CN1385552A - Carbon nitride ultrahard film plated target material and preparation method thereof - Google Patents
Carbon nitride ultrahard film plated target material and preparation method thereof Download PDFInfo
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- CN1385552A CN1385552A CN 02115767 CN02115767A CN1385552A CN 1385552 A CN1385552 A CN 1385552A CN 02115767 CN02115767 CN 02115767 CN 02115767 A CN02115767 A CN 02115767A CN 1385552 A CN1385552 A CN 1385552A
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Abstract
The carbon nitride superhard film plated target material is made up by combining two target materials which are respectively titanium alloy target or chrome alloy target and graphite target, and is characterized by that the rare earty is added in the above-mentioned two target materials, and the rare earty content is 0.01-5 wt% of total weight. Its addition mode adopts directly-droping or indirect physial-chemical precipitation mode, and its addition form adopts rare earthy compound and rare earthy intermediate alloy powder. Said invention can be used in multihead arc plasma plating equipment for plating various wear-resisting workpieces, such as gear, tool, die and others.
Description
Technical field
The present invention relates to a kind of plated target material and preparation method thereof, relate to a kind of carbon nitride ultrahard film plated target material and preparation method thereof particularly.
Background technology
Carbonitride is the novel superhard material of the nineties exploitation, and its hardness is approaching or surpass diamond, and chemical stability and thermostability are excellent more.When carbonitride is sandwiched between two-layer titanium nitride (chromium) lattice, will be forced to crystalization, need plate one deck titanium nitride (TiN) earlier at workpiece surface when carbon nitride ultrahard film plated (multiple arc plasma body plating), plate carbonitride (C again
3N
4), titanium-nitride (TiN) again is clipped in the middle carbonitride at last, forces it to form the carbonitride (C of superhard perfect crystal
3N
4).Carbon nitride ultrahard film plated employing titanium alloy target or Chrome metal powder target (optional one), graphite target, two kinds of targets are placed on simultaneously in the multiple arc plasma body plating equipment workpiece are carried out plating, make workpiece surface plating superhard material carbon nitride films.The key problem in technology problem that exists is at present: the carbonitride rete effect less stable that forms in the plating process, particularly obtaining aspect the crystalline membrane, aspect raising nitrogen content and microhardness stability, and at the graphite, class graphite structure such as the rhombohedral carbonitride (C that eliminate coatings
3N
4) aspect all needs bigger improvement, the repeatability of plating technic and reliability await further raising, so just might realize real industrialization.
Summary of the invention
The object of the present invention is to provide that a kind of plating carbon nitride films crystal property is good, good stability, repeatable strong carbon nitride ultrahard film plated target material and preparation method thereof.
To achieve these goals, technical scheme of the present invention is: carbon nitride ultrahard film plated target material by two kinds of target combinations, is respectively titanium alloy target or Chrome metal powder target and graphite target, it is characterized in that respectively adding rare earth, it is 0.01-5 that content of rare earth accounts for total weight percent.
Aforesaid rare earth is that lanthanum (La) is or yttrium (Y).
Add rare earth in the aforesaid titanium alloy target and be called the rare earth titanium alloy target, the rare earth titanium alloy target comprises titanium, manganese or chromium, rare earth, and the each component weight percent is:
Titanium 85-95
Manganese or chromium 4-10
Rare earth 0.01-5.
Add rare earth in the aforesaid Chrome metal powder target and be called rare earth Chrome metal powder target, rare earth Chrome metal powder target comprises chromium, copper or titanium, rare earth, and the each component weight percent is:
Chromium 85-95
Copper or titanium 4-10
Rare earth 0.01-5.
Add rare earth in the aforesaid graphite target and be called the rare earth graphite target, the rare earth graphite target comprises graphite, rare earth, and the each component weight percent is:
Graphite 95-99.09
Rare earth 0.01-5.
The preparation method of carbon nitride ultrahard film plated target material: 1, addition manner: with direct doping and physical chemistry coprecipitation mode interpolation indirectly; 2, add form: add with rare earth compound and rare earth intermediate alloy powder mode; 3, addition: it is 0.01-5 that rare earth accounts for total weight percent.
The present invention utilizes the special physicochemical performances such as sex change, microalloying, purifying, absorption and catalytic activation of rare earth element, has improved the stable and repeatable of carbonitride plating technic performance greatly, and plating carbon nitride films crystal property is good.Sex change, microalloying, purifying, absorption and catalytic activation make at the bottom of titanium nitride (TiN) and the workpiece and carbonitride (C
3N
4) between in conjunction with more firm, the coating difficult drop-off; Sex change, microalloying, purifying, absorption and catalytic activation make carbonitride crystalline form and coating more complete, purer, have eliminated impurity, and stability is better.Add the carbonitride (C that has eliminated imperfect crystal behind the rare earth effectively
3N
4) and rhombohedral carbonitride (C
3N
4) class graphite and soft graphite structure, superhard property and stability rise significantly.After adopting the present invention, nitrogen content average statistical in the carbonitride plating rete improves 10-20% than the analog value after handling without rare earth, corresponding film microhardness HV primary system meter average improves 5 units, reach 64-70Gpa, be up to 76Gpa, the correlation intensity value of workpiece improves 10%, and improve 20% the work-ing life of workpiece, and the plating reliability reaches more than 95%.
Embodiment
Carbon nitride ultrahard film plated target material by two kinds of target combinations, is respectively titanium alloy target or Chrome metal powder target and graphite target, and each adds rare earth, and it is 0.01-5 that content of rare earth accounts for total weight percent.
Aforesaid rare earth is that lanthanum (La) is or yttrium (Y).
Add rare earth in the aforesaid titanium alloy target and be called the rare earth titanium alloy target, the rare earth titanium alloy target comprises titanium, manganese or chromium, rare earth, and the each component weight percent is:
Titanium 85-95
Manganese or chromium 4-10
Rare earth 0.01-5.
Add rare earth in the aforesaid Chrome metal powder target and be called rare earth Chrome metal powder target, rare earth Chrome metal powder target comprises chromium, copper or titanium, rare earth, and the each component weight percent is:
Chromium 85-95
Copper or titanium 4-10
Rare earth 0.01-5.
Add rare earth in the aforesaid graphite target and be called the rare earth graphite target, the rare earth graphite target comprises graphite, rare earth, and the each component weight percent is:
Graphite 95-99.09
Rare earth 0.01-5.
The preparation method of carbon nitride ultrahard film plated target material: 1, addition manner: with direct doping and physical chemistry coprecipitation mode interpolation indirectly; 2, add form: add with rare earth compound and rare earth intermediate alloy powder mode; 3, addition: it is 0.01-5 that rare earth accounts for total weight percent.
Use: plating technic adopts multiple arc plasma body plating equipment (Wuhan University is existing), rare earth titanium alloy target or rare earth Chrome metal powder target (optional one) be placed in the multiple arc plasma body plating equipment simultaneously with the rare earth graphite target carry out, make workpiece surface plating superhard material carbon nitride films the workpiece plating.Workpiece is as: the rings on the gear of mechanical industry, cutter and the textile equipment, steel ring, spindle and various wearing piece, cutter and the mould that has wear resistance, hardness to require.
Claims (6)
1, carbon nitride ultrahard film plated target material by two kinds of target combinations, is respectively titanium alloy target or Chrome metal powder target and graphite target, it is characterized in that respectively adding rare earth, and it is 0.01-5 that content of rare earth accounts for total weight percent.
2, carbon nitride ultrahard film plated target material according to claim 1 is characterized in that rare earth is that lanthanum (La) is or yttrium (Y).
3, carbon nitride ultrahard film plated target material according to claim 1 is characterized in that adding in the described titanium alloy target rare earth and is called the rare earth titanium alloy target, and the rare earth titanium alloy target comprises titanium, manganese or chromium, rare earth, and the each component weight percent is:
Titanium 85-95
Manganese or chromium 4-10
Rare earth 0.01-5.
4, carbon nitride ultrahard film plated target material according to claim 1 is characterized in that adding in the described Chrome metal powder target rare earth and is called rare earth Chrome metal powder target, and rare earth Chrome metal powder target comprises chromium, copper or titanium, rare earth, and the each component weight percent is:
Chromium 85-95
Copper or titanium 4-10
Rare earth 0.01-5.
5, carbon nitride ultrahard film plated target material according to claim 1 is characterized in that adding in the described graphite target rare earth and is called the rare earth graphite target, and the rare earth graphite target comprises graphite, rare earth, and the each component weight percent is:
Graphite 95-99.09
Rare earth 0.01-5.
6, the preparation method of carbon nitride ultrahard film plated target material: 1, addition manner: with direct doping and physical chemistry coprecipitation mode interpolation indirectly; 2, add form: add with rare earth compound and rare earth intermediate alloy powder mode; 3, addition: it is 0.01-5 that rare earth accounts for total weight percent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021157677A CN1164790C (en) | 2002-04-26 | 2002-04-26 | Carbon nitride ultrahard film plated target material and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021157677A CN1164790C (en) | 2002-04-26 | 2002-04-26 | Carbon nitride ultrahard film plated target material and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1385552A true CN1385552A (en) | 2002-12-18 |
| CN1164790C CN1164790C (en) | 2004-09-01 |
Family
ID=4743854
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021157677A Expired - Fee Related CN1164790C (en) | 2002-04-26 | 2002-04-26 | Carbon nitride ultrahard film plated target material and preparation method thereof |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100394076C (en) * | 2003-07-31 | 2008-06-11 | 日产自动车株式会社 | Gear |
| CN101962747A (en) * | 2010-10-26 | 2011-02-02 | 中国航天科技集团公司第五研究院第五一○研究所 | Method for arc ion plating of CN thin film |
| CN109930108A (en) * | 2018-11-21 | 2019-06-25 | 广东工业大学 | A kind of high-temperature wear-resisting self-lubricating TiB2Base coating and its preparation method and application |
-
2002
- 2002-04-26 CN CNB021157677A patent/CN1164790C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100394076C (en) * | 2003-07-31 | 2008-06-11 | 日产自动车株式会社 | Gear |
| US8096205B2 (en) | 2003-07-31 | 2012-01-17 | Nissan Motor Co., Ltd. | Gear |
| CN101962747A (en) * | 2010-10-26 | 2011-02-02 | 中国航天科技集团公司第五研究院第五一○研究所 | Method for arc ion plating of CN thin film |
| CN109930108A (en) * | 2018-11-21 | 2019-06-25 | 广东工业大学 | A kind of high-temperature wear-resisting self-lubricating TiB2Base coating and its preparation method and application |
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| Publication number | Publication date |
|---|---|
| CN1164790C (en) | 2004-09-01 |
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