CN1384334A - Double-frequency confocal step height microscope measuring device - Google Patents
Double-frequency confocal step height microscope measuring device Download PDFInfo
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- CN1384334A CN1384334A CN 02120884 CN02120884A CN1384334A CN 1384334 A CN1384334 A CN 1384334A CN 02120884 CN02120884 CN 02120884 CN 02120884 A CN02120884 A CN 02120884A CN 1384334 A CN1384334 A CN 1384334A
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Abstract
The present invention belongs to the field of surface appearance measuring technology. The microscope measurer includes transverse Zeeman laser; spectroscope, Faraday cell, half-wave plate, lens, pinhole, glued lens and polarized spectroscope on the axis of laser emitting end; quarter wavelength plate and tetrahedron prism in the reflecting light path of the polarized spectroscope; quarter wavelength plate and microscopic objective in the transmitting light path of the polarized spectroscope; one second spectroscope; Glan objective, convergent lens, second pinhole and photoelectronic detector in the reflecting light path of the second spectroscope; and one other convergent lens and one second photoelectronic detector in the transmitting light path of the second spectroscope.
Description
Technical field
The invention belongs to the measuring surface form technical field, particularly double-frequency confocal interferes microscopic system to be used for the standard step height measurement.
Background technology
The cofocus scanning imaging is just proposed by Minsky as far back as eighties of last century the fifties, and Davidovits, Sheppard and Wilson etc. have done further research to confocal microscope system subsequently.Result of study shows: the cofocus scanning microscopic system not only can be suppressed to weak parasitic light in the picture, and under identical image-forming condition, its axial resolution is 1.4 times of common microscopic system, and has three-dimensional chromatography imaging function.The ability of this three-dimensional imaging makes confocal microscopy be widely used in biology, biomedicine, industry detection and metrology field just.
Yet, its axial resolution of common confocal microscope still only rests on sub-micrometer scale, and the noise of light source and drift directly influence measurement result, and the Tan Jiubin of Harbin Institute of Technology etc. has proposed differential confocal formula nanoscale optical focus detection system for this reason, as shown in Figure 1.Its structure comprises: light source 31 and the semi-transparent semi-reflecting lens 32 and the condenser lens 33 that are provided with on its emergent light axis, another semi-transparent semi-reflecting lens 35 is set on the reflected light path of this semi-transparent semi-reflecting lens 32, and the reflection, two pin holes 36,38 on the transmitted light path and two detectors 37,39 that are located at this semi-transparent semi-reflecting lens 35 respectively, and the treatment circuit 40 that receives the output signal of two detectors.The principle of work of this confocal microscope is: be divided into transmission and reflection two-beam by spectroscope 35 from the light of light source 31 outputs after 34 reflections of testing sample surface are returned, behind reflected light and transmitted light, place pin hole and detector respectively, the position of pin hole 36,38 be symmetrically located at respectively the picture focal plane before and afterwards, by two detector signals 37,39 being asked difference and summation, give the bright dipping focus signal.When the testing sample surface was positioned on the focal plane, position, two pin hole ground relatively and as the focal plane symmetry, the difference of two detectors is zero; When sample surfaces departed from the micro-displacement in focal plane, picture point leveled off to one of them pin hole and away from another pin hole respectively, makes the increase of luminous power that detects, and one reduces, thereby removes the size and Orientation of displacement by the differential wave reflection.Though this method can make the axial resolution of measurement reach 2nm, measurement range is subjected to the restriction of light intensity difference moving curve linear zone, can not provide measurement in a big way.Simultaneously because light intensity changes relation with the sample surfaces displacement is not linear relationship completely, so the precision of measuring also can not be very high.
Summary of the invention
The objective of the invention is for overcoming the weak point of prior art, merge the characteristics of double-frequency laser interference and scanning confocal microtechnic, provide a kind of double-frequency confocal micro-bench height measurement mechanism, can carry out quantitative measurment to bench heights such as microelectronics mask plates, have the advantages that height high-resolution and relatively large journey are measured.
Measuring principle of the present invention is as follows: as shown in Figure 2.Transverse zeeman (He-Ne double frequency) the laser instrument while is as the light source of confocal microscope and error interference system, obtain the intensity signal (coarse positioning) and the phase information (exact value) of sample surfaces respectively, realized relatively large journey and high-resolution bench height measurement requirement simultaneously.
The polarization vector of supposing transverse zeeman laser output laser is:
In the formula, the implication of each variable is:
Be respectively the polarization direction vector of outgoing parallel component p, vertical component s; E
01, E
02Be respectively the amplitude of p, s component; f
1, f
2Be respectively the frequency of p, s component, frequency difference Δ f=f
1-f
2φ
01, φ
02Be respectively the initial phase of p, s component.
E
0After the PBS beam split, reflected light is the s component, forms reference light that transmitted light is the p component, forms measuring light, closes light by PBS again through reference with after measuring light path respectively.Because reference light comes and goes through quarter wave plate twice, be equivalent to through one time 1/2 wave plate, because the fast axle of quarter wave plate is at 45 with the polarization direction,, promptly become the p polarization again by the s polarization so the polarized component of reference light has been rotated 90 ° respectively; In like manner measuring light then has the p polarization to become the polarization for s.So, when being returned by tetrahedron, reference light sees through PBS, when being returned by the testing sample surface reflection, measuring light reflects by PBS, and the two synthesizes a branch of light again.Can the polarization vector E of reference light and measuring light after the light will be closed through PBS
1And E
2Writing:
Wherein, K
1=1-α
1, K
2=1-α
2, α
1, α
2Be respectively s, the p component intensity loss factor in interferometer; φ
12Be reference path position phase increment, φ
22For measuring light path at the asynchronous position of sample phase increment.f
DBe the Doppler shift that causes in the sample scanning process.
E
1, E
2Receive by detector after the analyzing and form measuring-signal E
m, I
m, can be described as:
I
m=I
0K
1K
2Sin (2 π (f
1-f
2+ 2f
D) t+ φ
01+ φ
22-(φ
02+ φ
12)) in (4) formula: I
0∝ E
01E
02
The reference signal I that directly obtains from the output of transverse zeeman laser
rFor:
I
r=I
0K
0Sin (2 π (f
1-f
2) t+ φ
0) (5) because φ
01, φ
22, φ
02, φ
12, φ
0Be constant, so I
mWith I
rCan get phase difference φ after comparing mutually is:
In the formula, λ=632.8nm is He-Ne optical maser wavelength; S is tested displacement; The unit of Δ φ is degree.Can get by formula (6):
So when phase measurement resolution was 0.1 °, displacement measurement resolution reached 0.1nm.
Yet the phase measurement method can only be in the half wavelength range ability effectively.So in order to improve the measurement range, the present invention utilizes confocal microscope system that light intensity has been carried out synchro measure, so just when satisfying, realized the high-resolution that bench height is measured than wide-measuring range.
The present invention has following characteristics and good result:
The micro-bench height measurement mechanism of double-frequency confocal of the present invention is measured on the basis of light intensity in conventional confocal microscopes, takes double-frequency laser as light source, has increased phase-detection, thereby has broken through the restriction of the Rayleigh criterion of light intensity detection.The phase measurement method realizes making Measurement Resolution reach nanometer scale to 3600 segmentations (being equivalent to 0.1 ° phase measurement unit) of half-wavelength.It is that the present invention is different from one of innovative point of prior art that double-frequency confocal after the improvement is interfered the microscopic system light path.
Confocal micro-measurement technology of the present invention adopts faraday cell and 1/2 wave plate, emergent light and back light polarization direction (being s polarization and p polarization) are exchanged, thereby overcome the influence of light back coupling problem effectively, make laser frequency stabilizing system operate as normal all the time in measuring process, avoid occurring a plurality of resonator cavitys.
The present invention is realizing the high-resolution while by luminous intensity measurement acquisition coarse positioning information, and its light intensity signal is measured by double frequency and interfered the sinusoidal signal amplitude that obtains to provide.The reference signal of measuring-signal and same frequency is imported lock-in amplifier, can obtain the amplitude size of measuring-signal.Measure the direct current light intensity with common confocal microscope and compare, this method can overcome the interference of external parasitic light effectively, improves the robustness of measuring.This be the difference prior art innovative point two.
Description of drawings
Fig. 1 is existing differential confocal formula nanoscale optical focus detection system light path structural drawing
Fig. 2 is a measuring principle block diagram of the present invention
Fig. 3 is double-frequency confocal step height microscope measuring device example structure figure of the present invention
Fig. 4 is embodiment of the present invention and nanometer interferometer theory diagram
Fig. 5 is one group of preliminary experiment result of embodiment of the present invention
Embodiment
The structure of double-frequency confocal step height microscope measuring device of the present invention and principle of work reach accompanying drawing in conjunction with the embodiments and are described in detail as follows:
The structure of present embodiment as shown in Figure 3, comprise: transverse zeeman He-Ne two-frequency laser 1 with higher precision frequency stabilization, and be placed on spectroscope (BS) 2, faraday cell 4,1/2 wave plate 5, lens 6, pin hole 7, balsaming lens 8 and polarization spectroscope (PBS) 9 on the laser instrument transmitting terminal axis successively, be placed on quarter wave plate 10 and kaleidoscope prism 11 on the PBS reflected light path, be placed on quarter wave plate 12, microcobjective 13 on the PBS transmitted light path; Measuring light and reference light are divided into two parts and are respectively applied for luminous intensity measurement and phase measurement after PBS closes light, so this device also comprises BS 15, be placed on Glan prism 19, balsaming lens 20, pin hole 21 and photodetector 22 on the BS reflected light path respectively, the diaphragm 16 on BS 15 transmitted light paths, convergent lens 17 and photodetector 18.
The concrete principle of the micro-height measuring device of double-frequency confocal step of present embodiment is as follows:
As shown in Figure 3.The double-frequency laser of transverse zeeman He-Ne laser instrument 1 output orthogonal, to export light by BS 2 and be divided into two bundles, form reference signal by detector 3 after the reflected light analyzing, 1/2 wave plate 5 that transmitted light is placed along 22.5 ° of directions by faraday cell 4 and fast axle makes polarisation of light direction half-twist, can avoid the influence of light back coupling to laser instrument.Converge on the pin hole 7 through lenslet 6 again, behind needle passing hole 7 filtering parasitic lights, light beam is expanded into parallel beam by balsaming lens 8.Parallel beam carries out polarization spectro by PBS 9, and wherein reflected light is as reference light, and transmitted light is as measuring light.Reference light is reflected by tetrahedron 11 behind the quarter wave plate 10 of 45 ° of placements through too fast axle earlier, and through the quarter wave plate 10 of 45 ° of placements, the polarization direction half-twist of reference light becomes transmitted light to reflected light during once more through PBS 9 once more; Measuring light is incident upon testing sample surface 14 through too fast axle along the quarter wave plate 12 of 45 ° of placements and the microcobjective 13 of unlimited tube length, measuring light is passed through also half-twist of quarter wave plate 12 rear polarizer directions once more behind the sample reflected back, once more through being reflected behind the PBS 9, and with the reference actinic light.Synthetic light is by BS 15 separated into two parts, and transmitted light forms the phase measurement signal through diaphragm 16 and convergent lens 17 backs by detector 18 analyzings reception, carries out phase measurement with reference signal, thereby the microscopical resolution of double-frequency confocal is brought up to below 1 nanometer; Reflected light is through Glan prism 19 elimination reference lighies, and assemble behind pin hole 21 by balsaming lens 20 (identical) with balsaming lens 8, inciding detector 22 receives, form the luminous intensity measurement signal, obtain light intensity value by lock-in amplifier, change obtaining the information of axial displacement off-focal amount by light intensity, measure the monambiguity problem thereby overcome the pure phase position, vertical measurement range is reached more than 5 microns, also effectively reduce interference of stray light simultaneously.
The method that present embodiment is measured the microelectronics bench height may further comprise the steps:
1) double-frequency laser of transverse zeeman He-Ne laser instrument 1 output orthogonal, to export light by BS 2 and be divided into two bundles, form reference signal by detector 3 after the reflected light analyzing, 1/2 wave plate 5 that transmitted light is placed along 22.5 ° of directions by faraday cell 4 and fast axle makes the polarization direction half-twist, with the influence of avoiding light to feedback.
2) converge on the pin hole 7 through lenslet 6 again, behind needle passing hole 7 filtering parasitic lights, light beam is expanded into parallel beam by balsaming lens 8.
3) parallel beam carries out polarization spectro by PBS 9, and wherein reflected light is as reference light, and transmitted light is as measuring light.
4) reference light is reflected by tetrahedron 11 behind the quarter wave plate 10 of 45 ° of placements through too fast axle earlier, and through the quarter wave plate 10 of 45 ° of placements, the polarization direction half-twist of reference light becomes transmitted light to reflected light during once more through PBS 9 once more.
5) measuring light is incident upon testing sample surface 14 through too fast axle along the quarter wave plate 12 of 45 ° of placements and the microcobjective 13 of unlimited tube length, measuring light is through the sample reflected back, through behind the microcobjective 13, once more by quarter wave plate 12, make also half-twist of its polarization direction, be reflected after arriving PBS 9, and with the reference actinic light.
6) synthetic light is by BS 15 separated into two parts, transmitted light forms the phase measurement signal through diaphragm 16 and convergent lens 17 backs by detector 18 analyzings reception, carry out phase measurement with reference signal, thereby the microscopical resolution of double-frequency confocal is brought up to below 1 nanometer.
7) reflected light is through Glan prism 19 elimination reference lighies, and assemble behind pin hole 21 by balsaming lens 20 (identical) with balsaming lens 8, inciding detector 22 receives, measuring-signal obtains light intensity value by lock-in amplifier, change the information that obtains axial displacement off-focal amount by light intensity, measure the monambiguity problem thereby overcome the pure phase position, vertical measurement range is reached more than 5 microns, also effectively reduce interference of stray light simultaneously.
In the method, adopt confocal microscopy and difference interference measuring technology, satisfied the needs of bigger measurement range and high measurement resolution simultaneously.Luminous intensity measurement has utilized phase-locked principle, has overcome the problem that pure survey direct current light intensity is subjected to stray light easily.Utilize FPGA phase place card to realize the phase measurement of difference interference signal, resolution can reach 0.1 °, the resolution of corresponding about 0.1 nanometer.Intensity measurements and phase measurement receive by computing machine respectively.
The model of embodiments of the invention main devices and parameter:
Adopt transverse zeeman laser 1 frequency difference to arrive the hundreds of kilohertz tens, the transmissivity of BS 2 is 90%, reflectivity is 10%, detector 3,18,22 is the PIN pipe, faraday cell 4 makes 45 ° of polarization direction rotations, the quick shaft direction of 1/2 wave plate 5 and horizontal direction angle are 22.5 °, the focal length of balsaming lens 8 is 150mm, and quarter wave plate 10,12 and horizontal direction angle are 45 °, and BS 15 transmissions and reflectance are 1: 1.
For demarcating the measurement accuracy of present embodiment system, adopt differential nanometer interferometer SJD5 to demarcate native system, method is as shown in Figure 4.Drive micro-displacement work table by piezoelectric ceramics PZT, (this interferometer is demarcated through metering institute to use confocal microscopy interference system of the present invention and differential nanometer interferometer SJD5 respectively, Measurement Resolution is Ya Nami, nonlinearity erron 2.8 nanometers) measure, adopt computing machine to carry out measurement synchronization control, the result is also by computer acquisition.Fig. 5 has provided one group of empirical curve, the measurement result of SJD5 when horizontal ordinate is PZT driving worktable, the ordinate left side is the phase measurement of confocal microscopy interference system, and ordinate the right is an intensity measurements, and experimental result shows that the nonlinearity erron of phase measurement is being no more than 7 nanometers.
Claims (1)
1, a kind of double-frequency confocal step height microscope measuring device, it is characterized in that, comprise transverse zeeman laser, be placed on first spectroscope, faraday cell, 1/2 wave plate, lens, first pin hole, balsaming lens and polarization spectroscope on this laser instrument transmitting terminal axis successively; Be placed on quarter wave plate and kaleidoscope prism on this polarization spectroscope reflected light path, be placed on quarter wave plate, microcobjective on this polarization spectroscope transmitted light path; Also comprise second spectroscope on the light light path of closing that is arranged on this polarization spectroscope, be placed on Glan prism, convergent lens, second pin hole and photodetector on this second spectroscopical reflected light path respectively, convergent lens and photodetector on this second spectroscopical transmitted light path.
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| CN1300550C (en) * | 2004-03-22 | 2007-02-14 | 财团法人工业技术研究院 | Apparatus and method for measuring surface outline of measured object |
| CN1323309C (en) * | 2005-11-21 | 2007-06-27 | 哈尔滨工业大学 | Reflection multilight bean confocal interference microscope having several tens nanometer lateral discriminability |
| CN101208579B (en) * | 2005-01-14 | 2011-03-30 | 埃西勒国际通用光学公司 | Optical thickness probe and device and method making use thereof |
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- 2002-06-07 CN CNB021208840A patent/CN1180222C/en not_active Expired - Fee Related
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