CN1369747A - 曝光方法及曝光装置 - Google Patents

曝光方法及曝光装置 Download PDF

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Publication number
CN1369747A
CN1369747A CN02102898A CN02102898A CN1369747A CN 1369747 A CN1369747 A CN 1369747A CN 02102898 A CN02102898 A CN 02102898A CN 02102898 A CN02102898 A CN 02102898A CN 1369747 A CN1369747 A CN 1369747A
Authority
CN
China
Prior art keywords
pattern
substrate
exposure
light shield
projection system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN02102898A
Other languages
English (en)
Chinese (zh)
Inventor
町野胜弥
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of CN1369747A publication Critical patent/CN1369747A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
CN02102898A 2001-01-30 2002-01-30 曝光方法及曝光装置 Pending CN1369747A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001022042 2001-01-30
JP2001022042A JP2002229215A (ja) 2001-01-30 2001-01-30 露光方法及び露光装置

Publications (1)

Publication Number Publication Date
CN1369747A true CN1369747A (zh) 2002-09-18

Family

ID=18887505

Family Applications (1)

Application Number Title Priority Date Filing Date
CN02102898A Pending CN1369747A (zh) 2001-01-30 2002-01-30 曝光方法及曝光装置

Country Status (4)

Country Link
JP (1) JP2002229215A (ja)
KR (1) KR20020063798A (ja)
CN (1) CN1369747A (ja)
TW (1) TW518662B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101383977B (zh) * 2003-06-13 2010-12-08 索尼株式会社 投影式显示装置
CN109074006A (zh) * 2016-05-18 2018-12-21 Towerjazz松下半导体有限公司 半导体装置及其制造方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101484435B1 (ko) 2003-04-09 2015-01-19 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101528089B1 (ko) * 2003-06-13 2015-06-11 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI385414B (zh) * 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
TWI505329B (zh) 2004-02-06 2015-10-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
KR101332035B1 (ko) * 2004-12-22 2013-11-22 가부시키가이샤 니콘 마스크 표면의 높이 방향 위치 측정 방법, 노광 장치 및노광 방법
JP2006203032A (ja) * 2005-01-21 2006-08-03 Victor Co Of Japan Ltd 素子の製造方法
IT201700079201A1 (it) * 2017-07-13 2019-01-13 Lfoundry Srl Metodo di allineamento di maschere fotolitografiche e relativo procedimento di fabbricazione di circuiti integrati in una fetta di materiale semiconduttore

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101383977B (zh) * 2003-06-13 2010-12-08 索尼株式会社 投影式显示装置
CN109074006A (zh) * 2016-05-18 2018-12-21 Towerjazz松下半导体有限公司 半导体装置及其制造方法
CN109074006B (zh) * 2016-05-18 2021-03-23 高塔伙伴半导体有限公司 半导体装置及其制造方法

Also Published As

Publication number Publication date
TW518662B (en) 2003-01-21
JP2002229215A (ja) 2002-08-14
KR20020063798A (ko) 2002-08-05

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C06 Publication
PB01 Publication
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication