CN1332390A

CN1332390A - Making proces sof antireflecting constituent for projecting screen

Info

Publication number: CN1332390A
Application number: CN 01108601
Authority: CN
Inventors: 霍永峰; 张益民; 龚成
Original assignee: 张益民
Priority date: 2001-07-05
Filing date: 2001-07-05
Publication date: 2002-01-23
Anticipated expiration: 2021-07-05
Also published as: CN1170202C

Abstract

The making process of protective antireflecting constituent includes the step of: cleaning glass; coating titanate solution films onto the two sides of the glass through soaking the glass inside ethyl titanate solution, stoving to eliminate water andethanol of the titanate solution films and form homogeneous titania films; coating silicic acid sol films by soaking the glass with titania films in ethyl silicate solution, stoving to eliminate water and ethanol to form homogeneous silica films.

Description

Method for manufacturing anti-reflection and anti-reflection protection component in projection screen

The invention relates to a method for manufacturing an anti-reflection protective layer used in a projection screen.

The screen currently used in projection televisions generally consists of a three-layer structure (see fig. 1), one layer facing the projector being a fresnel lens layer 1 ', an intermediate layer being a cylindrical conducting layer or scattering layer 2 ', and a front surface being an anti-reflection protective layer 3 '. The anti-reflection protective layer is also called as an anti-reflection protective component, and mainly overcomes the reflection of ambient light, improves the contrast of an image, and simultaneously protects the microstructure of the middle layer from being damaged artificially.

The current production methods of the anti-reflection protective layer (i.e. the anti-reflection protective component) include the following steps:

1: the method has the advantages that the process is simple and easy to implement, the reflectivity of reflected light is not reduced substantially, the anti-reflection and anti-reflection functions are not achieved, and meanwhile, the randomness of the rough surface increases the total reflection probability of the ambient light and the emergent light of the projector, so that the reflection of the ambient light enhances the projection light of the projector to weaken, and the image quality is influenced.

2: some pigments are added in the optical organic glass to absorb the ambient light, and the method does not achieve the functions of anti-reflection and anti-reflection substantially, but only sacrifices the brightness to improve the contrast, influences the output brightness of the image and influences the image quality.

3: the optical surface is coated with an antireflection film in vacuum, and the vacuum coating is generally carried out by a high-temperature meteorological deposition method and a magnetron sputtering method. The basic optical principle is that two mediums with different refractive indexes and same optical thickness are alternately plated on the surface of the glass.

Disadvantages of the pyrometallurgical deposition method:

1) the spatial distribution of the particle concentration in the air results in a large area of film thickness uniformity that is very difficult to ascertain.

2) The continuity of the coating process is poor, continuous coating is hardly achieved, the production efficiency is low, and the method is not suitable for batch production.

3) It is difficult to coat both sides simultaneously.

Disadvantages of the magnetic sputtering method:

1) the investment scale of the large-area dielectric film plating is large.

2) The sputtering efficiency of the medium is low. (e.g., SiO)₂)

3) It is difficult to simultaneously coat both sides.

4) The thickness of the film layer is difficult to control.

In view of the above situation, the present invention aims to provide a continuous manufacturing method for antireflection and antireflection protection components, wherein both surfaces of the glass can be coated with films simultaneously, and the thickness of the film layers can be controlled.

The purpose is realized by simultaneously coating films on two surfaces of the glass by adopting an organic compound solution hydrolysis method to obtain a required oxide layer and preparing the anti-reflection protective glass. Specifically, the method comprises a glass cleaning procedure, wherein the cleaned glass is placed in an ethyl titanate solution for film drawing to form titanium acid soluble film films on two surfaces of the glass, and then the glass is baked to enable the titanium acid soluble film films on the surface of the glass to be dehydratedand volatilized by ethanol to form titanium dioxide films with uniform thickness; then, the glass with titanium dioxide films on both surfaces is placed in ethyl silicate solution to be drawn, a layer of silicic acid sol film is formed on the surface of the glass, and then the glass is baked to volatilize dehydrated ethanol to form a silicon dioxide film with uniform thickness, so that the anti-reflection and anti-reflection protective glass is prepared. The glass is used as a component of a rear projection screen and is used for rear projection televisions.

The whole process reaction process of the invention is as follows:

the invention has the following advantages:

1. the thickness of the film layers on the two surfaces of the glass is controllable and uniform;

2. the production process is simple and the investment is small;

3. can be produced in large batch and has high production efficiency.

The invention is further described in the following with reference to the figures and examples of the specification.

FIG. 1 is a schematic diagram of the components of a screen currently used in a rear projection television

FIG. 2 is a process flow diagram of the present invention

FIG. 3 is a schematic diagram of the structure of the anti-reflection and anti-reflection protective component prepared by the invention

The present invention is illustrated in fig. 2, which depicts an apparatus and process for continuously making antireflective and antireflective protective components, i.e., antireflective and antireflective glasses. The manufacturing process flow is as follows:

the first step is as follows: the glass cleaning is generally performed by ultrasonic cleaning in consideration of a large glass area. The glass is kg toughened glass.

The second step is that: placing the cleaned glass in Ti (OC)₂H₅)₄＋4H₂Drawing the film in O solution to form H on both surfaces of the glass₄TiO₄＋C₂H₅And (3) OH sol film. The liquid temperature is controlled to be 25 to 36 ℃ under stable environmental conditions, and the drawing speed is controlled to be 0.1 to 0.5 m/s, so that the corresponding film thickness can be obtained.

The third step: baking in a thermostatic chamber at 110-150 deg.C for 5-10 min to volatilize titanic acid dehydrated alcohol to form TiO₂A film.

The fourth step: at Si (OC)₂H₅)₄＋4H₂H is formed on the surface of the glass by drawing a film in O solution₄TiO₄＋C₂H₅Film of OH solution. The liquid temperature is controlled to be 25 to 36 ℃ under stable environmental conditions, and the drawing speed is controlled to be 0.2 to 0.7 m/s, so that the corresponding film thickness can be obtained.

The fifth step: baking in a thermostatic chamber at 110-150 deg.C for 5-10 min to volatilize silicic acid dehydrated ethanol to form SiO₂A film.

The antireflection glass (see FIG. 3) prepared as described above had TiO 1/4 wavelengths on both surfaces of glass 1₂Film layer 2 and 1/4 wavelength SiO₂A film layer 3.

The anti-reflection and anti-reflection glass produced by the process has controllable film thickness and uniform thickness. The glass is used as a component in a back screen, and the glass, the transparent layer with the cylindrical surface structure and the Fresnel lens structure form the back projection screen together, and the back projection screen is used in a back projection television.

Claims

1. A method for preparing an anti-reflection and anti-reflection protection component used in a projection screen comprises a glass cleaning process, and is characterized in that the cleaned glass is placed in a titanic acid ethyl ester solution for film drawing, titanic acid sol films are formed on two surfaces of the glass, and then the glass is baked to enable the titanic acid sol films on the two surfaces of the glass to be dehydrated and volatilized by ethanol to form titanium dioxide films; then, the glass with titanium dioxide film on both surfaces is put into ethyl silicate solution to be drawn to form a silicic acid sol film on the surface, and then the glass is baked to dehydrate the silicic acid sol film on the surface and volatilize ethanol to form a silicon dioxide film.

2. The method of claim 1, wherein the ethyl titanate solution is comprised of Ti (OC)₂H₅)₄＋4H₂The temperature of the medium liquid formed by O is controlled between 25 and 36 ℃, and the drawing speed of the glass after the glass is put into the medium liquid is 0.1 to 0.5 meter per second.

3. The process for producing an antireflection protection element as claimed in claim 1, wherein the baking temperature for forming a titanium dioxide film from a titanic acid sol film on the glass surface is controlled to be 110 to 150 ℃ and the resultant glass is baked at a constant temperature for 5 to 10 minutes.

4. The method of making an antireflective and antireflective protective component of claim 1 where the ethyl silicate solution is comprised of Si (OC)₂H₅)₄＋4H₂O, the liquid temperature is controlled between 25 ℃ and 36 ℃, and the glass drawing speed is 0.2 meter per second to 0.7 meter per second.

5. The process for producing an antireflection protection element as claimed in claim 1, wherein the baking temperature for converting a silica sol film on the outer surface of the glass into a silica film is controlled within a range of 110 to 150 ℃ and the baking is carried out for 5 to 10 minutes at a constant temperature.

6. The method of making an antireflective and antireflective protective component of claim 1, where the glass is cleaned by an ultrasonic cleaning process.