CN1170202C

CN1170202C - Making proces sof antireflecting constituent for projecting screen

Info

Publication number: CN1170202C
Application number: CNB011086017A
Authority: CN
Inventors: 霍永峰; 张益民; 龚成
Original assignee: 张益民
Priority date: 2001-07-05
Filing date: 2001-07-05
Publication date: 2004-10-06
Anticipated expiration: 2021-07-05
Also published as: CN1332390A

Abstract

The present invention discloses a method for manufacturing anti-reflecting constituents in a projecting screen. The method of the present invention comprises: cleaning glass and placing the cleaned glass in titanium ethoxide solution to pull a film so that titanic acid solution films are formed on both surfaces of the glass; secondly, baking the glass so that the dehydration alcohol on the titanic acid solution films on the surfaces of the glass are volatilized to form titania films with uniform thickness; then, placing the glass whose both surfaces have titania films in Tetraethyl orthosilicate solution to pull the films so that silicic acid sol films are formed on the surfaces, and backing the silicic acid sol films to cause the dehydration alcohol to be volatilizated for forming silicon dioxide films with uniform thickness. Thus, anti-reflecting protecting glass is manufactured.

Description

Method for manufacturing anti-reflection and anti-reflection protection component in projection screen

Technical Field

The invention relates to a method for manufacturing an anti-reflection protective layer used in a projection screen.

Background

The screens currently used in projection televisions generally consist of a three-layer structure (see fig. 1), one layer facing the projector being a fresnel lens layer 1 ', an intermediate layer being a desirable and inaccessible surface conducting or scattering layer 2 ', and the front surface being an antireflection protective layer 3 '. The anti-reflection protective layer is also called anti-reflection protective component, and is mainly used for overcoming the reflection of ambient light, improving the contrast of an image and protecting the original microstructure of the middle layer from being damaged artificially.

The current production methods of the anti-reflection protective layer (i.e. the anti-reflection protective component) include the following steps:

1: the method has the advantages that the process is simple and easy to implement, the reflectivity is not reduced substantially, the anti-reflection and anti-reflection functions are not achieved, and meanwhile, the reflection of the ambient light enhances the projection light of the projector to be weakened because the total reflection probability of the ambient light and the emergent light of the projector is increased due to the randomness of the rough surface, so thatthe image quality is influenced.

2: some pigments are added in the optical organic glass to absorb the ambient light, and the method does not achieve the functions of anti-reflection and anti-reflection substantially, but only sacrifices the brightness to improve the contrast, influences the output brightness of the image and influences the image quality.

3: the optical surface is coated with an antireflection film in vacuum, and the vacuum coating is generally carried out by a high-temperature vapor deposition method and a magnetron sputtering method. The basic optical principle is that two mediums with different refractive indexes and same optical thickness are alternately plated on the surface of the glass.

Disadvantages of the high-temperature vapor deposition method:

1) the cosine distribution of the particle concentration in space causes the thickness uniformity of a large-area film layer to be difficult to grasp.

2) The continuity of the coating process is poor, continuous coating is hardly achieved, the production efficiency is low, and the method is not suitable for batch production.

3) It is difficult to coat both sides simultaneously.

The disadvantages of the magnetron sputtering method are:

1) and (4) large-area dielectric film plating investment scale.

2) The sputtering efficiency of the media is low (e.g. SiO)₂)。

3) It is difficult to simultaneously coat both sides.

4) The thickness of the film layer is difficult to control.

The invention content is as follows:

aiming at the situation, the invention provides a continuous manufacturing method of the anti-reflection and anti-reflection protection component, wherein the two surfaces of the glass can be coated with films simultaneously, and the thickness of the film layer can be controlled.

The technical scheme for solving the technical problem is as follows:

and (3) simultaneously coating films on two surfaces of the glass by adopting an organic compound solution hydrolysis method to obtain a required oxide layer, and preparing the anti-reflection and anti-reflection protective glass. Specifically, the method of the present invention comprises a glass cleaning process, and the cleaned glass is placed in a chamber made of Ti (OC)₂H₅)₄+4H₂And O. In the ethyl titanate solution, the liquid temperature is controlled at 25-36 ℃, and the film is drawn at the glass drawing speed of 0.1-0.5 m/s, so that the film forms titanium acid soluble film thin films on the two surfaces of the glassBaking to evaporate ethanol to obtain titanium dioxide film with uniform thickness, and placing the glass with titanium dioxide film on both surfaces in Si (OC)₂H₅)₄+4H₂And in the ethyl silicate solution formed by O, controlling the liquid temperature at 25-36 ℃, drawing the film at a glass drawing speed of 0.2-0.7 m/s to form a layer of silicic acid sol film on the surface, baking to evaporate dehydrated ethanol to form a silicon dioxide film with uniform thickness, and withdrawing work to obtain the anti-reflection and anti-reflection protective glass. The glass is used as a component of a rear projection screen and is used for rear projection televisions.

The whole process reaction process of the invention is as follows:

the invention has the following advantages:

1. the thickness of the film layers on the two surfaces of the glass is controllable and uniform;

2. the production process is simple and the investment is small;

3. can be produced in large batch and has high production efficiency.

Drawings

The invention is further described in the following with reference to the figures and examples of the specification.

FIG. 1 is a schematic diagram of the components of a screen currently used in a rear projection television

FIG. 2 is a process flow diagram of the present invention

FIG. 3 is a schematic diagram of the structure of the anti-reflection and anti-reflection protective component prepared by the invention

Detailed Description

The invention is shown in the figure, which describes equipment and a process for continuously manufacturing anti-reflection protective components, namely anti-reflection and anti-reflection glass. The manufacturing process flow is as follows:

the first step is as follows: the glass is cleaned by an ultrasonic cleaning process in consideration of large glass area. Glass adopted K₉And (4) tempering the glass.

The second step is that: placing the cleaned glass in Ti (OC)₂H₅)₄+4H₂Drawing the film in O solution to form H on both surfaces of the glass₄TiO₄+C₂H₅And (3) OH sol film. The liquid temperature is controlled to be 25-36 ℃ under stable environmental conditions, and the drawing speed is controlled to be0.1 to 0.5 m/s, corresponding film thicknesses can be achieved.

The third step: baking the titanium oxide in a thermostatic chamber at the temperature of between 110 and 150 ℃ for 5 to 10 minutes to volatilize titanic acid dehydrated ethanol to form TiO₂A film.

The fourth step: at Si (OC)₂H₅)₄+4H₂H is formed on the glass surface by supporting a film in O solution₄SiO₄+4C₂H₅Film of OH solution. The liquid temperature is controlled to be 25 to 35 ℃ under stable environmental conditions, and the drawing speed is controlled to be 0.2 to 0.7 m/s, so that the corresponding film thickness can be obtained.

The fifth step: baking at 110-150 deg.C in a sun room for 5-10 min to volatilize silicic acid dehydrated ethanol to form SiO₂A film.

The antireflection glass (see FIG. 3) prepared as described above had TiO 1/4 wavelengths on both surfaces of its glass 1₂Film layer 2 and 1/4 wavelength SiO₂A film layer 3.

The anti-reflection and anti-reflection glass produced by the process has controllable film thickness and uniform thickness. The glass is used as a component of a rear projection screen, and the glass, the transparent layer with the cylindrical surface structure and the Fresnel lens structure form the rear projection screen together, and the rear projection screen is used in a rear projection television.

Claims

1. A process for preparing the anti-reflection and anti-reflection protecting component of projection screen includes such steps as washing glass, putting the washed glass in Ti (OC)₂H₅)₄+4H₂In the ethyl titanate solution formed by O, controlling the liquid temperature at 25-36 ℃, drawing a film at the glass drawing speed of 0.1-0.5 m/s, forming titanic acid sol films on the two surfaces of the glass, and then baking the titanic acid sol film on the surface of the glass to dehydrate ethanol and volatilize to form a titanium dioxide film; then, the glass with titanium dioxide film on both surfaces is put into ethyl silicate solution, the liquid temperature is controlled at 25-36 ℃, and the film is drawn at the glass drawing speed of 0.2-0.7 m/s, so that the silica gel film is formed on the surface of the glass, and then the glass is baked to ensure that the silica gel film is formed on the surface of the glassThe formed silicic acid sol film is dehydrated and volatilized by ethanol to form a silicon dioxide film.