CN1322494C - 具有RuAl/NiAlB双晶种层的薄膜介质 - Google Patents
具有RuAl/NiAlB双晶种层的薄膜介质 Download PDFInfo
- Publication number
- CN1322494C CN1322494C CNB2004100824667A CN200410082466A CN1322494C CN 1322494 C CN1322494 C CN 1322494C CN B2004100824667 A CNB2004100824667 A CN B2004100824667A CN 200410082466 A CN200410082466 A CN 200410082466A CN 1322494 C CN1322494 C CN 1322494C
- Authority
- CN
- China
- Prior art keywords
- layer
- nialb
- thin film
- deposited
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 30
- 230000009977 dual effect Effects 0.000 title claims abstract description 9
- 230000005291 magnetic effect Effects 0.000 claims abstract description 53
- 239000010408 film Substances 0.000 claims abstract description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 14
- YTPMCWYIRHLEGM-BQYQJAHWSA-N 1-[(e)-2-propylsulfonylethenyl]sulfonylpropane Chemical compound CCCS(=O)(=O)\C=C\S(=O)(=O)CCC YTPMCWYIRHLEGM-BQYQJAHWSA-N 0.000 claims description 11
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 9
- 229910052796 boron Inorganic materials 0.000 claims description 9
- 230000005294 ferromagnetic effect Effects 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910000684 Cobalt-chrome Inorganic materials 0.000 claims description 5
- 239000010952 cobalt-chrome Substances 0.000 claims description 5
- 125000006850 spacer group Chemical group 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 4
- 239000000725 suspension Substances 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical group [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 229910000531 Co alloy Inorganic materials 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 72
- 229910000943 NiAl Inorganic materials 0.000 description 8
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 8
- 239000011651 chromium Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 229910015372 FeAl Inorganic materials 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000007704 transition Effects 0.000 description 3
- 229910017141 AlTa Inorganic materials 0.000 description 2
- 229910017150 AlTi Inorganic materials 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- -1 Ni3P Chemical compound 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000788 chromium alloy Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/672—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers having different compositions in a plurality of magnetic layers, e.g. layer compositions having differing elemental components or differing proportions of elements
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/676—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers having magnetic layers separated by a nonmagnetic layer, e.g. antiferromagnetic layer, Cu layer or coupling layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
- G11B5/7379—Seed layer, e.g. at least one non-magnetic layer is specifically adapted as a seed or seeding layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/26—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12465—All metal or with adjacent metals having magnetic properties, or preformed fiber orientation coordinate with shape
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/676,735 US6863993B1 (en) | 2003-09-30 | 2003-09-30 | Thin film media with a dual seed layer of RuAI/NiAIB |
| US10/676,735 | 2003-09-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1604200A CN1604200A (zh) | 2005-04-06 |
| CN1322494C true CN1322494C (zh) | 2007-06-20 |
Family
ID=34218172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100824667A Expired - Fee Related CN1322494C (zh) | 2003-09-30 | 2004-09-22 | 具有RuAl/NiAlB双晶种层的薄膜介质 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6863993B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2005108419A (cg-RX-API-DMAC7.html) |
| CN (1) | CN1322494C (cg-RX-API-DMAC7.html) |
| SG (1) | SG110172A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7651794B2 (en) * | 2005-04-28 | 2010-01-26 | Hitachi Global Storage Technologies Netherlands B.V. | Adhesion layer for thin film magnetic recording medium |
| US20070019328A1 (en) * | 2005-07-25 | 2007-01-25 | Mohammad Mirzamaani | Laminated magnetic recording media with two sublayers in the lower magnetic layer |
| US20080131735A1 (en) * | 2006-12-05 | 2008-06-05 | Heraeus Incorporated | Ni-X, Ni-Y, and Ni-X-Y alloys with or without oxides as sputter targets for perpendicular magnetic recording |
| US8941950B2 (en) | 2012-05-23 | 2015-01-27 | WD Media, LLC | Underlayers for heat assisted magnetic recording (HAMR) media |
| US9490054B2 (en) * | 2012-10-11 | 2016-11-08 | Headway Technologies, Inc. | Seed layer for multilayer magnetic materials |
| US9177585B1 (en) | 2013-10-23 | 2015-11-03 | WD Media, LLC | Magnetic media capable of improving magnetic properties and thermal management for heat-assisted magnetic recording |
| US11398247B1 (en) | 2021-06-21 | 2022-07-26 | Western Digital Technologies, Inc. | Magnetic recording media with oxidized pre-seed layer |
| US11810605B2 (en) | 2021-09-29 | 2023-11-07 | Western Digital Technologies, Inc. | Magnetic recording media with tungsten pre-seed layer |
| US11990163B2 (en) * | 2022-06-30 | 2024-05-21 | Western Digital Technologies, Inc. | Multilayer structures for magnetic recording devices to facilitate targeted magnetic switching and low coercivity |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6143388A (en) * | 1997-11-24 | 2000-11-07 | International Business Machines Corporation | Thin film disk with onset layer |
| US6159625A (en) * | 1997-08-08 | 2000-12-12 | Hitachi Metals Ltd. | Target of intermetallic compound with B2-ordered lattice structure, production method thereof and magnetic recording medium having B2-structured underlayer |
| CN1309386A (zh) * | 2000-02-09 | 2001-08-22 | 国际商业机器公司 | 带有预置籽晶层的非金属薄膜磁记录盘 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5800931A (en) * | 1994-09-29 | 1998-09-01 | Carnegie Mellon University | Magnetic recording medium with a MgO sputter deposited seed layer |
| US5789056A (en) * | 1997-01-30 | 1998-08-04 | International Business Machines Corporation | Thin film magnetic disk with chromium-titanium seed layer |
| US6753101B1 (en) * | 1999-06-08 | 2004-06-22 | Fujitsu Limited | Magnetic recording medium, magnetic storage apparatus, recording method and method of producing magnetic recording medium |
| US6740397B1 (en) * | 2000-05-24 | 2004-05-25 | Seagate Technology Llc | Subseedlayers for magnetic recording media |
| JP3577486B2 (ja) * | 2002-04-25 | 2004-10-13 | Hoya株式会社 | 磁気記録媒体及びその製造方法 |
-
2003
- 2003-09-30 US US10/676,735 patent/US6863993B1/en not_active Expired - Lifetime
-
2004
- 2004-09-22 CN CNB2004100824667A patent/CN1322494C/zh not_active Expired - Fee Related
- 2004-09-29 SG SG200405521A patent/SG110172A1/en unknown
- 2004-09-30 JP JP2004287707A patent/JP2005108419A/ja not_active Withdrawn
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6159625A (en) * | 1997-08-08 | 2000-12-12 | Hitachi Metals Ltd. | Target of intermetallic compound with B2-ordered lattice structure, production method thereof and magnetic recording medium having B2-structured underlayer |
| US6143388A (en) * | 1997-11-24 | 2000-11-07 | International Business Machines Corporation | Thin film disk with onset layer |
| CN1309386A (zh) * | 2000-02-09 | 2001-08-22 | 国际商业机器公司 | 带有预置籽晶层的非金属薄膜磁记录盘 |
| US6607842B2 (en) * | 2000-02-09 | 2003-08-19 | Hitachi Globel Storage Technologies Netherlands, B.V. | Containing an AITa or AITi pre-seed layer, a CoCr onset layer and a CoCrPtB magnetic layer |
Also Published As
| Publication number | Publication date |
|---|---|
| US6863993B1 (en) | 2005-03-08 |
| SG110172A1 (en) | 2005-04-28 |
| JP2005108419A (ja) | 2005-04-21 |
| US20050069730A1 (en) | 2005-03-31 |
| CN1604200A (zh) | 2005-04-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070620 Termination date: 20091022 |