CN1304782C - Chemical supply system and valve housing design thereof - Google Patents

Chemical supply system and valve housing design thereof Download PDF

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Publication number
CN1304782C
CN1304782C CNB2003101016028A CN200310101602A CN1304782C CN 1304782 C CN1304782 C CN 1304782C CN B2003101016028 A CNB2003101016028 A CN B2003101016028A CN 200310101602 A CN200310101602 A CN 200310101602A CN 1304782 C CN1304782 C CN 1304782C
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China
Prior art keywords
chemical
feeding mechanism
floor
supply system
chemical feeding
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CNB2003101016028A
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CN1609501A (en
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洪锡焜
徐乾智
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Macronix International Co Ltd
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Macronix International Co Ltd
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Abstract

The present invention relates to a chemical supply system and a valve housing design thereof. The chemical supply system comprises a first chemical supply device, a plurality of main pipelines and a second chemical supply device, wherein the first chemical supply device is arranged on a first floor, and a control unit is arranged in the first chemical supply device; the main pipelines are communicated with the first chemical supply device, and one of the main pipelines is used for distributing chemicals to the use end of the first floor; the second chemical supply device is arranged on a second floor; and one of the main pipelines is communicated to the second chemical supply device from the first chemical supply device in order to distribute chemicals to the use end of the second floor. The present invention uses the main pipelines to distribute chemical reagents or gases, and therefore, the present invention can solve the current limiting problem of the pipelines.

Description

The chemistry supply system
Technical field
The present invention relates to the design of a kind of chemical supply system (chemical supply system) and clack box (valve box) thereof, particularly relate to a kind of chemical supply system and clack box design thereof that is used for many merits formula (multi-function) of manufacturing works.
Background technique
Usually, intergrated circuit or semiconductor element all need to go through many fabrication steps and just are accomplished, and these fabrication steps nearly all need to use chemical reagent or gas carries out.Therefore generally in semiconductor factory, all can install chemical supply system, utilize elements such as the configuration of its pipeline and control device, with chemical reagent or gas delivery to each process work bench, and these process work bench be called using end (point of use, POU).
General in the factory of many floors, its chemical supply system is to comprise a chemical feeding mechanism that is arranged on the bottom floor, and the chemical feeding mechanism that is separately positioned on other floor, and all each has its control unit in the chemical feeding mechanism of each floor.By the control of the control unit in the chemical feeding mechanism of bottom floor, but distributing chemical reagent or gas are to the using end of bottom floor.The chemical feeding mechanism of other floor then can be by its control unit requires required chemical reagent of dispensing or gas from the chemical feeding mechanism of bottom floor, and then with chemical reagent or the gas delivery using end to the place floor.Particularly; the main line that has the known chemical feeding mechanism that is connected in the bottom floor now can be branched and be divided into a plurality of pipelines; give the using end of bottom floor and the chemical feeding mechanism of other floor with supply chemical reagent or gas; therefore when demand explodes, often have current limliting (flowlimitation) or situation about being unable to supply and take place.And because of the chemical feeding mechanism of each floor all each has its control unit, so the control system of each floor do not combine, so for the supply status of chemical reagent or gas in the whole factory and can't control easily.
In order to address the above problem, a kind of mode is in the extra installing of bottom floor one converting unit (transfer unit), several control units that wherein have the chemical feeding mechanism of controlling each floor respectively in this converting unit, see through the controlling of several control units of this converting unit inside, chemical reagent or gas can be distributed to the chemical feeding mechanism of each floor respectively, then the chemical feeding mechanism of each floor again with chemical reagent or gas delivery to its using end.
Though use the mode of converting unit can solve problems such as current limliting, buying of converting unit but has the defective that cost is significantly increased.
In addition, generally on the distributing chemical reagent or the pipeline of gas, all clack box be can be equiped with, the chemical reagent of using end or the flow of gas are delivered in order to control.Yet; above-mentioned chemical supply system is under long-term use; on pipeline, find to have the chemicals or the chemical smoke (chemicalfume) of oozing out through regular meeting; particularly near the pipeline the clack box, ooze out chemicals or chemical smoke through regular meeting; but so not only can influence the see-through of pipeline, but also may cause the filth of miscellaneous equipment element.
This shows that above-mentioned existing chemical supply system and clack box design thereof still have many defectives, and demand urgently further being improved.In order to solve the problem that the design of chemical supply system and clack box thereof exists, relevant manufacturer there's no one who doesn't or isn't seeks solution painstakingly, but do not see always that for a long time suitable design finished by development, and common product does not have appropriate structure to address the above problem, and this obviously is the problem that the anxious desire of relevant dealer solves.
Because the defective that above-mentioned existing chemical supply system and clack box design thereof exist, the inventor is based on being engaged in this type of product specification manufacturing abundant for many years practical experience and professional knowledge, actively studied innovation, in the hope of founding the design of a kind of novel chemical supply system and clack box thereof, can improve the design of general existing chemical supply system and clack box thereof, make it have more practicability.Through constantly research, design, and after studying sample and improvement repeatedly, create the present invention who has practical value finally.
Summary of the invention
The objective of the invention is to; overcome the defective that existing chemical supply system exists; and a kind of new chemical supply system is provided; technical problem to be solved is to make it can solve existing known chemical supply system when the using end of the different floors of supply; often have current limliting or the problem of being unable to supply; thereby be suitable for practicality more, and have the value on the industry.
Another object of the present invention is to, a kind of chemical supply system is provided, technical problem to be solved is to make it not need to increase the problem that just can solve the prior art existence under the condition of cost.
A further object of the present invention is, a kind of clack box design is provided, and technical problem to be solved is it can be solved on the pipeline ooze out chemical smoke through regular meeting, but and influences the problem of pipeline see-through.
The object of the invention to solve the technical problems realizes by the following technical solutions.A kind of chemical supply system according to the present invention's proposition, it is applicable to dispensing one chemicals a plurality of using ends of floor (point of use at the most, POU), this chemistry supply system comprises: one first chemical feeding mechanism, be configured in one first floor, wherein have a control unit in this first chemical feeding mechanism; A plurality of main lines, it is to be communicated with this first feeding mechanism, and wherein those main lines are to be used for providing and delivering the using end of these chemicals to this first floor; And one second chemical feeding mechanism, be configured in one second floor, and another those main lines are to be communicated to this second chemical feeding mechanism by this first chemical feeding mechanism, so that this chemicals can be delivered to this second chemical feeding mechanism, and then be distributed to the using end of this second floor by the control of this control unit.
The object of the invention to solve the technical problems also can be applied to the following technical measures to achieve further.
Aforesaid chemical supply system comprises more in the wherein said first chemical feeding mechanism that design has a plurality of spare interfaces (port), in order to additionally to install main line additional.
Aforesaid chemical supply system, it more comprises a plurality of clack boxes (valvc box), be configured between the using end of this first chemical feeding mechanism and this first floor, and between the using end of this second chemical feeding mechanism and this second floor, wherein each those clack box comprises: a clack box main body, this clack box main body is and corresponding this chemistry feeding mechanism is communicated with, and is communicated with corresponding those using ends; One tapping equipment, it is communicated with this clack box main body, in order to give off the pollutant in the pipeline; And a washing unit, it is to be communicated with this clack box main body, cleans thing to purify pipeline in order to feed.
Aforesaid chemical supply system, wherein said washing unit comprises an air cleaning device, in order to bubbling air to purify pipeline.
Aforesaid chemical supply system, it more comprises at least one chemical feeding mechanism, be configured in each above floor of this second floor respectively, wherein each those chemical feeding mechanism all is communicated with this first chemical feeding mechanism with the main line that separates respectively, and by this control unit from this first chemical feeding mechanism provide and deliver these chemicals to each those chemical feeding mechanisms, and then the using end of these chemicals of providing and delivering to each floor.
Aforesaid chemical supply system, wherein said chemicals be selected from a chemical reagent and a gas one of them.
The object of the invention to solve the technical problems also adopts following technological scheme to realize.The design of a kind of clack box that proposes according to the present invention, it is that this clack box comprises on the pipeline that is installed between a feed end and a plurality of using end: a clack box main body, this clack box main body is to be communicated with this feed end and to be communicated with those using ends by this pipeline; One tapping equipment, it is to be communicated with this clack box main body, in order to give off the pollutant in the pipeline; And a washing unit, it is to be communicated with this clack box main body, cleans thing to purify pipeline in order to feed.
The object of the invention to solve the technical problems also can adopt following technical measures further to realize.The design of aforesaid clack box, wherein said washing unit comprises an air cleaning device, in order to bubbling air to purify pipeline.
The present invention compared with prior art has tangible advantage and beneficial effect.By above technological scheme as can be known, in order to reach aforementioned goal of the invention, major technique of the present invention thes contents are as follows:
The present invention proposes a kind of chemical supply system, it is applicable to dispensing chemicals a plurality of using ends of floor at the most, these chemicals for example are chemical reagent or gas, and should the chemistry supply system be to comprise one first chemical feeding mechanism, several main lines and one second chemical feeding mechanism.Wherein, the first chemical feeding mechanism is to be configured in one first floor, and has a control unit in the first chemical feeding mechanism.Several main lines are to be communicated with the first chemical feeding mechanism, and wherein a main line is to be used for providing and delivering the using end of chemicals to the first floor.And the second chemical feeding mechanism is to be configured in one second floor, and another main line is to be communicated to the second chemical feeding mechanism by the first chemical feeding mechanism, so that chemicals can be delivered to the second chemical feeding mechanism, and then be distributed to the using end of second floor by the control of the control unit in the first chemical supply system.
The present invention proposes a kind of design of clack box again, and it is installed on the pipeline between a feed end and several using ends, and this clack box comprises a clack box main body, a tapping equipment and a washing unit.Wherein, the clack box main body is to be communicated with feed end by pipeline and to be communicated with several using ends.In addition, tapping equipment is to be communicated with the clack box main body, and in order to giving off the pollutant in pipeline and the clack box main body, and washing unit is to be communicated with the clack box main body, cleans thing to purify pipeline and clack box main body in order to feed.
Because chemical supply system of the present invention is to use a plurality of main lines and the chemical feeding mechanism of each floor always is connected with the chemical feeding mechanism of bottom floor, therefore can solve when use amount explodes, pipeline current limliting or the problem of being unable to supply can take place.
The present invention is owing to only be provided with control unit in the chemical feeding mechanism of bottom floor, supply with the chemical feeding mechanism of controlling all floors, therefore the present invention integrates the control system of all chemical feeding mechanisms, can be easy to control the chemical reagent in the factory and the supply status of gas.
Therefore the present invention can make the chemical smoke of oozing out pipeline be discharged from or wash owing to be provided with discharger and washing unit at clack box, but and then can recover the see-through of pipeline.
Via as can be known above-mentioned, by technique scheme, the present invention has following advantage at least:
1, chemical supply system of the present invention can solve when use amount explodes, and pipeline current limliting or the problem of being unable to supply can take place.
2, the present invention integrates the control system of all chemical feeding mechanisms, can be easy to control the chemical reagent in the factory and the supply status of gas.
3, the present invention has discharger and washing unit in clack box design, and can make the chemical smoke of oozing out pipeline be discharged from or wash, but and then can recover the see-through of pipeline.
In sum, the chemical supply system of special construction of the present invention and clack box design thereof can solve existing known chemical supply system when the using end of the different floors of supply, often have current limliting or the problem of being unable to supply, thereby be suitable for practicality more, and have the value on the industry; It just can solve the problem that prior art exists not needing to increase under condition of cost, and can solve on the pipeline and ooze out chemical smoke through regular meeting, but and influences the problem of pipeline see-through.It has above-mentioned many advantages and use value, and in like product, do not see have the similar structure design to publish or use and really genus innovation, no matter it structurally or bigger improvement all arranged on the function, have technically than much progress, and produced handy and practical effect, and the design of more existing chemical supply system and clack box thereof has the multinomial effect of enhancement, thus be suitable for practicality more, and have the extensive value of industry, really be a new and innovative, progressive, practical new design.
Above-mentioned explanation only is the general introduction of technical solution of the present invention, for can clearer understanding technological means of the present invention, and can be implemented according to the content of specification, below with preferred embodiment of the present invention and conjunction with figs. describe in detail as after.
Description of drawings
Fig. 1 is the schematic representation according to the chemical supply system of a preferred embodiment of the present invention.
Fig. 2 is the schematic representation according to the design of the clack box of the present invention's one preferred embodiments.
100,200,300: chemical feeding mechanism 102: control unit
104,204,304; Clack box 106a, 106b: using end
110a, 110b, 110c: main line 112; Spare interface
206a, 206b: using end 306a, 306b: using end
406a, 406b: using end 400: feed end
402: pipeline 404: the clack box main body
408: discharger 410: washing unit
Embodiment
Below in conjunction with accompanying drawing and preferred embodiment, chemical supply system and clack box thereof that foundation the present invention is proposed design its embodiment, structure, feature and effect thereof, describe in detail as after.
In order to solve the situation that the chemical supply system that is used for many floors in the prior art current limliting takes place or be unable to supply through regular meeting; therefore the present invention proposes a kind of chemical supply system of new structure; it is to use a plurality of main lines to provide and deliver chemicals to different floors; wherein these chemicals for example are chemical reagent or gas; main line is branched off into a plurality of pipelines with supply chemical reagent or gas during, the problem that current limliting takes place or be unable to supply through regular meeting to solve in the prior art to different floor.
Seeing also shown in Figure 1ly, is the schematic representation according to the chemical supply system of a preferred embodiment of the present invention.Chemical supply system of the present invention, be to be applicable to dispensing chemicals a plurality of using ends of floor (point of use at the most, POU), wherein, these chemicals for example are chemical reagent or gas, and these using ends comprise using end 106a, the 106b that is configured in first floor, are configured in using end 206a, the 206b of second floor, or even using end 306a, the 306b of other floor.If chemical supply system of the present invention is to be applied in the semiconductor factory, then above-mentioned using end for example is process work bench such as etching machine or deposition machine.
Chemical supply system proposed by the invention is to comprise chemical feeding mechanism 100, the chemical feeding mechanism 200 that is configured in second floor that is configured in first floor, the chemical feeding mechanism 300 that is configured in other floor (for example being the N floor) and several main lines 110a, 110b, 110c.In addition, chemical supply system of the present invention more is included on the pipeline of each floor and disposes clack box 104,204,304.
Wherein, be configured in the chemical feeding mechanism 100 of first floor and have a control unit 102, this control unit system is used for controlling the supply of the chemical reagent or the gas of all floors in the factory.And in chemical feeding mechanism 100, comprised existing known device unit commonly used such as presser unit (pump).And several main lines 110a, 110b, 110c are communicated with chemical feeding mechanism 100, wherein this main line 110a is used for distributing chemical reagent or using end 106a, the 106b of gas to the first floor, and on the main line 110a between chemical feeding mechanism 100 and using end 106a, the 106b, more comprise and dispose clack box 104, in order to control chemical reagent or gas delivery supply to each using end 106a, 106b.
And another main line 110b is connected between the chemical feeding mechanism 200 of the chemical feeding mechanism 100 and second floor, control by control unit 102, chemical reagent or gas can be distributed to the chemical feeding mechanism 200 of second floor through main line 110b from chemical feeding mechanism 100, just carry the chemical reagent or the using end 206a of gas to the second floor afterwards by chemical feeding mechanism 200,206b, same, at chemical feeding mechanism 200 and using end 206a, more comprise on the pipeline between the 206b and dispose a clack box 204, in order to control chemical reagent or gas delivery to each using end 206a, the supply of 206b.Certainly, also comprise existing known device unit commonly used such as presser unit in the chemical feeding mechanism 200.
Therefore; the present invention since in chemical feeding mechanism 100 just with the main line 110a, 110b distributing chemical reagent or gas to the first floor that separate and using end 106a, 106b, 206a, the 206b of second floor; therefore can solve in the prior art and main line to be branched off into several pipelines and during to each floor, current limliting or the situation of being unable to supply to take place through regular meeting with distributing chemical reagent or gas.And, the present invention combines the control system of the chemical feeding mechanism of each floor, control the chemical reagent of each floor or the supply status of gas by single control unit 102, and can make the supply status of chemical reagent in the whole factory or gas be easy to control.
If when chemical supply system of the present invention is the factory that is applied in more than two floors, then on the chemical feeding mechanism 100 of first floor, more be connected with another main line 110c, in order to be communicated with the chemical feeding mechanism 300 of N floor.Same, control by control unit 102, chemical reagent or gas can be distributed to via main line 110c the chemical feeding mechanism 300 of N floor from chemical feeding mechanism 100, just carry chemical reagent or using end 306a, the 306b of gas to the N floor by chemical feeding mechanism 300 afterwards.And, on the pipeline between chemical feeding mechanism 300 and using end 306a, the 306b, also comprise and dispose a clack box 304, in order to control chemical reagent or gas delivery supply to each using end 306a, 306b.Certainly, also comprise existing known device unit commonly used such as presser unit in the chemical feeding mechanism 300.
What is particularly worth mentioning is that, on chemical feeding mechanism 100, more comprise and dispose several spare interfaces 112, it provides extra main line interface, with in response to can additionally install main line additional when a certain floor chemical reagent or gas use amount increase, to satisfy the demand of this floor.Certainly, this spare interface 112 can also be reserved in factory and increase when building floor, can offer to be supplied to the main line that is connected to other floor to use.
In addition, in chemical supply system of the present invention, all can dispose clack box (as Fig. 1 indicated 104,204,206) on the chemical feeding mechanism of each floor and the pipeline between the using end, be distributed to the amount of the chemical reagent or the gas of each using end in order to control.Because chemical supply system is under long-term use; on pipeline, find to have the chemicals or the chemical smoke (chemicalfume) of oozing out through regular meeting; particularly near the pipeline the clack box, ooze out chemicals or chemical smoke through regular meeting; but it not only can influence the see-through of pipeline, but also may cause the filth of miscellaneous equipment element.Therefore the present invention proposes a kind of design of clack box again especially, to solve the above problems.
See also shown in Figure 2, clack box of the present invention is on the pipeline 402 that is installed between a feed end 400 and several using ends 406a, the 406b, at this feed end 400 for example is the chemical feeding mechanism 100,200 or 300 of Fig. 1, and using end 406a, 406b for example are each process work bench.This clack box comprises a clack box main body 404, a tapping equipment 408 and a washing unit 410.Wherein clack box main body 404 is to be communicated with and to be communicated with using end 406a, 406b with feed end 400 by pipeline 402.And tapping equipment 408 is to be communicated with the clack box main body, in order to give off the pollutant in clack box main body 404 and the pipeline 402.And washing unit 410 is to be communicated with clack box main body 404, cleans thing with purge valve box main body 404 and pipeline 402 in order to feed, and the cleaning thing that feeds also can give off from tapping equipment 408 certainly.In a preferred embodiment, washing unit 410 for example is that an air cleans (air purge) device, by feeding clean air to clack box main body 404 and pipeline 402, the chemicals or the chemical smoke of oozing out with removing, but and then improve the see-through of pipeline and avoid the equipment component filth.
The design of above-mentioned clack box and non-limiting can only be in chemical supply system of the present invention the supply system or the delivery system of other kind, as long as can use the system of clack box, all can use clack box of the present invention.
The above, it only is preferred embodiment of the present invention, be not that the present invention is done any pro forma restriction, though the present invention discloses as above with preferred embodiment, yet be not in order to limit the present invention, any those skilled in the art, in not breaking away from the technical solution of the present invention scope, when the technology contents that can utilize above-mentioned announcement is made a little change or is modified to the equivalent embodiment of equivalent variations, in every case be the content that does not break away from technical solution of the present invention, according to technical spirit of the present invention to any simple modification that above embodiment did, equivalent variations and modification all still belong in the scope of technical solution of the present invention.

Claims (6)

1, a kind of chemical supply system, it is to be applicable to dispensing one chemicals a plurality of using ends of floor at the most, it is characterized in that this chemistry supply system comprises:
One first chemical feeding mechanism is configured in one first floor, wherein has a control unit in this first chemical feeding mechanism;
A plurality of main lines, it is to be communicated with this first feeding mechanism, and those main lines one of them be to be used for providing and delivering the using end of these chemicals to this first floor; And
One second chemical feeding mechanism, be configured in one second floor, and another those main lines are to be communicated to this second chemical feeding mechanism by this first chemical feeding mechanism, so that this chemicals can be delivered to this second chemical feeding mechanism, and then be distributed to the using end of this second floor by the control of this control unit.
2, chemical supply system according to claim 1 is characterized in that more comprising in the wherein said first chemical feeding mechanism that design has a plurality of spare interfaces, in order to additionally to install main line additional.
3, chemical supply system according to claim 1, it is characterized in that it more comprises a plurality of clack boxes, be configured between the using end of this first chemical feeding mechanism and this first floor, and between the using end of this second chemical feeding mechanism and this second floor, wherein each those clack box comprises:
One clack box main body, this clack box main body are and corresponding this chemistry feeding mechanism is communicated with, and are communicated with corresponding those using ends;
One tapping equipment, it is to be communicated with this clack box main body, in order to give off the pollutant in the pipeline; And
One washing unit, it is to be communicated with this clack box main body, cleans thing to purify pipeline in order to feed.
4, chemical supply system according to claim 3 is characterized in that wherein said washing unit comprises an air cleaning device, in order to bubbling air to purify pipeline.
5, chemical supply system according to claim 1, it is characterized in that it more comprises at least one chemical feeding mechanism, be configured in each above floor of this second floor respectively, wherein each those chemical feeding mechanism all is communicated with this first chemical feeding mechanism with the main line that separates respectively, and by this control unit from this first chemical feeding mechanism provide and deliver these chemicals to each those chemical feeding mechanisms, and then the using end of these chemicals of providing and delivering to each floor.
6, chemical supply system according to claim 1, it is characterized in that wherein said chemicals be selected from group that a chemical reagent and a gas forms one of them.
CNB2003101016028A 2003-10-21 2003-10-21 Chemical supply system and valve housing design thereof Expired - Fee Related CN1304782C (en)

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Application Number Priority Date Filing Date Title
CNB2003101016028A CN1304782C (en) 2003-10-21 2003-10-21 Chemical supply system and valve housing design thereof

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Application Number Priority Date Filing Date Title
CNB2003101016028A CN1304782C (en) 2003-10-21 2003-10-21 Chemical supply system and valve housing design thereof

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CN1304782C true CN1304782C (en) 2007-03-14

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112283582B (en) * 2020-10-23 2021-12-21 长江存储科技有限责任公司 Valve box and reactant supply system

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN86203297U (en) * 1986-05-17 1987-03-11 姜桂英 Combined slurry pump
US5441070A (en) * 1993-11-10 1995-08-15 Thompson; Gary E. Fluid management system
JPH1183659A (en) * 1997-09-10 1999-03-26 Sanko Jido Kiki Kk Method for adjusting differential pressure transmitter and three-way valve therefor
CN2415241Y (en) * 2000-04-13 2001-01-17 王洪生 Automatic controller of pipeline medium
US6568426B1 (en) * 1998-06-04 2003-05-27 Gee Group Ltd Pressurized water supply systems

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN86203297U (en) * 1986-05-17 1987-03-11 姜桂英 Combined slurry pump
US5441070A (en) * 1993-11-10 1995-08-15 Thompson; Gary E. Fluid management system
JPH1183659A (en) * 1997-09-10 1999-03-26 Sanko Jido Kiki Kk Method for adjusting differential pressure transmitter and three-way valve therefor
US6568426B1 (en) * 1998-06-04 2003-05-27 Gee Group Ltd Pressurized water supply systems
CN2415241Y (en) * 2000-04-13 2001-01-17 王洪生 Automatic controller of pipeline medium

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