CN1296211C - 流体喷射装置 - Google Patents
流体喷射装置 Download PDFInfo
- Publication number
- CN1296211C CN1296211C CNB031584977A CN03158497A CN1296211C CN 1296211 C CN1296211 C CN 1296211C CN B031584977 A CNB031584977 A CN B031584977A CN 03158497 A CN03158497 A CN 03158497A CN 1296211 C CN1296211 C CN 1296211C
- Authority
- CN
- China
- Prior art keywords
- temperature
- ink
- fluid
- ejection apparatus
- fluid ejection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000012530 fluid Substances 0.000 title claims abstract description 41
- 238000005507 spraying Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 claims abstract description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 238000005530 etching Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 5
- 230000004069 differentiation Effects 0.000 claims 1
- 238000007639 printing Methods 0.000 abstract description 6
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 239000007921 spray Substances 0.000 description 24
- 230000000694 effects Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000008859 change Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- -1 boron ion Chemical class 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 229920005591 polysilicon Polymers 0.000 description 5
- 238000013461 design Methods 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910018594 Si-Cu Inorganic materials 0.000 description 2
- 229910008465 Si—Cu Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- VGRFVJMYCCLWPQ-UHFFFAOYSA-N germanium Chemical compound [Ge].[Ge] VGRFVJMYCCLWPQ-UHFFFAOYSA-N 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000011089 mechanical engineering Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- SBEQWOXEGHQIMW-UHFFFAOYSA-N silicon Chemical compound [Si].[Si] SBEQWOXEGHQIMW-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Landscapes
- Ink Jet (AREA)
Abstract
Description
Claims (15)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB031584977A CN1296211C (zh) | 2001-03-27 | 2001-03-27 | 流体喷射装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB031584977A CN1296211C (zh) | 2001-03-27 | 2001-03-27 | 流体喷射装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB011120347A Division CN1159571C (zh) | 2001-03-27 | 2001-03-27 | 压阻式温度感测器 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1593923A CN1593923A (zh) | 2005-03-16 |
CN1296211C true CN1296211C (zh) | 2007-01-24 |
Family
ID=34660477
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB031584977A Expired - Fee Related CN1296211C (zh) | 2001-03-27 | 2001-03-27 | 流体喷射装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN1296211C (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI715755B (zh) * | 2016-05-02 | 2021-01-11 | 愛爾蘭商滿捷特科技公司 | 用於高速列印之單色噴墨列印頭 |
JP6965017B2 (ja) * | 2016-05-30 | 2021-11-10 | キヤノン株式会社 | 記録素子基板および記録装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5208611A (en) * | 1988-12-14 | 1993-05-04 | Mannesmann Aktiengesellschaft | Arrangement for heating the ink in the write head of an ink-jet printer |
JPH09131896A (ja) * | 1995-11-10 | 1997-05-20 | Brother Ind Ltd | インクジェット式記録装置 |
US6102530A (en) * | 1998-01-23 | 2000-08-15 | Kim; Chang-Jin | Apparatus and method for using bubble as virtual valve in microinjector to eject fluid |
-
2001
- 2001-03-27 CN CNB031584977A patent/CN1296211C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5208611A (en) * | 1988-12-14 | 1993-05-04 | Mannesmann Aktiengesellschaft | Arrangement for heating the ink in the write head of an ink-jet printer |
JPH09131896A (ja) * | 1995-11-10 | 1997-05-20 | Brother Ind Ltd | インクジェット式記録装置 |
US6102530A (en) * | 1998-01-23 | 2000-08-15 | Kim; Chang-Jin | Apparatus and method for using bubble as virtual valve in microinjector to eject fluid |
Also Published As
Publication number | Publication date |
---|---|
CN1593923A (zh) | 2005-03-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: BENQ CORP. Free format text: FORMER OWNER: QISDA CORPORATION Effective date: 20121213 |
|
C41 | Transfer of patent application or patent right or utility model | ||
C56 | Change in the name or address of the patentee |
Owner name: QISDA CORPORATION Free format text: FORMER NAME: BENQ CORP. |
|
CP01 | Change in the name or title of a patent holder |
Address after: China Taiwan Taoyuan County Patentee after: Qisda Corp. Address before: China Taiwan Taoyuan County Patentee before: Benq Corp. |
|
TR01 | Transfer of patent right |
Effective date of registration: 20121213 Address after: Taipei City, Taiwan, China Patentee after: BENQ Corp. Address before: China Taiwan Taoyuan County Patentee before: Qisda Corp. |
|
ASS | Succession or assignment of patent right |
Owner name: JIGUO HOLDING CO., LTD. Free format text: FORMER OWNER: BENQ CORP. Effective date: 20130123 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20130123 Address after: Delaware Patentee after: Kyrgyzstan Holdings Ltd. Address before: Taipei City, Taiwan, China Patentee before: Benq Corp. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070124 Termination date: 20160327 |