CN1273560C - Semiconductive ceramic thick film heating material - Google Patents

Semiconductive ceramic thick film heating material Download PDF

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Publication number
CN1273560C
CN1273560C CN 03125351 CN03125351A CN1273560C CN 1273560 C CN1273560 C CN 1273560C CN 03125351 CN03125351 CN 03125351 CN 03125351 A CN03125351 A CN 03125351A CN 1273560 C CN1273560 C CN 1273560C
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oxide
function
phase
thick film
mutually
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CN 03125351
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CN1490376A (en
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王培英
白铁城
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Xiamen Kangmeida Technology Co Ltd
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Abstract

The present invention relates to a semiconductive ceramic thick film heating material. A function phase and an adhesion phase are mixed according to proportion, thick film ink is formed by adding organic carriers, in this way, an electric heating exothermic material is made, and a thick film resistor is sintered at high temperature after spreading the electric heating exothermic material on a basal body. The function phase comprises one or more simple substance elements in germanium, silicon and carbon and various kinds of oxide such as copper oxide, zinc oxide, magnesia, alumina, silicon oxide, boron oxide, ytterbium oxide, lanthanum oxide and bismuth oxide, and the content ratio according to weight is (0 to 4.5) %; an electric resistance property modifier of the function phase is made of copper oxide and rare earth oxide such as ytterbium oxide and lanthanum oxide. A thermostability modifier of the function phase is made of alumina, boron oxide, bismuth oxide, silicon oxide, magnesium oxide, zinc oxide, cordierite and boltonite, the cordierite and boltonite are made of silicon oxide, alumina and magnesium oxide, and the content ratio according to weight is (30 to 48) %. The function phase material: the adhesion phase =70 to 50%: 30 to 50%; solid phase materials: the organic carriers =24 to 88%: 76 to 12%.

Description

Semiconductor thick film exothermic material
Technical field
Thick-film electronic material and electric-heating technology field under the present invention.
Technical background
Thick-film electronic material and technology are widely used in the prior art, are mainly used in Thick ﹠ Thin Film Integrated Circuit technology and the electronics chip components and parts technology.These thick-film materials mainly are used as conductor and resistance, appearance element, carry out information processing, do not have electric heating function.Electric-heating technology is with a long history, the Heating element that uses on the fields such as household electrical appliance and worker, farming, doctor, scientific research is nichrome wire or electrothermal tube mostly for a long time, traditional resistance wire has heating efficiency low, and the life-span is short, can not be in shortcomings such as work under the low voltage (as 12V).The Heating element of the replacement electrothermal tube that grows up the seventies has the PTC ceramic plate and is the coating Electric radiant Heating Film of base based on the film-type Electric radiant Heating Film of stannic oxide and with carbon.They use power-frequency voltage, and heating temp is no more than 300 ℃.Can partly replace electrothermal tube, be applied to electric chafing dish, electric cooker is on about 200~300 ℃ product of heating temps such as warm-air drier.But above-mentioned materials exists heating temp lower, and (as the PTC ceramic plate) that have has Lead contamination, and shortcoming such as can not work under no-load condition has limited their application.Shortcomings such as the oxide compound thick film exothermic material that RECENT DEVELOPMENTS is got up also has the performance wild effect, and when surface temperature surpassed 600 ℃, power attenuation was fast, and the resistance of material side is big.
Summary of the invention
The present invention can reach 800 ℃ for the heating temp maximum, and high-temperature stability is good; Side resistance is less, can depress the semiconductor thick film exothermic material of use in safety voltage such as 12V, 24V, 36V or 110V, 220V, 380V alternating current-direct current.
The said semiconductor thick film of the present invention exothermic material adopts thick-film electronic material and technology, manufactures the exothermic material with electric heating function.With function phase (containing properties-correcting agent), bonding mutually by the suitable proportion mixing, add organic carrier and form thick film ink, by silk screen printing or impregnation technology, slurry is coated on the matrixes such as alumina ceramics or chemical porcelain, behind high temperature sintering, form and have from limitting temperature function, nontoxic semiconductor resistor-type thick film Heating element.
The function of semiconductor thick film ink is by one or more simple substance elements and multiple oxide compound in germanium (Ge), silicon (Si), the carbon (C): cupric oxide (CuO), zinc oxide (ZnO), magnesium oxide (MgO), aluminum oxide (Al 2O 3), silicon oxide (SiO 2), boron oxide (B 2O 3), yttrium oxide (Y 2O 3), lanthanum trioxide (La 2O 3), bismuth oxide (Bi 2O 3) form;
Wherein just to hinder characteristic properties-correcting agent mutually be cupric oxide (CuO) and rare earth oxide to function: yttrium oxide (Y 2O 3), lanthanum trioxide (La 2O 3) form.
The middle mutually thermostability properties-correcting agent of function is by aluminum oxide (Al 2O 3), boron oxide (B 2O 3), bismuth oxide (Bi 2O 3), silicon oxide (SiO 2), magnesium oxide (MgO), zinc oxide (ZnO) and by silicon oxide (SiO 2), aluminum oxide (Al 2O 3), the trichroite (2MgO2Al that makes of magnesium oxide (MgO) 2O 35SiO 2), forsterite (2MgOSiO 2) form.
Bonding glass powder by the ordinary method preparation.They are made up of silicon (Si), aluminium (Al), boron (B), zinc (Zn), magnesium (Mg), calcium (Ca), potassium (K), sodium lead-free oxide compounds such as (Na).
The said organic carrier of the present invention can be following ingredients: Viscotrol C, butylcarbitol, butyl carbitol amyl acetate, dibutyl phthalate (DBP), trolamine, Terpineol 350, ethanol, propyl carbinol, ethyl cellulose, Yelkin TTS.
The content of the middle mutually side's resistance of function characteristic properties-correcting agent is (0~4.5) % by weight;
The function content of middle thermostability properties-correcting agent mutually is (30~48) % by weight;
Function phase material and bonding weight ratio mutually, proportioning is: the function phase material: bonding phase=(70~50) %: (30~50) %;
Solid phase material (function phase+bonding phase) with the weight ratio of organic carrier is: solid mutually: organic carrier=(24~88) %: (76~12) %.
The present invention has following effect:
(1) heating temp is from room temperature to 800 degree centigrade;
(2) the side resistance of thick-film material is from 2 Europe/sides (Ω/ )~500 kilo-ohm/square (K Ω/);
(3) low-resistance material can use low-work voltage (12V, 24V, 36V), highly resistant material use power-frequency voltage (110V, 220V) etc.
(4) not leaded and other toxic substance of starting material, non-environmental-pollution.
(5) this material has high infrared energy and high electricity-thermal radiation efficiency of conversion;
(6) satisfy the demand for heat (as noninductive electric iron) of noninductive occasion;
(7) life-span is long;
(8) film and matrix bond are very firm, cold-resistant thermal shocking good (from room temperature to 700 degree centigrade cold cycling repeatedly, rete do not have burst and obscission).
Embodiment
Function phase (semiconductor thick film ink) integral part 10 examples (weight percent):
Numbering 1 2 3 4 5 6 7 8 9 10
Si 45 50 55 40 60 50 67
SiO 2 17 10 20 15 15 20 20 16 30 11
Ge 50 51 57
C 10 15 10 14
La 2O 3 0.5 1.0 1.0
Y 2O 3 1.0 1.0 3.0 1.5
Bi 2O 3 1.0 1.0
ZnO 2.0 10 1.7 1.0 2.0 2.0 1.0
Al 2O 3 15 15 5.0 25 20 20 10 15 10 9.0
CuO 3.0 1.0 4.5 3.2 1.5
B 2O 3 3.5 3.0 2.2 4.0 4.0 3.5 4.3 4.0 7.0
MgO 7.0 3.0 1.8 3.0 4.3 3.0 2.0 1.5 1.0 2.0
Bonding phase (conventional lead-free glass powder) 5 examples (weight percent):
Numbering SiO 2 Al 2O 3 B 2O 3 ZnO MgO CaO Na 2O K 2O
1 73 1.6 3.7 5.4 16.3
2 67 2.0 22 6.5 6.5
3 60 15 20 5.0
4. 55 17 15 4.5 3.5 5.0
5 50 21.7 11.5 8.3 8.5
Composition 9 examples (weight percent) of organic carrier:
Numbering 1 2 3 4 5 6 7 8 9
Viscotrol C 8 8 7 8 8 8 1.5 1.4
Terpineol 350 93 73 61 69 68 64 65.5 4.9 4.2
Butylcarbitol 15 10 10 16 20
Propyl carbinol 10 10 10 5 10
The butyl carbitol amyl acetate 3 3 3
Ethyl cellulose 4 4 3 4 4 4 2 2.1 3
Yelkin TTS 0.5 0.5 0.4
Dibutyl phthalate (DBP) 1 3 1.0
Ethanol 90 81
Trolamine 2 2 1
Sintering temperature: 1200~1350 degrees centigrade;
Body material is: alumina ceramics or chemical porcelain, base shape can be flat board or tubulose;
Its side's resistive scope be 2 Europe/sides (Ω/ )~500 kilo-ohm/side (and K Ω/), as required, apply rated operational voltage after, from tens to 800 degrees centigrade of heating temps.

Claims (4)

1, a kind of semiconductor thick film exothermic material is characterized in that, with the function phase, bondingly be mixed in proportion mutually, add organic carrier and form thick film ink, manufacture exothermic material, it is coated on the matrix, behind high temperature sintering, form thick-film resistor with electric heating function; Said function is by germanium Ge, silicon Si, carbon C simple substance element and cupric oxide CuO, zinc oxide ZnO, magnesium oxide MgO, aluminium oxide Al 2O 3, silicon oxide sio 2, boron oxide B 2O 3, yttrium oxide Y 2O 3, lanthanum trioxide La 2O 3, bismuth oxide Bi 2O 3Form;
Wherein the square mutually positive characteristic properties-correcting agent of function is cupric oxide CuO and rare earth oxide: yttrium oxide Y 2O 3, lanthanum trioxide La 2O 3Form;
The middle mutually thermostability properties-correcting agent of function is by aluminium oxide Al 2O 3, boron oxide B 2O 3, bismuth oxide Bi 2O 3, silicon oxide sio 2, magnesium oxide MgO, zinc oxide ZnO and by silicon oxide sio 2, aluminium oxide Al 2O 3, the trichroite made of magnesium oxide MgO, forsterite form;
The content of the middle mutually side's resistance of function characteristic properties-correcting agent is 0~43% by weight;
The function content of middle thermostability properties-correcting agent mutually is 30~48% by weight;
Function phase material and bonding weight ratio mutually, proportioning is:
Function phase material: bonding phase=70~50%: 30~50%;
The solid phase material---" function phase+bonding phase " with the weight ratio of organic carrier is: solid mutually: organic carrier=24~88%: 76~12%.
According to the said semiconductor thick film of claim 1 exothermic material, it is characterized in that 2, sintering temperature is 1200~1350 degrees centigrade.
According to the said semiconductor thick film of claim 1 exothermic material, it is characterized in that 3, said body material can be alumina ceramics, also can be chemical porcelain; Said base shape can be flat board also can be tubulose.
According to the said semiconductor thick film of claim 1 exothermic material, it is characterized in that 4, its side's resistive scope of said exothermic material is 2 Ou Fang (Ω/ )~500 kilo-ohm/side (K Ω/).
CN 03125351 2003-09-01 2003-09-01 Semiconductive ceramic thick film heating material Expired - Fee Related CN1273560C (en)

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CN1273560C true CN1273560C (en) 2006-09-06

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1714577A2 (en) 2005-04-18 2006-10-25 Hexagear Industries Limited Hot air blower with ceramic heating element
CN102269086A (en) * 2011-07-01 2011-12-07 南京航空航天大学 Heavy oil engine cold-starting preheating device and method
CN109734480A (en) * 2019-02-27 2019-05-10 常州联德陶业有限公司 A kind of aluminium nitride ceramics heater cofiring high temperature exothermic slurry and preparation method thereof

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100386829C (en) 2004-07-28 2008-05-07 王克政 PTC thick film curc uit controllable electric heating element
CN1937856B (en) * 2006-07-28 2010-12-15 王克政 Rare earth basic-metal resistance size for metal base board based rare earth thick film circuit and its preparing process
CN101148577B (en) * 2007-10-18 2010-05-19 昆明理工大学 Aluminum/aluminum oxide base composite phase transition thermal storage material
CN103992097B (en) * 2014-05-30 2015-09-09 天津唯元科技发展有限公司 A kind of rare earth full spectrum thermal power transfer ceramic suspension liquid and its preparation method and application method
CN105472791A (en) * 2015-12-23 2016-04-06 东莞珂洛赫慕电子材料科技有限公司 Rare earth-doped semiconductor infrared radiation thick-film electronic paste and preparation method therefor
CN107446408A (en) * 2017-07-18 2017-12-08 德阳烯碳科技有限公司 PTC graphenes heating ink and preparation method thereof and its heating film prepared
CN108538445A (en) * 2018-04-18 2018-09-14 湖南省国银新材料有限公司 A kind of semiconductor slurry and preparation method thereof
CN111246601B (en) * 2018-11-29 2023-04-25 湖北中烟工业有限责任公司 Novel ceramic heating element composition, and preparation and application of heating element thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1714577A2 (en) 2005-04-18 2006-10-25 Hexagear Industries Limited Hot air blower with ceramic heating element
CN102269086A (en) * 2011-07-01 2011-12-07 南京航空航天大学 Heavy oil engine cold-starting preheating device and method
CN109734480A (en) * 2019-02-27 2019-05-10 常州联德陶业有限公司 A kind of aluminium nitride ceramics heater cofiring high temperature exothermic slurry and preparation method thereof

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