CN120826501A - 坩埚、使用其的β型三氧化二镓单晶衬底的制造方法以及β型三氧化二镓单晶衬底 - Google Patents
坩埚、使用其的β型三氧化二镓单晶衬底的制造方法以及β型三氧化二镓单晶衬底Info
- Publication number
- CN120826501A CN120826501A CN202380095237.XA CN202380095237A CN120826501A CN 120826501 A CN120826501 A CN 120826501A CN 202380095237 A CN202380095237 A CN 202380095237A CN 120826501 A CN120826501 A CN 120826501A
- Authority
- CN
- China
- Prior art keywords
- single crystal
- crucible
- type
- film
- crystal substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/021100 WO2024252544A1 (ja) | 2023-06-07 | 2023-06-07 | 坩堝、それを用いたベータ型三酸化二ガリウム単結晶基板の製造方法、およびベータ型三酸化二ガリウム単結晶基板 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN120826501A true CN120826501A (zh) | 2025-10-21 |
Family
ID=93795545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202380095237.XA Pending CN120826501A (zh) | 2023-06-07 | 2023-06-07 | 坩埚、使用其的β型三氧化二镓单晶衬底的制造方法以及β型三氧化二镓单晶衬底 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2024252544A1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN120826501A (cg-RX-API-DMAC7.html) |
| TW (1) | TW202507090A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2024252544A1 (cg-RX-API-DMAC7.html) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH042687A (ja) * | 1990-04-18 | 1992-01-07 | Fujikura Ltd | 酸化物単結晶育成用るつぼ |
| JP3639147B2 (ja) * | 1999-06-02 | 2005-04-20 | 日本電信電話株式会社 | 単結晶育成用るつぼ |
| JP2016117606A (ja) * | 2014-12-19 | 2016-06-30 | 株式会社タムラ製作所 | Ga2O3系単結晶の育成方法、及び坩堝 |
| JP7155968B2 (ja) * | 2018-12-04 | 2022-10-19 | Tdk株式会社 | 単結晶育成用ルツボ及び単結晶製造方法 |
| US11674239B2 (en) * | 2020-02-27 | 2023-06-13 | Fujikoshi Machinery Corp. | Gallium oxide crystal manufacturing device |
| CN114318503A (zh) * | 2021-12-30 | 2022-04-12 | 陕西旭光晶体科技有限公司 | 氧化嫁晶体用的铂铱合金坩埚以及制备方法 |
-
2023
- 2023-06-07 CN CN202380095237.XA patent/CN120826501A/zh active Pending
- 2023-06-07 WO PCT/JP2023/021100 patent/WO2024252544A1/ja not_active Ceased
- 2023-06-07 JP JP2025525512A patent/JPWO2024252544A1/ja active Pending
-
2024
- 2024-02-27 TW TW113106980A patent/TW202507090A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202507090A (zh) | 2025-02-16 |
| JPWO2024252544A1 (cg-RX-API-DMAC7.html) | 2024-12-12 |
| WO2024252544A1 (ja) | 2024-12-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102374317B1 (ko) | 산화갈륨 결정의 제조 장치 및 산화갈륨 결정의 제조 방법 | |
| EP2733239B1 (en) | Sic single crystal and manufacturing process therefor | |
| EP2206809A1 (en) | Silicon wafer and method for producing the same | |
| TW202146714A (zh) | 氧化鎵結晶的製造裝置 | |
| EP0193192A2 (en) | Pyrolytic boron nitride article and method for producing the same | |
| RU2358905C2 (ru) | Способ получения слитков поликристаллического кремния | |
| JP2020105069A (ja) | 酸化ガリウム結晶の製造装置および酸化ガリウム結晶の製造方法 | |
| TW202507090A (zh) | 坩鍋、使用其之β型三氧化二鎵單晶基板之製造方法及β型三氧化二鎵單晶基板 | |
| TW202600917A (zh) | β型三氧化二鎵單晶之製造方法、β型三氧化二鎵單晶基板之製造方法、及β型三氧化二鎵單晶基板 | |
| WO2024252542A1 (ja) | 三酸化二ガリウム単結晶基板、三酸化二ガリウム単結晶の製造方法、および三酸化二ガリウム単結晶基板の製造方法 | |
| US20260092391A1 (en) | N-type silicon block and n-type silicon substrate | |
| EP3572562A1 (en) | Gallium arsenide compound semiconductor crystal and wafer group | |
| EP4692429A1 (en) | Digallium trioxide single crystal substrate, method for producing digallium trioxide single crystal, and method for producing digallium trioxide single crystal substrate | |
| JP2000109391A (ja) | 石英るつぼ | |
| JP2024050122A (ja) | 単結晶の育成方法、半導体基板の製造方法、及び半導体基板 | |
| JP3583117B2 (ja) | 熱電素子用結晶体及びその製造方法並びに熱電素子の製造方法 | |
| JP7768464B2 (ja) | ヒ化ガリウム単結晶の製造方法、ヒ化ガリウム単結晶基板の製造方法、ヒ化ガリウム単結晶基板、およびヒ化ガリウム単結晶 | |
| WO2026013719A1 (ja) | ベータ型三酸化二ガリウム単結晶基板、ベータ型三酸化二ガリウム単結晶の製造方法、およびベータ型三酸化二ガリウム単結晶基板の製造方法 | |
| EP4667627A1 (en) | Beta-digallium trioxide single crystal substrate, method for manufacturing beta-digallium trioxide single crystal, and method for manufacturing beta-digallium trioxide single crystal substrate | |
| Blevins et al. | 2 β-Ga2 O3 BULK GROWTH TECHNIQUES | |
| WO2026013718A1 (ja) | ベータ型三酸化二ガリウム単結晶基板、ベータ型三酸化二ガリウム単結晶の製造方法、およびベータ型三酸化二ガリウム単結晶基板の製造方法 | |
| Hoshikawa | Vertical Bridgman Growth Method | |
| GB2639313A (en) | Gallium arsenide single crystal substrate and method for producing same | |
| KR20250042813A (ko) | 합성 라이너를 갖는 도가니들로 단결정 실리콘 잉곳을 형성하기 위한 시스템들 및 방법들 | |
| JPH08183694A (ja) | 細線状シリコン製造用坩堝および細線状シリコン |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |