CN119522636A - 半导体装置及半导体装置的制造方法 - Google Patents
半导体装置及半导体装置的制造方法 Download PDFInfo
- Publication number
- CN119522636A CN119522636A CN202380050510.7A CN202380050510A CN119522636A CN 119522636 A CN119522636 A CN 119522636A CN 202380050510 A CN202380050510 A CN 202380050510A CN 119522636 A CN119522636 A CN 119522636A
- Authority
- CN
- China
- Prior art keywords
- region
- semiconductor layer
- semiconductor device
- semiconductor
- type semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/60—Schottky-barrier diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/50—Physical imperfections
- H10D62/53—Physical imperfections the imperfections being within the semiconductor body
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/875—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being semiconductor metal oxide, e.g. InGaZnO
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/01—Manufacture or treatment
- H10D8/051—Manufacture or treatment of Schottky diodes
Landscapes
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022105187 | 2022-06-29 | ||
| JP2022-105187 | 2022-06-29 | ||
| PCT/JP2023/024229 WO2024005153A1 (ja) | 2022-06-29 | 2023-06-29 | 半導体装置および半導体装置の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN119522636A true CN119522636A (zh) | 2025-02-25 |
Family
ID=89382458
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202380050510.7A Pending CN119522636A (zh) | 2022-06-29 | 2023-06-29 | 半导体装置及半导体装置的制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20250133757A1 (https=) |
| JP (1) | JPWO2024005153A1 (https=) |
| CN (1) | CN119522636A (https=) |
| WO (1) | WO2024005153A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025158572A1 (ja) * | 2024-01-24 | 2025-07-31 | 三菱電機株式会社 | 半導体装置および半導体装置の製造方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021144851A1 (ja) * | 2020-01-14 | 2021-07-22 | 三菱電機株式会社 | ショットキーバリアダイオード |
| JP2022030646A (ja) * | 2020-08-07 | 2022-02-18 | 株式会社Flosfia | 酸化物半導体及び酸化物半導体を含む半導体装置 |
| JPWO2022030647A1 (https=) * | 2020-08-07 | 2022-02-10 | ||
| JP7634813B2 (ja) * | 2020-10-23 | 2025-02-25 | 株式会社Flosfia | 半導体装置 |
-
2023
- 2023-06-29 JP JP2024530974A patent/JPWO2024005153A1/ja active Pending
- 2023-06-29 CN CN202380050510.7A patent/CN119522636A/zh active Pending
- 2023-06-29 WO PCT/JP2023/024229 patent/WO2024005153A1/ja not_active Ceased
-
2024
- 2024-12-30 US US19/005,007 patent/US20250133757A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2024005153A1 (https=) | 2024-01-04 |
| US20250133757A1 (en) | 2025-04-24 |
| WO2024005153A1 (ja) | 2024-01-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |