CN118435119A - 感光化射线性或感放射线性树脂组合物、感光化射线性或感放射线性膜、图案形成方法、电子器件的制造方法及化合物 - Google Patents

感光化射线性或感放射线性树脂组合物、感光化射线性或感放射线性膜、图案形成方法、电子器件的制造方法及化合物 Download PDF

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CN118435119A
CN118435119A CN202280083885.9A CN202280083885A CN118435119A CN 118435119 A CN118435119 A CN 118435119A CN 202280083885 A CN202280083885 A CN 202280083885A CN 118435119 A CN118435119 A CN 118435119A
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group
represented
atom
compound
acid
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小岛雅史
后藤研由
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Fujifilm Corp
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Fujifilm Corp
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    • C07C65/05—Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing hydroxy or O-metal groups monocyclic and having all hydroxy or O-metal groups bound to the ring o-Hydroxy carboxylic acids
    • C07C65/10—Salicylic acid

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CN202280083885.9A 2021-12-23 2022-12-09 感光化射线性或感放射线性树脂组合物、感光化射线性或感放射线性膜、图案形成方法、电子器件的制造方法及化合物 Pending CN118435119A (zh)

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JP2021210013 2021-12-23
JP2021-210013 2021-12-23
PCT/JP2022/045518 WO2023120250A1 (ja) 2021-12-23 2022-12-09 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法、及び化合物

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KR (1) KR102937062B1 (https=)
CN (1) CN118435119A (https=)
IL (1) IL313684A (https=)
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CN121378176A (zh) * 2025-07-31 2026-01-23 信越化学工业株式会社 鎓盐、光酸产生剂、化学增幅抗蚀剂组成物及图案形成方法

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