CN118348628A - Optical filter and preparation method thereof, optical filter film and preparation method thereof - Google Patents
Optical filter and preparation method thereof, optical filter film and preparation method thereof Download PDFInfo
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Abstract
The invention relates to an optical filter and a preparation method thereof, and an optical filter film and a preparation method thereof. The optical filter of the present invention includes a flexible quantum dot optical filter layer having a plurality of regions having different optical filter wavelengths, each region of the flexible quantum dot optical filter layer being formed of a flexible quantum dot optical filter film including a quantum dot material and a polymer matrix, and the proportion of the quantum dot material is 80 to 250 mass% with respect to 100 mass% of the total mass of the polymer matrix, and the thickness of each region of the flexible quantum dot optical filter layer is 20 micrometers or more and 100 micrometers or less.
Description
Technical Field
The invention relates to the technical field of quantum dots, in particular to an optical filter and a preparation method thereof, and an optical filter film and a preparation method thereof.
Background
In the technical field of optical devices, an optical filter is widely applied to various optical imaging scenes as an optical element for selecting a required radiation wave band, and the optical filter capable of simultaneously realizing multi-wavelength optical filtering is the key point of current research.
The existing production mode of the multi-wavelength integrated quantum dot optical filter realizes optical filtering performance by coating quantum dots on a glass substrate in regions, takes inkjet printing as an example, sequentially sprays quantum dot ink in a selected wavelength region, covers an unselected region, and directly forms a film on the glass substrate in a mode of ultraviolet light curing or thermal curing ink. In order to realize multi-wavelength and multi-region optical filtering, the preparation process needs to repeat the processes of ink jet, mask and solidification on the same glass substrate for a plurality of times, so that the optical filter is difficult to mold at one time, and the consistency and stability of the optical filter are difficult to maintain. In addition, the filter film is difficult to separate from the substrate, and the whole filter is required to be abandoned and re-produced due to a certain operation error, so that the production efficiency is low and the cost is high.
Disclosure of Invention
Problems to be solved by the invention
In view of the above, the technical problem to be solved by the present invention is to provide an optical filter capable of realizing multi-wavelength, multi-region optical filtering, easily maintaining consistency and stability, and easily obtainable, improving production efficiency and reducing production cost compared with conventional methods, and a method for manufacturing the same.
The technical problem to be solved by the present invention is also to provide a filter film which has excellent stability and can be easily obtained and is suitable for mass production in advance, so that a filter requiring multi-wavelength, multi-region filtering can be easily produced, the consistency and stability of which are easily maintained, and which improves production efficiency and reduces production cost compared with the conventional method, and a method for producing the same.
Solution for solving the problem
According to the intensive studies of the present inventors, it was found that the above technical problems can be solved by the implementation of the following technical scheme:
[1] A method of manufacturing an optical filter, comprising:
a1 A substrate is prepared, the substrate has a patterned surface,
A2 A flexible quantum dot optical filter film, wherein the flexible quantum dot optical filter film comprises a quantum dot material and a polymer matrix, the proportion of the quantum dot material is 80 to 250 mass percent relative to 100 mass percent of the total mass of the polymer matrix, the thickness of the flexible quantum dot optical filter film is more than 20 micrometers and less than 100 micrometers,
A3 A plurality of flexible quantum dot optical filter films with different optical filter wavelengths are attached on the patterning surface of the substrate in a mode of matching with the pattern of the patterning surface, so that a flexible quantum dot optical filter layer with a plurality of areas with different optical filter wavelengths is formed,
A4 Packaging the composite A1 comprising the flexible quantum dot filter layer and the substrate to obtain a composite A2.
[2] The production method according to [1], wherein in a 1), the patterned surface is formed by subjecting the surface of the substrate to laser or ion etching; and/or
A2 The preparation of the flexible quantum dot filter film is carried out by: forming a coating film using a quantum dot material liquid composition comprising a quantum dot material, a polymer, and a solvent, thereby solidifying the coating film to obtain a solid film, and then cutting the solid film according to the pattern of the patterned surface to obtain the flexible quantum dot optical filter film.
[3] The production method according to [1] or [2], wherein the composite body A1 further comprises a reflective film, the reflective film being plated on an edge of the pattern of the patterned surface of the substrate, or on an edge of the flexible quantum dot filter film; and/or
The optical filter further comprises an antireflection film, wherein the antireflection film is plated on the side of the surface, opposite to the patterned surface, of the substrate in the composite body A1, and/or the antireflection film is plated on the side of the first surface of the composite body A2, opposite to the patterned surface, of the substrate.
[4] A method of manufacturing an optical filter, comprising:
b1 A silicone film is prepared, the silicone film has a patterned surface,
B2 A flexible quantum dot optical filter film, wherein the flexible quantum dot optical filter film comprises a quantum dot material and a polymer matrix, the proportion of the quantum dot material is 80 to 250 mass percent relative to 100 mass percent of the total mass of the polymer matrix, the thickness of the flexible quantum dot optical filter film is more than 20 micrometers and less than 100 micrometers,
B3 A plurality of flexible quantum dot optical filter films with different optical filter wavelengths are adhered on the patterned surface of the silica gel film in a mode of matching with the pattern of the patterned surface, so that a flexible quantum dot optical filter layer with a plurality of areas with different optical filter wavelengths is formed,
B4 In a complex B1 comprising the flexible quantum dot filter layer and the silica gel film, packaging a side of the flexible quantum dot filter layer facing away from the silica gel film, and removing the silica gel film to obtain a complex B2,
B5 Packaging the surface of the complex B2 exposed out of the flexible quantum dot filter layer to obtain a complex B3.
[5] The production method according to [4], wherein in b 1), the patterned surface is formed by subjecting the surface of the silica gel film to laser or ion etching; and/or
B2 The preparation of the flexible quantum dot filter film is carried out by: forming a coating film using a quantum dot material liquid composition comprising a quantum dot material, a polymer, and a solvent, thereby solidifying the coating film to obtain a solid film, and then cutting the solid film according to the pattern of the patterned surface to obtain the flexible quantum dot optical filter film.
[6] The preparation method of [4] or [5], wherein the complex B1 further comprises a reflecting film, and the reflecting film is plated on the edge of the flexible quantum dot optical filter film; and/or
The optical filter further comprises an antireflection film, and the antireflection film is plated on at least one surface of the complex B3.
[7] The production method according to [1] or [4], wherein the polymer for forming the polymer matrix is a linear polymer, preferably at least one selected from the group consisting of polyvinyl acetal esters, polystyrene, polyethylene terephthalate, polycarbonate, polymethyl methacrylate;
the light transmittance of the flexible quantum dot filter film is more than 80%;
The tensile strength of the flexible quantum dot filter film is more than 20MPa;
The elongation at break of the flexible quantum dot filter film is greater than 30%.
[8] A filter includes a flexible quantum dot filter layer having a plurality of regions of different filter wavelengths,
Each region of the flexible quantum dot filter layer is respectively formed by a flexible quantum dot filter film comprising a quantum dot material and a polymer matrix, and
The proportion of the quantum dot material is 80 to 250 mass% relative to 100 mass% of the total mass of the polymer matrix,
Each region of the flexible quantum dot filter layer has a thickness of 20 microns or more and 100 microns or less.
[9] A filter film comprising a quantum dot material and a polymer matrix,
The proportion of the quantum dot material is 80 to 250 mass% relative to 100 mass% of the total mass of the polymer matrix,
The thickness of the filter film is 20 micrometers or more and 100 micrometers or less.
[10] A method for producing a filter film according to [9], which comprises: a coating film is formed using a liquid composition of a quantum dot material comprising the quantum dot material, a polymer and a solvent, and the coating film is solidified to obtain a solid film.
ADVANTAGEOUS EFFECTS OF INVENTION
The filter film has a certain thickness, shows softness and toughness, and can ensure that the operation during cutting and transferring can not cause destructive damage to the flatness and integrity of the film. In addition, the filter film of the invention ensures the filter performance due to the inclusion of the quantum dot material in a specific proportion, and the light transmittance degradation caused by the aggregation of the quantum dots of the quantum dot filter film can not occur.
The introduction of the polymer matrix increases the volume and thickness of the film, provides more dispersion space for the quantum dots, reduces the possibility of collision and coagulation of the quantum dots, improves the light transmittance of the film, and can be widely applied to quantum dot materials of different systems. In addition, due to the introduction of the polymer matrix, the performance changes of red shift and blue shift of the wavelength of the optical filter, caused by coagulation of the quantum dot material, ligand falling and the like, are avoided after film formation, and the storage stability of the optical filter is ensured. When the film has excellent storage stability, it is possible to ensure that the filter performance of the film does not significantly change during storage before the filter is manufactured.
In the preparation method of the optical filter film, the quantum dot material is dispersed by adopting the polymer matrix, and the optical filter film is prepared by adopting a method of dissolving the polymer by adopting the solvent. Accordingly, the quantum dot material is uniformly dispersed in the polymer matrix, the problem of difficult transfer caused by poor toughness of the pure quantum dot film is solved, and the optical filter film disclosed by the invention can be easily obtained and is a flexible film.
By using the filter film, the filter can realize multi-wavelength and multi-region filtering, and the filter film is prepared into a single-wavelength flexible filter film finished product, and then the filter film is cut and combined into the filter film with multiple wavelengths and multiple regions according to the requirement. And can be easily obtained, improving production efficiency and reducing production cost compared with the conventional method.
Drawings
Fig. 1 is a view showing flexibility of a filter film containing cadmium selenide of 549nm obtained in example 1 of the present invention.
FIG. 2 is a view showing the light filtering properties of a filter film containing 549nm cadmium selenide obtained in example 1 of the present invention.
Fig. 3 shows the uv-vis spectra of the respective filter films obtained in (1) to (3) and (5) in example 1 of the present invention.
Fig. 4 shows the uv-visible spectrum of the filter film before the high-low temperature stability evaluation (589 nm film obtained in (4) in example 1), the filter film obtained by one round of high-low temperature treatment, and the filter film obtained by two rounds of high-low temperature treatment.
Fig. 5 shows the ultraviolet visible spectrum of the filter film before high temperature and high humidity stability evaluation (549 nm film obtained in (4) in example 1) and the filter film obtained by subjecting to high temperature and high humidity treatment.
Fig. 6 is an ultraviolet-visible spectrum showing the filter film before evaluation of ultraviolet stability (620 nm film obtained in (4) in example 1) and the filter film obtained after ultraviolet irradiation for each time.
Fig. 7 is an exemplary top view of an example of different flexible quantum dot filter films disposed in different regions in a filter of the present invention.
Fig. 8 is an exemplary front view of an example of different flexible quantum dot filter films disposed in different regions in a filter of the present invention.
Fig. 9 is a flowchart of a method for manufacturing an optical filter according to the present invention.
Fig. 10 is a flowchart of another method for manufacturing an optical filter according to the present invention.
Detailed Description
Various exemplary embodiments, features and aspects of the invention are described in detail below. The word "exemplary" is used herein to mean "serving as an example, embodiment, or illustration. Any embodiment described herein as "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments.
Furthermore, in the following detailed description, numerous specific details are set forth in order to provide a better illustration of the invention. It will be understood by those skilled in the art that the present invention may be practiced without some of these specific details. In other instances, well known methods, procedures, means, equipment and steps have not been described in detail so as not to obscure the present invention.
Unless otherwise indicated, all units used in this specification are units of international standard, and numerical values, ranges of values, etc. appearing in the present invention are understood to include systematic errors unavoidable in industrial production.
In the present specification, the meaning of "can" includes both the meaning of performing a certain process and the meaning of not performing a certain process.
Reference throughout this specification to "some specific/preferred embodiments," "other specific/preferred embodiments," "an embodiment," and so forth, means that a particular element (e.g., feature, structure, property, and/or characteristic) described in connection with the embodiment is included in at least one embodiment described herein, and may or may not be present in other embodiments. In addition, it is to be understood that the elements may be combined in any suitable manner in the various embodiments.
In the present specification, the numerical range indicated by the term "numerical value a to numerical value B" means a range including the end point numerical value A, B.
In the present specification, when "normal temperature" and "room temperature" are used, the temperature may be 15 to 25 ℃.
< Filter, filter film and method for producing the same >
The optical filter of the invention comprises a flexible quantum dot optical filter layer which is provided with a plurality of areas with different filter wavelengths. Therefore, the optical filter can realize multi-wavelength and multi-region optical filtering.
In the present invention, each region of the flexible quantum dot filter layer is individually formed from a flexible quantum dot filter film comprising a quantum dot material and a polymer matrix. That is, the flexible quantum dot filter layer is formed by using a plurality of flexible quantum dot filter films having different filter wavelengths, thereby having a plurality of regions having different filter wavelengths.
In the invention, any two of the plurality of areas with different filtering wavelengths of the flexible quantum dot filter layer can be mutually spaced or mutually contacted. In some preferred embodiments, the flexible quantum dot filter layer is preferably formed by splicing a plurality of flexible quantum dot filter films.
In addition, in the flexible quantum dot filter layer, the number of each of the plurality of flexible quantum dot filter films may be more than one as required.
In the flexible quantum dot filter film, the proportion of the quantum dot material is 80-250 mass percent relative to 100 mass percent of the total mass of the polymer matrix. When the ratio of the quantum dot material to the polymer matrix is within the scope of the present invention, the filtering performance of the resulting flexible quantum dot filter film is ensured, and the quantum dot filter film does not suffer from degradation in light transmittance due to aggregation of the quantum dots. In some preferred embodiments, the proportion of the quantum dot material is preferably 100 to 200 mass%, more preferably 125 to 200 mass% with respect to 100 mass% of the total mass of the polymer matrix from the viewpoint of better achievement of the effect of the present invention.
In addition, in the present invention, the composition of the flexible quantum dot filter layer (or flexible quantum dot filter film) is not particularly limited as long as the polymer matrix and the quantum dot material are contained in the above-mentioned ratio. However, the total content of the polymer matrix and the quantum dot material is preferably 80 mass% or more, more preferably 90 mass% or more, still more preferably 100 mass% with respect to 100 mass% of the total mass of the flexible quantum dot filter layer (or flexible quantum dot filter film).
In the present invention, the type of the polymer matrix is not particularly limited, and may be appropriately selected according to need. For example, the polymer used to form the polymer matrix may be a linear polymer, such as polyvinyl acetal ester, styrene-based polymer, polyester-based resin, polycarbonate, (meth) acrylate-based polymer, polyphenylene sulfide resin, polyamide resin, and the like. These polymers may be used singly or in combination of two or more.
In some preferred embodiments, the polymer matrix is preferably at least one selected from the group consisting of polyvinyl acetal esters, styrene-based polymers, polyester-based resins, polycarbonates, and (meth) acrylate-based polymers from the viewpoint of improving the light transmittance of the quantum dot optical filter film.
As the polyvinyl acetal ester, there may be mentioned, without limitation, polyvinyl acetal ester, polyvinyl Ding Quanzhi and the like. Among them, polyvinyl acetal Ding Quanzhi is preferably used.
The styrene polymer may be, but is not limited to, polystyrene (PS), a copolymer of styrene and other monomers (for example, (meth) acrylate, (meth) acrylic acid, vinyl carboxylate, monovinyl ether, etc.), and the like. Among them, polystyrene (PS) is preferably used.
In the present invention, the term "polyester" means a polymer comprising mainly the following repeating unit (a), or mainly the following repeating units (b) and (c), or mainly the following repeating units (a), (b) and (c): (a) 1 or more than 2 repeating units derived from hydroxycarboxylic acids and derivatives thereof, (b) 1 or more than 2 repeating units derived from dicarboxylic acids and derivatives thereof, and (c) at least 1 or more than 2 repeating units derived from diols and derivatives thereof. Examples of the polyester resin include, but are not limited to, polybutylene isophthalate resin, polybutylene phthalate resin, polybutylene terephthalate resin (PBT), polyethylene terephthalate resin (PET), polybutylene terephthalate resin, and polyethylene terephthalate resin. Among them, polyethylene terephthalate resin (PET) and/or polybutylene terephthalate resin (PBT) are preferably used.
The (meth) acrylic acid ester-based polymer may be, but is not limited to, homopolymers of (meth) acrylic acid esters, copolymers of different (meth) acrylic acid esters, and copolymers of (meth) acrylic acid esters with other monomers (for example, styrene, (meth) acrylic acid, vinyl carboxylate, monovinyl ether, etc.). Examples of (meth) acrylates include, but are not limited to: (meth) acrylate haloalkyl esters such as (meth) acrylate chloroalkyl esters, (meth) acrylate bromoalkyl esters, (meth) acrylate fluoroalkyl esters; hydroxyalkyl (meth) acrylates such as hydroxyethyl (meth) acrylate; alkyl (meth) acrylates, for example, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate; (meth) acrylate epoxyalkyl esters such as (meth) acrylate glycidyl esters and the like. Among them, polymethyl methacrylate (PMMA) is preferably used.
In some more preferred embodiments, the polymer matrix is more preferably at least one selected from the group consisting of polyvinyl acetal, polystyrene, polyethylene terephthalate, polycarbonate, polymethyl methacrylate from the viewpoint of more improving the light transmittance of the quantum dot filter film.
According to the invention, the polymer matrix can limit the Brownian motion of quantum dot particles, so that the problems of poor dispersibility and poor light transmittance of a pure quantum dot film caused by volume shrinkage and accelerated coagulation of the quantum dot solution during drying and film formation are solved, the quantum dot still cannot do Brownian motion after film formation, the performance changes of red shift and blue shift of the wavelength of the optical filter caused by coagulation of the quantum dot, ligand falling and the like are avoided, and the storage stability of the optical filter is ensured.
In the present invention, the type of the quantum dot material is not particularly limited, and may be appropriately selected as needed. Examples of quantum dot materials may include, but are not limited to: quantum dots of group II-VI compounds, such as CdS, cdSe, cdTe, znS, znSe, pbS, pbSe quantum dots; quantum dots of group III-V compounds, such as InP, gaP, gaN, alN quantum dots; quantum dots of core-shell structured materials, such as CdS/ZnS、CdSe/CdS、CdSe/ZnS、CdSe/CdS/ZnS、CdTe/CdS、CdTe/CdS/ZnS、ZnSe/ZnS、InP/ZnSe、InP/ZnS、InP/ZnSe/ZnS、InP/GaP/ZnS; perovskite quantum dots; quantum dots of noble metals, such as Au, ag, pt; carbon quantum dots, and the like. These quantum dot materials may be used singly or in combination of two or more.
In some preferred embodiments, the quantum dot material may be a quantum dot of a group II-VI compound, more preferably at least one selected from cadmium selenide CdSe (having a long pass wavelength of 495nm, 549nm, 581nm, 620nm, or 640nm, respectively), cadmium telluride CdTe (having a long pass wavelength of 705 nm), cadmium sulfide CdS, zinc sulfide ZnS.
In the present invention, the quantum dot material of the present invention may further optionally contain various organic ligands.
In the present invention, the morphology of the quantum dot material is not particularly limited, and in some specific embodiments, it may be a crystalline material having a certain shape. Typically, the morphology of the quantum dot material of the present invention may have, for example, a spherical or substantially spherical structure, a rod-like structure, a sheet-like structure, a cone-like structure, a tower-like structure, a polygonal structure, a cube structure, or the like. In some preferred embodiments, the resulting quantum dot crystals have a spherical or substantially spherical morphology; in other preferred embodiments, the resulting quantum dot crystals have a (spherical or substantially spherical) core-shell structure.
In addition, in the present invention, the particle size of the quantum dot material is not particularly limited, and in some specific embodiments of the present invention, it may be 1 to 100nm, preferably, the particle size range may be 2 to 70nm, more preferably 2 to 60nm, still more preferably 2 to 50nm, still more preferably 3 to 30nm, 3 to 20nm, or 3 to 10nm.
In addition, the flexible quantum dot filter layer (or flexible quantum dot filter film) may optionally contain various additives, such as plasticizers, leveling agents, preservatives, processing oils, and the like, in addition to the polymer and the quantum dot material. In particular, when polycarbonate or styrenic polymers (especially PS) are used, plasticizers are preferably included in the polymer matrix.
In the invention, the thickness of the flexible quantum dot filter layer (or the flexible quantum dot filter film) is more than 20 micrometers and less than 100 micrometers. When the thickness is within the scope of the present invention, the flexible quantum dot filter layer (or flexible quantum dot filter film) exhibits softness and toughness, and in particular, for flexible quantum dot filter films, it can be ensured that operations during cutting and transferring do not cause destructive damage to the flatness and integrity of the film. In some preferred embodiments, the thickness of the flexible quantum dot filter layer (or flexible quantum dot filter film) is preferably 30 micrometers or more and 60 micrometers or less from the viewpoint of better achieving the effects of the present invention.
In the present invention, from the viewpoint of better achieving the effects of the present invention, in some preferred embodiments, the light transmittance of the flexible quantum dot filter layer (or flexible quantum dot filter film) is preferably more than 80%, more preferably 90% or more. The light transmittance is obtained from the ultraviolet-visible spectrum measured by an ultraviolet-visible spectrophotometer.
In addition, in the present invention, from the viewpoint of better achieving the effects of the present invention, in some preferred embodiments, the tensile strength of the flexible quantum dot optical filter film is preferably more than 20MPa, more preferably more than 25MPa. In other preferred embodiments, the elongation at break of the flexible quantum dot filter film is preferably greater than 30%, more preferably greater than 40%. In the present invention, the method described in GB/T1040.1-2006 (measurement of Plastic-stretching Property, part 1: general rule) was used as a method for measuring tensile strength and elongation at break.
In the present invention, the preparation method of the flexible quantum dot filter film of the present invention is not particularly limited as long as it can be obtained, and various means commonly used in the art can be employed.
In some specific embodiments, the flexible quantum dot optical filter of the present invention may be formed using a quantum dot material liquid composition from the standpoint of easier availability of the flexible quantum dot optical filter of the present invention. Specifically, the preparation method of the optical filter film of the present invention includes forming a coating film using a quantum dot material liquid composition, and further solidifying the coating film to obtain a solid film (flexible quantum dot optical filter film). In the present invention, a liquid composition of quantum dot material comprises a quantum dot material, a polymer for forming the aforementioned polymer matrix, and a solvent.
In the present invention, the composition of the liquid composition of the quantum dot material is not particularly limited, and may be in various dispersion forms as needed. In some preferred embodiments, the liquid composition of the quantum dot material is preferably in the form of a colloidal solution from the viewpoint of easier uniform dispersion of the quantum dot material in the polymer matrix, comprising the quantum dot material, the polymer matrix, and a solvent for dissolving the polymer matrix and capable of dispersing the quantum dot material. In colloidal solutions, the quantum dot material remains particulate (i.e., dispersed in the composition) but is not visible to the naked eye because the quantum dot material is highly dispersed and is of nano-scale size.
In the present invention, examples of the solvent include, but are not limited to, halogenated hydrocarbon solvents such as methylene chloride, chloroform (chloroform), 1, 2-dichloroethane, hexachloroethane, etc.; ester solvents, methyl acetate, ethyl acetate, butyl acetate, and the like. In some specific embodiments, the polymer concentration in the liquid composition of the quantum dot material may be, for example, 3 to 6wt%.
In the present invention, the coating method of the coating film is not particularly limited, and for example, a usual coating method such as die film formation, spin coating, blade coating, spray coating and the like can be adopted. In some preferred embodiments, in order to make the surface smoothness and light transmittance of the formed film better, and to facilitate separation of the cured film, and to suppress pulling deformation of the cured film, a mold film forming method is preferably employed. In this case, a mold made of a material which has a low surface tension and is not dissolved by a solvent in the liquid composition of the quantum dot material, such as a fluororesin, polypropylene (PP), or the like, may be used, and other flat molds having an inner surface coated with a release agent may be used.
In the present invention, the solidification conditions are not particularly limited, and may be appropriately adjusted according to actual needs. For example, the solidification may be performed under the following conditions: the temperature is 0-60 ℃, the humidity is below 50%, and the time is above 5 minutes.
In some specific embodiments, where a quantum dot material of 400-700 nm is employed, solidification may be performed under the following conditions: the temperature is 15-30 ℃, the humidity is less than 10%, and the time is not less than 12h.
In the present invention, the term "solidification" refers to a process of converting a coating film into a solid film by volatilizing at least a solvent contained in the coating film. Preferably, the solidification in the present invention refers to a process of converting a coating film into a solid film by volatilizing a solvent contained in the coating film, but does not include a crosslinking reaction.
In addition, the optical filter of the present invention may include a substrate having a patterned surface, a reflective film, an antireflection film, and the like as required, in addition to the flexible quantum dot optical filter of the present invention.
In the present invention, the method for producing the optical filter is not particularly limited, but is preferably produced by the method described in < method for producing an optical filter > described below.
< Method for producing optical Filter >
The invention provides two preparation methods of an optical filter.
(Scheme 1)
As shown in fig. 9, the method for manufacturing the optical filter of the present invention includes: a1 Preparing a substrate having a patterned surface; a2 A flexible quantum dot filter film is prepared, wherein the flexible quantum dot filter film comprises a quantum dot material and a polymer matrix, the proportion of the quantum dot material is 80-250 mass% relative to the total mass of the polymer matrix, and the thickness of the flexible quantum dot filter film is more than 20 microns and less than 100 microns; a3 Attaching a plurality of flexible quantum dot optical filter films with different optical filter wavelengths on the patterned surface of the substrate in a mode of matching with the pattern of the patterned surface, thereby forming a flexible quantum dot optical filter layer with a plurality of areas with different optical filter wavelengths; a4 Packaging the composite A1 comprising the flexible quantum dot filter layer and the substrate to obtain a composite A2.
In the present invention, there is no particular limitation on the kind of the substrate, and examples include, but are not limited to, quartz plates; glass; a silicon wafer; a ceramic; various polymers such as polymethyl methacrylate, silicone films, and the like; combinations of the various forms of the above materials, and the like.
A1 The method of forming the patterned surface is not particularly limited, and may be appropriately adjusted according to the kind of the substrate. For example, the pattern of the patterned surface may be a pattern formed based on a structure such as a groove.
In some preferred embodiments, the patterned surface is formed by laser or ion etching the surface of the substrate. In the invention, the substrate is patterned by laser or ion etching, so that accurate designs (such as the size, the depth and the like of the grooves) can be more easily made on the positions and the like of each wavelength region, and the flexible quantum dot filter film can be easily aligned and fixed at a proper position in the transfer process, thereby ensuring the flatness and consistency of each region.
A2 In the above, the method for preparing the flexible quantum dot filter film is not particularly limited. In some preferred embodiments, from the standpoint of more easily obtaining a flexible quantum dot filter film, the preparation of the flexible quantum dot filter film is carried out by: forming a coating film using a quantum dot material liquid composition comprising a quantum dot material, a polymer, and a solvent, thereby solidifying the coating film to obtain a solid film, and then cutting the solid film according to the pattern of the patterned surface to obtain the flexible quantum dot optical filter film.
Here, details for the solid film (flexible quantum dot filter film) and the preparation method thereof are the same as those of the filter film and the preparation method thereof described in < filter, filter film and the preparation method thereof > described above, and are not described here again.
Moreover, the cutting of the solid film (flexible quantum dot filter film) can be achieved by methods commonly used in the art.
A3 As described above), a plurality of types of flexible quantum dot filter films (two or more types of flexible quantum dot filter films) having different filter wavelengths are attached to the patterned surface of the substrate so as to match the pattern of the patterned surface, thereby forming a flexible quantum dot filter layer having a plurality of regions having different filter wavelengths.
In some preferred embodiments, where the pattern of the patterned surface is formed based on structures such as grooves, the flexible quantum dot filter film may be disposed in the grooves of the patterned surface.
In the invention, any two of the plurality of areas with different filtering wavelengths of the flexible quantum dot filter layer can be mutually spaced or mutually contacted. In some preferred embodiments, the flexible quantum dot filter layer is preferably formed by splicing a plurality of flexible quantum dot filter films having different filter wavelengths.
In addition, in the flexible quantum dot filter layer, the number of each of the plurality of flexible quantum dot filter films may be more than one as required.
In the present invention, the composite A1 including only the flexible quantum dot filter layer and the silica gel film can be directly obtained through the above a 3). As described below, the composite A1 of the present invention may include other members such as a reflective film and an antireflection film.
A4 By packaging the composite A1 including the flexible quantum dot filter layer and the substrate to obtain the composite A2, the flexible quantum dot filter film and the substrate are packaged into a whole to isolate water, oxygen and other substances from contacting the quantum dot filter film, so that the filter has long-term environmental (light, heat and the like) stability. And moreover, the flexible quantum dot filter film can be fixed by encapsulation, so that the movement of the flexible film is prevented, and the stable performance is ensured. In addition, the packaging can also fill up the deformation of the filter film caused during transfer, the upper surface with uniform height is obtained after solidification, and the flatness of the filter is better.
For example, the encapsulation may be performed by coating the surface of the composite body A1 with an encapsulation adhesive and then curing the encapsulation adhesive. The kind of the encapsulation adhesive used is not particularly limited as long as it is transparent (i.e., colorless) and does not lose the flexibility of the filter.
Examples of encapsulation glue include, but are not limited to: epoxy resins, silicones, polyurethanes, polyimides, silicones, (meth) acrylate materials, and the like.
In addition, in some preferred embodiments, the above-described composite A1 further includes a reflective film(s) that is plated on the edges of the pattern of the patterned surface of the substrate, or on the edges of the flexible quantum dot filter film. Under the condition that the pattern of the patterned surface is formed based on structures such as grooves, when the reflecting film is plated, light rays penetrating through the light filtering film can be directly reflected and cannot penetrate through the periphery of the grooves, and only the lower surface of the substrate can be penetrated, so that light ray superposition interference of different areas penetrating through the light filtering film is effectively prevented, and a better light filtering effect is achieved. In addition, in the present invention, the reflective film used may be different according to the flexible quantum dot filter film.
In the present invention, the kind of the reflective film and the plating method are not particularly limited, and various means known in the art may be employed.
As an example of the reflective film, a metal reflective film may be used. Common materials for forming the metal reflective film include, but are not limited to, aluminum, silver, gold, chromium, and the like.
In addition, for the metal reflective film, a plating method may be a common method of preparing a metal reflective film, examples of which include, but are not limited to: vacuum coating techniques such as Physical Vapor Deposition (PVD) and magnetron sputtering. In these methods, the metal is evaporated or sputtered onto the substrate surface in a vacuum environment.
As an example of the reflective film, a total dielectric reflective film may also be used. The total dielectric reflection film is generally formed by alternately stacking multiple layers of dielectric materials with different refractive indexes, such as silicon dioxide (SiO 2), titanium dioxide (TiO 2) and the like.
In addition, for the total dielectric reflection film, the plating method may be a common method of preparing the total dielectric reflection film, examples of which include, but are not limited to: multilayer dielectric reflective films can be prepared using Molecular Beam Epitaxy (MBE), ion Beam Deposition (IBD), sol-Gel (Sol-Gel) techniques, and the like.
In addition, in some preferred embodiments, the optical filter further preferably includes an antireflection film, the antireflection film is plated on a side of the substrate in the composite A1 opposite to the patterned surface, and/or the antireflection film is plated on a side of the first surface of the composite A2, the first surface of the composite A2 being a side of the substrate opposite to the patterned surface. In other words, the anti-reflection film may be plated on the side of the non-patterned surface of the substrate before packaging, or on the side of the non-patterned surface of the substrate after packaging. For example, the anti-reflection film may be directly disposed on the non-patterned surface of the substrate, or may be disposed on another film between the anti-reflection film and the non-patterned surface of the substrate.
In the present invention, the arrangement of the antireflection film can obtain a better effect because the following problems can be suppressed: the use of polymers in flexible quantum dot filters as a matrix for dispersing quantum dots, as a composite material, sometimes makes it difficult for the filter to achieve 100% light transmittance, and in addition, the superposition of multiple layers of organic substances can also result in a decrease in the intensity of light passing through the integrated filter. In addition, in order to achieve a more uniform anti-reflection effect, different areas with different wavelengths can be plated with different anti-reflection films.
In the present invention, the kind of the antireflection film and the plating method are not particularly limited, and various means known in the art can be employed.
As the material for forming the antireflection film, (a) dielectric materials including silicon dioxide (SiO 2), titanium dioxide (TiO 2), aluminum oxide (Al 2O3), magnesium fluoride (MgF 2) and the like, which have different refractive indices, may be used alone or in combination to form a multilayer antireflection film; (b) Special materials, such as nanocomposites or organic polymers, which achieve specific optical properties or simplify the coating process.
Examples of the plating method of the antireflection film include: (a) Physical Vapor Deposition (PVD), including magnetron sputtering, evaporation coating and the like, can accurately control the thickness and structure of the film in a vacuum environment, and is suitable for preparing high-quality anti-reflection films; (b) Chemical Vapor Deposition (CVD) which is suitable for preparing thin films of high uniformity and high adhesion, but may require higher temperatures and complex process control; (c) Sol-gel processes, which may be carried out at lower temperatures, are suitable for large area coating, but may require subsequent heat treatment steps; (d) Ion assisted deposition, which uses ion beam in the coating process, can improve the density and adhesion of the film and enhance the performance of the antireflection film.
The antireflection film may be a single layer film or a multilayer film.
In some particularly specific embodiments, the preparation method of scheme 1 is carried out as follows: the method comprises the steps of (1) patterning the upper surface of a substrate, (2) preparing and cutting a flexible quantum dot filter film, (3) plating a reflecting film on the edge of the pattern on the upper surface of the substrate or plating a reflecting film around the cut filter film, (4) plating an antireflection film on the lower surface of the substrate, (5) attaching the flexible quantum dot filter film on the upper surface of the substrate, and (6) packaging the composite body comprising the flexible quantum dot filter film and the substrate.
(Scheme 2)
As shown in fig. 10, the method for manufacturing the optical filter of the present invention includes: b1 Preparing a silica gel film, wherein the silica gel film is provided with a patterned surface, B2) preparing a flexible quantum dot optical filter film, wherein the flexible quantum dot optical filter film comprises quantum dot materials and a polymer matrix, the proportion of the quantum dot materials is 80-250 mass percent relative to the total mass of the polymer matrix, the thickness of the flexible quantum dot optical filter film is more than 20 micrometers and less than 100 micrometers, B3) bonding a plurality of flexible quantum dot optical filter films with different optical filter wavelengths on the patterned surface of the silica gel film in a mode of matching with the pattern of the patterned surface, thereby forming a flexible quantum dot optical filter layer with a plurality of areas with different optical filter wavelengths, B4) packaging one side of the flexible quantum dot optical filter layer, which is far away from the silica gel film, in a complex B1 comprising the flexible quantum dot optical filter layer and the silica gel film, and removing the silica gel film to obtain a complex B2, B5) packaging the surface of the complex B2, which is exposed to the flexible quantum dot optical filter layer, so as to obtain a complex B3.
B1 The method of forming the patterned surface is not particularly limited, and may be appropriately adjusted according to the kind of the substrate. For example, the pattern of the patterned surface may be a pattern formed based on a structure such as a groove. In some preferred embodiments, the patterned surface is preferably formed by laser or ion etching the surface of the silicone film, based on similar considerations as in scheme 1.
B2 In the above, the method for preparing the flexible quantum dot filter film is not particularly limited. In some preferred embodiments, from the standpoint of more easily obtaining a flexible quantum dot filter film, the preparation of the flexible quantum dot filter film is carried out by: forming a coating film using a quantum dot material liquid composition comprising a quantum dot material, a polymer, and a solvent, thereby solidifying the coating film to obtain a solid film, and then cutting the solid film according to the pattern of the patterned surface to obtain the flexible quantum dot optical filter film.
Here, details for the solid film (flexible quantum dot filter film) and the preparation method thereof are the same as those of the filter film and the preparation method thereof described in < filter, filter film and the preparation method thereof > described above, and are not described here again.
Moreover, the cutting of the solid film (flexible quantum dot filter film) can be achieved by methods commonly used in the art.
B3 As described above), a plurality of kinds of the flexible quantum dot filter films (two or more kinds of flexible quantum dot filter films) having different filter wavelengths are attached to the patterned surface of the substrate in a manner to match the pattern of the patterned surface, thereby forming a flexible quantum dot filter layer having a plurality of regions having different filter wavelengths.
In some preferred embodiments, where the pattern of the patterned surface is formed based on structures such as grooves, the flexible quantum dot filter film may be disposed in the grooves of the patterned surface.
In the invention, any two of the plurality of areas with different filtering wavelengths of the flexible quantum dot filter layer can be mutually spaced or mutually contacted. In some preferred embodiments, the flexible quantum dot filter layer is preferably formed by splicing a plurality of flexible quantum dot filter films having different filter wavelengths.
In addition, in the flexible quantum dot filter layer, the number of each of the plurality of flexible quantum dot filter films may be more than one as required.
In the present invention, the composite B1 including only the flexible quantum dot filter layer and the silica gel film can be directly obtained through the above B3). In addition, in some preferred embodiments, complex B1 further comprises a reflective film(s) that is plated on the edges of the flexible quantum dot filter film. When the reflecting film is plated, the light rays penetrating through the light filtering film can be directly reflected and cannot pass through the part outside the range of the light filtering film, and only can pass through the lower surface of the light filtering film, so that the light rays penetrating through the light filtering film in different areas are effectively prevented from being overlapped and disturbed, and a better light filtering effect is achieved. In addition, in the present invention, the reflective film used may be different according to the flexible quantum dot filter film.
In addition, in preparing the composite B1 including the flexible quantum dot filter layer and the silica gel film, a surface of the silica gel film opposite to a surface on which the flexible quantum dot filter film is to be formed may be fixed with hard glass for the purpose of convenience of handling.
B4 Details of the encapsulation of complex B1 and complex B2 referred to in B5) are similar to those of complex A1 in scheme 1 and will not be described here again.
In addition, in some preferred embodiments, the filter further includes an antireflection film, based on similar considerations as in scheme 1, which is plated on at least one surface of the composite body B3. Preferably, antireflection films are plated on both upper and lower surfaces of the composite B3. In addition, in order to achieve a more uniform anti-reflection effect, different areas with different wavelengths can be plated with different anti-reflection films.
In some particularly specific embodiments, the preparation method of scheme 2 is performed as follows: patterning the surface of a silica gel film, (2) preparing and cutting a flexible quantum dot filter film, (3) plating a reflecting film on the periphery of the cut filter film, (4) bonding the filter film plated with the reflecting film on the upper surface of the silica gel film to obtain a product ①, (5) coating packaging glue on the upper surface (the surface with the filter film) of the product ①, curing to obtain a product ②, and (6) removing the silica gel film to obtain the glue-packaged and fixed integrated quantum dot filter film.
Examples
Embodiments of the present invention will be described in detail below with reference to examples, but it will be understood by those skilled in the art that the following examples are only for illustrating the present invention and should not be construed as limiting the scope of the present invention. The specific conditions are not noted in the examples and are carried out according to conventional conditions or conditions recommended by the manufacturer. The reagents or apparatus used were conventional products commercially available without the manufacturer's attention.
Example 1 ]
(Preparation of a sheet of Flexible Filter film)
(1) Film comprising cadmium selenide CdSe (long pass wavelength 495 nm)
Solid quantum dot cadmium selenide CdSe (with a long-pass wavelength of 495 nm) is dispersed in chloroform solution of PVB to obtain quantum dot colloid solution (PVB: quantum dots (mass ratio) =4:5, polymer concentration is 4.5 wt%). In the preparation process of the colloid solution, the CdSe is fully dispersed in a mode of combining vortex 15min and ultrasonic vibration 15min until the mixed solution is clear and transparent. And standing for 5min to foam the obtained colloid solution of 495nm cadmium selenide to obtain the colloid solution containing the quantum dot material and the polymer.
Pouring the solution into a polytetrafluoroethylene material mold with low surface tension and without being dissolved by a solvent, placing the mold at 25 ℃ and humidity of 50% for 12 hours, solidifying to obtain a film containing 495nm CdSe, and then separating the mold from the quantum dot polymer film, thereby obtaining the flexible optical filter film-495 nmCdSe with long-pass optical filtering performance.
(2) Film comprising cadmium selenide CdSe (long pass wavelength 581 nm)
A flexible filter film-581 nmCdSe having long-pass filter properties was obtained in the same manner as in the above (1), except that cadmium selenide CdSe (long-pass wavelength of 581 nm) was used.
(3) Film comprising cadmium selenide CdSe (640 nm long pass wavelength)
A flexible filter film-640 nmCdSe having long-pass filter properties was obtained in the same manner as in the above (1), except that cadmium selenide CdSe (long-pass wavelength 640 nm) was used.
(4) Film comprising cadmium selenide having long pass wavelengths of 589nm, 549nm, 620nm, respectively
Except that cadmium selenide with long pass wavelengths of 589nm, 549nm, 620nm, respectively, was used, and PVB: quantum dot (mass ratio) =10: except 9, in the same manner as in the above (1), a flexible filter film-589 nm film, 549nm film, 620nm film having long-pass filter properties were obtained, respectively.
(5) Films comprising cadmium telluride CdTe (long pass wavelength 705 nm)
Solid quantum dot cadmium telluride CdTe (wavelength of long pass is 705 nm) and polymer PVB are dissolved in chloroform to obtain a quantum dot solution (PVB: quantum dot (mass ratio) =1:1, polymer concentration is 4.5 wt%). In the preparation process of the solution, a mode of combining vortex 15min and ultrasonic vibration 15min is adopted to fully disperse CdTe and PVB until the mixed solution is clear and transparent, and standing for 5min for defoaming to obtain the solution containing the quantum dot material and the polymer.
Pouring the solution into a polytetrafluoroethylene material mold with low surface tension and without being dissolved by a solvent, placing the mold at 25 ℃ and humidity of 50% for 12 hours, solidifying to obtain a film containing 705nm CdTe, and then separating the mold from the quantum dot polymer film to obtain the optical filter film-705 nmCdTe with long-pass optical filtering performance.
The respective obtained filter films have flexibility, can be folded and bent (for example, as shown in fig. 1) and exhibit good filtering effects (for example, as shown in fig. 2), and further, the uv-visible spectra of the respective filter films obtained in the above (1) to (3) and (5) are shown in fig. 3.
The filter film (589 nm film) obtained in (4) above was evaluated for high-low temperature stability (by one-round high-low temperature treatment and by two-round high-low temperature treatment). In the invention, the filter film is placed at 70 ℃ for 24 hours, and then placed at-40 ℃ for 24 hours, thereby completing one round of high-low temperature treatment. In the invention, the filter film after one round of high and low temperature treatment is subjected to the high and low temperature treatment, so that two rounds of high and low temperature treatment are completed. Fig. 4 shows the uv-visible spectrum of the filter before the high-low temperature stability evaluation, the filter obtained by one round of high-low temperature treatment, and the filter obtained by two rounds of high-low temperature treatment.
The filter film (549 nm film) obtained in (4) above was evaluated for high-temperature high-humidity stability. In the invention, the filter film is placed at 60 ℃ and the humidity is 95% for 72 hours, thereby completing the high-temperature and high-humidity treatment. Fig. 5 shows the uv-visible spectrum of the filter film before the high-temperature high-humidity stability evaluation and the filter film obtained by the high-temperature high-humidity treatment.
The ultraviolet stability of the filter film (620 nm film) obtained in (4) above was evaluated. In the invention, the light filter film is continuously irradiated by a 275nm light source, thereby completing ultraviolet light treatment. Fig. 6 shows the uv-vis spectra of the filter film before uv stability evaluation and the filter film obtained after uv irradiation for each time.
(Patterning of the substrate)
PET is used as a substrate, a plasma etching method is adopted, a double-frequency etching system is used for patterning treatment, and the PET surface is used as a mask to ensure that a required pattern is etched. The etching depth was 40. Mu.m.
(Substrate coating film)
Before coating, the substrate needs to be cleaned, stains on the surface of the substrate are removed, and ethanol is selected as a cleaning agent.
(1) Antireflection film
On the surface of the substrate opposite to the patterned surface, a magnesium oxide MgF 2 film is prepared by adopting a magnesium oxide evaporation method and an argon ion bombardment method to serve as an antireflection film. The electron beam was used to evaporate the magnesium oxide material (99.99%). Argon ions (99.99%) are used in kaufman ion sources to generate argon ion beams. The ion incident angle is maintained at 45 ° inclined from the normal direction of the substrate base plate. In the deposition process, the vacuum is pumped to 1×10 -4 Pa by a low-temperature pump, then oxygen (99.99%) is introduced into the chamber, the working pressure is increased to 0.2mTorr with the introduction of oxygen, the duration is 4min, and the thickness of the film is 120nm.
(2) Reflective film
And (3) adopting a thin film deposition process (physical vapor deposition PVD mode) and vacuum thermal evaporation to plate an Al film on the edge of the groove of the pattern on the patterned surface of the substrate to form a high-reflection film. Specifically, firstly vacuumizing the vacuum chamber to reach instrument indexes, adjusting the voltage to 50V, switching on a high-voltage power supply and an electron gun power supply, and pre-melting the film material of the reflecting film; opening an ion source power supply, and introducing oxygen into the vacuum chamber; after the pre-melting is finished, the baffle plate is opened to start plating the film, and the film thickness of the reflecting film is 120nm, so that the film plating can be stopped.
(Assembly of optical Filter)
The obtained filter films are placed in the etched grooves in sequence, and the grooves can play a limiting role, so that no deliberate alignment is needed. And packaging the substrate and the filter film by using epoxy resin, attaching a layer of hard silica gel film on the surface of the epoxy resin by using a chip mounter, ensuring that the packaging layer is completely flat, and curing the resin at room temperature for 24 hours to remove the silica gel film and obtain the filter. As shown in fig. 7.
Example 2 ]
(Preparation of a sheet of Flexible Filter film)
Each flexible filter film was prepared in the same manner as in example 1.
(Patterning of the substrate)
In a similar manner to that in example 1, the upper surface of the silica gel film was etched with a laser to a desired pattern for positioning the different wavelength filter films as described later.
(Assembly of optical Filter)
The filter films with different wavelengths are sequentially aligned and placed in the etched specified area, and etched curves have a limiting effect and are convenient to align. And packaging the silica gel film and the filter film by using epoxy resin, wherein the dosage of the epoxy resin is 50 microliters/filter film, mounting the epoxy resin on the upper surface of the silica gel film by using a chip mounter, ensuring that the packaging layer is completely flat, curing the resin at room temperature for 24 hours, and removing the silica gel film to obtain the composite 1.
And (3) packaging a layer of epoxy resin on the lower surface of the composite body 1, wherein the dosage of the epoxy resin is 20 microlitres per filter film, and the curing steps are the same, so as to obtain the composite body 2.
Antireflection films were plated on the upper and lower surfaces of the composite body 2 in a similar manner to that in example 1 to obtain a filter.
It should be noted that, although the technical solution of the present invention is described in specific examples, those skilled in the art can understand that the present invention should not be limited thereto.
The foregoing description of embodiments of the invention has been presented for purposes of illustration and description, and is not intended to be exhaustive or limited to the embodiments disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the various embodiments described. The terminology used herein was chosen in order to best explain the principles of the embodiments, the practical application, or the technical improvements in the marketplace, or to enable others of ordinary skill in the art to understand the embodiments disclosed herein.
Claims (10)
1. A method of manufacturing an optical filter, comprising:
a1 A substrate is prepared, the substrate has a patterned surface,
A2 A flexible quantum dot optical filter film, wherein the flexible quantum dot optical filter film comprises a quantum dot material and a polymer matrix, the proportion of the quantum dot material is 80 to 250 mass percent relative to 100 mass percent of the total mass of the polymer matrix, the thickness of the flexible quantum dot optical filter film is more than 20 micrometers and less than 100 micrometers,
A3 A plurality of flexible quantum dot optical filter films with different optical filter wavelengths are attached on the patterning surface of the substrate in a mode of matching with the pattern of the patterning surface, so that a flexible quantum dot optical filter layer with a plurality of areas with different optical filter wavelengths is formed,
A4 Packaging the composite A1 comprising the flexible quantum dot filter layer and the substrate to obtain a composite A2.
2. The method of claim 1, wherein in a 1), the patterned surface is formed by laser or ion etching the surface of the substrate; and/or
A2 The preparation of the flexible quantum dot filter film is carried out by: forming a coating film using a quantum dot material liquid composition comprising a quantum dot material, a polymer, and a solvent, thereby solidifying the coating film to obtain a solid film, and then cutting the solid film according to the pattern of the patterned surface to obtain the flexible quantum dot optical filter film.
3. The method of manufacturing according to claim 1 or 2, wherein the composite A1 further comprises a reflective film, the reflective film being plated on an edge of the pattern of the patterned surface of the substrate or on an edge of the flexible quantum dot filter film; and/or
The optical filter further comprises an antireflection film, wherein the antireflection film is plated on the side of the surface, opposite to the patterned surface, of the substrate in the composite body A1, and/or the antireflection film is plated on the side of the first surface of the composite body A2, opposite to the patterned surface, of the substrate.
4. A method of manufacturing an optical filter, comprising:
b1 A silicone film is prepared, the silicone film has a patterned surface,
B2 A flexible quantum dot optical filter film, wherein the flexible quantum dot optical filter film comprises a quantum dot material and a polymer matrix, the proportion of the quantum dot material is 80 to 250 mass percent relative to 100 mass percent of the total mass of the polymer matrix, the thickness of the flexible quantum dot optical filter film is more than 20 micrometers and less than 100 micrometers,
B3 A plurality of flexible quantum dot optical filter films with different optical filter wavelengths are adhered on the patterned surface of the silica gel film in a mode of matching with the pattern of the patterned surface, so that a flexible quantum dot optical filter layer with a plurality of areas with different optical filter wavelengths is formed,
B4 In a complex B1 comprising the flexible quantum dot filter layer and the silica gel film, packaging a side of the flexible quantum dot filter layer facing away from the silica gel film, and removing the silica gel film to obtain a complex B2,
B5 Packaging the surface of the complex B2 exposed out of the flexible quantum dot filter layer to obtain a complex B3.
5. The method of claim 4, wherein in b 1), the patterned surface is formed by laser or ion etching the surface of the silica gel film; and/or
B2 The preparation of the flexible quantum dot filter film is carried out by: forming a coating film using a quantum dot material liquid composition comprising a quantum dot material, a polymer, and a solvent, thereby solidifying the coating film to obtain a solid film, and then cutting the solid film according to the pattern of the patterned surface to obtain the flexible quantum dot optical filter film.
6. The method of claim 4 or 5, wherein the composite B1 further comprises a reflective film, the reflective film being plated on the edge of the flexible quantum dot filter film; and/or
The optical filter further comprises an antireflection film, and the antireflection film is plated on at least one surface of the complex B3.
7. The method of preparation according to claim 1 or 4, characterized in that the polymer used to form the polymer matrix is a linear polymer, preferably at least one selected from the group consisting of polyvinyl aldol esters, polystyrene, polyethylene terephthalate, polycarbonate, polymethyl methacrylate;
the light transmittance of the flexible quantum dot filter film is more than 80%;
The tensile strength of the flexible quantum dot filter film is more than 20MPa;
The elongation at break of the flexible quantum dot filter film is greater than 30%.
8. A light filter is characterized by comprising a flexible quantum dot light filtering layer, wherein the flexible quantum dot light filtering layer is provided with a plurality of areas with different light filtering wavelengths,
Each region of the flexible quantum dot filter layer is respectively formed by a flexible quantum dot filter film comprising a quantum dot material and a polymer matrix, and
The proportion of the quantum dot material is 80 to 250 mass% relative to 100 mass% of the total mass of the polymer matrix,
Each region of the flexible quantum dot filter layer has a thickness of 20 microns or more and 100 microns or less.
9. A light filter film is characterized by comprising a quantum dot material and a polymer matrix,
The proportion of the quantum dot material is 80 to 250 mass% relative to 100 mass% of the total mass of the polymer matrix,
The thickness of the filter film is 20 micrometers or more and 100 micrometers or less.
10. A method of producing the optical filter according to claim 9, comprising: a coating film is formed using a liquid composition of a quantum dot material comprising the quantum dot material, a polymer and a solvent, and the coating film is solidified to obtain a solid film.
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN118348628A true CN118348628A (en) | 2024-07-16 |
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