CN118068391B - Ion beam divergence angle measuring device and ion beam divergence angle measuring method - Google Patents
Ion beam divergence angle measuring device and ion beam divergence angle measuring method Download PDFInfo
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- 238000010884 ion-beam technique Methods 0.000 title claims abstract description 194
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- 150000002500 ions Chemical class 0.000 claims abstract description 51
- 238000012545 processing Methods 0.000 claims abstract description 49
- 238000005259 measurement Methods 0.000 claims description 32
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- 238000001914 filtration Methods 0.000 claims description 9
- 238000000691 measurement method Methods 0.000 claims description 5
- 238000007493 shaping process Methods 0.000 claims description 3
- 210000002381 plasma Anatomy 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000012216 screening Methods 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/29—Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
- G01T1/2907—Angle determination; Directional detectors; Telescopes
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- H05H1/00—Generating plasma; Handling plasma
- H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
- H05H1/0081—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by electric means
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
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Abstract
The invention provides an ion beam divergence angle measuring device, which comprises: an ion source for generating a beam of ions. The aperture baffle comprises a plurality of apertures for limiting the path of the ion beam, and the position of the ion beam passing through the apertures is a first position. And the microchannel plate is used for amplifying ions in the ion beam current to generate an electron cloud signal. The location where the ion beam hits the microchannel plate is the second location. The anode plate comprises a plurality of anode strips which are distributed at equal intervals and is used for collecting electronic cloud signals and converting the electronic cloud signals into electric signals. And a processing module that generates ion beam divergence angle information based on the first distance and the second distance of the ion beam current in the electrical signal. The first distance is obtained based on the distance between the micro-channel plate and the small hole baffle plate, and the second distance is obtained based on the distance between the horizontal projection position of the first position on the micro-channel plate and the second position. The invention also provides a measuring method of the ion beam divergence angle.
Description
Technical Field
The present invention relates to the field of ion beam divergence angle measurement, and more particularly, to an ion beam divergence angle measurement apparatus and an ion beam divergence angle measurement method.
Background
Accurate measurement of the angle of beam divergence is critical to assessing the resolution and sensitivity of the ground calibration system. The beam divergence angle reflects the spatial distribution and directionality of the ion beam current. By accurately measuring the ion beam divergence angle, the measuring range and the measuring precision of the ground calibration system to the ion beam current can be determined, and the performance of the space plasma detecting instrument can be further evaluated.
The related art images a spot of an ion beam on a phosphor screen or a photodetector based on an optical system by a conventional optical imaging method, and then estimates an angle of a divergence angle of the ion beam by analyzing a shape and a size of the spot.
In the process of implementing the inventive concept, the inventor finds that at least the following problems exist in the related art: the related art relies on external equipment to detect and analyze the physical characteristics of the ion beam, and further processing of the collected data is more difficult to achieve, and information of the ion beam divergence angle is more difficult to extract from the collected data, resulting in lower measurement accuracy of the ion beam divergence angle.
Disclosure of Invention
In view of the above, the present invention provides an ion beam divergence angle measurement apparatus and an ion beam divergence angle measurement method.
According to a first aspect of the present invention, there is provided an ion beam divergence angle measurement apparatus comprising: an ion source for generating a beam of ions. The aperture baffle comprises a plurality of apertures for limiting the path of the ion beam, and the position of the ion beam passing through the apertures is a first position. And the microchannel plate is used for amplifying ions in the ion beam current to generate an electron cloud signal. The position of the micro-channel plate in the ion beam current impact is a second position. The anode plate comprises a plurality of anode strips which are distributed at equal intervals and is used for collecting the electronic cloud signals and converting the electronic cloud signals into electric signals. And a processing module for generating ion beam divergence angle information based on the first distance and the second distance of the ion beam current in the electric signal. And obtaining a first distance based on the distance between the microchannel plate and the orifice baffle, and obtaining a second distance based on the distance between the horizontal projection position of the first position on the microchannel plate and the second position.
According to an embodiment of the present invention, a spacing between the plurality of anode strips of the anode plate is 100-500 μm.
According to an embodiment of the present invention, the orifice shield includes 4 orifices, the 4 orifices are equally spaced and symmetrically distributed on the orifice shield, the orifice has a circular shape, and the diameter of the orifice is 0.1-10mm.
According to an embodiment of the present invention, the microchannel plate comprises a first microchannel plate and a second microchannel plate, the first microchannel plate and the second microchannel plate being stacked.
According to an embodiment of the present invention, the processing module includes a screening sub-module configured to distinguish between noise events and events of the anode plate in the ion beam stream striking the anode plate via an electron cloud formed by the microchannel plate.
According to an embodiment of the present invention, the processing module further includes a signal amplifying circuit for amplifying the electrical signal, and a filtering circuit for shaping and filtering the amplified electrical signal.
According to an embodiment of the present invention, the processing module further includes a power module for generating a power required by the microchannel plate and a power required by the processing module.
According to an embodiment of the present invention, the ion beam divergence angle measurement device further includes an interaction module, where the interaction module is configured to display the ion beam divergence angle information generated by the processing module.
According to an embodiment of the invention, the ion source generates an ion beam having an energy of 250-5000eV.
A second aspect of the present invention provides an ion beam divergence angle measurement method comprising: the ion beam current is obtained by an ion source. The first position of the ion beam flow through the aperture is obtained by the aperture stop. And amplifying ions in the ion beam current through a micro-channel plate to generate an electronic cloud signal, and obtaining a second position based on the position of the micro-channel plate in the ion beam current. The electronic cloud signals are collected through the anode plate, and the electronic cloud signals are converted into electric signals. And generating, by a processing module, ion beam divergence angle information based on the first distance and the second distance of the ion beam current in the electrical signal. And obtaining a first distance based on the distance between the microchannel plate and the orifice baffle, and obtaining a second distance based on the distance between the horizontal projection position of the first position on the microchannel plate and the second position.
According to the embodiment of the invention, the interaction between the ion beam current and the micro-channel plate is directly measured, the measurement error of the ion beam divergence angle caused by external equipment resolution and data processing is reduced, and the rapid measurement of the ion beam divergence angle is realized. In addition, the invention limits the propagation path of the ion beam current based on the small-hole baffle plate, the micro-channel plate amplifies secondary electrons generated by ion impact to form an electron cloud signal, the anode plate can convert the electron cloud signal into an electric signal, and the measuring precision of the ion beam divergence angle is improved based on a plurality of anode strips distributed at equal intervals. In addition, the processing module can receive the electric signals and generate the information of the ion beam divergence angle, so that the complexity of human intervention and data processing is reduced, and the measuring precision of the ion beam divergence angle is improved.
Drawings
The foregoing and other objects, features and advantages of the invention will be apparent from the following description of embodiments of the invention with reference to the accompanying drawings, in which:
fig. 1 is a schematic view showing a structure of an ion beam divergence angle measurement apparatus according to an embodiment of the present invention;
FIG. 2 shows a schematic diagram of the location distribution of orifices on an orifice shield according to an embodiment of the invention;
Fig. 3 shows a schematic diagram of a flight trajectory of an ion beam current according to an embodiment of the present invention;
Fig. 4 shows a schematic structural view of an anode strip according to an embodiment of the present invention;
FIG. 5 shows a schematic diagram of a processing module according to an embodiment of the invention; and
Fig. 6 shows a flow chart of a method of measuring an angle of divergence of an ion beam in accordance with an embodiment of the present invention.
Detailed Description
Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. It should be understood that the description is only illustrative and is not intended to limit the scope of the invention. In the following detailed description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the embodiments of the invention. It may be evident, however, that one or more embodiments may be practiced without these specific details. In addition, in the following description, descriptions of well-known structures and techniques are omitted so as not to unnecessarily obscure the present invention.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The terms "comprises," "comprising," and/or the like, as used herein, specify the presence of stated features, steps, operations, and/or components, but do not preclude the presence or addition of one or more other features, steps, operations, or components.
All terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art unless otherwise defined. It should be noted that the terms used herein should be construed to have meanings consistent with the context of the present specification and should not be construed in an idealized or overly formal manner.
The ground calibration system of the space plasma detecting instrument mainly tests and calibrates the space plasma detecting instrument by generating ion beam current similar to plasma parameters in a space environment through an ion source. The ground calibration system can be used for calibrating the sensitivity, response characteristic and energy resolution of the space plasma detecting instrument, and ensures the normal operation and accurate measurement of the space plasma detecting instrument in space. By accurately measuring the known plasmas on the ground, the measurement error of the space plasma detection instrument can be evaluated, and the display data is corrected to improve the accuracy and the reliability of the data.
In ground scaling systems, the quality of the ion beam current is a key factor affecting the accuracy of the scaling. If the parameter information of the ion beam current cannot be accurately measured, the ground calibration system cannot be effectively calibrated, and a large error can occur in the final measurement result. By comparing the ion beam information measured by the ground calibration system with the known ion beam information, the sensitivity, resolution and accuracy of the ground calibration system can be evaluated, and an important basis is provided for further optimizing the performance of the spatial plasma detection instrument.
Accurate measurement of the angle of beam divergence is critical to assessing the resolution and sensitivity of the ground calibration system. The beam divergence angle reflects the spatial distribution and directionality of the ion beam current. The measuring range and the accuracy of the ground calibration system to the ion beam current are determined by accurately measuring the ion beam divergence angle, so that the performance of the space plasma detecting instrument is evaluated.
The related art images a spot of an ion beam on a phosphor screen or a photodetector based on an optical system by a conventional optical imaging method, and then estimates a divergence angle of the ion beam by analyzing the shape and size of the spot.
In the process of implementing the inventive concept, the inventor finds that at least the following problems exist in the related art: the related art relies on external equipment to detect and analyze the physical characteristics of the ion beam, and further processing of the collected data is more difficult to achieve, and information of the ion beam divergence angle is more difficult to extract from the collected data, resulting in lower measurement accuracy of the ion beam divergence angle.
In view of the foregoing, embodiments of the present invention provide an ion beam divergence angle measurement device.
Fig. 1 shows a schematic structure of an ion beam divergence angle measurement device in accordance with an embodiment of the present invention.
As shown in fig. 1, the ion beam divergence angle measurement apparatus includes an ion source 110, a small aperture baffle 120, a microchannel plate 130, an anode plate 140, and a processing module 150. An ion source 110 for generating a beam of ions. The aperture plate 120 includes a plurality of apertures for restricting the path of the ion beam, and the position of the ion beam passing through the apertures is the first position. The microchannel plate 130 is used for amplifying ions in the ion beam current to generate an electron cloud signal. The location where the ion beam hits the microchannel plate 130 is the second location. The anode plate 140 includes a plurality of anode bars distributed at equal intervals, and is used for collecting an electron cloud signal and converting the electron cloud signal into an electrical signal. And a processing module 150 that generates ion beam divergence angle information based on the first distance and the second distance of the ion beam current in the electron cloud electrical signal. Wherein the first distance is obtained based on the spacing between the microchannel plate 130 and the orifice shield 120, and the second distance is obtained based on the spacing between the position of the horizontal projection of the first position on the microchannel plate 130 and the second position.
According to an embodiment of the present invention, the ion beam divergence angle measurement apparatus may further include an ion accelerator and a focusing module. The ion source 110 may convert atoms or molecules into charged ions and generate a stream of ions. The generated ion beam may pass through an ion accelerator that may accelerate ions in the ion beam to a desired energy range by an electric or magnetic field. After the ions in the ion beam are accelerated, the focusing module is required to focus the ions to a required space range, and the diameter of the ion beam is reduced to a required size, so that the ion beam is ensured to have uniform and symmetrical shape and high consistent directivity.
According to an embodiment of the present invention, the ion beam passes through the aperture in the aperture stop 120 and the position of the ion beam passing through the aperture is marked as the first position. The apertures in the aperture plate 120 may limit the propagation path of the ion beam.
According to the embodiment of the present invention, the ion beam passing through the small holes on the small hole baffle 120 hits the micro channel plate 130, and the ion beam hits the micro channel plate 130 at the second position, and the first distance is obtained based on the distance between the micro channel plate 130 and the small hole baffle 120, and the second distance is obtained based on the distance between the horizontal projection position of the first position on the micro channel plate 130 and the second position. The microchannel plate 130 amplifies secondary electrons generated by ion impact to generate an electron cloud signal.
According to an embodiment of the present invention, the anode plate 140 may collect an electron cloud signal and convert the electron cloud signal into an electrical signal. The anode plate 140 includes a plurality of anode bars, and the positions where the ion beam passes through the aperture and the positions where the ion beam hits the microchannel plate 130, i.e., the first position and the second position, can be accurately distinguished based on the plurality of anode bars equally spaced on the anode plate 140.
In accordance with an embodiment of the present invention, the processing module 150 may be configured to receive the electrical signal and generate ion beam divergence angle information based on the first distance and the second distance of the ion beam current in the electrical signal.
According to the embodiment of the invention, the interaction between the ion beam current and the micro-channel plate is directly measured, the measurement error of the ion beam divergence angle caused by external equipment resolution and data processing is reduced, and the rapid measurement of the ion beam divergence angle is realized. In addition, the invention limits the propagation path of the ion beam current based on the small-hole baffle plate, the micro-channel plate amplifies secondary electrons generated by ion impact to form an electron cloud signal, the anode plate can convert the electron cloud signal into an electric signal, and the measuring precision of the ion beam divergence angle is improved based on a plurality of anode strips distributed at equal intervals. In addition, the processing module can receive the electric signals and generate the information of the ion beam divergence angle, so that the complexity of human intervention and data processing is reduced, and the measuring precision of the ion beam divergence angle is improved.
According to an embodiment of the invention, the ion source generates an ion beam having an energy of 250-5000eV.
According to an embodiment of the invention, the ion source may be a low energy ion source for emitting a low energy ion beam having a predetermined energy. The low-energy ion source has the characteristics of high ion current density and high controllability, and can accurately control the energy and current intensity of the ion beam. The predetermined energy of the ion beam may be 250-5000eV.
According to the embodiment of the invention, the energy of the ion beam is 250-5000eV, and the ion source can provide accurate energy control, so that the divergence angle of the ion beam can be accurately measured.
According to an embodiment of the invention, the orifice shield comprises 4 orifices, the 4 orifices are equally spaced and symmetrically distributed on the orifice shield, the shape of the orifices comprises a circle, and the diameter of the orifices is 0.1-10mm.
According to an embodiment of the present invention, the diameter of the ion beam may be 15mm, and the distance between two adjacent small holes may be 1mm. The ion beam cannot pass through the rest of the aperture stop but can pass through 4 apertures. That is, the ion beam current is blocked by the small hole baffle plate in the propagation process, and only the ion beam current passing through the small hole can continue to propagate.
According to the embodiment of the invention, the aperture baffle can limit the path of the ion beam, is used for fixing and determining the position of the ion beam passing through the aperture, namely the first position, and provides contrast position information for generating ion beam divergence angle information for the processing module.
According to the embodiment of the invention, the plate of the small hole baffle plate can be a stainless steel plate, and the stainless steel plate has the characteristic of low cost and is easy to machine small holes on.
Fig. 2 shows a schematic diagram of the position distribution of the orifices on the orifice shield according to an embodiment of the invention.
As shown in fig. 2,4 symmetrical small holes 121 are machined on the small hole baffle 120 according to a square geometric configuration by using a precision drilling technology based on a plate made of stainless steel, and each small hole is positioned at the vertex of the square, so that the position of the ion beam passing through the small hole baffle can be intuitively determined. The location where the ion beam stream hits the microchannel plate (Microchannel Plate, MCP) after passing through the aperture 2 and hits the microchannel plate after hitting the aperture on the aperture plate is the second location a 2.
According to the embodiment of the invention, through the small holes which are uniformly and symmetrically distributed on the small hole baffle plate, the position of the ion beam passing through the small holes, namely the first position, can be determined, so that the path of the ion beam passing through the small holes is accurately controlled, and the ion beam can keep a preset propagation direction after passing through the small holes.
According to the embodiment of the invention, the microchannel plate has the advantages of high gain, quick response, low noise, high spatial resolution, small volume and the like, can be used for multiplying and amplifying photoelectric signals, converts ion beam information into electronic cloud signals, and can be received by the anode plate.
According to embodiments of the present invention, the microchannel plate may be made of a solid material, such as a circular glass sheet having a thickness of millimeter, and the surface thereof is continuous and uniform, so that continuous transmission of electrons can be ensured. Millions of micro-pore channels are uniformly distributed on the micro-channel plate, and each micro-pore channel can be regarded as an independent electron multiplication channel and can independently amplify electrons. The diameter of the microporous channels may be on the order of microns. The microchannel plate can have a larger effective area to cover a larger space range, so that more electrons can be conveniently received and amplified, and the signal intensity and detection sensitivity generated by the ion beam current are improved.
According to an embodiment of the present invention, in case that ions hit the microchannel plate, the ions generate secondary electrons at the inner wall of the channel of the microchannel plate. These secondary electrons are accelerated by the electric field and collide with other channel walls in the channel, generating more secondary electrons, thus realizing electron multiplication. This process is repeated within each channel, ultimately producing an observable electronic cloud signal.
Fig. 3 shows a schematic diagram of the flight trajectory of an ion beam current according to an embodiment of the present invention.
As shown in fig. 3, a first end point of the real flight trajectory j 1 of the ion beam, that is, a position where the ion beam passes through the aperture, is a first position a 1, and a second end point, that is, a position where the ion beam hits the microchannel plate, is a second position a 2. The second location a 2 does not coincide with the location a 3 of the horizontal projection of the first location a 1 on the microchannel plate because of the divergence angle of the ion beam. The second distance s 2 is derived based on the spacing between the position a 3 of the horizontal projection of the first position a 1 on the microchannel plate and the second position a 2. The calculation formula of the second distance s 2 can be shown as the following formula (1):
（1）
according to an embodiment of the present invention, the first distance s 1 may be obtained based on the spacing between the microchannel plate and the orifice plate. The first distance s 1 may be 1-2mm.
The calculation formula of the ion beam divergence angle can be shown as the following formula (2):
（2）
Wherein: θ is the ion beam divergence angle.
According to an embodiment of the invention, the microchannel plate comprises a first microchannel plate and a second microchannel plate, the first microchannel plate and the second microchannel plate being stacked.
As shown in fig. 3, the microchannel plate 130 includes a first microchannel plate 131 and a second microchannel plate 132, and the first microchannel plate 131 and the second microchannel plate 132 are stacked in a "V" shape. The gain of the microchannel plate 130 may be 10 6~107 based on the first microchannel plate 131 and the second microchannel plate 132.
According to the embodiment of the invention, due to the problem of angle divergence of the ion beam, the position of the ion beam, i.e. the second position, where the ion beam hits the microchannel plate after passing through the aperture of the aperture plate, is deviated from the horizontal projection of the ion beam, i.e. the first position, on the microchannel plate. The second distance may be derived based on a spacing between a location of a horizontal projection of the first location on the microchannel plate and the second location.
According to the embodiment of the invention, the electron multiplication gain can be improved based on the first microchannel plate and the second microchannel plate which are stacked, so that the signal intensity is enhanced, and the sensitivity and the signal-to-noise ratio of the ion beam divergence angle measuring device are improved. Moreover, the first microchannel plate and the second microchannel plate which are stacked can simplify the structure of the ion beam divergence angle measuring device, so that the whole device is more compact and is convenient to integrate into various ion beam divergence angle measuring systems.
According to an embodiment of the present invention, the spacing between the plurality of anode strips of the anode plate is 100-500 μm.
According to the embodiment of the invention, the anode surface can be manufactured based on a gold precipitation process to obtain the anode plate. The anode plate has the characteristics of good conductivity, high reliability and low cost.
According to embodiments of the present invention, an anode plate may be used to collect an electron cloud signal and convert the electron cloud signal into an electrical signal. The anode plate can comprise a plurality of anode strips which are horizontally and parallelly distributed at equal intervals, and the number of the anode strips can be 32, 64 or 128.
According to embodiments of the present invention, the spacing between anode strips may be 100-500 μm so that the anode plates may achieve a positional resolution of 100-500 μm. For example, an electron cloud signal of two ion events 200 μm apart on an anode plate falls on two adjacent anode strips, respectively, the anode plate being able to identify that the two ion events are independent, and that the two ion events come from different ion impact points, respectively. The ion event may be a single or a series of events in which ions in the ion beam strike the anode plate and generate an electron cloud signal.
Fig. 4 shows a schematic structural view of an anode strip according to an embodiment of the present invention.
As shown in fig. 4, a plurality of anode bars may be equally spaced on the anode plate 140 in a single dimension, for example, a plurality of anode bars may be equally spaced along the length of the anode plate. The number of anode bars 141 may be 32, 64 or 128.
According to an embodiment of the present invention, a plurality of anode strips may also be arranged on the anode plate at equal intervals in a two-dimensional dimension. The plurality of anode bars are divided into a first group of anode bars and a second group of anode bars. The two sets of anode strips form an orthogonal array of anode strips. The first groups of anode bars may be arranged at equal intervals along the X-axis direction, and the number of the first groups of anode bars may be 64. The second group of anode bars may be arranged at equal intervals along the Y-axis direction, and the number of the second group of anode bars may be 64. The spacing between the plurality of anode strips in the first set of anode strips and the spacing between the plurality of anode strips in the second set of anode strips may be 300-500 μm such that the anode plate achieves a positional resolution of 100-200 μm.
According to an embodiment of the invention, the anode plate may transmit the electrical signal to the processing module through an electronic connector, wherein the electronic connector may comprise a high density connector.
According to the embodiment of the invention, the measurement accuracy of the ion beam divergence angle and the position resolution which can be realized by the anode plate have a positive correlation. The anode plate of the embodiment of the invention can realize micron-level high position resolution, thereby improving the measurement accuracy of the ion beam divergence angle and reaching the measurement accuracy within 0.1 degree.
Fig. 5 shows a schematic structural diagram of a processing module according to an embodiment of the present invention.
As shown in fig. 5, the processing module 150 includes a multi-channel ASIC (Application-specific integrated circuit) 151, an FPGA (Field-Programmable gate array chip) 152, and a power module 153.
A multi-channel ASIC is an integrated circuit designed for a particular application or task, according to an embodiment of the present invention. Compared with the traditional general integrated circuit, the multi-channel ASIC can provide higher performance and efficiency in specific application, and has the characteristics of high counting rate, multiple channels, small volume, high integration level and the like.
According to an embodiment of the invention, the multi-channel ASIC may be a MaPMT _v20 chip, and the MaPMT _v20 chip may convert the optical signal into an electrical signal. In an ion beam divergence angle measurement device, the MaPMT _v20 chip can receive secondary electron cloud signals generated by the ion beam striking the anode plate and convert these signals into electrical signals.
According to an embodiment of the invention, the processing module comprises a power supply module for generating the power supply required by the microchannel plate and the power supply required by the processing module.
According to the embodiment of the invention, the power module can be integrated in the processing module, and has the characteristics of small volume and high integration level.
According to an embodiment of the present invention, the power module may be composed of a high voltage chip and a direct current power chip. The power module can provide negative high voltage power required by the micro-channel plate and also can provide direct current power required by the processing module.
According to the embodiment of the invention, the power supply module can provide stable and accurate power supply, and is beneficial to realizing high gain of the micro-channel plate and realizing accurate data processing of the processing module. And the design of the power module can reduce the extra external connection and space occupation, so that the processing module is compact and convenient to install and maintain.
According to an embodiment of the present invention, the processing module further comprises a signal amplifying circuit for amplifying the electrical signal, and a filtering circuit for shaping and filtering the amplified electrical signal.
According to an embodiment of the invention, the signal amplifying circuit and the filtering circuit may be integrated in a multi-channel ASIC.
According to the embodiment of the invention, based on the signal amplifying circuit and the filter circuit, the rapid and effective processing of the electric signal can be realized, and the loss and delay of the electric signal in the transmission process are reduced. And the filter circuit can shape and filter the amplified electric signal, thereby being beneficial to removing noise and irregular signals and improving the quality and reliability of the signals.
According to an embodiment of the invention, the processing module includes a screening sub-module for distinguishing between noise events and events of the ion beam stream hitting the anode plate via an electron cloud signal formed by the microchannel plate.
The screening sub-module may also be integrated in a multi-channel ASIC according to embodiments of the present invention.
According to the embodiment of the invention, in the measuring process of the ion beam divergence angle, besides signals generated by the event that the ion beam current hits the anode plate through the electron cloud signals formed by the micro-channel plates, noise signals generated by noise events are also generated. The screening submodule can judge whether the signal is an event that the effective ion beam current hits the anode plate through an electron cloud signal formed by the micro-channel plate by comparing the signal intensity with a preset threshold value. An event is considered a valid event only if the signal strength exceeds a threshold, otherwise it is discriminated as a noise event.
According to an embodiment of the invention, the processing module may further comprise a digital to analog converter DAC, which may be controlled by the FPGA, which outputs a threshold voltage and provides the threshold voltage to the discrimination sub-module. The discrimination sub-module may determine whether the received signal exceeds a particular intensity level, i.e., whether the threshold voltage is exceeded, based on the threshold voltage, and perform subsequent processing. For example, the discrimination submodule discriminates that the voltage of the received signal is greater than or equal to the threshold voltage provided by the DAC, outputs the digital signal 1, and corresponds to an event that the ion beam stream hits the anode plate via an electron cloud signal formed by the microchannel plate. The discrimination submodule discriminates that the voltage of the received signal is smaller than the threshold voltage provided by the DAC, and outputs a digital signal 0 corresponding to the noise event.
According to the embodiment of the invention, the threshold voltage can be set by the screening submodule, so that the measuring device of the ion beam divergence angle can effectively identify the signal generated by the fact that the electron cloud signal formed by the ion beam passing through the microchannel plate hits the anode plate, and the accuracy of signal identification is improved.
According to the embodiment of the invention, the FPGA is internally provided with the pre-programmed hardware logic code, and the ion beam dispersion angle information can be generated based on a signal output by the multi-channel ASIC, the counting rate of events of an electron cloud signal, which is formed by the ion beam passing through the micro-channel plate, hitting the anode plate, and the first distance and the second distance of the ion beam in the electric signal, and based on the formula (2).
According to the embodiment of the invention, the ion beam divergence angle measuring device further comprises an interaction module, and the interaction module is used for displaying the ion beam divergence angle information generated by the processing module.
According to an embodiment of the invention, the interaction module may comprise a communication sub-module. The communication sub-module may be a serial communication interface module using the RS-485 standard. The communication sub-module can transmit the received ion beam divergence angle information data packet which is packaged and sent by the FPGA to the interaction module based on a serial port communication protocol.
According to the embodiment of the invention, after the interaction module receives the ion beam divergence angle information data packet sent by the FPGA package, the interaction module can perform further data interaction based on a processor or a singlechip, a programmable logic device and other systems on a chip so as to display the divergence angle information of the ion beam on an interaction interface in real time, namely, the ion beam divergence angle information is visually displayed. And moreover, a user can modify parameters of the multi-channel ASIC based on the interaction module through the interaction interface, control the FPGA, select a working mode, set threshold voltage required by the screening sub-module, control the gain of the signal amplifying circuit, adjust the filtering parameters of the filtering circuit and the like.
According to the embodiment of the invention, the ion beam divergence angle information can be displayed on the interactive interface in real time based on the interactive module, and the multichannel ASIC and other circuit parameters can be directly modified on the interactive interface based on the interactive module, so that the use flexibility of the ion beam divergence angle measuring device is improved.
Fig. 6 shows a flow chart of a method of measuring an angle of divergence of an ion beam in accordance with an embodiment of the present invention.
As shown in fig. 6, the ion beam divergence angle measurement method of this embodiment includes operations S610 to S650.
In operation S610, an ion beam current is obtained by an ion source.
In operation S620, a first position of the aperture is obtained for the ion beam current through the aperture stop.
In operation S630, ions in the ion beam are amplified by the microchannel plate to generate an electron cloud signal, and a second position is obtained based on the position where the ion beam hits the microchannel plate.
In operation S640, an electron cloud signal is collected by the anode plate and converted into an electrical signal.
In operation S650, ion beam divergence angle information is generated by the processing module based on the first distance and the second distance of the ion beam current in the electrical signal. The first distance is obtained based on the distance between the micro-channel plate and the small hole baffle plate, and the second distance is obtained based on the distance between the horizontal projection position of the first position on the micro-channel plate and the second position.
In accordance with an embodiment of the present invention, an ion source may be activated to generate a beam of ions, the ion source being activated to generate charged particles to form a beam of directed ions.
According to the embodiment of the invention, a plurality of uniformly distributed small holes are designed on the small hole baffle, and the position of the ion beam passing through the small holes, namely the first position, is obtained by using the small hole baffle.
According to the embodiment of the invention, the ion beam current passing through the small holes on the small hole baffle plate can hit the micro-channel plate, the position of the ion beam current hitting the micro-channel plate is a second position, a first distance can be obtained based on the distance between the micro-channel plate and the small hole baffle plate, and a second distance can be obtained based on the distance between the horizontal projection position of the first position on the micro-channel plate and the second position. The microchannel plate amplifies secondary electrons generated by ion impact to form an electron cloud signal.
According to the embodiment of the invention, the anode plate comprises a plurality of anode strips, and the electron cloud signals can be acquired based on the anode plate and converted into electric signals.
According to the embodiment of the invention, the processing module receives the electric signals collected by the anode plate and generates divergence angle information of the ion beam based on the first distance and the second distance information of the ion beam current in the electric signals.
According to the embodiment of the invention, the measuring precision of the ion beam divergence angle can be improved based on the initial position of the ion beam current limited by the small-hole baffle plate, the electronic amplification effect of the micro-channel plate and the accurate signal acquisition capability of the anode plate. Based on the data processing function of the processing module, the ion beam divergence angle information is generated, the complexity of human intervention and data processing is reduced, and the measurement accuracy of the ion beam divergence angle is improved.
Those skilled in the art will appreciate that the features recited in the various embodiments of the invention and/or in the claims may be combined in various combinations and/or combinations, even if such combinations or combinations are not explicitly recited in the invention. In particular, the features recited in the various embodiments of the invention and/or in the claims can be combined in various combinations and/or combinations without departing from the spirit and teachings of the invention. All such combinations and/or combinations fall within the scope of the invention.
The embodiments of the present invention are described above. These examples are for illustrative purposes only and are not intended to limit the scope of the present invention. Although the embodiments are described above separately, this does not mean that the measures in the embodiments cannot be used advantageously in combination. The scope of the invention is defined by the appended claims and equivalents thereof. Various alternatives and modifications can be made by those skilled in the art without departing from the scope of the invention, and such alternatives and modifications are intended to fall within the scope of the invention.
Claims (9)
1. An ion beam divergence angle measurement device, comprising:
An ion source for generating an ion beam current;
The aperture baffle comprises a plurality of apertures for limiting the path of the ion beam, and the position of the ion beam passing through the apertures is a first position;
The microchannel plate is used for amplifying ions in the ion beam current to generate an electron cloud signal; the position of the ion beam which hits the micro-channel plate is a second position;
The anode plate comprises a plurality of anode strips which are distributed at equal intervals, wherein the interval between the plurality of anode strips is 100-500 mu m; the anode plate is used for collecting the electronic cloud signals and converting the electronic cloud signals into electric signals; and
The processing module is used for generating ion beam divergence angle information based on the first distance and the second distance of the ion beam current in the electric signal;
and obtaining a first distance based on the distance between the microchannel plate and the orifice baffle, and obtaining a second distance based on the distance between the horizontal projection position of the first position on the microchannel plate and the second position.
2. The ion beam divergence angle measurement device of claim 1 wherein the aperture plate comprises 4 apertures equally spaced and symmetrically distributed on the aperture plate, the apertures having a shape comprising a circle, the apertures having a diameter of 0.1-10mm.
3. The ion beam divergence angle measurement device of claim 1, wherein the microchannel plate comprises a first microchannel plate and a second microchannel plate, the first microchannel plate and the second microchannel plate being stacked.
4. The ion beam divergence angle measurement device of claim 1, wherein the processing module comprises a discrimination sub-module configured to discriminate between noise events and events of the ion beam stream hitting the anode plate via an electron cloud signal formed by a microchannel plate.
5. The ion beam divergence angle measurement device of claim 4, wherein the processing module further comprises a signal amplifying circuit for amplifying the electrical signal and a filtering circuit for shaping and filtering the amplified electrical signal.
6. The ion beam divergence angle measurement device of claim 1 in which the processing module further comprises a power module for generating a power source required by the microchannel plate and a power source required by the processing module.
7. The apparatus according to claim 1, further comprising an interaction module configured to display the ion beam divergence angle information generated by the processing module.
8. The apparatus according to claim 1, wherein the ion source generates an ion beam current having an energy of 250-5000eV.
9. An ion beam divergence angle measurement method, comprising:
obtaining ion beam current through an ion source;
obtaining a first position of the ion beam current through an aperture baffle;
amplifying ions in the ion beam current through a micro-channel plate to generate an electronic cloud signal, and obtaining a second position based on the position where the ion beam current hits the micro-channel plate;
collecting the electronic cloud signals through an anode plate, and converting the electronic cloud signals into electric signals; and
Generating, by a processing module, ion beam divergence angle information based on a first distance and a second distance of an ion beam current in the electrical signal; wherein, the spacing between the anode strips of the anode plate is 100-500 mu m; and obtaining a first distance based on the distance between the microchannel plate and the orifice baffle, and obtaining a second distance based on the distance between the horizontal projection position of the first position on the microchannel plate and the second position.
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