CN117929786A - Light interference type micro-integrated triaxial acceleration sensing structure and resolving method thereof - Google Patents
Light interference type micro-integrated triaxial acceleration sensing structure and resolving method thereof Download PDFInfo
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- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/18—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration in two or more dimensions
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- G—PHYSICS
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- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/03—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses by using non-electrical means
- G01P15/032—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses by using non-electrical means by measuring the displacement of a movable inertial mass
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Abstract
The invention provides an optical interference type micro-integrated triaxial acceleration sensing structure and a resolving method thereof, wherein the optical interference type micro-integrated triaxial acceleration sensing structure comprises a triaxial acceleration synchronous sensitive structure, an array grating structure and a photoelectric detection array structure which are sequentially arranged from bottom to top; the triaxial acceleration synchronous sensitive structure comprises a fixed frame, a special sensitive elastic beam, a stepped mass block and a reflective film. Has the following advantages: (1) The design responds to and realizes 3 axial acceleration measurements simultaneously by a single sensitive structure, and compared with a conventional sensing system with an array integrated 3-direction acceleration sensing unit, the integration level is further improved. In addition, the measurement result of the invention is more accurate. (2) And an arrayed sensing structure for detecting multi-site displacement on the sensitive structure is constructed by adopting a grating interference type displacement measurement method and combining an array grating structure and a photoelectric detection array structure, so that the integration level of the whole triaxial acceleration sensing module is further improved.
Description
Technical Field
The invention relates to an optical interference type triaxial acceleration sensing structure, in particular to an optical interference type micro-integration triaxial acceleration sensing structure and a resolving method thereof.
Background
The current inertial navigation module mainly composed of the 3-axis acceleration sensor has wide application requirements in the aviation field, the intelligent mechanical field, the consumer electronics field and the like. By measuring the 3-axial acceleration of the moving object, further combining with other motion parameter measurement, fusing and calculating the important information such as the gesture, the speed, the displacement and the like of the moving object, and further finishing the tasks such as motion trail planning, stable control and the like by the feedback of the motion information, the method plays an important role in realizing autonomous navigation, intelligent control and the like of the moving equipment.
The novel acceleration sensing technology based on the optical measurement method has the advantages of high sensitivity, low noise, non-contact response and the like, and particularly, the acceleration sensing structure combining the high-sensitivity optical interference displacement measurement method and the elastic beam-mass block has become an important direction for developing a high-sensitivity acceleration sensor. However, compared with a mature micro-electromechanical system (MEMS) electrical acceleration sensor, the current optical interference acceleration sensor has a gap in miniaturized and integrated application. First, conventional optical interference type displacement measurement is based on an interference optical path and optical elements forming the optical path in a certain space, and is not easily integrated with a mainstream silicon-based micro-sensitive structure, so that the integration level of a single acceleration sensing element is limited. On the other hand, the optical interference displacement measurement principle used for the optical interference type micro acceleration sensor is only sensitive to the out-of-plane displacement of the sensitive structure, so that the acceleration sensor is conveniently applied to the acceleration detection in a single z-axis direction, namely the normal direction of a mass block, and the optical interference measurement method is used for the research work of the displacement measurement of the acceleration in the response plane of the sensitive structure, but a detection light path is required to be aligned with the vertical side plane of the sensitive structure so as to realize the measurement of the out-of-plane response displacement, and the method still limits the integration level of a sensing element. The integration level of the acceleration sensor element applied to a single axial direction is limited, and it is more difficult to implement a micro-integrated sensor system that measures 3 axial accelerations simultaneously.
Disclosure of Invention
Aiming at the defects existing in the prior art, the invention provides an optical interference type micro-integrated triaxial acceleration sensing structure and a resolving method thereof, which can effectively solve the problems.
The technical scheme adopted by the invention is as follows:
The invention provides an optical interference type micro-integrated triaxial acceleration sensing structure, which comprises a triaxial acceleration synchronous sensitive structure, an array grating structure and a photoelectric detection array structure which are sequentially arranged from bottom to top;
The triaxial acceleration synchronous sensitive structure comprises a fixed frame (1), a specific sensitive elastic beam (2), a stepped mass block (3) and a reflective film (4); the number of the specific sensitive elastic beams (2) is four, namely a first specific sensitive elastic beam, a second specific sensitive elastic beam, a third specific sensitive elastic beam and a fourth specific sensitive elastic beam; the number of the reflective films (4) is four, namely a first reflective film, a second reflective film, a third reflective film and a fourth reflective film;
The inside of the fixed frame (1) is suspended with the stepped mass block (3), the positive position point of the upper surface edge X of the stepped mass block (3) is connected with the fixed frame (1) through the first specific sensitive elastic beam, the negative position point of the upper surface edge X of the stepped mass block (3) is connected with the fixed frame (1) through the second specific sensitive elastic beam, the positive position point of the upper surface edge Y of the stepped mass block (3) is connected with the fixed frame (1) through the third specific sensitive elastic beam, and the negative position point of the upper surface edge Y of the stepped mass block (3) is connected with the fixed frame (1) through the fourth specific sensitive elastic beam; the four specific sensitive elastic beams (2) are distributed in an orthogonal direction in a plane and are symmetrical relative to the center of gravity of the step-type mass block (3) at the center of a projection point on the upper surface; a first reflective film covering the area around the X positive locus is arranged on the upper surface of the stepped mass block (3), a second reflective film covering the area around the X negative locus is arranged on the upper surface of the stepped mass block, a third reflective film covering the area around the Y positive locus is arranged on the upper surface of the stepped mass block, and a fourth reflective film covering the area around the Y negative locus is arranged on the upper surface of the stepped mass block;
the array grating structure comprises a grating substrate (5) and a grating (6); the number of the gratings (6) is four, namely a first grating, a second grating, a third grating and a fourth grating; the grating substrate (5) is fixedly arranged above the triaxial acceleration synchronous sensitive structure, the grating substrate (5) is arranged on the surface facing the triaxial acceleration synchronous sensitive structure, the first grating is arranged on the surface facing the first reflecting film, the second grating is arranged on the surface facing the second reflecting film, the third grating is arranged on the surface facing the third reflecting film, and the fourth grating is arranged on the surface facing the fourth reflecting film;
The photoelectric detection array structure comprises a photoelectric substrate (7), a first laser, a first optical detector, a second laser, a second optical detector, a third laser, a third optical detector, a fourth laser and a fourth optical detector; the photoelectric base (7) is arranged above the grating substrate (5), and a parallel cavity is formed between the photoelectric base (7) and the grating substrate (5); the first laser is arranged on the surface of the photoelectric base (7) facing the grating substrate (5), the first light detector is arranged at the diffraction reflection light position of the first grating, the second laser is arranged at the diffraction reflection light position of the second grating, the second light detector is arranged at the diffraction reflection light position of the second grating, the third laser is arranged at the diffraction reflection light position of the third grating, the third light detector is arranged at the diffraction reflection light position of the third grating, the fourth laser is arranged at the diffraction reflection light position of the fourth grating, and the fourth light detector is arranged at the diffraction reflection light position of the fourth grating.
Preferably, one end of each specific sensitive elastic beam (2) is fixedly connected with the fixed frame (1), and the other end of each specific sensitive elastic beam (2) is fixedly connected with the corresponding position of the edge of the upper surface of the stepped mass block (3).
Preferably, the specific sensitive elastic beam (2) is composed of two symmetrical folding elastic beams, the joint of the specific sensitive elastic beam and the step type mass block (3) is a two-sided folding elastic Liang Fenli part, the specific sensitive elastic beam is provided with two connecting points, the distance between the connecting points is not more than 1/10 of the size of the upper surface of the step type mass block (3), and the thickness of each section of straight beam in the specific sensitive elastic beam (2) in the vertical direction is not more than 1/10 of the width.
Preferably, the direction from the connection position with the fixed frame (1) to the connection position with the stepped mass block (3) is taken as an axial direction, and the direction perpendicular to the axial direction is transverse to the plane of the specific sensitive elastic beam (2); the direction perpendicular to the plane where the specific sensitive elastic beam (2) is positioned is a normal direction;
aiming at normal bending deformation, folding elastic beams at two sides are connected in parallel, and the formed specific sensitive elastic beam (2) presents certain bending rigidity;
For transverse bending deformation, the folding elastic beams on two sides are insensitive to transverse bending, and the formed specific sensitive elastic beam (2) can neglect transverse bending deformation under normal load;
For torsional deformation, the folding elastic beams on two sides are connected in series, and the torsional rigidity of the specific sensitive elastic beam (2) relative to a torsion angle is extremely small because the space between the folding elastic beams and the discrete connecting points of the stepped mass block (3) is small;
For axial deformation, the thickness of each section of straight beam in the folded elastic beam is far smaller than the width, the normal bending stiffness of the folded elastic beam is far smaller than the transverse bending stiffness, and the axial deformation stiffness of the formed specific sensitive elastic beam (2) is far greater than the normal bending stiffness.
Preferably, the step mass block (3) sequentially comprises a reflection surface reinforcing step (301), a connecting step (302) and a sinking step (303) from top to bottom;
the upper surface of the reflecting surface reinforcing step (301) is connected with the special sensitive elastic beam (2) and has a certain thickness so as to ensure that the surface of a connecting point area is flat when the special sensitive elastic beam (2) is acted;
The horizontal section size of the connecting step (302) is smaller than that of the reflecting surface reinforcing step (301) and the sinking step (303);
the horizontal section size of the sinking step (303) is larger than that of the reflecting surface reinforcing step (301).
Preferably, the planar shape of the stepped mass block (3) is axisymmetric relative to the orthogonal directions of the 4 specific sensitive elastic beams (2).
Preferably, the fixing frame (1), the specific sensitive elastic beam (2) and the reflecting surface reinforcing step (301) in the step type mass block (3) are integrated structures processed and manufactured on the same substrate, and the materials are elastic materials.
Preferably, the grating substrate (5) is a light-transmitting bottom plate, and the grating (6) is a one-dimensional grating; the grating stripes of the first grating, the second grating, the third grating and the fourth grating are staggered by a certain angle.
The invention also provides a resolving method based on the optical interference type micro-integrated triaxial acceleration sensing structure, which comprises the following steps:
step 1, a first laser, a first optical detector, a second laser, a second optical detector, a third laser, a third optical detector, a fourth laser and a fourth optical detector are all connected to a photoelectric detection circuit;
the first reflective film and a first grating right above form a first grating interference cavity; the second reflective film and a second grating right above form a second grating interference cavity; the third reflective film and a third grating right above form a third grating interference cavity; the fourth reflecting film and a fourth grating right above form a fourth grating interference cavity;
Step 2, powering on the optical interference type micro-integrated triaxial acceleration sensing structure; each laser and the optical detector work simultaneously, the first laser emits a coherent light source, the coherent light source reaches the first grating interference cavity and is reflected and diffracted to be received by the first optical detector, the first optical detector detects an interference light signal, and an X forward voltage signal V x+ is output through the photoelectric detection circuit; the interference optical signal measured by the first optical detector represents the normal displacement of the forward position point of the edge X of the upper surface of the stepped mass block (3);
Meanwhile, a second laser emits a coherent light source, reaches a second grating interference cavity, reflects and diffracts the coherent light source to be received by a second light detector, and an interference light signal is measured by the second light detector and is output to an X-negative voltage signal V x- through a photoelectric detection circuit; the interference optical signal measured by the second optical detector represents the normal displacement of the X-negative locus of the edge of the upper surface of the stepped mass block (3);
meanwhile, the third laser emits a coherent light source, reaches the third grating interference cavity, reflects and diffracts the coherent light source to be received by the third light detector, and the third light detector detects an interference light signal and outputs a Y forward voltage signal V y+ through a photoelectric detection circuit; the interference light signal measured by the third light detector represents the normal displacement of the positive position point of the edge Y of the upper surface of the stepped mass block (3);
meanwhile, a fourth laser emits a coherent light source, reaches a fourth grating interference cavity, reflects and diffracts the coherent light source to be received by a fourth light detector, and outputs a Y negative voltage signal V y- through a photoelectric detection circuit after the fourth light detector detects an interference light signal; the interference light signal measured by the fourth light detector represents the normal displacement of the Y negative locus of the edge of the upper surface of the stepped mass block (3);
Step 3, respectively resolving the X positive voltage signal V x+, the X negative voltage signal V x-, the Y positive voltage signal V y+ and the Y negative voltage signal V y- to obtain a normal displacement measurement value S x+ of an X positive locus, a normal displacement measurement value S x- of an X negative locus, a normal displacement measurement value S y+ of a Y positive locus and a normal displacement measurement value S y- of a Y negative locus on the edge of the upper surface of the step mass block (3);
step 4, pre-calibration measurement is performed to obtain a mapping matrix K between the triaxial acceleration to be measured and the normal displacement of each directional locus, and the normal displacement measurement value of each directional locus is calculated according to the following formula to obtain a triaxial acceleration measurement value, which comprises the following steps: x-axis acceleration measurement a x, Y-axis acceleration measurement a y, and Z-axis acceleration measurement a z:
Wherein:
k x+ is the proportionality coefficient of the X-axis acceleration measurement value A x to generate the X-direction locus displacement S x+ of the upper surface of the step mass block; k x- is the proportionality coefficient of the X-axis acceleration measurement value A x to generate the X-negative locus displacement S x- of the upper surface of the stepped mass block; k zx+ is the proportionality coefficient of the positive displacement S x+ of the X-direction locus of the upper surface of the step mass block generated by the action of the Z-axis acceleration measurement value A z; k zx- is the proportionality coefficient of the X negative locus displacement S x- of the upper surface of the step mass block generated by the action of the Z-axis acceleration measurement value A z; k y+ is the proportionality coefficient of the Y-axis acceleration measurement value A y to generate the Y-direction locus displacement S y+ of the upper surface of the stepped mass block; k y- is the proportionality coefficient of the Y-axis acceleration measurement value A y to generate the Y-direction locus displacement S y- of the upper surface of the stepped mass block; k zy- is the proportionality coefficient of the displacement S y- of the negative locus of the upper surface Y of the step mass block generated by the action of the Z-axis acceleration measurement value A z; k zy+ is the proportionality coefficient of the positive displacement S y+ of the upper surface Y of the step mass generated by the action of the Z-axis acceleration measured value A z.
The optical interference type micro-integrated triaxial acceleration sensing structure and the resolving method thereof provided by the invention have the following advantages:
(1) The acceleration sensitive structure formed by combining the specific sensitive elastic beam and the step type mass block simultaneously responds to triaxial acceleration and is converted into normal displacement of the upper surface of the mass block, then, the non-contact optical interferometry displacement measurement method capable of measuring point displacement is combined to measure displacements of different points on the upper surface of the mass block, and simultaneously, the obtained multiple measurement data are synchronously solved to obtain 3 axial acceleration measurement values. In addition, the measurement result of the invention is more accurate.
(2) And an arrayed sensing structure for detecting multi-site displacement on the sensitive structure is constructed by adopting a grating interference type displacement measurement method and combining an array grating structure and a photoelectric detection array structure, so that the integration level of the whole triaxial acceleration sensing module is further improved.
Drawings
FIG. 1 is a cross-sectional view of an optical interference type micro-integrated triaxial acceleration sensing structure according to the present invention;
FIG. 2 is a top view of a triaxial acceleration synchronization sensitive structure provided by the present invention;
FIG. 3 is a cross-sectional view of a triaxial acceleration synchronization sensitive structure provided by the present invention;
FIG. 4 is a schematic diagram of deformation of a specific sensitive elastic beam provided by the invention;
FIG. 5 is a schematic diagram of the three-axis acceleration synchronous sensitive structure principle provided by the invention;
FIG. 6 is a bottom view of an array grating structure according to the present invention;
FIG. 7 is a schematic diagram of a three-axis acceleration calculation method according to the present invention;
Fig. 8 is a schematic diagram of 4 displacement measurement sites in the triaxial acceleration resolving method according to the present invention.
In the figure: 1-a fixed frame; 2-a specific sensitive elastic beam; 3-a step mass block; 301-a reflective surface reinforcing step; 302-connecting steps; 303-sinking step; 4-a reflective film; 5-grating substrate; 6-grating; 7-an optoelectronic substrate; 8-a laser; 9-photodetector.
Detailed Description
In order to make the technical problems, technical schemes and beneficial effects solved by the invention more clear, the invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
The invention provides an optical interference type micro-integrated triaxial acceleration sensing structure, which comprises a triaxial acceleration synchronous sensitive structure, an array grating structure and a photoelectric detection array structure which are sequentially arranged from bottom to top as shown in figure 1.
In the invention, as shown in fig. 2 and 3, the triaxial acceleration synchronous sensitive structure comprises a fixed frame 1, a specific sensitive elastic beam 2, a stepped mass block 3 and a reflective film 4; the number of the specific sensitive elastic beams 2 is four, namely a first specific sensitive elastic beam, a second specific sensitive elastic beam, a third specific sensitive elastic beam and a fourth specific sensitive elastic beam; the number of the reflective films 4 is four, namely a first reflective film, a second reflective film, a third reflective film and a fourth reflective film;
The inside of the fixed frame 1 is suspended with the stepped mass block 3, the positive position point of the upper surface edge X of the stepped mass block 3 is connected with the fixed frame 1 through the first specific sensitive elastic beam, the negative position point of the upper surface edge X of the stepped mass block 3 is connected with the fixed frame 1 through the second specific sensitive elastic beam, the positive position point of the upper surface edge Y of the stepped mass block 3 is connected with the fixed frame 1 through the third specific sensitive elastic beam, and the negative position point of the upper surface edge Y of the stepped mass block 3 is connected with the fixed frame 1 through the fourth specific sensitive elastic beam; therefore, one end of each specific sensitive elastic beam 2 is fixedly connected with the fixed frame 1, and the other end of each specific sensitive elastic beam 2 is fixedly connected with the corresponding position of the edge of the upper surface of the stepped mass block 3.
The four specific sensitive elastic beams 2 are distributed in an orthogonal direction in a plane and are centrally symmetrical relative to a projection point of the gravity center of the step-type mass block 3 on the upper surface; a first reflective film covering the area around the X positive locus, a second reflective film covering the area around the X negative locus, a third reflective film covering the area around the Y positive locus and a fourth reflective film covering the area around the Y negative locus are arranged on the upper surface of the stepped mass block 3; wherein, the surrounding area of each position point is the connection area of the step mass block 3 and each specific sensitive elastic beam.
Specifically, the specific sensitive elastic beam 2 is formed by two symmetrical folding elastic beams, the joint of the specific sensitive elastic beam 2 and the stepped mass block 3 is a two-sided folding elastic Liang Fenli part, the specific sensitive elastic beam is provided with two connecting points, the distance between the connecting points is not more than 1/10 of the size of the upper surface of the stepped mass block 3, and the thickness of each section of straight beam in the specific sensitive elastic beam 2 in the vertical direction is not more than 1/10 of the width.
The stiffness characteristics of the specific sensitive elastic beam 2 in all directions of the present invention are shown in fig. 4: the integral special sensitive elastic beam 2 takes the direction from the connection position with the fixed frame 1 to the connection position with the stepped mass block 3 as the axial direction, and the direction perpendicular to the axial direction is transverse to the plane of the special sensitive elastic beam 2; the direction perpendicular to the plane where the specific sensitive elastic beam 2 is positioned is a normal direction;
aiming at normal bending deformation, folding elastic beams on two sides are connected in parallel, and a formed special sensitive elastic beam 2 presents certain bending rigidity; for transverse bending deformation, the folding elastic beams on two sides are insensitive to transverse bending, and the formed special sensitive elastic beam 2 can neglect transverse bending deformation under the conventional load; for torsional deformation, the folding elastic beams on two sides are connected in series, and the torsional rigidity of the formed specific sensitive elastic beam 2 relative to the torsion angle is extremely small because the space between the folding elastic beams and the discrete connecting points of the stepped mass block 3 is extremely small; for axial deformation, the thickness of each section of straight beam in the folded elastic beam is far smaller than the width, the normal bending rigidity of the folded elastic beam is far smaller than the transverse bending rigidity, and the axial deformation rigidity of the formed special sensitive elastic beam 2 is far greater than the normal bending rigidity.
In the invention, the stepped mass block 3 sequentially comprises a reflection surface reinforcing step 301, a connecting step 302 and a sinking step 303 from top to bottom;
The upper surface of the reflection surface reinforcing step 301 is connected with the specific sensitive elastic beam 2, and has a certain thickness so as to ensure that the surface of the connection point area is flat when the specific sensitive elastic beam 2 is acted;
The horizontal section size of the connecting step 302 is smaller than the reflective surface reinforcing step 301 and the sinking step 303; the horizontal cross-sectional dimension of the sinking step 303 is larger than that of the reflecting surface reinforcing step 301. Therefore, the connection step 302 having a smaller horizontal sectional size connects the reflection surface reinforcing step 301 and the sinking step 303, and the sinking step 303 has a larger horizontal sectional size and thickness to lower the gravity center position of the stepped mass 3.
The planar shape of the stepped mass block 3 is axisymmetric with respect to the orthogonal directions of the 4 specific sensitive elastic beams 2, and may be square, regular octagon, circular, etc.
In the three-axis acceleration synchronous sensitive structure, at least the fixed frame 1, the specific sensitive elastic beam 2 and the reflecting surface reinforced step 301 in the step mass block 3 are integrated structures manufactured on the same substrate, and the materials can be high-quality elastic materials such as silicon, metal and the like.
The principle of the triaxial acceleration synchronous sensitive structure is shown in fig. 5, when the z-axis acceleration in the vertical direction acts on the sensitive structure, the normal inertia force acts on the stepped mass block, and 4 specific sensitive elastic Liang Juntong are bent towards the directions to achieve balance, so that the upper surface of the stepped mass block generates normal translation; when the acceleration of the x axis (y axis) in the plane direction acts on the sensitive structure, the transverse inertia force acts on the lower heavy center of the stepped mass block, so as to achieve balance, the two opposite special sensitive elastic beams in the x axis (y axis) direction are reversely bent, the opposite force acts on the connection of the two edges of the upper surface of the stepped mass block and form moment balance with the transverse inertia force, meanwhile, the two opposite special sensitive elastic beams in the y axis (x axis) direction apply the acting force opposite to the transverse inertia force direction on the connection of the two edges of the upper surface of the stepped mass block, but the special sensitive elastic beams are insensitive to the transverse force, the transverse bending deformation is negligible, the upper surface of the stepped mass block rotates around the y axis (x axis) direction, at the moment, the torsional rigidity of the two opposite special sensitive elastic beams in the y axis (x axis) direction generated by the rotation of the stepped mass block is extremely low, and finally the normal displacement of the special elastic beams in the connection of the upper surface of the stepped mass block and the two opposite special sensitive elastic beams in the x axis (y axis) direction is negligible.
The array grating structure comprises a grating substrate 5 and a grating 6; as shown in fig. 6, the number of the gratings 6 is four, which are respectively a first grating, a second grating, a third grating and a fourth grating; the grating stripes of the first grating, the second grating, the third grating and the fourth grating are staggered by a certain angle. The grating substrate 5 is fixedly arranged above the triaxial acceleration synchronous sensitive structure, the first grating is arranged on the surface facing the triaxial acceleration synchronous sensitive structure, the second grating is arranged on the surface facing the first reflecting film, the third grating is arranged on the surface facing the third reflecting film, and the fourth grating is arranged on the surface facing the fourth reflecting film;
Specifically, the grating substrate 5 is a light-transmitting bottom plate, the grating 6 is a semi-transparent semi-reflective one-dimensional diffraction grating on the surface of the grating substrate facing the triaxial acceleration synchronous sensitive structure, and is divided into 4 areas according to the connection areas of the 4 special sensitive elastic beams corresponding to the upper surface of the stepped mass block in the triaxial acceleration synchronous sensitive structure, grating stripes of the areas are staggered for a certain angle to form grating arrays capable of staggering diffraction planes, and a parallel cavity is formed by providing a support structure at the edge between the lower surface of the array grating structure and the upper surface of the stepped mass block in the triaxial acceleration synchronous sensitive structure opposite to the lower surface by the grating substrate 5 or the fixed frame 1.
The photoelectric detection array structure comprises a photoelectric substrate 7, a first laser, a first light detector, a second laser, a second light detector, a third laser, a third light detector, a fourth laser and a fourth light detector;
The photoelectric base 7 is arranged above the grating substrate 5, and a parallel cavity is formed between the photoelectric base 7 and the grating substrate 5; the surface of the photoelectric base 7 facing the grating substrate 5 is provided with the first laser at the surface facing the first reflecting film, the first laser detector at the diffraction reflection light position of the first grating, the second laser at the diffraction reflection light position of the second reflecting film, the second laser at the diffraction reflection light position of the second grating, the third laser at the diffraction reflection light position of the third reflecting film, the third laser at the diffraction reflection light position of the third grating, the fourth laser at the diffraction reflection light position of the fourth reflecting film, and the fourth photodetector at the diffraction reflection light position of the fourth grating.
Specifically, the lasers 8 and the light detectors 9 of each group are arranged on a photoelectric assembly plane of the photoelectric substrate 7 facing the array grating structure and are electrically connected, and a support structure is provided by the photoelectric substrate 7 at the edge between the photoelectric assembly plane and the upper surface of the opposite grating substrate to form a parallel cavity; the total of 4 groups of lasers 8 and light detectors 9 form an array, each laser 8 is vertically opposite to the reflecting film 4 of the connecting area of the step mass block 3 and the special sensitive elastic beam 2 in the triaxial acceleration synchronous sensitive structure, and each light detector 9 is positioned at a position for receiving reflected light diffracted by the one-dimensional grating opposite to the area.
In the micro-integrated triaxial acceleration sensing structure, the assembly of each layer of structure can be realized by adopting a micro-structure bonding process, and can also be realized by adopting a conventional bonding or other mechanical assembly processes.
The integral sensing principle of the micro-integrated triaxial acceleration sensing structure is as follows: by combining the principle of the triaxial acceleration synchronous sensitive structure, three axial accelerations are converted into normal displacement of the connection point of the upper surface of the stepped mass block and the 4 special sensitive elastic beams by the sensitive structure, a typical grating interference cavity is formed by the reflective films of the 4 connection areas and the one-dimensional grating right above, a typical grating interference measuring structure is formed by combining lasers and detectors corresponding to all areas in the array, coherent light emitted by the lasers reaches the grating interference cavity and reflected diffraction is received by corresponding light detectors, interference light intensity signals measured by the light detectors are modulated by the cavity length of the grating interference cavity, and the normal displacement of 4 edge areas of the stepped mass block can be represented by combining fixed grating planes and interference light intensity signals measured by the light detectors in the 4 arrays.
The method for synchronously calculating the triaxial acceleration by the sensing signals based on the micro-integrated triaxial acceleration sensing structure is shown in fig. 7, and specifically comprises the following steps:
Step 1, a first laser, a first optical detector, a second laser, a second optical detector, a third laser, a third optical detector, a fourth laser and a fourth optical detector are all connected to a photoelectric detection circuit; the photoelectric detection circuit is a conventional photoelectric detection circuit and comprises a laser driving circuit, a photodetector signal conversion circuit, a necessary signal conditioning circuit and a power supply voltage stabilizing circuit.
The first reflective film and a first grating right above form a first grating interference cavity; the second reflective film and a second grating right above form a second grating interference cavity; the third reflective film and a third grating right above form a third grating interference cavity; the fourth reflecting film and a fourth grating right above form a fourth grating interference cavity;
Step 2, powering on the optical interference type micro-integrated triaxial acceleration sensing structure; and switching on the power supply, transmitting a coherent light source by each laser, receiving returned interference light signals for detecting the cavity length of each position grating interference cavity by the corresponding 4 detectors, and outputting 4 voltage signals by a detection circuit, wherein V x+、Vx-、Vy+、Vy- is the same as the voltage signal.
Specifically, each laser and the optical detector work simultaneously, the first laser emits a coherent light source, the coherent light source reaches the first grating interference cavity and is reflected and diffracted to be received by the first optical detector, the first optical detector detects an interference light signal, and an X forward voltage signal V x+ is output through the photoelectric detection circuit; wherein, the interference light signal measured by the first light detector represents the normal displacement of the positive position point of the edge X of the upper surface of the stepped mass block 3;
Meanwhile, a second laser emits a coherent light source, reaches a second grating interference cavity, reflects and diffracts the coherent light source to be received by a second light detector, and an interference light signal is measured by the second light detector and is output to an X-negative voltage signal V x- through a photoelectric detection circuit; wherein, the interference light signal measured by the second light detector represents the normal displacement of the X-negative locus of the edge of the upper surface of the stepped mass block 3;
Meanwhile, the third laser emits a coherent light source, reaches the third grating interference cavity, reflects and diffracts the coherent light source to be received by the third light detector, and the third light detector detects an interference light signal and outputs a Y forward voltage signal V y+ through a photoelectric detection circuit; the interference light signal measured by the third light detector represents the normal displacement of the Y forward locus of the edge of the upper surface of the stepped mass block 3;
Meanwhile, a fourth laser emits a coherent light source, reaches a fourth grating interference cavity, reflects and diffracts the coherent light source to be received by a fourth light detector, and outputs a Y negative voltage signal V y- through a photoelectric detection circuit after the fourth light detector detects an interference light signal; the interference light signal measured by the fourth light detector represents the normal displacement of the Y-direction locus of the edge of the upper surface of the stepped mass block 3;
Step 3, respectively resolving the X positive voltage signal V x+, the X negative voltage signal V x-, the Y positive voltage signal V y+ and the Y negative voltage signal V y- to obtain a normal displacement measurement value S x+ of an X positive locus, a normal displacement measurement value S x- of an X negative locus, a normal displacement measurement value S y+ of a Y positive locus and a normal displacement measurement value S y- of a Y negative locus on the edge of the upper surface of the stepped mass block 3;
as shown in fig. 8, since the 4 voltage signals V x+、Vx-、Vy+、Vy- are normal displacement measurement signals corresponding to x+, x-, y+, y-4 sites on the upper surface of the stepped mass, the normal displacement measurement values S x+、Sx-、Sy+、Sy- of the 4 sites are calculated by combining the 4 voltage signals V x+、Vx-、Vy+、Vy- with the previous calibration data of the sensor.
Specifically, the method for calculating the measured displacement by the output voltage signal adopts a conventional grating interference type displacement sensor signal calculating method, and is not described herein.
Step 4, calculating triaxial acceleration measurement values from the normal displacement measurement values of 4 loci:
The method comprises the steps of obtaining a mapping matrix K between triaxial acceleration to be measured and normal displacement of each directional site through pre-calibration measurement, and specifically obtaining the mapping matrix K between triaxial acceleration to be measured and normal displacement measurement values S x+、Sx-、Sy+、Sy- of the normal displacement of 4 sites according to a sensitivity theory of a triaxial acceleration synchronous sensitive structure and an experimental calibration method:
Specifically, the mapping matrix K is based on the sensitivity principle of the triaxial acceleration synchronous sensitive structure and the rigidity characteristic of the specific sensitive elastic beams, the normal bending deformation of the specific sensitive elastic beams in 4 orthogonal directions is mainly caused by the step type mass blocks, the normal displacement of the connection sites between each specific sensitive elastic beam and the edge of the step type mass blocks is correspondingly generated, and in the elastic deformation range of each specific sensitive elastic beam, the effect generated by the 3 axial accelerations is approximately in a linear superposition relationship, as shown in the following equation.
Wherein:
k x+ is the proportionality coefficient of the X-axis acceleration measurement value A x to generate the X-direction locus displacement S x+ of the upper surface of the step mass block; k x- is the proportionality coefficient of the X-axis acceleration measurement value A x to generate the X-negative locus displacement S x- of the upper surface of the stepped mass block; k zx+ is the proportionality coefficient of the positive displacement S x+ of the X-direction locus of the upper surface of the step mass block generated by the action of the Z-axis acceleration measurement value A z; k zx- is the proportionality coefficient of the X negative locus displacement S x- of the upper surface of the step mass block generated by the action of the Z-axis acceleration measurement value A z; k y+ is the proportionality coefficient of the Y-axis acceleration measurement value A y to generate the Y-direction locus displacement S y+ of the upper surface of the stepped mass block; k y- is the proportionality coefficient of the Y-axis acceleration measurement value A y to generate the Y-direction locus displacement S y- of the upper surface of the stepped mass block; k zy- is the proportionality coefficient of the displacement S y- of the negative locus of the upper surface Y of the step mass block generated by the action of the Z-axis acceleration measurement value A z; k zy+ is the proportionality coefficient of the positive displacement S y+ of the upper surface Y of the step mass generated by the action of the Z-axis acceleration measured value A z.
According to the above, the normal displacement measurement value of each directional locus is calculated to obtain a triaxial acceleration measurement value, which comprises: x-axis acceleration measurement A x, Y-axis acceleration measurement A y, and Z-axis acceleration measurement A z.
All the calculation operations in the steps (3) and (4) are performed in a computer, a singlechip and other equipment with the required digital signal processing operation function.
The invention relates to an optical interference type micro-integrated triaxial acceleration sensing structure and a resolving method thereof, which have the following advantages:
(1) The acceleration sensitive structure formed by combining the specific sensitive elastic beam and the step type mass block simultaneously responds to triaxial acceleration and is converted into normal displacement of the upper surface of the mass block, then, the non-contact optical interferometry displacement measurement method capable of measuring point displacement is combined to measure displacements of different points on the upper surface of the mass block, and simultaneously, the obtained multiple measurement data are synchronously solved to obtain 3 axial acceleration measurement values. In addition, the measurement result of the invention is more accurate.
(2) And an arrayed sensing structure for detecting multi-site displacement on the sensitive structure is constructed by adopting a grating interference type displacement measurement method and combining an array grating structure and a photoelectric detection array structure, so that the integration level of the whole triaxial acceleration sensing module is further improved.
The foregoing is merely a preferred embodiment of the present invention and it should be noted that modifications and adaptations to those skilled in the art may be made without departing from the principles of the present invention, which is also intended to be covered by the present invention.
Claims (9)
1. The light interference type micro-integrated triaxial acceleration sensing structure is characterized by comprising a triaxial acceleration synchronous sensitive structure, an array grating structure and a photoelectric detection array structure which are sequentially arranged from bottom to top;
The triaxial acceleration synchronous sensitive structure comprises a fixed frame (1), a specific sensitive elastic beam (2), a stepped mass block (3) and a reflective film (4); the number of the specific sensitive elastic beams (2) is four, namely a first specific sensitive elastic beam, a second specific sensitive elastic beam, a third specific sensitive elastic beam and a fourth specific sensitive elastic beam; the number of the reflective films (4) is four, namely a first reflective film, a second reflective film, a third reflective film and a fourth reflective film;
The inside of the fixed frame (1) is suspended with the stepped mass block (3), the positive position point of the upper surface edge X of the stepped mass block (3) is connected with the fixed frame (1) through the first specific sensitive elastic beam, the negative position point of the upper surface edge X of the stepped mass block (3) is connected with the fixed frame (1) through the second specific sensitive elastic beam, the positive position point of the upper surface edge Y of the stepped mass block (3) is connected with the fixed frame (1) through the third specific sensitive elastic beam, and the negative position point of the upper surface edge Y of the stepped mass block (3) is connected with the fixed frame (1) through the fourth specific sensitive elastic beam; the four specific sensitive elastic beams (2) are distributed in an orthogonal direction in a plane and are symmetrical relative to the center of gravity of the step-type mass block (3) at the center of a projection point on the upper surface; a first reflective film covering the area around the X positive locus is arranged on the upper surface of the stepped mass block (3), a second reflective film covering the area around the X negative locus is arranged on the upper surface of the stepped mass block, a third reflective film covering the area around the Y positive locus is arranged on the upper surface of the stepped mass block, and a fourth reflective film covering the area around the Y negative locus is arranged on the upper surface of the stepped mass block;
the array grating structure comprises a grating substrate (5) and a grating (6); the number of the gratings (6) is four, namely a first grating, a second grating, a third grating and a fourth grating; the grating substrate (5) is fixedly arranged above the triaxial acceleration synchronous sensitive structure, the grating substrate (5) is arranged on the surface facing the triaxial acceleration synchronous sensitive structure, the first grating is arranged on the surface facing the first reflecting film, the second grating is arranged on the surface facing the second reflecting film, the third grating is arranged on the surface facing the third reflecting film, and the fourth grating is arranged on the surface facing the fourth reflecting film;
The photoelectric detection array structure comprises a photoelectric substrate (7), a first laser, a first optical detector, a second laser, a second optical detector, a third laser, a third optical detector, a fourth laser and a fourth optical detector; the photoelectric base (7) is arranged above the grating substrate (5), and a parallel cavity is formed between the photoelectric base (7) and the grating substrate (5); the first laser is arranged on the surface of the photoelectric base (7) facing the grating substrate (5), the first light detector is arranged at the diffraction reflection light position of the first grating, the second laser is arranged at the diffraction reflection light position of the second grating, the second light detector is arranged at the diffraction reflection light position of the second grating, the third laser is arranged at the diffraction reflection light position of the third grating, the third light detector is arranged at the diffraction reflection light position of the third grating, the fourth laser is arranged at the diffraction reflection light position of the fourth grating, and the fourth light detector is arranged at the diffraction reflection light position of the fourth grating.
2. The light interference type micro-integrated triaxial acceleration sensing structure according to claim 1, wherein one end of each specific sensitive elastic beam (2) is fixedly connected with the fixed frame (1), and the other end of each specific sensitive elastic beam (2) is fixedly connected with the corresponding position of the upper surface edge of the step mass block (3).
3. The light interference type micro-integrated triaxial acceleration sensing structure according to claim 1, wherein the specific sensitive elastic beam (2) is composed of two symmetrical folding elastic beams, the joint of the specific sensitive elastic beam and the stepped mass block (3) is a two-sided folding elastic Liang Fenli part, two connecting points are arranged, the distance between the connecting points is not more than 1/10 of the upper surface size of the stepped mass block (3), and the thickness of each section of straight beam in the specific sensitive elastic beam (2) in the vertical direction is not more than 1/10 of the width.
4. A light interference type micro-integrated triaxial acceleration sensing structure according to claim 3, characterized in that the direction from the connection with the fixed frame (1) to the connection with the stepped mass block (3) is axial, and the direction perpendicular to the axial direction is transverse to the plane of the specific sensitive elastic beam (2); the direction perpendicular to the plane where the specific sensitive elastic beam (2) is positioned is a normal direction;
aiming at normal bending deformation, folding elastic beams at two sides are connected in parallel, and the formed specific sensitive elastic beam (2) presents certain bending rigidity;
For transverse bending deformation, the folding elastic beams on two sides are insensitive to transverse bending, and the formed specific sensitive elastic beam (2) can neglect transverse bending deformation under normal load;
For torsional deformation, the folding elastic beams on two sides are connected in series, and the torsional rigidity of the specific sensitive elastic beam (2) relative to a torsion angle is extremely small because the space between the folding elastic beams and the discrete connecting points of the stepped mass block (3) is small;
For axial deformation, the thickness of each section of straight beam in the folded elastic beam is far smaller than the width, the normal bending stiffness of the folded elastic beam is far smaller than the transverse bending stiffness, and the axial deformation stiffness of the formed specific sensitive elastic beam (2) is far greater than the normal bending stiffness.
5. The light interference type micro-integrated triaxial acceleration sensing structure according to claim 1, characterized in that the stepped mass block (3) comprises a reflection surface reinforcing step (301), a connecting step (302) and a sinking step (303) from top to bottom in sequence;
the upper surface of the reflecting surface reinforcing step (301) is connected with the special sensitive elastic beam (2) and has a certain thickness so as to ensure that the surface of a connecting point area is flat when the special sensitive elastic beam (2) is acted;
The horizontal section size of the connecting step (302) is smaller than that of the reflecting surface reinforcing step (301) and the sinking step (303);
the horizontal section size of the sinking step (303) is larger than that of the reflecting surface reinforcing step (301).
6. The light interference type micro-integrated triaxial acceleration sensing structure according to claim 5, characterized in that the planar shape of the stepped mass block (3) is axisymmetric with respect to the orthogonal directions of the 4 specific sensitive elastic beams (2).
7. The light interference type micro-integrated triaxial acceleration sensing structure according to claim 5, characterized in that the reflective surface reinforcing steps (301) in the fixed frame (1), the specific sensitive elastic beams (2) and the stepped mass block (3) are integrated structures manufactured on the same substrate, and are made of elastic materials.
8. The light interference type micro-integrated triaxial acceleration sensing structure according to claim 1, characterized in that the grating substrate (5) is a light-transmitting base plate, and the grating (6) is a one-dimensional grating; the grating stripes of the first grating, the second grating, the third grating and the fourth grating are staggered by a certain angle.
9. A method for resolving an optical interferometry micro-integrated triaxial acceleration sensing structure according to any one of claims 1-8, characterized by the steps of:
step 1, a first laser, a first optical detector, a second laser, a second optical detector, a third laser, a third optical detector, a fourth laser and a fourth optical detector are all connected to a photoelectric detection circuit;
the first reflective film and a first grating right above form a first grating interference cavity; the second reflective film and a second grating right above form a second grating interference cavity; the third reflective film and a third grating right above form a third grating interference cavity; the fourth reflecting film and a fourth grating right above form a fourth grating interference cavity;
Step 2, powering on the optical interference type micro-integrated triaxial acceleration sensing structure; each laser and the optical detector work simultaneously, the first laser emits a coherent light source, the coherent light source reaches the first grating interference cavity and is reflected and diffracted to be received by the first optical detector, the first optical detector detects an interference light signal, and an X forward voltage signal V x+ is output through the photoelectric detection circuit; the interference optical signal measured by the first optical detector represents the normal displacement of the forward position point of the edge X of the upper surface of the stepped mass block (3);
Meanwhile, a second laser emits a coherent light source, reaches a second grating interference cavity, reflects and diffracts the coherent light source to be received by a second light detector, and an interference light signal is measured by the second light detector and is output to an X-negative voltage signal V x- through a photoelectric detection circuit; the interference optical signal measured by the second optical detector represents the normal displacement of the X-negative locus of the edge of the upper surface of the stepped mass block (3);
meanwhile, the third laser emits a coherent light source, reaches the third grating interference cavity, reflects and diffracts the coherent light source to be received by the third light detector, and the third light detector detects an interference light signal and outputs a Y forward voltage signal V y+ through a photoelectric detection circuit; the interference light signal measured by the third light detector represents the normal displacement of the positive position point of the edge Y of the upper surface of the stepped mass block (3);
meanwhile, a fourth laser emits a coherent light source, reaches a fourth grating interference cavity, reflects and diffracts the coherent light source to be received by a fourth light detector, and outputs a Y negative voltage signal V y- through a photoelectric detection circuit after the fourth light detector detects an interference light signal; the interference light signal measured by the fourth light detector represents the normal displacement of the Y negative locus of the edge of the upper surface of the stepped mass block (3);
Step 3, respectively resolving the X positive voltage signal V x+, the X negative voltage signal V x-, the Y positive voltage signal V y+ and the Y negative voltage signal V y- to obtain a normal displacement measurement value S x+ of an X positive locus, a normal displacement measurement value S x- of an X negative locus, a normal displacement measurement value S y+ of a Y positive locus and a normal displacement measurement value S y- of a Y negative locus on the edge of the upper surface of the step mass block (3);
step 4, pre-calibration measurement is performed to obtain a mapping matrix K between the triaxial acceleration to be measured and the normal displacement of each directional locus, and the normal displacement measurement value of each directional locus is calculated according to the following formula to obtain a triaxial acceleration measurement value, which comprises the following steps: x-axis acceleration measurement a x, Y-axis acceleration measurement a y, and Z-axis acceleration measurement a z:
Wherein:
k x+ is the proportionality coefficient of the X-axis acceleration measurement value A x to generate the X-direction locus displacement S x+ of the upper surface of the step mass block; k x- is the proportionality coefficient of the X-axis acceleration measurement value A x to generate the X-negative locus displacement S x- of the upper surface of the stepped mass block; k zx+ is the proportionality coefficient of the positive displacement S x+ of the X-direction locus of the upper surface of the step mass block generated by the action of the Z-axis acceleration measurement value A z; k zx- is the proportionality coefficient of the X negative locus displacement S x- of the upper surface of the step mass block generated by the action of the Z-axis acceleration measurement value A z; k y+ is the proportionality coefficient of the Y-axis acceleration measurement value A y to generate the Y-direction locus displacement S y+ of the upper surface of the stepped mass block; k y- is the proportionality coefficient of the Y-axis acceleration measurement value A y to generate the Y-direction locus displacement S y- of the upper surface of the stepped mass block; k zy- is the proportionality coefficient of the displacement S y- of the negative locus of the upper surface Y of the step mass block generated by the action of the Z-axis acceleration measurement value A z; k zy+ is the proportionality coefficient of the positive displacement S y+ of the upper surface Y of the step mass generated by the action of the Z-axis acceleration measured value A z.
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