CN117904593A - Metal workpiece, metal surface composite coating and preparation method thereof - Google Patents
Metal workpiece, metal surface composite coating and preparation method thereof Download PDFInfo
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- CN117904593A CN117904593A CN202410294491.9A CN202410294491A CN117904593A CN 117904593 A CN117904593 A CN 117904593A CN 202410294491 A CN202410294491 A CN 202410294491A CN 117904593 A CN117904593 A CN 117904593A
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 135
- 239000002184 metal Substances 0.000 title claims abstract description 135
- 239000011248 coating agent Substances 0.000 title claims abstract description 47
- 238000000576 coating method Methods 0.000 title claims abstract description 47
- 239000002131 composite material Substances 0.000 title claims abstract description 45
- 238000002360 preparation method Methods 0.000 title claims abstract description 24
- 238000000151 deposition Methods 0.000 claims abstract description 57
- 230000008021 deposition Effects 0.000 claims abstract description 49
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 40
- 239000007789 gas Substances 0.000 claims abstract description 31
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910000037 hydrogen sulfide Inorganic materials 0.000 claims abstract description 22
- 230000003647 oxidation Effects 0.000 claims abstract description 21
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 21
- 238000012986 modification Methods 0.000 claims abstract description 20
- 230000004048 modification Effects 0.000 claims abstract description 20
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910000077 silane Inorganic materials 0.000 claims abstract description 17
- 238000006243 chemical reaction Methods 0.000 claims abstract description 15
- 150000001282 organosilanes Chemical class 0.000 claims abstract description 13
- 239000001257 hydrogen Substances 0.000 claims abstract description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 10
- 230000001590 oxidative effect Effects 0.000 claims abstract description 10
- 239000011261 inert gas Substances 0.000 claims abstract description 9
- 230000035484 reaction time Effects 0.000 claims abstract description 9
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- 239000012495 reaction gas Substances 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 47
- 238000004140 cleaning Methods 0.000 claims description 18
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims description 6
- 239000008367 deionised water Substances 0.000 claims description 6
- 229910021641 deionized water Inorganic materials 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 238000005238 degreasing Methods 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 5
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 claims description 5
- 229940094989 trimethylsilane Drugs 0.000 claims description 5
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 claims description 3
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 claims description 3
- 239000005051 trimethylchlorosilane Substances 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 abstract description 28
- 230000007797 corrosion Effects 0.000 abstract description 25
- 238000001179 sorption measurement Methods 0.000 abstract description 17
- 230000009286 beneficial effect Effects 0.000 abstract description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 55
- 229910001220 stainless steel Inorganic materials 0.000 description 30
- 239000010935 stainless steel Substances 0.000 description 30
- 238000002161 passivation Methods 0.000 description 17
- 238000004458 analytical method Methods 0.000 description 14
- 230000008569 process Effects 0.000 description 14
- 238000004381 surface treatment Methods 0.000 description 13
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 238000001514 detection method Methods 0.000 description 8
- 230000008901 benefit Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 125000004434 sulfur atom Chemical group 0.000 description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000004073 vulcanization Methods 0.000 description 4
- UYJXRRSPUVSSMN-UHFFFAOYSA-P ammonium sulfide Chemical compound [NH4+].[NH4+].[S-2] UYJXRRSPUVSSMN-UHFFFAOYSA-P 0.000 description 3
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 3
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical class [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000005019 vapor deposition process Methods 0.000 description 3
- 239000002351 wastewater Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 230000000711 cancerogenic effect Effects 0.000 description 2
- 231100000315 carcinogenic Toxicity 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000000427 thin-film deposition Methods 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000003891 environmental analysis Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0209—Pretreatment of the material to be coated by heating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention provides a metal workpiece, a metal surface composite coating and a preparation method thereof. The preparation method of the composite coating comprises the following steps of S1: placing a metal workpiece in a deposition chamber, and enabling the interior of the deposition chamber to be in a preset vacuum degree; s2: heating a metal workpiece to a preset temperature, wherein the preset temperature is higher than 100 ℃; s3: introducing reaction gas containing organosilane, hydrogen sulfide and hydrogen, and depositing a sulfur-doped amorphous silicon film on the surface of the metal workpiece under the preset reaction pressure and radio frequency power conditions for a preset reaction time; s4: oxidizing the sulfur-doped amorphous silicon film formed by deposition; s5: and (3) carrying out surface modification treatment on the sulfur-doped amorphous silicon film subjected to oxidation treatment by adopting functional gas containing silane and inert gas at the temperature of 300-600 ℃, wherein the surface modification time is more than or equal to 5min. The invention can obviously improve the corrosion resistance and the adsorption resistance of the metal and is beneficial to prolonging the service life of the metal workpiece.
Description
Technical Field
The invention belongs to the field of materials, and particularly relates to a metal surface treatment technology, in particular to a metal workpiece, a metal surface composite coating and a preparation method thereof.
Background
The metal material surface treatment technology is widely applied to the fields of petrochemical industry, aerospace, medical instruments, environmental analysis and the like. For example, in the exploitation of oil and gas fields, acid gases such as hydrogen sulfide and carbon dioxide contained in natural gas can cause serious corrosion to metal transportation pipes, joint members, and the like. This not only causes great economic loss for the development and production of oil and gas fields, but also causes environmental pollution. These acid gas contacting metal parts must therefore be surface treated to improve their corrosion resistance.
Among the many factors that cause corrosion of sour field facilities, hydrogen sulfide is the most dangerous, especially for oil casings and other downhole equipment. Passivation is a very important type of metal surface treatment technology in the prior art. The passivation treatment is a process of changing the physical and chemical properties of the material surface through the interaction of the passivating agent and the material surface, so that the material surface is changed from an active state to an inert state. In addition, some passivation structures formed after passivation treatment have a self-repairing function, so that the corrosion resistance of the material is stronger, the service life is prolonged, and the production potential safety hazard is reduced.
In the conventional passivation treatment, hexavalent chromium compounds such as chromate, chromic acid and the like are mostly used as treating agents, and after the treatment, a chromate passivation film is formed on the surface of a metal material to protect the base metal. However, chromates are extremely toxic and carcinogenic substances, and aerosols generated during the chromate passivation process are harmful to the human body, and the discharged wastewater severely pollutes the environment, and for this reason, it has been urgent to replace the chromate passivation method with a new, environmentally friendly, chromium-free passivation technique.
It should be noted that the foregoing description of the background art is only for the purpose of providing a clear and complete description of the technical solution of the present application and is presented for the convenience of understanding by those skilled in the art. The above-described solutions are not considered to be known to the person skilled in the art simply because they are set forth in the background of the application section.
Disclosure of Invention
In view of the above-mentioned drawbacks of the prior art, the present invention aims to provide a metal surface composite coating, a preparation method thereof, and a metal workpiece, which are used for solving the problems that the existing method for passivating the metal surface by adopting hexavalent chromium compounds such as chromates and chromic acid as treating agents causes harm to human bodies, and the generated wastewater seriously pollutes the environment.
To achieve the above and other related objects, the present invention provides a method for preparing a metal surface composite coating, comprising the steps of:
S1: placing a metal workpiece in a deposition chamber, and enabling the interior of the deposition chamber to be in a preset vacuum degree;
S2: heating a metal workpiece to a preset temperature, wherein the preset temperature is higher than 100 ℃;
S3: introducing reaction gas containing organosilane, hydrogen sulfide and hydrogen, wherein the flow rate ratio of the organosilane to the hydrogen is 0.02-1, the flow rate ratio of the hydrogen sulfide to the organosilane is 0.01-0.05, and depositing a sulfur-doped amorphous silicon film on the surface of a metal workpiece under the preset reaction pressure and radio frequency power conditions for a preset reaction time;
s4: oxidizing the sulfur-doped amorphous silicon film formed by deposition;
S5: and (3) carrying out surface modification on the sulfur-doped amorphous silicon film subjected to oxidation treatment by adopting a functional gas containing silane and inert gas at the temperature of 300-600 ℃, wherein the mass percentage of the silane in the functional gas is 5-30%, and the surface modification time is more than or equal to 5min.
Optionally, the preparation method of the metal surface composite coating comprises a plurality of the following conditions:
1) Cleaning the surface of a metal workpiece before the metal workpiece is placed in a deposition chamber;
2) In the step S1, the preset vacuum degree of the deposition chamber is less than or equal to 10 -4 Pa;
3) In the step S2, the preset temperature is 300-800 ℃;
4) In the step S3, the vacuum degree in the deposition chamber is below 10 -4 Pa, the preset reaction pressure of the deposition chamber is 30 KPa-50 KPa, the radio frequency power is 500W-1000W, and the reaction time is 10 min-60 min;
5) After the sulfur-doped amorphous silicon film is formed by deposition, an air source and a radio frequency power supply are turned off, after the temperature is reduced to below 60 ℃, the deposition chamber is cleaned for a plurality of times by inert gas, and then the metal workpiece is taken out and transferred into a vacuum furnace for oxidation treatment;
6) In the step S4, the reaction temperature is 300-600 ℃, the adopted oxidizing gas comprises a plurality of O 2、O3 and H 2 O, and the time of the oxidation treatment is 1-3H;
7) In the step S5, the silane comprises a plurality of dimethyl silane, trimethyl silane, dimethyl chlorosilane and trimethyl chlorosilane, and the treatment time is 30min-2h.
Optionally, the method for cleaning the surface of the metal workpiece comprises the steps of placing the metal workpiece in organic degreasing liquid, performing first ultrasonic cleaning at a preset temperature, placing the metal workpiece in methanol and/or ethanol solution for second ultrasonic cleaning, cleaning with deionized water, and drying.
More optionally, the time of the first ultrasonic cleaning is 5min-10min, the time of the second ultrasonic cleaning is 3min-15min, and the drying temperature is 60-80 ℃.
Optionally, the deposition chamber in step S1 is a plasma enhanced chemical vapor deposition chamber.
Optionally, the preparation method comprises repeating steps S3 to S5 at least once.
Optionally, the preparation method of the metal surface composite coating further comprises the steps of depositing a sulfur-doped amorphous silicon film on the surface of the metal workpiece, then carrying out vulcanization treatment on the formed sulfur-doped amorphous silicon film, and then carrying out oxidation treatment.
More optionally, the method of sulfidizing treatment includes a method of performing elemental sulfur ion implantation and/or treatment with an ammonium sulfide solution.
The invention also provides a metal surface composite coating, which is prepared by adopting the preparation method in any scheme.
The invention also provides a metal workpiece, and the surface of the metal workpiece is provided with a composite coating by adopting the preparation method in any scheme.
As described above, the metal workpiece, the metal surface composite coating and the preparation method thereof have the following beneficial effects: the invention firstly forms a sulfur doped amorphous silicon film through a vapor deposition process, and then sequentially carries out oxidation treatment on the film and adopts functional gas containing silane to carry out further surface modification. The sulfur-doped amorphous silicon film has lower surface energy, and the doping of sulfur atoms can further prevent the transfer of electrons in the surface atomic reaction/adsorption process, and compared with the metal surface, the sulfur-doped amorphous silicon film has smaller surface active points, so that the sulfur-doped amorphous silicon film has the characteristics of higher surface inertia and adsorption resistance, and can obviously improve the corrosion resistance and adsorption resistance of the metal; the subsequent oxidation and surface modification can further eliminate active sites in the film and improve the compactness of the film, thereby further improving the corrosion resistance of metal, prolonging the service life of metal workpieces and improving the production safety and economic benefit. The method can be applied to metal surface treatment in the technical fields of environment detection and analysis and the like, can reduce the adsorption of sulfide on the metal surface, and ensures the accuracy of analysis and detection results.
Drawings
FIG. 1 is a flow chart illustrating an exemplary method for preparing a composite coating on a metal surface according to the present invention.
FIG. 2 is a graph showing the weight change of a stainless steel workpiece after surface treatment and an untreated stainless steel workpiece according to the corrosion time by using the preparation method of the metal surface composite coating provided by the invention.
FIG. 3 is a graph showing the comparison of the adsorption of hydrogen sulfide between a stainless steel workpiece subjected to surface treatment by the method for preparing a metal surface composite coating provided by the invention and an untreated stainless steel workpiece.
Detailed Description
Other advantages and effects of the present invention will become apparent to those skilled in the art from the following disclosure, which describes the embodiments of the present invention with reference to specific examples. The invention may be practiced or carried out in other embodiments that depart from the specific details, and the details of the present description may be modified or varied from the spirit and scope of the present invention. As described in detail in the embodiments of the present invention, the cross-sectional view of the device structure is not partially enlarged to a general scale for convenience of explanation, and the schematic drawings are only examples, which should not limit the scope of the present invention. In addition, the three-dimensional dimensions of length, width and depth should be included in actual fabrication.
For ease of description, spatially relative terms such as "under", "below", "beneath", "above", "upper" and the like may be used herein to describe one element or feature's relationship to another element or feature as illustrated in the figures. It will be understood that these spatially relative terms are intended to encompass other orientations of the device in use or operation in addition to the orientation depicted in the figures. Furthermore, when a layer is referred to as being "between" two layers, it can be the only layer between the two layers or one or more intervening layers may also be present.
It should be noted that, the illustrations provided in the present embodiment merely illustrate the basic concept of the present invention by way of illustration, and only the components related to the present invention are shown in the drawings and are not drawn according to the number, shape and size of the components in actual implementation, and the form, number and proportion of the components in actual implementation may be arbitrarily changed, and the layout of the components may be more complex. In order to make the illustration as concise as possible, not all structures are labeled in the drawings.
Passivation is a common treatment used in the prior art to improve the corrosion resistance of metals. In the conventional passivation treatment, hexavalent chromium compounds such as chromate, chromic acid and the like are mostly used as treating agents, and after the treatment, a chromate passivation film is formed on the surface of a metal material to protect the base metal. However, chromates are extremely toxic and carcinogenic substances, and aerosol generated during the chromate passivation process is harmful to human body, and the discharged wastewater severely pollutes the environment, therefore, the inventors of the present invention have proposed an improvement scheme through a great deal of research.
Specifically, the invention provides a preparation method of a metal surface composite coating, which mainly comprises the following steps of:
S1: placing a metal workpiece in a deposition chamber, and enabling the interior of the deposition chamber to be in a preset vacuum degree;
s2: heating the metal workpiece to a preset temperature, wherein the preset temperature is higher than 100 ℃ so as to ensure that the deposition chamber is in a moisture-free dry atmosphere;
S3: introducing reaction gas containing organosilane, hydrogen sulfide and hydrogen, wherein the flow rate ratio of the organosilane to the hydrogen is 0.02-1, the flow rate ratio of the hydrogen sulfide to the organosilane is 0.01-0.05, and depositing a sulfur-doped amorphous silicon film on the surface of a metal workpiece under the preset reaction pressure and radio frequency power conditions for a preset reaction time;
s4: oxidizing the sulfur-doped amorphous silicon film formed by deposition;
S5: and (3) carrying out surface modification on the sulfur-doped amorphous silicon film subjected to oxidation treatment by adopting a functional gas containing silane and inert gas at the temperature of 300-600 ℃, wherein the mass percentage of the silane in the functional gas is 5-30%, and the surface modification time is more than or equal to 5min.
The invention is applicable to the surface treatment of various metals, so the invention does not limit the material of the metal workpiece, and the metal workpiece can be common metals such as iron, stainless steel, aluminum, copper and the like.
The preparation method of the metal surface composite coating is improved in process design, firstly, a sulfur-doped amorphous silicon film is formed through a vapor deposition process, and then the film is subjected to oxidation treatment in sequence and further surface modification by adopting functional gas containing silane. The sulfur-doped amorphous silicon film has lower surface energy, and the doping of sulfur atoms can further prevent the transfer of electrons in the surface atomic reaction/adsorption process, and compared with the metal surface, the sulfur-doped amorphous silicon film has smaller surface active points, so that the sulfur-doped amorphous silicon film has the characteristics of higher surface inertia and adsorption resistance, and can obviously improve the corrosion resistance and adsorption resistance of the metal; the subsequent oxidation and surface modification can further eliminate active sites in the film and increase the compactness of the film, thereby further improving the corrosion resistance of metal, prolonging the service life of metal workpieces and improving the production safety and economic benefit. The method can be applied to metal surface treatment in the technical fields of environment detection and analysis and the like, can reduce the adsorption of sulfide on the metal surface, and ensures the accuracy of analysis and detection results.
To improve the uniformity of subsequent thin film deposition, to enhance the adhesion of the deposited thin film to the metal substrate, in some examples, the surface of the metal workpiece is cleaned prior to placement in the deposition chamber, depending on the cleaning of the surface of the metal workpiece. In some preferred examples, the method for cleaning the surface of the metal workpiece comprises placing the metal workpiece in an organic degreasing liquid (a certain active agent may be added to the degreasing liquid), performing a first ultrasonic cleaning at a preset temperature (for example, 30-50 ℃) for a period of time, for example, 5-10 min, placing the metal workpiece in a methanol and/or ethanol solution, performing a second ultrasonic cleaning for a period of time, for example, 3-15 min, then cleaning with deionized water, and then drying in an oven at a temperature, for example, 60-80 ℃. Impurity particles and/or oil stains on the surface of the metal workpiece are removed through the cleaning procedure, so that the film formed later is prevented from falling off.
Of course, if the original cleanliness of the surface of the metal workpiece is confirmed to be high, the cleaning step is not necessary in the present case.
In some examples, after removing obvious impurities such as greasy dirt on the surface of the metal workpiece, a metal oxide layer is formed on the surface of the metal workpiece, and the formed metal oxide layer has an anti-corrosion effect and is beneficial to enhancing the adhesiveness of a film deposited subsequently.
In addition to the surface cleanliness of the metal workpiece, the cleanliness of the deposition chamber also has a great impact on the quality of the deposited film. It is therefore desirable to clean the interior of the deposition chamber before or after the metal workpiece is placed in the deposition chamber. In this embodiment, it is recommended that the chamber is sealed after the metal workpiece is placed in the deposition chamber, the deposition chamber is repeatedly cleaned by using inert gas such as argon, and finally the chamber is evacuated to make the vacuum degree of the deposition chamber be at a preset value, and the preset value is preferably less than or equal to 10 -4 Pa.
The manner in which the metal workpiece is heated may depend on the configuration of the deposition chamber. For example, a susceptor for carrying a metal workpiece is usually disposed in the deposition chamber, and the metal workpiece and the deposition chamber may be heated by heating the susceptor at a temperature greater than 100 ℃ to ensure that a moisture-free dry atmosphere is maintained in the deposition chamber. The heating temperature is also an important factor affecting the film quality. In a preferred embodiment of the present invention, the heating temperature of the metal workpiece is preferably controlled to 300-800 ℃, and this temperature is kept as constant as possible during the next thin film deposition process. And in a preferred example, the deposition chamber employed is a Plasma Enhanced Chemical Vapor Deposition (PECVD) chamber. The plasma enhanced chemical vapor deposition process is used for deposition, a large number of hydrogen atoms and hydrogen atom groups exist in the deposited film, and dangling bonds in the amorphous silicon film are saturated, so that defect states are reduced, and various performances of the hydrogenated amorphous silicon film are greatly improved.
And after the temperature is stable, depositing a sulfur-doped amorphous silicon film on the surface of the metal workpiece. Experiments show that the preferred deposition condition of the step is that the vacuum degree in the deposition chamber is below 10 -4 Pa, the flow rate ratio of organosilane to hydrogen is 0.02-1, the flow rate ratio of hydrogen sulfide to organosilane is 0.01-0.05, the preset reaction pressure of the deposition chamber is 30 KPa-50 KPa, the radio frequency power is 500W-1000W, and the reaction time is 10 min-60 min. Specifically, a vacuum pumping system of the equipment is opened, and the deposition chamber is vacuumized to a set value; setting flow parameters of organosilane, hydrogen sulfide and hydrogen, regulating a vacuum pressure regulating valve to enable the pressure of gas in a chamber to be at a preset pressure constant value, regulating the radio frequency power to be a certain value, reacting for a certain time to form a film with a required thickness, closing a gas source and a radio frequency power supply, after the temperature is reduced to below 60 ℃, cleaning a deposition chamber with inert gas for a plurality of times, and taking out a metal workpiece.
The removed metal workpiece may then be transferred to a vacuum furnace to oxidize the formed sulfur-doped amorphous silicon film. Through oxidation treatment, the surface defects of the film can be effectively improved, and the uniformity and the compactness of the film are improved. In a preferred example, the reaction temperature is 300-600 ℃ during the oxidation treatment, the oxidizing gas used comprises several of O 2、O3 and H 2 O, preferably a single gas, such as O 2, and the oxidation treatment time is 1-3H.
After the oxidation treatment is finished, the sulfur-doped amorphous silicon film subjected to the oxidation treatment can be subjected to enhanced passivation treatment in the same vacuum furnace by adopting functional gas containing silane and inert gas, so that the further modification of the surface of the film is realized. The surface modification of the step can further eliminate active sites in the film, improve surface defects caused in the oxidation treatment process, promote the compactness of the film and further improve the corrosion resistance of the film. In a preferred example, the silane may be present in the entire functionalized gas in a mass percentage of 5% -30%. In preferred examples, the reaction temperature during the modification treatment of this step is 400-500 ℃, and the silane used may be several of dimethylsilane, trimethylsilane, dimethylchlorosilane and trimethylchlorosilane, and the treatment time is 30min-2h.
In some examples, the method for preparing the composite coating on the metal surface further comprises the steps of depositing a sulfur-doped amorphous silicon film on the surface of the metal workpiece, vulcanizing the formed sulfur-doped amorphous silicon film, and then oxidizing. The sulfur atom content in the sulfur-doped amorphous silicon film can be further improved through vulcanization treatment, and the sulfur atom has a good passivation effect on the dangling bond on the surface of the amorphous silicon film, so that the interface passivation effect and passivation stability can be improved. Specifically, the method of performing the vulcanization treatment may be to perform sulfur ion implantation, or to spray the surface of the film with an ammonium sulfide solution, or both. If ion implantation is used, a high temperature anneal is typically performed to activate the ion activity. If spraying the ammonium sulfide solution, the method further comprises the step of cleaning the metal workpiece with deionized water to remove the redundant solution. The sulfur doping content can be up to more than 10 20atoms/cm3 through vulcanization treatment.
In some examples, steps S3 through S5 may be repeated at least once to obtain a composite coating having a greater thickness, further enhancing its corrosion resistance. The thickness of the prepared composite coating is preferably 100nm-1 μm, for example 100nm,200nm,300nm … … μm or any value in the interval, by combining various factors such as corrosion resistance and efficiency.
After the film is subjected to surface modification by adopting the functional gas, the film can be subjected to corrosion resistance test, for example, after the surface of the metal workpiece is treated by adopting the method, the metal workpiece is placed in an acidic environment, the corrosion condition of the surface of the metal workpiece is known by means of appearance observation and/or weighing, and the process parameters can be adjusted according to the test result, for example, the thickness of the composite coating can be adjusted for the metal workpieces with different materials so as to realize the optimization of corrosion resistance.
In order to make the technical scheme and advantages of the present invention more obvious, the present invention will be further described below with reference to specific embodiments.
Examples
The preparation process of the metal surface composite coating of the embodiment is as follows:
firstly, carrying out surface pretreatment on a metal workpiece, wherein the metal workpiece in the embodiment adopts a stainless steel workpiece:
Placing the stainless steel workpiece in the degreasing liquid, ultrasonically cleaning for 10min at normal temperature, then placing the stainless steel workpiece in ethanol solution, ultrasonically cleaning for 15min, finally cleaning with deionized water, and drying at 60 ℃.
Then preparing a composite coating on the surface of the stainless steel workpiece:
Placing a stainless steel workpiece into a deposition chamber, sealing the chamber, repeatedly cleaning the deposition chamber for 3 times by using argon, and finally vacuumizing the chamber to ensure that the vacuum degree of the deposition chamber reaches 10 -4 Pa; heating the stainless steel workpiece to 500 ℃; opening a vacuum pumping system, vacuumizing to below 10 -5 Pa, adjusting the flow rate ratio of silane to hydrogen to be 0.025, adjusting the flow rate ratio of hydrogen sulfide to silane to be 0.03, and adjusting a vacuum pressure regulating valve to enable the pressure in a chamber to be 35KPa and the radio frequency power to be 800W, and reacting for 30min; then the air source and the radio frequency power supply are turned off, after the temperature is reduced to below 60 ℃, the deposition chamber is cleaned for 3 times by argon, and then the workpiece is taken out; then placing the workpiece in a vacuum furnace, and introducing oxygen to normal pressure when the temperature of the vacuum furnace reaches 350 ℃ for 2 hours; after the reaction is finished, repeatedly cleaning the vacuum chamber for 3 times by using argon, introducing functional gas containing argon and trimethylsilane, wherein the mass percentage content of the trimethylsilane is 10%, and reacting for 1h when the temperature in the vacuum chamber reaches normal pressure and the temperature is increased to 350 ℃.
The experimental results are shown with reference to fig. 2 and 3. The curve ① in fig. 2 is a corrosion rate curve of a stainless steel workpiece subjected to surface treatment by the method in this embodiment, the curve ② is a corrosion rate schematic curve of a stainless steel workpiece subjected to surface treatment, the experimental method is that under the same condition (room temperature environment), the two stainless steel workpieces are respectively placed in saturated hydrogen sulfide solution, after being soaked for the same time, a sample is taken out, and then washed with deionized water, dried, and then weighed by a weighing method to obtain a weight (C) corresponding to the reaction time, wherein the C/C0 (C0 is the original weight of the stainless steel workpiece) is taken as an ordinate, and the reaction time is taken as an abscissa.
As can be seen from fig. 2, the stainless steel workpiece treated by the method of this example has substantially no weight loss, i.e., the treated stainless steel workpiece has higher corrosion resistance than the untreated stainless steel workpiece under such conditions.
FIG. 3 is a graph showing the comparison of the adsorption of hydrogen sulfide to stainless steel workpieces before and after surface treatment by the method for preparing a metal surface composite coating. For convenience of testing, the stainless steel workpiece was processed into a tubular structure (i.e., into a stainless steel tube) in this test. The experimental method was to continuously pass a hydrogen sulfide gas (1 ppm) at a certain concentration through the pipelines of two stainless steel workpieces (one of which was surface-treated by the method of the present example and the other of which was untreated), and continuously detect and analyze the concentration of the hydrogen sulfide gas flowing out of the pipelines of the two stainless steel workpieces by using a gas chromatograph (gas chromatograph GC7890, manufactured by agilent company, usa).
As can be seen from fig. 3, the analysis concentration of the hydrogen sulfide gas flowing through the stainless steel workpiece treated by the method of this embodiment is basically unchanged, which indicates that the stainless steel workpiece treated by the method of this embodiment has higher analysis stability to hydrogen sulfide, while the analysis concentration of the hydrogen sulfide gas flowing through the untreated stainless steel workpiece is lower from the beginning of the sample injection analysis, which indicates that a part of the hydrogen sulfide is adsorbed onto the stainless steel workpiece, resulting in a lower analysis concentration value (after a certain time, when the stainless steel workpiece reaches adsorption saturation, the analysis concentration of the hydrogen sulfide gas flowing through the stainless steel workpiece will not change any more). This demonstrates that the stainless steel workpieces treated by the method of this example have lower surface adsorptivity for hydrogen sulfide than untreated workpieces. Therefore, if the invention is applied to the metal surface treatment in the technical fields of environmental detection and analysis, the adsorption of sulfide on the metal surface can be reduced, and the accuracy of analysis and detection results can be ensured.
It should be particularly noted that the above embodiments are merely exemplary illustrations in actual experimental data. In practice the inventors have made far more than this number of experiments to prepare a composite coating with excellent corrosion resistance. In addition to researching the influence of a single parameter in the experimental process, a plurality of experiments for adjusting a plurality of parameters are also used for observing the synergistic effect among the parameters. A large number of experiments show that the composite coating prepared according to the process conditions provided by the invention can effectively improve the surface corrosion resistance of metal.
The invention also provides a metal surface composite coating, which is prepared by adopting the preparation method in any scheme. As can be known from the content of the preparation method, the metal surface composite coating provided by the invention is a thin film layer formed by oxidizing and surface-modifying a sulfur-doped amorphous silicon layer. Compared with the existing anti-corrosion coating, the metal surface composite coating provided by the invention has the advantages of more uniform and compact coating, more excellent anti-corrosion performance and the like. For a further description of the composite coating of the metal surface of the present invention, reference is made to the foregoing, and for brevity, will not be repeated.
The invention also provides a metal workpiece, which is provided with a metal substrate, wherein the surface of the metal substrate is provided with a composite coating by adopting the preparation method in any scheme. Due to the composite coating in the scheme, the corrosion resistance of the metal workpiece can be obviously improved, and when the component manufactured based on the metal workpiece is applied to the fields of petrochemical industry, aerospace, medical appliances and the like, the service life of the component can be effectively prolonged, so that the production safety and economic benefit can be improved.
In summary, the preparation method of the metal surface composite coating of the invention is improved in process design, firstly, a sulfur-doped amorphous silicon film is formed by a vapor deposition process, and then the film is sequentially subjected to oxidation treatment and further surface modification by adopting functional gas containing silane. The sulfur-doped amorphous silicon film has lower surface energy, and the doping of sulfur atoms can further prevent the transfer of electrons in the surface atomic reaction/adsorption process, so that the sulfur-doped amorphous silicon film has smaller surface active points compared with the metal surface, has the characteristics of higher surface inertia and adsorption resistance, and can obviously improve the corrosion resistance and adsorption resistance of the metal; the subsequent oxidation and surface modification can further eliminate active sites in the film and improve the compactness of the film, so that the corrosion resistance of metal is further improved, the service life of metal workpieces is prolonged, and the production safety and economic benefit are improved. The method can be applied to metal surface treatment in the technical fields of environment detection and analysis and the like, can reduce the adsorption of sulfide on the metal surface, and ensures the accuracy of analysis and detection results. Therefore, the invention effectively overcomes various defects in the prior art and has high industrial utilization value.
The above embodiments are merely illustrative of the principles of the present invention and its effectiveness, and are not intended to limit the invention. Modifications and variations may be made to the above-described embodiments by those skilled in the art without departing from the spirit and scope of the invention. Accordingly, it is intended that all equivalent modifications and variations of the invention be covered by the claims, which are within the ordinary skill of the art, be within the spirit and scope of the present disclosure.
Claims (10)
1. The preparation method of the metal surface composite coating is characterized by comprising the following steps:
S1: placing a metal workpiece in a deposition chamber, and enabling the interior of the deposition chamber to be in a preset vacuum degree;
S2: heating a metal workpiece to a preset temperature, wherein the preset temperature is higher than 100 ℃;
S3: introducing reaction gas containing organosilane, hydrogen sulfide and hydrogen, wherein the flow rate ratio of the organosilane to the hydrogen is 0.02-1, the flow rate ratio of the hydrogen sulfide to the organosilane is 0.01-0.05, and depositing a sulfur-doped amorphous silicon film on the surface of a metal workpiece under the preset reaction pressure and radio frequency power conditions for a preset reaction time;
s4: oxidizing the sulfur-doped amorphous silicon film formed by deposition;
S5: and (3) carrying out surface modification treatment on the sulfur-doped amorphous silicon film subjected to oxidation treatment by adopting a functional gas containing silane and inert gas at the temperature of 300-600 ℃, wherein the mass percentage of the silane in the functional gas is 5-30%, and the surface modification time is more than or equal to 5min.
2. The method of preparing a metal surface composite coating according to claim 1, wherein the method of preparing a metal surface composite coating comprises several of the following conditions:
1) Cleaning the surface of a metal workpiece before the metal workpiece is placed in a deposition chamber;
2) In the step S1, the preset vacuum degree of the deposition chamber is less than or equal to 10 -4 Pa;
3) In the step S2, the preset temperature is 300-800 ℃;
4) In the step S3, the vacuum degree in the deposition chamber is below 10 -4 Pa, the preset reaction pressure of the deposition chamber is 30 KPa-50 KPa, the radio frequency power is 500W-1000W, and the reaction time is 10 min-60 min;
5) After the sulfur-doped amorphous silicon film is formed by deposition, an air source and a radio frequency power supply are turned off, after the temperature is reduced to below 60 ℃, the deposition chamber is cleaned for a plurality of times by inert gas, and then the metal workpiece is taken out and transferred into a vacuum furnace for oxidation treatment;
6) In the step S4, the reaction temperature is 300-600 ℃, the adopted oxidizing gas comprises a plurality of O 2、O3 and H 2 O, and the time of the oxidation treatment is 1-3H;
7) In the step S5, the silane comprises a plurality of dimethyl silane, trimethyl silane, dimethyl chlorosilane and trimethyl chlorosilane, and the treatment time is 30min-2h.
3. The method for preparing a composite coating on a metal surface according to claim 2, wherein the method for cleaning the surface of the metal workpiece comprises the steps of placing the metal workpiece in an organic degreasing liquid, performing a first ultrasonic cleaning at a preset temperature, placing the metal workpiece in a methanol and/or ethanol solution for a second ultrasonic cleaning, cleaning with deionized water, and drying.
4. The method for preparing a composite coating on a metal surface according to claim 3, wherein the time of the first ultrasonic cleaning is 5min-10min, the time of the second ultrasonic cleaning is 3min-15min, and the drying temperature is 60 ℃ to 80 ℃.
5. The method of claim 2, wherein the deposition chamber in step S1 is a plasma enhanced chemical vapor deposition chamber.
6. The method for preparing a metal surface composite coating according to claim 1, wherein the preparation method comprises repeating steps S3 to S5 at least once.
7. The method for preparing a composite coating on a metal surface according to claim 1, further comprising the step of vulcanizing the formed sulfur-doped amorphous silicon film after depositing the sulfur-doped amorphous silicon film on the surface of the metal workpiece, and then oxidizing the sulfur-doped amorphous silicon film.
8. The method for producing a composite coating on a metal surface according to any one of claims 1 to 7, wherein the composite coating is produced to have a thickness of 100nm to 1 μm.
9. A metal surface composite coating, characterized in that the metal surface composite coating is prepared by the preparation method according to any one of claims 1-8.
10. A metal workpiece, characterized in that the surface of the metal workpiece is provided with a composite coating by the preparation method according to any one of claims 1 to 8.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1514627A2 (en) * | 2003-04-28 | 2005-03-16 | Air Products And Chemicals, Inc. | Method for removal of surface oxides by electron attachment |
| CN101208456A (en) * | 2005-06-28 | 2008-06-25 | 美光科技公司 | Atomic layer deposition systems and methods including metal beta-diketiminate compounds |
| CN102112654A (en) * | 2008-08-01 | 2011-06-29 | 乔治洛德方法研究和开发液化空气有限公司 | Method of forming a tantalum-containing layer on a substrate |
| CN109913857A (en) * | 2019-04-26 | 2019-06-21 | 上海金铎禹辰水环境工程有限公司 | A kind of doped structure diamond thin and preparation method thereof |
| JP6752213B2 (en) * | 2015-10-19 | 2020-09-09 | 住友電気工業株式会社 | Single crystal diamond, tools using it, and method for manufacturing single crystal diamond |
| CN114107939A (en) * | 2022-01-27 | 2022-03-01 | 上海陛通半导体能源科技股份有限公司 | Metal film deposition method |
-
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- 2024-03-15 CN CN202410294491.9A patent/CN117904593B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1514627A2 (en) * | 2003-04-28 | 2005-03-16 | Air Products And Chemicals, Inc. | Method for removal of surface oxides by electron attachment |
| US20080149690A1 (en) * | 2003-04-28 | 2008-06-26 | Air Products And Chemicals, Inc. | Removal of Surface Oxides by Electron Attachment for Wafer Bumping Applications |
| CN101208456A (en) * | 2005-06-28 | 2008-06-25 | 美光科技公司 | Atomic layer deposition systems and methods including metal beta-diketiminate compounds |
| CN102112654A (en) * | 2008-08-01 | 2011-06-29 | 乔治洛德方法研究和开发液化空气有限公司 | Method of forming a tantalum-containing layer on a substrate |
| JP6752213B2 (en) * | 2015-10-19 | 2020-09-09 | 住友電気工業株式会社 | Single crystal diamond, tools using it, and method for manufacturing single crystal diamond |
| CN109913857A (en) * | 2019-04-26 | 2019-06-21 | 上海金铎禹辰水环境工程有限公司 | A kind of doped structure diamond thin and preparation method thereof |
| CN114107939A (en) * | 2022-01-27 | 2022-03-01 | 上海陛通半导体能源科技股份有限公司 | Metal film deposition method |
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