CN117693141A - Shell with three-dimensional textures and preparation method thereof - Google Patents
Shell with three-dimensional textures and preparation method thereof Download PDFInfo
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- CN117693141A CN117693141A CN202211075005.1A CN202211075005A CN117693141A CN 117693141 A CN117693141 A CN 117693141A CN 202211075005 A CN202211075005 A CN 202211075005A CN 117693141 A CN117693141 A CN 117693141A
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- 238000002360 preparation method Methods 0.000 title abstract description 10
- 238000005498 polishing Methods 0.000 claims abstract description 73
- 239000000758 substrate Substances 0.000 claims abstract description 38
- 238000005530 etching Methods 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 32
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 31
- 238000005507 spraying Methods 0.000 claims abstract description 19
- 239000000126 substance Substances 0.000 claims abstract description 19
- 238000000227 grinding Methods 0.000 claims abstract description 16
- 238000005488 sandblasting Methods 0.000 claims abstract description 12
- 239000011159 matrix material Substances 0.000 claims abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 28
- 239000007788 liquid Substances 0.000 claims description 20
- 239000004576 sand Substances 0.000 claims description 19
- 239000000243 solution Substances 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 13
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 12
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 8
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 6
- 229910017604 nitric acid Inorganic materials 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 5
- 238000004040 coloring Methods 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 4
- 238000005422 blasting Methods 0.000 claims description 4
- 229910052593 corundum Inorganic materials 0.000 claims description 4
- 239000010431 corundum Substances 0.000 claims description 4
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 229920002635 polyurethane Polymers 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 2
- 239000011324 bead Substances 0.000 claims description 2
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 239000010985 leather Substances 0.000 claims description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 2
- 210000002268 wool Anatomy 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 18
- 210000005252 bulbus oculi Anatomy 0.000 abstract description 2
- 230000002860 competitive effect Effects 0.000 abstract description 2
- 239000011257 shell material Substances 0.000 description 35
- 230000000052 comparative effect Effects 0.000 description 8
- 241000533950 Leucojum Species 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 229910000838 Al alloy Inorganic materials 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 239000003814 drug Substances 0.000 description 4
- 239000005368 silicate glass Substances 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- URQUNWYOBNUYJQ-UHFFFAOYSA-N diazonaphthoquinone Chemical compound C1=CC=C2C(=O)C(=[N]=[N])C=CC2=C1 URQUNWYOBNUYJQ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229940104869 fluorosilicate Drugs 0.000 description 1
- 150000001261 hydroxy acids Chemical class 0.000 description 1
- 230000001795 light effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K5/00—Casings, cabinets or drawers for electric apparatus
- H05K5/02—Details
- H05K5/0217—Mechanical details of casings
- H05K5/0243—Mechanical details of casings for decorative purposes
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The invention relates to the technical field of electronic equipment, in particular to a shell with three-dimensional textures and a preparation method thereof, wherein the method comprises the following steps: (1) carrying out sand blasting treatment on a matrix to obtain a sandy matrix; (2) Spraying photoresist on the surface of the sandy matrix, exposing and developing, and drawing a texture pattern to obtain a matrix to be carved; (3) After the substrate to be etched is baked, performing chemical polishing and etching and deplating to form a groove, and obtaining a coarse substrate; (4) And (3) carrying out flat grinding and polishing on the coarse substrate to obtain the shell with the three-dimensional texture. According to the preparation method of the shell with the three-dimensional texture, the concave texture and the convex texture of the prepared shell are strong in glossiness and roughness contrast, a strong flashing effect can be displayed visually, the shell with the three-dimensional texture has unique external aesthetics of attracting eyeballs, and the electronic product is very competitive in the market.
Description
Technical Field
The invention relates to the technical field of electronic equipment, in particular to a shell with three-dimensional textures and a preparation method thereof.
Background
With the improvement of living standard, the young consumer group becomes a non-negligible consumer force, the cool stereoscopic grating effect and comfortable touch of the electronic product are more and more uniquely loved and focused by the young consumer group, and if the electronic product has the external aesthetic feeling of uniquely attracting eyeballs, the electronic product is very competitive in the market.
At present, smart phones, watches, flat panels, notebook computers and the like are used as common electronic equipment, in particular to mobile phones, the shell is made of transparent glass or opaque plates, patterns are generally presented by attaching colorful films, or anodes are adopted for being simply colored, and texture patterns are rarely formed on the shell directly.
Compared with a planar pattern or a pure-color shell, the shell with the three-dimensional texture is more attractive, so that the preparation of the three-dimensional texture on the shell of an electronic product has become a current research hot spot. CN111586221a relates to a shell component, a method for preparing the same and an electronic device, and discloses a method for preparing a three-dimensional snowflake texture, wherein a pit is formed by sand blasting, CNC processing, laser carving and die imprinting, and then the pit is used as a crystal nucleus point of fluorosilicate for performing frosting etching to form the snowflake texture. CN111233339a discloses a glass etching solution, a method for etching high-alumina silicate glass and high-alumina silicate glass with textures on the surface, and by preparing extremely complex multi-component glass etching solution, etching is performed on the high-alumina silicate glass under strict conditions, so that snowflake textures are prepared.
In the methods disclosed in CN111586221A and CN111233339A, the formation of snowflakes is mainly controlled by liquid medicine etched by frosting, and the shape, direction, size and height of the snowflakes can not be kept consistent when the preparation is repeated. In addition, the liquid medicine has dependence on the glass material, is mainly used for etching high-alumina silica glass, and can not achieve the snowflake etching effect if the liquid medicine is changed into a metal material.
Therefore, it is desirable to provide a method for forming a three-dimensional texture pattern directly on a shell material and for repeating the process.
Disclosure of Invention
The invention aims to solve the problems that in the prior art, a three-dimensional texture cannot be directly formed on a shell of electronic equipment and the three-dimensional texture is difficult to duplicate, and provides a shell with the three-dimensional texture and a preparation method thereof.
In order to achieve the above object, a first aspect of the present invention provides a method for preparing a shell having a stereoscopic texture, the method comprising the steps of:
(1) Performing sand blasting treatment on the substrate to obtain a sandy substrate;
(2) Spraying photoresist on the surface of the sandy matrix, exposing and developing, and drawing a texture pattern to obtain a matrix to be carved;
(3) Performing polishing and etching and deplating on the substrate to be etched after being baked to form a groove, so as to obtain a coarse substrate;
(4) And carrying out flat grinding and polishing on the coarse substrate to obtain the shell with the three-dimensional texture.
A second aspect of the present invention provides a case having a three-dimensional texture including a concave texture and a convex texture, the concave texture being a concave portion of a groove that is chemical-etched, the convex texture being a convex portion of a groove that is not chemical-etched; the height of the convex texture is 2-50 μm, preferably 10-25 μm; the gloss of the relief texture is 450-850Gu greater than the gloss of the recessed texture, preferably 500-650Gu greater; the roughness of the convex texture is 0.1-1.5 μm, preferably 0.4-0.7 μm smaller than the roughness Ra of the concave texture.
Through the technical scheme, the beneficial technical effects obtained by the invention are as follows:
1) The preparation method of the shell with the three-dimensional texture widens the material of the shell, not only can be used in the base material made of aluminum alloy, but also can be used in the base material made of stainless steel or glass;
2) According to the preparation method of the shell with the three-dimensional texture, provided by the invention, the texture pattern is prepared by adopting an externally-added polishing and etching mode after photoresist exposure and development, the size of the texture pattern can be regulated and controlled stably, and batch and repeated production can be realized;
3) The shell with the three-dimensional texture provided by the invention has the advantages that the concave texture retains the sand texture caused by sand blasting, the convex texture has a smooth area with a mirror surface after polishing, the glossiness and the roughness of the concave texture and the convex texture are strongly compared, and a strong flashing effect is visually shown;
4) According to the shell with the three-dimensional textures, the edges and corners of the concave edges of the concave textures are polished after slight polishing treatment, so that the blocking feeling can be reduced, and the smooth and comfortable hand feeling can be maintained.
5) The shell with the three-dimensional textures provided by the invention can not be seen basically, the existence of the relief textures is avoided, and the light effect of the texture patterns is good.
Drawings
FIG. 1 is a schematic diagram of a three-dimensional texture according to the present invention;
fig. 2 is an external view of a mobile phone case prepared in embodiment 1 of the present invention;
FIG. 3 is a scanning electron microscope image of the mobile phone housing prepared in example 1 of the present invention;
fig. 4 is a scanning electron microscope image of the mobile phone case prepared in comparative example 1 of the present invention.
Detailed Description
The endpoints and any values of the ranges disclosed herein are not limited to the precise range or value, and are understood to encompass values approaching those ranges or values. For numerical ranges, one or more new numerical ranges may be found between the endpoints of each range, between the endpoint of each range and the individual point value, and between the individual point value, in combination with each other, and are to be considered as specifically disclosed herein.
The first aspect of the invention provides a method for preparing a shell with three-dimensional textures, wherein the method comprises the following steps:
(1) Performing sand blasting treatment on the substrate to obtain a sandy substrate;
(2) Spraying photoresist on the surface of the sandy matrix, exposing and developing, and drawing a texture pattern to obtain a matrix to be carved;
(3) Performing polishing and etching and deplating on the substrate to be etched after being baked to form a groove, so as to obtain a coarse substrate;
(4) And carrying out flat grinding and polishing on the coarse substrate to obtain the shell with the three-dimensional texture.
In the step (1) of the process,
in a preferred embodiment, the substrate is not particularly limited in the present invention, and a housing commonly used for electronic devices may be used as the substrate in the present invention. Preferably, the substrate is at least one selected from aluminum alloy, stainless steel and glass, preferably aluminum alloy.
In a preferred embodiment, the operating conditions of the blasting process include: the grain size of the sand material is 50-1000 meshes, preferably 100-300 meshes; the sand material is one or more of ceramic sand, iron sand, zirconium dioxide sand, glass beads, white corundum sand and brown corundum sand; the pressure of the sand blasting is 0.1-0.5MPa, preferably 0.2-0.3MPa.
In the invention, the roughness of the surface of the base material can be increased by sand blasting, and the uneven sand grain-shaped plane is formed on the surface of the base material, so that the overall anti-glare sub-surface effect of the base material is obtained.
In the step (2) of the process,
in a preferred embodiment, the photoresist is an acid-resistant positive photoresist having a viscosity of 7 to 10cp at room temperature, and more preferably a phenolic resin-diazonaphthoquinone photoresist.
The room temperature in the present invention has a known meaning, and the present invention is not particularly limited to room temperature, and for example, the room temperature may be 20 to 35 ℃. The acid-resistant positive photoresist selected in the invention can resist chemical polishing etching liquid medicine corrosion after being baked and cannot fall off.
In a preferred embodiment, the photoresist is uniformly sprayed on the surface of the substrate in a fan-shaped atomizing manner by using compressed air. Wherein the spraying amount of the photoresist is such that the thickness of the photoresist dry film obtained after spraying is 2-9 μm, preferably 5-7 μm.
In a preferred embodiment, in order to accelerate the drying of the photoresist, baking is preferably performed after the completion of the photoresist spraying. Wherein the baking is carried out at 80-120deg.C for 4-10min.
In a preferred embodiment, the operating conditions of the exposure include: the wavelength of the laser is 375-405nm, preferably 375nm andor 405nm; the exposure energy is 250-450mJ/cm 2 Preferably 300-350mJ/cm 2 。
In a preferred embodiment, the operating conditions for development include: spraying the exposed substrate by using an alkaline developing solution at room temperature; wherein the developing solution is one or more selected from sodium hydroxide aqueous solution, tetramethyl ammonium hydroxide aqueous solution, potassium hydroxide aqueous solution and sodium carbonate aqueous solution; the concentration of the developing solution is 0.05-3.5wt%, preferably 1.5-3wt%; the spraying pressure of the spraying is 10-50kg/cm 2 Preferably 20-40kg/cm 2 。
In the invention, phenolic resin-diazonaphthoquinone in phenolic resin diazonaphthoquinone photoresist is decomposed into a hydroxy acid under the catalysis of laser in an exposure area because of being irradiated by the laser, and then is contacted with alkaline developer to be removed because of chemical reaction, and the photoresist in an unexposed area is reserved, so that a texture pattern is drawn on a substrate to be carved, and a substrate to be carved is obtained.
In a preferred embodiment, the present invention does not particularly limit the texture pattern, which is preferably a pattern composed of lines in order to further improve the effect of the flash. That is, in the present invention, the photoresist in the unexposed area has a line shape, wherein the lines may be arranged arbitrarily, the distance between adjacent lines may be 5 to 500 μm, preferably 20 to 100 μm, and the width of the lines may be 5 to 500 μm, preferably 20 to 100 μm.
In the step (3) of the process,
in a preferred embodiment, the operating conditions of the curing include: the curing temperature is 120-200 ℃, preferably 150-180 ℃; the baking time is 10-80min, preferably 30-50min.
In a preferred embodiment, the chemical polishing etching operation conditions include: the chemical polishing and etching temperature is 70-90 ℃, preferably 80-90 ℃; the chemical polishing etching time is 60-300s, preferably 90-200s; the etching step depth is 2 to 80. Mu.m, preferably 15 to 35. Mu.m. In the present invention, the etching step depth refers to the depth of a groove formed after etching.
In a preferred embodiment, the chemical polishing liquid is selected from one or more of phosphoric acid, sulfuric acid, hydrofluoric acid, nitric acid, and hydrochloric acid.
The chemical polishing liquid is not particularly limited, and chemical polishing liquid commonly used in the field can be used in the invention. Preferably, the chemical polishing liquid is a mixed liquid of phosphoric acid, nitric acid and sulfuric acid; wherein the volume fraction of phosphoric acid is 65-85%, the volume fraction of nitric acid is 5-10%, and the volume fraction of sulfuric acid is 8-15%.
In a preferred embodiment, the deplating operating conditions include: the deplating temperature is 70-90 ℃, preferably 80-90 ℃; the deplating time is 60-600s, preferably 180-300s.
The invention is not limited in particular, and organic neutral stripping solutions which do not corrode aluminum alloy can be used in the invention, such as stripping solution manufactured by Jin Dacheng and having a model of UV-LC-500, SH-665 paint remover of four-glow surface treatment technology Co. In order to improve the deplating effect, the deplating is preferably performed under ultrasound.
In the step (4) of the method,
in a preferred embodiment, the polishing liquid in the flat-grinding polishing is selected from one or more of a silica polishing liquid, a cerium oxide polishing liquid, and a lanthanum oxide polishing liquid.
In a preferred embodiment, the polishing liquid has a solids content of 3 to 20wt%, preferably 5 to 8wt%; the solid particle size is 0.1-3. Mu.m, preferably 0.5-1.5. Mu.m.
In a preferred embodiment, the buffing material in the flat buffing is selected from one or more of animal skin, polyurethane buffing, wool felt. The animal skin is not particularly limited, and animal skins commonly used in the polishing field, such as cowhide, can be used in the present invention.
In a preferred embodiment, the operating conditions of the flat abrasive polishing include: the polishing rotation speed is 40-70rpm, preferably 50-60rpm; the polishing pressure is 0.5-2MPa, preferably 0.8-1.5MPa; the polishing time is 30 to 200s, preferably 90 to 150s.
In a preferred embodiment, the raised portions of the grooves on the coarse substrate have a removal height of 0.25 to 30 μm, preferably 5 to 10 μm.
Wherein, in the invention, when the rough substrate is subjected to flat grinding polishing, the convex part of the groove, especially the top of the convex part, can be polished and polished by controlling the operation conditions, thereby increasing the smoothness and chromaticity of the convex part of the groove. The concave portion of the groove is polished and polished to a much smaller extent than the convex portion of the groove under the protection of the convex portion of the groove under the above-defined operation conditions due to the relatively low position, so that the sandiness of the concave portion of the groove can be maintained, and further, a strong contrast in glossiness and roughness is exhibited with the convex portion of the groove, so that the housing visually exhibits a strong glittering effect.
In a preferred embodiment, the method further comprises polishing followed by cleaning, anodic oxidation, coloring and sealing. The invention is not particularly limited to cleaning, anodic oxidation, coloring and hole sealing, and can be processed according to the conventional operation in the field.
A second aspect of the present invention provides a case having a three-dimensional texture including a concave texture and a convex texture, the concave texture being a concave portion of a groove that is chemical-etched, the convex texture being a convex portion of a groove that is not chemical-etched; the height of the convex texture is 2-50 μm, preferably 10-25 μm; the gloss of the relief texture is 450-850Gu greater than the gloss of the recessed texture, preferably 500-650Gu greater; the roughness of the convex texture is 0.1-1.5 μm, preferably 0.4-0.7 μm smaller than the roughness Ra of the concave texture.
Wherein, the glossiness and the roughness of the convex texture refer to the glossiness and the roughness of the surface of the top of the relief texture, and the glossiness and the roughness of the concave texture refer to the glossiness and the roughness of the surface of the concave part of the groove.
In a preferred embodiment, the convex texture has a gloss of 800-900Gu, preferably 850-880Gu; the glossiness of the concave texture is 250-400Gu, preferably 260-330Gu.
In a preferred embodiment, the width of the raised texture is 5-500 μm, preferably 20-100 μm; the width of the concave texture is 5-500 μm, preferably 20-100 μm.
In a preferred embodiment, the shape of the stereoscopic texture is not particularly limited in the present invention, and the stereoscopic texture may be formed in any shape, for example: the three-dimensional textures can be randomly distributed, as shown in fig. 1, the black lines in fig. 1 represent concave textures, the white lines represent concave textures, and the concave textures are densely distributed on the surface of the shell, so that the shell has a flashing effect. The three-dimensional textures can also be regularly arranged, for example, the three-dimensional textures can be arranged in various shapes such as triangles, quadrilaterals, pentagons, hexagons, stars, snowflakes and the like.
The present invention will be described in detail by examples.
Example 1
(1) The base body is a smooth aluminum alloy mobile phone shell, the 150-mesh ceramic sand is utilized to carry out sand blasting treatment on the base body, the sand blasting pressure is 0.2MPa, and a sand feeling base body is obtained;
(2) Uniformly spraying phenolic resin-diazonaphthoquinone photoresist (with the viscosity of 8cp at 25 ℃) on the surface of the sandy matrix in a fan-shaped atomization mode by using compressed air, baking for 4min at 100 ℃ after the photoresist spraying is finished, wherein the thickness of a photoresist dry film is 6 mu m; then exposing under the action of laser with wavelength of 375nm and exposure energy of 300mJ/cm 2 The method comprises the steps of carrying out a first treatment on the surface of the After the exposure was completed, the film was exposed to light at room temperature at 25kg/cm 2 Developing the photoresist by spraying potassium hydroxide aqueous solution with the mass concentration of 2.5wt% to obtain a texture pattern drawn by lines formed by the unexposed photoresist; the width of the lines is 30 μm, and the distance between adjacent lines is 30 μm;
(3) Placing the substrate to be etched into an electric oven, baking for 30min at 150 ℃, and performing polishing etching after baking; wherein the chemical polishing etching solution is mixed solution of phosphoric acid, nitric acid and sulfuric acid, and the volume fractions of the phosphoric acid, the nitric acid and the sulfuric acid are 78%, 8% and 14% respectively; chemical polishing and etching temperature is 85 ℃, chemical polishing and etching time is 180s, and etching step depth is 30 mu m; placing the polished and etched substrate in a deplating solution with the model of UV-LC-500 produced by Jin Dacheng, deplating photoresist at 75 ℃, and forming a groove after ultrasonic deplating for 300s to obtain a coarse substrate;
(4) Performing flat grinding and polishing on the coarse substrate, wherein the polishing material is polyurethane leather, the polishing solution is silicon dioxide polishing solution (the content of silicon dioxide is 6wt%, the particle size is 1 mu m), the polishing rotating speed is 55rpm, the polishing pressure is 1.5MPa, the polishing time is 120s, and the removal height of the convex part of the groove on the coarse substrate is 8 mu m; and then cleaning, anodizing, coloring and sealing holes to obtain the shell with the three-dimensional texture.
As shown in fig. 2, the shell with three-dimensional texture prepared in example 1 is shown in fig. 2, and the concave texture of the shell with three-dimensional texture prepared in example 1 of the present invention retains the sand texture caused by sand blasting, the texture has smooth areas with mirror surfaces after polishing, the glossiness and roughness of the concave texture and the texture show strong contrast, and a strong flashing effect is visually shown.
After the flat grinding and polishing, the edges and corners of the concave texture concave edges are polished after the slight polishing treatment, so that the blocking feeling can be reduced, and the shell with the three-dimensional texture prepared in the embodiment 1 can keep silky and comfortable handfeel.
Example 2
The same as in example 1, except that: in the step (3), the chemical polishing etching time is 120s, and the etching step depth is 20 mu m.
Compared with embodiment 1, embodiment 2 has short chemical polishing etching time and shallow etching depth of the grooves, the prepared stereoscopic texture has lower convex texture, the difference between the glossiness and roughness of the convex texture and the concave texture is increased, and the shell has better flashing effect.
Example 3
The same as in example 1, except that: in the step (4), the polishing time of the flat grinding and polishing was 240s, and the removal height of the convex portions of the grooves on the coarse substrate was 16. Mu.m.
Wherein, compared with example 1, the flat grinding polishing time of example 3 is long, the polishing and grinding degree of the coarse substrate is larger, the difference between the roughness of the convex texture and the roughness of the concave texture is reduced, and the flashing effect is slightly reduced.
Example 4
The same as in example 1, except that: the drawn texture pattern was changed such that the width of the lines was 80 μm and the distance between adjacent lines was 80 μm.
Example 5
The same as in example 1, except that: the drawn texture pattern was changed such that the width of the lines was 500 μm and the distance between adjacent lines was 500 μm.
From comparative example 1, example 4 and example 5, it is seen that the greater the density of the texture, the better the sparkling effect.
Comparative example 1
Compared with example 1, the difference is that: in the step (4), flat grinding and polishing are omitted, and the crude substrate is directly subjected to cleaning, anodic oxidation, coloring and hole sealing to obtain the shell with the three-dimensional texture.
Comparative example 2
Compared with example 1, the difference is that: step (1) is omitted, and step (2) is directly carried out on the smooth aluminum alloy mobile phone shell.
Test example 1
The housings prepared in the examples and comparative examples were subjected to a gloss test using a germany BYK a-4430 micro-gloss meter at a test angle of 60 °; roughness tests were performed using a Mittutonom-411 surface roughness meter, width and height tests were performed using a metallographic microscope (specification model Axio Imsger A1 m), and the test results are shown in Table 1:
TABLE 1
As can be seen from table 1, the mobile phone shell with three-dimensional texture prepared by the method of the present invention has large glossiness, small roughness, and large difference between the glossiness and the roughness, and the mobile phone shell visually exhibits a strong sparkling effect.
As is apparent from the analysis of the data of example 1 and comparative example 1, the stereoscopic texture which was not subjected to the flat grinding polishing, although the difference between the convex texture and the concave texture was relatively large, the sparkling effect was poor because the glossiness of the convex texture was significantly small.
As is clear from the analysis of the data of example 1 and comparative example 2, the three-dimensional texture without sandblasting treatment had a relatively large glossiness of both the convex texture and the concave texture, and the difference between them was small, so that the sparkling effect was poor.
Test example 2
The housings in example 1 and comparative example 1 were respectively subjected to scanning electron microscope characterization, and the results are shown in fig. 3 and 4, respectively.
As can be seen from comparing fig. 3 and fig. 4, the three-dimensional texture in embodiment 1 is clear after the shell is polished by flat grinding, so that the reflection intensity of the shell can be remarkably increased, and the flashing effect can be enhanced.
The preferred embodiments of the present invention have been described in detail above, but the present invention is not limited thereto. Within the scope of the technical idea of the invention, a number of simple variants of the technical solution of the invention are possible, including combinations of the individual technical features in any other suitable way, which simple variants and combinations should likewise be regarded as being disclosed by the invention, all falling within the scope of protection of the invention.
Claims (13)
1. A method of preparing a shell having a three-dimensional texture, the method comprising the steps of:
(1) Performing sand blasting treatment on the substrate to obtain a sandy substrate;
(2) Spraying photoresist on the surface of the sandy matrix, exposing and developing, and drawing a texture pattern to obtain a matrix to be carved;
(3) Performing polishing and etching and deplating on the substrate to be etched after being baked to form a groove, so as to obtain a coarse substrate;
(4) And carrying out flat grinding and polishing on the coarse substrate to obtain the shell with the three-dimensional texture.
2. The method of claim 1, wherein the operating conditions of the grit blasting include: the grain size of the sand is 50-1000 meshes, preferably 100-300 meshes;
preferably, the sand material is selected from one or more of ceramic sand, iron sand, zirconium dioxide sand, glass beads, white corundum sand and brown corundum sand;
preferably, the blasting pressure of the blasting is 0.1-0.5MPa, preferably 0.2-0.3MPa.
3. The method of claim 1 or 2, wherein the photoresist is an acid-resistant positive photoresist;
preferably, the acid-resistant positive photoresist has a viscosity of 7-10cp at room temperature, and more preferably a phenol resin-diazonaphthoquinone photoresist.
4. A method according to any one of claims 1 to 3, wherein the photoresist is uniformly sprayed on the surface of the substrate in a fan-shaped atomized manner using compressed air; wherein the spraying amount of the photoresist is such that the thickness of the photoresist dry film obtained after spraying is 2-9 mu m, preferably 5-7 mu m;
preferably, baking is performed after the photoresist spraying is completed; wherein the baking is carried out at 80-120deg.C for 4-10min.
5. The method of any of claims 1-4, wherein the operating conditions of the exposing comprise: the wavelength of the laser is 375-405nm, preferably 375nm and/or 405nm; the exposure energy is 250-450mJ/cm 2 Preferably 300-350mJ/cm 2 。
6. The method of any of claims 1-5, wherein the developing comprises: spraying the exposed substrate by using an alkaline developing solution at room temperature;
preferably, the developing solution is selected from one or more of sodium hydroxide aqueous solution, tetramethyl ammonium hydroxide aqueous solution, potassium hydroxide aqueous solution and sodium carbonate aqueous solution;
preferably, the concentration of the developing solution is 0.05 to 4.5wt%, preferably 1.5 to 3wt%;
preferably, the spraying pressure of the spraying is 10-50kg/cm2, preferably 20-40kg/cm2.
7. The method of any of claims 1-6, wherein the operating conditions of the curing include: the curing temperature is 120-200 ℃, preferably 150-180 ℃; the baking time is 10-80min, preferably 30-50min.
8. The method of any of claims 1-7, wherein the chemical-mechanical-polishing etching operating conditions comprise: the chemical polishing and etching temperature is 70-90 ℃, preferably 80-90 ℃; the chemical polishing etching time is 60-300s, preferably 90-200s; the etching step depth is 2-80 μm, preferably 15-35 μm;
preferably, the chemical polishing liquid is selected from one or more of phosphoric acid, sulfuric acid, hydrofluoric acid, nitric acid and hydrochloric acid.
9. The method of any of claims 1-8, wherein the deplating operating conditions include: the deplating temperature is 70-90 ℃, preferably 80-90 ℃; the deplating time is 60-600s, preferably 180-300s.
10. The method according to any one of claims 1 to 9, wherein the polishing liquid in the flat-grinding polishing is selected from one or more of a silica polishing liquid, a cerium oxide polishing liquid, and a lanthanum oxide polishing liquid;
preferably, the solid content in the polishing liquid is 3 to 20wt%, preferably 5 to 8wt%; the solid particle size is 0.1-3 μm, preferably 0.5-1.5 μm;
preferably, the polishing material in the flat polishing is one or more selected from polyurethane leather, animal skin and wool felt;
preferably, the operating conditions of the flat grinding polishing include: the polishing rotation speed is 40-70rpm, preferably 50-60rpm; the polishing pressure is 0.5-2MPa, preferably 0.8-1.2MPa; the polishing time is 30 to 200s, preferably 90 to 150s;
preferably, the raised portions of the grooves on the coarse substrate have a removal height of 0.25-30 μm, preferably 5-10 μm.
11. The method of any one of claims 1-10, wherein the method further comprises polishing followed by cleaning, anodic oxidation, coloring, and sealing.
12. A shell with three-dimensional textures, which is characterized in that the three-dimensional textures comprise concave textures and convex textures, the concave textures are concave parts of grooves which are subjected to chemical polishing, and the convex textures are convex parts of grooves which are not subjected to chemical polishing;
preferably, the relief has a height of 2-50 μm, preferably 10-25 μm;
preferably, the gloss of the relief texture is 450-850Gu greater than the gloss of the recessed texture, preferably 500-650Gu greater;
preferably, the roughness of the convex texture is 0.1-1.5 μm smaller than the roughness Ra of the concave texture, preferably 0.4-0.7 μm smaller.
13. The shell according to claim 12, wherein the convex texture has a gloss of 800-900Gu, preferably 850-880Gu; the glossiness of the concave texture is 250-400Gu, preferably 260-330Gu;
preferably, the relief has a width of 5-500 μm, preferably 20-100 μm; the width of the concave texture is 5-500 μm, preferably 20-100 μm.
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| CN107509333A (en) * | 2017-08-31 | 2017-12-22 | 维沃移动通信有限公司 | A kind of method of surface finish of housing, housing and mobile terminal |
| CN113772956A (en) * | 2021-09-28 | 2021-12-10 | 蓝思科技(东莞)有限公司 | Anti-glare glass and preparation method thereof |
| CN114554754A (en) * | 2022-02-14 | 2022-05-27 | 联想(北京)有限公司 | Electronic equipment and preparation method of metal workpiece |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN205166316U (en) * | 2015-07-24 | 2016-04-20 | 深圳市光峰光电技术有限公司 | Tape identification piece casing |
| CN106929897A (en) * | 2015-12-30 | 2017-07-07 | 比亚迪股份有限公司 | A kind of Al-alloy casing and preparation method thereof |
| CN107509333A (en) * | 2017-08-31 | 2017-12-22 | 维沃移动通信有限公司 | A kind of method of surface finish of housing, housing and mobile terminal |
| CN113772956A (en) * | 2021-09-28 | 2021-12-10 | 蓝思科技(东莞)有限公司 | Anti-glare glass and preparation method thereof |
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