CN117565486A - Water vapor barrier film - Google Patents
Water vapor barrier film Download PDFInfo
- Publication number
- CN117565486A CN117565486A CN202311567098.4A CN202311567098A CN117565486A CN 117565486 A CN117565486 A CN 117565486A CN 202311567098 A CN202311567098 A CN 202311567098A CN 117565486 A CN117565486 A CN 117565486A
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- Prior art keywords
- layer
- refractive index
- barrier layer
- index layer
- water vapor
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- 230000004888 barrier function Effects 0.000 title claims abstract description 197
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 50
- 239000000758 substrate Substances 0.000 claims abstract description 47
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 5
- 230000008569 process Effects 0.000 claims abstract description 4
- 239000010410 layer Substances 0.000 claims description 325
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 37
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 27
- 239000002245 particle Substances 0.000 claims description 25
- 239000011247 coating layer Substances 0.000 claims description 19
- 239000010954 inorganic particle Substances 0.000 claims description 19
- 239000004925 Acrylic resin Substances 0.000 claims description 15
- 229920000178 Acrylic resin Polymers 0.000 claims description 15
- 239000000178 monomer Substances 0.000 claims description 15
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 12
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 11
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 10
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 8
- ZGLJZIDHAZXABI-UHFFFAOYSA-N 2-butyl-2-(hydroxymethyl)propane-1,3-diol 2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CCCCC(CO)(CO)CO ZGLJZIDHAZXABI-UHFFFAOYSA-N 0.000 claims description 6
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 claims description 6
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 claims description 6
- SSOONFBDIYMPEU-UHFFFAOYSA-N [3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propyl] prop-2-enoate Chemical compound OCC(CO)(CO)COCC(CO)(CO)COC(=O)C=C SSOONFBDIYMPEU-UHFFFAOYSA-N 0.000 claims description 5
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 claims description 3
- SAPGBCWOQLHKKZ-UHFFFAOYSA-N 6-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCOC(=O)C(C)=C SAPGBCWOQLHKKZ-UHFFFAOYSA-N 0.000 claims description 3
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 3
- MRONFXZUVYCIMF-UHFFFAOYSA-N C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.CCC(O)C(CO)(CO)CO Chemical compound C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.CCC(O)C(CO)(CO)CO MRONFXZUVYCIMF-UHFFFAOYSA-N 0.000 claims description 3
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims description 3
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 claims description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 claims description 3
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 claims description 3
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 3
- 125000004386 diacrylate group Chemical group 0.000 claims description 3
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 claims description 3
- 239000001095 magnesium carbonate Substances 0.000 claims description 3
- 229910000021 magnesium carbonate Inorganic materials 0.000 claims description 3
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 claims description 3
- 239000000391 magnesium silicate Substances 0.000 claims description 3
- 229910052919 magnesium silicate Inorganic materials 0.000 claims description 3
- 235000019792 magnesium silicate Nutrition 0.000 claims description 3
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- FSDNTQSJGHSJBG-UHFFFAOYSA-N piperidine-4-carbonitrile Chemical compound N#CC1CCNCC1 FSDNTQSJGHSJBG-UHFFFAOYSA-N 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 230000003667 anti-reflective effect Effects 0.000 claims 1
- 239000001301 oxygen Substances 0.000 abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 abstract description 19
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 17
- 238000002834 transmittance Methods 0.000 abstract description 12
- 230000000694 effects Effects 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 21
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 18
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- 229910052786 argon Inorganic materials 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 8
- 230000002708 enhancing effect Effects 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910000484 niobium oxide Inorganic materials 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- -1 acrylic ester Chemical class 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- ZBVQEUUTPTVMHY-UHFFFAOYSA-N phenyl-(2-phenylphenyl)methanone Chemical compound C=1C=CC=C(C=2C=CC=CC=2)C=1C(=O)C1=CC=CC=C1 ZBVQEUUTPTVMHY-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000016776 visual perception Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/126—Shielding, e.g. light-blocking means over the TFTs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/26—Polymeric coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/418—Refractive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/726—Permeability to liquids, absorption
- B32B2307/7265—Non-permeable
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Ceramic Engineering (AREA)
- Laminated Bodies (AREA)
Abstract
The invention discloses a water vapor barrier film, which comprises a substrate layer and a water vapor barrier layer coated on one side of the substrate layer. An anti-reflection layer is arranged on one side of the water vapor barrier layer, which is away from the substrate layer, and the anti-reflection layer is prepared by a magnetron sputtering process; the water vapor barrier layer comprises a first organic barrier layer, a first inorganic barrier layer, a second organic barrier layer and a second inorganic barrier layer which are sequentially laminated from the substrate layer towards the anti-reflection layer; the anti-reflection layer comprises at least one laminated structure, and each laminated structure comprises a high refractive index layer and a low refractive index layer which are laminated in sequence; the high refractive index layer has a refractive index of 1.7 or more and the low refractive index layer has a refractive index of 1.7 or less. The water vapor barrier film can effectively isolate water vapor and oxygen and has higher light transmittance and good display effect.
Description
Technical Field
The invention relates to the field of films, in particular to a water vapor barrier film.
Background
In recent years, flexible electronic devices have received a lot of attention, for example, flexible thin film solar cells are widely used in the fields of solar backpacks, solar tents, solar flashlights, solar automobiles, photovoltaic building integration and the like due to their unique flexibility and light and thin properties. Organic Light Emitting Diodes (OLEDs) have high light emitting efficiency, low power consumption, light and slim texture, flexibility, etc., are widely appreciated and rapidly developed, and are considered as an important development direction of next generation display technologies. However, flexible electronic devices often use organic polymer substrates, which are less stable, and more permeable to moisture and oxygen, which can easily cause device failure. Therefore, a transparent flexible film having high water-oxygen permeability needs to be subjected to barrier modification. In order to protect the product from the attack of external steam, and to prolong the service life, a water vapor barrier film having high barrier property is required.
Barrier films developed today place the center of gravity on the water vapor barrier, but the light transmittance is also particularly important, both in the solar and OLED fields. The high-transmittance water vapor barrier film can improve the photoelectric conversion rate and better visual perception, but the prior water vapor barrier film has poor transmittance and poor display effect.
The information disclosed in this background section is only for enhancement of understanding of the general background of the invention and should not be taken as an acknowledgement or any form of suggestion that this information forms the prior art already known to a person of ordinary skill in the art.
Disclosure of Invention
The invention aims to provide a water vapor barrier film which can effectively isolate water vapor and oxygen, has higher light transmittance and has good display effect.
In order to achieve the above objective, an embodiment of the present invention provides a moisture barrier film, which includes a substrate layer and a moisture barrier layer coated on one side of the substrate layer. An anti-reflection layer is arranged on one side of the water vapor barrier layer, which is away from the substrate layer, and the anti-reflection layer is prepared by a magnetron sputtering process; the water vapor barrier layer comprises a first organic barrier layer, a first inorganic barrier layer, a second organic barrier layer and a second inorganic barrier layer which are sequentially laminated from the substrate layer towards the anti-reflection layer; the anti-reflection layer comprises at least one laminated structure, and each laminated structure comprises a high refractive index layer and a low refractive index layer which are laminated in sequence; the high refractive index layer has a refractive index of 1.7 or more and the low refractive index layer has a refractive index of 1.7 or less.
In one or more embodiments of the invention, the first and second organic barrier layers have a refractive index between 1.62 and 1.68 and the first and second inorganic barrier layers have a refractive index between 1.42 and 1.48.
In one or more embodiments of the present invention, the first and second organic barrier layers are prepared from an organic paint by a coating process, the organic paint comprising the following components in parts by mass: polyfunctional acrylates: 40-50 parts of acrylic resin monomer: 8-12 parts of nano inorganic particles: 1-3 parts of a photoinitiator: 3-6 parts of organic solvent: 50-80 parts.
In one or more embodiments of the present invention, the nano-inorganic particles are selected from any two of silica particles, alumina particles, magnesium silicate particles, aluminum silicate particles, calcium carbonate particles, magnesium carbonate particles, titanium dioxide particles, silicon nitride particles, and the particle size of the nano-inorganic particles is between 20nm and 80 nm.
In one or more embodiments of the present invention, the polyfunctional acrylate is selected from one of trimethylolpropane triacrylate, trimethylol pentane trimethacrylate, dipentaerythritol acrylate, 2-ethyl pentaerythritol triacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, trimethylolpropane trimethacrylate, pentaerythritol tetraacrylate, and dipentaerythritol hexaacrylate; and/or the acrylic resin monomer is selected from one of pentaerythritol triacrylate, 1, 6-hexanediol dimethacrylate, 1, 6-hexanediol diacrylate, ethylene glycol diacrylate, p-pentanediol diacrylate, 2-hydroxyethyl methacrylate, trimethylol pentane trimethacrylate, dipropylene glycol diacrylate and dipentaerythritol acrylate.
In one or more embodiments of the invention, the substrate layer has a thickness of between 50 μm and 100 μm; and/or the thickness of the first organic barrier layer and the second organic barrier layer is between 1.5 μm and 2.5 μm; and/or the thickness of the first inorganic barrier layer and the second inorganic barrier layer is between 150nm and 200nm.
In one or more embodiments of the present invention, the first and second inorganic barrier layers are silicon oxide coating layers.
In one or more embodiments of the present invention, the anti-reflection layer includes: a first high refractive index layer, a first low refractive index layer, a second high refractive index layer, and a second low refractive index layer. The first high refractive index layer is magnetically sputtered on the surface of the second inorganic barrier layer; the first low refractive index layer is subjected to magnetron sputtering on the surface of the first high refractive index layer; the second high refractive index layer is subjected to magnetron sputtering on the surface of the first low refractive index layer; and the second low refractive index layer is subjected to magnetron sputtering on the surface of the second high refractive index layer.
In one or more embodiments of the present invention, the first and second high refractive index layers are niobium pentoxide layers; and/or the first low refractive index layer and the second low refractive index layer are silicon dioxide layers.
In one or more embodiments of the invention, the first high refractive index layer has a thickness between 95nm and 105 nm; and/or the thickness of the first low refractive index layer is between 195nm and 205 nm; and/or the thickness of the second high refractive index layer is between 10nm and 20 nm; and/or the thickness of the second low refractive index layer is between 110nm and 120 nm.
Compared with the prior art, the water vapor barrier film can effectively block water vapor and oxygen and simultaneously can ensure the transmittance of the water vapor barrier film by laminating a plurality of organic barrier layers and inorganic barrier layers with different refractive indexes. Secondly, coating the first organic barrier layer on the substrate layer can improve the bonding degree between the first inorganic barrier layer and the substrate layer and prevent the first inorganic barrier layer from directly bonding the substrate layer to generate falling. In addition, the organic barrier layer and the inorganic barrier layer are further provided with an anti-reflection layer, and the anti-reflection layer can further improve the transmittance of the water vapor barrier film.
Drawings
FIG. 1 is a first schematic illustration of a water vapor barrier membrane according to an embodiment of the invention;
fig. 2 is a second schematic view of a water vapor barrier membrane according to an embodiment of the invention.
The main reference numerals illustrate:
1-a substrate layer, 2-a first organic barrier layer, 3-a first inorganic barrier layer, 4-a second organic barrier layer, 5-a second inorganic barrier layer, 6-an anti-reflection layer, 61-a first high refractive index layer, 62-a first low refractive index layer, 63-a second high refractive index layer, 64-a second low refractive index layer.
Detailed Description
The following detailed description of embodiments of the invention is, therefore, to be taken in conjunction with the accompanying drawings, and it is to be understood that the scope of the invention is not limited to the specific embodiments.
Throughout the specification and claims, unless explicitly stated otherwise, the term "comprise" or variations thereof such as "comprises" or "comprising", etc. will be understood to include the stated element or component without excluding other elements or components.
As shown in fig. 1, a water vapor barrier film according to a preferred embodiment of the present invention includes a substrate layer 1 and a water vapor barrier layer coated on one side of the substrate layer 1. One side of the water vapor barrier layer, which is away from the substrate layer 1, is provided with an anti-reflection layer 6, and the anti-reflection layer 6 is prepared by adopting a magnetron sputtering process. The water vapor barrier layer comprises a first organic barrier layer 2, a first inorganic barrier layer 3, a second organic barrier layer 4 and a second inorganic barrier layer 5 which are sequentially laminated from a substrate layer 1 to an anti-reflection layer 6. The antireflection layer 6 includes at least one laminated structure, each of which includes a high refractive index layer and a low refractive index layer which are laminated in this order. The high refractive index layer has a refractive index greater than or equal to 1.7, and the low refractive index layer has a refractive index less than or equal to 1.7.
In the embodiment, the water vapor barrier film can effectively block water vapor and oxygen and simultaneously can ensure the transmittance of the water vapor barrier film by laminating a plurality of organic barrier layers and inorganic barrier layers with different refractive indexes. Secondly, coating the first organic barrier layer 2 on the substrate layer 1 can improve the bonding degree between the first inorganic barrier layer 3 and the substrate layer 1, and prevent the first inorganic barrier layer 3 from directly bonding the substrate layer 1 to generate falling. In addition, an anti-reflection layer 6 is further arranged on the organic barrier layer and the inorganic barrier layer, and the anti-reflection layer 6 can further improve the transmittance of the water vapor barrier film.
In one embodiment, the thickness of the substrate layer 1 is between 50 μm and 100 μm. The thickness of the first organic barrier layer 2 and the second organic barrier layer 4 is between 1.5 μm and 2.5 μm. The refractive index of the first organic barrier layer 2 and the second organic barrier layer 4 is between 1.62 and 1.68. The polymer chain segment unit of the organic barrier layer is small, the repeatability is high, and a side chain group with strong polarity exists, so that water molecules are not easy to penetrate, and the excellent water vapor barrier performance is shown.
The thickness of the first inorganic barrier layer 3 and the second inorganic barrier layer 5 is between 150nm and 200nm. The refractive index of the first inorganic barrier layer 3 and the second inorganic barrier layer 5 is between 1.42 and 1.48. The first inorganic barrier layer 3 and the second inorganic barrier layer 5 are silicon oxide coating layers. The inorganic barrier layer is sputtered on the organic barrier layer in a magnetron way, has high compactness, good bonding force with the organic barrier layer and good water vapor barrier effect.
In one embodiment, the first organic barrier layer 2 and the second organic barrier layer 4 are made of an organic coating material by a coating process, the organic coating material comprising the following components in parts by mass: polyfunctional acrylates: 40-50 parts of acrylic resin monomer: 8-12 parts of nanoscale inorganic particles: 1-3 parts of a photoinitiator: 3-6 parts of organic solvent: 50-80 parts.
Further, the polyfunctional acrylate in the first organic barrier layer 2 and the second organic barrier layer 4 is one selected from trimethylolpropane triacrylate, trimethylol pentane trimethacrylate, dipentaerythritol triacrylate, 2-ethyl pentaerythritol triacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, trimethylolpropane trimethacrylate, pentaerythritol tetraacrylate and dipentaerythritol hexaacrylate.
The acrylic resin monomer is selected from one of pentaerythritol triacrylate, 1, 6-hexanediol dimethacrylate, 1, 6-hexanediol diacrylate, ethylene glycol diacrylate, p-pentanediol diacrylate, 2-hydroxyethyl methacrylate, trimethylol pentane trimethacrylate, dipropylene glycol diacrylate and dipentaerythritol acrylate.
The nanometer inorganic particles are selected from any two of silicon dioxide particles, aluminum oxide particles, magnesium silicate particles, aluminum silicate particles, calcium carbonate particles, magnesium carbonate particles, titanium dioxide particles and silicon nitride particles. The particle size of the nano inorganic particles is between 20nm and 80 nm. The addition of the nano inorganic particles can effectively delay the diffusion of water vapor, thereby achieving the purpose effect of improving the water vapor barrier capability of the coating.
The solvent is one or more selected from butanone, methyl isobutyl ketone, acetone, cyclopentanone, propylene glycol methyl ether, ethyl acetate, butyl acetate, amyl acetate, methanol, ethanol, n-propanol, butanol, ethylene glycol diethyl ether, ethylene glycol butyl ether and diethylene glycol diethyl ether.
The photoinitiator is selected from one or more of 2-methyl-4, phenylbenzophenone, 2-methoxy-1, 2-diphenylethanone, 2-methyl-1- [4- (methylthio) phenyl ] -2- (4-morpholinyl) -1-propanone, 1-hydroxycyclohexylphenyl methanone and 2-hydroxy-2-methyl-1-phenyl-1-propanone.
The first organic barrier layer 2 and the second organic barrier layer 4 are prepared as follows: the nano inorganic particles were dissolved in the solvent and stirred for 4 hours by heating to 50 ℃ using a magnetic stirrer. And after stirring, standing to room temperature. Then sequentially add moreAnd (3) stirring the functional acrylic ester and the acrylic resin monomer for 2 hours at room temperature by using a magnetic stirrer, and finally adding a photoinitiator to obtain the barrier liquid. Spin-coating a barrier liquid on a substrate layer 1 or a first inorganic barrier layer 2 by using a 15# wire rod, baking for 2min in an oven at 80 ℃, and then curing the baked sample wafer in a UV machine under the curing condition of 500mJ/cm 2 Curing under ultraviolet light to prepare the first organic barrier layer 2 or the second organic barrier layer 4.
The first inorganic barrier layer 3 and the second inorganic barrier layer 5 are prepared as follows: the high-purity silicon rotary target is coated on the organic barrier layer by adopting a magnetron sputtering roll-to-roll coating method. Wherein, the magnetron sputtering conditions are as follows: argon and oxygen are introduced, the power is 10kw, the running speed is 2m/min, the argon flow is 40sccm, the oxygen flow is 30sccm, and the thickness is 175nm.
In one embodiment, as shown in fig. 2, the anti-reflection layer 6 includes: a first high refractive index layer 61, a first low refractive index layer 62, a second high refractive index layer 63, and a second low refractive index layer 64. The first high refractive index layer 61 is magnetically sputtered on the surface of the second inorganic barrier layer 5; the first low refractive index layer 62 is magnetron sputtered on the surface of the first high refractive index layer 61; the second high refractive index layer 63 is magnetron sputtered on the surface of the first low refractive index layer 62; a second low refractive index layer 64 is magnetron sputtered on the surface of the second high refractive index layer 63.
Specifically, the first high refractive index layer 61 and the second high refractive index layer 63 are niobium pentoxide layers. The first low refractive index layer 62 and the second low refractive index layer 64 are silicon dioxide layers. The thickness of the first high refractive index layer 61 is between 95nm and 105 nm; the thickness of the first low refractive index layer 62 is between 195nm and 205 nm; the second high refractive index layer 63 has a thickness of between 10nm and 20 nm; the second low refractive index layer 64 has a thickness between 110nm and 120 nm.
The first high refractive index layer 61 was a high purity niobium oxide rotary target, and was supplied with argon and oxygen at a power of 12kw, a running speed of 2m/min, an argon flow of 60sccm, an oxygen flow of 8sccm, and a thickness of 100nm. The first low refractive index layer 62 was a high purity silicon rotary target, and was charged with argon and oxygen at a power of 13kw, a running speed of 2m/min, an argon flow rate of 40sccm, an oxygen flow rate of 30sccm, and a thickness of 200nm. The second high refractive index layer 63 was a high purity niobium oxide rotary target, and was charged with argon and oxygen at a power of 2kw, a running speed of 2m/min, an argon flow rate of 60sccm, an oxygen flow rate of 8sccm, and a thickness of 15nm. The second low refractive index layer 64 was a high purity silicon rotary target, and was charged with argon and oxygen at a power of 7.5kw, a running speed of 2m/min, an argon flow rate of 40sccm, an oxygen flow rate of 30sccm, and a thickness of 115nm.
The invention is further illustrated below in connection with specific examples and comparative examples.
Example 1
Substrate layer 1: PET substrate layer 1, 50 μm thick. First organic barrier layer 2:1.5 μm thick. First inorganic barrier layer 3: and the thickness of the silicon oxide coating layer is 150 nm. Second organic barrier layer 4:1.5 μm thick. A second inorganic barrier layer 5: and the thickness of the silicon oxide coating layer is 150 nm. Reflection enhancing layer 6: first high refractive index layer 61: a thickness of 100 nm; first low refractive index layer 62:200nm thick; second high refractive index layer 63:15nm thick; second low refractive index layer 64:115nm thick.
The composition of the first organic barrier layer 2 and the second organic barrier layer 4:
polyfunctional acrylates: 45 parts by mass of a sand-pima CN2254 NS;
acrylic resin monomer: 10 parts by mass of pentaerythritol triacrylate;
nano inorganic particles: silicon oxide (50 nm), 1 part by mass; and, silicon nitride (50 nm), 1 part by mass;
and (3) a photoinitiator: 184,5 parts by mass of basf;
solvent: butanone 30 parts by mass; propylene glycol methyl ether, 30 parts by mass.
Example 2
Substrate layer 1: PET substrate layer 1, 50 μm thick. First organic barrier layer 2:2.5 μm thickness. First inorganic barrier layer 3: and the thickness of the silicon oxide coating layer is 150 nm. Second organic barrier layer 4:2.5 μm thickness. A second inorganic barrier layer 5: and the thickness of the silicon oxide coating layer is 150 nm. Reflection enhancing layer 6: first high refractive index layer 61: a thickness of 100 nm; first low refractive index layer 62:200nm thick; second high refractive index layer 63:15nm thick; second low refractive index layer 64:115nm thick.
The composition of the first organic barrier layer 2 and the second organic barrier layer 4:
polyfunctional acrylates: 45 parts by mass of a sand-pima CN2254 NS;
acrylic resin monomer: 10 parts by mass of pentaerythritol triacrylate;
nano inorganic particles: silicon oxide (50 nm), 1 part by mass; and, silicon nitride (50 nm), 1 part by mass;
and (3) a photoinitiator: 184,5 parts by mass of basf;
solvent: 30 parts of butanone; propylene glycol methyl ether, 30 parts by mass.
Example 3
Substrate layer 1: PET substrate layer 1, 50 μm thick. First organic barrier layer 2:1.5 μm thick. First inorganic barrier layer 3: and the thickness of the silicon oxide coating layer is 190 nm. Second organic barrier layer 4:1.5 μm thick. A second inorganic barrier layer 5: and the thickness of the silicon oxide coating layer is 190 nm. Reflection enhancing layer 6: first high refractive index layer 61: a thickness of 100 nm; first low refractive index layer 62:200nm thick; second high refractive index layer 63:15nm thick; second low refractive index layer 64:115nm thick.
The composition of the first organic barrier layer 2 and the second organic barrier layer 4:
polyfunctional acrylates: 45 parts by mass of a sand-pima CN2254 NS;
acrylic resin monomer: 10 parts by mass of pentaerythritol triacrylate;
nano inorganic particles: silicon oxide (50 nm), 1 part by mass; and, silicon nitride (50 nm), 1 part by mass;
and (3) a photoinitiator: 184,5 parts by mass of basf;
solvent: 30 parts of butanone; propylene glycol methyl ether, 30 parts by mass.
Comparative example 1
Substrate layer 1: PET substrate layer 1, 50 μm thick. First organic barrier layer 2: and no. First inorganic barrier layer 3: and the thickness of the silicon oxide coating layer is 150 nm. Second organic barrier layer 4:1.5 μm thick. A second inorganic barrier layer 5: and the thickness of the silicon oxide coating layer is 150 nm. Reflection enhancing layer 6: first high refractive index layer 61: a thickness of 100 nm; first low refractive index layer 62:200nm thick; second high refractive index layer 63:15nm thick; second low refractive index layer 64:115nm thick.
The composition of the first organic barrier layer 2 and the second organic barrier layer 4:
polyfunctional acrylates: 45 parts by mass of a sand-pima CN2254 NS;
acrylic resin monomer: 10 parts by mass of pentaerythritol triacrylate;
nano inorganic particles: silicon oxide (50 nm), 1 part by mass; and, silicon nitride (50 nm), 1 part by mass;
and (3) a photoinitiator: 184,5 parts by mass of basf;
solvent: 30 parts of butanone; propylene glycol methyl ether, 30 parts by mass.
Comparative example 2
Substrate layer 1: PET substrate layer 1, 50 μm thick. First organic barrier layer 2:1.5 μm thick. First inorganic barrier layer 3: and the thickness of the silicon oxide coating layer is 150 nm. Second organic barrier layer 4:1.5 μm thick. A second inorganic barrier layer 5: and the thickness of the silicon oxide coating layer is 150 nm. Reflection enhancing layer 6: and no.
The composition of the first organic barrier layer 2 and the second organic barrier layer 4:
polyfunctional acrylates: 45 parts by mass of a sand-pima CN2254 NS;
acrylic resin monomer: 10 parts by mass of pentaerythritol triacrylate;
nano inorganic particles: silicon oxide (50 nm), 1 part by mass; and, silicon nitride (50 nm), 1 part by mass;
and (3) a photoinitiator: 184,5 parts by mass of basf;
solvent: butanone 30 parts by mass; propylene glycol methyl ether, 30 parts by mass.
Comparative example 3
Substrate layer 1: PET substrate layer 1, 50 μm thick. First organic barrier layer 2:1 μm thick. First inorganic barrier layer 3: and the thickness of the silicon oxide coating layer is 150 nm. Second organic barrier layer 4:1 μm thick. A second inorganic barrier layer 5: and the thickness of the silicon oxide coating layer is 150 nm. Reflection enhancing layer 6: first high refractive index layer 61: a thickness of 100 nm; first low refractive index layer 62:200nm thick; second high refractive index layer 63:15nm thick; second low refractive index layer 64:115nm thick.
The composition of the first organic barrier layer 2 and the second organic barrier layer 4:
polyfunctional acrylates: 45 parts by mass of a sand-pima CN2254 NS;
acrylic resin monomer: 10 parts by mass of pentaerythritol triacrylate;
nano inorganic particles: silicon oxide (50 nm), 1 part by mass; and, silicon nitride (50 nm), 1 part by mass;
and (3) a photoinitiator: 184,5 parts by mass of basf;
solvent: butanone 30 parts by mass; propylene glycol methyl ether, 30 parts by mass.
Comparative example 4
Substrate layer 1: PET substrate layer 1, 50 μm thick. First organic barrier layer 2:1.5 μm thick. First inorganic barrier layer 3: and the thickness of the silicon oxide coating layer is 150 nm. Second organic barrier layer 4:1.5 μm thick. A second inorganic barrier layer 5: and the thickness of the silicon oxide coating layer is 150 nm. Reflection enhancing layer 6: first high refractive index layer 61: a thickness of 100 nm; first low refractive index layer 62:200nm thick; second high refractive index layer 63:15nm thick; second low refractive index layer 64:115nm thick.
The composition of the first organic barrier layer 2 and the second organic barrier layer 4:
polyfunctional acrylates: 45 parts by mass of a sand-pima CN2254 NS;
acrylic resin monomer: 10 parts by mass of pentaerythritol triacrylate;
nano inorganic particles: silicon oxide (50 nm), 1 part by mass;
and (3) a photoinitiator: 184,5 parts by mass of basf;
solvent: butanone 30 parts by mass; propylene glycol methyl ether, 30 parts by mass.
Comparative example 5
Substrate layer 1: PET substrate layer 1, 50 μm thick. First organic barrier layer 2:1.5 μm thick. First inorganic barrier layer 3: and the thickness of the silicon oxide coating layer is 150 nm. Second organic barrier layer 4:1.5 μm thick. A second inorganic barrier layer 5: and the thickness of the silicon oxide coating layer is 150 nm. Reflection enhancing layer 6: first high refractive index layer 61: a thickness of 100 nm; first low refractive index layer 62:200nm thick; second high refractive index layer 63:15nm thick; second low refractive index layer 64:115nm thick.
The composition of the first organic barrier layer 2 and the second organic barrier layer 4:
polyfunctional acrylates: 55 parts by mass of sarumami CN2254 NS;
acrylic resin monomer: the method is free;
nano inorganic particles: silicon oxide (50 nm), 1 part by mass; and, silicon nitride (50 nm), 1 part by mass;
and (3) a photoinitiator: 184,5 parts by mass of basf;
solvent: butanone 30 parts by mass; propylene glycol methyl ether, 30 parts by mass.
Examples 1 to 3 and comparative examples 1 to 5 were tested, and specific test results are shown in table 1 below.
TABLE 1 results of the related tests for examples 1-3 and comparative examples 1-5
It can be seen from examples 1 to 3 that the water vapor barrier film of the present invention can achieve high transmittance and high water oxygen barrier effect. Simply adding an organic barrier layer or an inorganic barrier layer can improve the water-oxygen barrier rate, but the increase of the organic barrier layer or the inorganic barrier layer and the change of the thickness can affect the optical effect, the organic barrier layer can improve the bending resistance, and the inorganic barrier layer and the anti-reflection layer 6 are not beneficial to bending.
In summary, the water vapor barrier film of the invention can effectively block water vapor and oxygen and simultaneously can ensure the transmittance of the water vapor barrier film by laminating a plurality of organic barrier layers and inorganic barrier layers with different refractive indexes. Secondly, coating the first organic barrier layer 2 on the substrate layer 1 can improve the bonding degree between the first inorganic barrier layer 3 and the substrate layer 1, and prevent the first inorganic barrier layer 3 from directly bonding the substrate layer 1 to generate falling. In addition, an anti-reflection layer 6 is further arranged on the organic barrier layer and the inorganic barrier layer, and the anti-reflection layer 6 can further improve the transmittance of the water vapor barrier film.
The foregoing descriptions of specific exemplary embodiments of the present invention are presented for purposes of illustration and description. It is not intended to limit the invention to the precise form disclosed, and obviously many modifications and variations are possible in light of the above teaching. The exemplary embodiments were chosen and described in order to explain the specific principles of the invention and its practical application to thereby enable one skilled in the art to make and utilize the invention in various exemplary embodiments and with various modifications as are suited to the particular use contemplated. It is intended that the scope of the invention be defined by the claims and their equivalents.
Claims (10)
1. The water vapor barrier film comprises a substrate layer and a water vapor barrier layer coated on one side of the substrate layer, and is characterized in that an anti-reflection layer is arranged on one side of the water vapor barrier layer away from the substrate layer, and the anti-reflection layer is prepared by a magnetron sputtering process;
the water vapor barrier layer comprises a first organic barrier layer, a first inorganic barrier layer, a second organic barrier layer and a second inorganic barrier layer which are sequentially laminated from the substrate layer towards the anti-reflection layer;
the anti-reflection layer comprises at least one laminated structure, and each laminated structure comprises a high refractive index layer and a low refractive index layer which are laminated in sequence;
the high refractive index layer has a refractive index of 1.7 or more and the low refractive index layer has a refractive index of 1.7 or less.
2. The water vapor barrier film of claim 1, wherein the first and second organic barrier layers have a refractive index between 1.62 and 1.68 and the first and second inorganic barrier layers have a refractive index between 1.42 and 1.48.
3. The water vapor barrier film according to claim 2, wherein the first and second organic barrier layers are prepared from an organic coating material by a coating process, the organic coating material comprising the following components in parts by mass:
polyfunctional acrylates: 40-50 parts of acrylic resin monomer: 8-12 parts of nano inorganic particles: 1-3 parts of a photoinitiator: 3-6 parts of organic solvent: 50-80 parts.
4. A water vapor barrier film according to claim 3, wherein the nano-inorganic particles are selected from any two of silica particles, alumina particles, magnesium silicate particles, aluminum silicate particles, calcium carbonate particles, magnesium carbonate particles, titanium dioxide particles, silicon nitride particles, and the particle diameter of the nano-inorganic particles is between 20nm and 80 nm.
5. A water vapor barrier film according to claim 3, wherein the polyfunctional acrylate is selected from one of trimethylolpropane triacrylate, trimethylol pentane trimethacrylate, dipentaerythritol acrylate, 2-ethyl pentaerythritol triacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, trimethylolpropane trimethacrylate, pentaerythritol tetraacrylate, and dipentaerythritol hexaacrylate; and/or the acrylic resin monomer is selected from one of pentaerythritol triacrylate, 1, 6-hexanediol dimethacrylate, 1, 6-hexanediol diacrylate, ethylene glycol diacrylate, p-pentanediol diacrylate, 2-hydroxyethyl methacrylate, trimethylol pentane trimethacrylate, dipropylene glycol diacrylate and dipentaerythritol acrylate.
6. The vapor barrier film of claim 1, wherein the substrate layer has a thickness of between 50 μιη and 100 μιη; and/or the thickness of the first organic barrier layer and the second organic barrier layer is between 1.5 μm and 2.5 μm; and/or the thickness of the first inorganic barrier layer and the second inorganic barrier layer is between 150nm and 200nm.
7. The vapor barrier film of claim 1, wherein the first inorganic barrier layer and the second inorganic barrier layer are silicon oxide coating layers.
8. The vapor barrier film of claim 1, wherein the antireflective layer comprises:
the first high refractive index layer is sputtered on the surface of the second inorganic barrier layer in a magnetron manner;
the first low refractive index layer is sputtered on the surface of the first high refractive index layer in a magnetron manner;
the second high refractive index layer is sputtered on the surface of the first low refractive index layer in a magnetron manner;
and the second low refractive index layer is sputtered on the surface of the second high refractive index layer in a magnetron manner.
9. The vapor barrier film of claim 8, wherein the first high refractive index layer and the second high refractive index layer are niobium pentoxide layers; and/or the first low refractive index layer and the second low refractive index layer are silicon dioxide layers.
10. The vapor barrier film of claim 8, wherein the first high refractive index layer has a thickness between 95nm and 105 nm; and/or the thickness of the first low refractive index layer is between 195nm and 205 nm; and/or the thickness of the second high refractive index layer is between 10nm and 20 nm; and/or the thickness of the second low refractive index layer is between 110nm and 120 nm.
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