CN117512545A - Large-caliber optical film deposition method and coating equipment - Google Patents
Large-caliber optical film deposition method and coating equipment Download PDFInfo
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- CN117512545A CN117512545A CN202410023335.9A CN202410023335A CN117512545A CN 117512545 A CN117512545 A CN 117512545A CN 202410023335 A CN202410023335 A CN 202410023335A CN 117512545 A CN117512545 A CN 117512545A
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- 238000000151 deposition Methods 0.000 title claims abstract description 269
- 239000012788 optical film Substances 0.000 title claims abstract description 34
- 239000011248 coating agent Substances 0.000 title claims abstract description 21
- 238000000576 coating method Methods 0.000 title claims abstract description 21
- 230000003287 optical effect Effects 0.000 claims abstract description 283
- 230000008021 deposition Effects 0.000 claims abstract description 246
- 238000005137 deposition process Methods 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 20
- 238000007747 plating Methods 0.000 claims description 4
- 238000005566 electron beam evaporation Methods 0.000 claims description 3
- 238000001659 ion-beam spectroscopy Methods 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 238000005240 physical vapour deposition Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 10
- 230000010485 coping Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000011165 process development Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
Abstract
The invention relates to the technical field of optical coating, in particular to a large-caliber optical film deposition method and coating equipment, which comprise the following steps: selecting the shape and size of a deposition source according to the shape of an optical element to be deposited; determining a moving track of a deposition source according to the shape of an optical element to be deposited and the shape and the size of the deposition source; the moving track is formed by performing first relative movement on the deposition source and the optical element to be deposited, and the first relative movement direction of the deposition source and the optical element to be deposited is perpendicular to the normal line of the optical element to be deposited and is used for traversing the surface of the optical element to be deposited; the deposition process also comprises a second relative motion which occurs cooperatively with the first relative motion, and the second relative motion direction of the deposition source and the optical element to be deposited is parallel to the normal line of the optical element to be deposited, so as to realize the sagittal height compensation of the optical element to be deposited; and the deposition of the large-caliber optical film layer is completed through the first relative movement and the second relative movement of the deposition source and the optical element to be deposited.
Description
Technical Field
The invention relates to the technical field of optical coating, in particular to a large-caliber optical film deposition method and coating equipment.
Background
The manufacturing of large-aperture optical elements is not separated from the deposition technology of large-aperture optical films. The large-caliber optical element has the problems of large deposition area, large surface-shaped sagittal height difference change and the like, so that one of important difficulties faced by the deposition of the large-caliber optical film is how to realize the consistency of film deposition.
The uniformity of film deposition can be seen in two directions: one is the thickness uniformity of the deposition; another is uniformity of deposition performance. The former directly affects the surface shape index of the optical element after coating, and the latter affects the finally obtained mirror spectrum performance and the environmental performance thereof, thereby affecting the performance and stability of the whole optical system. Many related arts at home and abroad have proposed a lot of proposals to solve the above problems, but none of the technologies having wide applicability have solved the above problems.
The consistency of the optical film performance is affected by a plurality of factors, and factors such as the vacuum condition of equipment, the adopted deposition mode, the adoption of an ion source or not and the like, the distance between a deposition source and an optical element to be deposited, the deposition angle of deposition particles on the optical element to be deposited and the like have great influence on the general condition of the problem.
In the conventional large-caliber optical coating equipment, the basic position relation between a deposition source and an optical element to be deposited is fixed, in this case, the relation between the distance between the deposition source and the optical element to be deposited, the deposition angle of deposition particles on the optical element to be deposited and the like is also fixed, and once the equipment is formed, the relation is difficult to change in the later process development process. This greatly limits the exertion of post-process technicians during post-process development and also limits the technical capabilities of the equipment. This is disadvantageous in terms of a long manufacturing cycle and a large cost for the large-diameter optical coating equipment. Related technicians have proposed a method of using a movable deposition source to achieve uniform deposition of film thickness, but there is a dilemma in coping with the difficulty of uniformity of film deposition performance caused by the ultra-large sagittal height difference of a large-caliber optical element.
Disclosure of Invention
Aiming at the defects of the prior art, the invention provides a large-caliber optical film deposition method and coating equipment, and aims to solve the difficulty of film deposition performance consistency caused by the ultra-large sagittal height difference of a large-caliber optical element.
In order to achieve the above purpose, the invention adopts the following technical scheme:
in a first aspect, a method for depositing a large-caliber optical film layer includes the steps of:
step 1: selecting the shape and size of a deposition source according to the shape of an optical element to be deposited;
step 2: determining a moving track of a deposition source according to the shape of an optical element to be deposited and the shape and the size of the deposition source;
step 3: the moving track is formed by performing first relative movement on the deposition source and the optical element to be deposited, and the first relative movement direction of the deposition source and the optical element to be deposited is perpendicular to the normal line of the optical element to be deposited and is used for traversing the surface of the optical element to be deposited;
step 4: the deposition process also comprises a second relative motion which occurs cooperatively with the first relative motion, and the second relative motion direction of the deposition source and the optical element to be deposited is parallel to the normal line of the optical element to be deposited, so as to realize the sagittal height compensation of the optical element to be deposited;
step 5: and the deposition of the large-caliber optical film layer is completed through the first relative movement and the second relative movement of the deposition source and the optical element to be deposited.
Specifically, in step 1, the optical element to be deposited includes a circular optical element, a rectangular optical element, and a circular optical element whose surface is formed in a rotationally symmetrical structure;
when the optical element to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source is selected as a rectangular deposition source or a circular deposition source, and the size of the deposition source is smaller than that of the optical element to be deposited;
or when the optical element to be deposited is a rectangular optical element, the shape of the deposition source is selected as a rectangular deposition source, and the length of the narrow side of the rectangular deposition source is at least 300mm larger than the length of the narrow side of the surface to be deposited of the optical element to be deposited.
Specifically, in step 2, the movement track is a linear movement track, a linear reciprocating movement track, or a track moving along the grating;
when the optical element to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source is a rectangular deposition source or a circular deposition source, the size of the deposition source is smaller than that of the optical element to be deposited, and the moving track is determined to be a linear reciprocating moving track or a track moving along the grating;
or when the optical element to be deposited is a rectangular optical element, the shape of the deposition source is a rectangular deposition source, the length of the narrow side of the rectangular deposition source is at least 300mm larger than that of the narrow side of the surface to be deposited of the optical element to be deposited, and the moving track is determined to be a linear moving track.
Specifically, in step 2, the projection of the start position and the end position of the movement track to the plane where the optical element to be deposited is located is outside the range of the surface to be deposited of the optical element to be deposited.
Specifically, in step 3, the first relative movement of the deposition source and the optical element to be deposited is specifically:
when the optical element to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source is a rectangular deposition source or a circular deposition source, the size of the deposition source is smaller than that of the optical element to be deposited, the optical element to be deposited is fixed, and the deposition source moves along a grating track to traverse the optical element to be deposited;
or when the optical element to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source is a rectangular deposition source or a circular deposition source, the size of the deposition source is smaller than that of the optical element to be deposited, the optical element to be deposited performs autorotation, and the deposition source traverses the optical element to be deposited in a straight line reciprocating track;
or when the optical element to be deposited is a rectangular optical element, the shape of the deposition source is a rectangular deposition source, the length of the narrow side of the rectangular deposition source is at least 300mm larger than that of the narrow side of the surface to be deposited of the optical element to be deposited, the optical element to be deposited is fixed, and the deposition source traverses the optical element to be deposited through linear track motion.
Specifically, in step 3, the first relative movement of the deposition source and the optical element to be deposited is specifically:
when the optical element to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source is a rectangular deposition source or a circular deposition source, the size of the deposition source is smaller than that of the optical element to be deposited, the deposition source is fixed, and the optical element to be deposited makes a grating track motion so that the deposition source traverses the optical element to be deposited;
or when the optical element to be deposited is a rectangular optical element, the shape of the deposition source is a rectangular deposition source, the length of the narrow side of the rectangular deposition source is at least 300mm larger than that of the narrow side of the surface to be deposited of the optical element to be deposited, the deposition source is fixed, and the optical element to be deposited moves through a linear track to enable the deposition source to traverse the optical element to be deposited.
Specifically, in step 4, the second relative movement of the deposition source and the optical element to be deposited is specifically:
the position of the optical element to be deposited in the vertical direction is fixed, and the deposition source makes linear reciprocating motion parallel to the normal line of the optical element to be deposited, or pitch motion or torsional motion, so as to realize the sagittal height compensation of the optical element to be deposited.
Specifically, in step 4, the second relative movement of the deposition source and the optical element to be deposited is specifically:
the position of the deposition source in the vertical direction is fixed, and the optical element to be deposited does linear reciprocating motion parallel to the normal line of the optical element to be deposited.
In a second aspect, a plating apparatus includes:
the coating box is provided with a vacuum chamber;
the deposition source emission module is arranged in the vacuum chamber and used for emitting a deposition source;
the coating clamp is arranged in the vacuum chamber and used for fixing the optical element to be deposited;
and the three-dimensional vacuum movement system is used for controlling the deposition source and the optical element to be deposited to perform first relative movement and second relative movement.
Specifically, the deposition source emission module includes a magnetron sputtering cathode, an ion beam sputtering system, an electron beam evaporation system, or a physical vapor deposition system.
The invention discloses a large-caliber optical film deposition method and coating equipment, which have the beneficial effects that:
compared with the existing large-caliber optical element deposition mode, the plating method comprising the traditional substrate autorotation set uniformity baffle and the novel dynamic deposition method based on the movable deposition source have dilemma in coping with the problem of film performance deposition consistency caused by the ultra-large sagittal height difference of the large-caliber optical element.
According to the large-caliber optical film deposition method, in the deposition process, the traversal of the optical element to be deposited by the deposition source is completed through the first relative movement between the deposition source and the optical element to be deposited, and meanwhile, the second relative movement which occurs cooperatively with the first relative movement enables the surface distance between the deposition source and the optical element to be deposited to be changed, so that the compensation of the large sagittal height difference of the surface of the large-caliber optical element is realized, the dilemma of the conventional large-caliber optical film deposition method is broken, and the consistent deposition of the film performance is realized.
Drawings
FIG. 1 is a schematic flow chart of a method for depositing a large-caliber optical film layer according to the present invention;
FIG. 2 is a schematic illustration of a first relative movement of the present invention;
FIG. 3 is a schematic illustration of a second first relative motion of the present invention;
FIG. 4 is a schematic illustration of a third first relative motion of the present invention;
FIG. 5 is one of the schematic views of the first second relative motion of the present invention;
FIG. 6 is a second schematic representation of a first second relative motion of the present invention;
fig. 7 is a schematic representation of a second relative motion of the present invention.
Reference numerals illustrate:
1. an optical element to be deposited; 2. a deposition source; 3. a first relative motion; 4. a second relative motion; 5. and (5) autorotation movement.
Detailed Description
The invention will be further described with reference to the drawings and the specific embodiments.
As shown in fig. 1, a method for depositing a large-caliber optical film layer comprises the following steps:
step 1: selecting the shape and size of a deposition source according to the shape of an optical element to be deposited;
step 2: determining a moving track of a deposition source according to the shape of an optical element to be deposited and the shape and the size of the deposition source;
step 3: the moving track is formed by performing first relative movement on the deposition source and the optical element to be deposited, and the first relative movement direction of the deposition source and the optical element to be deposited is perpendicular to the normal line of the optical element to be deposited and is used for traversing the surface of the optical element to be deposited;
step 4: the deposition process also comprises a second relative motion which occurs cooperatively with the first relative motion, and the second relative motion direction of the deposition source and the optical element to be deposited is parallel to the normal line of the optical element to be deposited, so as to realize the sagittal height compensation of the optical element to be deposited;
step 5: and the deposition of the large-caliber optical film layer is completed through the first relative movement and the second relative movement of the deposition source and the optical element to be deposited.
Compared with the existing large-caliber optical element deposition mode, the plating method comprising the traditional substrate autorotation set uniformity baffle and the novel dynamic deposition method based on the movable deposition source have dilemma in coping with the problem of film performance deposition consistency caused by the ultra-large sagittal height difference of the large-caliber optical element.
According to the large-caliber optical film deposition method, in the deposition process, the traversal of the optical element to be deposited by the deposition source is completed through the first relative movement between the deposition source and the optical element to be deposited, and meanwhile, the second relative movement which occurs cooperatively with the first relative movement enables the surface distance between the deposition source and the optical element to be deposited to be changed, so that the compensation of the large sagittal height difference of the surface of the large-caliber optical element is realized, the dilemma of the conventional large-caliber optical film deposition method is broken, and the consistent deposition of the film performance is realized.
It should be noted that, in step 4, the sagittal height compensation of the optical element to be deposited may be kept constant or may be a variable value realized by programming.
A coating apparatus comprising:
the coating box is provided with a vacuum chamber;
the deposition source emission module is arranged in the vacuum chamber and used for emitting a deposition source;
the coating clamp is arranged in the vacuum chamber and used for fixing the optical element to be deposited;
and the three-dimensional vacuum movement system is used for controlling the deposition source and the optical element to be deposited to perform first relative movement and second relative movement.
Specifically, the deposition source emission module includes a magnetron sputtering cathode, an ion beam sputtering system, an electron beam evaporation system, or a physical vapor deposition system.
In the above coating apparatus, the surface of the optical element to be deposited with the coating film may be either face-down, face-up, or face-side.
The specific embodiments of the invention are as follows:
example 1
As shown in fig. 2, 5 and 6, the method for depositing a large-aperture optical film layer in this embodiment includes the following steps:
step 1: the optical element 1 to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source 2 is selected as a rectangular deposition source 2 or a circular deposition source 2, and the size of the deposition source 2 is smaller than that of the optical element 1 to be deposited;
step 2: the moving track is determined as a track moving along the grating; the projection of the initial position of the moving track and the final position of the traversing end to the plane where the optical element 1 to be deposited is located is outside the range of the surface to be deposited of the optical element 1 to be deposited;
step 3: the first relative movement 3 of the deposition source 2 and the optical element 1 to be deposited is in particular: the optical element 1 to be deposited is fixed, and the deposition source 2 moves along a grating track to traverse the optical element 1 to be deposited;
step 4: the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited is in particular: the position of the optical element 1 to be deposited in the vertical direction is fixed, and the deposition source 2 does linear reciprocating motion parallel to the normal line of the optical element 1 to be deposited, or pitching motion, or twisting motion, so as to realize the sagittal height compensation of the optical element 1 to be deposited; so that when the deposition source 2 moves to the positions with different radiuses of the optical element 1 to be deposited, the deposition source 2 can keep the same deposition distance through the movement perpendicular to the surface direction of the optical element 1 to be deposited; the vertical direction refers to a direction parallel to the normal line of the optical element 1 to be deposited;
step 5: the deposition of the large-caliber optical film layer is completed through the first relative movement 3 and the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited.
Example 2
As shown in fig. 3, 5 and 6, the method for depositing a large-aperture optical film layer in this embodiment includes the following steps:
step 1: the optical element 1 to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source 2 is selected as a rectangular deposition source 2 or a circular deposition source 2, and the size of the deposition source 2 is smaller than that of the optical element 1 to be deposited;
step 2: the moving track is determined as a linear reciprocating moving track; the projection of the initial position of the moving track and the final position of the traversing end to the plane where the optical element 1 to be deposited is located is outside the range of the surface to be deposited of the optical element 1 to be deposited;
step 3: the first relative movement 3 of the deposition source 2 and the optical element 1 to be deposited is in particular: the optical element 1 to be deposited makes autorotation 5, and the deposition source 2 traverses the optical element 1 to be deposited in a linear reciprocating track;
step 4: the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited is in particular: the position of the optical element 1 to be deposited in the vertical direction is fixed, and the deposition source 2 does linear reciprocating motion parallel to the normal line of the optical element 1 to be deposited, or pitching motion, or twisting motion, so as to realize the sagittal height compensation of the optical element 1 to be deposited; so that when the deposition source 2 moves to the positions with different radiuses of the optical element 1 to be deposited, the deposition source 2 can keep the same deposition distance through the movement perpendicular to the surface direction of the optical element 1 to be deposited;
step 5: the deposition of the large-caliber optical film layer is completed through the first relative movement 3 and the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited.
Example 3
As shown in fig. 4, 5 and 6, the method for depositing a large-aperture optical film layer in this embodiment includes the following steps:
step 1: the optical element 1 to be deposited is a rectangular optical element, the shape of the deposition source 2 is selected as a rectangular deposition source 2, and the length of the narrow side of the rectangular deposition source 2 is at least 300mm longer than that of the narrow side of the surface to be deposited of the optical element 1 to be deposited;
step 2: the moving track is determined as a linear moving track; the projection of the initial position of the moving track and the final position of the traversing end to the plane where the optical element 1 to be deposited is located is outside the range of the surface to be deposited of the optical element 1 to be deposited;
step 3: the first relative movement 3 of the deposition source 2 and the optical element 1 to be deposited is in particular: the optical element 1 to be deposited is fixed, and the deposition source 2 traverses the optical element 1 to be deposited through linear track motion;
step 4: the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited is in particular: the position of the optical element 1 to be deposited in the vertical direction is fixed, and the deposition source 2 does linear reciprocating motion parallel to the normal line of the optical element 1 to be deposited, or pitching motion, or twisting motion, so as to realize the sagittal height compensation of the optical element 1 to be deposited; so that when the deposition source 2 moves to the positions with different radiuses of the optical element 1 to be deposited, the deposition source 2 can keep the same deposition distance through the movement perpendicular to the surface direction of the optical element 1 to be deposited;
step 5: the deposition of the large-caliber optical film layer is completed through the first relative movement 3 and the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited.
Example 4
As shown in fig. 2 and 7, the method for depositing a large-aperture optical film layer in this embodiment includes the following steps:
step 1: the optical element 1 to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source 2 is selected as a rectangular deposition source 2 or a circular deposition source 2, and the size of the deposition source 2 is smaller than that of the optical element 1 to be deposited;
step 2: the moving track is determined as a track moving along the grating; the projection of the initial position of the moving track and the final position of the traversing end to the plane where the optical element 1 to be deposited is located is outside the range of the surface to be deposited of the optical element 1 to be deposited;
step 3: the first relative movement 3 of the deposition source 2 and the optical element 1 to be deposited is in particular: the deposition source 2 is fixed, and the optical element 1 to be deposited makes a grating track motion, so that the deposition source 2 traverses the optical element 1 to be deposited;
step 4: the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited is in particular: the position of the deposition source 2 in the vertical direction is fixed, and the optical element 1 to be deposited performs linear reciprocating motion parallel to the normal line of the optical element 1 to be deposited; so that when the deposition source 2 moves to the positions with different radiuses of the optical element 1 to be deposited, the deposition distance of the deposition element can be kept the same by the movement perpendicular to the surface direction of the optical element 1 to be deposited;
step 5: the deposition of the large-caliber optical film layer is completed through the first relative movement 3 and the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited.
Example 5
As shown in fig. 3 and 7, the method for depositing a large-aperture optical film layer in this embodiment includes the following steps:
step 1: the optical element 1 to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source 2 is selected as a rectangular deposition source 2 or a circular deposition source 2, and the size of the deposition source 2 is smaller than that of the optical element 1 to be deposited;
step 2: the moving track is determined as a track moving along the grating; the projection of the initial position of the moving track and the final position of the traversing end to the plane where the optical element 1 to be deposited is located is outside the range of the surface to be deposited of the optical element 1 to be deposited;
step 3: the first relative movement 3 of the deposition source 2 and the optical element 1 to be deposited is in particular: the optical element 1 to be deposited makes autorotation 5, and the deposition source 2 traverses the optical element 1 to be deposited in a linear reciprocating track;
step 4: the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited is in particular: the position of the deposition source 2 in the vertical direction is fixed, and the optical element 1 to be deposited performs linear reciprocating motion parallel to the normal line of the optical element 1 to be deposited; so that when the deposition source 2 moves to the positions with different radiuses of the optical element 1 to be deposited, the deposition distance of the deposition element can be kept the same by the movement perpendicular to the surface direction of the optical element 1 to be deposited;
step 5: the deposition of the large-caliber optical film layer is completed through the first relative movement 3 and the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited.
Example 6
As shown in fig. 4 and 7, the method for depositing a large-aperture optical film layer in this embodiment includes the following steps:
step 1: the optical element 1 to be deposited is a rectangular optical element, the shape of the deposition source 2 is selected as a rectangular deposition source 2, and the length of the narrow side of the rectangular deposition source 2 is at least 300mm longer than that of the narrow side of the surface to be deposited of the optical element 1 to be deposited;
step 2: the moving track is determined as a linear moving track; the projection of the initial position of the moving track and the final position of the traversing end to the plane where the optical element 1 to be deposited is located is outside the range of the surface to be deposited of the optical element 1 to be deposited;
step 3: the first relative movement 3 of the deposition source 2 and the optical element 1 to be deposited is in particular: the deposition source 2 is fixed, and the optical element 1 to be deposited moves through a linear track, so that the deposition source 2 traverses the optical element 1 to be deposited;
step 4: the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited is in particular: the position of the deposition source 2 in the vertical direction is fixed, and the optical element 1 to be deposited does linear reciprocating motion parallel to the normal line of the optical element 1 to be deposited, so as to realize the sagittal height compensation of the optical element 1 to be deposited; so that when the deposition source 2 moves to the positions with different radiuses of the optical element 1 to be deposited, the deposition distance of the deposition element can be kept the same by the movement perpendicular to the surface direction of the optical element 1 to be deposited;
step 5: the deposition of the large-caliber optical film layer is completed through the first relative movement 3 and the second relative movement 4 of the deposition source 2 and the optical element 1 to be deposited.
The foregoing description is only of the preferred embodiments of the present invention and is not intended to limit the technical scope of the present invention, so that any minor modifications, equivalent changes and modifications made to the above embodiments according to the technical principles of the present invention still fall within the scope of the technical solutions of the present invention.
Claims (8)
1. The large-caliber optical film layer deposition method is characterized by comprising the following steps of:
step 1: selecting the shape and size of a deposition source according to the shape of an optical element to be deposited;
step 2: determining a moving track of a deposition source according to the shape of an optical element to be deposited and the shape and the size of the deposition source;
step 3: the moving track is formed by performing first relative movement on the deposition source and the optical element to be deposited, and the first relative movement direction of the deposition source and the optical element to be deposited is perpendicular to the normal line of the optical element to be deposited and is used for traversing the surface of the optical element to be deposited;
step 4: the deposition process also comprises a second relative motion which occurs cooperatively with the first relative motion, and the second relative motion direction of the deposition source and the optical element to be deposited is parallel to the normal line of the optical element to be deposited, so as to realize the sagittal height compensation of the optical element to be deposited;
step 5: the deposition of the large-caliber optical film layer is completed through the first relative movement and the second relative movement of the deposition source and the optical element to be deposited;
in step 1, the optical element to be deposited comprises a circular optical element, a rectangular optical element and a circular optical element with a rotationally symmetrical structure;
when the optical element to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source is selected as a rectangular deposition source or a circular deposition source, and the size of the deposition source is smaller than that of the optical element to be deposited;
or when the optical element to be deposited is a rectangular optical element, the shape of the deposition source is selected as a rectangular deposition source, and the length of the narrow side of the rectangular deposition source is at least 300mm longer than that of the narrow side of the surface to be deposited of the optical element to be deposited;
in the step 2, the moving track is a linear moving track, a linear reciprocating moving track or a track moving along the grating;
when the optical element to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source is a rectangular deposition source or a circular deposition source, the size of the deposition source is smaller than that of the optical element to be deposited, and the moving track is determined to be a linear reciprocating moving track or a track moving along the grating;
or when the optical element to be deposited is a rectangular optical element, the shape of the deposition source is a rectangular deposition source, the length of the narrow side of the rectangular deposition source is at least 300mm larger than that of the narrow side of the surface to be deposited of the optical element to be deposited, and the moving track is determined to be a linear moving track.
2. The method according to claim 1, wherein in the step 2, the projection of the start position and the end position of the movement track to the plane of the optical element to be deposited is outside the range of the surface of the optical element to be deposited.
3. The method according to claim 1, wherein in step 3, the first relative movement between the deposition source and the optical element to be deposited is specifically:
when the optical element to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source is a rectangular deposition source or a circular deposition source, the size of the deposition source is smaller than that of the optical element to be deposited, the optical element to be deposited is fixed, and the deposition source moves along a grating track to traverse the optical element to be deposited;
or when the optical element to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source is a rectangular deposition source or a circular deposition source, the size of the deposition source is smaller than that of the optical element to be deposited, the optical element to be deposited performs autorotation, and the deposition source traverses the optical element to be deposited in a straight line reciprocating track;
or when the optical element to be deposited is a rectangular optical element, the shape of the deposition source is a rectangular deposition source, the length of the narrow side of the rectangular deposition source is at least 300mm larger than that of the narrow side of the surface to be deposited of the optical element to be deposited, the optical element to be deposited is fixed, and the deposition source traverses the optical element to be deposited through linear track motion.
4. The method according to claim 1, wherein in step 3, the first relative movement between the deposition source and the optical element to be deposited is specifically:
when the optical element to be deposited is a circular optical element or a circular optical element with a surface formed into a rotationally symmetrical structure, the shape of the deposition source is a rectangular deposition source or a circular deposition source, the size of the deposition source is smaller than that of the optical element to be deposited, the deposition source is fixed, and the optical element to be deposited makes a grating track motion so that the deposition source traverses the optical element to be deposited;
or when the optical element to be deposited is a rectangular optical element, the shape of the deposition source is a rectangular deposition source, the length of the narrow side of the rectangular deposition source is at least 300mm larger than that of the narrow side of the surface to be deposited of the optical element to be deposited, the deposition source is fixed, and the optical element to be deposited moves through a linear track to enable the deposition source to traverse the optical element to be deposited.
5. The method according to claim 3 or 6, wherein in step 4, the second relative movement of the deposition source and the optical element to be deposited is specifically:
the position of the optical element to be deposited in the vertical direction is fixed, and the deposition source makes linear reciprocating motion parallel to the normal line of the optical element to be deposited, or pitch motion or torsional motion, so as to realize the sagittal height compensation of the optical element to be deposited.
6. The method according to claim 3 or claim 4, wherein in step 4, the second relative movement of the deposition source and the optical element to be deposited is specifically:
the position of the deposition source in the vertical direction is fixed, and the optical element to be deposited does linear reciprocating motion parallel to the normal line of the optical element to be deposited.
7. A coating apparatus suitable for use in the method for depositing a large-caliber optical film layer according to any one of claims 1 to 6, comprising:
the coating box is provided with a vacuum chamber;
the deposition source emission module is arranged in the vacuum chamber and used for emitting a deposition source;
the coating clamp is arranged in the vacuum chamber and used for fixing the optical element to be deposited;
and the three-dimensional vacuum movement system is used for controlling the deposition source and the optical element to be deposited to perform first relative movement and second relative movement.
8. The plating apparatus according to claim 7, wherein the deposition source emission module comprises a magnetron sputtering cathode, an ion beam sputtering system, an electron beam evaporation system, or a physical vapor deposition system.
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| CN202410023335.9A CN117512545A (en) | 2024-01-08 | 2024-01-08 | Large-caliber optical film deposition method and coating equipment |
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| US20170207071A1 (en) * | 2014-07-09 | 2017-07-20 | Soleras Advanced Coatings Bvba | Sputter Device with Moving Target |
| JP2019052371A (en) * | 2017-09-14 | 2019-04-04 | エフ・ハー・エル・アンラーゲンバウ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | Method and device for homogeneously coating 3d substrates |
| CN115710689A (en) * | 2022-11-07 | 2023-02-24 | 湖南玉丰真空科学技术有限公司 | Telescopic mechanism for coating cathode of irregular curved surface workpiece |
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| US20170207071A1 (en) * | 2014-07-09 | 2017-07-20 | Soleras Advanced Coatings Bvba | Sputter Device with Moving Target |
| JP2019052371A (en) * | 2017-09-14 | 2019-04-04 | エフ・ハー・エル・アンラーゲンバウ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | Method and device for homogeneously coating 3d substrates |
| CN115710689A (en) * | 2022-11-07 | 2023-02-24 | 湖南玉丰真空科学技术有限公司 | Telescopic mechanism for coating cathode of irregular curved surface workpiece |
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