CN117504641A - Device for stirring and controlling temperature of chemical etching liquid - Google Patents
Device for stirring and controlling temperature of chemical etching liquid Download PDFInfo
- Publication number
- CN117504641A CN117504641A CN202311469279.3A CN202311469279A CN117504641A CN 117504641 A CN117504641 A CN 117504641A CN 202311469279 A CN202311469279 A CN 202311469279A CN 117504641 A CN117504641 A CN 117504641A
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- stirring
- etching liquid
- transmission shaft
- temperature
- chemical etching
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- 238000003756 stirring Methods 0.000 title claims abstract description 78
- 239000007788 liquid Substances 0.000 title claims abstract description 71
- 238000003486 chemical etching Methods 0.000 title claims abstract description 41
- 238000005530 etching Methods 0.000 claims abstract description 49
- 238000010438 heat treatment Methods 0.000 claims abstract description 46
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 230000005540 biological transmission Effects 0.000 claims description 37
- 238000005485 electric heating Methods 0.000 claims description 16
- 208000032370 Secondary transmission Diseases 0.000 claims description 12
- -1 polytetrafluoroethylene Polymers 0.000 claims description 5
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 5
- 239000011241 protective layer Substances 0.000 claims description 4
- 238000013019 agitation Methods 0.000 claims description 2
- 238000000926 separation method Methods 0.000 claims 2
- 238000000034 method Methods 0.000 abstract description 13
- 230000000694 effects Effects 0.000 abstract description 11
- 230000008569 process Effects 0.000 abstract description 9
- 241000883990 Flabellum Species 0.000 abstract description 4
- 230000008859 change Effects 0.000 abstract description 2
- 230000001737 promoting effect Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 description 10
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 238000005859 coupling reaction Methods 0.000 description 5
- 238000002955 isolation Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F27/00—Mixers with rotary stirring devices in fixed receptacles; Kneaders
- B01F27/80—Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis
- B01F27/808—Mixers with rotary stirring devices in fixed receptacles; Kneaders with stirrers rotating about a substantially vertical axis with stirrers driven from the bottom of the receptacle
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/30—Driving arrangements; Transmissions; Couplings; Brakes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/30—Driving arrangements; Transmissions; Couplings; Brakes
- B01F35/32—Driving arrangements
- B01F35/321—Disposition of the drive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/30—Driving arrangements; Transmissions; Couplings; Brakes
- B01F35/33—Transmissions; Means for modifying the speed or direction of rotation
- B01F35/332—Transmissions; Means for modifying the speed or direction of rotation alternately changing the direction of rotation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/50—Mixing receptacles
- B01F35/53—Mixing receptacles characterised by the configuration of the interior, e.g. baffles for facilitating the mixing of components
- B01F35/531—Mixing receptacles characterised by the configuration of the interior, e.g. baffles for facilitating the mixing of components with baffles, plates or bars on the wall or the bottom
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/90—Heating or cooling systems
- B01F35/93—Heating or cooling systems arranged inside the receptacle
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The invention discloses a device for stirring and controlling the temperature of chemical etching liquid, which comprises: the substrate is a hollow cuboid piece, an opening is formed in the upper end of the substrate, and the substrate is used for storing etching liquid; the stirring fan blade is arranged at the bottom in the base body and is used for stirring etching liquid; the driving device is arranged on the base body and connected with the stirring fan blade; and the heating module is arranged at the bottom in the substrate and used for heating the etching liquid. The device for stirring of chemical etching liquid and control by temperature change that this application provided, through the inside stirring flabellum that sets up of base member and heating module cooperation, can guarantee the etching liquid of each position department in the etching process, the device not only can be used before chemical etching, can also be used in chemical etching process, has guaranteed the homogeneity of configuration solution concentration and temperature, has important meaning to promoting chemical etching effect.
Description
Technical Field
The invention relates to the technical field of precision manufacturing of resonance gyroscopes, in particular to a device for stirring and controlling temperature of chemical etching liquid.
Background
The hemispherical resonator gyro is a novel inertial-stage solid fluctuation gyro, and the high-performance, high-precision and high-stability resonator gyro needs a high-quality factor resonator which is generally manufactured by adopting fused quartz glass materials, and in the process of manufacturing the high-quality factor resonator, an important process step different from the common mechanical part processing, namely chemical etching is provided.
After the harmonic oscillator is machined, certain surface loss is impossible to exist on the surface of the harmonic oscillator, and the surface loss is caused by mechanical damage and microcracks on the surface of the harmonic oscillator due to insufficient precision of machining equipment and machining technology and the fact that quartz materials have hard brittleness and the like in the machining, grinding and polishing processes of the harmonic oscillator, so that the quality factor of the harmonic oscillator is reduced. The chemical etching is beneficial to reducing the surface loss of the harmonic oscillator and improving the quality factor of the harmonic oscillator by carrying out secondary polishing on the processed harmonic oscillator.
For chemical etching of the harmonic oscillator, the concentration, the temperature and the consistency of the chemical etching liquid are key factors influencing the chemical etching effect of the harmonic oscillator and improving the quality factor of the harmonic oscillator. At present, the following problems mainly exist in the process of preparing chemical etching liquid: 1. when the solution is prepared, the components are mixed according to a fixed proportion, an operator is required to stir manually, uniformity is difficult to grasp, long-time stirring is required, etching liquid has certain corrosiveness, and the method is not beneficial to human health; 2. the proportioned etching liquid is usually used uninterruptedly, and the layering phenomenon of the etching liquid after long-time rest is not beneficial to ensuring the chemical etching effect of the harmonic oscillator; 3. the existing device lacks a temperature control module, and accurate control of the etching liquid temperature is difficult to realize.
In summary, how to prepare a chemical etching solution with uniform concentration and temperature to improve the chemical etching effect and quality factor of the resonator is a problem to be solved by those skilled in the art.
Disclosure of Invention
Therefore, the invention aims to provide a device for stirring and controlling the temperature of chemical etching liquid, which not only can be used before chemical etching, but also can be used in the chemical etching process, ensures the uniformity of concentration and temperature of a configuration solution, and can greatly improve the chemical etching effect and quality factor of a harmonic oscillator.
In order to achieve the above object, the present invention provides the following technical solutions:
an apparatus for chemical etching liquid agitation and temperature control, comprising:
the substrate is a hollow cuboid piece, an opening is formed in the upper end of the substrate, and the substrate is used for storing etching liquid;
the stirring fan blade is arranged at the bottom in the base body and is used for stirring the etching liquid;
the driving device is arranged on the base body and connected with the stirring fan blade;
and the heating module is arranged at the bottom in the substrate and is used for heating the etching liquid.
Preferably, the driving device comprises a servo motor, a shaft coupling, a main transmission shaft, a bevel gear and a secondary transmission shaft, wherein the output end of the servo motor is connected with the main transmission shaft through the shaft coupling, one end of the main transmission shaft, which deviates from the servo motor, is provided with the bevel gear, two ends of the secondary transmission shaft are respectively provided with the bevel gear, the lower end of the stirring fan blade is provided with the bevel gear, and the main transmission shaft, the secondary transmission shaft and the stirring fan blade are connected through the bevel gear.
Preferably, the servo motor is arranged on the base body through a motor base, two transmission shaft supports are arranged on the inner wall of the base body, the main transmission shaft penetrates through the two transmission shaft supports, two transmission shaft supports are arranged at the bottom of the base body, and the secondary transmission shaft penetrates through the two transmission shaft supports at the bottom of the base body.
Preferably, the servo motor comprises an angular velocity sensor for detecting the rotational speed of the output end of the servo motor, and the angular velocity sensor is connected to a control system for controlling the output power of the servo motor.
Preferably, a temperature sensing module is arranged on the motor base and used for detecting the temperature of the etching liquid, the temperature sensing module is connected with the control system, and the control system is connected with the heating module and used for controlling the output power of the heating module.
Preferably, the matrix is internally provided with two isolation nets which are arranged vertically to each other.
Preferably, the heating module comprises an electric heating pipe and a power supply device, the electric heating pipe is a U-shaped piece, and the electric heating pipe is electrically connected with the power supply device.
Preferably, a polytetrafluoroethylene protective layer is arranged on the periphery of the electric heating tube.
Preferably, the stirring fan blade is connected to the bottom surface of the base body through a fan blade support, and the heating module is arranged between the bottom surface of the base body and the stirring fan blade.
According to the device for stirring and controlling the temperature of the chemical etching liquid, the substrate of the device is a hollow piece, the etching liquid is stored in the substrate, the stirring fan blade and the heating module are further arranged at the bottom of the substrate, the stirring fan blade is connected with the driving device, the stirring fan blade can be controlled to be opened and closed by controlling the driving device, in the opened state of the stirring fan blade, an operator only needs to pour different solutions into the substrate according to specified metering, the stirring fan blade automatically completes mixing and full stirring of the solutions, the operator does not need to manually stir the etching liquid, the workload of the operator can be reduced, and the operator is prevented from being influenced by chemicals;
the bottom of the base body is also provided with a heating module, the heating module can heat etching liquid in the base body to ensure that the etching liquid is always at the optimal temperature for etching the harmonic oscillator, for the heating module and the stirring fan blade, the temperature of the etching liquid at the bottom in the heating process of the heating module is firstly increased, the density is lowered to be floated, the temperature of the etching liquid at the inner upper part of the base body is relatively lower, the density is relatively higher to be sunk, and the stirring fan blade can accelerate the flow of the etching liquid in the base body to ensure that the temperature of the etching liquid in the base body is uniform, so that the quality factor of the etched harmonic oscillator is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are required to be used in the embodiments or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are only embodiments of the present invention, and that other drawings can be obtained according to the provided drawings without inventive effort for a person skilled in the art.
FIG. 1 shows an apparatus for stirring and controlling the temperature of a chemical etching liquid according to the present invention.
In fig. 1, reference numerals include:
the device comprises a base body 1, stirring blades 2, a heating module 3, a servo motor 4, a coupler 5, a main transmission shaft 6, a bevel gear 7, a secondary transmission shaft 8, a motor base 9, a transmission shaft support 10, an isolation net 11 and a blade support 12.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The invention has the core of providing a device for stirring and controlling the temperature of chemical etching liquid, which can prepare chemical etching solution with uniform concentration and temperature, and can be used not only before chemical etching but also in the chemical etching process, thereby ensuring the uniformity of the concentration and the temperature of the prepared solution and greatly improving the chemical etching effect and the quality factor of a harmonic oscillator.
It should be noted that, in the present embodiment, the orientation or positional relationship indicated by "upper", "lower", "front", "rear", etc. is based on the orientation or positional relationship shown in the drawings, and is merely for convenience of description of the present application and simplification of the description, and is not indicative or implying that the apparatus or element in question must have a specific orientation, be configured and operated in a specific orientation, and therefore, should not be construed as limiting the present application.
The application provides a device for chemical etching liquid stirring and control by temperature change, include: a base body 1, stirring fan blades 2, a driving device and a heating module 3;
wherein, the base body 1 is a hollow cuboid piece, the upper end of the base body 1 is provided with an opening, and the inner cavity of the base body 1 is used for storing etching liquid;
the stirring fan blade 2 is arranged at the bottom in the matrix 1 and is used for stirring etching liquid;
the driving device is arranged on the base body 1 and connected with the stirring fan blade 2;
the heating module 3 is arranged at the bottom in the substrate 1, and the heating module 3 is used for heating etching liquid.
Specifically, please refer to fig. 1, the substrate 1 is a cuboid shell, the upper end of the substrate 1 is provided with an opening, an operator adds chemicals contained in etching liquid into the substrate 1 according to a certain metering, the bottom in the substrate 1 is provided with a stirring fan blade 2, a driving device can be opened in the process of adding the chemicals, the driving device is electrically connected with the stirring fan blade 2, so that the stirring fan blade 2 can stir the chemicals in the substrate 1, so that various chemicals can be fully mixed, the manual stirring of the operator is not needed, the workload of the operator can be reduced, the operator is prevented from inhaling the chemicals, the operation risk is reduced, the bottom in the substrate 1 is also provided with a heating module 3, the heating module 3 can heat the chemicals at the bottom in the substrate 1, the density of the heated chemicals is reduced, the temperature of the chemicals at the upper part in the substrate 1 is relatively low, the density is relatively high, and accordingly, the temperature of the chemicals to be etched is lowered, the heating module 3 can ensure the internal temperature of the substrate 1 to be always at the optimal temperature for etching, and the etching objects to be directly placed into the etching liquid in the substrate 1 can be fully etched, and the etching can be realized, and the quality factor after the etching can be improved;
to the cooperation of heating module 3 and stirring flabellum 2 use, heating module 3 to the in-process of etching liquid heating, stirring flabellum 2 can drive the inside liquid flow of base member 1, accelerates the heat transfer of the interior liquid of base member 1, can improve heating efficiency.
Optionally, the article to be etched is typically a resonator.
On the basis of the above embodiment, the driving device includes a servo motor 4, a coupling 5, a main driving shaft 6, a bevel gear 7 and a secondary driving shaft 8, wherein the output end of the servo motor 4 is connected to the main driving shaft 6 through the coupling 5, one end of the main driving shaft 6, which is away from the servo motor 4, is provided with the bevel gear 7, two ends of the secondary driving shaft 8 are provided with the bevel gear 7, the lower end of the stirring fan blade 2 is provided with the bevel gear 7, and the main driving shaft 6, the secondary driving shaft 8 and the stirring fan blade 2 are connected through the bevel gear 7.
Wherein, servo motor 4 locates the upper portion of base member 1 and not with etching liquid contact, servo motor 4 passes through shaft coupling 5 and connects in main drive shaft 6, and main drive shaft 6 vertical setting, and the level setting of secondary drive shaft 8 just all is equipped with bevel gear 7 at the both ends of secondary drive shaft 8, and main drive shaft 6 passes through bevel gear 7 transmission with secondary drive shaft 8 and is connected, and secondary drive shaft 8 passes through bevel gear 7 transmission with stirring flabellum 2 and is connected.
Specifically, the stirring fan blade 2 is arranged on the bottom surface inside the base body 1, the plane where the fan blade is arranged is parallel to the bottom surface of the base body 1, the servo motor 4 cannot be arranged inside the base body 1, the servo motor 4 is prevented from being in contact with etching liquid, the servo motor 4 is prevented from being corroded, the anti-creeping effect is achieved, the servo motor 4 is fixedly connected with the main transmission shaft 6 through the coupler 5, the main transmission shaft 6 can be driven to rotate when the servo motor 4 is started, the main transmission shaft 6 drives the secondary transmission shaft 8 to rotate through the bevel gear 7, and the secondary transmission shaft 8 drives the stirring fan blade 2 to rotate through the bevel gear 7, so that stirring of etching liquid is achieved.
On the basis of the above embodiment, the servo motor 4 is disposed on the base 1 through the motor base 9, two transmission shaft supports 10 are disposed on the inner wall of the base 1, the main transmission shaft 6 is disposed through the two transmission shaft supports 10, two transmission shaft supports 10 are disposed at the bottom of the base 1, and the sub transmission shaft 8 is disposed through the two transmission shaft supports 10 at the bottom of the base 1.
Wherein, motor cabinet 9 is the sheet structure of L shape, and the one end of motor cabinet 9 is fixed in the outside lateral wall of base member 1, and the other end is on a parallel with the up end of base member 1 and sets up directly over the up end of base member 1, and servo motor 4 sets up in the up end of motor cabinet 9, is provided with two transmission shaft support 10 on the inside lateral wall of base member 1, and the inside bottom surface of base member 1 is provided with two transmission shaft support 10, and two sets of transmission shaft support 10 are used for installing final drive shaft 6 and secondary drive shaft 8 respectively.
Specifically, the servo motor 4 is arranged on the upper end face of the motor base 9 so as to drive the main transmission shaft 6, thereby driving the secondary transmission shaft 8 to rotate, and the motor base 9 and the transmission shaft support 10 are matched for use so as to support the whole framework of the stirring mechanism.
On the basis of the above embodiment, the servomotor 4 includes an angular velocity sensor for detecting the rotational speed of the output end of the servomotor 4, the angular velocity sensor being connected to a control system for controlling the output power of the servomotor 4.
Specifically, the rotational speed of the output end of the servo motor 4 is monitored in real time through the angular velocity sensor, and the control system can receive information fed back by the angular velocity sensor and regulate and control the rotational speed of the servo motor 4 according to the feedback information so as to ensure that the etching liquid in the substrate 1 achieves a more uniform mixing effect of density and components.
On the basis of the above embodiment, the motor base 9 is provided with a temperature sensing module, the temperature sensing module is used for detecting the temperature of the etching liquid, the temperature sensing module is connected to a control system, and the control system is connected to the heating module 3 and is used for controlling the output power of the heating module 3.
Specifically, the temperature sensing detection module is located on the upper layer of the etching liquid stored in the substrate 1, so that real-time monitoring of the temperature of the etching liquid can be realized, and a detection result is transmitted to the control system, and then the control system is used for controlling the starting and closing of the heating module 3, so that the optimal temperature of the etching reaction is always kept in the use process of the etching liquid in the substrate 1, and the quality factor of the etched article is improved.
In some embodiments, the isolating net 11 is arranged in the base 1, and the isolating net 11 is arranged in two mutually perpendicular ways.
Specifically, two isolation nets 11 arranged in the substrate 1 are mutually perpendicular to form an L-shaped structure, the two isolation nets 11 divide the interior of the substrate 1 into two parts, one part is used for installing the stirring fan blade 2 and the heating module 3, the other part is used for placing an article to be etched, in general, the article to be etched needs to move in the substrate 1 in the etching process, and the arrangement of the isolation nets 11 can prevent the collision between the article to be etched and the stirring fan blade 2 and the heating module 3 in the substrate 1 under the condition of ensuring the circulation of etching liquid.
In some embodiments, the heating module 3 comprises an electric heating tube and a power supply device, the electric heating tube being a U-shaped piece, the electric heating tube being electrically connected to the power supply device.
In particular, the electric heating pipe and the power supply device are matched for use, so that the effect of instant use and convenient regulation can be achieved, and compared with the use of convection heat exchange equipment, the electric heating pipe and the power supply device are lower in cost and more convenient.
On the basis of the embodiment, the outer periphery of the electric heating tube is provided with a polytetrafluoroethylene protective layer.
Specifically, the protective layer on the periphery of the electric heating pipe is made of polytetrafluoroethylene anti-corrosion materials, the electric heating pipe is designed into a structure that two L-shaped pipes are connected with a plurality of U-shaped pipes end to end, the electric heating pipe is arranged on the side wall and the bottom in the base body 1, can avoid the transmission shaft support 10 and is positioned below the stirring fan blades 2, when the heating module 3 works, liquid at the bottom is heated, the density is lowered, the liquid floats upwards, the liquid at the upper layer is at a lower temperature, and the liquid sinks due to the higher density; at this time, the stirring blade 2 is matched to work, so that the stirring of the solution in the matrix 1 can be accelerated, and the mixing effect of more uniform density, components and temperature can be achieved.
It should be noted that, the base 1, the stirring fan blade 2, the driving device and the heating module 3 are made of materials capable of resisting chemical etching, such as ceramics or polytetrafluoroethylene; also, the same effect can be achieved by spraying an anti-corrosion coating on the surface of the aforementioned component.
On the basis of the above embodiment, the stirring blade 2 is connected to the bottom surface of the base 1 through the blade support 12, and the heating module 3 is disposed between the bottom surface of the base 1 and the stirring blade 2.
Specifically, the fan blade support 12 is an L-shaped structural member, one end of the fan blade support 12 is connected to the bottom of the base body 1, the other end of the fan blade support is perpendicular to the bottom of the base body 1, so that a certain gap exists between the stirring fan blade 2 and the bottom surface inside the base body 1, the installation of the heating module 3 is facilitated, the integration level of equipment can be improved, the heating module 3 heats etching liquid while the stirring fan blade 2 can stir the liquid, the flow of the etching liquid in the base body 1 is accelerated, and the heating efficiency is improved.
In the present specification, each embodiment is described in a progressive manner, and each embodiment is mainly described in a different point from other embodiments, and identical and similar parts between the embodiments are all enough to refer to each other.
The device for stirring and controlling the temperature of the chemical etching liquid provided by the invention is described in detail above. The principles and embodiments of the present invention have been described herein with reference to specific examples, the description of which is intended only to facilitate an understanding of the method of the present invention and its core ideas. It should be noted that it will be apparent to those skilled in the art that various modifications and adaptations of the invention can be made without departing from the principles of the invention and these modifications and adaptations are intended to be within the scope of the invention as defined in the following claims.
Claims (9)
1. An apparatus for chemical etching liquid agitation and temperature control, comprising:
the substrate (1) is a hollow cuboid piece, an opening is formed in the upper end of the substrate, and the substrate (1) is used for storing etching liquid;
the stirring fan blade (2) is arranged at the bottom in the substrate (1) and is used for stirring the etching liquid;
the driving device is arranged on the base body (1) and connected with the stirring fan blades (2);
and the heating module (3) is arranged at the bottom in the substrate (1), and the heating module (3) is used for heating the etching liquid.
2. The device for stirring and controlling the temperature of chemical etching liquid according to claim 1, wherein the driving device comprises a servo motor (4), a coupler (5), a main transmission shaft (6), a bevel gear (7) and a secondary transmission shaft (8), wherein the output end of the servo motor (4) is connected with the main transmission shaft (6) through the coupler (5), one end of the main transmission shaft (6) deviating from the servo motor (4) is provided with the bevel gear (7), two ends of the secondary transmission shaft (8) are provided with the bevel gear (7), the lower end of the stirring fan blade (2) is provided with the bevel gear (7), and the main transmission shaft (6), the secondary transmission shaft (8) and the stirring fan blade (2) are connected through the bevel gear (7).
3. The device for stirring and controlling the temperature of chemical etching liquid according to claim 2, wherein the servo motor (4) is arranged on the base body (1) through a motor base (9), two transmission shaft supports (10) are arranged on the inner wall of the base body (1), the main transmission shaft (6) passes through the two transmission shaft supports (10), two transmission shaft supports (10) are arranged at the bottom of the base body (1), and the secondary transmission shaft (8) passes through the two transmission shaft supports (10) at the bottom of the base body (1).
4. A device for chemical etching liquid stirring and temperature control according to claim 3, characterized in that the servo motor (4) comprises an angular velocity sensor for detecting the rotational speed of the output of the servo motor (4), which is connected to a control system for controlling the output power of the servo motor (4).
5. The device for stirring and controlling the temperature of a chemical etching liquid according to claim 4, wherein a temperature sensing module is arranged on the motor base (9), the temperature sensing module is used for detecting the temperature of the etching liquid, the temperature sensing module is connected with the control system, and the control system is connected with the heating module (3) and used for controlling the output power of the heating module (3).
6. Device for stirring and controlling the temperature of a chemical etching liquid according to claim 1, characterized in that the inside of the base body (1) is provided with a separation net (11), the separation net (11) is provided with two and mutually perpendicular.
7. Device for stirring and temperature control of chemical etching liquids according to claim 1, characterized in that the heating module (3) comprises an electric heating tube, which is a U-shaped piece, and a power supply device, which is electrically connected to the electric heating tube.
8. The apparatus for stirring and controlling temperature of chemical etching liquid according to claim 7, wherein a polytetrafluoroethylene protective layer is provided on the outer periphery of the electric heating tube.
9. The apparatus for stirring and controlling temperature of chemical etching liquid according to any one of claims 1 to 8, wherein the stirring blade (2) is connected to the bottom surface of the base body (1) through a blade holder (12), and the heating module (3) is disposed between the bottom surface of the base body (1) and the stirring blade (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311469279.3A CN117504641A (en) | 2023-11-07 | 2023-11-07 | Device for stirring and controlling temperature of chemical etching liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311469279.3A CN117504641A (en) | 2023-11-07 | 2023-11-07 | Device for stirring and controlling temperature of chemical etching liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117504641A true CN117504641A (en) | 2024-02-06 |
Family
ID=89752345
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311469279.3A Pending CN117504641A (en) | 2023-11-07 | 2023-11-07 | Device for stirring and controlling temperature of chemical etching liquid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117504641A (en) |
-
2023
- 2023-11-07 CN CN202311469279.3A patent/CN117504641A/en active Pending
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