CN209836303U - Film preparation equipment - Google Patents

Film preparation equipment Download PDF

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Publication number
CN209836303U
CN209836303U CN201822245710.7U CN201822245710U CN209836303U CN 209836303 U CN209836303 U CN 209836303U CN 201822245710 U CN201822245710 U CN 201822245710U CN 209836303 U CN209836303 U CN 209836303U
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China
Prior art keywords
reaction tank
reaction
temperature
heating device
liquid
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CN201822245710.7U
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Chinese (zh)
Inventor
曾雄
惠述伟
张升飞
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Dongjun new energy Co.,Ltd.
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Huaxia Energy (guangdong) Amperex Technology Ltd
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Abstract

The utility model discloses a film preparation equipment, include: a reaction tank (10) for performing a chemical deposition reaction on the injected reaction solution; set up circulating device (20) outside reaction tank (10), the one end and reaction tank (10) bottom intercommunication of circulating device (20), the other end and reaction tank (10) upper portion intercommunication, circulating device (20) will be carried to external heater heating through the reaction solution that reaction tank (10) upper portion overflowed, then pour into this reaction solution through the notes liquid mouth of reaction tank (10) bottom, still include: at least one heating device (30) which is arranged at the lower part or the outer side of the bottom of the reaction tank (10) and is used for heating the reaction liquid in the reaction tank (10) in a non-contact way; and the temperature measuring instrument (40) is arranged near the upper outlet of the reaction tank (10) and is used for detecting the temperature of the reaction liquid overflowing from the reaction tank (10). By adopting the embodiment, the problem of heating time delay is effectively solved, and the temperature of the reaction liquid in the reaction tank (10) is uniformly distributed while the temperature is rapidly raised.

Description

Film preparation equipment
Technical Field
The utility model relates to a chemical water bath deposition apparatus field, concretely relates to chemical water bath deposition film preparation equipment field.
Background
Chemical Bath Deposition (CBD) is a method for depositing a film on the surface of a substrate by utilizing chemical reaction, and the prior art mixes reaction liquid into a reaction tank by a pump, overflows to an external heater for heating through an overflow port at the top of the tank, and then conveys the reaction liquid into the tank from a liquid injection port at the bottom of the tank so as to regulate and control the solubility and temperature of the reaction liquid in the reaction tank, and then a layer of uniform and compact cadmium sulfide film is deposited on the surface of the glass substrate.
However, the existing heating mode has the following defects:
1. the temperature of the reaction liquid in the reaction tank cannot be uniformly distributed, so that the temperature of the lower part of the reaction tank is higher than that of the upper part of the reaction tank;
2. the heating time is long, and the reaction liquid in the reaction tank has certain ductility;
3. the non-uniformity of the temperature above and below the reaction liquid can directly influence the film forming quality, the appearance has color difference, the film layer is non-uniform, and the performance of the film is further reduced.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a can make the interior reaction liquid rapid heating up of reaction tank and its temperature evenly distributed, improve film quality's film preparation equipment.
In order to solve the above problem, the utility model provides a film preparation equipment, include: a reaction tank for injecting reaction liquid to perform chemical deposition reaction to prepare a film; set up and be in outside circulating device of reaction tank, circulating device's one end with reaction tank bottom intercommunication, its other end with reaction tank upper portion intercommunication, circulating device will carry the reaction liquid that overflows through the overflow mouth on reaction tank upper portion to the heating of external heater, then through the notes liquid mouth of reaction tank bottom to inject the reaction liquid after the heating in the reaction tank, its characterized in that still includes: at least one heating device which is arranged at the lower part or the outer side of the bottom of the reaction tank and is used for heating the reaction liquid in the reaction tank in a non-contact way; and the temperature measuring instrument is arranged near the outlet at the upper part of the reaction tank and is used for detecting the temperature of the overflow reaction liquid at the upper part of the reaction tank.
Further, the temperature controller is electrically connected to the heating device and used for controlling the on-off and the output power of the heating device so as to control the temperature of the reaction liquid.
Further, the control device is electrically connected to the temperature measuring instrument and the temperature controller, and is used for controlling the on-off and the output power of the thermal device through the temperature controller according to the temperature of the reaction liquid fed back by the temperature measuring instrument, so as to control the temperature of the reaction liquid.
Further, when the temperature measuring instrument detects that the temperature of the overflow reaction liquid reaches a set value, the control device sends an instruction to reduce the output power of the heating device and keep the working state, and the control device is matched with the circulating device to maintain the temperature of the reaction liquid at the set value; when the temperature measuring instrument detects that the temperature of the overflow reaction liquid is higher than a set value, the control device controls the heating device to be closed, the circulating device continues to work, and the temperature and the concentration of the reaction liquid in the reaction tank are kept uniform. Further, when the temperature measuring instrument detects that the temperature of the overflow reaction liquid is lower than a set value, the control device controls the heating device 30 to be started or to increase the output power, and the circulating device continuously works to increase the temperature of the reaction liquid in the reaction tank.
Further, the liquid injection port of the reaction tank is arranged at the lower part or the bottom part of the reaction tank; the liquid injection ports of the reaction tank are arranged at intervals with the at least one heating device.
Further, the circulation device comprises at least one circulation pump.
Further, the heating device is a microwave heating device, an infrared heating device or an electric heating device.
Further, the reaction tank is formed into a double-layer shell and comprises a metal outer layer and a plastic inner layer.
Further, the reaction tank is integrally formed with the heating device.
The above technical scheme of the utility model has following profitable technological effect:
(1) the reaction tank is made of polyvinyl chloride materials, and a microwave heating mode is adopted, so that microwaves basically penetrate through the polyvinyl chloride materials and are not absorbed, and the microwaves can be absorbed by polar water molecules in reaction liquid in the reaction tank in a large quantity, so that the temperature of the reaction liquid is quickly raised, and the temperature is uniformly distributed.
(2) The temperature measuring instrument and the temperature controller are in electric signal connection with the control device, and the control device adjusts and controls the power of the microwave generator according to the temperature of the overflowing reaction liquid detected by the temperature controller, so that the control precision of the heating device is improved, and the time delay problem is effectively avoided.
(3) Further effectively improving the production efficiency and quality of the film and improving the economic benefit.
(4) The ceramic nut and the ceramic screw are adopted for fixing, so that microwave propagation is not interfered, and the microwave oven is convenient to mount, dismount and maintain.
(5) The heating device is arranged outside the reaction tank, and compared with the heating in the reaction tank, the heating device does not influence the deposition reaction, does not need to change the design of the reaction tank and occupy the space in the reaction tank, and saves the cost.
Drawings
FIG. 1 is a structural diagram of a first embodiment of a thin film formation apparatus according to the present invention;
FIG. 2 is a structural view of a heating device according to the present invention;
FIG. 3 is a schematic view of the bottom of a reaction tank according to a second embodiment of the thin film forming apparatus of the present invention.
Reference numerals:
10: a reaction tank; 20: a circulation device; 30: a heating device; 31: a temperature controller; 40: a temperature measuring instrument; 50: and a circulating pump.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in detail with reference to the accompanying drawings. It should be understood that the description is intended to be illustrative only and is not intended to limit the scope of the present invention. Moreover, in the following description, descriptions of well-known structures and techniques are omitted so as to not unnecessarily obscure the concepts of the present invention.
FIG. 1 is a structural diagram of a thin film manufacturing apparatus according to the present invention.
As shown in FIG. 1, the following is a preferred embodiment of a thin film manufacturing apparatus according to the present invention.
A film preparation device comprises a reaction tank 10, wherein the reaction tank 10 is made of polyvinyl chloride materials, a reaction liquid mixed by ammonia water, cadmium sulfate and thiourea is mixed in the reaction tank 10, and the reaction liquid contains polar water molecules.
An overflow port is arranged on one side and on the upper side of the reaction tank 10, a plurality of liquid injection ports are evenly arranged on the lower surface of the reaction tank 10 along the middle line of the length direction of the lower surface of the reaction tank 10, a circulating device 20 is arranged for communicating the overflow port with the liquid injection ports, one end of the circulating device 20 connected with the liquid injection ports is divided into a plurality of branches corresponding to the liquid injection ports, and the branches are communicated with the liquid injection ports, so that the reaction tank 10 and the circulating device 20 form a closed reaction liquid circulating system.
A temperature measuring instrument 40, a circulating pump 50 and an external heating device (not shown in the figure) are sequentially arranged on the circulating device 20 at a short distance from the overflow port, the temperature measuring instrument 40 is mainly used for detecting the temperature of reaction liquid overflowing from the upper part of the reaction tank 10, and the temperature measuring instrument 40 is connected with the control device through a cable or a wireless way; the circulating pump 50 is used to make the concentrations of the reaction solution in the upper and lower portions of the reaction tank 10 uniform. The external heating device heats the reaction solution flowing out from the circulation pump 50 once, and the heated reaction solution flows into the reaction tank 10 through the injection port. The external heating device may be heated in a contact or non-contact manner, and the patent is not limited thereto.
At least one heating device 30 is uniformly fixed between the adjacent liquid injection ports on the outer surface of the reaction tank 10, so that the heating device 30 can uniformly heat the reaction liquid in the reaction tank 10. The number of the heating means 30 and the pouring port can be adjusted according to the actual situation.
The circulation device 20 may be a circulation pipe, and the circulation device 20 is various, and the patent is not limited thereto.
Fig. 2 is a structural view of the heating device provided by the present invention.
As shown in fig. 2, the heating device 30 of the present invention includes a microwave generator, which may be a magnetron. The microwave generator is provided with an output end, and the waveguide is connected with the output end and fixed on the surface of the microwave generator, and can guide the microwave generated by the microwave generator to the reaction tank 10, and the waveguide can be a rectangular waveguide.
The connecting part is fixedly connected to one side of the waveguide facing the reaction tank 10, the main body of the connecting part is sheet-shaped, the connecting part is made of polyvinyl chloride material which is the same as the material of the reaction tank 10, and thus, the microwave can directionally pass through the connecting part and the reaction tank 10 without being absorbed and is absorbed by a large amount of polar water molecules in the reaction liquid, so that the temperature of the reaction liquid is rapidly increased and the temperature is uniformly distributed.
A temperature controller 31 is fixed on the surface of the microwave generator and the waveguide, and the temperature controller 31 is connected with the control device through a cable signal or a wireless signal; through the signal transmission of the temperature measuring instrument 40, the control device and the temperature controller 31 and the preset scheme of the three, the temperature controller 31 can control the on-off and the output power of the microwave generator in time, and the effect of controlling the temperature of the reaction liquid is achieved.
The temperature controller 31, the microwave generator, the waveguide, the connecting part and the reaction tank 10 are fixedly connected by ceramic screws and ceramic nuts which have no influence on the microwave.
The heating device 30 may employ a microwave heating device, an infrared heating device, or an electric heating device.
When the reaction tank 10 is upgraded to a large-capacity device, the reaction tank 10 may be provided with a double-shell structure, and the heating device 30 and the reaction tank 10 are integrally designed to form a structure similar to a "microwave oven". A sealed metal shell is additionally arranged on the outer side of the reaction tank 10, namely the reaction tank 10 and the heating device 30 are both arranged in the metal shell, the heating device 30 is still uniformly fixed at the bottom of the reaction tank 10, and an automatic switch is arranged at the top of the metal shell or other positions on the outer surface of the metal shell. The metal shell can reflect the microwaves without being absorbed, so that the reaction liquid in the large-scale reaction tank 10 can absorb the microwaves more sufficiently, and the aims of quickly increasing the temperature of the reaction liquid and uniformly distributing the reaction liquid are fulfilled.
A protective cover (not marked on the figure) is arranged on the outer side of the whole prepared film, a protective window for observing the condition in the protective cover is arranged on the protective cover, the protective window is made of a microwave absorbing material and can absorb leaked microwaves and prevent a small amount of microwave leakage from damaging human bodies, and the aim of safe production is fulfilled.
FIG. 3 is a schematic view of the bottom of a reaction tank according to a second embodiment of the thin film forming apparatus of the present invention.
In the second embodiment, the distribution of the liquid injection port on the lower surface of the reaction tank 10 and the heating means 30 is different from the above-described embodiments.
As shown in FIG. 3, the liquid inlet openings are uniformly formed in the lower surface of the reaction tank 10, the liquid inlet openings are distributed in a rectangular shape as a whole, and the heating means 30 are uniformly arranged in the rectangular distribution of the liquid inlet openings 11.
Optionally, the liquid injection port and the heating device 30 may be distributed in various forms, so that the reaction liquid can be uniformly heated. For example: the liquid injection ports and the heating device 30 can be arranged in an uneven distribution manner; the liquid injection port and the heating device 30 can be arranged on the side surface of the lower part of the reaction tank 10; the liquid injection port and the heating means 30 are provided on the lower side surface and the lower surface of the reaction tank 10, respectively, but the present invention is not limited thereto. In conclusion, the technical scheme adopts a microwave heating mode with uniform heating and high speed, the heating device is uniformly fixed on the outer side of the lower part of the reaction tank 10 through the ceramic nuts and the ceramic screws, because the tank body of the reaction tank 10 is made of polyvinyl chloride materials, microwaves emitted by the microwave generator 31 are coupled by the waveguide 32 and transmitted to the joint of the opening of the waveguide 32 and the bottom of the reaction tank 10, the microwaves can well transmit through the reaction tank 10 and hardly absorb the microwaves, the microwaves are transmitted into the reaction tank 10, and the microwaves quickly heat the reaction liquid. The heating and the circulation are simultaneously carried out, the reaction liquid in the reaction tank 10 overflows to the circulating device 20 through the overflow port, and the concentrations of the reaction liquid in the upper part and the lower part in the reaction tank 10 tend to be consistent under the action of the circulating pump 50. When the temperature measuring instrument 40 detects that the temperature of the overflow reaction liquid reaches a set value, the control device sends an instruction to reduce the output power of the heating device 30 and keep the working state, and the temperature of the reaction liquid is maintained at the set value by matching with the circulating device 20; when the temperature measuring instrument 40 detects that the temperature of the overflow reaction liquid is higher than a set value, the control device controls the heating device 30 to be closed, the circulating device 20 continues to work, and the temperature and the concentration of the reaction liquid in the reaction tank 10 are kept uniform. When the temperature measuring instrument 40 detects that the temperature of the overflow reaction liquid is lower than a set value, the control device controls the heating device 30 to be started or the output power to be increased, and the circulating device 20 continuously works to increase the temperature of the reaction liquid in the reaction tank 10.
The above technical scheme of the utility model has following profitable technological effect:
(1) the reaction tank 10 is made of polyvinyl chloride material, and a microwave heating mode is adopted, so that microwaves basically penetrate through the polyvinyl chloride material and are not absorbed, and the microwaves can be absorbed by polar water molecules in the reaction liquid in the reaction tank 10 in a large quantity, so that the temperature of the reaction liquid is rapidly increased, and the temperature is uniformly distributed.
(2) The temperature measuring instrument 40 and the temperature controller 31 are in electric signal connection with the control device, and the control device adjusts and controls the power of the microwave generator 31 according to the temperature of the overflowing reaction liquid detected by the temperature controller 31, so that the control precision of the heating device 30 is improved, and the time delay problem is effectively avoided.
(3) Further effectively improving the production efficiency and quality of the film and improving the economic benefit.
(4) The ceramic nut and the ceramic screw are adopted for fixing, so that microwave propagation is not interfered, and the microwave oven is convenient to mount, dismount and maintain.
(5) The heating device 30 is arranged outside the reaction tank 10, and compared with the heating in the reaction tank 10, the deposition reaction is not influenced, the design of the reaction tank 10 does not need to be changed, the space in the tank is not occupied, and the cost is saved.
It is to be understood that the above-described embodiments of the present invention are merely illustrative of or explaining the principles of the invention and are not to be construed as limiting the invention. Therefore, any modification, equivalent replacement, improvement and the like made without departing from the spirit and scope of the present invention should be included in the protection scope of the present invention. Further, it is intended that the appended claims cover all such variations and modifications as fall within the scope and boundaries of the appended claims or the equivalents of such scope and boundaries.

Claims (10)

1. A thin film formation apparatus, comprising: a reaction tank (10) for injecting a reaction solution to perform a chemical deposition reaction to prepare a thin film; set up in circulating device (20) outside reaction tank (10), the one end of circulating device (20) with reaction tank (10) bottom intercommunication, its other end with reaction tank (10) upper portion intercommunication, circulating device (20) will be carried to external heater heating through the reaction solution that overflows through the overflow mouth on reaction tank (10) upper portion, then through the notes liquid mouth of reaction tank (10) bottom to reaction tank (10) interior reaction solution after the heating of injection, its characterized in that still includes:
at least one heating device (30) arranged at the lower part or the outer side of the bottom of the reaction tank (10) and used for heating the reaction liquid in the reaction tank (10) in a non-contact way;
and the temperature measuring instrument (40) is arranged near the outlet at the upper part of the reaction tank (10) and is used for detecting the temperature of the overflowing reaction liquid at the upper part of the reaction tank (10).
2. The thin film formation apparatus according to claim 1, further comprising:
and the temperature controller (31) is electrically connected to the heating device (30) and is used for controlling the on-off and output power of the heating device (30) so as to control the temperature of the reaction liquid.
3. The thin film formation apparatus according to claim 2, further comprising:
and the control device is electrically connected to the temperature measuring instrument (40) and the temperature controller (31) and is used for controlling the on-off and the output power of the thermal device (30) through the temperature controller (31) according to the temperature of the reaction liquid fed back by the temperature measuring instrument (40) so as to control the temperature of the reaction liquid.
4. The thin film formation apparatus according to claim 3, wherein,
when the temperature measuring instrument (40) detects that the temperature of the overflow reaction liquid reaches a set value, the control device sends out an instruction to reduce the output power of the heating device (30) and keep the working state, and the temperature of the reaction liquid is maintained at the set value by matching with the circulating device (20);
when the temperature measuring instrument (40) detects that the temperature of the overflow reaction liquid is higher than a set value, the control device controls the heating device (30) to be closed, the circulating device (20) continues to work, and the temperature and the concentration of the reaction liquid in the reaction tank (10) are kept uniform.
5. The thin film formation apparatus according to claim 4, wherein,
when the temperature measuring instrument (40) detects that the temperature of the overflow reaction liquid is lower than a set value, the control device controls the heating device (30) to be started or to increase the output power, and the circulating device (20) continuously works to increase the temperature of the reaction liquid in the reaction tank (10).
6. The apparatus for producing a thin film according to claim 5, wherein the liquid inlet of the reaction tank (10) is provided at a lower portion or a bottom portion thereof; the plurality of liquid injection ports of the reaction tank (10) are arranged at intervals with the at least one heating device (30).
7. The apparatus for preparing thin films according to claim 4, characterized in that said circulating means (20) comprise at least one circulating pump (50).
8. The apparatus for preparing thin films according to claim 6, wherein the heating device (30) is a microwave heating device, an infrared heating device or an electric heating device.
9. The apparatus for preparing thin films according to claim 6, wherein the reaction tank (10) is formed as a double-layered casing comprising an outer layer of metal and an inner layer of plastic.
10. The apparatus according to claim 9, wherein the reaction tank (10) is formed integrally with the heating device (30).
CN201822245710.7U 2018-12-27 2018-12-27 Film preparation equipment Active CN209836303U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201822245710.7U CN209836303U (en) 2018-12-27 2018-12-27 Film preparation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201822245710.7U CN209836303U (en) 2018-12-27 2018-12-27 Film preparation equipment

Publications (1)

Publication Number Publication Date
CN209836303U true CN209836303U (en) 2019-12-24

Family

ID=68900795

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201822245710.7U Active CN209836303U (en) 2018-12-27 2018-12-27 Film preparation equipment

Country Status (1)

Country Link
CN (1) CN209836303U (en)

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Date Code Title Description
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20201231

Address after: No.31 Yanqi street, Yanqi Economic Development Zone, Huairou District, Beijing

Patentee after: Beijing Huihong Technology Co., Ltd

Address before: Room 309-5, 3rd floor, entrepreneurship service center, 163 Gaoxin 2nd Road, Heyuan hi tech Industrial Development Zone, Guangdong 517000

Patentee before: HUAXIA YINENG (GUANGDONG) NEW ENERGY TECHNOLOGY Co.,Ltd.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20211028

Address after: No.31 Yanqi street, Yanqi Economic Development Zone, Huairou District, Beijing

Patentee after: Dongjun new energy Co.,Ltd.

Address before: No.31 Yanqi street, Yanqi Economic Development Zone, Huairou District, Beijing

Patentee before: Beijing Huihong Technology Co., Ltd

TR01 Transfer of patent right