CN117438276A - Multi-mode gas switching device and method for microwave plasma source - Google Patents

Multi-mode gas switching device and method for microwave plasma source Download PDF

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Publication number
CN117438276A
CN117438276A CN202311269766.5A CN202311269766A CN117438276A CN 117438276 A CN117438276 A CN 117438276A CN 202311269766 A CN202311269766 A CN 202311269766A CN 117438276 A CN117438276 A CN 117438276A
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China
Prior art keywords
gas
air
outlet
valve
path
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Inventor
雷永乾
梁维新
郭鹏然
陈宇萍
陈江韩
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Institute Of Testing And Analysis Guangdong Academy Of Sciences Guangzhou Analysis And Testing Center China
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Institute Of Testing And Analysis Guangdong Academy Of Sciences Guangzhou Analysis And Testing Center China
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Priority to CN202311269766.5A priority Critical patent/CN117438276A/en
Publication of CN117438276A publication Critical patent/CN117438276A/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Flow Control (AREA)

Abstract

The invention relates to the technical field of microwave plasma source switching, in particular to a microwave plasma source multi-mode gas switching device and method. The multi-mode gas switching device for the microwave plasma source comprises a gas control device, wherein the gas control device comprises at least two gas paths and a control detection device; each gas path comprises a gas inlet and a gas outlet, and a pulse valve and a switch valve are sequentially connected between the gas inlet and the gas outlet; the control detection device comprises a control PCB which is respectively connected with the pulse valves and the switch valves; every two gas paths can be connected through a connecting channel. The invention realizes the proportion mixing, the rapid air flow switching and the stable flow adjustment of more than two gases through the combination of the pulse valve and the switch valve, and has the characteristics of multiple mixing modes, rapid air control response, high module integration level, convenient expansion and high stability in the aspect of air mixing control.

Description

Multi-mode gas switching device and method for microwave plasma source
Technical Field
The invention relates to the technical field of microwave plasma source switching, in particular to a microwave plasma source multi-mode gas switching device and method.
Background
The microwave plasma is a quasi-equilibrium plasma with high electron density and high electron temperature of electrodeless discharge, the microwave plasma source is a device for realizing stable excitation and plasma maintenance of gas by acting microwaves on working gas, and in recent years, the microwave plasma source is a device for realizing stable excitation and plasma maintenance of gas by acting microwaves on working gas in the aspects of chemical vapor deposition, material surface modification, microcircuit manufacturing, plasma spraying, plasma chemical industry, sample excitation of detection instruments, environment-friendly water treatment and the like. Compared with the prior ICP plasma source, the microwave plasma source can be used for Ar and N 2 The plasma generator works in various gas modes such as He and the like, and has the characteristics of high maintenance frequency, good plasma stability and the like.
In the working process of the microwave plasma source, the control of the working gas plays an important role in the stability of the plasma, and the response time of the mass flowmeter adopted in the existing gas mixing and switching control is more in the second level during the gas switching control, so that the unstable time of the plasma is increased during the source gas switching. The invention adopting the proportional valve has the defect of uneven gas mixing during gas switching. The mode has high requirements on gas control precision, for example, when the mode is used as a sample excitation source of a detection instrument, the unstable plasma flame is easily caused, and the defects that the plasma source is easy to flameout and a torch tube is easy to burn exist.
Compared with the prior art (CN 114334596A) which is close to the invention, although the microwave plasma control technology is adopted, the microwave plasma is mainly used as an excitation source of a high-end precision instrument and is prepared by N 2 Inert gases such as Ar, he and the like are working gases, and the high-power operation (usually about 1000W) is required, the stability requirement on plasma in the operation process is very high, and the gas flow control in the operation process is very highIs a precision of (a). Whereas the microwave plasma control system proposed in the prior art is used for vapor deposition and etching, the plasma is H 2 、O 2 、CH 4 The gas is working gas, and the relative running power is low (500W). The invention uses the common multi-path gas flow controller to control the gas flow, which has the defects of prolonged time and incapability of rapidly and stably switching the gas flow.
Disclosure of Invention
The invention aims at: in order to solve the problems in the prior art, the invention provides a multi-mode gas switching device and method for a microwave plasma source.
In order to solve the problems existing in the prior art, the invention adopts the following technical scheme:
the multi-mode gas switching device for the microwave plasma source comprises a gas control device, wherein the gas control device comprises at least two gas paths and a control detection device;
each gas path comprises a gas inlet and a gas outlet, and at least two control valves are arranged between the gas inlet and the gas outlet and are used for controlling the gas flow of the corresponding gas path and switching the gas inlet state of the corresponding gas path;
the gas control device also comprises a connecting gas circuit, and two ends of the connecting gas circuit are respectively communicated with the two gas circuits;
the control detection device comprises a control PCB, and the control PCB is respectively connected with a plurality of control valves.
As an improvement of the technical scheme of the microwave plasma multimode gas switching device, at least two control valves are respectively a pulse valve and a switch valve;
each gas path sequentially comprises a gas inlet, a pulse valve, a switch valve and a gas outlet which are sequentially communicated; or each gas path comprises the gas inlet, the switch valve, the pulse valve and the gas outlet which are sequentially communicated.
As an improvement of the technical scheme of the microwave plasma multi-mode gas switching device, the microwave plasma source multi-mode gas switching device further comprises a gas valve base, wherein a plurality of first channels are arranged in the gas valve base in a penetrating manner, and each first channel corresponds to one gas path;
and a connecting channel is further arranged in the air valve base in a penetrating manner, and the connecting channel corresponds to the connecting air channel.
As an improvement of the technical scheme of the microwave plasma multi-mode gas switching device, the control detection device also comprises a plurality of air pressure sensors respectively connected with the control PCB, and the air pressure sensors are correspondingly arranged at the air outlet of each air channel; the air pressure sensor is used for collecting the pressure value of the air outlet and feeding back the pressure value to the MCU of the control PCB, and the MCU is used for controlling the air inlet and outlet flow of the pulse valve.
As an improvement of the technical scheme of the microwave plasma multi-mode gas switching device, a set value is preset in the MCU, and the MCU compares the pressure value with the set value after receiving the pressure value fed back by the air pressure sensor;
if the pressure value is higher than the set value, the MCU reduces the duty ratio of the pulse valve of the corresponding air path so as to reduce the outlet air flow;
and if the pressure value is lower than the set value, the MCU increases the duty ratio of the pulse valve of the corresponding air path so as to increase the outlet air flow.
As an improvement of the technical scheme of the microwave plasma multi-mode gas switching device, the gas circuit is used for gas passing, and the gas is N 2 Any two or more gases of Ar and He.
The microwave plasma source multi-mode gas switching method using the microwave plasma source multi-mode gas switching device comprises the following steps:
different gases are introduced into different gas paths, and different working modes are switched by regulating and controlling a control valve in each gas path; switching gas or mixed gas by switching different working modes;
and the air outlet quantity of the air channel is detected by the control detection device, and the duty ratio of the control valve is reversely adjusted according to the air outlet quantity so as to adjust the air outlet quantity of different air channels and/or the proportion of mixed gas.
As an improvement of the technical scheme of the multi-mode gas switching method of the microwave plasma source, the detection device provided with the MCU is used for obtaining the gas outlet quantity of each gas path detected by the gas pressure sensor, a set value is preset in the MCU, and the MCU compares the pressure value with the set value after receiving the pressure value fed back by the gas pressure sensor;
if the pressure value is higher than the set value, the MCU reduces the duty ratio of the pulse valve of the corresponding air path so as to reduce the outlet air flow;
and if the pressure value is lower than the set value, the MCU increases the duty ratio of the pulse valve of the corresponding air path so as to increase the outlet air flow.
As an improvement of the technical scheme of the multi-mode gas switching method of the microwave plasma source, at least two control valves are respectively a pulse valve and a switch valve; each gas path sequentially comprises a gas inlet, a pulse valve, a switch valve and a gas outlet which are sequentially communicated; or each gas path comprises the gas inlet, the switch valve, the pulse valve and the gas outlet which are sequentially communicated;
changing the connection mode of the corresponding pulse valve or the switch valve outlet in each gas path through a connection channel, switching gas or mixed gas under program control, obtaining the gas outlet quantity of each gas path detected by a gas pressure sensor through a detection device provided with an MCU, presetting a set value in the MCU, and comparing the pressure value with the set value after receiving the pressure value fed back by the gas pressure sensor by the MCU;
if the pressure value is higher than the set value, the MCU reduces the duty ratio of the pulse valve of the corresponding air path so as to reduce the outlet air flow;
and if the pressure value is lower than the set value, the MCU increases the duty ratio of the pulse valve of the corresponding air path so as to increase the outlet air flow.
The invention has the beneficial effects that:
1. aiming at the defects of the existing microwave plasma source gas control, the invention starts from the switching, the proportional mixing and the flow control of the mixed gas, and solves the problems through the combined control of a plurality of groups of electromagnetic valves and pulse valves under the low delay. The rapid switching of the microwave plasma source air flow and the stable operation under various air modes are realized through air path connection, valve control, pressure and air flow feedback;
2. the invention realizes the proportion mixing, the rapid air flow switching and the stable flow adjustment of more than two gases through the combination of the pulse valve and the switch valve, and has the characteristics of multiple mixing modes, rapid air control response, high module integration level, convenient expansion and high stability in the aspect of air mixing control;
3. under the control time sequence of a corresponding pulse valve and a corresponding switch valve in each gas path is changed through a connecting channel, gas or mixed gas is switched, the gas outlet quantity of each gas path detected by a gas pressure sensor is obtained through a detection device provided with an MCU, a set value is preset in the MCU, and after the MCU receives the pressure value fed back by the gas pressure sensor, the pressure value is compared with the set value.
Drawings
FIG. 1 is a schematic diagram of a connection structure according to the present invention;
FIG. 2 is a schematic diagram of a first gas control mode according to the present invention;
FIG. 3 is a schematic diagram of a second gas control mode according to the present invention;
FIG. 4 is a schematic diagram of a third gas control mode according to the present invention;
FIG. 5 is a schematic diagram of a fourth gas control mode according to the present invention;
FIG. 6 is a schematic diagram of a fifth gas control mode according to the present invention.
Reference numerals illustrate: 11-a first air inlet; 12-a first pulse valve; 13-a first switching valve; 14-a first air pressure sensor; 15-a first air outlet; 21-a second air inlet; 22-a second pulse valve; 23-a second switching valve; 24-a second air pressure sensor; 25-a second air outlet; 31-a third air inlet; 32-a third pulse valve; 33-a third switching valve; 34-a third air pressure sensor; 35-a third air outlet; 4-an air valve base; 5-a control PCB; 1-a first mixed gas; 2-a second mixed gas; 3-a third mixed gas; a-a first gas flow; b-second gas path airflow; and C, third air passage airflow.
Detailed Description
In order to make the objects, technical solutions and advantageous effects of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are only some embodiments of the present invention, but not all embodiments of the present invention.
As shown in FIG. 1, the multi-mode gas switching device of the microwave plasma source comprises a gas control device, wherein the gas control device comprises at least two gas paths and a control detection device;
each gas path comprises a gas inlet and a gas outlet, and at least two control valves are arranged between the gas inlet and the gas outlet and used for controlling the gas flow of the corresponding gas path and switching the gas inlet state of the corresponding gas path;
the gas control device also comprises a connecting gas circuit, and two ends of the connecting gas circuit are respectively communicated with the two gas circuits; the control detection device comprises a control PCB5, and the control PCB5 is respectively connected with a plurality of control valves.
In the invention, two air paths are taken as an example for illustration, and the two air paths are a first air path and a second air path respectively; the gas can be respectively injected into the two gas paths, the gas flow of the gas paths is adjusted and the gas inlet state of the corresponding gas paths is switched by controlling the control valve, and the rapid switching of the gas flow of the microwave plasma source and the stable operation under multiple gas modes are realized.
In detail, the invention comprises at least two gas paths, so that the effect of injecting gas into any gas path can be realized, and the effect that the two gas paths can inject the same gas or different gases can be realized.
When gas is injected into any one of the two gas paths, the gas can sequentially pass through the gas inlet, the control valve and the gas outlet to realize the effect of gas flow, the gas outlet quantity at the gas outlet can be detected under the action of the control detection device, and then the control valve is reversely adjusted to be opened or closed according to the gas outlet quantity, so that the effect of adjusting the gas flow of the gas paths is realized.
When the two gas paths are filled with the same gas, the gas in the two gas paths can correspondingly and sequentially pass through the gas inlet, the control valve and the gas outlet to realize the effect of gas flow, the gas outlet quantity at the gas outlet can be detected under the action of the control detection device, and then the opening or closing of the control valve is reversely regulated according to the gas outlet quantity so as to realize the effect of regulating the gas flow of the gas paths;
when different gases are injected into the two gas paths, the gas inlet state of the gas paths can be controlled through the control valve so as to achieve the effect of gas mixing, and the effect of controlling the gas flow can be achieved through controlling the gas flow of the gas paths.
In some embodiments of the invention, the gas path is for passage of a gas, the gas being N 2 Any two or more gases of Ar and He.
In some embodiments of the invention, the at least two control valves are a pulse valve and a switch valve, respectively;
each gas path sequentially comprises a gas inlet, a pulse valve, a switching valve and a gas outlet which are sequentially communicated; or each gas path comprises a gas inlet, a switch valve, a pulse valve and a gas outlet which are communicated in sequence. The pulse valve is used for adjusting the air inlet and outlet, and the switch valve is used for switching the circulation and closing state of the air in the channel.
In some embodiments of the present invention, the microwave plasma source multimode gas switching device further includes a gas valve base 4, wherein a plurality of first channels are penetrated in the gas valve base 4, and each first channel corresponds to one gas path; a connecting channel is also arranged in the air valve base 4 in a penetrating way, and the connecting channel is correspondingly connected with an air circuit.
Under the control time sequence of a corresponding pulse valve and a switching valve in each gas path is changed through a connecting channel, gas or mixed gas is switched, the gas outlet quantity of each gas path detected by a gas pressure sensor is obtained through a detection device provided with an MCU, a set value is preset in the MCU, and after the MCU receives the pressure value fed back by the gas pressure sensor, the pressure value is compared with the set value.
In some embodiments of the present invention, the control detection device further includes a plurality of air pressure sensors respectively connected to the control PCB5, where the plurality of air pressure sensors are correspondingly disposed at the air outlet of each air path; the air pressure sensor is used for collecting the pressure value of the air outlet and feeding back the pressure value to the MCU of the control PCB5, and the MCU is used for controlling the air inlet and outlet flow of the pulse valve.
Further, a set value is preset in the MCU, and the MCU compares the pressure value with the set value after receiving the pressure value fed back by the air pressure sensor;
if the pressure value is higher than the set value, the MCU reduces the duty ratio of the pulse valve corresponding to the air path so as to reduce the outlet air flow; if the pressure value is lower than the set value, the MCU increases the duty ratio of the pulse valve corresponding to the air path to increase the outlet air flow.
In some embodiments of the present invention, a microwave plasma source multimode gas switching device includes at least two gas paths, where the at least two gas paths include a first gas path and a second gas path;
the first air path correspondingly comprises a first air inlet 11, a first pulse valve 12, a first switch valve 13 and a first air outlet 15; the second air path correspondingly comprises a second air inlet 21, a second pulse valve 22, a second switch valve 23 and a second air outlet 25; the first air inlet 11 is respectively communicated with inlets of the first pulse valve 12 and the second switch valve 23;
the gas in the second gas path flows through the second gas inlet 21 and the second pulse valve 22, and then is mixed with the gas in the first gas path to form mixed gas, and the mixed gas is discharged from the second gas outlet 25.
In some embodiments of the invention, the connecting channel connects the pulse valve outlet with the inlet of the on-off valve in the other gas path.
In the present invention, three gas paths are exemplified, and three kinds of gases are respectively nitrogen, argon and helium, and three kinds of plasma switching and mixing are exemplified.
The air valve base 4 is used for setting a plurality of air passage channels to form a plurality of air passages, the air valve base 4 is an air valve base 4 with a certain thickness, and can be made of metal or plastic, wherein the preferred metal is aluminum or stainless steel based on the characteristics of metal.
For one air channel, the two opposite ends of the air valve base 4 are respectively provided with an air inlet and an air outlet of the air channel, a pulse valve and a switching valve are sequentially arranged between the air inlet and the air outlet, the pulse valve is used for adjusting the air inlet and outlet, and the switching valve is used for switching the circulation and closing state of air in the channel.
The three air paths are a first air path, a second air path and a third air path respectively, the first air path comprises a first air inlet 11, a first pulse valve 12, a first switch valve 13, a first air outlet 15 and a first air pressure sensor 14, the second air path comprises a second air inlet 21, a second pulse valve 22, a second switch valve 23, a second air outlet 25 and a second air pressure sensor 24, and the third air path comprises a third air inlet 31, a third pulse valve 32, a third switch valve 33, a third air outlet 35 and a third air pressure sensor 34.
The invention can realize the switching, the mixing of the gas and the air flow proportion and a plurality of modes.
When the invention is in the process of switching and mixing gas, the outlet of the multi-way pulse valve and the inlet of the switch valve are communicated with each other. And the air inlet paths are mutually mixed after passing through the pulse valve, when a certain switching valve is opened, mixed gases with different proportions are discharged through the outlet, and in the process, the duty ratio of each path of air flow can be adjusted by adjusting the duty ratio of each path of air path pulse valve, so that the proportion adjustment of each component in the air flow control process is realized, and the stable switching of the gas types is realized.
Specifically, in the switching and mixed gas mode, the outlet of the first pulse valve 12, the outlet of the second pulse valve 22, and the outlet of the third pulse valve 32 in the present invention are respectively and correspondingly communicated with the inlet of the first switching valve 13, the inlet of the second switching valve 23, and the inlet of the third switching valve 33.
The first air path air flow A, the second air path air flow B and the third air path air flow C are mutually mixed after passing through the first pulse valve 12, the second pulse valve 22 and the third pulse valve 32, and when one or more of the first switch valve 13, the second switch valve 23 and the third switch valve 33 are opened, mixed gases with different proportions are discharged through an outlet.
In this process, the first air pressure sensor 14, the second air pressure sensor 24, and the third air pressure sensor 34 collect the outlet air flow pressure values of the first air outlet 15, the second air outlet 25, and the third air outlet 35, respectively, and feed back to the MCU of the control PCB5 board.
And according to the proportional relation between the outlet pressure value and the air flow, the MCU compares the outlet pressure value with a set value, if the pressure value is higher than the set value, the MCU reduces the duty ratio of the air circuit pulse valve to reduce the outlet air flow, and if the pressure value is lower than the set value, the MCU increases the duty ratio of the air circuit pulse valve to increase the outlet air flow.
The duty ratio of each gas path pulse valve can be adjusted by adjusting the duty ratio of each gas path, so that the proportion adjustment of each component in the gas flow control process is realized, and the stable switching of gas types is realized. In the mode, the invention can realize the proportion adjustment and stable switching of the airflows of any two paths in the three paths of air inlet and the random proportion adjustment of the three paths of air inlet, and can realize the control of the total flow of the mixed gas through the combination of three paths of different flow outlets.
The mixing process of the air flow ratio is as follows: the first air inlet 11 in the present invention is connected to the inlet of the second switching valve 23 in addition to the first pulse valve 12. In the mixing process, the second air path air flow B is mixed with the first air path air flow A after passing through the second air inlet 21 and the second pulse valve 22, and when the second switching valve is opened, the mixed air flows through the second air outlet 25 and is discharged, and in the process, the proportion mixing of the first air path air flow A and the second air path air flow B can be realized by adjusting the duty ratio of the second pulse valve 22. By similar connection and control mode, the proportion mixing of the two paths of air flows can be realized.
In detail, when the present invention is in the air flow ratio mixing mode, the first air inlet 11 is connected with the inlets of the first pulse valve 12 and the second switching valve 23, respectively, wherein the first air inlet 11 is connected with the inlet of the second switching valve 23 through a connection passage.
In the mixing process, the second air path air flow B is mixed with the first air path air flow A after passing through the second air inlet 21 and the second pulse valve 22, and when the second air path switch valve is opened, the mixed air flows through the second air outlet 25 to be discharged.
In this process, the second air pressure sensor 24 at the second air outlet 25 of the air flow collects the outlet pressure value and feeds back to the MCU of the control PCB5. According to the proportional relation between the outlet pressure value and the air flow, the MCU compares the outlet pressure value with a set value, if the pressure value is higher than the set value, the MCU reduces the duty ratio of the second pulse valve 22 to reduce the flow of the second air outlet 25, and if the pressure value is lower than the set value, the MCU increases the duty ratio of the second pulse valve 22 to increase the flow of the second air outlet 25.
The stable control of the valve air flow and the proportional mixing of the first air passage air flow A and the second air passage air flow B are realized by reversely adjusting the duty ratio of the second pulse valve 22. The proportion mixing of the second air passage air flow B with the third air passage air flow C and the proportion mixing of the first air passage air flow A with the third air passage air flow C can be realized through similar connection and control modes.
The invention respectively collects multi-path air pressure/air flow data, adjusts different valve actions in real time according to the air flow data, realizes the rapid stabilization of the multi-path air flow switching process through closed loop feedback control, solves the problem of rapid control of working air flow, solves the problem of air flow overshoot or undersize in the air switching process, and has good adaptability to external air pressure/flow fluctuation.
Compared with the prior art, the method and the device can realize simultaneous control of multiple paths of gases, and have the advantages of small volume and convenient and flexible gas path connection; the invention has various working modes, and the gas path is easy to expand.
When the air flow is switched, the response time of the pulse valve and the electromagnetic valve is in millisecond level, and compared with the existing air flow controller with the response time in second level, the quick switching of various gases can be realized. Meanwhile, when the gas is mixed and controlled, the pulse valve adopted in the technical scheme of the invention has high operating frequency, can realize uniform mixing of multiple paths of gas flows, and can realize stable mixing and flow adjustment of the gas through pulse width modulation.
As a first embodiment of the invention, as shown in FIG. 1, each air path comprises an air inlet, a pulse valve, a switching valve and an air outlet which are communicated in sequence.
The invention comprises a first air inlet 11, a first pulse valve 12, a first switch valve 13, a first air pressure sensor 14, a first air outlet 15, a second air inlet 21, a second pulse valve 22, a second switch valve 23, a second air pressure sensor 24, a second air outlet 25, a third air inlet 31, a third pulse valve 32, a third switch valve 33, a third air pressure sensor 34, a third air outlet 35, an air valve base 4 and a control PCB5. The connection channels communicate the gas outlet positions of the first pulse valve 12, the second pulse valve 22, and the third pulse valve 32, and the gas inlet positions of the first switch valve 13, the second switch valve 23, and the third switch valve 33, respectively.
When the invention works in the gas switching mode, the gas path connection is shown in fig. 2, and the outlets of the first pulse valve 12, the second pulse valve 22 and the third pulse valve 32 and the inlets of the first switch valve 13, the second switch valve 23 and the third switch valve 33 are communicated with each other. The first air path air flow A, the second air path air flow B and the third air path air flow C are mutually mixed after passing through the first pulse valve 12, the second pulse valve 22 and the third pulse valve 32, and when one or more of the first switch valve 13, the second switch valve 23 and the third switch valve 33 are opened, mixed gases with different proportions are discharged through an outlet.
In this process, the first air pressure sensor 14, the second air pressure sensor 24, and the third air pressure sensor 34 collect the outlet air flow pressure values of the first air outlet 15, the second air outlet 25, and the third air outlet 35, respectively, and feed back to the MCU of the control PCB5 board.
And according to the proportional relation between the outlet pressure value and the air flow, the MCU compares the outlet pressure value with a set value, if the pressure value is higher than the set value, the MCU reduces the duty ratio of the air circuit pulse valve to reduce the outlet air flow, and if the pressure value is lower than the set value, the MCU increases the duty ratio of the air circuit pulse valve to increase the outlet air flow.
The duty ratio of each gas path pulse valve can be adjusted by adjusting the duty ratio of each gas path, so that the proportion adjustment of each component in the gas flow control process is realized, and the stable switching of gas types is realized. In the mode, the working frequency of the pulse electromagnetic valve is 5kHz, and the duty ratio can be adjusted within the range of 0-100% according to the airflow proportion.
The embodiment can realize the proportion adjustment and stable switching of the airflows of any two paths in the airflows A, B and C of the first air path and the airflows B and C of the third air path and the random proportion adjustment of the airflows of the three paths, and can realize the control of the total flow of the mixed gas through the combination of the three different flow outlets.
The air flows A, B, C are respectively N 2 Ar and He gases.
As a second embodiment of the invention, as shown in FIG. 3, each air path comprises an air inlet, a pulse valve, a switching valve and an air outlet which are communicated in sequence.
The invention comprises a first air inlet 11, a first pulse valve 12, a first switch valve 13, a first air pressure sensor 14, a first air outlet 15, a second air inlet 21, a second pulse valve 22, a second switch valve 23, a second air pressure sensor 24, a second air outlet 25, a third air inlet 31, a third pulse valve 32, a third switch valve 33, a third air pressure sensor 34, a third air outlet 35, an air valve base 4 and a control PCB5.
When the invention works in the air flow proportion mixing mode, the air path connection is shown in figure 3, and the first air inlet 11 is connected with the inlet of the second switch valve 23 in addition to the first pulse valve 12. That is, in the present embodiment, the first air intake port 11 communicates with the inlet of the first pulse valve 12, and the first air intake port 11 communicates with the inlet of the second on-off valve 23 through the connection passage; the second air inlet 21 communicates with the inlet of the second pulse valve 22, and the second air inlet 21 communicates with the inlet of the third on-off valve 33 through a connection passage; the third air inlet 31 communicates with the inlet of the third pulse valve 32, and the third air inlet 31 communicates with the inlet of the first on-off valve 13 through a connection passage.
The second air flow B is mixed with the first air flow A through the second air inlet 21 and the second pulse valve 22 in the mixing process, and when the second air flow B is opened, the mixed air flows through the second air outlet 25 to be discharged, and in the mixing process, the second air pressure sensor 24 at the second air outlet 25 end of the air flow collects the outlet pressure value and feeds back the outlet pressure value to the MCU of the control PCB5.
According to the proportional relation between the outlet pressure value and the air flow, the MCU compares the outlet pressure value with a set value, if the pressure value is higher than the set value, the MCU reduces the duty ratio of the second pulse valve 22 to reduce the flow of the second air outlet 25, and if the pressure value is lower than the set value, the MCU increases the duty ratio of the second pulse valve 22 to increase the flow of the second air outlet 25.
The stable control of the valve air flow is realized by reversely adjusting the duty ratio of the second pulse valve 22, and the proportional mixing of the first air passage air flow A and the second air passage air flow B is realized. In this mode, the working frequency of the pulse electromagnetic valve is 10kHz, the duty ratio can be adjusted within the range of 0-100% according to the air flow ratio, and the proportion mixing of the second air path air flow B with the third air path air flow C and the first air path air flow a with the third air path air flow C can be realized by similar connection and control modes.
The air flows A, B, C are respectively N 2 Ar and He gases.
As a third embodiment of the invention, as shown in FIG. 4, each air path comprises an air inlet, a switching valve, a pulse valve and an air outlet which are communicated in sequence.
The invention comprises a first air inlet 11, a first switch valve 1312, a first pulse valve 1213, a first air pressure sensor 14, a first air outlet 15, a second air inlet 21, a second switch valve 2322, a second pulse valve 2223, a second air pressure sensor 24, a second air outlet 25, a third air inlet 31, a third switch valve 3332, a third pulse valve 3233, a third air pressure sensor 34, a third air outlet 35, an air valve base 4 and a control PCB5.
When the invention works in the air flow proportion mixing mode, the air path connection is shown in fig. 4, and the first air inlet 11 is connected with the inlet of the second pulse valve 2223 in addition to the first switch valve 1312. That is, in the present embodiment, the first air inlet 11 communicates with the inlet of the first on-off valve 13, and the first air inlet 11 communicates with the inlet of the second pulse valve 22 through the connection passage; the second air inlet 21 communicates with the inlet of the second switching valve 23, and the second air inlet 21 communicates with the inlet of the third pulse valve 32 through a connection passage; the third air inlet 31 communicates with the inlet of the third switching valve 33, and the third air inlet 31 communicates with the inlet of the first pulse valve 12 through a connection passage.
In the mixing process, the second air flow B is mixed with the first air flow a through the second air inlet 21 and the second switch valve 2322, and when the second pulse valve 23 is opened, the mixed air flows through the second air outlet 25 and is discharged.
In this process, the second air pressure sensor 24 at the second air outlet 25 of the air flow collects the outlet pressure value and feeds back to the MCU of the control PCB5.
According to the proportional relationship between the outlet pressure value and the air flow, the MCU compares the outlet pressure value with a set value, if the pressure value is higher than the set value, the MCU decreases the duty cycle of the second pulse valve 2223 to decrease the flow rate of the second air outlet 25, and if the pressure value is lower than the set value, the MCU increases the duty cycle of the second pulse valve 2223 to increase the flow rate of the second air outlet 25.
The stable control of the air flow after the first air path air flow A and the second air path air flow B are mixed is realized by reversely adjusting the duty ratio of the second pulse valve 2223, and meanwhile, the switch of the AB mixed air flow to the single air flow A can be controlled by the switch of the second switch valve 2322 in the air flow control process. In the mode, the working frequency of the pulse electromagnetic valve is 12kHz, the duty ratio can be adjusted within the range of 0-100% according to the air flow ratio, and the flow adjustment and single air flow switching after the second air passage air flow B and the third air passage air flow C and the first air passage air flow A and the third air passage air flow C are mixed can be realized through similar connection and control modes.
The air flows A, B, C are respectively N 2 Ar and He gases.
As a fourth embodiment of the present invention, as shown in FIG. 5, each air path includes an air inlet, a switching valve, a pulse valve and an air outlet which are sequentially communicated.
The invention comprises a first air inlet 11, a first switch valve 1312, a first pulse valve 1213, a first air pressure sensor 14, a first air outlet 15, a second air inlet 21, a second switch valve 2322, a second pulse valve 2223, a second air pressure sensor 24, a second air outlet 25, a third air inlet 31, a third switch valve 3332, a third pulse valve 3233, a third air pressure sensor 34, a third air outlet 35, an air valve base 4 and a control PCB5.
When the invention works in the air flow proportion mixing mode, the air path connection is shown in fig. 5, and the outlet of the first switch valve 1312 is connected with the inlet of the first pulse valve 1213 and the second air outlet 25. That is, in the present embodiment, the first air inlet 11 is communicated with the first switching valve 13, the outlet of the first switching valve 13 is communicated with the inlet of the first pulse valve 12, and the outlet of the first switching valve 13 is communicated with the outlet of the second pulse valve 2223 through the connection passage; the second air inlet 21 is communicated with a second switch valve 23, an outlet of the second switch valve 23 is communicated with an inlet of a second pulse valve 22, and an outlet of the second switch valve 23 is communicated with an outlet of a third pulse valve 32 through a connecting channel; the third air inlet 31 communicates with a third switching valve 33, an outlet of the third switching valve 33 communicates with an inlet of a third pulse valve 32, and an outlet of the third switching valve 33 communicates with an outlet of the first pulse valve 12 through a connection passage.
In the mixing process, the second air path air flow B is mixed with the first air path air flow a passing through the first switch valve 1312 after passing through the second air inlet 21, the second switch valve 2322 and the second pulse valve 2223, and the mixed air flows through the second air outlet 25 to be discharged, and in the process, the second air pressure sensor 24 at the second air outlet 25 end of the air flow collects an outlet pressure value and feeds back the outlet pressure value to the MCU of the control PCB5.
According to the proportional relationship between the outlet pressure value and the air flow, the MCU compares the outlet pressure value with a set value, if the pressure value is higher than the set value, the MCU decreases the duty cycle of the second pulse valve 2223 to decrease the flow rate of the second air outlet 25, and if the pressure value is lower than the set value, the MCU increases the duty cycle of the second pulse valve 2223 to increase the flow rate of the second air outlet 25.
The stable control of the air flow after the first air path air flow A and the second air path air flow B are mixed is realized by reversely adjusting the duty ratio of the second pulse valve 2223, and meanwhile, the switch of the AB mixed air flow to the single air flow A can be controlled by the switch of the second switch valve 2322 in the air flow control process. In the mode, the working frequency of the pulse electromagnetic valve is 12kHz, the duty ratio can be adjusted within the range of 0-100% according to the air flow ratio, and the flow adjustment and single air flow switching after the second air passage air flow B and the third air passage air flow C and the first air passage air flow A and the third air passage air flow C are mixed can be realized through similar connection and control modes.
The air flows A, B, C are respectively N 2 Ar and He gases.
As a fifth embodiment of the present invention, as shown in fig. 6, each air path includes an air inlet, a pulse valve, a switching valve and an air outlet which are sequentially communicated.
The invention comprises a first air inlet 11, a first switch valve 1312, a first pulse valve 1213, a first air pressure sensor 14, a first air outlet 15, a second air inlet 21, a second switch valve 2322, a second pulse valve 2223, a second air pressure sensor 24, a second air outlet 25, a third air inlet 31, a third switch valve 3332, a third pulse valve 3233, a third air pressure sensor 34, a third air outlet 35, an air valve base 4 and a control PCB5.
When the invention works in the air flow proportion mixing mode, the air path connection is shown in figure 6, and the outlet of the first pulse valve 12 is connected with the second air outlet 25 in addition to the first switch valve 13. That is, in the present embodiment, the first air inlet 11 communicates with the first pulse valve 12, the outlet of the first pulse valve 12 communicates with the inlet of the first on-off valve 13, and the outlet of the first pulse valve 12 communicates with the outlet of the second on-off valve 23 through the connection passage; the second air inlet 21 is communicated with the second pulse valve 22, the outlet of the second pulse valve 22 is communicated with the inlet of the second switch valve 23, and the outlet of the second pulse valve 22 is communicated with the outlet of the third switch valve 33 through a connecting channel; the third air inlet 31 communicates with the third pulse valve 32, the outlet of the third pulse valve 32 communicates with the inlet of the third on-off valve 33, and the outlet of the third pulse valve 32 communicates with the outlet of the first on-off valve 13 through a connection passage.
In the mixing process, the second air path air flow B is mixed with the first air path air flow A passing through the outlet of the first pulse valve 12 after passing through the second air inlet 21, the second pulse valve 22 and the second switch valve 23, the mixed air flow is discharged through the second air outlet 25, and in the process, the second air pressure sensor 24 at the second air outlet 25 end of the air flow collects the outlet pressure value and feeds back the outlet pressure value to the MCU of the control PCB5.
According to the proportional relation between the outlet pressure value and the air flow, the MCU compares the outlet pressure value with a set value, if the pressure value is higher than the set value, the MCU reduces the duty ratio of the first pulse valve 12 and the second pulse valve 22 to reduce the flow of the second air outlet 25, and if the pressure value is lower than the set value, the MCU increases the duty ratio of the first pulse valve 12 and the second pulse valve 22 to increase the flow of the second air outlet 25.
The duty ratio of each air flow can be adjusted by adjusting the duty ratio of the first pulse valve 12 and the second pulse valve 22, so that the proportion adjustment of the mixing of the first air flow A and the second air flow B is realized, and the stable switching and the stable control of the gas types are realized. By similar connection and control modes, the embodiment can realize the proportional mixing of the second air path air flow B and the third air path air flow C, and the first air path air flow A and the third air path air flow C. In the mode, the working frequency of the pulse electromagnetic valve is 10kHz, the duty ratio can be adjusted within the range of 0-100% according to the air flow proportion, and the invention can realize the proportion adjustment and stable switching of any two paths of air flow in three paths of air inlet.
The air flows A, B, C are respectively N 2 Ar and He gases.
The invention also provides a microwave plasma source multi-mode gas switching method, which uses the microwave plasma source multi-mode gas switching device and comprises the following steps:
different gases are introduced into different gas paths, and different working modes are switched by regulating and controlling a control valve in each gas path; switching gas or mixed gas by switching different working modes;
and the air outlet quantity of the air channel is detected by the control detection device, and the duty ratio of the control valve is reversely adjusted according to the air outlet quantity so as to adjust the air outlet quantity of different air channels and/or the proportion of mixed gas.
In some embodiments of the present invention, the detecting device provided with an MCU obtains the air output of each air path detected by the air pressure sensor, a set value is preset in the MCU, and the MCU compares the pressure value with the set value after receiving the pressure value fed back by the air pressure sensor;
if the pressure value is higher than the set value, the MCU reduces the duty ratio of the pulse valve corresponding to the air path so as to reduce the outlet air flow; if the pressure value is lower than the set value, the MCU increases the duty ratio of the pulse valve corresponding to the air path to increase the outlet air flow.
In some embodiments of the invention, the at least two control valves are a pulse valve and a switch valve, respectively; each gas path sequentially comprises a gas inlet, a pulse valve, a switching valve and a gas outlet which are sequentially communicated; or each gas path comprises a gas inlet, a switch valve, a pulse valve and a gas outlet which are communicated in sequence;
changing the connection mode of the corresponding pulse valve or the switch valve outlet in each gas path through a connection channel, switching gas or mixed gas under program control, acquiring the gas outlet quantity of each gas path detected by a gas pressure sensor through a detection device provided with an MCU, presetting a set value in the MCU, and comparing the pressure value with the set value after the MCU receives the pressure value fed back by the gas pressure sensor;
if the pressure value is higher than the set value, the MCU reduces the duty ratio of the pulse valve corresponding to the air path so as to reduce the outlet air flow; if the pressure value is lower than the set value, the MCU increases the duty ratio of the pulse valve corresponding to the air path to increase the outlet air flow.
All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.

Claims (9)

1. The multi-mode gas switching device for the microwave plasma source is characterized by comprising a gas control device, wherein the gas control device comprises at least two gas paths and a control detection device;
each gas path comprises a gas inlet and a gas outlet, and at least two control valves are arranged between the gas inlet and the gas outlet and are used for controlling the gas flow of the corresponding gas path and switching the gas inlet state of the corresponding gas path;
the gas control device also comprises a connecting gas circuit, and two ends of the connecting gas circuit are respectively communicated with the two gas circuits;
the control detection device comprises a control PCB, and the control PCB is respectively connected with a plurality of control valves.
2. The microwave plasma source multimode gas switching device of claim 1, wherein at least two of the control valves are a pulse valve and a switching valve, respectively;
each gas path sequentially comprises a gas inlet, a pulse valve, a switch valve and a gas outlet which are sequentially communicated; or each gas path comprises the gas inlet, the switch valve, the pulse valve and the gas outlet which are sequentially communicated.
3. The device of claim 1, further comprising a gas valve base, wherein a plurality of first channels are arranged in the gas valve base in a penetrating manner, and each first channel corresponds to one gas path;
and a connecting channel is further arranged in the air valve base in a penetrating manner, and the connecting channel corresponds to the connecting air channel.
4. The apparatus of claim 1, wherein the control and detection apparatus further comprises a plurality of air pressure sensors respectively connected to the control PCB, the plurality of air pressure sensors being correspondingly disposed at the air outlet of each air path; the air pressure sensor is used for collecting the pressure value of the air outlet and feeding back the pressure value to the MCU of the control PCB, and the MCU is used for controlling the air inlet and outlet flow of the pulse valve.
5. The multi-mode gas switching device for microwave plasma source according to claim 4, wherein a set value is preset in the MCU, and the MCU compares the pressure value with the set value after receiving the pressure value fed back by the gas pressure sensor;
if the pressure value is higher than the set value, the MCU reduces the duty ratio of the pulse valve of the corresponding air path so as to reduce the outlet air flow;
and if the pressure value is lower than the set value, the MCU increases the duty ratio of the pulse valve of the corresponding air path so as to increase the outlet air flow.
6. The apparatus of claim 1, wherein the gas path is configured for passage of a gas, the gas being N 2 Any two or more gases of Ar and He.
7. A method for switching microwave plasma source multi-mode gas, characterized in that a microwave plasma source multi-mode gas switching device according to any one of claims 1-6 is used, comprising the steps of:
different gases are introduced into different gas paths, and different working modes are switched by regulating and controlling a control valve in each gas path; switching gas or mixed gas by switching different working modes;
and the air outlet quantity of the air channel is detected by the control detection device, and the duty ratio of the control valve is reversely adjusted according to the air outlet quantity so as to adjust the air outlet quantity of different air channels and/or the proportion of mixed gas.
8. The method for switching the microwave plasma source into the multi-mode gas according to claim 7, wherein the detection device provided with the MCU is used for obtaining the gas outlet quantity of each gas path detected by the gas pressure sensor, a set value is preset in the MCU, and the MCU compares the pressure value with the set value after receiving the pressure value fed back by the gas pressure sensor;
if the pressure value is higher than the set value, the MCU reduces the duty ratio of the pulse valve of the corresponding air path so as to reduce the outlet air flow;
and if the pressure value is lower than the set value, the MCU increases the duty ratio of the pulse valve of the corresponding air path so as to increase the outlet air flow.
9. The method of claim 7, wherein at least two of the control valves are pulse valves and on-off valves, respectively; each gas path sequentially comprises a gas inlet, a pulse valve, a switch valve and a gas outlet which are sequentially communicated; or each gas path comprises the gas inlet, the switch valve, the pulse valve and the gas outlet which are sequentially communicated;
changing the connection mode of the corresponding pulse valve or the switch valve outlet in each gas path through a connection channel, switching gas or mixed gas under program control, obtaining the gas outlet quantity of each gas path detected by a gas pressure sensor through a detection device provided with an MCU, presetting a set value in the MCU, and comparing the pressure value with the set value after receiving the pressure value fed back by the gas pressure sensor by the MCU;
if the pressure value is higher than the set value, the MCU reduces the duty ratio of the pulse valve of the corresponding air path so as to reduce the outlet air flow;
and if the pressure value is lower than the set value, the MCU increases the duty ratio of the pulse valve of the corresponding air path so as to increase the outlet air flow.
CN202311269766.5A 2023-09-28 2023-09-28 Multi-mode gas switching device and method for microwave plasma source Pending CN117438276A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202311269766.5A CN117438276A (en) 2023-09-28 2023-09-28 Multi-mode gas switching device and method for microwave plasma source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202311269766.5A CN117438276A (en) 2023-09-28 2023-09-28 Multi-mode gas switching device and method for microwave plasma source

Publications (1)

Publication Number Publication Date
CN117438276A true CN117438276A (en) 2024-01-23

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