CN117377893A - 用于在工作平面上产生限定的激光照射的设备 - Google Patents
用于在工作平面上产生限定的激光照射的设备 Download PDFInfo
- Publication number
- CN117377893A CN117377893A CN202280037536.3A CN202280037536A CN117377893A CN 117377893 A CN117377893 A CN 117377893A CN 202280037536 A CN202280037536 A CN 202280037536A CN 117377893 A CN117377893 A CN 117377893A
- Authority
- CN
- China
- Prior art keywords
- optical axis
- irradiation
- working plane
- angular spectrum
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005855 radiation Effects 0.000 title description 3
- 230000003287 optical effect Effects 0.000 claims abstract description 70
- 238000007493 shaping process Methods 0.000 claims abstract description 38
- 238000001228 spectrum Methods 0.000 claims abstract description 37
- 238000003491 array Methods 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 230000003595 spectral effect Effects 0.000 claims 2
- 238000005286 illumination Methods 0.000 abstract description 27
- 239000011521 glass Substances 0.000 description 9
- 229910021417 amorphous silicon Inorganic materials 0.000 description 8
- 238000005224 laser annealing Methods 0.000 description 6
- 238000003754 machining Methods 0.000 description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021113406.4A DE102021113406A1 (de) | 2021-05-25 | 2021-05-25 | Vorrichtung zum Erzeugen einer definierten Laserbeleuchtung auf einer Arbeitsebene |
| DE102021113406.4 | 2021-05-25 | ||
| PCT/EP2022/062593 WO2022248209A1 (de) | 2021-05-25 | 2022-05-10 | Vorrichtung zum erzeugen einer definierten laserbeleuchtung auf einer arbeitsebene |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117377893A true CN117377893A (zh) | 2024-01-09 |
Family
ID=81975058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202280037536.3A Pending CN117377893A (zh) | 2021-05-25 | 2022-05-10 | 用于在工作平面上产生限定的激光照射的设备 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2024520476A (ja) |
| KR (1) | KR20240006068A (ja) |
| CN (1) | CN117377893A (ja) |
| DE (1) | DE102021113406A1 (ja) |
| WO (1) | WO2022248209A1 (ja) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5637526B2 (ja) | 2010-04-28 | 2014-12-10 | 株式会社ブイ・テクノロジー | レーザ加工装置 |
| JP2012037572A (ja) * | 2010-08-03 | 2012-02-23 | Hamamatsu Photonics Kk | レーザ光整形及び波面制御用光学系 |
| DE102011101585B4 (de) | 2011-05-12 | 2015-11-12 | Technische Universität Dresden | Verfahren zur Herstellung von Leuchtdioden oder photovoltaischen Elementen |
| CN115121940A (zh) | 2016-07-27 | 2022-09-30 | 通快激光有限责任公司 | 激光线照射 |
| DE102018211972B4 (de) | 2018-07-18 | 2020-04-23 | Trumpf Laser Gmbh | Optische Anordnung zur variablen Erzeugung eines Multifoki-Profils, sowie Verfahren zum Betrieb und Verwendung einer solchen Anordnung |
| EP3748287B1 (en) | 2019-06-06 | 2021-10-13 | TRUMPF Photonic Components GmbH | Vcsel based pattern projector |
-
2021
- 2021-05-25 DE DE102021113406.4A patent/DE102021113406A1/de active Pending
-
2022
- 2022-05-10 WO PCT/EP2022/062593 patent/WO2022248209A1/de active Application Filing
- 2022-05-10 KR KR1020237042445A patent/KR20240006068A/ko unknown
- 2022-05-10 JP JP2023573027A patent/JP2024520476A/ja active Pending
- 2022-05-10 CN CN202280037536.3A patent/CN117377893A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2024520476A (ja) | 2024-05-24 |
| WO2022248209A1 (de) | 2022-12-01 |
| DE102021113406A1 (de) | 2022-12-01 |
| KR20240006068A (ko) | 2024-01-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI504465B (zh) | Optical systems and laser processing devices | |
| US7318866B2 (en) | Systems and methods for inducing crystallization of thin films using multiple optical paths | |
| CN104148810B (zh) | 将半导体基板辐射开槽的方法 | |
| TW200405575A (en) | A single-shot semiconductor processing system and method having various irradiation patterns | |
| WO2011132559A1 (ja) | レーザアニール方法、装置及びマイクロレンズアレイ | |
| WO2005029544A2 (en) | Systems and methods for processing thin films | |
| TW200523988A (en) | Method and system for providing a single-scan, continuous motion sequential lateral solidification for enabling a bi-directional grain growth, and a mask for facilitating such bi-directional grain growth | |
| KR102666258B1 (ko) | 레이저 머시닝 시스템 | |
| EP2010355A1 (en) | Apparatus for laser annealing of large substrates and method for laser annealing of large substrates | |
| KR20120101087A (ko) | 비주기적인 펄스 순차 측면 고상화를 위한 시스템 및 방법 | |
| EP2539104B1 (en) | Method and apparatus for irradiating a semiconductor material surface by laser energy | |
| KR102589766B1 (ko) | 레이저 장치 | |
| CN117377893A (zh) | 用于在工作平面上产生限定的激光照射的设备 | |
| US20230236431A1 (en) | Device for generating a laser line on a work plane | |
| US20190181009A1 (en) | Apparatus for annealing a layer of semiconductor material, a method of annealing a layer of semiconductor material, and a flat panel display | |
| CN111065759B (zh) | 激光装置和对薄膜进行加工的方法 | |
| CN112213862B (zh) | 用于使光辐射强度均匀化的光学系统 | |
| JP2023537606A (ja) | 作業面上に規定のレーザラインを生成するための装置 | |
| JP7513845B2 (ja) | 画定されたレーザ照射を作業面に生成するための装置 | |
| JP7443042B2 (ja) | 光スポット像照射装置および転写装置 | |
| US11600491B2 (en) | Laser apparatus and method of processing thin films | |
| KR102140603B1 (ko) | 레이저 빔의 빔 분포를 조절시키는 광학시스템 | |
| JP2000275581A (ja) | 回折光学素子（ｄｏｅ）を用いた二段縮小光学系及びこれを用いたレーザ加工システム | |
| TWI557802B (zh) | 用於在半導體基板上形成直線投射之方法及裝置 | |
| Hauschild et al. | Free form microlens sysems enable new laser beam profiles for RTP |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |