CN117309329A - Full-space detection device and method for optical element - Google Patents
Full-space detection device and method for optical element Download PDFInfo
- Publication number
- CN117309329A CN117309329A CN202311256166.5A CN202311256166A CN117309329A CN 117309329 A CN117309329 A CN 117309329A CN 202311256166 A CN202311256166 A CN 202311256166A CN 117309329 A CN117309329 A CN 117309329A
- Authority
- CN
- China
- Prior art keywords
- light
- optical element
- light source
- detection
- full
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 title claims abstract description 120
- 230000003287 optical effect Effects 0.000 title claims abstract description 89
- 238000000034 method Methods 0.000 title claims abstract description 12
- 230000033001 locomotion Effects 0.000 claims abstract description 43
- 230000005540 biological transmission Effects 0.000 claims abstract description 34
- 230000007547 defect Effects 0.000 claims description 26
- 230000008859 change Effects 0.000 claims description 3
- 239000003344 environmental pollutant Substances 0.000 claims 1
- 231100000719 pollutant Toxicity 0.000 claims 1
- 238000005259 measurement Methods 0.000 abstract description 6
- 230000010287 polarization Effects 0.000 description 10
- 239000000356 contaminant Substances 0.000 description 7
- 238000000149 argon plasma sintering Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000009916 joint effect Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000009659 non-destructive testing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0278—Detecting defects of the object to be tested, e.g. scratches or dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Geometry (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
本发明提供了一种光学元件全空间检测装置及方法,属于光学元件检测领域,该装置包括光路单元和机械单元,其中:光路单元的光源组件用于提供入射光;反射探测组件设置在待测光学元件的反射侧;透射探测组件设置在待测光学元件的透射侧;机械单元的样品运动平台用于固定待测光学元件并带动其移动;光源运动平台用于带动光源组件转动;探测器半球运动平台设置用于同步带动反射探测组件和透射探测组件在各自的半球内运动。本发明通过增加了一个信息来源能够有效提高检测的准确性,并且通过设置机械单元,能够实现反射光和透射光的全空间检测,从而获得更多的光强信息,从而进一步提高检测的准确性和测量效率。
The invention provides an optical element full-space detection device and method, which belongs to the field of optical element detection. The device includes an optical path unit and a mechanical unit, wherein: the light source component of the optical path unit is used to provide incident light; the reflection detection component is arranged in the area to be tested. The reflective side of the optical element; the transmission detection component is set on the transmission side of the optical element to be measured; the sample movement platform of the mechanical unit is used to fix the optical element to be measured and drive it to move; the light source movement platform is used to drive the light source component to rotate; the detector hemisphere The motion platform is configured to synchronously drive the reflection detection component and the transmission detection component to move within their respective hemispheres. The present invention can effectively improve the accuracy of detection by adding an information source, and by setting up a mechanical unit, it can realize full-space detection of reflected light and transmitted light, thereby obtaining more light intensity information, thereby further improving the accuracy of detection. and measurement efficiency.
Description
技术领域Technical field
本发明属于光学元件检测领域,更具体地,涉及一种光学元件全空间检测装置及方法。The invention belongs to the field of optical element detection, and more specifically, relates to an optical element full-space detection device and method.
背景技术Background technique
以熔石英、单晶硅为代表的光学元件应用越来越广泛,光学元件的加工过程中,引入的表面/亚表面缺陷会从干涉引起的光场强化、裂纹杂质增强光学材料的激光吸收能力以及材料力学性能降低等三个方面同时影响光学元件的缺陷敏感性,进而造成光学元件的宏观缺陷,降低光学元件的性能。Optical elements represented by fused quartz and single crystal silicon are used more and more widely. During the processing of optical elements, the surface/subsurface defects introduced will strengthen the light field caused by interference and crack impurities to enhance the laser absorption capacity of optical materials. These three aspects, including the reduction of material mechanical properties, simultaneously affect the defect sensitivity of optical elements, thereby causing macroscopic defects in optical elements and reducing the performance of optical elements.
目前通常采用光散射法对光学元件进行无损检测,即采用激光散射技术来测量缺陷与表面污染物,并借助偏振技术实现缺陷、颗粒污染物及表面粗糙度的区分。但是现有技术的探测器是固定的,只能测量散射光,无法实现整个空间的光强分布检测,进而造成检测精度差、效率低的问题。At present, light scattering method is usually used for non-destructive testing of optical components, that is, laser scattering technology is used to measure defects and surface contaminants, and polarization technology is used to distinguish defects, particle contaminants and surface roughness. However, the detectors in the existing technology are fixed and can only measure scattered light and cannot detect the light intensity distribution of the entire space, which in turn causes problems of poor detection accuracy and low efficiency.
发明内容Contents of the invention
针对现有技术的缺陷,本发明的目的在于提供一种光学元件全空间检测装置及方法,旨在解决现有的光散射检测装置无法实现整个空间光强分布检测的问题。In view of the shortcomings of the existing technology, the purpose of the present invention is to provide an optical element full-space detection device and method, aiming to solve the problem that the existing light scattering detection device cannot detect the entire space light intensity distribution.
为实现上述目的,按照本发明的一方面,提供了一种光学元件全空间检测装置,该装置包括光路单元和机械单元,其中:In order to achieve the above objects, according to one aspect of the present invention, a full-space detection device for optical elements is provided. The device includes an optical path unit and a mechanical unit, wherein:
所述光路单元包括光源组件、反射探测组件和透射探测组件,所述光源组件用于向待测光学元件提供入射光以产生反射光和透射光;所述反射探测组件设置在待测光学元件的反射侧,用于采集所述反射光的光强信息;所述透射探测组件设置在待测光学元件的透射侧,用于采集所述透射光的光强信息;The optical path unit includes a light source component, a reflection detection component and a transmission detection component. The light source component is used to provide incident light to the optical element to be tested to generate reflected light and transmitted light; the reflection detection component is arranged on the optical element to be tested. The reflection side is used to collect the light intensity information of the reflected light; the transmission detection component is arranged on the transmission side of the optical element to be measured, and is used to collect the light intensity information of the transmitted light;
所述机械单元包括样品运动平台、光源运动平台和和探测器半球运动平台,所述样品运动平台用于固定待测光学元件并带动其移动;所述光源运动平台设置在样品运动平台的前方并与光源组件连接,以带动光源组件转动;所述探测器半球运动平台设置在样品运动平台的后方并与反射探测组件和透射探测组件连接,以同步带动所述反射探测组件和透射探测组件在各自的半球内运动从而实现反射光和透射光的全空间检测。The mechanical unit includes a sample movement platform, a light source movement platform and a detector hemisphere movement platform. The sample movement platform is used to fix the optical element to be measured and drive it to move; the light source movement platform is arranged in front of the sample movement platform and It is connected with the light source component to drive the light source component to rotate; the detector hemispheric motion platform is arranged behind the sample motion platform and is connected with the reflection detection component and the transmission detection component to synchronously drive the reflection detection component and the transmission detection component in their respective The movement within the hemisphere enables full-space detection of reflected light and transmitted light.
作为进一步优选地,所述光学元件全空间检测装置还包括暗室罩,所述暗室罩设置在光路单元和机械单元的外侧,用于形成暗室环境,并且该暗室罩的内壁设置有吸光结构,用于吸收杂散光。As a further preference, the optical element full-space detection device also includes a darkroom cover, which is arranged outside the optical path unit and the mechanical unit for forming a darkroom environment, and the inner wall of the darkroom cover is provided with a light-absorbing structure. To absorb stray light.
作为进一步优选地,所述光源组件包括依次连接的激光器和光斑调整结构,所述激光器用于产生激光光斑,所述光斑调整结构用于对所述激光光斑进行调节以形成入射光。As a further preference, the light source assembly includes a laser and a spot adjustment structure connected in sequence, the laser is used to generate a laser spot, and the spot adjustment structure is used to adjust the laser spot to form incident light.
作为进一步优选地,所述光斑调整结构包括沿光线传播方向依次连接的起偏器、滤波器、准直镜和入射光阑。As a further preference, the light spot adjustment structure includes a polarizer, a filter, a collimating lens and an incident diaphragm connected in sequence along the light propagation direction.
作为进一步优选地,所述反射探测组件包括沿光线传播方向依次连接的第一检偏器、第一光阑和第一光电倍增管。As a further preference, the reflection detection component includes a first analyzer, a first diaphragm and a first photomultiplier tube connected in sequence along the light propagation direction.
作为进一步优选地,所述透射探测组件包括沿光线传播方向依次连接的第二检偏器、第二光阑和第二光电倍增管。As a further preference, the transmission detection component includes a second analyzer, a second aperture and a second photomultiplier tube connected in sequence along the light propagation direction.
作为进一步优选地,所述样品运动平台包括样品夹具和样品XY轴移动结构,其中所述样品夹具用于放置待测光学元件,所述样品XY轴移动结构与样品夹具连接,以带动待测光学元件沿X轴、Y轴的方向移动,从而改变入射光的照射位置。As a further preference, the sample movement platform includes a sample clamp and a sample XY-axis moving structure, wherein the sample clamp is used to place the optical element to be tested, and the sample XY-axis moving structure is connected with the sample clamp to drive the optical element to be tested. The element moves along the X-axis and Y-axis, thereby changing the irradiation position of the incident light.
作为进一步优选地,所述光源运动平台包括第一支撑杆和光源C轴转动结构,其中所述第一支撑杆竖直放置,其上端与光源组件连接,其下端与光源C轴转动结构连接;所述光源C轴转动结构固定在底面上,用于带动所述光源组件绕Z轴转动。As a further preference, the light source movement platform includes a first support rod and a C-axis rotation structure of the light source, wherein the first support rod is placed vertically, its upper end is connected to the light source assembly, and its lower end is connected to the C-axis rotation structure of the light source; The C-axis rotation structure of the light source is fixed on the bottom surface and is used to drive the light source assembly to rotate around the Z-axis.
作为进一步优选地,所述探测器半球运动平台包括第二支撑杆、L型连杆、探测器B轴转动结构、探测器C轴转动结构和横杆,其中所述第二支撑杆竖直固定在底面上;所述L型连杆的一端通过探测器B轴转动结构与第二支撑杆连接,其另一端通过探测器C轴转动结构与横杆连接;所述横杆的一端与倾斜的反射探测组件连接,其另一端与透射探测组件连接。As a further preference, the detector hemispheric motion platform includes a second support rod, an L-shaped connecting rod, a detector B-axis rotation structure, a detector C-axis rotation structure and a cross bar, wherein the second support rod is vertically fixed On the bottom surface; one end of the L-shaped connecting rod is connected to the second support rod through the B-axis rotation structure of the detector, and the other end is connected to the cross bar through the C-axis rotation structure of the detector; one end of the cross bar is connected to the inclined The reflection detection component is connected, and the other end is connected with the transmission detection component.
按照本发明的另一方面,提供了一种光学元件全空间检测方法,该方法采用上述光学元件全空间检测装置,具体包括如下步骤:According to another aspect of the present invention, a method for full-space detection of optical elements is provided. The method adopts the above-mentioned full-space detection device for optical elements and specifically includes the following steps:
S1启动光源组件并放置待测光学元件,然后开启反射探测组件和透射探测组件;S1 starts the light source component and places the optical element to be tested, then turns on the reflection detection component and transmission detection component;
S2利用光源运动平台带动光源组件转动以调整入射光的入射角,同时利用探测器半球运动平台带动反射探测组件和透射探测组件转动相同角度以采集反射光和透射光的光强信息S2 uses the light source movement platform to drive the light source component to rotate to adjust the incident angle of the incident light. At the same time, it uses the detector hemisphere movement platform to drive the reflection detection component and transmission detection component to rotate at the same angle to collect the light intensity information of reflected light and transmitted light.
S3重复步骤S2直至入射角覆盖设定范围,以此完成当前光斑处的检测;S3 Repeat step S2 until the incident angle covers the set range, thereby completing the detection at the current light spot;
S4利用样品运动平台带动待测光学元件移动预设距离至下一光斑处,然后重复步骤S2、S3,直至入射光覆盖待测光学元件,并根据采集的光强信息获得待测光学元件的表面缺陷及污染物。S4 uses the sample movement platform to drive the optical element under test to move a preset distance to the next light spot, and then repeats steps S2 and S3 until the incident light covers the optical element under test, and obtains the surface of the optical element under test based on the collected light intensity information. Defects and contaminants.
总体而言,通过本发明所构思的以上技术方案与现有技术相比,具有以下有益效果:Generally speaking, compared with the prior art, the above technical solution conceived by the present invention has the following beneficial effects:
1.本发明通过设置反射探测组件和透射探测组件,能够实现反射光和透射光的同步检测,与单独测量反射光相比增加了一个信息来源,能够有效提高表面缺陷和污染物检测的准确性,同时本发明通过设置机械单元,能够实现反射光和透射光的全空间检测,与探测器固定的现有技术相比能够获得更多的光强信息,从而进一步提高检测的准确性和测量效率;1. By arranging a reflection detection component and a transmission detection component, the present invention can realize synchronous detection of reflected light and transmitted light. Compared with measuring reflected light alone, it adds an information source and can effectively improve the accuracy of surface defect and contaminant detection. , at the same time, the present invention can realize full-space detection of reflected light and transmitted light by setting up a mechanical unit. Compared with the existing technology with a fixed detector, it can obtain more light intensity information, thereby further improving the detection accuracy and measurement efficiency. ;
2.尤其是,本发明通过设置暗室罩并在其内壁设置吸光结构,能够有效吸收空间内的杂散光,降低杂散光度探测光路的影响;2. In particular, the present invention can effectively absorb stray light in the space and reduce the influence of the stray light detection light path by arranging a darkroom cover and a light-absorbing structure on its inner wall;
3.同时,本发明通过对光源组件、反射探测组件和透射探测组件的结构进行优化,能够进一步提高检测的准确性;3. At the same time, the present invention can further improve the accuracy of detection by optimizing the structures of the light source component, reflection detection component and transmission detection component;
4.此外,本发明通过对样品运动平台、光源运动平台和探测器半球运动平台的结构进行优化,能够实现待测光学元件、光源组件、反射探测件和透射探测组件的协同运动,解决了转动时不平衡的问题,能够在提高检测精度的同时进一步降低检测时间,从而有效提高检测效率。4. In addition, by optimizing the structures of the sample movement platform, the light source movement platform and the detector hemisphere movement platform, the present invention can realize the coordinated movement of the optical element to be measured, the light source assembly, the reflection detection component and the transmission detection component, and solve the problem of rotation. The problem of time imbalance can be improved while improving detection accuracy while further reducing detection time, thereby effectively improving detection efficiency.
附图说明Description of drawings
图1是本发明实施例提供的光学元件全空间检测装置的结构示意图;Figure 1 is a schematic structural diagram of an optical element full-space detection device provided by an embodiment of the present invention;
图2是本发明实施例提供的光学元件全空间检测装置的光路示意图;Figure 2 is a schematic optical path diagram of a full-space detection device for optical elements provided by an embodiment of the present invention;
图3是本发明实施例提供的光学元件全空间检测装置中暗室罩的内壁结构;Figure 3 is the inner wall structure of the darkroom cover in the optical element full-space detection device provided by the embodiment of the present invention;
图4是本发明实施例提供的光学元件全空间检测方法的流程图;Figure 4 is a flow chart of a full-space detection method for optical elements provided by an embodiment of the present invention;
图5是本发明实施例提供的光学元件全空间检测方法中光强采集方案示意图。Figure 5 is a schematic diagram of the light intensity collection scheme in the full-space detection method of optical elements provided by the embodiment of the present invention.
在所有附图中,相同的附图标记用来表示相同的元件或结构,其中:Throughout the drawings, the same reference numbers refer to the same elements or structures, wherein:
101-光源C轴转动结构,102-第一支撑杆,103-第二支撑杆,104-样品夹具,105-探测器C轴转动结构,106-探测器B轴转动结构,107-样品XY轴移动结构,108-L型连杆,109-横杆,200-待测光学元件,300-光斑调整结构,301-激光器,302-起偏器,303-滤波器,304-准直镜,305-入射光阑,310-反射探测组件,311-第一光电倍增管,312-第一光阑,313-第一检偏器,320-透射探测组件,321-第二光电倍增管,322-第二光阑,323-第二检偏器,400-暗室罩,401-吸光结构。101-light source C-axis rotation structure, 102-first support rod, 103-second support rod, 104-sample clamp, 105-detector C-axis rotation structure, 106-detector B-axis rotation structure, 107-sample XY axis Moving structure, 108-L-shaped connecting rod, 109-cross bar, 200-optical element to be tested, 300-spot adjustment structure, 301-laser, 302-polarizer, 303-filter, 304-collimating mirror, 305 -Incidence diaphragm, 310-Reflection detection component, 311-First photomultiplier tube, 312-First diaphragm, 313-First analyzer, 320-Transmission detection component, 321-Second photomultiplier tube, 322- The second diaphragm, 323-second polarizer, 400-darkroom cover, 401-light absorption structure.
具体实施方式Detailed ways
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention and are not intended to limit the present invention.
如图1、2所示,按照本发明的一方面,提供了一种光学元件全空间检测装置,该装置包括光路单元和机械单元,其中:As shown in Figures 1 and 2, according to one aspect of the present invention, a full-space detection device for optical elements is provided. The device includes an optical path unit and a mechanical unit, wherein:
光路单元包括光源组件、反射探测组件310和透射探测组件320,光源组件用于产生缺陷检测的准直平行光线即入射光,以照射到待测光学元件200的表面,经过粗糙表面及缺陷后,入射光偏振状态发生改变并产生反射光和透射光,用于区分表面粗糙度和缺陷;反射探测组件310设置在待测光学元件200的反射侧,用于采集反射光的光强信息并识别粗糙度信号和缺陷信号;透射探测组件320设置在待测光学元件200的透射侧,用于采集透射光的光强信息并识别粗糙度信号和缺陷信号;The optical path unit includes a light source component, a reflection detection component 310 and a transmission detection component 320. The light source component is used to generate collimated parallel light for defect detection, that is, incident light, to illuminate the surface of the optical element 200 to be tested. After passing through the rough surface and defects, The polarization state of the incident light changes and generates reflected light and transmitted light, which is used to distinguish surface roughness and defects; the reflection detection component 310 is provided on the reflection side of the optical element 200 to be tested, and is used to collect the light intensity information of the reflected light and identify roughness. degree signal and defect signal; the transmission detection component 320 is arranged on the transmission side of the optical element 200 to be tested, and is used to collect the light intensity information of the transmitted light and identify the roughness signal and defect signal;
以机械单元的固定平面为XY水平面,以反射探测组件310指向透射探测组件320的方向为Y轴,建立XYZ轴坐标系,机械单元包括样品运动平台、光源运动平台和和探测器半球运动平台,样品运动平台包括样品夹具104和样品XY轴移动结构107,其中样品夹具104用于放置待测光学元件200,样品XY轴移动结构107与样品夹具104连接,以带动待测光学元件200沿X轴、Y轴的方向移动,从而改变入射光的照射位置;样品XY轴移动结构107可以采用手动滑台,利用人工调节的方式带动待测光学元件200移动;Taking the fixed plane of the mechanical unit as the XY horizontal plane, and taking the direction in which the reflection detection component 310 points to the transmission detection component 320 as the Y axis, an XYZ axis coordinate system is established. The mechanical unit includes a sample movement platform, a light source movement platform and a detector hemisphere movement platform. The sample movement platform includes a sample clamp 104 and a sample XY-axis moving structure 107. The sample clamp 104 is used to place the optical element 200 to be tested. The sample XY-axis moving structure 107 is connected to the sample clamp 104 to drive the optical element 200 to be tested along the X-axis. , moves in the direction of the Y-axis, thereby changing the irradiation position of the incident light; the sample XY-axis moving structure 107 can use a manual slide, and use manual adjustment to drive the movement of the optical element 200 to be tested;
光源运动平台设置在样品运动平台的前方并与光源组件连接,其包括第一支撑杆102和光源C轴转动结构101,第一支撑杆102竖直放置,其上端与光源组件连接,其下端与光源C轴转动结构101连接;光源C轴转动结构101固定在底面上,用于带动光源组件绕Z轴转动,从而在入射光的入射半径不变的情况下,改变入射光的入射角;The light source movement platform is arranged in front of the sample movement platform and is connected to the light source assembly. It includes a first support rod 102 and a light source C-axis rotation structure 101. The first support rod 102 is placed vertically, its upper end is connected to the light source assembly, and its lower end is connected to the light source assembly. The light source C-axis rotation structure 101 is connected; the light source C-axis rotation structure 101 is fixed on the bottom surface and is used to drive the light source assembly to rotate around the Z-axis, thereby changing the incident angle of the incident light while the incident radius of the incident light remains unchanged;
探测器半球运动平台设置在样品运动平台的后方并与反射探测组件310和透射探测组件320连接,其包括第二支撑杆103、L型连杆108、探测器B轴转动结构106、探测器C轴转动结构105和横杆109,第二支撑杆103竖直固定在底面上;L型连杆108的一端通过探测器B轴转动结构106与第二支撑杆103连接,使得L型连杆108在探测器B轴转动结构106的带动下绕Y轴转动,其另一端通过探测器C轴转动结构105与横杆109连接,以利用探测器C轴转动结构105带动横杆109绕Z轴转动;横杆109的一端与倾斜的反射探测组件310连接,其另一端与透射探测组件320连接,从而在探测器B轴转动结构106和探测器C轴转动结构105的共同作用下,同步带动反射探测组件310和透射探测组件320在各自的半球内运动以实现反射光和透射光的全空间检测;反射探测组件310的轴线与入射光的轴线成一定的夹角,避免反射探测组件310探测过程中对入射光的影响。The detector hemispheric motion platform is arranged behind the sample motion platform and connected to the reflection detection component 310 and the transmission detection component 320. It includes a second support rod 103, an L-shaped link 108, a detector B-axis rotation structure 106, and a detector C. The shaft rotation structure 105 and the crossbar 109, the second support rod 103 are vertically fixed on the bottom surface; one end of the L-shaped connecting rod 108 is connected to the second support rod 103 through the detector B-axis rotation structure 106, so that the L-shaped connecting rod 108 The detector B-axis rotation structure 106 rotates around the Y-axis, and its other end is connected to the crossbar 109 through the detector C-axis rotation structure 105, so that the detector C-axis rotation structure 105 drives the crossbar 109 to rotate around the Z-axis. ; One end of the crossbar 109 is connected to the inclined reflection detection assembly 310, and the other end is connected to the transmission detection assembly 320, so that under the joint action of the detector B-axis rotation structure 106 and the detector C-axis rotation structure 105, the reflection is synchronously driven The detection component 310 and the transmission detection component 320 move within their respective hemispheres to achieve full-space detection of reflected light and transmitted light; the axis of the reflection detection component 310 forms a certain angle with the axis of the incident light to avoid the detection process of the reflection detection component 310 effect on incident light.
进一步,如图3所示,光学元件全空间检测装置还包括暗室罩400,暗室罩400设置在光路单元和机械单元的外侧,用于形成暗室环境。暗室罩400的内壁设置有吸光结构401,并且该吸光结构401的表面涂有吸光黑涂层,以借助吸光结构401的多次反射以及吸光黑涂层实现杂散光的吸收,避免杂散光反射产生噪声,从而降低杂散光对测量结果的影响。优选地,吸光结构401采用等腰三角形的微结构。Further, as shown in Figure 3, the optical element full-space detection device also includes a darkroom cover 400. The darkroom cover 400 is provided outside the optical path unit and the mechanical unit to form a darkroom environment. The inner wall of the darkroom cover 400 is provided with a light-absorbing structure 401, and the surface of the light-absorbing structure 401 is coated with a light-absorbing black coating to absorb stray light through multiple reflections of the light-absorbing structure 401 and the light-absorbing black coating to avoid stray light reflection. noise, thereby reducing the impact of stray light on measurement results. Preferably, the light-absorbing structure 401 adopts an isosceles triangle microstructure.
进一步,光源组件包括依次连接的激光器301和光斑调整结构300,用于产生不同光斑半径及偏振状态的入射光,其中激光器301用于产生特定波长的激光光斑,优选采用532nm的滤光激光,功率范围可以实现0~100mW的范围内调节;光斑调整结构300用于对激光光斑进行调节以形成入射光,光斑调整结构300包括沿光线传播方向依次连接的起偏器302、滤波器303、准直镜304和入射光阑305,其中使用起偏器302产生S或P偏振光,搭配准直镜304和入射光阑305实现了偏振平行光线的入射,能够去除待测光学元件200的粗糙度,并在后续利用检偏器检测缺陷散射后偏振状态的改变。其中,起偏器302主要是为了避免表面粗糙度对缺陷检测的影响;滤波器303用于产生均匀激光,避免其他波长激光入射对测量结果的影响;准直镜304用于准直光路以降低由于光源光线分布不均匀导致的散射光线问题,提升检测的准确性;入射光阑305用于调节照射待测光学元件200表面激光光斑的大小,以适用不同的光学元件尺寸。Further, the light source component includes a laser 301 and a spot adjustment structure 300 connected in sequence, which are used to generate incident light with different spot radii and polarization states. The laser 301 is used to generate a laser spot of a specific wavelength, preferably a 532nm filter laser. The power The range can be adjusted within the range of 0 to 100mW; the spot adjustment structure 300 is used to adjust the laser spot to form incident light. The spot adjustment structure 300 includes a polarizer 302, a filter 303, and a collimator connected in sequence along the direction of light propagation. Mirror 304 and incident diaphragm 305, in which the polarizer 302 is used to generate S or P polarized light, and the collimating mirror 304 and the incident diaphragm 305 are used to realize the incidence of polarized parallel light, which can remove the roughness of the optical element 200 to be measured. And then use the analyzer to detect the change of polarization state after defect scattering. Among them, the polarizer 302 is mainly used to avoid the impact of surface roughness on defect detection; the filter 303 is used to generate uniform laser light to avoid the impact of other wavelength laser incidence on the measurement results; the collimating mirror 304 is used to collimate the optical path to reduce The problem of scattered light caused by uneven light distribution of the light source improves the accuracy of detection; the incident diaphragm 305 is used to adjust the size of the laser spot that illuminates the surface of the optical element 200 to be tested, so as to be suitable for different optical element sizes.
进一步,反射探测组件310包括沿光线传播方向依次连接的第一检偏器313、第一光阑312和第一光电倍增管311,透射探测组件320包括沿光线传播方向依次连接的第二检偏器323、第二光阑322和第二光电倍增管321。其中,第一检偏器313和第二检偏器323与起偏器302相互作用来检测特定的散射信号,能够去除入射光的偏振状态,实现表面粗糙度信号的去除;通过第一光电倍增管311和第二光电倍增管321直接检测缺陷导致的散射光强的分布状态,并且借助第一光阑312和第二光阑322调整探测光斑的大小。为了避免第一光电倍增管311和第二光电倍增管321直接检测反射光和透射光时会因光强过大而造成缺陷的问题,可以相应设置光电倍增管保护程序及电路设计。同时,为了降低杂散光对光电倍增的影响,可以延长第一光电倍增管311和第二光电倍增管321的光接受口的长度,并在整个光电倍增管表面及内表面涂上黑色导电涂层,从而实现杂散光的吸收及电磁屏蔽作用。第一光电倍增管311和第二光电倍增管321探测到的光信号借助数据采集器获取光强信号,并借助微弱信号处理手段实现光散射信号的采集。Further, the reflection detection component 310 includes a first analyzer 313, a first diaphragm 312 and a first photomultiplier tube 311 that are connected in sequence along the direction of light propagation, and the transmission detection component 320 includes a second analyzer that is connected in sequence along the direction of light propagation. 323, the second aperture 322 and the second photomultiplier tube 321. Among them, the first analyzer 313 and the second analyzer 323 interact with the polarizer 302 to detect specific scattering signals, which can remove the polarization state of the incident light and achieve the removal of surface roughness signals; through the first photoelectric multiplication The tube 311 and the second photomultiplier tube 321 directly detect the distribution state of the scattered light intensity caused by the defects, and adjust the size of the detection light spot with the help of the first aperture 312 and the second aperture 322 . In order to avoid the problem of defects caused by excessive light intensity when the first photomultiplier tube 311 and the second photomultiplier tube 321 directly detect reflected light and transmitted light, the photomultiplier tube protection program and circuit design can be set accordingly. At the same time, in order to reduce the impact of stray light on photomultiplication, the length of the light receiving ports of the first photomultiplier tube 311 and the second photomultiplier tube 321 can be extended, and a black conductive coating can be applied to the surface and inner surface of the entire photomultiplier tube. , thereby achieving stray light absorption and electromagnetic shielding. The light signal detected by the first photomultiplier tube 311 and the second photomultiplier tube 321 is obtained by using a data collector to obtain the light intensity signal, and the light scattering signal is collected by using weak signal processing means.
测试时,入射光照射到待测光学元件200的表面,一部分表面反射,还有一部分透过待测光学元件200,其中待测光学元件200的表面粗糙度对入射光的偏振状态无影响,但是缺陷及表面污染物会导致光散射状态改变,通过第一检偏器313和第二检偏器323去除与入射光相同偏振状态,检测由于缺陷及表面污染物导致的偏振状态改变的光强分布。During the test, the incident light irradiates the surface of the optical element 200 to be tested, part of the surface is reflected, and part is transmitted through the optical element 200 to be tested. The surface roughness of the optical element 200 to be tested has no effect on the polarization state of the incident light. However, Defects and surface contaminants will cause changes in the light scattering state. The first analyzer 313 and the second analyzer 323 remove the same polarization state as the incident light, and detect the light intensity distribution of the change in polarization state caused by defects and surface contaminants. .
如图4所示,按照本发明的另一方面,提供了一种光学元件全空间检测方法,该方法包括如下步骤:As shown in Figure 4, according to another aspect of the present invention, a method for full-space detection of optical elements is provided, which method includes the following steps:
S1启动光源组件并调整入射光偏振状态,然后放置待测光学元件200,最后开启反射探测组件310和透射探测组件320,调试第一光电倍增管311和第二光电倍增管321;S1 starts the light source component and adjusts the polarization state of the incident light, then places the optical element 200 to be tested, finally turns on the reflection detection component 310 and the transmission detection component 320, and debugs the first photomultiplier tube 311 and the second photomultiplier tube 321;
S2利用光源运动平台带动光源组件转动以调整入射光的入射角,同时利用探测器半球运动平台带动反射探测组件310和透射探测组件320转动相同角度以采集反射光和透射光的光强信息;S2 uses the light source movement platform to drive the light source component to rotate to adjust the incident angle of the incident light, and at the same time uses the detector hemisphere movement platform to drive the reflection detection component 310 and the transmission detection component 320 to rotate at the same angle to collect the light intensity information of the reflected light and transmitted light;
S3重复步骤S2直至入射角覆盖设定范围,以完成当前光斑处的检测;S3 Repeat step S2 until the incident angle covers the set range to complete the detection at the current light spot;
S4利用样品运动平台带动待测光学元件200移动预设距离至下一光斑处,然后重复步骤S2、S3,直至入射光覆盖待测光学元件200,并根据采集的光强信息获得待测光学元件200的表面缺陷及污染物。S4 uses the sample movement platform to drive the optical element 200 to be tested to move a preset distance to the next light spot, and then repeats steps S2 and S3 until the incident light covers the optical element 200 to be tested, and obtains the optical element to be tested based on the collected light intensity information. 200 surface defects and contaminants.
进一步,步骤S1中,使用之前首先调试设备,主要集中在入射光偏振状态、入射光光斑直径大小、缺陷检测环境这些因素;在设备的初始调试完成后,启动激光器301,在恒温没有外界噪声信号干扰的情况下,稳定运行一段时间保证整个装置进入稳定运行状态。Further, in step S1, the equipment is first debugged before use, mainly focusing on factors such as the polarization state of the incident light, the diameter of the incident light spot, and the defect detection environment; after the initial debugging of the equipment is completed, the laser 301 is started, and there is no external noise signal at a constant temperature. In the case of interference, stable operation for a period of time ensures that the entire device enters a stable operating state.
进一步,步骤S2中,设置入射光的初始入射角为0°,此时第一光电倍增管311和第二光电倍增管321检测到的光强存在最大值,检测最大值光强的分布情况,设置一个高低档范围,在保证光电倍增管安全的前提下,实现缺陷光强信号的高灵敏度测量。如图5所示,判断检测到的光强信号的强度是否超过峰值光强,若是,则开启强光保护断开光强采集,若否,则判断是否超过低档位测量范围,若是,则调至高档位光强采集电路,若否,则调至低档位光强采集电路。Further, in step S2, the initial incident angle of the incident light is set to 0°. At this time, the light intensity detected by the first photomultiplier tube 311 and the second photomultiplier tube 321 has a maximum value, and the distribution of the maximum light intensity is detected, Set a high and low range to achieve high-sensitivity measurement of defective light intensity signals while ensuring the safety of the photomultiplier tube. As shown in Figure 5, determine whether the intensity of the detected light intensity signal exceeds the peak light intensity. If so, turn on the strong light protection and disconnect the light intensity collection. If not, determine whether it exceeds the low-range measurement range. If so, adjust the to the high-level light intensity collection circuit. If not, adjust to the low-level light intensity collection circuit.
进一步,步骤S3中,首先利用白光散射等常见检测手段检测表面缺陷形貌,将检测到的表面缺陷形貌与光强分布检测到的进行对比,对比缺陷的空间分布与真实缺陷形貌对应情况建立散射矩阵库,从而借助散射矩阵库以及采集的光强信息判断缺陷形貌。Further, in step S3, common detection methods such as white light scattering are first used to detect surface defect morphology, the detected surface defect morphology is compared with that detected by light intensity distribution, and the spatial distribution of defects is compared with the correspondence between the real defect morphology Establish a scattering matrix library to determine the defect morphology with the help of the scattering matrix library and the collected light intensity information.
本领域的技术人员容易理解,以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。It is easy for those skilled in the art to understand that the above descriptions are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions and improvements, etc., made within the spirit and principles of the present invention, All should be included in the protection scope of the present invention.
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202311256166.5A CN117309329A (en) | 2023-09-26 | 2023-09-26 | Full-space detection device and method for optical element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202311256166.5A CN117309329A (en) | 2023-09-26 | 2023-09-26 | Full-space detection device and method for optical element |
Publications (1)
Publication Number | Publication Date |
---|---|
CN117309329A true CN117309329A (en) | 2023-12-29 |
Family
ID=89273205
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202311256166.5A Pending CN117309329A (en) | 2023-09-26 | 2023-09-26 | Full-space detection device and method for optical element |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN117309329A (en) |
-
2023
- 2023-09-26 CN CN202311256166.5A patent/CN117309329A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106442564B (en) | Detection device and method for large-diameter ultra-smooth surface defects | |
CN102435582B (en) | High precision laser absorptivity measuring device | |
CN108717062A (en) | A kind of the details in a play not acted out on stage, but told through dialogues defect detecting device and its measurement method of heavy caliber ultra-precision surface | |
CN106404794A (en) | High-speed measuring device and method for surface scattering of large-aperture material | |
CN112229854B (en) | Device and method for measuring surface defect of spherical optical element | |
CN101122555A (en) | High concentration super fine granule measuring device and method based on backward photon related spectrum | |
CN110702613B (en) | Device and method for testing full-polarization bidirectional reflection distribution of sample | |
CN106872415A (en) | With reference to the measurement apparatus and measuring method of the multi-wavelength sample optical limiting properties of micro-imaging | |
CN102175431A (en) | Device for measuring point source stray light transmission coefficient in large dynamic range | |
JP2001305072A (en) | Method and device for detecting defect in substrate | |
CN102507596A (en) | Optical element surface defect detecting system based on active laser beam scanning | |
CN203479497U (en) | Stray light coefficient and point source transmittance composite test system | |
CN115561220A (en) | Light scattering angle resolution detection analysis system | |
CN103454072B (en) | stray light coefficient and point source transmittance composite test method and system | |
CN204855406U (en) | Fused quartz sublayer microdefect detecting device | |
CN103105283B (en) | Focal length measuring device of single-spectrum large-caliber long-focus lens | |
CN102621107A (en) | In-situ optical measurement device for aerospace material space environment irradiation measurement | |
CN110779927B (en) | A subsurface defect detection device and method based on ultrasonic modulation | |
CN203132818U (en) | Stray light detection system of optical system to be detected | |
CN107843564A (en) | Reflection type optical material nonlinear polarization spectrum measuring device | |
CN101482504A (en) | Test device for detecting material laser space scattering characteristics and its detecting method | |
CN107561008A (en) | A kind of device for VUV diffusing reflection plate BRDF feature measurements | |
CN117309329A (en) | Full-space detection device and method for optical element | |
CN105572060A (en) | Device and method for detecting gas leakage | |
JPH0442945A (en) | Inspection of wafer slip line |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |