CN117285131A - Chemical cleaning liquid treatment circulating device for semiconductor grinding process - Google Patents
Chemical cleaning liquid treatment circulating device for semiconductor grinding process Download PDFInfo
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- CN117285131A CN117285131A CN202311358347.9A CN202311358347A CN117285131A CN 117285131 A CN117285131 A CN 117285131A CN 202311358347 A CN202311358347 A CN 202311358347A CN 117285131 A CN117285131 A CN 117285131A
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- 239000007788 liquid Substances 0.000 title claims abstract description 51
- 238000004140 cleaning Methods 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 title claims abstract description 29
- 239000004065 semiconductor Substances 0.000 title claims abstract description 28
- 239000000126 substance Substances 0.000 title claims abstract description 28
- 230000008569 process Effects 0.000 title claims abstract description 26
- 230000007246 mechanism Effects 0.000 claims abstract description 41
- 230000007306 turnover Effects 0.000 claims abstract description 16
- 239000007787 solid Substances 0.000 claims description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 235000017166 Bambusa arundinacea Nutrition 0.000 claims description 9
- 235000017491 Bambusa tulda Nutrition 0.000 claims description 9
- 241001330002 Bambuseae Species 0.000 claims description 9
- 235000015334 Phyllostachys viridis Nutrition 0.000 claims description 9
- 239000011425 bamboo Substances 0.000 claims description 9
- 239000006185 dispersion Substances 0.000 claims description 6
- 239000008394 flocculating agent Substances 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000007599 discharging Methods 0.000 claims description 2
- 238000007517 polishing process Methods 0.000 claims 2
- 238000010129 solution processing Methods 0.000 claims 2
- 239000000203 mixture Substances 0.000 description 22
- 239000002245 particle Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 230000016615 flocculation Effects 0.000 description 6
- 238000005189 flocculation Methods 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 239000002351 wastewater Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Separation Of Suspended Particles By Flocculating Agents (AREA)
Abstract
The invention discloses a chemical cleaning liquid treatment and circulation device in a semiconductor grinding process, and relates to the technical field of semiconductors. The method specifically comprises the following steps: the treatment device comprises a treatment cylinder, wherein a first fixed frame is fixedly connected to the inside of the treatment cylinder, a first adjusting column is fixedly connected to the top of the first fixed frame, a fixed pipeline is fixedly connected to the inside of the treatment cylinder, and a treatment mechanism is fixedly connected to the inside of the fixed pipeline; the turnover mechanism is used for mixing flocculant and chemical cleaning liquid and comprises a sliding box, a rotating shaft is fixedly connected to the inside of the sliding box, a fixed column is fixedly connected to the outside of the rotating shaft, a square plate is fixedly connected to the outside of the fixed column, a dispersing assembly is fixedly connected to the outside of the square plate, and the sliding box is slidably connected to the inside of the first fixed frame; the feeding mechanism is used for feeding the flocculant into the treatment cylinder, and the chemical cleaning liquid treatment and circulation device in the semiconductor grinding process achieves the purpose of improving the service efficiency of equipment.
Description
Technical Field
The invention relates to the technical field of semiconductors, in particular to a chemical cleaning liquid treatment and circulation device in a semiconductor grinding process.
Background
The semiconductor industry is an attractive advanced industry in the development of the China industry in recent years, has great market and development potential, and in the process of changing semiconductor wafers into end products with various functions, according to product requirements and set sizes, the wafers need to be subjected to grinding and cutting treatment, and meanwhile, the wafers are cleaned by water in the grinding and cutting process, so that a large amount of grinding and cutting waste water is generated. The main pollutants in the grinding and cutting wastewater are suspended particles and cleaning agents, and the wastewater is characterized by high suspended matter concentration, light weight, extremely difficult precipitation, turbid appearance, poor biochemistry and weak alkalinity.
At present, when a flocculating agent is added into a treatment cylinder, the flocculating agent falls on an adding position, so that the mixture of solid particles and the flocculating agent at the adding position is overlarge, liquid in the mixture is difficult to discharge, the water content of the mixture is higher, and the water quantity recycled is reduced. Because the liquid amount is more, after the flocculant gets into the processing section of thick bamboo, be difficult to quick and liquid homogeneous mixing, if set up powerful agitated vessel, easily lead to the mixture that solid particle and flocculant formed to be broken up, influence flocculation effect.
Disclosure of Invention
In order to solve the technical problems, the invention provides a chemical cleaning solution treatment and circulation device for a semiconductor grinding process, which specifically comprises the following steps:
the treatment device comprises a treatment cylinder, wherein a first fixed frame is fixedly connected to the inside of the treatment cylinder, a first adjusting column is fixedly connected to the top of the first fixed frame, a fixed pipeline is fixedly connected to the inside of the treatment cylinder, and a treatment mechanism is fixedly connected to the inside of the fixed pipeline;
the turnover mechanism is used for mixing flocculant and chemical cleaning liquid and comprises a sliding box, a rotating shaft is fixedly connected to the inside of the sliding box, a fixed column is fixedly connected to the outside of the rotating shaft, a square plate is fixedly connected to the outside of the fixed column, a dispersing assembly is fixedly connected to the outside of the square plate, and the sliding box is slidably connected to the inside of the first fixed frame;
the feeding mechanism is used for feeding the flocculant into the treatment cylinder, the feeding mechanism comprises a second fixed frame, a sliding frame is connected to the outer portion of the second fixed frame in a sliding mode, a storage cylinder is fixedly connected to the top of the sliding frame, a vertical pipe is fixedly connected to the bottom of the storage cylinder, and the second fixed frame is fixedly connected to the top of the first adjusting column.
Preferably, the outside fixedly connected with first solid fixed ring of processing section of thick bamboo, the bottom fixedly connected with base of first solid fixed ring, the bottom fixedly connected with ejection of compact pipeline of processing section of thick bamboo.
Preferably, the inside fixedly connected with second regulation post of first fixed frame, the inside fixedly connected with motor of slip case, the output and the pivot fixed connection of motor, second regulation post fixed connection is in the bottom of slip case.
Preferably, the dispersion assembly comprises a first clamping seat, a first telescopic column is fixedly connected to the inside of the first clamping seat, a spring rod is fixedly connected to the top of the first telescopic column, a fourth adjusting column is fixedly connected to the bottom of the square plate, a sucking disc is fixedly connected to the bottom of the fourth adjusting column and used for fixing the position of the square plate, and the first clamping seat is fixedly connected to the top of the square plate.
Preferably, the dispersing assembly further comprises a half bearing, a third adjusting column is rotatably connected to the inside of the half bearing, a second fixing ring is fixedly connected to the outside of the third adjusting column, an elastic rod is fixedly connected to the outside of the second fixing ring, a friction shell is sleeved on the outside of the elastic rod and used for cleaning the inner wall of the treatment cylinder, and the half bearing is fixedly connected to the outside of the square plate.
Preferably, the top fixedly connected with backup plate of second fixed frame, the outside fixedly connected with second telescopic column of backup plate, second telescopic column and carriage fixed connection.
Preferably, the outside fixedly connected with bleeder of standpipe, the inside fixedly connected with telescopic tube of bleeder for transport flocculant, the outside fixedly connected with third solid fixed ring of bleeder, the bottom fixedly connected with electric putter of third solid fixed ring, electric putter's outside fixedly connected with links up the post, the outside fixedly connected with first screens ring of linking the post.
Preferably, the processing mechanism comprises a spring, a second clamping ring is fixedly connected to the outer portion of the spring, a cross plate is fixedly connected to the outer portion of the second clamping ring and used for fixing the filter screen, and the spring is fixedly connected to the outer portion of the fixed pipeline.
Preferably, the outside fixedly connected with second cassette of cross board, the inside fixedly connected with active carbon column of second cassette is used for absorbing the peculiar smell, the inside fixedly connected with adapter ring of fixed pipeline.
The invention provides a chemical cleaning liquid treatment and circulation device in a semiconductor grinding process. The beneficial effects are as follows:
1. according to the chemical cleaning liquid treatment circulating device in the semiconductor grinding process, the height and the position of the flocculant entering the treatment cylinder are controlled by arranging the turnover mechanism and the feeding mechanism, so that the flocculant and the liquid are uniformly mixed. And the liquid is driven to move to promote the mixing of the two, so that the mixture is protected and prevented from being scattered. The purpose of facilitating the flocculation work and protecting the mixture is achieved.
2. The chemical cleaning liquid treatment circulating device in the semiconductor grinding process drives liquid to move by arranging the turnover mechanism. Because the liquid amount is more, after the flocculant gets into the processing section of thick bamboo, be difficult to quick and liquid homogeneous mixing, if set up powerful agitated vessel, easily lead to the mixture that solid particle and flocculant formed to be broken up, influence flocculation effect. Therefore, the turnover mechanism is arranged to drive the liquid to move and protect the mixture, so as to solve the problems. The purpose of facilitating the driving of the liquid in the treatment cylinder to move and promoting the mixing of the flocculant and the liquid is achieved.
3. According to the chemical cleaning liquid treatment circulating device in the semiconductor grinding process, the flocculant is sent into the treatment cylinder by arranging the feeding mechanism. When the flocculant is added into the treatment cylinder, the flocculant falls on the adding position, so that the mixture of solid particles and the flocculant at the adding position is oversized, liquid in the mixture is difficult to discharge, the water content of the mixture is high, and the amount of water recycled is reduced. Therefore, the feeding mechanism is arranged, and three branch pipes are simultaneously arranged at different positions and different heights to transport the flocculant, so that the flocculant uniformly falls into the treatment cylinder to solve the problems. The purpose of being convenient for evenly feeding the flocculant into the treatment cylinder is achieved.
4. The chemical cleaning liquid treatment circulating device for the semiconductor grinding process shakes off the mixture of the pipe orifice by arranging a treatment mechanism. In the process of mixing the flocculant and the liquid, the liquid moves to drive the second clamping ring to move, the mixture outside the cross plate is shaken off, subsequent water pumping work is convenient to carry out, and a detachable activated carbon column is arranged to remove the odor of the liquid. The purpose of being convenient for shaking off the mixture at the orifice of the fixed pipeline is achieved.
Drawings
FIG. 1 is a schematic diagram of the overall structure of the present invention;
FIG. 2 is a schematic view of the bottom structure of the present invention;
FIG. 3 is a schematic diagram of the turnover mechanism of the present invention;
FIG. 4 is a schematic view of a dispersion member according to the present invention;
FIG. 5 is an enlarged schematic view of a portion of FIG. 4A according to the present invention;
FIG. 6 is a schematic diagram of a feeding mechanism according to the present invention;
FIG. 7 is an enlarged schematic view of a portion of the invention at B in FIG. 6;
FIG. 8 is a schematic view of a processing mechanism according to the present invention.
In the figure: 1. a treatment cylinder; 2. a first fixing frame; 3. a turnover mechanism; 301. a slide box; 302. a rotating shaft; 303. fixing the column; 304. a square plate; 305. a dispersion assembly; 3051. a first clamping seat; 3052. a first telescoping column; 3053. a spring rod; 3054. a half bearing; 3055. a third adjustment column; 3056. a second fixing ring; 3057. an elastic rod; 3058. a friction housing; 3059. a fourth adjustment column; 306. a second adjustment column; 4. a first adjustment column; 5. a feeding mechanism; 501. a second fixing frame; 502. a backup plate; 503. a second telescoping column; 504. a carriage; 505. a storage cylinder; 506. a standpipe; 507. a branch pipe; 508. a telescoping tube; 509. a third fixing ring; 510. an electric push rod; 511. a connecting column; 512. a first clamping ring; 6. fixing the pipeline; 7. a processing mechanism; 701. a spring; 702. a second clamping ring; 703. a cross plate; 704. a second clamping seat; 705. an activated carbon column; 706. a connecting ring; 8. a first fixing ring; 9. a base; 10. and a discharging pipeline.
Detailed Description
The invention will be described in further detail with reference to the drawings and the detailed description. The embodiments of the invention have been presented for purposes of illustration and description, and are not intended to be exhaustive or limited to the invention in the form disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiments were chosen and described in order to best explain the principles of the invention and the practical application, and to enable others of ordinary skill in the art to understand the invention for various embodiments with various modifications as are suited to the particular use contemplated.
As shown in fig. 1 to 8, the present invention provides a technical solution: the method specifically comprises the following steps:
the treatment device comprises a treatment cylinder 1, wherein a first fixed frame 2 is fixedly connected to the inside of the treatment cylinder 1, a first adjusting column 4 is fixedly connected to the top of the first fixed frame 2, a fixed pipeline 6 is fixedly connected to the inside of the treatment cylinder 1, and a treatment mechanism 7 is fixedly connected to the inside of the fixed pipeline 6;
the turnover mechanism 3 is used for mixing flocculant and chemical cleaning liquid, the turnover mechanism 3 comprises a sliding box 301, a rotating shaft 302 is fixedly connected to the inside of the sliding box 301, a fixed column 303 is fixedly connected to the outside of the rotating shaft 302, a square plate 304 is fixedly connected to the outside of the fixed column 303, a dispersing assembly 305 is fixedly connected to the outside of the square plate 304, and the sliding box 301 is slidably connected to the inside of the first fixed frame 2;
the feeding mechanism 5 is used for feeding the flocculant into the treatment cylinder 1, the feeding mechanism 5 comprises a second fixed frame 501, a sliding frame 504 is connected to the outer portion of the second fixed frame 501 in a sliding manner, a storage cylinder 505 is fixedly connected to the top of the sliding frame 504, a vertical pipe 506 is fixedly connected to the bottom of the storage cylinder 505, and the second fixed frame 501 is fixedly connected to the top of the first adjusting column 4.
The outside fixedly connected with first solid fixed ring 8 of processing section of thick bamboo 1, the bottom fixedly connected with base 9 of first solid fixed ring 8, the bottom fixedly connected with ejection of compact pipeline 10 of processing section of thick bamboo 1, the inside of ejection of compact pipeline 10 is provided with the valve.
When the equipment is used, chemical cleaning liquid in the semiconductor grinding process is sent into the treatment cylinder 1, then the turnover mechanism 3 is adjusted and started, the turnover mechanism 3 starts to drive liquid in the treatment cylinder 1 to move, and the liquid drives the treatment mechanism 7 to move. The feeding mechanism 5 is then opened to feed the flocculant into the interior of the treatment canister 1, and the flocculant is mixed with the liquid in the treatment canister 1 in cooperation with the turning mechanism 3. After flocculation, the liquid in the treatment cylinder 1 is manually pumped out through the fixed pipeline 6 by using a water pump and returned to the semiconductor grinding equipment for recycling the chemical cleaning liquid.
The inside fixedly connected with second regulation post 306 of first fixed frame 2, the inside fixedly connected with motor of sliding box 301, the output and the pivot 302 fixed connection of motor, second regulation post 306 fixed connection is in the bottom of sliding box 301.
Before the device is used, the length of the second adjusting post 306 is manually adjusted, so that when the square plate 304 is in the vertical state, the height of the square plate 304 is lower than the height of the fixed pipeline 6. The sliding box 301 moves inside the first fixed frame 2 along with the second adjusting post 306, so as to drive the rotating shaft 302, the fixed post 303, the square plate 304 and the dispersing component 305 to move.
The dispersion assembly 305 includes a first clamping seat 3051, a first telescopic column 3052 is fixedly connected to the inside of the first clamping seat 3051, a spring rod 3053 is fixedly connected to the top of the first telescopic column 3052, a fourth adjusting column 3059 is fixedly connected to the bottom of the square plate 304, a sucking disc is fixedly connected to the bottom of the fourth adjusting column 3059, and the first clamping seat 3051 is fixedly connected to the top of the square plate 304.
The motor in the sliding box 301 is started, the motor drives the rotating shaft 302, the fixed column 303 and the square plate 304 to rotate, and then drives the first clamping seat 3051, the first telescopic column 3052 and the spring rod 3053 to rotate, gaps exist between the spring rods 3053, a mixture generated by mixing the flocculant and the solid particles can pass through the gaps between the spring rods 3053, and the spring rods 3053 can drive the mixture to deflect downwards in a large range. The first telescopic column 3052 is gradually and naturally extended downwards in the process of rotating downwards, the spring rod 3053 contacts with the bottom of the treatment cylinder 1, and when the spring rod 3053 collides with the treatment cylinder 1, particles attached to the outer portion of the spring rod 3053 can be promoted to be separated from the spring rod 3053.
The dispersion assembly 305 further comprises a half bearing 3054, a third adjusting column 3055 is rotatably connected to the inside of the half bearing 3054, a second fixing ring 3056 is fixedly connected to the outside of the third adjusting column 3055, an elastic rod 3057 is fixedly connected to the outside of the second fixing ring 3056, a friction shell 3058 is sleeved on the outside of the elastic rod 3057, and the half bearing 3054 is fixedly connected to the outside of the square plate 304.
In the process of overturning the square plate 304, the square plate 304 drives the external half bearing 3054, the third adjusting column 3055, the second fixing ring 3056 and the elastic rod 3057 to rotate, and then drives the friction shell 3058 to rotate, when the elastic rod 3057 and the friction shell 3058 contact the inner wall of the treatment cylinder 1, the elastic rod 3057 is elastically deformed, the friction shell 3058 scrapes the inner wall, and the mixture is prevented from being attached to the inner wall of the treatment cylinder 1.
The top fixedly connected with backup plate 502 of second fixed frame 501, the outside fixedly connected with second flexible post 503 of backup plate 502, second flexible post 503 and carriage 504 fixed connection.
The outside fixedly connected with bleeder 507 of standpipe 506, the inside of standpipe 506 is provided with electric valve, bleeder 507 is provided with three, the inside fixedly connected with telescopic tube 508 of bleeder 507, the outside fixedly connected with third solid fixed ring 509 of bleeder 507, the bottom fixedly connected with electric putter 510 of third solid fixed ring 509, the outside fixedly connected with of electric putter 510 links up post 511, the outside fixedly connected with of linking post 511 first screens ring 512, first screens ring 512 fixedly connected with is in the outside of telescopic tube 508.
The electric push rod 510 is started, and the electric push rod 510 drives the connecting column 511 and the first clamping ring 512 to move downwards, so as to drive the telescopic sleeve 508 in the first clamping ring 512 to move downwards until the telescopic sleeve 508 is positioned at the bottom of the treatment cylinder 1 and above the square plate 304. The electric valve is opened, the flocculant in the storage barrel 505 enters the three branch pipes 507 through the vertical pipes 506, and moves downwards through the three branch pipes 507, and the second telescopic column 503 is pulled outwards at a constant speed manually until the sliding frame 504 moves to the outermost side of the second fixed frame 501. At this point the flocculant uniformly enters the bottom of the treatment canister 1.
The electric valve in the opening state is closed, the electric push rod 510 drives the telescopic tube 508 to return to the original position, and at the moment, the telescopic tube 508 is positioned at the middle upper position of the treatment cylinder 1 and is in the liquid. The electric valve is opened, and the second telescopic column 503 is pulled in the opposite direction at a constant speed manually until the sliding frame 504 moves back to the original position, so that the flocculant is uniformly fed into the middle upper part of the treatment cylinder 1.
The processing mechanism 7 comprises a spring 701, a second clamping ring 702 is fixedly connected to the outer portion of the spring 701, a cross plate 703 is fixedly connected to the outer portion of the second clamping ring 702, a filter screen is arranged on the outer portion of the cross plate 703, and the spring 701 is fixedly connected to the outer portion of the fixed pipeline 6.
The outside fixedly connected with second cassette 704 of cross 703, the inside fixedly connected with activated carbon column 705 of second cassette 704, the inside fixedly connected with adapter ring 706 of fixed pipeline 6.
When the square plate 304 drives the liquid to turn over in the direction away from the second clamping ring 702, the liquid drives the second clamping ring 702 to move outwards, and then drives the spring 701 to move outwards, and as the liquid continues to move, the spring 701 rebounds, the second clamping ring 702 is driven to gradually clamp the outside of the fixed pipeline 6, and the mixture on the outer surface of the filter screen is promoted to fall off.
When the cleaning liquid after flocculation is pumped out, the liquid enters the fixed pipeline 6 through the filter screen, and the activated carbon column 705 plays a role in absorbing peculiar smell.
Working principle: when the equipment is used, chemical cleaning liquid in the process of grinding the semiconductor is sent into the treatment cylinder 1, and the height of the liquid is consistent with the height of the bottom of the second clamping ring 702. The turnover mechanism 3 is then adjusted and opened, and the lengths of the second adjusting column 306 and the fourth adjusting column 3059 are manually adjusted so that the suction cup is separated from the bottom of the treatment canister 1, and when the square plate 304 is in the vertical state, the height of the square plate 304 is lower than the height of the fixed pipeline 6. The sliding box 301 moves inside the first fixed frame 2 along with the second adjusting post 306, so as to drive the rotating shaft 302, the fixed post 303, the square plate 304 and the dispersing component 305 to move.
When the square plate 304 drives the liquid to turn over in the direction away from the second clamping ring 702, the liquid drives the second clamping ring 702 to move outwards, and then drives the spring 701 to move outwards, and as the liquid continues to move, the spring 701 rebounds, the second clamping ring 702 is driven to gradually clamp the outside of the fixed pipeline 6, and the mixture on the outer surface of the filter screen is promoted to fall off.
And then the feeding mechanism 5 is started, the electric push rod 510 drives the connecting column 511 and the first clamping ring 512 to move downwards, and further drives the telescopic sleeve 508 in the first clamping ring 512 to move downwards until the telescopic sleeve 508 is positioned at the bottom of the treatment cylinder 1 and above the square plate 304. The electric valve is opened, the flocculant in the storage barrel 505 enters the three branch pipes 507 through the vertical pipes 506, and moves downwards through the three branch pipes 507, and the second telescopic column 503 is pulled outwards at a constant speed manually until the sliding frame 504 moves to the outermost side of the second fixed frame 501. At this point the flocculant uniformly enters the bottom of the treatment canister 1.
The electric valve in the opening state is closed, the electric push rod 510 drives the telescopic tube 508 to return to the original position, and at the moment, the telescopic tube 508 is positioned at the middle upper position of the treatment cylinder 1 and is in the liquid. The electric valve is opened, and the second telescopic column 503 is pulled in the opposite direction at a constant speed manually until the sliding frame 504 moves back to the original position, so that the flocculant is uniformly fed into the middle upper part of the treatment cylinder 1. The motor in the sliding box 301 is started, the motor drives the rotating shaft 302, the fixed column 303 and the square plate 304 to rotate, and then drives the first clamping seat 3051, the first telescopic column 3052 and the spring rod 3053 to rotate, gaps exist between the spring rods 3053, a mixture generated by mixing the flocculant and the solid particles can pass through the gaps between the spring rods 3053, and the spring rods 3053 can drive the mixture to deflect downwards in a large range. The first telescopic column 3052 is gradually and naturally extended downwards in the process of rotating downwards, the spring rod 3053 contacts with the bottom of the treatment cylinder 1, and when the spring rod 3053 collides with the treatment cylinder 1, particles attached to the outer portion of the spring rod 3053 can be promoted to be separated from the spring rod 3053.
In the process of overturning the square plate 304, the square plate 304 drives the external half bearing 3054, the third adjusting column 3055, the second fixing ring 3056 and the elastic rod 3057 to rotate, and then drives the friction shell 3058 to rotate, when the elastic rod 3057 and the friction shell 3058 contact the inner wall of the treatment cylinder 1, the elastic rod 3057 is elastically deformed, the friction shell 3058 scrapes the inner wall, and the mixture is prevented from being attached to the inner wall of the treatment cylinder 1. With the cooperation of the turning mechanism 3, the flocculant is mixed with the solid particles in the treatment canister 1.
After flocculation, the water suction pipe is manually connected with the adapter ring 706, and the liquid in the treatment cylinder 1 is pumped out through the water suction pipe and the fixed pipeline 6 by using the water suction pump and is returned to the semiconductor grinding equipment for recycling the chemical cleaning liquid. The liquid enters the inside of the fixed pipeline 6 through the filter screen, and the activated carbon column 705 plays a role in absorbing peculiar smell.
It will be apparent that the described embodiments are only some, but not all, embodiments of the invention. All other embodiments, which can be made by those skilled in the art and which are included in the embodiments of the present invention without the inventive step, are intended to be within the scope of the present invention. Structures, devices and methods of operation not specifically described and illustrated herein, unless otherwise indicated and limited, are implemented according to conventional means in the art.
Claims (9)
1. A chemical cleaning liquid treatment and circulation device for a semiconductor grinding process specifically comprises:
a treatment drum (1), characterized in that: the device comprises a treatment cylinder (1), a first fixing frame (2) is fixedly connected to the inside of the treatment cylinder (1), a first adjusting column (4) is fixedly connected to the top of the first fixing frame (2), a fixing pipeline (6) is fixedly connected to the inside of the treatment cylinder (1), and a treatment mechanism (7) is fixedly connected to the inside of the fixing pipeline (6);
the turnover mechanism (3) is used for mixing flocculant and chemical cleaning liquid, the turnover mechanism (3) comprises a sliding box (301), a rotating shaft (302) is fixedly connected to the inside of the sliding box (301), a fixed column (303) is fixedly connected to the outside of the rotating shaft (302), a square plate (304) is fixedly connected to the outside of the fixed column (303), a dispersing assembly (305) is fixedly connected to the outside of the square plate (304), and the sliding box (301) is slidably connected to the inside of the first fixed frame (2);
feeding mechanism (5) for send into the inside of handling section of thick bamboo (1) with the flocculating agent, feeding mechanism (5) are including second fixed frame (501), the outside sliding connection of second fixed frame (501) has carriage (504), the top fixedly connected with storage section of thick bamboo (505) of carriage (504), the bottom fixedly connected with standpipe (506) of storage section of thick bamboo (505), the top at first regulation post (4) of second fixed frame (501) fixed connection.
2. A semiconductor grinding process chemical cleaning solution treatment circulation device according to claim 1, wherein: the device is characterized in that a first fixing ring (8) is fixedly connected to the outside of the treatment cylinder (1), a base (9) is fixedly connected to the bottom of the first fixing ring (8), and a discharging pipeline (10) is fixedly connected to the bottom of the treatment cylinder (1).
3. A semiconductor grinding process chemical cleaning solution treatment circulation device according to claim 1, wherein: the inside fixedly connected with second regulation post (306) of first fixed frame (2), the inside fixedly connected with motor of sliding box (301), the output and the pivot (302) fixed connection of motor, second regulation post (306) fixed connection is in the bottom of sliding box (301).
4. A semiconductor grinding process chemical cleaning solution treatment circulation device according to claim 1, wherein: the dispersing assembly (305) comprises a first clamping seat (3051), a first telescopic column (3052) is fixedly connected to the inside of the first clamping seat (3051), a spring rod (3053) is fixedly connected to the top of the first telescopic column (3052), a fourth adjusting column (3059) is fixedly connected to the bottom of the square plate (304), a sucking disc is fixedly connected to the bottom of the fourth adjusting column (3059), and the first clamping seat (3051) is fixedly connected to the top of the square plate (304).
5. The chemical cleaning solution processing and circulating apparatus for a semiconductor polishing process as recited in claim 4, wherein: the dispersion assembly (305) further comprises a half bearing (3054), a third adjusting column (3055) is rotatably connected to the inside of the half bearing (3054), a second fixing ring (3056) is fixedly connected to the outside of the third adjusting column (3055), an elastic rod (3057) is fixedly connected to the outside of the second fixing ring (3056), a friction shell (3058) is sleeved on the outside of the elastic rod (3057), and the half bearing (3054) is fixedly connected to the outside of the square plate (304).
6. A semiconductor grinding process chemical cleaning solution treatment circulation device according to claim 1, wherein: the top fixedly connected with backup plate (502) of second fixed frame (501), the outside fixedly connected with second flexible post (503) of backup plate (502), second flexible post (503) and carriage (504) fixed connection.
7. The chemical cleaning solution processing and circulating apparatus for a semiconductor polishing process as recited in claim 6, wherein: the outside fixedly connected with bleeder (507) of standpipe (506), the inside fixedly connected with telescopic tube (508) of bleeder (507), the outside fixedly connected with third solid fixed ring (509) of bleeder (507), the bottom fixedly connected with electric putter (510) of third solid fixed ring (509), the outside fixedly connected with of electric putter (510) links up post (511), the outside fixedly connected with first screens ring (512) of linking post (511).
8. A semiconductor grinding process chemical cleaning solution treatment circulation device according to claim 1, wherein: the processing mechanism (7) comprises a spring (701), a second clamping ring (702) is fixedly connected to the outer portion of the spring (701), a cross plate (703) is fixedly connected to the outer portion of the second clamping ring (702), and the spring (701) is fixedly connected to the outer portion of the fixed pipeline (6).
9. A semiconductor grinding process chemical cleaning solution treatment circulation device as defined in claim 8, wherein: the outside fixedly connected with second cassette (704) of cross board (703), the inside fixedly connected with active carbon column (705) of second cassette (704), the inside fixedly connected with adapter ring (706) of fixed pipeline (6).
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Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111265968A (en) * | 2020-02-29 | 2020-06-12 | 魏九宝 | Oil-water separation device for vacuum pump |
| CN213375430U (en) * | 2020-09-24 | 2021-06-08 | 新疆同济生态科技工程股份有限公司 | Pressure type coagulation reaction filter special for water plant |
| CN213569841U (en) * | 2020-09-18 | 2021-06-29 | 成都精仕诚科技有限公司 | Waste water treatment device for large water mill |
| CN214360463U (en) * | 2020-12-31 | 2021-10-08 | 苏州美源达环保科技股份有限公司 | Mixing equipment for treating PCB processing wastewater |
| CN113617244A (en) * | 2021-08-11 | 2021-11-09 | 林存 | Bleaching enterprise is clarification plant for waste water |
| CN114344995A (en) * | 2022-01-05 | 2022-04-15 | 史岩 | Sewage debris filter equipment |
| CN216441242U (en) * | 2021-11-12 | 2022-05-06 | 张志萍 | Disinfectant mixing and cleaning device for medical instruments |
| CN115259561A (en) * | 2022-07-29 | 2022-11-01 | 吉安创成环保科技有限责任公司 | High-concentration organic acid-base waste liquid treatment system and process thereof |
| CN218810750U (en) * | 2023-02-07 | 2023-04-07 | 黑龙江弘伟环境工程有限公司 | A flocculation basin mixer for sewage treatment |
| CN116216892A (en) * | 2023-04-04 | 2023-06-06 | 湖南锦络电子股份有限公司 | Electroplating wastewater filtering treatment device based on ecological environment detection |
| WO2023138106A1 (en) * | 2022-01-20 | 2023-07-27 | 浙江杰为凯过滤科技有限公司 | Efficient rotary filter press having filter cloths |
| CN219579947U (en) * | 2022-11-04 | 2023-08-25 | 铜川启凡达环保科技有限公司 | Flocculation tank for waste coal mine sewage treatment |
| CN116870570A (en) * | 2023-07-21 | 2023-10-13 | 大元投资集团商砼股份有限公司 | Concrete mixer truck cleaning wastewater recovery device |
-
2023
- 2023-10-19 CN CN202311358347.9A patent/CN117285131B/en active Active
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111265968A (en) * | 2020-02-29 | 2020-06-12 | 魏九宝 | Oil-water separation device for vacuum pump |
| CN213569841U (en) * | 2020-09-18 | 2021-06-29 | 成都精仕诚科技有限公司 | Waste water treatment device for large water mill |
| CN213375430U (en) * | 2020-09-24 | 2021-06-08 | 新疆同济生态科技工程股份有限公司 | Pressure type coagulation reaction filter special for water plant |
| CN214360463U (en) * | 2020-12-31 | 2021-10-08 | 苏州美源达环保科技股份有限公司 | Mixing equipment for treating PCB processing wastewater |
| CN113617244A (en) * | 2021-08-11 | 2021-11-09 | 林存 | Bleaching enterprise is clarification plant for waste water |
| CN216441242U (en) * | 2021-11-12 | 2022-05-06 | 张志萍 | Disinfectant mixing and cleaning device for medical instruments |
| CN114344995A (en) * | 2022-01-05 | 2022-04-15 | 史岩 | Sewage debris filter equipment |
| WO2023138106A1 (en) * | 2022-01-20 | 2023-07-27 | 浙江杰为凯过滤科技有限公司 | Efficient rotary filter press having filter cloths |
| CN115259561A (en) * | 2022-07-29 | 2022-11-01 | 吉安创成环保科技有限责任公司 | High-concentration organic acid-base waste liquid treatment system and process thereof |
| CN219579947U (en) * | 2022-11-04 | 2023-08-25 | 铜川启凡达环保科技有限公司 | Flocculation tank for waste coal mine sewage treatment |
| CN218810750U (en) * | 2023-02-07 | 2023-04-07 | 黑龙江弘伟环境工程有限公司 | A flocculation basin mixer for sewage treatment |
| CN116216892A (en) * | 2023-04-04 | 2023-06-06 | 湖南锦络电子股份有限公司 | Electroplating wastewater filtering treatment device based on ecological environment detection |
| CN116870570A (en) * | 2023-07-21 | 2023-10-13 | 大元投资集团商砼股份有限公司 | Concrete mixer truck cleaning wastewater recovery device |
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