CN117259129A - Coating method, coating device and gasket thereof - Google Patents
Coating method, coating device and gasket thereof Download PDFInfo
- Publication number
- CN117259129A CN117259129A CN202311569591.XA CN202311569591A CN117259129A CN 117259129 A CN117259129 A CN 117259129A CN 202311569591 A CN202311569591 A CN 202311569591A CN 117259129 A CN117259129 A CN 117259129A
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- gasket
- edge
- slurry
- coating
- slit outlet
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- 238000000576 coating method Methods 0.000 title claims abstract description 84
- 239000011248 coating agent Substances 0.000 title claims abstract description 68
- 239000002002 slurry Substances 0.000 claims abstract description 77
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 238000009792 diffusion process Methods 0.000 claims abstract description 32
- 230000000903 blocking effect Effects 0.000 claims description 3
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 230000001105 regulatory effect Effects 0.000 claims 1
- 239000007788 liquid Substances 0.000 description 20
- 230000007480 spreading Effects 0.000 description 5
- 230000003247 decreasing effect Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 125000006850 spacer group Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000006255 coating slurry Substances 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000006115 industrial coating Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
- H01M4/0402—Methods of deposition of the material
- H01M4/0404—Methods of deposition of the material by coating on electrode collectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
- H01M4/0402—Methods of deposition of the material
- H01M4/0407—Methods of deposition of the material by coating on an electrolyte layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Coating Apparatus (AREA)
Abstract
The invention discloses a coating method, a coating device and a gasket thereof, wherein the coating method comprises the following steps: providing a coating device and a substrate, wherein the coating device is provided with a slit outlet for flowing out slurry, and an edge adjusting part is arranged on the coating device; the coating device is controlled to coat and form a wet film on the substrate, and the edge adjusting part is used for preventing the wet film from diffusing in the width direction of the wet film. The coating method, the coating device and the gasket thereof are used for reducing the diffusion degree of the slurry at the discharge hole and improving the coating uniformity.
Description
Technical Field
The invention relates to the technical field of coating, in particular to a coating method, a coating device and a gasket thereof.
Background
Slot die is a common slot coating apparatus. When preparing the perovskite solar cell, slit coating equipment is required to be used for coating slurry on a substrate in the preparation process, and the uniformity of coating the slurry on the surface of the substrate can influence the quality of the finally prepared lithium battery, perovskite solar cell and other products. The conventional slit coating apparatus causes the slurry to flow out of a slit nozzle under a certain pressure, drop onto a substrate like a curtain, and then transport the formed film on the substrate.
As shown in fig. 1, a partial cross-sectional view of a conventional coating apparatus. In the conventional slot coating apparatus, the conventional gasket 3' is sandwiched between two dies, the slurry flows out through the slit-shaped nozzles formed by the two dies and the gasket 3', a certain distance is provided between the slurry and the substrate 100, and a liquid curtain 1' is formed between the slot coating apparatus and the substrate 100 when the slurry flows onto the substrate 100 from the discharge port of the slot coating apparatus. However, the slurry is diffused by the tension of the liquid when forming the curtain 1', and the diffusion portion 11' which diffuses outward is formed at the edge of the curtain 1'. In order to reduce the spreading of the curtain 1', the existing coating apparatus generally requires that the viscosity of the slurry to be coated be above a predetermined value.
In the existing industrial coating equipment of perovskite solar cells, the adopted slurry has various different viscosity ratios, wherein the viscosity of a plurality of slurries can not reach the preset value required by the existing coating equipment, the diffusion part 11 'of the liquid curtain 1' is larger, the diffusion part 11 'can cause uneven distribution at the edge of the liquid curtain 1', the slurry coated on the substrate 100 is further caused to be unevenly distributed at the edge, and defects such as holes, bubbles, broken meniscus and the like appear, so that the quality of the finally prepared perovskite solar cells is affected.
Disclosure of Invention
The invention aims to provide a coating method, a coating device and a gasket thereof, which are used for reducing the diffusion degree of slurry at a discharge hole and improving the coating uniformity.
The invention adopts the following technical scheme:
a coating method comprising:
providing a coating device and a substrate, wherein the coating device is provided with a slit outlet for flowing out slurry, and an edge adjusting part is arranged on the coating device;
the coating device is controlled to coat and form a wet film on the substrate, and the edge adjusting part is used for preventing the wet film from diffusing in the width direction of the wet film.
Preferably, the edge adjusting parts are disposed at two sides of the slit outlet in the length direction and spaced from the slit outlet, and the ratio of the distance between the slit outlet and the substrate to the distance between the edge adjusting parts and the slit outlet is in the range of 1: (1-50).
Preferably, when the interval between the slit outlet and the substrate is constant, the interval between the edge adjusting part and the slit outlet decreases as the viscosity of the slurry increases;
when the interval between the slit outlet and the substrate is changed, the interval between the edge adjusting part and the slit outlet is reduced as the interval between the slit outlet and the substrate is increased under any viscosity of the slurry.
Preferably, when the viscosity of the slurry is 1-100cps and the interval between the slit outlet and the substrate is 0.03-0.3mm, the interval between the edge adjusting part and the slit outlet is 0.1-1mm; when the viscosity of the slurry is 100-20000cps and the interval between the slit outlet and the substrate is 0.1-1mm, the interval between the edge adjusting part and the slit outlet is 0.5-5mm.
A gasket for coating device, the gasket has the water conservancy diversion hole that runs through two sides along thickness direction, the water conservancy diversion hole extends to the edge of gasket and forms the discharge gate, the gasket is adjacent the edge outer end of discharge gate is provided with edge adjustment portion, edge adjustment portion with the discharge gate interval sets up.
Preferably, the edge adjustment is a notch extending inwardly from the edge of the shim or a protrusion extending outwardly from the edge of the shim.
Preferably, the opening length of the notch is greater than the length of the notch bottom.
Preferably, the notch is a dovetail groove structure with gradually expanding openings.
Preferably, the ratio of the opening length of the notch to the depth of the notch ranges from 1: (0.2-2), wherein the angle of the dovetail angle of the notch is 10-90 degrees.
Preferably, the ratio of the distance between the notch and the discharge hole to the opening length of the notch is in the range of 1: (3-6).
Preferably, the distance between the notch and the discharge hole is 0.5-1.5mm, the opening length of the notch is 2-9mm, and the depth of the notch is 2-7mm.
Preferably, the gasket is in a U-shaped structure and comprises a bottom wall and two opposite side walls, the outer ends of the edges of the two side walls are respectively provided with an edge adjusting part, and the edge adjusting parts are used for preventing a wet film formed by slurry from diffusing in the width direction of the wet film.
A coating apparatus comprising:
a gasket for a coating device of any of the above;
the gasket is clamped between the first die head and the second die head, the first die and the second die head are connected and form a containing cavity and a slit outlet which are communicated, and the slit outlet corresponds to a discharge hole of the gasket.
Compared with the prior art, the invention has the beneficial effects that at least:
through setting up edge adjustment portion at the edge outer end of gasket, when the thick liquids flow out from the discharge gate, thick liquids can flow to discharge gate edge outer end along discharge gate length direction to towards edge adjustment portion diffusion, when thick liquids flow to edge adjustment portion, edge adjustment portion can block the further diffusion of thick liquids, with the degree that reduces thick liquids to the relative both sides diffusion of discharge gate length direction, can improve the degree of consistency of the liquid curtain edge that thick liquids formed. Through setting up edge adjustment portion, can control the diffusion degree of the liquid curtain that thick liquids formed, and then realize the barrier to the wet film diffusion in this wet film's width direction, improve wet film thickness's homogeneity.
Drawings
FIG. 1 is a partial cross-sectional view of a prior art slot coating apparatus;
fig. 2 is a schematic view of a coating apparatus according to an embodiment of the present invention in a partially cut-away state;
FIG. 3 is a partial cross-sectional view of a coating device according to an embodiment of the present invention;
fig. 4 is an enlarged view of a portion a in fig. 3;
FIG. 5 is a schematic view showing the structure of a spacer in a coating apparatus according to an embodiment of the present invention;
fig. 6 is a schematic view showing a partial structure of a gasket in a coating apparatus according to an embodiment of the present invention.
In the figure: 100. a substrate; 200. a slurry; 1. a first die; 2. a second die; 3. a gasket; 31. a deflector aperture; 311. a discharge port; 32. a bottom wall; 33. a sidewall; 34. a receiving chamber; 35. a notch; 351. an opening; 352. a bottom; d1, a first interval; d2, diffusion width; d3, a second interval; 1', a liquid curtain; 11', a diffusion section; 3', spacers.
Detailed Description
Example embodiments will now be described more fully with reference to the accompanying drawings. However, the exemplary embodiments can be embodied in many forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the example embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and thus a repetitive description thereof will be omitted.
The words expressing the positions and directions described in the present invention are described by taking the drawings as an example, but can be changed according to the needs, and all the changes are included in the protection scope of the present invention.
As shown in fig. 2, a coating apparatus for coating a slurry 200 onto a surface of a substrate 100 corresponds to an embodiment of the present invention. The coating device comprises a first die 1, a second die 2 and a gasket 3.
With further reference to fig. 5, the gasket 3 is interposed between the first die 1 and the second die 2, and the gasket 3 has flow guiding holes 31 penetrating both sides in the thickness direction, and at the same time, the flow guiding holes 31 extend to the edge of the gasket 3 and form a discharge port 311; the discharge port 311 may be a strip structure, and the width of the discharge port 311 may be smaller, i.e., the discharge port 311 may be a strip slit. Specifically, the flow guiding hole 31 penetrates the gasket 3 in a direction perpendicular to the thickness of the gasket 3, so that the gasket 3 forms the discharge hole 311 in a direction perpendicular to the thickness of the gasket 3. The diversion hole 31 may specifically penetrate through one end of the gasket 3 along the flow direction of the slurry 200 and form the discharge hole 311, and the width of the diversion hole 31 may be the same as the thickness of the gasket 3.
In this embodiment, the gasket 3 may have a substantially U-shaped structure, and the gasket 3 includes a bottom wall 32 and two opposite side walls 33. The opening of the U-shaped structure formed by the gasket 3 is the discharge hole 311 of the gasket 3.
With further reference to fig. 2 to 4, the first die 1 and the second die 2 may block the deflector hole 31 in the thickness direction of the gasket 3 to form a receiving cavity 34, the receiving cavity 34 is for receiving the slurry 200, and the receiving cavity 34 communicates with the discharge port 311; also, the first die 1 and the second die 2 may form a slit outlet corresponding to the discharge port 311 by separation of the gasket 3; for example, the slot outlet is identical to the outlet 311. One of the first die 1 and the second die 2 may be provided with a feeding region that is communicated to the deflector hole 31 so that the slurry 200 may flow from the feeding region into the deflector hole 31 and out of the discharge hole 311.
Since the slurry 200 in liquid form will generate tension when flowing out from the outlet 311, a portion of the slurry 200 will flow along the portion of the sidewall 33 of the gasket 3 that is flush with the bottom of the outlet 311 until the molecular tension limit of the slurry 200, which will cause the curtain of slurry 200 formed after flowing out of the outlet 311 to spread toward two opposite sides in the length direction of the outlet 311. However, the slurry 200 at the discharge port 311 is in a uniform state, and the slurry 200 is diffused at the edge of the curtain formed after flowing out of the discharge port 311, which may cause uneven thickness of the curtain at the edge and center of the wet film formed on the substrate 100.
With further reference to fig. 5 and 6, for this purpose, the gasket 3 may be provided with an edge adjusting portion adjacent to the outer edge of the discharge port 311, and the edge adjusting portion is spaced apart from the discharge port 311. When the slurry 200 flows out from the discharge hole 311, the slurry 200 flows to the outer end of the edge of the discharge hole 311 along the length direction of the discharge hole 311 and diffuses towards the edge adjusting part, and when the slurry 200 flows to the edge adjusting part, the edge adjusting part can block further diffusion of the slurry 200 so as to reduce the degree of diffusion of the slurry 200 to the two opposite sides of the length direction of the discharge hole 311, and thus, the uniformity of the liquid curtain edge formed by the slurry 200 can be improved. The slurry 200 may form a wet film after falling on the substrate 100, and the width of the wet film may be parallel to the length of the discharge port 311. By providing the edge adjusting portion, the degree of diffusion of the liquid curtain formed by the slurry 200 can be controlled, and thus the wet film can be blocked from diffusing in the width direction of the wet film, and the uniformity of the thickness of the wet film can be improved.
The two edge adjusting parts may be provided at opposite sides of the discharge hole 311 along the length direction thereof to block the slurry 200 flowing out of the discharge hole 311 from spreading to both sides. The edge adjusting portion may be disposed at the outer ends of the edges of the two side walls 33 of the gasket 3, that is, at the end of the two side walls 33 adjacent to the discharge port 311.
The edge adjustment may be a notch 35 extending inwardly from the edge of the gasket 3 or a protrusion extending outwardly from the edge of the gasket 3. The inner side of the edge of the gasket 3 may be the upstream direction of the edge of the gasket 3 along the slurry 200, and the outer side of the edge of the gasket 3 may be the downstream direction of the edge of the gasket 3 along the slurry 200.
When the edge adjusting portion is the notch 35, the slurry 200 needs to flow in the same direction as the extending direction of the notch 35, that is, to flow toward the inner side of the edge of the gasket 3 after flowing into the edge adjusting portion, which is opposite to the flowing direction of the slurry 200 when flowing out, and the tension at the edge of the slurry 200 cannot overcome the dead weight of the slurry 200 to make the slurry 200 take on the flow direction opposite to the flowing direction, so that the slurry 200 cannot be further diffused when diffusing into the notch 35.
When the edge adjusting portion is a protrusion, the slurry 200 is guided by the edge adjusting portion to flow in the extending direction of the edge adjusting portion after flowing to the edge adjusting portion, and the extending direction of the edge adjusting portion is towards the outer side of the gasket 3, which is similar to the original flowing direction of the slurry 200, that is, the slurry 200 is guided by the protrusion to gradually return to the original flowing direction when flowing to the protrusion. Wherein, the bulge is a bulge with steeper gradient, the bulge is close to the hypotenuse of the discharge hole 311 for guiding the slurry 200, and the slope of the bulge is set steeper, so that the hypotenuse of the bulge is closer to the original flow direction of the slurry 200.
In the present embodiment, the edge adjusting portion is specifically described as an example of the notch 35. Referring to fig. 6, the notch 35 extends from its opening 351 toward the inside of the gasket 3 to the bottom 352 of the notch 35, and the length of the opening 351 of the notch 35 is preferably greater than the length of the bottom 352 of the notch 35, and the ratio of the length of the opening 351 of the notch 35 to the depth of the notch 35 may range from 1: (0.2-2). Wherein the flow of slurry 200 to the openings 351 of the gap 35 is blocked, the size of the openings 351 of the gap 35 is required to meet the requirement of blocking the slurry 200, and the slurry 200 cannot pass over by the inertia of the flow, but the requirement of the bottom 352 of the gap 35 is less. Therefore, the length of the opening 351 of the notch 35 is greater than the length of the bottom 352 of the notch 35, so that the area of the notch 35 is smaller, and the gasket 3 can form the notch 35 only by presetting a smaller position. The notch 35 may specifically be a dovetail groove structure with a gradually expanding opening 351, and the angle of the dovetail angle of the notch 35 may be 10-90 degrees. By limiting the angle value of the dovetail angle of the notch 35, the situation that the slope of the oblique side of the notch 35 is small and the slurry 200 cannot be effectively blocked when the dovetail angle is too small can be avoided; at the same time, when the dovetail angle is too large, the length of the opening 351 of the notch 35 is too large, which results in an increase in the size of the notch 35, and the position where the notch 35 can be formed by the gasket 3 is limited.
To optimize the size of the opening 351 of the notch 35, the ratio of the gap 35 to the discharge opening 311 to the length of the opening 351 of the notch 35 may be in the range of 1: (3-6). By optimizing the dimensions at the opening 351 of the gap 35, it is possible to avoid that undersizing the opening 351 results in an inability to meet the requirements of blocking the slurry 200, and also may result in the slurry 200 crossing the opening 351 by inertia of the flow; at the same time, the oversized opening 351 can be avoided, which leads to an increased size of the gap 35, and thus to an inability to open the gap 35 when the reserved position of the gasket 3 is smaller. Specifically, the distance between the notch 35 and the discharge hole 311 is 0.5-1.5mm, the length of the opening 351 of the notch 35 is 2-9mm, and the depth of the notch 35 is 2-7mm.
By using the coating device using the gasket 3 provided with the notch 35 as the device a, the second distance D3 between the notch 35 and the discharge port 311 in the device a may be 1mm; under the same conditions and conditions, the thickness of the slurry 200 with a viscosity of 3-5cps and the thickness of the wet film formed on the substrate 100 by the slurry 200 with a viscosity of 2000cps were obtained by using the conventional coating apparatus for the gasket 3' without the notch 35 as the apparatus B and measuring the coating results of the apparatuses a and B, specifically, the average thickness of the wet film edge at the inward 3mm position, the average thickness of the wet film edge at the inward 5mm position, the average thickness of the wet film edge at the inward 10mm position, the average thickness of the wet film edge at the inward 15mm position, the average thickness of the wet film edge at the inward 20mm position, and the thickness of the wet film center position, and the test results shown in the following table 1 were obtained:
TABLE 1
Comparing the difference in thickness between the edge position of the wet film and the center position of the wet film gives the data of table 2 below:
TABLE 2
As can be seen from the above table data, the wet film formed by coating the gasket 3 with the notch 35 according to the present invention has smaller thickness difference between the edge and the center of the wet film formed by the coating apparatus according to the present invention and better uniformity of the wet film as compared with the wet film formed by the conventional coating apparatus without the gasket 3 with the notch 35.
The invention also provides a coating method, which comprises the following steps: steps S1 and S2.
Step S1: a coating device having a slit outlet for flowing out a slurry 200 and provided with an edge adjusting portion, and a substrate 100 are provided.
Step S2: the coating apparatus is controlled to coat and form a wet film on the substrate 100, and the edge adjusting part is used to block the wet film from diffusing in the width direction of the wet film.
The edge adjusting parts are arranged on two sides of the slit outlet in the length direction and are arranged at intervals with the slit outlet. The coating method of the present invention can be performed using the coating apparatus described above. The outlet of the slit may be the same as or similar to the outlet 311 of the coating device, and the edge adjusting portion is the same as or similar to the edge adjusting portion of the coating device, so that the description thereof will be omitted.
A curtain of liquid is formed after the slurry 200 flows out of the slit outlet, and the height of the curtain of liquid may be the same as the distance between the slit outlet of the coating apparatus and the substrate 100. When the first distance D1 between the slit outlet and the substrate 100 is changed, the distance of the liquid curtain spreading along the opposite sides of the length direction of the slit outlet is affected, and finally the spreading width D2 of the wet film is affected. Wherein the diffusion width D2 is the distance between the edge of the wet film and the slit outlet. Specifically, when the second pitch D3 between the edge adjusting portion and the slit outlet is fixed, the diffusion width D2 of the wet film may be caused to become large when the first pitch D1 becomes small; when the first pitch D1 becomes large, the diffusion width D2 of the wet film becomes small, but when the first pitch D1 is too large, the coating speed of the coating apparatus is affected, and the coating process window becomes small.
In addition, in the coating method of the present invention, the thickness at the edge of the wet film can also be adjusted by controlling the second distance D3 of the slit outlet and the edge adjusting portion. Specifically, when the thickness of the portion at the edge of the wet film, that is, the diffusion width D2 of the wet film, is thinner than the central region of the wet film, the thickness of the portion at the diffusion width D2 of the wet film can be increased by decreasing the length of the second distance D3 between the slit outlet and the edge adjusting portion so that the diffusion width D2 of the wet film is decreased, and the slurry 200 is concentrated within the smaller diffusion width D2. When the thickness of the portion at the diffusion width D2 of the wet film is thicker than the central region of the wet film, the length of the second interval D3 of the slit outlet and the edge adjusting portion may be increased and decreased so that the diffusion width D2 of the wet film is increased, and the slurry 200 is dispersed within the larger diffusion width D2 to decrease the thickness of the portion at the diffusion width D2 of the wet film.
The reason why the adjustment of the diffusion width D2 of the wet film can be achieved by adjusting the length of the second distance D3 between the slit outlet and the edge adjusting portion is that the slurry 200 flows to the edge adjusting portion along the portion of the second distance D3 between the slit outlet and the edge adjusting portion when flowing out of the slit outlet. Therefore, by adjusting the length of the second distance D3 between the slit outlet and the edge adjusting portion, the diffusion distance of the slurry 200 before contacting the edge adjusting portion can be controlled, thereby realizing adjustment of the diffusion width D2 of the wet film. In order to control the diffusion width D2 of the wet film to be kept within a desired range, it is necessary to control the first pitch D1 and the second pitch D3 capable of affecting the diffusion width D2 of the wet film. Specifically, the ratio of the first interval D1 between the slit outlet and the substrate 100 to the second interval D3 between the edge adjusting part and the slit outlet may range from 1: (1-50). When the coating method of the present invention is implemented using the above-described coating apparatus, the ratio of the distance between the discharge port 311 of the coating apparatus and the substrate 100 to the distance between the edge adjusting portion and the discharge port 311 may be in the range of 1: (1-50). Further, when the first distance D1 between the slit outlet and the substrate 100 is changed, the second distance D3 between the edge adjusting part and the slit outlet should be decreased as the first distance D1 between the slit outlet and the substrate 100 is increased at an arbitrary viscosity of the slurry.
The degree of spreading of the different viscosity slurries 200 is different for the different viscosity slurries 200, and the tension is also different, so that the second distance D3 between the edge adjusting portion and the slit outlet may take different values when coping with the different viscosity slurries 200. Specifically, when the viscosity of the slurry 200 is 1 to 100cps, the first distance D1 between the slit outlet and the substrate 100 is 0.03 to 0.3mm, and the second distance D3 between the edge adjusting part and the slit outlet is 0.1 to 1mm; when the viscosity of the slurry 200 is 100-20000cps and the first distance D1 between the slit outlet and the substrate 100 is 0.1-1mm, the second distance D3 between the edge adjusting part and the slit outlet is 0.5-5mm. Further, when the first distance D1 between the slit outlet and the substrate 100 is constant, the second distance D3 between the edge adjusting part and the slit outlet decreases as the viscosity of the slurry increases.
While embodiments of the present invention have been shown and described, it will be understood that the above embodiments are illustrative and not to be construed as limiting the invention, and that changes, modifications, substitutions and alterations may be made therein by those of ordinary skill in the art without departing from the spirit and scope of the invention, all such changes being within the scope of the appended claims.
Claims (12)
1. A coating method, characterized by comprising:
providing a coating device and a substrate, wherein the coating device is provided with a slit outlet for flowing out slurry, and an edge adjusting part is arranged on the coating device;
the coating device is controlled to coat and form a wet film on the substrate, and the edge adjusting part is used for preventing the wet film from diffusing in the width direction of the wet film.
2. The coating method according to claim 1, wherein the edge adjusting portions are provided on both sides in a longitudinal direction of the slit outlet and spaced apart from the slit outlet, and a ratio of a space between the slit outlet and the substrate to a space between the edge adjusting portions and the slit outlet ranges from 1: (1-50).
3. The coating method according to claim 1, wherein,
when the viscosity of the slurry is 1-100cps and the interval between the slit outlet and the substrate is 0.03-0.3mm, the interval between the edge adjusting part and the slit outlet is 0.1-1mm;
when the viscosity of the slurry is 100-20000cps and the interval between the slit outlet and the substrate is 0.1-1mm, the interval between the edge adjusting part and the slit outlet is 0.5-5mm.
4. The gasket for the coating device is characterized by comprising guide holes penetrating through two sides in the thickness direction, wherein the guide holes extend to the edge of the gasket and form a discharge hole, an edge adjusting part is arranged at the outer end of the edge of the gasket, which is adjacent to the discharge hole, and the edge adjusting part is arranged at intervals with the discharge hole.
5. The gasket for a coating device of claim 4 wherein the edge adjustment is a notch extending inwardly from an edge of the gasket or a protrusion extending outwardly from an edge of the gasket.
6. The gasket for a coating device of claim 5 wherein the gap has an opening length greater than a length of the gap bottom.
7. The gasket for a coating apparatus of claim 6 wherein said gap is a dovetail configuration with a diverging opening.
8. The gasket for a coating device of claim 7 wherein the ratio of the opening length of the gap to the depth of the gap ranges from 1: (0.2-2), wherein the angle of the dovetail angle of the notch is 10-90 degrees.
9. A gasket for a coating device according to claim 5, wherein, the ratio range of the gap to the distance between the discharge holes and the opening length of the gap is 1: (3-6).
10. Gasket for a coating unit according to claim 9, characterized in that the gap between the gap and the outlet opening is 0.5-1.5mm, the gap opening length is 2-9mm, the gap depth is 2-7mm.
11. The gasket for a coating apparatus according to claim 4, wherein the gasket has a U-shaped structure including a bottom wall and two opposite side walls, edge outer ends of both the side walls being provided with the edge regulating portions for blocking diffusion of a wet film formed by slurry in a width direction of the wet film.
12. A coating apparatus, characterized by comprising:
a gasket for a coating device according to any one of claims 4 to 11;
the gasket is clamped between the first die head and the second die head, the first die and the second die head are connected and form a containing cavity and a slit outlet which are communicated, and the slit outlet corresponds to a discharge hole of the gasket.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311569591.XA CN117259129B (en) | 2023-11-23 | 2023-11-23 | Coating method, coating device and gasket thereof |
Applications Claiming Priority (1)
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015136675A (en) * | 2014-01-24 | 2015-07-30 | Ｎｅｃエナジーデバイス株式会社 | Coating apparatus, assembly method of coating apparatus, and manufacturing method of electrode for secondary battery |
| CN205236310U (en) * | 2015-11-23 | 2016-05-18 | 宁德时代新能源科技股份有限公司 | Pole piece coating unit |
| CN111250354A (en) * | 2020-03-18 | 2020-06-09 | 天能帅福得能源股份有限公司 | Extrusion coating type die head gasket capable of eliminating coating edge effect |
| CN211726368U (en) * | 2019-11-29 | 2020-10-23 | 合肥国轩高科动力能源有限公司 | Coating die head gasket with edge thinning |
| CN113510044A (en) * | 2021-04-30 | 2021-10-19 | 西安瑟福能源科技有限公司 | Small-surface-density slit type coating gasket |
| CN217250299U (en) * | 2022-03-25 | 2022-08-23 | 蜂巢能源科技股份有限公司 | Coated gasket |
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015136675A (en) * | 2014-01-24 | 2015-07-30 | Ｎｅｃエナジーデバイス株式会社 | Coating apparatus, assembly method of coating apparatus, and manufacturing method of electrode for secondary battery |
| CN205236310U (en) * | 2015-11-23 | 2016-05-18 | 宁德时代新能源科技股份有限公司 | Pole piece coating unit |
| CN211726368U (en) * | 2019-11-29 | 2020-10-23 | 合肥国轩高科动力能源有限公司 | Coating die head gasket with edge thinning |
| CN111250354A (en) * | 2020-03-18 | 2020-06-09 | 天能帅福得能源股份有限公司 | Extrusion coating type die head gasket capable of eliminating coating edge effect |
| CN113510044A (en) * | 2021-04-30 | 2021-10-19 | 西安瑟福能源科技有限公司 | Small-surface-density slit type coating gasket |
| CN217250299U (en) * | 2022-03-25 | 2022-08-23 | 蜂巢能源科技股份有限公司 | Coated gasket |
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| CN117259129B (en) | 2024-02-06 |
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