CN117192911A - Alignment system of mask alignment lithography equipment - Google Patents
Alignment system of mask alignment lithography equipment Download PDFInfo
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- CN117192911A CN117192911A CN202311158800.1A CN202311158800A CN117192911A CN 117192911 A CN117192911 A CN 117192911A CN 202311158800 A CN202311158800 A CN 202311158800A CN 117192911 A CN117192911 A CN 117192911A
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- 238000001459 lithography Methods 0.000 title claims abstract description 17
- 238000005286 illumination Methods 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 abstract description 13
- 235000012431 wafers Nutrition 0.000 description 14
- 238000010586 diagram Methods 0.000 description 11
- 101000857682 Homo sapiens Runt-related transcription factor 2 Proteins 0.000 description 5
- 102100025368 Runt-related transcription factor 2 Human genes 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
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Abstract
The invention discloses an alignment system of mask alignment lithography equipment, comprising: the device comprises a wafer, an objective lens, a prism, a zoom barrel lens, a CCD and a light source assembly, wherein the wafer, the objective lens, the prism, the zoom barrel lens and the CCD are sequentially arranged to form an observation route; forming an illumination light path from the light source assembly, the prism, the objective lens to the wafer; the objective lens can switch the magnification of the objective lens, and the zoom barrel lens can zoom to change the magnification of the objective lens. The invention has simple structure, can realize high-low power switching by only one-way imaging light, reduces the loss of a beam splitting prism, a total reflection prism and a reflecting mirror on the light compared with a comparison document, and improves the light utilization efficiency. The invention reduces the use of the beam splitter prism and the total reflection prism, simplifies the light path structure, reduces the conditions of stray light and ghost images, has only one imaging light ray, and is relatively simple to debug.
Description
Technical Field
The present invention relates to the field of alignment systems for mask alignment lithography apparatuses, and in particular, to an alignment system for mask alignment lithography apparatuses.
Background
The alignment system is a core technology component in the field of lithography machines, and is a key technology for ensuring high-precision alignment of masks and silicon wafers and realizing high-precision alignment. The alignment system can be further classified into a diffraction grating type and a photometric type.
In photometric alignment, since the lithographic apparatus requires extremely high alignment accuracy, which determines that the field of view taken by the camera is small, a large field of view is required to find a selected mark (marking range) in advance for marking; the method comprises the steps of finding a pre-selected mark by low magnification, enabling the mark to enter a camera field of view, and then identifying and extracting features of the mark by high magnification so as to accurately align the mark; this requires that the alignment system have at least two magnifications, high and low, to be adjustable. However, it is difficult to obtain even higher accuracy by merely switching between the two magnifications.
In the prior art, the mask alignment lithography apparatus is divided into two parts of imaging and illumination, wherein the imaging part, the wafer reflects illumination light, the light enters the barrel lens through the objective lens, the beam splitting prism and the total reflection prism, the light passing through the barrel lens is divided into two paths by the beam splitting prism, and the motor drives the light shielding plate to switch the working states of the two paths of light, if the first light shielding plate shields, the second light shielding plate is opened, the system is at a low multiplying power, and otherwise, the system is at a long focal length and a high multiplying power.
Thereby generating two paths of light rays;
the first path of light: the light reflected by the plane reflector passes through the beam splitting prism and the total reflection prism for the second time and finally reaches CCD imaging; the magnification of the light is determined by the objective lens and the barrel lens, and corresponds to the low magnification of the system;
second path light: the light reflected by the curved surface reflector passes through the beam splitting prism for the second time and the total reflection prism, and finally reaches the CCD for imaging; the magnification of the light is determined by the object lens, the cylindrical lens and the curved surface reflecting mirror, and corresponds to the high magnification of the system.
However, this technique has at least the following problems:
1. the structure is complex, two paths of light rays are used, the light rays pass through different reflectors and have different optical paths, and the two paths of light rays are required to be processed separately;
2. the utilization rate of the light source is very low, the light rays pass through the beam splitting prism for many times, the energy of the light rays is reduced by at least one half each time, and most energy is wasted;
3. stray light is obvious, light passes through the beam splitting prism for many times, and the prism is close to the camera, so that stray light is easy to form; the system comprises two paths of imaging light rays, so that ghost images are easy to form;
4. alignment and debugging are difficult, and two paths of imaging light rays are required to be adjusted coaxially, concentrically and in rotation angle, so that adjustment is difficult.
Disclosure of Invention
Accordingly, it is an object of the present invention to provide an alignment system for aligning a mask to a lithographic apparatus.
In order to achieve the above purpose, the technical scheme adopted by the invention is as follows:
an alignment system for aligning a mask to a lithographic apparatus, comprising:
the device comprises a wafer, an objective lens, a prism, a zoom barrel lens, a CCD (charge coupled device) and a light source assembly, wherein the wafer, the objective lens, the prism and the zoom barrel lens are sequentially arranged to form an observation route; forming an illumination light path from the light source assembly, the prism, the objective lens to the wafer;
the objective lens can switch the magnification of the objective lens, and the zoom barrel lens can zoom to change the magnification of the objective lens.
The alignment system of the mask alignment lithography apparatus, wherein the objective lens comprises:
the lens barrel is cylindrical, an objective lens placement space is formed in the hollow of the lens barrel, and a plurality of placement grooves are formed in the side wall of the lens barrel;
and each objective lens can be arranged in the objective lens placing space from the placing groove.
The mask alignment lithography apparatus alignment system is characterized in that the objective lens barrel is provided with a rotation shaft, each rotation shaft is disposed on the placement groove, each objective lens is rotatably connected with the objective lens barrel through the rotation shaft, and the objective lens is operatively screwed into or out of the objective lens placement space with the rotation shaft as an axis.
The mask alignment system of the mask alignment lithography apparatus, wherein the objective lens barrel is provided with a plurality of buckle devices, two sides of each of the placement grooves are respectively provided with a buckle device, each of the buckle devices is provided with a protruding portion, the protruding portions are made of flexible materials, each of the buckle devices is respectively pointed to the placement groove adjacent to the protruding portion, each of the buckle devices is respectively arranged in the placement groove, and the protruding portions of the two buckle devices which are oppositely arranged at two sides of each of the placement grooves are oppositely arranged and clamp the objective lens.
The mask alignment lithography apparatus alignment system described above, wherein the snap-fit device and the rotation shaft are respectively located at two opposite ends of the placement groove.
The alignment system of the mask alignment lithography apparatus, wherein the objective lens comprises: the lens frame is annular, the lens body is circular, the lens frame surrounds the lens body, the thickness of the lens body is smaller than that of the lens frame, the inner ring of the lens frame is connected with the side face of the lens body to form a step face, and the protruding part is clamped on the step face.
The alignment system of the mask alignment lithography apparatus, wherein the zoom barrel includes: the device comprises a front fixed lens group, a variable-magnification lens group, a compensation lens group and a rear fixed lens group, wherein the front fixed lens group, the variable-magnification lens group, the compensation lens group and the rear fixed lens group are sequentially arranged on a first straight line, the front fixed lens group and the rear fixed lens group are fixedly arranged, and the variable-magnification lens group and the compensation lens group can slide along the first straight line between the front fixed lens group and the rear fixed lens group.
The alignment system of the mask alignment lithography apparatus, wherein the zoom barrel further comprises: the zoom lens barrel, the zoom lens barrel is followed first straight line sets up, preceding fixed mirror group with back fixed mirror group is fixed to be set up in the zoom lens barrel, zoom lens group with the compensation mirror group in follow in the zoom lens barrel first direction slides, the spout has been seted up on the zoom lens barrel, the spout runs through from the surface of zoom lens barrel is the inside of zoom lens barrel, the spout is followed the length direction of zoom lens barrel extends, zoom lens group with be connected with first pushing part and second pushing part on the compensation mirror group respectively, one end of first pushing part with one end of second pushing part respectively with zoom lens group with the compensation mirror group is connected, the other end of first pushing part with the other end of second pushing part all runs through the spout and bulge outside the spout.
The mask alignment lithography apparatus's alignment system, wherein, first pushing part with the second pushing part respectively with the piston rod of first pneumatic cylinder and the piston rod of second pneumatic cylinder are connected, the cylinder body of first pneumatic cylinder with the cylinder body of second pneumatic cylinder is all fixed the setting, first pneumatic cylinder drive first pushing part and then drive the zoom lens group is followed the first direction slides in the zoom lens barrel, the second pneumatic cylinder drive second pushing part and then drive the compensation lens group is followed the first direction slides in the zoom lens barrel.
The alignment system of the mask alignment lithography apparatus, wherein the light source assembly comprises: the LED light source, the uniform rod, the collimating mirror, the prism and the objective lens form an illumination light path from the LED light source, the uniform rod, the collimating mirror and the objective lens to the wafer.
The invention adopts the technology, so that compared with the prior art, the invention has the positive effects that:
(1) The invention has simple structure, can realize high-low power switching by only one-way imaging light, reduces the loss of a beam splitting prism, a total reflection prism and a reflecting mirror on the light compared with a comparison document, and improves the light utilization efficiency.
(2) The invention reduces the use of the beam splitter prism and the total reflection prism, simplifies the light path structure, reduces the conditions of stray light and ghost images, has only one imaging light ray, and is relatively simple to debug.
(3) The invention combines the zoom barrel lens and the objective lens with switchable multiplying power, thereby realizing finer and clearer amplification.
Drawings
Fig. 1 is a schematic diagram of the prior art.
FIG. 2 is a schematic diagram of the optical path of an alignment system of a mask alignment lithographic apparatus of the present invention.
FIG. 3 is a schematic view of an objective lens barrel of an alignment system of a mask alignment lithographic apparatus of the present invention.
FIG. 4 is a schematic diagram of a cross-section of an objective lens barrel of an alignment system of a mask alignment lithographic apparatus of the present invention.
FIG. 5 is a schematic diagram of an objective lens of an alignment system of a mask alignment lithographic apparatus of the present invention.
FIG. 6 is a schematic diagram of a zoom lens barrel of an alignment system of a mask alignment lithographic apparatus of the present invention.
FIG. 7 is a schematic diagram of a cross-section of a zoom lens barrel of an alignment system of a mask alignment lithographic apparatus of the present invention.
In the accompanying drawings: 1. a CCD; 2. a total reflection prism; 3. a beam-splitting prism; 4. an objective lens; 5. a wafer; 6. a cylindrical mirror; 7. a variable-magnification motor; 8. a first mirror; 9. a second mirror; 10. a first light shielding plate; 11. a second light shielding plate; 12. a collimator lens; 13. a uniformity bar; 14. an LED light source; 15. a zoom barrel lens; 41. an objective lens barrel; 42. a placement groove; 43. an objective lens; 44. a protruding portion; 45. a rotating shaft; 431. an objective lens frame; 432. an objective lens body; 433. a handle; 151. a zoom lens barrel; 152. a front fixed mirror group; 153. a rear fixed mirror group; 154. a zoom lens group; 155. a compensation lens group; 156. a first hydraulic cylinder; 157. a second hydraulic cylinder; 158. a first pushing part; 159. and a second pushing part.
Detailed Description
The present invention will be further described with reference to the accompanying drawings and specific embodiments, but not as a limitation of the present invention, fig. 1 is a schematic diagram of the prior art, where it can be known from the figure that the prior art is divided into two parts, namely, imaging part, wafer 5 reflects illumination light, the light enters barrel lens 6 through objective lens 4, splitting prism 3 and total reflection prism 2, the light passing through barrel lens 6 is split into two paths by splitting prism 3, and the variable magnification motor 7 drives the light shielding plate to switch the working states of the two paths of light, such as when the first light shielding plate 10 shields, the second light shielding plate 11 is opened, the second reflecting mirror 9 reflects the light, and the system is low magnification; on the contrary, the first reflecting mirror 8 reflects light, and the system is long-focal-length and high-magnification.
Thereby generating two paths of light rays;
the first path of light: the light reflected by the plane reflector passes through the beam splitting prism 3 and the total reflection prism 2 for the second time and finally reaches the CCD1 for imaging; the magnification of the light is determined by the objective lens 4 and the cylindrical lens 6, and corresponds to the low magnification of the system;
second path light: the light reflected by the curved surface reflector passes through the beam splitting prism 3 and the total reflection prism 2 for the second time and finally reaches the CCD1 for imaging; the magnification of the light is determined by the objective lens 4, the cylindrical lens 6 and the curved surface reflecting mirror, and corresponds to the high magnification of the system.
FIG. 2 is a schematic diagram of the optical path of an alignment system of a mask alignment lithographic apparatus of the present invention; FIG. 3 is a schematic view of an objective lens barrel 41 of an alignment system of a mask alignment lithographic apparatus of the present invention; FIG. 4 is a schematic diagram of a cross-section of an objective lens barrel 41 of an alignment system of a mask alignment lithographic apparatus of the present invention; FIG. 5 is a schematic view of an objective lens 4 of an alignment system of a mask alignment lithographic apparatus of the present invention; FIG. 6 is a schematic diagram of a zoom lens barrel 151 of an alignment system of a mask alignment lithographic apparatus of the present invention; fig. 7 is a schematic diagram of a cross section of a zoom lens barrel 151 of an alignment system of a mask alignment lithographic apparatus of the present invention, referring to fig. 2 to 7, showing an alignment system of a mask alignment lithographic apparatus of a preferred embodiment, comprising: the wafer 5, the objective lens 4, the prism, the zoom barrel lens 15, the CCD1 and the light source component are sequentially arranged from the wafer 5, the objective lens 4, the prism and the zoom barrel lens 15 to the CCD1 to form an observation route; forming an illumination light path from the light source component, the prism and the objective lens 4 to the wafer 5; the objective lens 4 can switch its magnification, and the zoom barrel lens 15 can change its magnification by zooming.
In a preferred embodiment, the objective lens 4 comprises:
the objective lens cone 41, the objective lens cone 41 is in a tube shape, the interior of the objective lens cone 41 is hollow to form an objective lens 43 placing space, and a plurality of placing grooves 42 are formed on the side wall of the objective lens cone 41;
a plurality of objective lenses 43, each objective lens 43 is operable to be placed in the objective lens 43 placement space from the placement groove 42.
In a preferred embodiment, the objective lens barrel 41 is provided with a rotation shaft 45, each rotation shaft 45 is disposed on the placement groove 42, each objective lens 43 is rotatably connected with the objective lens barrel 41 through the rotation shaft 45, and the objective lens 43 is operatively screwed into or out of the objective lens 43 placement space with the rotation shaft 45 as an axis.
In a preferred embodiment, the objective lens barrel 41 is provided with a plurality of fastening devices, two sides of each placement groove 42 are respectively provided with a fastening device, each fastening device is provided with a protruding portion 44, the protruding portions 44 of each fastening device are made of flexible materials, the protruding portions 44 of each fastening device are respectively directed to the placement groove 42 adjacent to the protruding portions, the protruding portions 44 of each fastening device are respectively arranged in the placement groove 42, and the protruding portions 44 of the two fastening devices which are oppositely arranged at two sides of each placement groove 42 are oppositely arranged and clamp the objective lens 43.
In a preferred embodiment, the catch means and the shaft 45 are located on opposite ends of the placement groove 42, respectively.
In a preferred embodiment, the objective lens 4 lens comprises: the objective lens frame 431 and the objective lens body 432, the objective lens frame 431 is annular, the objective lens body 432 is circular, the objective lens frame 431 surrounds the outside of the objective lens body 432, the thickness of the objective lens body 432 is smaller than that of the objective lens frame 431, the inner ring of the objective lens frame 431 is connected with the side face of the objective lens body 432 to form a step face, and the protruding part 44 is clamped on the step face.
Further, a grip 433 is provided on the objective lens frame 431 to facilitate the user to rotate the objective lens 4.
The foregoing is merely a preferred embodiment of the present invention, and is not intended to limit the embodiments and the protection scope of the present invention.
The present invention has the following embodiments based on the above description:
in a further embodiment of the present invention, the zoom barrel 15 includes: the front fixed mirror group 152, the variable magnification mirror group 154, the compensation mirror group 155 and the rear fixed mirror group 153 are sequentially arranged in a first straight line, the front fixed mirror group 152 and the rear fixed mirror group 153 are fixedly arranged, and the variable magnification mirror group 154 and the compensation mirror group 155 can slide along the first straight line between the front fixed mirror group 152 and the rear fixed mirror.
In a further embodiment of the present invention, the zoom barrel 15 further comprises: the zoom lens barrel 151, the zoom lens barrel 151 sets up along first straight line, preceding fixed mirror group 152 and back fixed mirror group 153 are fixed to be set up in the zoom lens barrel 151, variable magnification mirror group 154 and compensation mirror group 155 slide along first direction in the zoom lens barrel 151, the spout has been seted up on the zoom lens barrel 151, the spout runs through from the surface of zoom lens barrel 151 and is the inside of zoom lens barrel 151, the spout extends along the length direction of change Jiao Jingtong 151, be connected with first pushing part 158 and second pushing part 159 on variable magnification mirror group 154 and the compensation mirror group 155 respectively, the one end of first pushing part 158 and the one end of second pushing part 159 are connected with variable magnification mirror group 154 and compensation mirror group 155 respectively, the other end of first pushing part 158 and the other end of second pushing part 159 all run through the spout and bulge outside the spout.
In a further embodiment of the present invention, the first pushing portion 158 and the second pushing portion 159 are respectively connected with a piston rod of the first hydraulic cylinder 156 and a piston rod of the second hydraulic cylinder 157, the cylinder of the first hydraulic cylinder 156 and the cylinder of the second hydraulic cylinder 157 are both fixedly arranged, the first hydraulic cylinder 156 drives the first pushing portion 158 to drive the zoom lens group 154 to slide in the zoom lens barrel 151 along the first direction, and the second hydraulic cylinder 157 drives the second pushing portion 159 to drive the compensation lens group 155 to slide in the zoom lens barrel 151 along the first direction.
In a further embodiment of the present invention, a light source assembly includes: the LED light source 14, the uniform rod 13 and the collimating mirror 12, and the LED light source 14, the uniform rod 13, the collimating mirror 12, the prism and the objective lens 4 form an illumination light path to the wafer 5.
Further, as shown in fig. 2, the prism includes: the common prism and the beam splitter prism 3, and the LED light source 14 emits light to the wafer 5 through the uniform rod 13, the collimating lens 12, the beam splitter prism 3 and the objective lens 4 to form an illumination light path.
Further, the wafer 5 reflects the illumination light, and the light enters the CCD1 after passing through the objective lens 4, the beam splitter prism 3, the total reflection prism 2 and the zoom barrel lens 15.
The foregoing is merely illustrative of the preferred embodiments of the present invention and is not intended to limit the embodiments and scope of the present invention, and it should be appreciated by those skilled in the art that equivalent substitutions and obvious variations may be made using the description and illustrations of the present invention, and are intended to be included in the scope of the present invention.
Claims (10)
1. An alignment system for aligning a mask to a lithographic apparatus, comprising:
the device comprises a wafer, an objective lens, a prism, a zoom barrel lens, a CCD and a light source assembly, wherein the wafer, the objective lens, the prism, the zoom barrel lens and the CCD are sequentially arranged to form an observation route; forming an illumination light path from the light source assembly, the prism, the objective lens to the wafer;
the objective lens can switch the magnification of the objective lens, and the zoom barrel lens can zoom to change the magnification of the objective lens.
2. An alignment system of a mask alignment lithographic apparatus according to claim 1, wherein said objective lens comprises:
the lens barrel is cylindrical, an objective lens placement space is formed in the hollow of the lens barrel, and a plurality of placement grooves are formed in the side wall of the lens barrel;
and each objective lens can be arranged in the objective lens placing space from the placing groove.
3. The alignment system of claim 2, wherein the objective lens barrel is provided with rotation shafts, each of the rotation shafts is provided on the placement groove, each of the objective lenses is rotatably connected to the objective lens barrel through the rotation shaft, and the objective lens is operatively screwed into or out of the objective lens placement space with the rotation shaft as an axis.
4. A mask alignment lithography apparatus alignment system as claimed in claim 3, wherein the objective lens barrel is provided with a plurality of snap-in devices, the snap-in devices are disposed on two sides of each of the placement grooves, each of the snap-in devices has a protrusion, the protrusions are made of flexible materials, the protrusions of each of the snap-in devices are directed to the placement groove adjacent thereto, the protrusions of each of the snap-in devices are disposed in the placement groove, and the protrusions of two of the snap-in devices disposed opposite to each other on two sides of each of the placement grooves are disposed opposite to each other and clamp the objective lens.
5. The alignment system of claim 4, wherein the snap-fit device and the spindle are located on opposite ends of the placement groove, respectively.
6. The alignment system of the mask alignment lithographic apparatus according to claim 4, wherein the objective lens comprises: the lens frame is annular, the lens body is circular, the lens frame surrounds the lens body, the thickness of the lens body is smaller than that of the lens frame, the inner ring of the lens frame is connected with the side face of the lens body to form a step face, and the protruding part is clamped on the step face.
7. The alignment system of a mask alignment lithographic apparatus according to claim 1, wherein said zoom barrel comprises: the device comprises a front fixed lens group, a variable-magnification lens group, a compensation lens group and a rear fixed lens group, wherein the front fixed lens group, the variable-magnification lens group, the compensation lens group and the rear fixed lens group are sequentially arranged on a first straight line, the front fixed lens group and the rear fixed lens group are fixedly arranged, and the variable-magnification lens group and the compensation lens group can slide along the first straight line between the front fixed lens group and the rear fixed lens group.
8. The alignment system of the mask alignment lithographic apparatus according to claim 7, wherein the zoom barrel further comprises: the zoom lens barrel, the zoom lens barrel is followed first straight line sets up, preceding fixed mirror group with back fixed mirror group is fixed to be set up in the zoom lens barrel, zoom lens group with the compensation mirror group in follow in the zoom lens barrel first direction slides, the spout has been seted up on the zoom lens barrel, the spout runs through from the surface of zoom lens barrel is the inside of zoom lens barrel, the spout is followed the length direction of zoom lens barrel extends, zoom lens group with be connected with first pushing part and second pushing part on the compensation mirror group respectively, one end of first pushing part with one end of second pushing part respectively with zoom lens group with the compensation mirror group is connected, the other end of first pushing part with the other end of second pushing part all runs through the spout and bulge outside the spout.
9. The alignment system of claim 8, wherein the first pushing part and the second pushing part are respectively connected with a piston rod of a first hydraulic cylinder and a piston rod of a second hydraulic cylinder, the cylinder body of the first hydraulic cylinder and the cylinder body of the second hydraulic cylinder are fixedly arranged, the first hydraulic cylinder drives the first pushing part to drive the zoom lens group to slide in the zoom lens barrel along the first direction, and the second hydraulic cylinder drives the second pushing part to drive the compensation lens group to slide in the zoom lens barrel along the first direction.
10. An alignment system for a mask alignment lithographic apparatus according to any one of claims 1 to 9, wherein the light source assembly comprises: the LED light source, the uniform rod, the collimating mirror, the prism and the objective lens form an illumination light path from the LED light source, the uniform rod, the collimating mirror and the objective lens to the wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311158800.1A CN117192911A (en) | 2023-09-08 | 2023-09-08 | Alignment system of mask alignment lithography equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311158800.1A CN117192911A (en) | 2023-09-08 | 2023-09-08 | Alignment system of mask alignment lithography equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117192911A true CN117192911A (en) | 2023-12-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311158800.1A Pending CN117192911A (en) | 2023-09-08 | 2023-09-08 | Alignment system of mask alignment lithography equipment |
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| Country | Link |
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| CN (1) | CN117192911A (en) |
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2023
- 2023-09-08 CN CN202311158800.1A patent/CN117192911A/en active Pending
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