CN117170193A - 决定方法、曝光方法、信息处理装置、存储介质、曝光装置以及物品制造方法 - Google Patents
决定方法、曝光方法、信息处理装置、存储介质、曝光装置以及物品制造方法 Download PDFInfo
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- CN117170193A CN117170193A CN202310626355.0A CN202310626355A CN117170193A CN 117170193 A CN117170193 A CN 117170193A CN 202310626355 A CN202310626355 A CN 202310626355A CN 117170193 A CN117170193 A CN 117170193A
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- exposure
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- model formula
- optical system
- projection optical
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Links
- 238000000034 method Methods 0.000 title claims abstract description 62
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 230000010365 information processing Effects 0.000 title claims abstract description 9
- 238000003860 storage Methods 0.000 title claims abstract description 8
- 238000003384 imaging method Methods 0.000 claims abstract description 127
- 238000005259 measurement Methods 0.000 claims abstract description 122
- 230000003287 optical effect Effects 0.000 claims abstract description 114
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 230000004075 alteration Effects 0.000 claims description 6
- 206010010071 Coma Diseases 0.000 claims description 3
- 201000009310 astigmatism Diseases 0.000 claims description 3
- 230000009471 action Effects 0.000 claims description 2
- 238000011161 development Methods 0.000 claims description 2
- 230000031700 light absorption Effects 0.000 claims description 2
- 238000012937 correction Methods 0.000 description 52
- 230000008569 process Effects 0.000 description 17
- 238000004364 calculation method Methods 0.000 description 9
- 230000008859 change Effects 0.000 description 9
- 230000014509 gene expression Effects 0.000 description 8
- 238000012545 processing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000006870 function Effects 0.000 description 4
- 238000013500 data storage Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022-091070 | 2022-06-03 | ||
JP2022091070A JP2023178029A (ja) | 2022-06-03 | 2022-06-03 | 決定方法、露光方法、情報処理装置、プログラム、露光装置、および物品製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN117170193A true CN117170193A (zh) | 2023-12-05 |
Family
ID=88934313
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202310626355.0A Pending CN117170193A (zh) | 2022-06-03 | 2023-05-30 | 决定方法、曝光方法、信息处理装置、存储介质、曝光装置以及物品制造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2023178029A (ja) |
KR (1) | KR20230168129A (ja) |
CN (1) | CN117170193A (ja) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0447807A (ja) | 1990-06-15 | 1992-02-18 | Nec Corp | アダプティブイコライザ |
JPH11150053A (ja) | 1997-11-18 | 1999-06-02 | Nikon Corp | 露光方法及び装置 |
-
2022
- 2022-06-03 JP JP2022091070A patent/JP2023178029A/ja active Pending
-
2023
- 2023-05-12 KR KR1020230061479A patent/KR20230168129A/ko active Search and Examination
- 2023-05-30 CN CN202310626355.0A patent/CN117170193A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20230168129A (ko) | 2023-12-12 |
JP2023178029A (ja) | 2023-12-14 |
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