CN117170193A - 决定方法、曝光方法、信息处理装置、存储介质、曝光装置以及物品制造方法 - Google Patents
决定方法、曝光方法、信息处理装置、存储介质、曝光装置以及物品制造方法 Download PDFInfo
- Publication number
- CN117170193A CN117170193A CN202310626355.0A CN202310626355A CN117170193A CN 117170193 A CN117170193 A CN 117170193A CN 202310626355 A CN202310626355 A CN 202310626355A CN 117170193 A CN117170193 A CN 117170193A
- Authority
- CN
- China
- Prior art keywords
- exposure
- measurement
- model formula
- optical system
- projection optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 62
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 230000010365 information processing Effects 0.000 title claims abstract description 9
- 238000003860 storage Methods 0.000 title claims abstract description 8
- 238000003384 imaging method Methods 0.000 claims abstract description 127
- 238000005259 measurement Methods 0.000 claims abstract description 122
- 230000003287 optical effect Effects 0.000 claims abstract description 114
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 230000004075 alteration Effects 0.000 claims description 6
- 206010010071 Coma Diseases 0.000 claims description 3
- 201000009310 astigmatism Diseases 0.000 claims description 3
- 230000009471 action Effects 0.000 claims description 2
- 238000011161 development Methods 0.000 claims description 2
- 230000031700 light absorption Effects 0.000 claims description 2
- 238000012937 correction Methods 0.000 description 52
- 230000008569 process Effects 0.000 description 17
- 238000004364 calculation method Methods 0.000 description 9
- 230000008859 change Effects 0.000 description 9
- 230000014509 gene expression Effects 0.000 description 8
- 238000012545 processing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000006870 function Effects 0.000 description 4
- 238000013500 data storage Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022-091070 | 2022-06-03 | ||
| JP2022091070A JP2023178029A (ja) | 2022-06-03 | 2022-06-03 | 決定方法、露光方法、情報処理装置、プログラム、露光装置、および物品製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117170193A true CN117170193A (zh) | 2023-12-05 |
Family
ID=88934313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310626355.0A Pending CN117170193A (zh) | 2022-06-03 | 2023-05-30 | 决定方法、曝光方法、信息处理装置、存储介质、曝光装置以及物品制造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2023178029A (ja) |
| KR (1) | KR20230168129A (ja) |
| CN (1) | CN117170193A (ja) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0447807A (ja) | 1990-06-15 | 1992-02-18 | Nec Corp | アダプティブイコライザ |
| JPH11150053A (ja) | 1997-11-18 | 1999-06-02 | Nikon Corp | 露光方法及び装置 |
-
2022
- 2022-06-03 JP JP2022091070A patent/JP2023178029A/ja active Pending
-
2023
- 2023-05-12 KR KR1020230061479A patent/KR20230168129A/ko active Search and Examination
- 2023-05-30 CN CN202310626355.0A patent/CN117170193A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20230168129A (ko) | 2023-12-12 |
| JP2023178029A (ja) | 2023-12-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101823725B1 (ko) | 노광 장치 및 디바이스의 제조 방법 | |
| JP5406437B2 (ja) | 露光装置及びデバイス製造方法 | |
| JP2009032875A (ja) | 結像特性変動予測方法、露光装置、並びにデバイス製造方法 | |
| JP5815987B2 (ja) | 露光装置およびデバイス製造方法 | |
| US9639008B2 (en) | Lithography apparatus, and article manufacturing method | |
| JP6039932B2 (ja) | 露光装置、露光方法及び物品の製造方法 | |
| KR20170133275A (ko) | 노광 장치 및 물품의 제조 방법 | |
| JP2014143306A (ja) | 露光方法、露光装置、それを用いたデバイスの製造方法 | |
| CN105573064A (zh) | 曝光方法、曝光装置和物品制造方法 | |
| CN109634064B (zh) | 曝光装置以及物品制造方法 | |
| JP5094517B2 (ja) | 露光装置、測定方法、安定化方法及びデバイスの製造方法 | |
| JP6554141B2 (ja) | 決定方法、露光方法、情報処理装置、プログラム及び物品の製造方法 | |
| JP2897345B2 (ja) | 投影露光装置 | |
| CN117170193A (zh) | 决定方法、曝光方法、信息处理装置、存储介质、曝光装置以及物品制造方法 | |
| KR20090086347A (ko) | 리소그래피 장치 및 조정 방법 | |
| JP2018066865A (ja) | リソグラフィ装置、および物品製造方法 | |
| JP2000228344A (ja) | 走査露光装置およびデバイス製造方法 | |
| JP2005129797A (ja) | 露光装置及びデバイス製造方法 | |
| JP7213757B2 (ja) | 露光装置、および物品製造方法 | |
| JP2007184378A (ja) | 露光装置における露光量および／または焦点合わせのための基板の位置を求める方法および装置 | |
| JP7022531B2 (ja) | 露光方法、露光装置、および物品の製造方法 | |
| JP2001244182A (ja) | 露光熱による投影光学系の結像特性変動の測定方法及び露光装置 | |
| JP7341754B2 (ja) | 測定装置、ステージ位置決め装置、露光装置、物品の製造方法及びコンピュータプログラム | |
| CN111413850B (zh) | 曝光装置、用于控制曝光装置的方法、以及物品制造方法 | |
| JP2006019561A (ja) | 露光方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |