CN117148667A - Double-sided nano imprinting device and processing method - Google Patents
Double-sided nano imprinting device and processing method Download PDFInfo
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- CN117148667A CN117148667A CN202311243093.6A CN202311243093A CN117148667A CN 117148667 A CN117148667 A CN 117148667A CN 202311243093 A CN202311243093 A CN 202311243093A CN 117148667 A CN117148667 A CN 117148667A
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- 238000003672 processing method Methods 0.000 title claims abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 125
- 239000000758 substrate Substances 0.000 claims abstract description 92
- 238000005507 spraying Methods 0.000 claims abstract description 54
- 239000012790 adhesive layer Substances 0.000 claims abstract description 42
- 238000007667 floating Methods 0.000 claims abstract description 36
- 238000007599 discharging Methods 0.000 claims abstract description 34
- 239000003292 glue Substances 0.000 claims abstract description 16
- 238000012545 processing Methods 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 10
- 239000007888 film coating Substances 0.000 claims description 21
- 238000009501 film coating Methods 0.000 claims description 21
- 239000000853 adhesive Substances 0.000 claims description 16
- 230000001070 adhesive effect Effects 0.000 claims description 16
- 239000003795 chemical substances by application Substances 0.000 claims description 13
- 239000011248 coating agent Substances 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 13
- 230000001681 protective effect Effects 0.000 claims description 13
- 238000005096 rolling process Methods 0.000 claims description 7
- 238000010030 laminating Methods 0.000 claims description 2
- 238000007639 printing Methods 0.000 claims description 2
- 230000009977 dual effect Effects 0.000 claims 7
- 238000004049 embossing Methods 0.000 abstract description 8
- 238000013461 design Methods 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000006082 mold release agent Substances 0.000 description 5
- 238000003825 pressing Methods 0.000 description 5
- 239000010410 layer Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000003848 UV Light-Curing Methods 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 238000001723 curing Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001127 nanoimprint lithography Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000008093 supporting effect Effects 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
The invention relates to the technical field of double-sided nanoimprint, and discloses a double-sided nanoimprint device, which comprises a mold material discharging unit, a first glue spraying unit, a substrate laying unit, a second glue spraying unit, a nanoimprint unit, a substrate receiving unit and a mold material receiving unit which are sequentially arranged; the substrate laying unit comprises a substrate laying roller set and a first air floating platform; the first nano-imprinting adhesive layer and the second nano-imprinting adhesive layer are respectively acted by the base material laying unit and the nano-imprinting unit, and microstructure patterns are formed on the front surface and the back surface of the base material. The double-sided embossing device with the structural design can efficiently and continuously automatically realize double-sided nanoembossing of the base material through the arrangement of the units, thereby effectively improving the double-sided embossing efficiency of the base material and reducing the double-sided embossing cost of the base material; the invention also provides a processing method which has simple process, easy operation and high processing efficiency and can effectively save the production cost.
Description
Technical Field
The invention relates to the technical field of double-sided nanoimprint, in particular to a double-sided nanoimprint device and a processing method.
Background
The nanoimprint lithography (Nanoimprint Lithography, NIL) is an initial study conducted by Stephen y. Methou teaching, university of minnesota, nanostructure laboratory, in 1995, and is a novel technique for patterning micro-nano patterning by stress deformation of resist using an imprint mold.
With the development of nanoimprint technology in recent years, more and more fields use nanoimprint apparatuses instead of electron beam lithography apparatuses. The main application field is as follows: the micro-nano pattern structure can be rapidly prepared by applying the nanoimprint technology in the fields of high-brightness photonic crystal LEDs, high-density magnetic disk media (HDD), optical components (optical waveguide, micro-optical lens, grating, mobile phone lens), biological micro-fluidic devices and the like, so that an expensive optical system is avoided, the cost of the device can be reduced, and the cost performance is high; and the nano imprinting device is simple to operate, reliable in performance and high in repeatability.
When the double-sided imprinting operation is carried out on the base material in the prior art, the design of the processing device and the processing method is unreasonable, so that the double-sided imprinting efficiency of the base material is lower, and the production cost is higher.
Disclosure of Invention
The first object of the present invention is to provide a double-sided nanoimprint apparatus, which has a compact structure, is convenient and efficient, and can effectively improve double-sided imprinting efficiency of a substrate.
The second object of the present invention is to provide a processing method, which can efficiently and continuously complete double-sided embossing of a substrate, thereby effectively improving the processing efficiency of the double-sided embossed substrate and reducing the processing cost of the double-sided embossed substrate.
In order to achieve the above purpose, the present invention adopts the following technical scheme:
the double-sided nano imprinting device comprises a mold material discharging unit, a first glue spraying unit, a substrate laying unit, a second glue spraying unit, a nano imprinting unit, a substrate receiving unit and a mold material receiving unit which are sequentially arranged;
the mold material discharging unit comprises a discharging roller group for tensioning and flattening a mold material and a release agent spraying device for spraying a release agent to the microstructure side of the mold material;
the substrate laying unit comprises a substrate laying roller set for laying a substrate to the microstructure side of the die material and a first air floating platform which is arranged below the die material and matched with the substrate laying roller set;
a first nano-imprinting adhesive layer is sprayed between the die material and the base material through the first adhesive spraying unit; a second nano-imprinting adhesive layer is sprayed on one side of the substrate, which is far away from the first nano-imprinting adhesive layer, through the second adhesive spraying unit;
the first nano imprinting adhesive layer and the second nano imprinting adhesive layer are respectively acted by the base material laying unit and the nano imprinting unit, and micro-structure patterns are formed on the front surface and the back surface of the base material.
The base material receiving unit and the die material receiving unit are used for separating the base material with the microstructure patterns printed on the two sides from the die material and respectively rolling the die material and the base material after printing.
The nano imprinting unit comprises an imprinting roller with a microstructure circumferentially arranged and a second air floating platform arranged below the die material and matched with the imprinting roller.
The first air floating platform and the second air floating platform are identical in structure, and each of the first air floating platform and the second air floating platform comprises an air pressure cavity, a pressure-regulating air supply device communicated with the air pressure cavity and a UV light fixing component arranged in the air pressure cavity, and UV light of the UV light fixing component is emitted outwards through an air floating end of the air pressure cavity.
The UV light fixing component comprises a UV light emitting component and a light adjusting component matched with the UV light emitting component.
The device further comprises a first film coating unit, a second film coating unit and a third film coating unit, wherein the first film coating unit and the second film coating unit are arranged on two sides of the base material receiving unit and used for coating the microstructure patterns on the front side and the back side of the base material, and the third film coating unit is arranged on one side of the die material receiving unit.
The mold material discharging unit further comprises a film tearing unit for tearing off the protective film covered on the microstructure side of the mold material.
The release agent spraying device is arranged adjacent to the first glue spraying unit and is positioned in front of the first glue spraying unit.
The first film covering unit, the second film covering unit and the third film covering unit are respectively provided with a discharging roller for discharging the protective film and a steering roller for paving the protective film.
The processing method comprises the double-sided nano-imprint processing equipment and further comprises the following processing steps:
1) Flattening the mould materials in the mould material discharging unit through a discharging roller set, enabling the microstructure to be arranged laterally upwards, and then spraying a release agent on the microstructure surface of the mould materials through the release agent spraying device;
2) Spraying a first nano imprinting adhesive to the microstructure side of the mold material through the first adhesive spraying unit, paving the substrate on the first nano imprinting adhesive layer through the substrate paving unit, laminating the substrate and the mold material through the substrate paving roller set and the first air floating platform in the paving process, and solidifying the microstructure transferred to the first nano imprinting adhesive layer;
3) Spraying a second nano-imprinting adhesive layer on one side of the substrate, which is far away from the first nano-imprinting adhesive layer, through the second adhesive spraying unit, and enabling the second nano-imprinting adhesive layer to form a microstructure pattern and be solidified through the nano-imprinting unit;
4) And separating the substrate with the microstructure patterns printed on the two sides from the die material through the substrate material receiving unit and the die material receiving unit, coating the corresponding microstructure patterns through the first coating unit, the second coating unit and the third coating unit, and simultaneously rolling the coated substrate and the die material through the substrate material receiving unit and the die material receiving unit.
The invention has the beneficial effects that: the invention provides a double-sided nano imprinting device which comprises a mold material discharging unit, a first glue spraying unit, a substrate laying unit, a second glue spraying unit, a nano imprinting unit, a substrate receiving unit and a mold material receiving unit which are sequentially arranged; the mould material discharging unit comprises a discharging roller set and a release agent spraying device; the substrate laying unit comprises a substrate laying roller set and a first air floating platform; a first nano imprinting adhesive layer is sprayed between the mold material and the base material through a first adhesive spraying unit; a second nanoimprint adhesive layer is sprayed on one side of the substrate, which is far away from the first nanoimprint adhesive layer, through a second adhesive spraying unit; the first nano-imprinting adhesive layer and the second nano-imprinting adhesive layer are respectively acted by the base material laying unit and the nano-imprinting unit, and microstructure patterns are formed on the front surface and the back surface of the base material. The double-sided embossing device with the structural design can efficiently and continuously automatically realize double-sided nanoembossing of the base material through the arrangement of the units, thereby effectively improving the double-sided embossing efficiency of the base material and reducing the double-sided embossing cost of the base material; the invention also provides a processing method which has simple process, easy operation and high processing efficiency and can effectively save the production cost.
Drawings
Fig. 1 is a schematic structural view of a double-sided nanoimprint apparatus of the present invention.
Fig. 2 is a schematic view of the first air bearing platform of fig. 1.
Fig. 3 is a schematic diagram of the structure with the dashed box in fig. 1 removed.
Fig. 4 is a schematic view of the processing steps of the present invention for a double-sided nanoimprint processing apparatus.
Detailed Description
The present invention will be further described with reference to the drawings and examples, and it should be noted that in the description of the present invention, the terms "upper", "lower", "left", "right", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, only for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific manner, and thus should not be construed as limiting the present invention. The terms "first," "second," "third," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
As shown in fig. 1 to 4, the present invention provides a double-sided nanoimprint apparatus, which includes a mold material discharging unit 1, a first glue spraying unit 2, a substrate laying unit 3, a second glue spraying unit 4, a nanoimprint unit 5, a substrate receiving unit 6, and a mold material receiving unit 7, which are sequentially arranged; through the sequential arrangement of the units, the double-sided nanoimprint of the base material can be effectively and continuously automatically realized, the double-sided nanoimprint efficiency of the base material is effectively improved, and the double-sided nanoimprint cost of the base material is reduced.
Specifically, with the above-described structure, the mold material discharging unit 1 preferably includes a discharging roller set for tensioning and flattening the mold material 114, and a mold release agent spraying device 12 for spraying a mold release agent to the microstructure side of the mold material 114, thereby forming a mold release layer 1311; the discharging roller set comprises a plurality of components such as a die material discharging roller 111, a die material steering roller 112, a die material driving roller 113 and the like, and the purpose of the discharging roller set can be to control the tensioning force of the die material and the feeding speed of the die material.
Further preferably, the mold discharging roller 111 and the mold driving roller 113 are respectively positioned at both ends of the mold, and the mold driving roller 113 in the mold discharging unit 1 is shared with the receiving driving roller in the mold receiving unit 7 in order to achieve synchronous winding of the mold after imprinting. The mold material tensioned in this way is horizontally tensioned, the side surface of the microstructure is upwards arranged, and then the mold release agent spraying device 12 is used for uniformly spraying the mold release agent on the side surface of the microstructure, so that good guarantee is provided for subsequent demolding, and the mold release agent spraying device 12 in the embodiment is arranged adjacent to the first glue spraying unit 2 and is positioned in front of the first glue spraying unit 2.
In addition, based on effective protection of the microstructure in the mold, the embodiment is further provided with a film tearing unit 13 on one side of the mold discharging roller 111 for tearing the protective film covered on the microstructure side of the mold, and the protective film 131 covered on the microstructure side of the mold is torn off and rolled by the film tearing unit 13 before the mold is tensioned and flattened.
Further, after the mold material is tensioned and flattened by the mold material discharging unit 1, the first nanoimprint adhesive layer 21 can be uniformly arranged on the microstructure side of the mold material by the first adhesive spraying unit 2, then the substrate is covered on the first nanoimprint adhesive layer 21 by the substrate laying unit 3, and the substrate 33 and the mold material are pressed together in the process of substrate discharging and covering, so that a nanoimprint pattern layer with a microstructure pattern is formed on the lower bottom surface of the substrate.
Preferably, the substrate laying unit 3 in the above step includes a substrate laying roller group for laying the substrate 33 toward the microstructure side of the mold, and a first air floating platform 31 provided below the mold in cooperation with the substrate laying roller group; the substrate laying roller set includes a substrate laying roller 321 for laying a substrate 33, and a substrate turning pressing roller 322 for pressing the substrate on the microstructure side of the mold in cooperation with the first air floating platform 31 below, when the substrate 33 is laid on the microstructure side of the mold sprayed with the first nanoimprint adhesive layer 21, the substrate laying roller 321 and the substrate turning pressing roller 322 both keep synchronous movement with the mold, so that the substrate 33 is synchronously fed forward along with the mold 114, and is pressed with the mold in the laying process.
Further, in order to enable the microstructure pattern transferred to the first nanoimprint adhesive layer 21 to be cured and set rapidly during the lamination process of the substrate 33 and the mold 114, preferably, the first air floating platform 31 includes an air pressure cavity 311, a pressure-adjusting air supply device communicated with the air pressure cavity 311, and a UV light curing assembly 312 disposed in the air pressure cavity 311, wherein UV light of the UV light curing assembly 312 is emitted outwards through an air floating end of the air pressure cavity 311, that is, when the substrate turning press roller 322 is subjected to air floating action of the first air floating platform 31 to fully laminate the substrate and the mold, the UV light emitted from the first air floating platform 31 is cured synchronously with the pattern transferred to the first nanoimprint adhesive layer 21. Of course, the step can be performed by pressing the mold material and the base material according to the requirement, and the UV curing operation is left to the subsequent station.
Further, after the above operation is completed, the second nanoimprint adhesive layer 41 may be uniformly sprayed on the upper surface of the laid substrate by the second adhesive spraying unit 4, and then the microstructure on the nanoimprint unit 5 is transferred to the second nanoimprint adhesive layer 41 by the nanoimprint unit 5 and the second air floating platform 51 disposed under the mold, so as to form an upper microstructure pattern of the substrate, and after the substrate 33 and the mold 131 are further separated, the microstructure pattern is formed on the front and back sides of the substrate 33.
Preferably, the nano-imprinting unit 5 comprises an imprinting roller 52 with a microstructure circumferentially arranged and a second air-floating platform 51 arranged below the mold material and matched with the imprinting roller 52, in this way, the pressed substrate and the mold material transfer the pattern on the imprinting roller 52 to the second nano-imprinting adhesive layer 41 through the rolling of the imprinting roller 52 under the supporting action of the second air-floating platform 51.
More specifically, as a preferred embodiment, the first air floating platform 31 and the second air floating platform 51 have the same structure, and the first air floating platform 31 and the second air floating platform 51 each include an air pressure cavity 311, a pressure-adjusting air supply device communicated with the air pressure cavity 311, and a UV light fixing component 312 disposed in the air pressure cavity 311, wherein UV light of the UV light fixing component 312 is emitted outwards through an air floating end of the air pressure cavity 311, so that an air cushion-like supporting position is formed under the mold material, and a stable and reliable support is provided for rolling the substrate laying roller set and the embossing roller 52.
Further, the UV light fixing component 312 includes a UV light emitting component and a light adjusting component matched with the UV light emitting component, and preferably, the light adjusting component may be an optical lens with a light adjusting function, so as to adjust parameters such as a wavelength and an irradiation area of the UV light. In this embodiment, in order to match the rolling of the above-mentioned substrate laying roller set, the projection area formed by the light beams emitted from the first air floating platform 31 and the second air floating platform 51 is in a long strip shape, the length of which corresponds to the width of the substrate, and the width ranges from 1mm to 5 mm.
Further, after the pattern transfer of the second nanoimprint adhesive layer on the upper surface of the substrate is completed, the substrate with the microstructure pattern printed on both sides and the mold material can be further separated through the substrate material receiving unit 6 and the mold material receiving unit 7, and the substrate and the mold material are respectively wound; in the winding process, in order to avoid damage to the microstructure patterns on the front and back sides of the substrate, the shaped microstructure patterns can be protected by covering the side surfaces of the microstructures with protective films 811 and 821.
As a preference, in this embodiment, the first film coating unit 81 and the second film coating unit 82 are respectively disposed on opposite sides of the base material receiving unit 6; in addition, a third film-coating unit 83 is provided on the side of the mold material-receiving unit 7 in order to protect the microstructure pattern on the side of the mold material after imprinting by the protective film 831.
Similar to the above-described base material laying unit 3, the first film-coating unit 81, the second film-coating unit 82, and the third film-coating unit 83 are each provided with a discharge roller for discharging the protective film, and a steering roller for laying the protective film. The turning rolls in the third film coating unit 83 are tangent to the driving rolls in the mold material receiving unit 7, and the turning rolls in the first film coating unit 81 and the second film coating unit 82 are tangent to the turning rolls in the substrate material receiving unit 6, respectively, so that the protective film is covered to the corresponding microstructure side along with the winding of the substrate 33 and the mold material 114.
In addition, the embodiment also provides a processing method for the double-sided nanoimprint device, which comprises the following processing steps:
1) Flattening the mold material 114 in the mold material discharging unit 1 by a discharging roller set and arranging the microstructure side up, and then spraying a release agent to the microstructure surface of the mold material by a release agent spraying device 12, thereby forming a release layer 1311 on the microstructure side of the mold material 114, see specifically fig. 1 to 4, and step S1 in fig. 4;
2) Spraying a first nano-imprinting adhesive layer 21 to the side of the microstructure of the mold provided with the release layer 1311 through a first adhesive spraying unit 2, then paving a substrate 33 on the first nano-imprinting adhesive layer 21 through a substrate paving unit 3, pressing the substrate and the mold through a substrate paving roller set and a first air floating platform 31 in the paving process, and curing the microstructure transferred to the first nano-imprinting adhesive layer 21, particularly referring to fig. 1 to 4, and step S2 in fig. 4;
3) Spraying a second nano-imprinting adhesive layer 41 on the side of the substrate far from the first nano-imprinting adhesive layer 21 through a second adhesive spraying unit 4, and forming and curing a microstructure pattern of the second nano-imprinting adhesive layer 41 through the nano-imprinting unit 5, particularly referring to fig. 1 to 4, and step S3 in fig. 4;
4) The substrate 33 with the microstructure pattern embossed on both sides is separated from the mold 114 by the substrate receiving unit 6 and the mold receiving unit 7, and the corresponding microstructure pattern is coated by the first coating unit 81, the second coating unit 82, and the third coating unit 83, and the coated substrate and mold are wound up by the substrate receiving unit 6 and the mold receiving unit 7, see fig. 1 to 4, and step S4 in fig. 4.
The processing method is used for carrying out double-sided nanoimprint on the base material, so that the processing continuity is good, the processing efficiency is high, the convenience and the high efficiency are realized, and the operation is easy.
The foregoing describes in detail preferred embodiments of the present invention. It should be understood that numerous modifications and variations can be made in accordance with the concepts of the invention by one of ordinary skill in the art without undue burden. Therefore, all technical solutions which can be obtained by logic analysis, reasoning or limited experiments based on the prior art by the person skilled in the art according to the inventive concept shall be within the scope of protection defined by the claims.
Claims (10)
1. The utility model provides a two-sided nanometer impression device which characterized in that:
the device comprises a die material discharging unit, a first glue spraying unit, a substrate paving unit, a second glue spraying unit, a nano imprinting unit, a substrate receiving unit and a die material receiving unit which are sequentially arranged;
the mold material discharging unit comprises a discharging roller group for tensioning and flattening a mold material and a release agent spraying device for spraying a release agent to the microstructure side of the mold material;
the substrate laying unit comprises a substrate laying roller set for laying a substrate to the microstructure side of the die material and a first air floating platform which is arranged below the die material and matched with the substrate laying roller set;
a first nano-imprinting adhesive layer is sprayed between the die material and the base material through the first adhesive spraying unit; a second nano-imprinting adhesive layer is sprayed on one side of the substrate, which is far away from the first nano-imprinting adhesive layer, through the second adhesive spraying unit;
the first nano imprinting adhesive layer and the second nano imprinting adhesive layer are respectively acted by the base material laying unit and the nano imprinting unit, and micro-structure patterns are formed on the front surface and the back surface of the base material.
2. The dual sided nanoimprint apparatus of claim 1, wherein: the base material receiving unit and the die material receiving unit are used for separating the base material with the microstructure patterns printed on the two sides from the die material and respectively rolling the die material and the base material after printing.
3. The dual sided nanoimprint apparatus of claim 1, wherein: the nano imprinting unit comprises an imprinting roller with a microstructure circumferentially arranged and a second air floating platform which is arranged below the die material and matched with the imprinting roller.
4. A two-sided nanoimprint apparatus as claimed in claim 3, wherein: the first air floating platform and the second air floating platform have the same structure, and each of the first air floating platform and the second air floating platform comprises an air pressure cavity, a pressure-regulating air supply device communicated with the air pressure cavity, and a UV light fixing component arranged in the air pressure cavity, wherein UV light of the UV light fixing component is emitted outwards through an air floating end of the air pressure cavity.
5. The dual sided nanoimprint apparatus of claim 4 wherein: the UV light fixing component comprises a UV light emitting component and a dimming component matched with the UV light emitting component.
6. The dual sided nanoimprint apparatus of claim 1, wherein: the device also comprises a first film coating unit, a second film coating unit and a third film coating unit, wherein the first film coating unit and the second film coating unit are arranged on two sides of the base material receiving unit and are used for coating the microstructure patterns on the front side and the back side of the base material, and the third film coating unit is arranged on one side of the die material receiving unit.
7. The dual sided nanoimprint apparatus of claim 1, wherein: the die material discharging unit further comprises a film tearing unit for tearing off the protective film covered on the microstructure side of the die material.
8. The dual sided nanoimprint apparatus of claim 1, wherein: the release agent spraying device is arranged adjacent to the first glue spraying unit and is positioned in front of the first glue spraying unit.
9. The dual sided nanoimprint apparatus of claim 1, wherein: the first film covering unit, the second film covering unit and the third film covering unit are respectively provided with a discharging roller for discharging the protective film and a steering roller for paving the protective film.
10. A processing method, which is characterized in that: a double-sided nanoimprint processing apparatus comprising any one of claims 1 to 9, further comprising the processing steps of:
1) Flattening the mould materials in the mould material discharging unit through a discharging roller set, enabling the microstructure to be arranged laterally upwards, and then spraying a release agent on the microstructure surface of the mould materials through the release agent spraying device;
2) Spraying a first nano imprinting adhesive to the microstructure side of the mold material through the first adhesive spraying unit, paving the substrate on the first nano imprinting adhesive layer through the substrate paving unit, laminating the substrate and the mold material through the substrate paving roller set and the first air floating platform in the paving process, and solidifying the microstructure transferred to the first nano imprinting adhesive layer;
3) Spraying a second nano-imprinting adhesive layer on one side of the substrate, which is far away from the first nano-imprinting adhesive layer, through the second adhesive spraying unit, and enabling the second nano-imprinting adhesive layer to form a microstructure pattern and be solidified through the nano-imprinting unit;
4) And separating the substrate with the microstructure patterns printed on the two sides from the die material through the substrate material receiving unit and the die material receiving unit, coating the corresponding microstructure patterns through the first coating unit, the second coating unit and the third coating unit, and simultaneously rolling the coated substrate and the die material through the substrate material receiving unit and the die material receiving unit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311243093.6A CN117148667A (en) | 2023-09-25 | 2023-09-25 | Double-sided nano imprinting device and processing method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311243093.6A CN117148667A (en) | 2023-09-25 | 2023-09-25 | Double-sided nano imprinting device and processing method |
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| Publication Number | Publication Date |
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| CN117148667A true CN117148667A (en) | 2023-12-01 |
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| CN202311243093.6A Pending CN117148667A (en) | 2023-09-25 | 2023-09-25 | Double-sided nano imprinting device and processing method |
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| CN (1) | CN117148667A (en) |
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