CN117144317A - Assembly, method and system for use in a magnetron sputtering process - Google Patents
Assembly, method and system for use in a magnetron sputtering process Download PDFInfo
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- CN117144317A CN117144317A CN202311164700.XA CN202311164700A CN117144317A CN 117144317 A CN117144317 A CN 117144317A CN 202311164700 A CN202311164700 A CN 202311164700A CN 117144317 A CN117144317 A CN 117144317A
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- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 147
- 238000000034 method Methods 0.000 title claims abstract description 41
- 230000008569 process Effects 0.000 title claims abstract description 27
- 238000005070 sampling Methods 0.000 claims abstract description 511
- 238000001514 detection method Methods 0.000 claims abstract description 41
- 238000007599 discharging Methods 0.000 claims abstract description 13
- 238000007789 sealing Methods 0.000 claims abstract description 12
- 238000001125 extrusion Methods 0.000 claims description 79
- 238000002955 isolation Methods 0.000 claims description 50
- 230000007246 mechanism Effects 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 12
- 238000004544 sputter deposition Methods 0.000 claims description 10
- 230000009471 action Effects 0.000 claims description 6
- 238000005520 cutting process Methods 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 6
- 210000001503 joint Anatomy 0.000 claims description 5
- 238000002360 preparation method Methods 0.000 claims description 3
- 238000000576 coating method Methods 0.000 abstract description 12
- 239000011248 coating agent Substances 0.000 abstract description 9
- 239000000523 sample Substances 0.000 description 24
- 238000006073 displacement reaction Methods 0.000 description 17
- 239000007789 gas Substances 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- -1 argon ions Chemical class 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000007405 data analysis Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a component, a method and a system for use in a magnetron sputtering treatment process, and relates to the technical field of magnetron sputtering coating. The assembly comprises: the sampling cabin is used for acquiring a sampling sample and accommodating the sampling sample; wherein, a plurality of sampling cabins in the magnetron sputtering chamber are connected end to form a sampling cabin chain; the first conveying port is arranged on the cavity wall of the magnetron sputtering cavity, and is in a closed state when the sampling cabin is not conveyed so as to keep sealing; and after the sampling cabin chain enters the conveying channel, sequentially discharging a plurality of sampling cabins of the sampling cabin chain through the first conveying port, so that corresponding sampling samples are sequentially conveyed from the inside of the magnetron sputtering chamber to the outside of the magnetron sputtering chamber. The invention provides a more accurate and flexible data detection scheme aiming at the magnetron sputtering process, and is convenient for users to know the trend changes of the gas environment in the magnetron sputtering chamber at different time/areas in time.
Description
Technical Field
The present invention relates to the field of magnetron sputtering coating technology, and in particular, to a component, a method and a system for use in a magnetron sputtering process.
Background
The magnetron sputtering coating needs to be carried out in a high vacuum environment. Based on the quality of the coated product, reproducibility of the coating process, acquisition and analysis of magnetron sputtering vapor deposition data, and other considerations, current magnetron sputtering systems require monitoring and/or control of the vacuum process in the magnetron sputtering chamber.
In order to monitor and control the vacuum process, the prior art provides magnetron sputtering monitoring schemes based on sensor technology. However, in the current sensor monitoring scheme, the sensor probe is usually directly arranged in the magnetron chamber to detect and measure, such as analyzing the concentration of the gas component in the chamber, so that the magnetron sputtering data can be monitored in real time. However, in practical applications, it was found that various particles may be deposited/attached on the sensor probe provided inside due to diffusion of various particles in the magnetron sputtering chamber, resulting in that information detected by the sensor may be different from the actual situation. On the other hand, the stability and the coating quality of the magnetron sputtering process can be guaranteed only by ensuring that the magnetron sputtering coating equipment has a high vacuum environment meeting the coating requirement, so that the isolation and the sealing of the magnetron sputtering chamber and the external environment are required to be ensured to maintain the high vacuum degree in the chamber in the magnetron sputtering process. Accordingly, how to provide a more accurate and flexible magnetron sputtering data detection scheme for the magnetron sputtering process on the basis of maintaining a high vacuum degree in the magnetron sputtering chamber is a technical problem to be solved currently.
Disclosure of Invention
The invention aims at: overcoming the deficiencies of the prior art and providing an assembly, method and system for use in a magnetron sputtering process. According to the assembly provided by the invention, a plurality of sampling samples obtained by sampling in time intervals/regions are transmitted outside the magnetron sputtering chamber through the sampling cabin chain to be analyzed/measured through the first conveying port, a more accurate and flexible data detection scheme is provided for the magnetron sputtering process, users can know trend changes of the gas environment in the magnetron sputtering chamber at different times/regions in time conveniently, and reliable data is provided for optimization, improvement, reproducible processing and the like of the later coating process.
In order to achieve the above object, the present invention provides the following technical solutions:
an assembly for use during a magnetron sputtering process, the assembly comprising:
the sampling cabin is used for acquiring a sampling sample and accommodating the sampling sample; wherein, a plurality of sampling cabins in the magnetron sputtering chamber are connected end to form a sampling cabin chain;
the first conveying port is arranged on the cavity wall of the magnetron sputtering cavity, and is in a closed state to keep sealing when the sampling cabin is not conveyed;
and after the sampling cabin chain enters the conveying channel, sequentially discharging a plurality of sampling cabins of the sampling cabin chain through the first conveying port, so that corresponding sampling samples are sequentially conveyed from the inside of the magnetron sputtering chamber to the outside of the magnetron sputtering chamber.
Further, the sampling cabin is of a strip-shaped structure with smooth edges, the conveying channel is a strip-shaped cavity and can accommodate the sampling cabin chain, and the sampling cabin chain is conveyed to the first conveying port through the conveying channel.
Further, the first conveying port comprises a squeezing port capable of being opened or closed, and a channel of the squeezing port comprises a squeezing part capable of being sealed with the outer surface of the sampling cabin in a squeezing mode when the sampling cabin passes through; when the sampling cabin enters the extrusion port, the extrusion port is converted from a closed state to an open state so that the sampling cabin just passes through, and the extrusion part keeps an extruded state until the sampling cabin leaves the extrusion port when the sampling cabin passes through; before the sampling cabin leaves the extrusion port, the extrusion port is restored to a closed state;
and a sampling cabin driving device is arranged on the inner side or the outer side of the magnetron sputtering chamber corresponding to the conveying channel, and the sampling cabin in the conveying channel is driven by the sampling cabin driving device to pass through the extrusion port.
Further, the sampling cabins are connected through a cabin connecting piece; the tail part of each sampling cabin is provided with the cabin connecting piece for separable connection with the head part of the next sampling cabin, and a plurality of sampling cabins are sequentially connected end to end through the cabin connecting pieces to form a chain structure; when one sampling pod is being ejected, it can be separated from the head of the next sampling pod by the pod connector.
Further, the device also comprises a sampling cabin discharge control part and a sampling cabin output counter; the sampling cabin discharge control part is used for processing the sampling cabin discharge instruction and controlling the sampling cabin driving device to work; the sampling cabin output counter is used for counting the sampling cabins passing through the extrusion port;
the sampling chamber drive control section is configured to perform the steps of:
s11, receiving a sampling cabin discharge instruction, and acquiring the number M of sampling cabins to be discharged in the sampling cabin discharge instruction;
s12, starting a sampling cabin driving device to apply thrust to a first sampling cabin positioned at the extrusion port so as to enable the whole sampling cabin chain to move towards the extrusion port at the front end, and enabling the first sampling cabin positioned at the forefront to apply pressure to the extrusion port, wherein the extrusion port is converted from a closed state to an open state under the action of the pressure so as to enable the sampling cabin to pass through; when the tail part of the sampling cabin is about to be discharged, separating a cabin connecting piece of the tail part from the head part of the next sampling cabin, and controlling the extrusion port to return to a closed state, wherein the tail part of the first sampling cabin is still kept sealed with the extrusion part of the extrusion port;
s13, driving the first sampling cabin to continue to move so as to leave the extrusion port, and adding one to the count value of the sampling cabin output counter when the tail part of the first sampling cabin is separated from the extrusion port;
S14, judging whether the current count value Q of the sampling cabin output counter is equal to M; if the determination is not equal, the process returns to step S12; otherwise, executing step S15;
and S15, ending the sampling cabin discharging operation.
Further, the sampling samples are sampling strip lines, and the sampling strip lines are continuously arranged in the plurality of sampling cabins so that the plurality of sampling cabins are connected end to form a chain structure;
the sampling strip line comprises a sampling section and a non-sampling section, the sampling section is positioned in a sampling cabin, the sampling cabin is controlled to open a sampling port for sampling when sampling is needed, and the sampling cabin is controlled to close the sampling port when sampling is completed; adjacent sampling cabins are connected through the non-sampling section; a thread cutting mechanism is arranged at the tail part of each sampling cabin and used for cutting off sampling threads, so that one sampling cabin can be separated from the head part of the next sampling cabin when being discharged.
Further, the conveying channel is of an annular structure and comprises an annular channel for accommodating the sampling cabin and a conveying power device for conveying the sampling cabin, wherein the annular channel penetrates through the cavity wall of the magnetron sputtering cavity and part of the channel is positioned in the magnetron sputtering cavity;
the magnetron sputtering chamber is characterized in that a second conveying port is further formed in the chamber wall of the magnetron sputtering chamber and used for enabling the sampling chamber to enter the magnetron sputtering chamber, a first isolation valve and a second isolation valve are respectively arranged on the first conveying port and the second conveying port, the annular channel is divided into a first vacuum area and a second vacuum area by the first isolation valve and the second isolation valve, the first vacuum area is communicated with the second vacuum area when the first isolation valve and/or the second isolation valve are opened, and the first vacuum area is isolated from the second vacuum area when the first isolation valve and the second isolation valve are closed; the first vacuum area is arranged inside the magnetron sputtering chamber and is provided with a first unloading opening of the sampling cabin, and the second vacuum area is arranged outside the magnetron sputtering chamber and is provided with a second unloading opening of the sampling cabin.
Further, a sampling cabin inlet and outlet control part arranged corresponding to the conveying channel is used for controlling the discharge and the inlet of the sampling cabin on the conveying channel;
the sampling chamber access control section is configured to:
the sampling cabins after the control sampling enter the first vacuum region through the first unloading openings of the sampling cabins, the sampling cabins are sequentially connected end to end in the first vacuum region, and the first unloading openings of the sampling cabins are controlled to be closed so as to be sealed and isolated from the inside of the magnetron sputtering chamber; the method comprises the steps of controlling a first isolation valve on a first conveying port to be opened, conveying a sampling cabin of the first vacuum region to a second vacuum region through the first conveying port by a conveying power device, and controlling the first isolation valve to be closed to finish the discharging operation of a sampling cabin chain; the method comprises the steps of,
when the fact that the sampling cabins of a preset number are loaded in the second vacuum area is monitored, after a second unloading opening of the sampling cabins is closed, purifying and vacuumizing the second vacuum area and the sampling cabins; after the vacuumizing treatment is finished, a second isolation valve on a second conveying port is controlled to be opened, a conveying power device conveys the sampling cabin in the second vacuum area to the first vacuum area, a fourth isolation valve is controlled to be closed, the sampling cabin reenters the magnetron sputtering chamber, and the entering operation of a sampling cabin chain is completed.
The invention also discloses a sampling detection method in the magnetron sputtering treatment process, which comprises the following steps:
obtaining a sampling sample through a sampling cabin; the sampling cabins are connected end to end in the magnetron sputtering chamber to form a sampling cabin chain;
controlling a sampling cabin chain to enter a conveying channel, wherein the conveying channel is in butt joint with a first conveying port, and the first conveying port is arranged on the cavity wall of the magnetron sputtering cavity;
and sequentially discharging a plurality of sampling cabins of the sampling cabin chain through the first conveying port, so that corresponding sampling samples are sequentially conveyed from the inside of the magnetron sputtering chamber to the outside of the magnetron sputtering chamber.
The invention also discloses a magnetron sputtering system, which comprises a magnetron sputtering device, a sampling device and a detection device;
the magnetron sputtering device comprises a vacuum container, a magnetron sputtering chamber is formed in the vacuum container, the magnetron sputtering chamber is provided with a sputtering mechanism and a substrate to be coated, and the sputtering mechanism is used for generating target atoms for film preparation;
the sampling device comprises the components;
the detection device is used for detecting the sampling sample conveyed to the outside of the magnetron sputtering chamber.
Compared with the prior art, the invention has the following advantages and positive effects by taking the technical scheme as an example: according to the assembly provided by the invention, a plurality of sampling samples obtained by sampling in time intervals/regions are transmitted outside the magnetron sputtering chamber through the sampling cabin chain to be analyzed/measured through the first conveying port, a more accurate and flexible data detection scheme is provided for the magnetron sputtering process, users can know trend changes of the gas environment in the magnetron sputtering chamber at different times/regions in time conveniently, and reliable data is provided for optimization, improvement, reproducible processing and the like of the later coating process.
Drawings
Fig. 1 is a schematic diagram of a prior art arrangement of a sampling assembly within a magnetron sputtering chamber.
Fig. 2 is a schematic diagram of an arrangement of a conveying channel in a magnetron sputtering chamber according to an embodiment of the invention.
Fig. 3 is a schematic structural view of the sampling chamber forming the sampling chamber chain of the 4 regions in fig. 2.
Fig. 4 is a schematic structural diagram of a sampling chamber according to an embodiment of the present invention.
Fig. 5 is a schematic structural diagram of a sampling cabin chain formed by sampling strip lines according to an embodiment of the present invention.
Fig. 6 is a schematic layout diagram of a circulating conveying channel according to an embodiment of the present invention.
Fig. 7 is a flowchart of a sampling detection method in a magnetron sputtering process according to an embodiment of the invention.
Reference numerals illustrate:
a vacuum vessel 100, a base 110, a magnetron sputtering mechanism 120, a sputtering material 130;
a sampling pod chain 20, sampling pod 200;
a first delivery port 300, a displacement port body portion 311, a displacement port compression portion 312, a displacement port passageway 313, a valve 314, a pressure sensor 315, a distance sensor 316;
a transfer tunnel 400, a first vacuum zone 4001, a second vacuum zone 4002;
sampling region 500, first sampling region 5001, second sampling region 5002, third sampling region 5003, fourth sampling region 5004;
Sampling line 600, sampling segment 610, non-sampling segment 620;
a second delivery port 700.
Detailed Description
The components, methods and systems disclosed herein for use during a magnetron sputtering process are described in further detail below with reference to the drawings and detailed description. It is noted that techniques (including methods and apparatus) known to those of ordinary skill in the relevant art may not be discussed in detail, but are considered to be part of the specification where appropriate. Meanwhile, other examples of the exemplary embodiment may have different values. The structures, proportions, sizes, etc. shown in the drawings are shown only in connection with the present disclosure for purposes of understanding and reading by those skilled in the art and are not intended to limit the scope of the application.
In the description of the embodiment of the present application, "/" means "and/or" is used to describe the association relationship of the association object, which means that three relationships may exist, for example, "a and/or b" means: there are three cases of A and B separately. In the description of the embodiments of the present application, "plurality" means two or more.
Hereinafter, the technical concept and the scheme of the present invention will be described according to an exemplary application scenario.
Examples
When the vacuum chamber is used for magnetron sputtering coating of a substrate, a magnetron sputtering device is arranged in the vacuum chamber and comprises a vacuum container, the magnetron sputtering chamber is formed in the vacuum container, the magnetron sputtering chamber is provided with a sputtering mechanism and the substrate to be coated, and the sputtering mechanism is used for generating target atoms for film preparation. The working process of magnetron sputtering is that electrons are collided with sputtering gas argon (other inert gases can be adopted) in the process of accelerating the electrons to fly to a substrate coating layer under the action of an electric field, a large amount of argon ions and electrons are ionized, and the electrons fly to the substrate coating layer and continuously collide with argon atoms in the process to generate more argon atoms and electrons; the argon ions are accelerated to bombard the target under the action of an electric field, a large number of target atoms are sputtered, and neutral target atoms are deposited on the surface of the substrate coating layer to form a film.
The shape and the size of the vacuum container can be selected according to actual needs, and the cross section of the common vacuum container can be round, rectangular and the like. During magnetron sputtering operations, the vacuum vessel needs to be kept under vacuum-for example, the vacuum vessel may be kept under vacuum with the aid of a gas pumping system.
The present invention addresses the above-described prior art by providing an assembly for use in a magnetron sputtering process, the assembly comprising a sampling chamber, a first delivery port and a delivery channel. Referring to fig. 1, there is illustrated a vacuum vessel of a cylindrical structure, the cross-sectional surface of which is rectangular and the cross-section of which is circular (not shown).
By way of example and not limitation, the substrate 110 and the magnetron sputtering mechanism 120 are disposed in a vacuum vessel 100. By way of example and not limitation, the substrate 100 in fig. 1 is a movable substrate, the magnetron sputtering mechanism 120 is a rotatable target magnetron, and a vacuum pump (not shown) is used to evacuate the vacuum vessel. A power supply is connected to the magnetron sputtering mechanism 120 via a cable for generating a glow discharge and forming a sputtered species 130 (e.g., target atoms), which sputtered species 130 can deposit onto the substrate 110. If necessary, a reactive gas may be introduced into the vacuum chamber to react the deposited material with the reactive gas existing in the chamber and form a composite film layer.
In this embodiment, a sampling chamber 200 is further disposed in the vacuum chamber 100, the sampling chamber may be disposed in a preset sampling area 500, and a sampling chamber storage chamber may be disposed in the sampling area 500 according to needs, and when sampling is needed, the sampling chamber storage chamber is controlled to output the sampling chamber.
The sampling chamber 200 is used to take a sampling sample and hold the sampling sample. The multiple sampling chambers 200 in the magnetron sputtering chamber formed by the vacuum chamber 100 may be connected end to form a sampling chamber chain. The sampling bins may be sequentially connected in a predetermined order, such as a sampling time order, or a predetermined sampling position (corresponding to different sampling regions) order.
The first delivery port 300 is disposed on the magnetron sputtering chamber wall, and the first delivery port 300 is closed to maintain a seal when the sampling chamber 200 is not being delivered. When the sampling chamber 200 needs to be transported, the first transporting port 300 may be opened to allow the sampling chamber to pass through, and the sealing performance of the magnetron sputtering chamber should be maintained when the sampling chamber 200 is communicated with the first transporting port 300, so as to avoid external air from entering the magnetron sputtering chamber.
The conveying channel 400 is in butt joint with the first conveying port 300, and after the sampling cabin chain enters the conveying channel 400, a plurality of sampling cabins of the sampling cabin chain can be sequentially discharged through the first conveying port 300, so that corresponding sampling samples are sequentially conveyed from the inside of the magnetron sputtering chamber to the outside of the magnetron sputtering chamber.
According to the invention, the sampling samples obtained by sampling in time intervals/regions can be transmitted to the outside of the magnetron sputtering chamber through the first conveying port for analysis/measurement through the sampling cabin chain, so that a user can know the trend change of atmosphere (gas environment) in the chamber in a preset time interval in time, and the difference of atmospheres in different regions of the magnetron sputtering chamber in the same time interval, and the particle distribution condition of each region of the magnetron sputtering chamber can be analyzed conveniently.
The preset period may be adaptively set according to the magnetron sputtering coating scale, for example and not by way of limitation, such as the preset period may be set to 1 hour, 4 hours, 12 hours, one day, etc. And in the preset period, sampling is carried out for a plurality of times according to a preset time interval or a preset sampling stage interval, one sampling corresponds to one sampling cabin, and when all sampling operations of one preset period are completed, the sampling cabin chain corresponding to the preset period is discharged out of the magnetron sputtering chamber through the first conveying port so as to carry out relevant detection outside the magnetron sputtering chamber. For example, according to magnetron sputtering monitoring information set by a system or a user, 4 times of sampling are required in a preset period, and a sampling cabin chain corresponding to the preset period comprises 4 sampling cabins; when the 4 sampling cabins are sampled, the 4 sampling cabins form a sampling cabin chain according to the sequence of sampling time/sampling stages, the sampling time/stage is arranged in front of the chain, the sampling time/stage is arranged behind the chain, the sampling cabin chain is controlled to enter the conveying channel, and the 4 sampling cabins of the sampling cabin chain are sequentially discharged out of the magnetron sputtering chamber through the first conveying port.
The division of the sampling area 500 may also be adaptively set according to the magnetron sputtering coating scale. By way of example and not limitation, such as the example of fig. 2, 4 sampling regions are provided in the vacuum chamber, a first sampling region 5001, a second sampling region 5002, a third sampling region 5003, and a fourth sampling region 5004, respectively. Each sampling area is provided with a sampling cabin. After receiving the sampling instruction, the sampling chambers of the first sampling area 5001, the second sampling area 5002, the third sampling area 5003 and the fourth sampling area 5004 may be controlled to start sampling simultaneously, after a preset sampling time is reached (for example, sampling is performed for 3 minutes), sampling is completed, after the sampling chambers of the 4 sampling areas are controlled to be closed simultaneously, the preset sequence of installing the sampling areas controls the sampling chambers to sequentially enter the conveying channel 400, and the sampling chambers are sequenced according to the preset sequence at the position of the first conveying port 300, so as to form a sampling chamber chain 20, as shown in fig. 3. In fig. 3, the sampling bin chain 20 includes 4 sampling bins sequentially arranged in the order of sampling regions 5001, 5002, 5003, 5004, the sampling bin of the first sampling region 5001 being located at the first position and the sampling bin of the fourth sampling region 5004 being located at the last position.
The sampling cabin can be used for directly sampling the gas in the magnetron sputtering chamber through the sampling hole or the sampling pipe, and is suitable for sampling analysis of the gas component/gas component concentration and the like in each region in the magnetron sputtering chamber. Optionally, an air pump may be disposed on the sampling chamber, and a sampling hole or a sampling tube is connected to the air pump, and the air pump is started to suck a small amount of gas in the magnetron sputtering chamber into the sampling chamber during sampling; after sampling is completed, the sampling hole or the sampling tube is closed to keep the sampling cabin sealed (such as by adopting a sealing cap), so that the sampled sample is stored in a sealing way.
The sampling cabin can be used for acquiring the sampling sample, and the sampling sheet/sampling strip can be placed in the sampling area of the magnetron sputtering chamber for a period of time and is suitable for sampling analysis of vapor deposition conditions in each area of the magnetron sputtering chamber.
In this embodiment, the sampling time information and the sampling area information of each time may be recorded while the sampling cabin acquires the sampling sample. The sampling time information comprises sampling start time, sampling end time and magnetron sputtering operation stage to which the sampling time period belongs. The sampling region information includes positional information of the employed region in the magnetron sputtering chamber.
A photographing device and a printing device can be arranged corresponding to each sampling cabin, and the photographing device is used for photographing image data of a sampling area of the sampling cabin and transmitting the image data to an associated image recognition device for recognition so as to acquire sampling area information. The printing device is used for performing printing operation on the sampling area information and the sampling time information recorded by the sampling cabin. After the sampling cabin acquires the sampling sample, the sampling time information and the sampling area information of the sampling sample can be acquired, then the bar code or the two-dimensional code related to the information is formed, and the bar code or the two-dimensional code is printed and output on the sampling cabin. At this time, a barcode or a two-dimensional code reader may be correspondingly disposed at the outer side of the first conveying port, and when the sampling cabin is discharged from the first conveying port, after the barcode or the two-dimensional code on the sampling cabin is read by the code reader, sampling area information and sampling time information of the sampling sample are obtained, and then the sampling area information and the sampling time information are mapped and stored corresponding to a sampling detection result of the sampling cabin. Thus, the data analysis, the processing, the integration and the like are convenient for the later-stage user.
In this embodiment, the sampling chamber preferably adopts a strip structure with smooth edges. In specific implementation, the outer contour of the strip-shaped structure can adopt a columnar structure, a prismatic structure and the like. Preferably, the sampling cabin adopts a columnar structure with a smooth outer surface, two ends of the columnar structure adopt arc-shaped sections, the middle section of the columnar structure adopts a cylindrical structure, and the relay section is smoothly connected with the arc-shaped sections at the two ends.
The conveying channel is a strip-shaped cavity and can accommodate the sampling cabin chain, the inner wall of the conveying channel is smooth, and the sampling cabin chain is conveyed to the first conveying port through the conveying channel.
In a typical embodiment, the first delivery port comprises a displacement port that can be open or closed. The channel of the extruding port comprises an extruding part which can be in extrusion sealing with the outer surface of the sampling cabin when the sampling cabin passes through; when the sampling cabin enters the extrusion port, the extrusion port is converted from a closed state to an open state so that the sampling cabin just passes through, and the extrusion part keeps an extruded state until the sampling cabin leaves the extrusion port when the sampling cabin passes through; before the sampling cabin leaves the extrusion port, the channel of the extrusion port is restored to a closed state.
Preferably, a sampling chamber driving device (not shown) is arranged on the inner side or the outer side of the magnetron sputtering chamber corresponding to the conveying channel, and the sampling chamber in the conveying channel is driven by the sampling chamber driving device to pass through the extruding opening.
In practice, the sampling chambers 200 may be connected by chamber connectors. The tail part of each sampling cabin is provided with the cabin connecting piece for separable connection with the head part of the next sampling cabin, and the sampling cabins are sequentially connected end to end through the cabin connecting pieces to form a chain structure. When one sampling pod is being ejected, it can be separated from the head of the next sampling pod by the pod connector.
In this case, the assembly may further include a sampling chamber discharge control part and a sampling chamber output counter. The sampling cabin discharge control part is used for processing the sampling cabin discharge instruction and controlling the sampling cabin driving device to work. The sampling cabin output counter is used for counting the sampling cabins passing through the extrusion port.
The sampling chamber drive control section is configured to perform the steps of: s11, receiving a sampling cabin discharge instruction, and acquiring the number M of sampling cabins to be discharged in the sampling cabin discharge instruction; s12, starting a sampling cabin driving device to apply thrust to a first sampling cabin positioned at the extrusion port so as to enable the whole sampling cabin chain to move towards the extrusion port at the front end, and enabling the first sampling cabin positioned at the forefront to apply pressure to the extrusion port, wherein the extrusion port is converted from a closed state to an open state under the action of the pressure so as to enable the sampling cabin to pass through; when the tail part of the sampling cabin is about to be discharged, separating a cabin connecting piece of the tail part from the head part of the next sampling cabin, and controlling the extrusion port to return to a closed state, wherein the tail part of the first sampling cabin is still kept sealed with the extrusion part of the extrusion port; s13, driving the first sampling cabin to continue to move so as to leave the extrusion port, and adding one to the count value of the sampling cabin output counter when the tail part of the first sampling cabin is separated from the extrusion port; s14, judging whether the current count value Q of the sampling cabin output counter is equal to M; if the determination is not equal, the process returns to step S12; otherwise, executing step S15; and S15, ending the sampling cabin discharging operation.
By way of example and not limitation, referring to fig. 4, the extrusion port may include a extrusion port body portion 311, an extrusion port extrusion portion 312, an extrusion port passage 313 and a valve 314, a pressure sensor 315 is provided at one end of the extrusion port extrusion portion 312, and a distance sensor 316 is provided at the bottom of the valve 314.
The extrusion port body portion 311 may be formed of a rigid material to form an extrusion port channel of a predetermined shape. The extrusion port extrusion part 312 is mounted on the inner side of the extrusion port body part 311, and the extrusion port extrusion part 312 samples an elastic material, and can be extruded under the action of external force to form an extrusion type sealing structure. In a specific arrangement, the extrusion portion 312 may be a sealing ring, the outer surface of which is tightly fixed on the inner surface of the extrusion portion body 311, and the inner surface of which forms the extrusion channel 313.
The shape and size of the extrusion port channel 313 is adapted to the outer contour shape and size of the sampling chamber 200, so that the sampling chamber 200 just can pass through the extrusion port channel 313, and the extrusion port extrusion part 312 can be kept in an extruded state until the sampling chamber 200 leaves the extrusion port when the sampling chamber 200 passes through the extrusion port channel 313.
The valve 314 is used to effect the opening or closing of the displacement port, i.e. the opening and closing of the displacement port channel 313. Preferably, the valve 314 is in a lifting configuration, and when the valve 314 is lifted, the displacement port channel 313 is in an open state, which allows the passage of the sampling chamber 200; when the valve 314 is lowered (set down), the displacement port channel 313 is in a closed state and the first delivery port is closed.
When the sampling chamber driving means applies a pushing force to the first sampling chamber located at the aforementioned displacement port, the entire sampling chamber chain moves toward the displacement port of the front end, the first sampling chamber located at the forefront applies a pressure to the displacement port, the front end of the displacement port pressing portion 312 is pressed, and when the pressure sensor 315 at the front end detects the pressure, the detected pressure signal is sent to the controller of the valve 314, and the controller controls the valve 314 to rise, as shown in fig. 4, at this time, the displacement port passage 313 is changed from the closed state to the open state for the passage of the sampling chamber 200. When the tail of the sampling pod 200 is about to be ejected, the controller controls the pod connector of the tail to be separated from the head of the next sampling pod, such as by way of example and not limitation, when the pod connector is in electromagnetic adsorption connection, the pod connector may be disconnected by de-energizing to release the magnetic force, at which time the head of the next sampling pod has not yet contacted the front end of the extrusion 312, i.e., is at a distance from the extrusion 312. Meanwhile, when the signal that the cabin connecting piece is disconnected is detected, the controller can control the valve 314 to drop so as to restore the closed state of the extrusion port channel 313, and at the moment, the tail 200 of the first sampling cabin also keeps extrusion type sealing with the extrusion part of the extrusion port, so that the isolation sealing of the magnetron sputtering chamber and the external environment can be ensured, and external air is prevented from entering the magnetron sputtering chamber. The aforementioned first sampling chamber is then driven further outwards to leave the displacement opening, see fig. 4.
Preferably, a distance sensor 316 is also provided at the bottom of the valve 314. The distance sensor may be used to detect the distance of the bottom of the valve 314 from the displacement port channel 313 to ensure that the valve 314 is able to fully open the displacement port channel 313 and to tightly fit into the displacement port channel 313 for a better seal.
Optionally, the distance sensor 316 may also be used to detect the distance between the bottom of the valve 314 and the exterior surface of the sampling chamber to determine if the tail of the sampling chamber is about to be ejected.
In this embodiment, the assembly may further comprise a sample detection device located outside the magnetron sputtering chamber. At this time, can be in the outside of first delivery port directly set up one and detect the chamber, this input butt joint of detecting the chamber the output of first delivery port, sampling cabin is discharged from aforesaid first delivery port can get into in the detection chamber, detects the sample in the sampling cabin through the sample detection device in the detection chamber. When the sampling cabin is discharged in a plurality, sampling sample detection needs to be carried out on the sampling cabin respectively, at the moment, the detection cavity can be provided with a plurality of detection subchambers, and the detection subchambers can be mutually sealed and isolated.
The detection subchambers can be arranged in parallel, the detection chamber comprises a transition channel, one end of the transition channel is communicated with the output end of the first conveying port, and a plurality of output ports are arranged at the other end of the transition channel so as to be respectively communicated with the detection subchambers.
The detection subchambers can be arranged in series, at this time, the detection chamber is a strip-shaped chamber, the strip-shaped chamber is separated by a plurality of isolation valves to form a plurality of detection subchambers, and the adjacent detection subchambers can be mutually communicated or isolated and sealed by the isolation valves. By way of example and not limitation, such as corresponding detection chambers, there may be provided isolation valve lift channels and lift drive structures by which corresponding isolation valves may be driven to move up or down along the lift channels, adjacent detection subchambers communicating with each other when the isolation valves are moved up, the detection chambers forming a through chamber when all of the isolation valves are retracted, and a plurality of sampling chambers being capable of entering the detection chambers together. Then, when the detection subchamber is detected to be placed with the sampling cabin, the corresponding isolation valve of the detection subchamber is controlled to reset, for example, based on the lifting channel and the lifting driving structure of the isolation valve, the corresponding isolation valve is driven to move downwards along the lifting channel by the lifting driving structure to reset, when the isolation valve moves downwards, the isolation valve forms a separation in the detection chamber, and the adjacent detection subchambers are isolated and sealed by the isolation valve, so that each sampling cabin can be sealed in the corresponding detection subchamber.
In addition to the above-described manner of connecting the sampling chambers by means of dedicated chamber connectors, in another implementation of this embodiment, the use chambers may also be connected by sampling samples. In particular, the sampling sample may be a sampling strip 600, as shown in fig. 5. The sampling strip 600 is serially arranged in the plurality of sampling pods 200 such that the plurality of sampling pods are connected end to form a chain structure.
Preferably, the sampling strip 600 includes a sampling section 610 and a non-sampling section 620. The sampling section 610 is located in the sampling cabin 200, and controls the sampling cabin 200 to open a sampling port for sampling when sampling is required, and controls the sampling cabin 200 to close the sampling port when sampling is completed. Adjacent sampling pods 200 are connected by the non-sampling segments 620. A thread cutting mechanism may be provided for cutting the sampling thread 600 corresponding to the tail of each sampling compartment 200 to enable separation of the head of one sampling compartment from the next upon discharge.
Referring to fig. 6, in another implementation manner of this embodiment, the conveying channel is an annular structure, including an annular channel for accommodating the sampling chamber and a conveying power device for conveying the sampling chamber, where the annular channel penetrates through a cavity wall of the magnetron sputtering chamber and has a part of the channel located inside the magnetron sputtering chamber.
A second delivery port 700 is also provided in the magnetron sputtering chamber wall for the sample chamber to enter the magnetron sputtering chamber. The first delivery port 300 and the second delivery port 700 may be provided with a first isolation valve and a second isolation valve, the annular channel is separated into a first vacuum area 4001 and a second vacuum area 4002 by the first isolation valve and the second isolation valve, when the first isolation valve and/or the second isolation valve is opened, the first vacuum area 4001 and the second vacuum area 4002 are communicated, and when the first isolation valve and the second isolation valve are closed, the first vacuum area 4001 and the second vacuum area 4002 are isolated. The first vacuum region 4001 is arranged inside the magnetron sputtering chamber and is provided with a first unloading opening of the sampling cabin, and the second vacuum region 4002 is arranged outside the magnetron sputtering chamber and is provided with a second unloading opening of the sampling cabin.
At this time, a sampling cabin in-out control part is also arranged corresponding to the conveying channel so as to control the discharging and the entering of the sampling cabin on the conveying channel.
Specifically, the sampling chamber access control section is configured to: the sampling cabins after the control sampling enter the first vacuum region through the first unloading openings of the sampling cabins, the sampling cabins are sequentially connected end to end in the first vacuum region, and the first unloading openings of the sampling cabins are controlled to be closed so as to be sealed and isolated from the inside of the magnetron sputtering chamber; and controlling a first isolation valve on the first conveying port to be opened, and after the conveying power device conveys the sampling cabin in the first vacuum region to the second vacuum region through the first conveying port, controlling the first isolation valve to be closed, so as to finish the discharging operation of the sampling cabin chain. Then, a second unloading opening of the sampling cabin in the second vacuum area can be controlled to be opened so as to take out all the sampling cabins, and sample detection is carried out on the sampling cabins; after the corresponding sample detection is completed, a plurality of sampling cabins can be controlled to be put back into a second vacuum area through a second unloading port of the sampling cabin; when the fact that the sampling cabins of the preset number are loaded in the second vacuum area is monitored, the second unloading opening of the sampling cabins is closed, and then the second vacuum area and the sampling cabins are subjected to purification and vacuumizing treatment; after the vacuumizing treatment is finished, a second isolation valve on a second conveying port is controlled to be opened, and after the conveying power device conveys the sampling cabin in the second vacuum area to the first vacuum area, the second isolation valve is controlled to be closed, the sampling cabin reenters the magnetron sputtering cavity, and the entering operation of a sampling cabin chain is completed.
In this way, the conveying channel with the annular structure is used for completing the discharge and the entry of the sampling cabin chain from the magnetron sputtering chamber, and the high vacuum environment of the magnetron sputtering chamber is not affected.
Referring to fig. 7, in another embodiment of the present invention, a method for detecting samples during a magnetron sputtering process is provided. The method comprises the following steps.
S100, acquiring a sampling sample through a sampling cabin; the sampling cabins are connected end to end in the magnetron sputtering chamber to form a sampling cabin chain.
S200, controlling the sampling cabin chain to enter a conveying channel, wherein the conveying channel is in butt joint with a first conveying port, and the first conveying port is arranged on the cavity wall of the magnetron sputtering cavity.
And S300, sequentially discharging a plurality of sampling cabins of the sampling cabin chain through the first conveying port, so that corresponding sampling samples are sequentially conveyed from the inside of the magnetron sputtering chamber to the outside of the magnetron sputtering chamber.
Other technical features are described in the previous embodiments and are not described in detail here.
In another embodiment of the present invention, a magnetron sputtering system is also provided. The system comprises a magnetron sputtering device, a sampling device and a detection device.
The magnetron sputtering device comprises a vacuum container, a magnetron sputtering chamber is formed in the vacuum container, the magnetron sputtering chamber is provided with a sputtering mechanism and a substrate to be coated, and the sputtering mechanism is used for generating target atoms for film making.
The sampling device comprises the components described in the previous embodiment.
The detection device is used for detecting the sampling sample conveyed to the outside of the magnetron sputtering chamber.
Other technical features are described in the previous embodiments and are not described in detail here.
In the above description, the disclosure of the present invention is not intended to limit itself to these aspects. Rather, the components may be selectively and operatively combined in any number within the scope of the present disclosure. In addition, terms like "comprising," "including," and "having" should be construed by default as inclusive or open-ended, rather than exclusive or closed-ended, unless expressly defined to the contrary. All technical, scientific, or other terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Common terms found in dictionaries should not be too idealized or too unrealistically interpreted in the context of the relevant technical document unless the present disclosure explicitly defines them as such. Any alterations and modifications of the present invention, which are made by those of ordinary skill in the art based on the above disclosure, are intended to be within the scope of the appended claims.
Claims (10)
1. An assembly for use during a magnetron sputtering process, the assembly comprising:
the sampling cabin is used for acquiring a sampling sample and accommodating the sampling sample; wherein, a plurality of sampling cabins in the magnetron sputtering chamber are connected end to form a sampling cabin chain;
the first conveying port is arranged on the cavity wall of the magnetron sputtering cavity, and is in a closed state to keep sealing when the sampling cabin is not conveyed;
and after the sampling cabin chain enters the conveying channel, sequentially discharging a plurality of sampling cabins of the sampling cabin chain through the first conveying port, so that corresponding sampling samples are sequentially conveyed from the inside of the magnetron sputtering chamber to the outside of the magnetron sputtering chamber.
2. The assembly of claim 1, wherein: the sampling cabin is of a strip-shaped structure with smooth edges, the conveying channel is a strip-shaped cavity and can accommodate the sampling cabin chain, and the sampling cabin chain is conveyed to the first conveying port through the conveying channel.
3. An assembly as claimed in claim 2, wherein: the first conveying port comprises a squeezing port capable of being opened or closed, and a channel of the squeezing port comprises a squeezing part capable of being sealed with the outer surface of the sampling cabin in a squeezing mode when the sampling cabin passes through; when the sampling cabin enters the extrusion port, the extrusion port is converted from a closed state to an open state so that the sampling cabin just passes through, and the extrusion part keeps an extruded state until the sampling cabin leaves the extrusion port when the sampling cabin passes through; before the sampling cabin leaves the extruding port, the channel of the extruding port is restored to a closed state;
And a sampling cabin driving device is arranged on the inner side or the outer side of the magnetron sputtering chamber corresponding to the conveying channel, and the sampling cabin in the conveying channel is driven by the sampling cabin driving device to pass through the extrusion port.
4. An assembly according to claim 3, wherein: the sampling cabins are connected through cabin connecting pieces;
the tail part of each sampling cabin is provided with the cabin connecting piece for separable connection with the head part of the next sampling cabin, and a plurality of sampling cabins are sequentially connected end to end through the cabin connecting pieces to form a chain structure; when one sampling pod is being ejected, it can be separated from the head of the next sampling pod by the pod connector.
5. The assembly of claim 4, further comprising a sampling chamber exhaust control and a sampling chamber output counter; the sampling cabin discharge control part is used for processing the sampling cabin discharge instruction and controlling the sampling cabin driving device to work; the sampling cabin output counter is used for counting the sampling cabins passing through the extrusion port;
the sampling chamber drive control section is configured to perform the steps of:
s11, receiving a sampling cabin discharge instruction, and acquiring the number M of sampling cabins to be discharged in the sampling cabin discharge instruction;
S12, starting a sampling cabin driving device to apply thrust to a first sampling cabin positioned at the extrusion port so as to enable the whole sampling cabin chain to move towards the extrusion port at the front end, and enabling the first sampling cabin positioned at the forefront to apply pressure to the extrusion port, wherein the extrusion port is converted from a closed state to an open state under the action of the pressure so as to enable the sampling cabin to pass through; when the tail part of the sampling cabin is about to be discharged, separating a cabin connecting piece of the tail part from the head part of the next sampling cabin, and controlling the extrusion port to return to a closed state, wherein the tail part of the first sampling cabin is still kept sealed with the extrusion part of the extrusion port;
s13, driving the first sampling cabin to continue to move so as to leave the extrusion port, and adding one to the count value of the sampling cabin output counter when the tail part of the first sampling cabin is separated from the extrusion port;
s14, judging whether the current count value Q of the sampling cabin output counter is equal to M; if the determination is not equal, the process returns to step S12; otherwise, executing step S15;
and S15, ending the sampling cabin discharging operation.
6. An assembly according to claim 3, wherein: the sampling samples are sampling strip lines, and the sampling strip lines are continuously arranged in the sampling cabins so that the sampling cabins are connected end to form a chain structure;
The sampling strip line comprises a sampling section and a non-sampling section, the sampling section is positioned in a sampling cabin, the sampling cabin is controlled to open a sampling port for sampling when sampling is needed, and the sampling cabin is controlled to close the sampling port when sampling is completed; adjacent sampling cabins are connected through the non-sampling section; a thread cutting mechanism is arranged at the tail part of each sampling cabin and used for cutting off sampling threads, so that one sampling cabin can be separated from the head part of the next sampling cabin when being discharged.
7. The assembly of claim 1, wherein: the conveying channel is of an annular structure and comprises an annular channel for accommodating the sampling cabin and a conveying power device for conveying the sampling cabin, wherein the annular channel penetrates through the cavity wall of the magnetron sputtering cavity and is provided with partial channels inside the magnetron sputtering cavity;
the magnetron sputtering chamber is characterized in that a second conveying port is further formed in the chamber wall of the magnetron sputtering chamber and used for enabling the sampling chamber to enter the magnetron sputtering chamber, a first isolation valve and a second isolation valve are respectively arranged on the first conveying port and the second conveying port, the annular channel is divided into a first vacuum area and a second vacuum area by the first isolation valve and the second isolation valve, the first vacuum area is communicated with the second vacuum area when the first isolation valve and/or the second isolation valve are opened, and the first vacuum area is isolated from the second vacuum area when the first isolation valve and the second isolation valve are closed; the first vacuum area is arranged inside the magnetron sputtering chamber and is provided with a first unloading opening of the sampling cabin, and the second vacuum area is arranged outside the magnetron sputtering chamber and is provided with a second unloading opening of the sampling cabin.
8. The assembly of claim 7, wherein: a sampling cabin inlet and outlet control part is arranged corresponding to the conveying channel so as to control the discharge and the inlet of the sampling cabin on the conveying channel;
the sampling chamber access control section is configured to:
the sampling cabins after the control sampling enter the first vacuum region through the first unloading openings of the sampling cabins, the sampling cabins are sequentially connected end to end in the first vacuum region, and the first unloading openings of the sampling cabins are controlled to be closed so as to be sealed and isolated from the inside of the magnetron sputtering chamber; the method comprises the steps of controlling a first isolation valve on a first conveying port to be opened, conveying a sampling cabin of the first vacuum region to a second vacuum region through the first conveying port by a conveying power device, and controlling the first isolation valve to be closed to finish the discharging operation of a sampling cabin chain; the method comprises the steps of,
when the fact that the sampling cabins of a preset number are loaded in the second vacuum area is monitored, after a second unloading opening of the sampling cabins is closed, purifying and vacuumizing the second vacuum area and the sampling cabins; after the vacuumizing treatment is finished, a second isolation valve on a second conveying port is controlled to be opened, and after the conveying power device conveys the sampling cabin in the second vacuum area to the first vacuum area, the second isolation valve is controlled to be closed, the sampling cabin reenters the magnetron sputtering cavity, and the entering operation of a sampling cabin chain is completed.
9. A sampling detection method in the magnetron sputtering treatment process is characterized by comprising the following steps:
obtaining a sampling sample through a sampling cabin; the sampling cabins are connected end to end in the magnetron sputtering chamber to form a sampling cabin chain;
controlling a sampling cabin chain to enter a conveying channel, wherein the conveying channel is in butt joint with a first conveying port, and the first conveying port is arranged on the cavity wall of the magnetron sputtering cavity;
and sequentially discharging a plurality of sampling cabins of the sampling cabin chain through the first conveying port, so that corresponding sampling samples are sequentially conveyed from the inside of the magnetron sputtering chamber to the outside of the magnetron sputtering chamber.
10. A magnetron sputtering system, characterized in that: comprises a magnetron sputtering device, a sampling device and a detection device; the magnetron sputtering device comprises a vacuum container, a magnetron sputtering chamber is formed in the vacuum container, the magnetron sputtering chamber is provided with a sputtering mechanism and a substrate to be coated, and the sputtering mechanism is used for generating target atoms for film preparation;
the sampling device comprising the assembly of any one of claims 1-8;
the detection device is used for detecting the sampling sample conveyed to the outside of the magnetron sputtering chamber.
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