CN117144314A - Curved glass coating production line - Google Patents

Curved glass coating production line Download PDF

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Publication number
CN117144314A
CN117144314A CN202311024936.3A CN202311024936A CN117144314A CN 117144314 A CN117144314 A CN 117144314A CN 202311024936 A CN202311024936 A CN 202311024936A CN 117144314 A CN117144314 A CN 117144314A
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CN
China
Prior art keywords
magnetron sputtering
chamber
curved glass
vacuum chamber
inlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202311024936.3A
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Chinese (zh)
Inventor
徐伯永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Yindu Energy Conservation Technology Co ltd
Original Assignee
Guangdong Yindu Solar Energy Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Yindu Solar Energy Technology Co ltd filed Critical Guangdong Yindu Solar Energy Technology Co ltd
Priority to CN202311024936.3A priority Critical patent/CN117144314A/en
Publication of CN117144314A publication Critical patent/CN117144314A/en
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention relates to the field of curved glass coating, in particular to a curved glass coating production line. The utility model provides a curved glass coating production line, including transport mechanism and the magnetron sputtering room that sets up along transport route of transport mechanism, including the fixed frock of being conveyed by transport mechanism, after fixed curved glass of fixed frock, transport mechanism is together with curved glass to be placed fixed frock on it and send the magnetron sputtering room. The curved glass coating production line can drive the curved glass arranged on the production line to stably go to the magnetron sputtering chamber for magnetron sputtering coating, so that the curved glass is not easy to deviate in the advancing process, and the coating effect is good.

Description

Curved glass coating production line
Technical Field
The invention relates to the field of curved glass coating, in particular to a curved glass coating production line.
Background
The performance of the glass can be obviously improved after the glass is coated, common glass coating processes such as a magnetron sputtering coating process are usually performed on the surface of the glass by using a sputtering target material, and the sputtering target material enables a plurality of nano film layers to be deposited on the surface of the glass under the action of a magnetic field, so that the coated glass with good performance and wide application range is prepared. The performance of the coated glass is affected by factors such as uniformity of the thickness of the film, and if the thickness of the film is uneven, the performance of the coated glass is poor. In actual production, if a large piece of plate-shaped glass is subjected to magnetron sputtering coating, production personnel usually place the glass to be coated on a conveying mechanism consisting of a plurality of driving rollers, and the glass is conveyed to a magnetron sputtering chamber for coating by the plurality of driving rollers. The existing plate glass to be coated can be paved on a plurality of driving rollers in a whole way after being placed on a conveying mechanism, and is in surface contact with the plurality of conveying rollers, so that the plate glass is not easy to deviate in the whole process driven by the conveying rollers, and the coating effect is good.
Disclosure of Invention
The technical problem to be solved by the invention is to provide a curved glass coating production line which can drive curved glass arranged on the production line to stably go to a magnetron sputtering chamber for magnetron sputtering coating, so that the curved glass is not easy to deviate in the advancing process, and the coating effect is good.
In order to solve the problems, the invention provides a curved glass coating production line which comprises a conveying mechanism and a magnetron sputtering chamber arranged along a conveying route of the conveying mechanism, wherein the magnetron sputtering chamber comprises a fixed tool conveyed by the conveying mechanism, and after the curved glass is fixed by the fixed tool, the conveying mechanism sends the fixed tool arranged on the fixed tool and the curved glass to the magnetron sputtering chamber.
Wherein the conveying mechanism comprises a left conveying belt and a right conveying belt; the fixed frock is equipped with left flank and the right flank of placing respectively on left conveyer belt and right conveyer belt, and left conveyer belt and right conveyer belt pass through the flank of conveying fixed frock, send fixed frock of fixed curved surface glass to magnetron sputtering room.
The fixing tool comprises a frame body, and the side wings are specifically arranged at two sides of the frame body; the area between the left conveyor belt and the right conveyor belt is left blank to expose the lower part of the frame body; the lower part of the frame body is correspondingly provided with a hollow area for exposing the downward back surface of the curved glass.
And the magnetron sputtering equipment is arranged below the conveying mechanism in the magnetron sputtering chamber, is upwards aligned to a region between the left conveying belt and the right conveying belt, and performs magnetron sputtering coating on the downward back surface of the curved glass in the passing fixed tool.
The magnetron sputtering device comprises a pre-vacuum chamber and a recovery air pressure chamber, wherein the pre-vacuum chamber, the magnetron sputtering chamber and the recovery air pressure chamber are arranged in the conveying direction of a conveying mechanism and are sequentially adjacent, an inlet of the magnetron sputtering chamber is communicated with an outlet of the pre-vacuum chamber, and an outlet of the magnetron sputtering chamber is communicated with an inlet of the recovery air pressure chamber.
Wherein, a first lifting flashboard is arranged at any position from the inlet of the magnetron sputtering chamber to the outlet of the pre-vacuum chamber for sealing; and/or a second lifting flashboard is arranged at any position from the outlet of the magnetron sputtering chamber to the inlet of the recovery air pressure chamber for sealing.
The magnetron sputtering chamber is provided with an air supply pump near the outlet of the magnetron sputtering chamber, and the air supply pump is arranged near the inlet of the magnetron sputtering chamber.
Wherein, a first sealing piece is arranged between the magnetron sputtering chamber and the pre-vacuum chamber, and/or a second sealing piece is arranged between the magnetron sputtering chamber and the recovery air pressure chamber.
Wherein, the inlet of the pre-vacuum chamber is provided with a sealing gate which can be opened outwards; and/or the outlet of the recovery air pressure chamber is provided with a sealing gate which can be opened outwards.
The beneficial effects are that: when the magnetron sputtering coating is required to be carried out on the curved glass, production personnel firstly fix the curved glass by using a fixing tool, then the fixing tool and the fixed curved glass are placed on a conveying mechanism together, and the conveying mechanism drives the curved glass to go to a magnetron sputtering chamber for magnetron sputtering. The curved glass is fixed by the fixed tool, so that the curved glass is not easy to deviate in the process of being driven by the conveying mechanism to go to the magnetron sputtering chamber for magnetron sputtering coating, and the coating layer is uniform when the magnetron sputtering coating is carried out, and the coating effect is good.
Drawings
FIG. 1 is a schematic diagram of a curved glass coating line.
Fig. 2 is a schematic diagram of the structure of the second pre-vacuum chamber.
Fig. 3 is a schematic cross-sectional view taken along the direction A-A in fig. 1.
Fig. 4 is a schematic diagram of the structure of the pre-vacuum chamber in fig. 3.
Fig. 5 is a schematic diagram of the structure of fig. 3 after the pre-vacuum chamber is eliminated.
Fig. 6 is a schematic diagram of the structure of the fixture.
Fig. 7 is a partial exploded view of the fixture.
Fig. 8 is a schematic diagram of the structure of the fixed curved glass of the fixed tooling.
Symbol description:
1-a production line; 21-a first pre-vacuum chamber; 211-a first pre-vacuum chamber inlet; 212-a first pre-vacuum chamber outlet; 213-a sealed shutter of the first pre-vacuum chamber; 214-an aspiration pump of the first pre-vacuum chamber; 22-a second pre-vacuum chamber; 221-a second pre-vacuum chamber inlet; 222-a second pre-vacuum chamber outlet; 223-a sealing gate of a second pre-vacuum chamber; 224-an aspiration pump of a second pre-vacuum chamber; 225-an annular seal groove; 31-a first magnetron sputtering chamber; 311-a first magnetron sputtering chamber inlet; 312-a first magnetron sputtering chamber outlet; 313-lifting flashboard of the first magnetron sputtering chamber; 314—an extraction pump of a first magnetron sputtering chamber; 315-an air supply pump of the first magnetron sputtering chamber; 316-magnetron sputtering equipment of a first magnetron sputtering chamber; 32-a second magnetron sputtering chamber; 321-a second magnetron sputtering chamber inlet; 322-a second magnetron sputtering chamber outlet; 323-lifting flashboard of the second magnetron sputtering chamber; 324-an air pump of a second magnetron sputtering chamber; 325-an air supply pump of a second magnetron sputtering chamber; 326-magnetron sputtering equipment of a second magnetron sputtering chamber; 4-restoring the air pressure chamber; 41-restoring the air pressure chamber inlet; 42-restoring the pneumatic chamber outlet; 43-lifting flashboard of the recovery air pressure chamber; 44-sealing gate of recovery air pressure chamber; 45-an air pump for recovering the air pressure chamber; 46-a gas supply pump to restore the gas pressure chamber; 511-left conveyor of the first pre-vacuum chamber; 512-left conveyor belt of the second pre-vacuum chamber; 513-a left conveyor belt of the first magnetron sputtering chamber; 514-left conveyor belt of the second magnetron sputtering chamber; 515-left conveyor belt restoring the pneumatic chamber; 52-a guide pulley; 6-fixing the tool; 61-a frame body; 62-moving member; 63-a slider; 631-clamping blocks; 632-a fixed part; 64-left flank; 65-right flank; 7-curved glass.
Detailed Description
The invention is further described in detail below in connection with the detailed description.
Referring to fig. 1, the curved glass coating line 1 includes a conveying mechanism (not shown) and a first pre-vacuum chamber 21, a second pre-vacuum chamber 22, a first magnetron sputtering chamber 31, a second magnetron sputtering chamber 32 and a recovery air pressure chamber 4 arranged in a conveying direction of the conveying mechanism. The production line 1 further comprises a plurality of fixed fixtures 6 (see fig. 8), the fixed fixtures 6 can be placed on a conveying mechanism after fixing the curved glass 7, and the curved glass 7 which is fixed in the fixed fixtures 6 is subjected to magnetron sputtering coating by the magnetron sputtering equipment in the magnetron sputtering chambers 31 and 32 through the first pre-vacuum chamber 21, the second pre-vacuum chamber 22, the first magnetron sputtering chamber 31, the second magnetron sputtering chamber 32 and the recovery air pressure chamber 4 in sequence by being conveyed forward by the conveying mechanism. The specific structure of each of the chambers and each of the mechanisms will be described in detail below.
See fig. 3, the first pre-vacuum chamber 21, the second pre-vacuum chamber 22, the first magnetron sputtering chamber 31, the second magnetron sputtering chamber 32 and the recovery air pressure chamber 4 are sequentially adjacent, and all of them are partially left blank on their own rear end plate to form an inlet and partially left blank on their own front end plate to form an outlet, see fig. 4 and 5, wherein: the outlet 212 of the first pre-vacuum chamber 21 is in communication with the inlet 221 of the second pre-vacuum chamber 22; the outlet 222 of the second pre-vacuum chamber 22 is communicated with the inlet 311 of the first magnetron sputtering chamber 31; the outlet 312 of the first magnetron sputtering chamber 31 is communicated with the inlet 321 of the second magnetron sputtering chamber 32; the outlet 322 of the second magnetron sputtering chamber 32 is communicated with the inlet 41 of the recovery air pressure chamber 4. To prevent leakage from the connection between each outlet and inlet, a seal is provided between adjacent chambers, for example, see fig. 2, an annular seal groove 225 is provided in the rear end plate of the second pre-vacuum chamber 22, which surrounds the outside of the inlet 221 in the rear end plate of the second pre-vacuum chamber 22. An annular seal (not shown) is accommodated in the annular seal groove 225, and in a state where the first pre-vacuum chamber 21 and the second pre-vacuum chamber 22 are adjacently mounted together, the annular seal seals a connection between the outlet 212 of the first pre-vacuum chamber 21 and the inlet 221 of the second pre-vacuum chamber 22 by sandwiching the annular seal between the rear end surface of the first pre-vacuum chamber 21 and the front end surface of the second pre-vacuum chamber 22. The rear end plate of the first magnetron sputtering chamber 31, the rear end plate of the second magnetron sputtering chamber 32, and the rear end plate of the recovery air pressure chamber 4 are provided with annular seal grooves and annular seal strips to serve as sealing members, and are not described in detail herein.
Referring to fig. 4, a sealing shutter 213 is provided outside the inlet 211 of the first pre-vacuum chamber 21 to seal, and the sealing shutter 213 can be opened rearward and outward to expose the inlet 211. Four pumps 214 (specifically, molecular pumps) are disposed on the left and right sides of the first pre-vacuum chamber 21, wherein the front two pumps 214 (one on each of the left and right sides) are close to the inlet 211 of the first pre-vacuum chamber 21, and the rear two pumps 214 are close to the outlet 212, and each pump 214 can pump air from the first pre-vacuum chamber 21. The left and right inner walls of the first pre-vacuum chamber 21 are respectively provided with a left conveyor belt 511 and a right conveyor belt, the left and right conveyor belts 511 and 511 are bilaterally symmetrical and are horizontally arranged front and back, the initial ends of the two belts are close to and aligned with the inlet 211 of the first pre-vacuum chamber 21, and the tail ends of the two belts are close to and aligned with the outlet 212. The second pre-vacuum chamber 22 is basically identical in structure to the first pre-vacuum chamber 21, and is also provided with a sealing shutter 223 (which protrudes into the first pre-vacuum chamber 21 from the outlet 212 of the first pre-vacuum chamber 21 when opened backward), an air pump 224, a left conveyor 512 and a right conveyor, except that the number of the air pumps 224 of the second pre-vacuum chamber 22 is four, and is provided on the left side and the right side of the second pre-vacuum chamber 22, respectively.
Referring to fig. 5, a lifting shutter 313 is provided inside the inlet 311 of the first magnetron sputtering chamber 31, and rises to block the inlet 311, i.e., seal the inlet 311, and falls to re-expose the inlet 311. Three gas supply pumps 315 are provided on the left and right sides of the first magnetron sputtering chamber 31, and the gas supply pumps 315 are located near the inlet 311 of the first magnetron sputtering chamber 31, so that inert gas such as argon gas can be supplied to the first magnetron sputtering chamber 31. Two air sucking pumps 314 (specifically, molecular pumps) are arranged in front of the bottom surface of the first magnetron sputtering chamber 31, and the two air sucking pumps 314 are close to the inlet 311 of the first magnetron sputtering chamber 31, so that air can be sucked into the first magnetron sputtering chamber 31. The left and right inner walls of the first magnetron sputtering chamber 31 are also provided with a left conveyor belt 513 and a right conveyor belt, respectively, the left and right conveyor belts 513 and 513 of the first magnetron sputtering chamber 31 are substantially identical in structure and only different in length, and the left and right conveyor belts 513 and 513 of the first magnetron sputtering chamber 31 are each provided with two sections, both of which are arranged horizontally front and rear between the inlet 311 and the outlet 312 of the first magnetron sputtering chamber 31. Four magnetron sputtering devices 316 are sequentially arranged at the bottom of the first magnetron sputtering chamber 31 in a front-back mode, are positioned at the rear sides of the two air sucking pumps 314 of the first magnetron sputtering chamber 31, and can perform magnetron sputtering on the passing curved glass 7 upwards. The second magnetron sputtering chamber 32 has substantially the same structure as the first magnetron sputtering chamber 31, and is provided with a lift gate 323, an air supply pump 325, an air suction pump 324, a magnetron sputtering device 326, a left conveyor 514 and a right conveyor, and differs only in that: six air supply pumps 325 are respectively arranged on the left side and the right side of the second magnetron sputtering chamber 32, and the front three of the six air supply pumps 325 on the same side are close to the inlet 321 and the rear three of the six air supply pumps 325 on the same side are close to the outlet 322 of the second magnetron sputtering chamber 32; the second magnetron sputtering chamber 32 is provided with two air pumps 324 near the inlet 321 at the front part of the bottom surface, two air pumps 324 (specifically molecular pumps) near the outlet 322 at the rear part of the bottom surface, and the two air pumps 324 at the rear part of the bottom surface and the two air pumps 324 at the front part of the bottom surface are arranged in a front-back symmetry manner; the number of magnetron sputtering devices 326 of the second magnetron sputtering chamber 32 is three.
The inner side of the inlet 41 of the recovery air pressure chamber 4 is provided with a lifting flashboard 43 which is the same as that of the magnetron sputtering chambers 31 and 32, the outer side of the outlet 42 is provided with a sealing gate 44 which is the same as that of the pre-vacuum chamber, and the sealing gate 44 of the recovery air pressure chamber 4 is opened frontward and outwards. The left and right sides of the recovery air pressure chamber 4 are respectively provided with an air supply pump 46 for supplying air to the recovery air pressure chamber 4 and an air pump 45 for exhausting air to the recovery air pressure chamber 4, the air pump 45 is close to the inlet 41, and the air supply pump 46 is close to the outlet 42. The left and right inner walls of the recovery air pressure chamber 4 are also provided with a left conveyor belt 515 and a right conveyor belt, respectively, which are arranged in a back-and-forth horizontal manner, with the start ends of the two belts being adjacent to and aligned with the inlet 41 and the end ends of the two belts being adjacent to and aligned with the outlet 42 of the recovery air pressure chamber 4. In the present embodiment, the lifting shutters 313, 323, 43 are provided inside the inlet 311 of the first magnetron sputtering chamber 31, inside the inlet 321 of the second magnetron sputtering chamber 32, and inside the inlet 41 of the recovery gas pressure chamber 4, respectively, to seal the respective inlets so that the connected inlet and outlet cannot be connected. In other embodiments, the lift gates 313, 323, 43 may instead be provided at any of the inlet 311 of the first magnetron sputtering chamber 31 to the outlet 222 of the second pre-vacuum chamber 22, at any of the inlet 321 of the second magnetron sputtering chamber 32 to the outlet 312 of the first magnetron sputtering chamber 31, and at any of the inlet 41 of the recovery gas pressure chamber 4 to the outlet 322 of the second magnetron sputtering chamber 32. The curved glass coating production line 1 is provided with a controller (not shown in the figure) which is provided with a control program in advance, and the controller controls and connects the sealing gate, the lifting gate plate, the air pump, the air supply pump, the magnetron sputtering equipment, the left conveyor belt, the right conveyor belt and other parts of each chamber one by one.
Referring to fig. 3, the left conveyors 511, 512, 513, 514, 515 and the right conveyor of the first pre-vacuum chamber 21, the second pre-vacuum chamber 22, the first magnetron sputtering chamber 31, the second magnetron sputtering chamber 32 and the recovery air pressure chamber 4 are used as conveying mechanisms together, and the conveyors of the five conveyors are located at the same height and are used for conveying the fixing tool 6 (see fig. 8) and the curved glass 7 fixed by the fixing tool. Referring to fig. 6 and 7, the fixing tool 6 has a frame body 61 with a rectangular outer contour, and left and right sides of the frame body 61 respectively extend to form left and right side wings 64 and 65, and the left and right side wings 64 and 65 can be driven and conveyed by left and right conveyor belts 511, 512, 513, 514, 515 (see fig. 3) respectively. The frame body 61 is hollow and vertically penetrated (the upper part and the lower part are both provided with a hollow area), a left moving part and a right moving part 62 are arranged at the hollow part of the frame body 61, the two moving parts 62 are symmetrically arranged left and right, the front end and the rear end of each moving part 62 are detachably clamped with the front frame edge and the rear frame edge of the frame body 61 respectively, and the clamped moving parts 62 can transversely move in the left and right directions along the front frame edge and the rear frame edge relative to the frame body 61. Each moving member 62 is provided with two sliding blocks 63 in front and back, the two sliding blocks 63 are symmetrically arranged in front and back, the lower part of each sliding block 63 is a fixing part 632 made of insulating materials, the upper part of each sliding block is a clamping block 631, and the clamping blocks 631 of the sliding blocks 63 are detachably clamped on the moving member 62 to finish the installation, so that the sliding members 62 can transversely move in the front and back directions. When the curved glass 7 needs to be fixed by the fixing tool 6, a producer firstly operates the two moving parts 62 to transversely move in the left-right direction and operates the four sliding blocks 63 to transversely move in the front-back direction so as to make a space for placing the curved glass 7; then, the producer manually moves the two moving members 62 and the four sliding blocks 63 laterally toward the curved glass 7 (inward) while putting the curved glass 7 into the space until the fixing portions 632 of the four sliding blocks 63 hold and clamp four corners of the curved glass 7 together, and as shown in fig. 8, the fixing tool 6 fixes the curved glass 7.
Referring to fig. 3 and 8, after the curved glass 7 is fixed by the fixing tool 6, the producer needs to place the fixing tool 6 and the fixed curved glass 7 on the conveying mechanism, and the conveying mechanism drives the fixed tool 6 with the fixed curved glass 7 to sequentially move to the first pre-vacuum chamber 21, the second pre-vacuum chamber 22, the first magnetron sputtering chamber 31, the second magnetron sputtering chamber 32 and the recovery air pressure chamber 4, that is, the producer needs to place the left flank 64 and the right flank 65 of the fixed tool 6 on the left conveyor 511 and the right conveyor 511 of the first pre-vacuum chamber 21, respectively, so that the left conveyor 511 and the right conveyor 511 of the first pre-vacuum chamber 21 drive the fixed tool 6 to move forward to the second pre-vacuum chamber 22 by driving the left flank 64 and the right flank 65 of the fixed tool 6, until the left flank 64 and the right flank 65 of the fixed tool 6 fall to the left conveyor 512 and the right conveyor 512 of the second pre-vacuum chamber 22, and the fixed tool 6 is changed from being driven by the left conveyor 511 and the right conveyor 511 of the first pre-vacuum chamber 21 to being driven by the left conveyor 512 and the right conveyor 512 of the second pre-vacuum chamber 6. The fixed tooling 6 sequentially passes through the first pre-vacuum chamber 21, the second pre-vacuum chamber 22, the first magnetron sputtering chamber 31, the second magnetron sputtering chamber 32 and the recovery air pressure chamber 4 under the sequential driving of the left conveying belt 511, 512, 513, 514, 515 and the right conveying belt of each chamber. The conveyor belts of each section are preferably conveyed forward at the same conveying speed to guide the fixed tooling 6, and the inward side of each conveyor belt of each section is provided with a plurality of guide pulleys 52. In addition, it should be noted that the distance between two adjacent conveyor belts in front and back should be smaller than the length of the fixed tooling 6 in the front and back direction, so as to ensure that the last conveyor belt can forward convey the fixed tooling 6 before the fixed tooling 6 falls onto the next conveyor belt.
Referring to fig. 3 to 5, before a manufacturer places the fixed tool 6 (see fig. 8) on the transfer mechanism, the controller controls all sealing gates 213, 223, 44 in the five chambers of the first pre-vacuum chamber 21, the second pre-vacuum chamber 22, the first magnetron sputtering chamber 31, the second magnetron sputtering chamber 32, and the recovery air pressure chamber 4 to be in a closed state, and all lifting gates 313, 323, 43 are located at the top dead center to block and seal the corresponding inlets, and at this time, each chamber forms a closed space because the respective inlets and outlets are sealed; the controller also controls the left and right conveyors 511, 512, 513, 514, 515 of the five chambers to drive at the same conveying speed. The producer first controls the sealing shutter 213 of the first pre-vacuum chamber 21 to open to expose the inlet 211 through the controller, then aligns and places the left flank 64 and the right flank 65 of the fixed tooling 6 from the inlet 211 of the first pre-vacuum chamber 21 to the left conveyor 511 and the right conveyor in the first pre-vacuum chamber 21, and the fixed tooling 6 having the curved glass 7 fixed thereto is fed into the first pre-vacuum chamber 21 by the left conveyor 511 and the right conveyor to be conveyed toward the outlet 212 of the first pre-vacuum chamber 21. After the fixed tooling 6 completely enters the first pre-vacuum chamber 21, the controller controls the sealing gate 213 of the first pre-vacuum chamber 21 to be closed so as to seal the inlet 211, so that a sealed space is formed inside the first pre-vacuum chamber 21, and at the moment, the controller controls the air pump 214 of the first pre-vacuum chamber 21 to start and pump out part of the air in the first pre-vacuum chamber 21. Before the fixed tooling 6 reaches the outlet 212 of the first pre-vacuum chamber 21, the controller controls the sealing gate 223 of the second pre-vacuum chamber 22 to open backward and outward to expose the inlet 221 of the second pre-vacuum chamber 22, so that the inlet 221 of the second pre-vacuum chamber 22 is communicated with the outlet 212 of the first pre-vacuum chamber 21, and the fixed tooling 6 and the fixed curved glass 7 enter the second pre-vacuum chamber 22 from the outlet 212 of the first pre-vacuum chamber 21 through the inlet 221 of the second pre-vacuum chamber 22 under the conveying of the left conveying belt 511 and the right conveying belt of the first pre-vacuum chamber 21, and are driven by the left conveying belt 512 and the right conveying belt of the second pre-vacuum chamber 22 to advance towards the outlet 222 of the second pre-vacuum chamber 22. After the fixed tooling 6 completely enters the second pre-vacuum chamber 22, the controller controls the sealing gate 223 of the second pre-vacuum chamber 22 to be closed so as to seal the inlet 221, so that a sealed space is formed inside the second pre-vacuum chamber 22, and at the moment, the controller controls the air pump 224 of the second pre-vacuum chamber 22 to start and pump most of air in the second pre-vacuum chamber 22, so that conditions are provided for subsequent magnetron sputtering.
Before the fixed tooling 6 arrives, the first magnetron sputtering chamber 31 and the second magnetron sputtering chamber 32 are pumped by the pumping pumps 314 and 324 under the control of the controller, so that the chambers are as close to vacuum as possible, and the influence of impurities in the air on the subsequent magnetron sputtering coating is avoided. Before the fixed tooling 6 reaches the outlet 222 of the second pre-vacuum chamber 22, the controller controls the lifting flashboard 313 of the first magnetron sputtering chamber 31 to descend and open so as to expose the inlet 311 of the first magnetron sputtering chamber 31, and the inlet 311 of the first magnetron sputtering chamber 31 is communicated with the outlet 222 of the second pre-vacuum chamber 22. In this process, the controller controls the air supply pump 315 of the first magnetron sputtering chamber 31 near the inlet 311 to start and continuously supply air (inert gas such as argon) to the first magnetron sputtering chamber 31, and controls the air pump 224 of the second pre-vacuum chamber 22 to keep starting and continuously pump air to the second pre-vacuum chamber 22, so that the air in the first magnetron sputtering chamber 31 flows to the second pre-vacuum chamber 22, and the air in the second pre-vacuum chamber 22 is not easy to reversely flow to the first magnetron sputtering chamber 31 to cause pollution. In other embodiments, the air supply pump 315 of the first magnetron sputtering chamber 31 near the inlet 311 does not supply air, but instead the air pump 314 pumps air, so that after the inlet 311 of the first magnetron sputtering chamber 31 is connected to the outlet 222 of the second pre-vacuum chamber 22, the residual air in the second pre-vacuum chamber 22 is pumped away by the air pump 314 of the first magnetron sputtering chamber 31 even if flowing to the first magnetron sputtering chamber 31, and the effect of avoiding pollution can be achieved.
After the fixed tooling 6 and the curved glass 7 completely enter the first magnetron sputtering chamber 31, the controller controls the lifting flashboard 313 of the first magnetron sputtering chamber 31 to ascend and reset, and the inlet 311 is resealed, so that a sealed space is formed inside the first magnetron sputtering chamber 31. The controller controls the air supply pump 315 of the first magnetron sputtering chamber 31 to continuously charge inert gas into the first magnetron sputtering chamber 31, after the inert gas is charged in a sufficient amount, the fixed tool 6 and the curved glass 7 are driven by the conveyor belt of the first magnetron sputtering chamber 31 to sequentially pass through four magnetron sputtering devices 316 in the first magnetron sputtering chamber 31 from above, and the controller controls the magnetron sputtering devices 316 to perform magnetron sputtering coating on the downward back surface of the curved glass 7 passing by (each magnetron sputtering device 316 sequentially coats the curved glass 7 with a film layer). Similarly, before the fixed tooling 6 reaches the outlet 312 of the first magnetron sputtering chamber 31, the controller controls the lifting gate 323 of the second magnetron sputtering chamber 32 to descend and open to expose the inlet 321 of the second magnetron sputtering chamber 32, so that the inlet 321 of the second magnetron sputtering chamber 32 is communicated with the outlet 312 of the first magnetron sputtering chamber 31. Because the inert gas used by the second magnetron sputtering chamber 32 is different from that used by the first magnetron sputtering chamber 31, in the process that the inlet 321 of the second magnetron sputtering chamber 32 is communicated with the outlet 312 of the first magnetron sputtering chamber 31, the controller controls the air pump 324 of the second magnetron sputtering chamber 32 close to the inlet 321 to start and pump air, and controls the air pump 314 of the first magnetron sputtering chamber 31 to pump air (alternatively, the air pump 315 of the first magnetron sputtering chamber 31 is used for supplying air and the air pump 324 of the second magnetron sputtering chamber 32 close to the inlet 321 is used for pumping air), so that pollution caused by air flow channeling of the first magnetron sputtering chamber 31 and the second magnetron sputtering chamber 32 is avoided. After the fixed tooling 6 and the curved glass 7 completely enter the second magnetron sputtering chamber 32, the controller controls the lifting flashboard 323 of the second magnetron sputtering chamber 32 to ascend, reset and reseal the inlet 321, so that a sealed space is formed inside the second magnetron sputtering chamber 32, then the controller controls the air supply pump 325 of the second magnetron sputtering chamber 32 to continuously charge inert gas into the second magnetron sputtering chamber 32, after the inert gas is filled in a sufficient amount, the fixed tooling 6 and the curved glass 7 are driven by the conveyor belt of the second magnetron sputtering chamber 32 to sequentially pass through three magnetron sputtering devices 326 in the second magnetron sputtering chamber 32 from above, and the controller controls the magnetron sputtering devices 326 to perform magnetron sputtering coating on the downward back surface of the routed curved glass 7.
Before the fixed tooling 6 reaches the outlet 322 of the second magnetron sputtering chamber 32, the controller controls the lifting flashboard 43 of the recovery air pressure chamber 4 to descend and open to expose the inlet 41 of the recovery air pressure chamber 4, so that the inlet 41 of the recovery air pressure chamber 4 is communicated with the outlet 322 of the second magnetron sputtering chamber 32. Also, in order to prevent the air of the recovery air chamber 4 from flowing into the second magnetron sputtering chamber 32 to cause pollution, the air supply pump 325 of the second magnetron sputtering chamber 32 near the outlet 322 needs to supply air (or the air pump 324 needs to pump air) while the air pump 45 of the recovery air chamber 4 pumps air during the process of connecting the inlet 41 of the recovery air chamber 4 with the outlet 322 of the second magnetron sputtering chamber 32. After the fixed tooling 6 and the coated curved glass 7 completely enter the recovery air pressure chamber 4, the controller controls the lifting flashboard 43 of the recovery air pressure chamber 4 to ascend, reset and reseal the inlet 41, so that a sealed space is formed inside the recovery air pressure chamber 4. Since the pumps 214, 224 of the previous pre-vacuum chambers 21, 22 pump most of the air, and the inert gas filled in the magnetron sputtering chamber during the magnetron sputtering process does not completely fill the whole magnetron sputtering chamber, the air pressure in the sealed space of the recovery air pressure chamber 4 is smaller than the normal atmospheric pressure. After the lifting flashboard 43 is lifted and reset, the controller controls the air pump 45 of the recovery air pressure chamber 4 to stop air suction and controls the air supply pump 46 to start slow air supply, so that the air pressure of the recovery air pressure chamber 4 is slowly recovered to the normal atmospheric pressure, and the defects of cracks and the like when the curved glass 7 directly enters the normal air pressure environment from the negative pressure environment are avoided. After the air pressure of the recovery air pressure chamber 4 is recovered to the normal atmospheric pressure, the controller controls the sealing gate 44 of the recovery air pressure chamber 4 to open forwards and outwards to expose the outlet 42, the fixed tooling 6 and the coated curved glass 7 are driven by the conveyor belt of the recovery air pressure chamber 4 to leave the recovery air pressure chamber 4 from the outlet 42 of the recovery air pressure chamber 4, and the producer can take the fixed tooling 6 from the front of the recovery air pressure chamber 4 to detach the coated curved glass 7 from the fixed tooling 6.
In this embodiment, the left conveyor 511, 512, 513, 514, 515 and the right conveyor of each chamber are all left open (for the fixed tooling 6 to pass through), and the upper and lower parts of the frame body 61 of the fixed tooling 6 are provided with open areas, so that the curved glass 7 fixed on the fixed tooling 6 is exposed from the upward front and the downward back, and the magnetron sputtering devices 316, 326 are arranged at the lower parts of the magnetron sputtering chambers 31, 32, and perform magnetron sputtering coating on the downward back of the curved glass 7. In other embodiments, the magnetron sputtering devices 316 and 326 may be instead arranged at the upper parts of the magnetron sputtering chambers 31 and 32, and the curved glass 7 is subjected to magnetron sputtering coating on the upward front surface; alternatively, magnetron sputtering devices 316 and 326 are arranged at the upper part and the lower part of the magnetron sputtering chambers 31 and 32, and magnetron sputtering coating is carried out on the front surface and the back surface of the curved glass 7 passing by.
In this embodiment, the producer places a fixed fixture 6 with a curved glass 7 fixed to the left and right conveyor belts 511 and 511 of the first pre-vacuum chamber 21, and the fixed fixture 6 is driven by the left and right conveyor belts to be conveyed forward. In other embodiments, a producer can place a plurality of fixing tools 6 at a time according to actual conditions, and the left conveyor belt and the right conveyor belt drive the fixing tools to be conveyed forwards; the left conveyor belt and the right conveyor belt can timely suspend conveying, so that the fixed tools are temporarily suspended in corresponding chambers, and after the air pump, the air supply pump and the magnetron sputtering equipment of the chambers complete relevant procedures, the left conveyor belt and the right conveyor belt drive the fixed tools to convey forwards. Further, in the present embodiment, the first pre-vacuum chamber 21, the second pre-vacuum chamber 22, and the recovery air pressure chamber 4 are provided with sealing gates. In other embodiments, these sealing gates may be replaced by lifting shutters 313, 323 of the magnetron sputtering chambers 31, 32, and the sealing effect of the inlet and outlet can be achieved.
The above-described embodiments are provided for the present invention only and are not intended to limit the scope of patent protection. Insubstantial changes and substitutions can be made by one skilled in the art in light of the teachings of the invention, as yet fall within the scope of the claims.

Claims (9)

1. The utility model provides a curved glass coating production line, includes transport mechanism and the magnetron sputtering room that sets up along transport route of transport mechanism, characterized by, including the fixed frock of being conveyed by transport mechanism, after fixed curved glass of fixed frock, transport mechanism is together with curved glass the fixed frock that places on it and send to the magnetron sputtering room.
2. The curved glass coating production line according to claim 1, wherein: the conveying mechanism comprises a left conveying belt and a right conveying belt; the fixed frock is equipped with left flank and the right flank of placing respectively on left conveyer belt and right conveyer belt, and left conveyer belt and right conveyer belt pass through the flank of conveying fixed frock, send fixed frock of fixed curved surface glass to magnetron sputtering room.
3. The curved glass coating production line according to claim 2, wherein: the fixing tool comprises a frame body, and the side wings are specifically arranged at two sides of the frame body; the area between the left conveyor belt and the right conveyor belt is left blank to expose the lower part of the frame body; the lower part of the frame body is correspondingly provided with a hollow area for exposing the downward back surface of the curved glass.
4. The coated glass curved surface production line according to claim 3, wherein a magnetron sputtering device is arranged below the conveying mechanism in the magnetron sputtering chamber, the magnetron sputtering device is upwards aligned with a region between the left conveying belt and the right conveying belt, and is used for carrying out magnetron sputtering coating on the downward back surface of the curved glass in the fixed tooling.
5. The curved glass coating production line according to claim 1, comprising a pre-vacuum chamber and a recovery air pressure chamber, wherein the pre-vacuum chamber, the magnetron sputtering chamber and the recovery air pressure chamber are arranged in a conveying direction of the conveying mechanism and are sequentially adjacent, an inlet of the magnetron sputtering chamber is communicated with an outlet of the pre-vacuum chamber, and an outlet of the magnetron sputtering chamber is communicated with an inlet of the recovery air pressure chamber.
6. The curved glass coating production line according to claim 5, wherein: a first lifting flashboard is arranged at any position from the inlet of the magnetron sputtering chamber to the outlet of the pre-vacuum chamber for sealing; and/or a second lifting flashboard is arranged at any position from the outlet of the magnetron sputtering chamber to the inlet of the recovery air pressure chamber for sealing.
7. The coated glass manufacturing line according to claim 6, wherein the pre-vacuum chamber is provided with an air pump near the outlet thereof, the magnetron sputtering chamber is provided with an air supply pump near the inlet thereof, and the air supply pump continuously supplies air to the magnetron sputtering chamber and the air pump continuously pumps air to the pre-vacuum chamber in a state that the first lifting flashboard is opened.
8. The coated glass manufacturing line according to claim 5, wherein a first sealing member is provided between the magnetron sputtering chamber and the pre-vacuum chamber, and/or a second sealing member is provided between the magnetron sputtering chamber and the recovery air pressure chamber.
9. The curved glass coating production line according to claim 5, wherein: the inlet of the pre-vacuum chamber is provided with a sealing gate which can be opened outwards; and/or the outlet of the recovery air pressure chamber is provided with a sealing gate which can be opened outwards.
CN202311024936.3A 2023-08-14 2023-08-14 Curved glass coating production line Pending CN117144314A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202311024936.3A CN117144314A (en) 2023-08-14 2023-08-14 Curved glass coating production line

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202311024936.3A CN117144314A (en) 2023-08-14 2023-08-14 Curved glass coating production line

Publications (1)

Publication Number Publication Date
CN117144314A true CN117144314A (en) 2023-12-01

Family

ID=88903625

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202311024936.3A Pending CN117144314A (en) 2023-08-14 2023-08-14 Curved glass coating production line

Country Status (1)

Country Link
CN (1) CN117144314A (en)

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