CN116954034B - Light source control method and system for laser direct writing exposure machine - Google Patents
Light source control method and system for laser direct writing exposure machine Download PDFInfo
- Publication number
- CN116954034B CN116954034B CN202310838421.0A CN202310838421A CN116954034B CN 116954034 B CN116954034 B CN 116954034B CN 202310838421 A CN202310838421 A CN 202310838421A CN 116954034 B CN116954034 B CN 116954034B
- Authority
- CN
- China
- Prior art keywords
- light source
- source control
- control
- command
- synchronous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 15
- 230000001360 synchronised effect Effects 0.000 claims abstract description 33
- 238000012545 processing Methods 0.000 claims abstract description 5
- 238000007405 data analysis Methods 0.000 claims abstract description 4
- 238000004458 analytical method Methods 0.000 claims description 6
- 230000004304 visual acuity Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000013307 optical fiber Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a light source control method and a light source control system for a laser direct writing exposure machine, and belongs to the field of exposure equipment. The system comprises: the light source control module comprises a plurality of light source drivers and corresponding light sources, wherein a light source control command and a light source synchronous command are input into a light source control board, after the light source control board receives the command, the command is analyzed through a processing chip in a board card, a plurality of groups of synchronous signals with fixed time delay are generated after data analysis, and the output synchronous control signals are respectively used for controlling the light source drivers and switching pulse control signals and constant current source control signals; the light source control mode for the laser direct writing exposure equipment can effectively solve the problem of light source synchronization, improves the light source utilization rate of the equipment, reduces the service life cost of the light source, improves the resolving power and the burrs of the graphic frame, and reduces the compensation difficulty and the rejection rate.
Description
Technical Field
The invention relates to a light source control method and a light source control system for a laser direct writing exposure machine, and belongs to the field of exposure equipment.
Background
In the operation process of the laser direct-writing exposure machine, laser is required to be irradiated on the DMD digital micromirror through the lens cone, light spots emitted by the laser are reflected on an exposure plate through the turning of the DMD digital micromirror, the laser spots are shaped and evenly irradiated, two types of lasers are commonly used at present, light emitted by the traditional laser is continuously irradiated on the DMD digital micromirror, and pulse-type laser can be used for pulse-type light emission according to the picture turning requirement, so that the pattern analysis precision and pattern frame burrs are improved.
Nowadays, laser direct-writing exposure machines are increasingly applied to anti-welding manufacturing processes, exposure requirements under different process requirements are adapted by using mixed-band light sources, the existing control method of the mixed-band light sources is to independently control different light sources by adopting a plurality of light source controllers, synchronous control and random switching of a plurality of light source control modes cannot be carried out, output delay between each light source is inconsistent, each light source can have different precision, so that exposed patterns are spliced and misplaced, signal continuity is low, and compensation difficulty is increased. If one driving mode can be used for meeting the normal exposure of different light sources and the random switching of the constant current pulse mode can be carried out, the graphic analysis precision can be further improved, the burrs of the graphic frame can be reduced, and the product cost can be reduced.
The structural mode of the prior art for controlling the light source is shown in fig. 1, in the scheme, the light source driver is controlled by adopting a control chip of an MCU (stm 32), the pin number of the MCU chip is less and cannot meet the distribution control of the multipath driver, and the clock offset of the MCU chip is larger and the synchronism is difficult to maintain.
Therefore, for the scheme of the light source with different wave bands, a plurality of light source controllers are needed to respectively control the light source, and under the control mode, as the types of the light source are increased, a light source control board and a light source driving board are correspondingly increased, so that the production cost is continuously increased; in addition, in the whole light source control system, the synchronous information of the platform synchronous signal does not exist, that is, the synchronous exposure of the mixed light source cannot be implemented, and the compensation difficulty is increased.
Disclosure of Invention
In order to reduce implementation cost of multi-path light source control in a laser direct writing exposure machine and optimize synchronization performance among a plurality of light sources so as to improve product quality, the invention provides a light source control method and a system for the laser direct writing exposure machine, and the technical scheme is as follows:
a first object of the present invention is to provide a light source control system for a laser direct-write exposure machine, comprising: the light source control module and the light source module comprise a plurality of light source drivers and corresponding light sources;
The light source control module comprises a light source control board, a light source control command and a light source synchronous command are input into the light source control board, after the light source control board receives the command, command analysis is carried out through a processing chip in the board card, a plurality of groups of synchronous signals with fixed time delay are generated after data analysis, and the output synchronous control signals are respectively used for controlling the light source driver and switching the pulse control signals and the constant current source control signals.
Optionally, the light source driver includes: parallel digital-to-analog converter U1, first operational amplifier u2_a, second operational amplifier u2_b, third operational amplifier U3, and transistor Q4;
After the light source control board receives and analyzes the light source control and synchronization command, the light source control board sends a digital-to-analog converter control signal DACCtrl _s to the parallel digital-to-analog converter U1 for functional configuration and output, the parallel digital-to-analog converter U1 outputs an amplifier control signal ctrl_s, and the amplifier control signal ctrl_s is amplified by the operational amplifier of the first operational amplifier u2_a, the integral operation of the second operational amplifier u2_b, and the negative feedback control of the third operational amplifier U3, so that a stable control signal is obtained to enable the transistor Q4 to be stably switched to light the light source.
Optionally, the control chip of the light source control board adopts an FPGA control chip.
Optionally, the light source control module and the light source module are integrated on the same board card.
Optionally, the light source control command and the light source synchronization command are input into the light source control board through an RJ45 network port.
Optionally, the light source includes: LED light sources and/or LD light sources.
A second object of the present invention is to provide a light source control method for a laser direct writing exposure machine, implemented by using the light source control system described in any one of the above, including:
s1: the light source control board receives a command sent by the upper computer;
S2: the light source control board analyzes the received light source control command and the light source synchronous command to obtain an energy value and a light emitting mode;
s3: outputting synchronous control signals correspondingly based on the energy value and the light emitting mode, and respectively inputting the synchronous control signals into corresponding light source drivers;
s4: the light source driver performs light source lighting and light source pulse constant current mode control;
S5: the light source driver feeds back a synchronous control signal;
s6: and the light source control board receives the feedback signal to analyze and adjust the synchronous control signal to perform stable output control.
The invention has the beneficial effects that:
the invention utilizes the light source control board to generate a plurality of groups of synchronous signals with fixed time delay, which are respectively used for controlling the light path drivers of different light sources, and can carry out independent signal control of different paths, and carry out random switching of pulse constant current, thereby accurately realizing the synchronization of the light sources in the exposure process; in addition, compared with the existing constant current control light source mode, the pulse driving mode changes the original 10-20ms order of magnitude response into hundred ns order of magnitude response speed, and the service life, control efficiency and response speed of the light source are improved.
Therefore, the light source control mode for the laser direct writing exposure equipment can effectively solve the problem of light source synchronization, improves the light source utilization rate of the equipment, reduces the service life cost of the light source, improves the resolving power and the burrs of the graphic frame, and reduces the compensation difficulty and the rejection rate.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for the description of the embodiments will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present invention, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
Fig. 1 is a block diagram of a prior art light source control system.
Fig. 2 is a block diagram of a hybrid pulse light source control system of the laser direct-write exposure apparatus of the present invention.
Fig. 3 is a block diagram of a light source control system according to the present invention.
Fig. 4 is a flowchart of the light source control process sequence of the present invention.
Fig. 5 is a light source driving circuit diagram of an exposure apparatus in the related art.
Fig. 6 is a light source driving circuit diagram of the present invention.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present invention more apparent, the embodiments of the present invention will be described in further detail with reference to the accompanying drawings.
Embodiment one:
the present embodiment provides a hybrid pulse light source control system for a laser direct-write exposure apparatus, referring to fig. 2, the system includes: the light source module comprises a plurality of light source drivers and corresponding light sources.
The light source control module is composed of a light source control board, a control chip of the light source control board can be an FPGA control chip, free definition of circuit functions can be achieved, the circuit has high flexibility, resource consumption is less when large-scale data processing is performed, meanwhile, the FPGA has more IO pins, internal programming clocks and signals have lower time delay, and synchronism can be maintained.
The light source control command and the light source synchronous command are input into the light source control board through two RJ45 network ports, after the light source control board receives the light source control and the synchronous command, command analysis is carried out through a processing chip in the board card, a plurality of groups of synchronous signals with fixed time delay are generated after data analysis, independent signal control of different paths can be carried out through command analysis, the output synchronous control signals are respectively used for controlling light source drivers of different light sources, pulse constant current random switching is carried out, and light source synchronization is accurately realized in the exposure process. Compared with other data communication such as serial ports, the RJ45 network port transmission has the advantages of higher transmission speed, safer and more stable data transmission, wider application range and difficult interference by external factors.
In this embodiment, the light source control module and the light source module may be integrated on the same board according to different use requirements, or may be respectively disposed on two independent boards. The integrated circuit board is miniaturized on the same board, the integrated circuit board is more convenient to select a higher integrated circuit board in a regular case, and two independent board cards are selected in an irregular case, so that the integrated circuit board can be installed at different positions, and the flexibility of the design inside the case is improved.
As shown in fig. 6, the light source driver circuit structure of the present embodiment mainly includes: the parallel DAC U1, the operational amplifier U2_A, the operational amplifier U2_B, the operational amplifier U3 and the transistor Q4 are analyzed after the FPGA control chip receives the light source control and synchronization command, the FPGA control chip sends DACCtrl _S signals, the function configuration and the output of the parallel DAC U1 are carried out through controlling DACCtrl _S, the output Ctrl_S signals of the U1 are amplified through the operational amplifier of the U2_A, the integral operation of the U2_B and the negative feedback control of the U3, and a stable control signal is obtained to enable the transistor Q4 to be stably switched so as to light the light source.
In the circuit of this embodiment, the debugging of analog signal has carried out many times circuit adjustment, prevents the oscillation of fortune amplifying, prevents the oscillation of negative feedback system, prevents that the pulse delay is too big, carries out emulation, test, the modification to the circuit, cooperates the signal control of U1 again for the circuit is reliable and controllable, makes the pulse rise decline time delay at 300ns, can carry out 1 us' pulse output. As shown in fig. 5, in the state of the constant current mode, the conventional light source driving circuit can meet the output control of high performance, but in the control of the pulse mode, the operational amplifier is in an unstable state, the bandwidth requirement cannot be met, the phase margin is smaller, the circuit oscillates, and the pulse output cannot be met.
The light source driving mode of this embodiment is reverse input, reverse input impedance is smaller than forward impedance, current becomes larger on the input signal loop, anti-interference capability becomes stronger, and signal is stable. In addition, a resistance and a capacitance are added in the circuit, a pole of the operational amplifier is added, a zero point of the operational amplifier is changed, the operational amplifier is kept in a stable state at all times, and in order to make an output signal more stable, a negative feedback system is added, so that expected adjustment of the signal can be carried out anytime and anywhere, and the reliability and the stability of signal output are ensured.
The light source driver controls different light sources respectively, wherein the light sources can be LED light sources and/or LD light sources, and can also be controlled to generate light sources with different wave bands, as shown in figure 2, the embodiment generates light sources with three different wave bands of 405nm, 380nm and 375 nm.
The resulting light sources are finally guided out of the optical fibers, respectively, as shown in fig. 2, the fiber bundle components being made up of fiber bundles: the emission end side of the first optical fiber, the emission end side of the second optical fiber, and the emission end side of the third optical fiber in fig. 2 are bundled in a predetermined arrangement corresponding to the shape of the DMD illumination region during exposure.
Embodiment two:
The present embodiment provides a hybrid pulse light source control method for a laser direct writing exposure apparatus, implemented by the light source control system described in the first embodiment, including the steps of:
s1: the light source control board receives a command sent by the upper computer;
s2: the light source control board analyzes the received light source control command and the light source synchronous command to obtain an energy value and a light emitting mode;
S3: based on the energy value and the corresponding output synchronous control signals of the light emitting mode, respectively inputting the synchronous control signals into corresponding light source drivers;
s4: the light source driver performs light source lighting and light source pulse constant current mode control;
s5: the light source driver feeds back a synchronous control signal;
S6: the light source control board receives the feedback signal to analyze and adjust the synchronous control signal to perform stable output control.
Some steps in the embodiments of the present invention may be implemented by using software, and the corresponding software program may be stored in a readable storage medium, such as an optical disc or a hard disk.
The foregoing description of the preferred embodiments of the invention is not intended to limit the invention to the precise form disclosed, and any such modifications, equivalents, and alternatives falling within the spirit and scope of the invention are intended to be included within the scope of the invention.
Claims (6)
1. A light source control system for a laser direct-write exposure machine, the system comprising: the light source control module and the light source module comprise a plurality of light source drivers and corresponding light sources;
The light source control module comprises a light source control board, wherein a light source control command and a light source synchronous command are input into the light source control board, after the light source control board receives the command, command analysis is carried out through a processing chip in the board card, a plurality of groups of synchronous signals with fixed time delay are generated after data analysis, and the output synchronous control signals are respectively used for controlling the light source driver and switching the pulse control signals and the constant current source control signals;
the light source driver includes: a parallel digital-to-analog converter (U1), a first operational amplifier (U2_A), a second operational amplifier (U2_B), a third operational amplifier (U3) and a transistor (Q4);
After the light source control board receives the light source control and synchronization command and analyzes the light source control and synchronization command, the light source control board sends a digital-to-analog converter control signal (DACCtrl _s) to the parallel digital-to-analog converter (U1) for functional configuration and output, the parallel digital-to-analog converter (U1) outputs an amplifier control signal (ctrl_s), and the amplifier control signal (ctrl_s) is amplified by an operational amplifier of a first operational amplifier (u2_a), integrated operation of a second operational amplifier (u2_b) and negative feedback control of a third operational amplifier (U3) to obtain a stable control signal so that the transistor (Q4) is stably switched to light the light source.
2. The light source control system for a laser direct write exposure machine according to claim 1, wherein the control chip of the light source control board adopts an FPGA control chip.
3. The light source control system for a laser direct write exposure machine according to claim 1, wherein the light source control module and the light source module are integrated on the same board.
4. The light source control system for a laser direct write exposure machine according to claim 1, wherein the light source control command and the light source synchronization command are input to the light source control board through an RJ45 portal.
5. The light source control system for a laser direct write exposure machine according to claim 1, wherein the light source includes: LED light sources and/or LD light sources.
6. A light source control method for a laser direct writing exposure machine, characterized in that the method is implemented by the light source control system according to any one of claims 1 to 5, comprising:
s1: the light source control board receives a command sent by the upper computer;
S2: the light source control board analyzes the received light source control command and the light source synchronous command to obtain an energy value and a light emitting mode;
s3: outputting synchronous control signals correspondingly based on the energy value and the light emitting mode, and respectively inputting the synchronous control signals into corresponding light source drivers;
s4: the light source driver performs light source lighting and light source pulse constant current mode control;
S5: the light source driver feeds back a synchronous control signal;
s6: and the light source control board receives the feedback signal to analyze and adjust the synchronous control signal to perform stable output control.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310838421.0A CN116954034B (en) | 2023-07-10 | 2023-07-10 | Light source control method and system for laser direct writing exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310838421.0A CN116954034B (en) | 2023-07-10 | 2023-07-10 | Light source control method and system for laser direct writing exposure machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN116954034A CN116954034A (en) | 2023-10-27 |
| CN116954034B true CN116954034B (en) | 2024-05-14 |
Family
ID=88452215
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310838421.0A Active CN116954034B (en) | 2023-07-10 | 2023-07-10 | Light source control method and system for laser direct writing exposure machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116954034B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109613802A (en) * | 2018-12-24 | 2019-04-12 | 无锡影速半导体科技有限公司 | A kind of exposure device that multiband exposes respectively and method |
| CN209487937U (en) * | 2019-01-24 | 2019-10-11 | 大族激光科技产业集团股份有限公司 | A kind of modulation circuit and system of Laser Driven |
| CN111884030A (en) * | 2020-06-28 | 2020-11-03 | 南京大学 | Quick tuning control system based on series-parallel array laser |
| CN113126449A (en) * | 2021-03-16 | 2021-07-16 | 合肥众群光电科技有限公司 | Laser direct-writing photoetching system and method for green oil photoetching |
-
2023
- 2023-07-10 CN CN202310838421.0A patent/CN116954034B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109613802A (en) * | 2018-12-24 | 2019-04-12 | 无锡影速半导体科技有限公司 | A kind of exposure device that multiband exposes respectively and method |
| CN209487937U (en) * | 2019-01-24 | 2019-10-11 | 大族激光科技产业集团股份有限公司 | A kind of modulation circuit and system of Laser Driven |
| CN111884030A (en) * | 2020-06-28 | 2020-11-03 | 南京大学 | Quick tuning control system based on series-parallel array laser |
| CN113126449A (en) * | 2021-03-16 | 2021-07-16 | 合肥众群光电科技有限公司 | Laser direct-writing photoetching system and method for green oil photoetching |
Also Published As
| Publication number | Publication date |
|---|---|
| CN116954034A (en) | 2023-10-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20080047445A1 (en) | Exposure device for the production of screen print stencils | |
| CN108923849B (en) | Batch test method for high-speed parallel multi-channel photoelectric transceiving modules | |
| CN101533414A (en) | A method and a device for generating unique identifier of database record | |
| CN105656562B (en) | A kind of photoelectric conversion module extinction ratio autocontrol method | |
| CN116954034B (en) | Light source control method and system for laser direct writing exposure machine | |
| CN102361394A (en) | Adjusting system and adjusting method of digital power supply of ion cancer therapy accelerator | |
| CN110181169A (en) | Can independent control Laser Time Sharing light splitting optical path, laser-processing system and method | |
| CN115021812B (en) | Testing method and system based on radio frequency performance of optical device | |
| CA1281075C (en) | Semiconductor laser modulation control system | |
| CN103001122B (en) | Power control system of double-closed-loop laser tube | |
| CN109462385B (en) | Device and method for compiling high-voltage pulse parameters | |
| De Marinis et al. | Analysis of Integration Technologies for High-Speed Analog Neuromorphic Photonics | |
| CN114101701B (en) | Multi-beam additive manufacturing method | |
| CN210007102U (en) | Laser module capable of controlling polarization direction in programmable mode and structured light laser module | |
| CN212540792U (en) | Parallel light path structure | |
| CN115412166A (en) | Automatic test method and device for large-scale light-emitting unit based on Benes network | |
| CN111313226B (en) | High-speed driving method and device for quantum communication high-extinction-ratio narrow-pulse light source | |
| CN115755536A (en) | Light source synchronous control system and method for laser direct-writing exposure equipment | |
| CN109507650B (en) | Microwave landing all-digital multipath interference signal simulation method and system | |
| KR940009838B1 (en) | Electron beam exposure system having an improved data transfer efficiency | |
| JP2003077821A (en) | Method of drawing pattern and method of manufacturing mask for exposure | |
| CN101162944B (en) | Method of implementing automatic detection optical module parameter | |
| WO2009128577A1 (en) | Laser marking controller and laser marking system including the same | |
| CN110220509A (en) | Hybrid integrated narrow linewidth laser system for high-precision optical fiber gyro | |
| JP2595149B2 (en) | Electron beam drawing equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |