CN116758073A - Mask plate data detection method and system - Google Patents
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- 238000000034 method Methods 0.000 claims description 18
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- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/10—Segmentation; Edge detection
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- G—PHYSICS
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- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/70—Determining position or orientation of objects or cameras
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- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
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Abstract
The application discloses a mask plate data detection method and a system, wherein the mask plate data detection method comprises the steps of obtaining a coordinate document for designing a mask plate; determining the coordinates of the mask plate according to the coordinate document; obtaining the pattern positions of the detection patterns corresponding to the mask plate according to the mask plate coordinates; obtaining screenshot of each detection graph according to each graph position; and detecting whether each screenshot meets the requirements according to a plurality of reference patterns used for limiting the mask plate. The application can realize automatic detection of mask plate data and can improve detection efficiency.
Description
Technical Field
The application relates to the technical field of semiconductors, in particular to a mask plate data detection method and a mask plate data detection system.
Background
The design graphics (such as GDS/oasis file) corresponding to the mask plate cannot be directly used for plate making, and can be sent to a mask factory after a series of data processing. The data processing includes two major parts: optical Proximity Correction (OPC) and bezel (kerf) designs. The frame design refers to the alignment marks, patterns for line width measurement, overlay error measurement patterns required in the frame region placement lithography process (any pattern for monitoring the process may be placed in the frame region).
In view of the current situation in the industry, some design companies and design chips are more and more, and the amount of NTO (new product coming off line) is very large. Taking current.18 logic devices or BCD devices as an example, a product has 10 to 30 lithographic layers, each with at least one mask (some masks also require a reprint or backup mask). The patterns required to be placed in each lithography layer frame are different, and some lithography layers have very strict requirements on OVL (overlay) and CDU (critical dimension), and special marks are required for monitoring. The photomask is required to be suitable for common machines such as ASML and Canon, and the corresponding marks of the machines are different. The design and placement of the graphics in the frame is a very specific and careful task that can result in the mask being scrapped once the graphics are placed in place, CD (size) or barcode (bar code and ID) format is wrong. The patterns placed on each mask frame need to be carefully checked by engineers, so that the frame design data processing workload is very large, for example, the data detection of about 30 layers needs to occupy at least one engineer for one day, and all patterns cannot be checked. It is therefore important to provide a method that can increase the speed and accuracy of data detection.
At present, software used for checking mask plate data is provided by a photomask factory, in the detection process, frame designers are often required to provide a table for each product, the graphs and positions required to be placed in each layer of mask frame are listed, engineers find corresponding graphs in corresponding software through coordinates of the graphs in the table, the placement positions and directions of the graphs are checked, whether the design accords with expectations, whether the distances between the graphs are influenced mutually or not and the like. However, each graph can only find one coordinate, and a large amount of time is required, so that the problem of low detection efficiency in the traditional mask plate data detection scheme is solved.
Disclosure of Invention
In view of the above, the application provides a method and a system for detecting mask data, which are used for solving the problem of low detection efficiency of the existing mask data detection scheme.
The application provides a mask plate data detection method, which comprises the following steps:
acquiring a coordinate document for designing a mask plate;
determining the coordinates of the mask plate according to the coordinate document;
obtaining the pattern positions of the detection patterns corresponding to the mask plate according to the mask plate coordinates;
obtaining screenshot of each detection graph according to each graph position;
and detecting whether each screenshot meets the requirements according to a plurality of reference patterns used for limiting the mask plate.
Optionally, after detecting whether each screenshot meets requirements according to a plurality of reference patterns for defining a mask, the mask data detection method further includes: and generating a detection report according to the coordinate document and each screenshot.
Optionally, after generating a detection report according to the coordinate document and each screenshot, the mask data detection method further includes: labeling detection results on each screenshot.
Optionally, the capturing a screenshot of each detected graphic according to each graphic position includes: determining the size of each detection pattern according to the type of each detection pattern, and amplifying each detection pattern according to the size of each detection pattern; and capturing the amplified detection graphs according to the graph positions to obtain the capturing of the detection graphs.
Optionally, the mask plate coordinates are used for recording coordinates of each detection pattern on the mask plate.
Optionally, the detection pattern includes at least one of: identification graphics, alignment marks, critical dimensions, overlay marks, and splice marks.
The application also provides a mask plate data detection method, which comprises the following steps:
acquiring an initial coordinate document;
judging whether the initial coordinate document is complete;
if the initial coordinate document is complete, taking the initial coordinate document as a coordinate document for designing the mask plate, and acquiring a detection result by adopting any mask plate data detection method.
Optionally, before generating the detection report, the mask data detection method further includes: and identifying a specific graph, and acquiring the size of the specific graph so as to mark the size corresponding to the specific graph when the detection report is generated.
The application also provides a mask plate data detection system, which comprises:
the first acquisition module is used for acquiring a coordinate document for designing the mask plate;
the determining module is used for determining the coordinates of the mask plate according to the coordinate document;
the second acquisition module is used for acquiring the pattern positions of the detection patterns corresponding to the mask plate according to the mask plate coordinates;
the third acquisition module is used for acquiring screenshot of each detection graph according to each graph position;
and the detection module is used for detecting whether the screenshot meets the requirements or not according to a plurality of reference patterns used for limiting the mask plate.
The application also provides a mask plate data detection system, which comprises the following steps:
the fourth acquisition module is used for acquiring an initial coordinate document;
the judging module is used for judging whether the initial coordinate document is complete or not;
and a fifth obtaining module, configured to, if the initial coordinate document is complete, input the initial coordinate document as a coordinate document for designing the mask, into any one of the mask data detection systems to obtain a detection result.
According to the mask data detection method and system, the coordinate document for designing the mask is obtained through the detection terminal, the mask coordinates are determined according to the coordinate document, the pattern positions of the detection patterns corresponding to the mask are obtained according to the mask coordinates, the screenshot of the detection patterns is obtained according to the pattern positions, and therefore whether the screenshot meets the requirements or not is detected according to the multiple reference patterns for limiting the mask, automatic detection of mask data is achieved, detection efficiency can be improved, the detection process is more objective, and accordingly accuracy of detection results is improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic flow chart of a mask data detection method according to an embodiment of the application;
FIG. 2 is a schematic diagram of a coordinate document according to one embodiment of the present application;
FIG. 3 is a schematic diagram of a mask blank according to an embodiment of the present application;
FIGS. 4a, 4b and 4c are schematic diagrams of alignment marks according to an embodiment of the present application;
FIG. 5 is a schematic diagram of an overlay mark according to an embodiment of the present application;
FIG. 6 is a schematic diagram of splice identification according to an embodiment of the present application;
FIG. 7 is a block diagram of a mask data detection system according to an embodiment of the present application;
FIG. 8 is a flowchart of a mask data detection method according to another embodiment of the present application;
FIG. 9 is a flowchart of a mask data detection method according to another embodiment of the present application;
fig. 10 is a block diagram of a mask data detection system according to another embodiment of the present application.
Detailed Description
The following description of the embodiments of the present application will be made in detail and with reference to the accompanying drawings, wherein it is apparent that the embodiments described are only some, but not all embodiments of the present application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to fall within the scope of the application. The various embodiments described below and their technical features can be combined with each other without conflict.
The first aspect of the present application provides a mask data detection method, which may be executed by a detection terminal for detecting mask data. Referring to fig. 1, the method for detecting mask data includes the following steps:
s110, acquiring a coordinate document for designing the mask plate.
The above-mentioned coordinate document for designing the mask plate includes a coordinate document to be used for manufacturing a board, such as a coordinate document to be outputted after being processed by a related data processing section, and the like. The coordinate document comprises a document in which all auxiliary graphics of the mask plate are placed at specific positions of the cutting tracks, and the document can record coordinates of each element on the mask plate; the elements on the mask may include logo information and/or related graphics, etc. Alternatively, the above coordinate document may refer to fig. 2, and information such as names, coordinates, and/or sizes of the respective elements may be recorded separately.
S120, determining the coordinates of the mask plate according to the coordinate document.
The mask plate coordinates may include coordinates of the mask plate itself and coordinates of each element on the mask plate.
S130, obtaining the pattern positions of the detection patterns corresponding to the mask plate according to the mask plate coordinates. The detection patterns comprise patterns of the respective mark information on the mask plate.
Optionally, the mask plate coordinates are used for recording coordinates of each detection pattern on the mask plate.
Optionally, the detection pattern includes at least one of: identification graphics, alignment marks, critical dimensions, overlay marks, and splice marks.
Optionally, the mask plate may also be referred to as a mask, and the identification pattern includes a mask bar code and an ID (i.e., a mask bar code); can be used for machine identification. The above-mentioned mask blank may refer to fig. 3, and may include information corresponding to a vendor name of the exposure machine, where the lithography machine needs to identify the mask ID through the mask blank, and if the number of bits, information, or placement direction of the mask blank are inconsistent, serious consequences such as mask rejection may be caused by the machine failing to identify the mask.
Alternatively, alignment marks (Alignment marks) may be used to align the wafer with the reticle to ensure that the mask pattern is transferred to the proper location on the wafer surface, as shown in FIGS. 4 a-4 c. The lithography machine alignment system can determine the position of each exposure area by measuring the position of the alignment marks on wafer, each exposure area has the positions in both X and Y directions, and different types of alignment marks can be placed according to the requirements to facilitate coarse alignment and fine alignment.
Alternatively, the critical dimension (CD bar) may include a minimum line width, etc., and measuring the minimum line width may confirm whether the corresponding design requirement is met. The critical dimension can assist in detecting whether the lines in the mask pattern meet the process requirements.
Alternatively, an overlay mark (OVL mark) may be referred to in fig. 5, where the overlay mark (wafer is a pattern specially used for measuring overlay error) is usually placed at the edge of the exposure area (kerf area).
Alternatively, as shown in fig. 6, the splice marks may be provided on the mask plate at positions where edges of the exposure area are near four corners. After the exposure is completed, the splicing marks are nested with each other, and the splicing errors between the exposure areas can be determined by measuring the overlay errors of the patterns.
And S140, obtaining screenshot of each detection graph according to each graph position.
Optionally, the positions of the detected patterns on the mask plate can be determined according to the corresponding pattern positions, and the pictures on the corresponding pattern positions can be intercepted, so that the corresponding screenshot can be obtained.
Alternatively, each pattern on the mask may be generally sized initially and substantially unchanged at a later stage, such that each pattern on the mask has a corresponding size. The size (or dimension) of the pattern (such as the detection image) on the mask plate is usually smaller, and if the corresponding picture is directly taken as a screenshot, the problem of unclear view due to the small dimension is easily caused. Based on this problem, the capturing a screenshot of each detected graphic according to each graphic position includes: determining the size of each detection pattern according to the type of each detection pattern, and amplifying each detection pattern according to the size of each detection pattern; and capturing the amplified detection graphs according to the graph positions to obtain the capturing of the detection graphs. The detection patterns can be amplified according to the sizes of the detection patterns, so that the obtained screenshots have proper sizes or uniform sizes, the convenience of the subsequent processing of the corresponding screenshots is improved, and the obtained screenshot features can be acquired by relevant staff such as engineers more clearly.
S150, detecting whether each screenshot meets the requirements according to a plurality of reference patterns used for limiting the mask plate.
Alternatively, the reference pattern may include a pattern corresponding to each element when the mask is shipped, which may be provided by a corresponding manufacturer. Specifically, if the reference graph and the screenshot have a corresponding relationship, if each feature of the screenshot matches each feature on the corresponding reference graph, the corresponding screenshot can be judged to meet the requirement or pass detection, and if at least one feature of the screenshot is inconsistent with the corresponding feature on the corresponding reference graph, the corresponding screenshot can be judged to not meet the requirement or pass detection.
According to the mask data detection method, the coordinate document for designing the mask can be obtained through the detection terminal, the mask coordinates are determined according to the coordinate document, the pattern positions of the detection patterns corresponding to the mask are obtained according to the mask coordinates, the screenshot of each detection pattern is obtained according to each pattern position, and therefore whether each screenshot meets the requirements or not is detected according to a plurality of reference patterns for limiting the mask, automatic detection of mask data is achieved, detection efficiency can be improved, the detection process is more objective, and accordingly accuracy of detection results is improved.
In one embodiment, after detecting whether each screenshot meets requirements according to a plurality of reference patterns for defining a mask, the mask data detection method further includes: and generating a detection report according to the coordinate document and each screenshot so as to output the detection report, so that related personnel such as a detection engineer and the like can acquire a detection result more intuitively.
Optionally, the coordinate document may record each element on the mask, and the coordinates corresponding to each element. The detection report can be added with a column of screenshot columns on the basis of the coordinate document so as to add the screenshot to a column of corresponding elements, and the format of the detection report is matched with the coordinate document. Optionally, the screenshot may carry a corresponding coordinate system, so that the user may learn information such as the size of the screenshot through the coordinate system and the coordinate data of the corresponding screenshot.
Optionally, after generating a detection report according to the coordinate document and each screenshot, the mask data detection method further includes: labeling the detection result on each screenshot so as to make the detection report more complete. Alternatively, the detection result may include a detection pass or a detection fail.
According to the mask data detection method, corresponding detection programs or detection software can be formed, the coordinate document for designing the mask is obtained through the detection terminal, the mask coordinates are determined according to the coordinate document, the pattern positions of the detection patterns corresponding to the mask are obtained according to the mask coordinates, the screenshot of each detection pattern is obtained according to each pattern position, whether each screenshot meets the requirements or not is detected according to a plurality of reference patterns for limiting the mask, automatic detection of the mask data is achieved, detection efficiency can be improved, the detection process is more objective, and therefore accuracy of detection results is improved.
A second aspect of the present application provides a mask data detection system, referring to fig. 7, the mask data detection system includes:
a first obtaining module 110, configured to obtain a coordinate document for designing a mask;
a determining module 120, configured to determine mask coordinates according to the coordinate document;
a second obtaining module 130, configured to obtain, according to the mask coordinates, a pattern position of each detected pattern corresponding to the mask;
a third obtaining module 140, configured to obtain a screenshot of each detected graphic according to each graphic position;
and the detection module 150 is used for detecting whether each screenshot meets the requirement according to a plurality of reference patterns used for defining the mask plate.
For specific limitation of the mask data detection system, reference may be made to the limitation of the mask data detection method hereinabove, and the description thereof will not be repeated here. All or part of each unit in the mask plate data detection system can be realized by software, hardware and a combination thereof. The units can be embedded in hardware or independent of an operation module in the computer equipment, and can also be stored in a memory in the computer equipment in a software mode, so that the operation module can call and execute the operations corresponding to the units.
A third aspect of the present application provides a mask data detection method, which may be performed by a detection terminal for detecting mask data. Referring to fig. 8, the method for detecting mask data includes the following steps:
s210, acquiring an initial coordinate document.
S220, judging whether the initial coordinate document is complete.
And S230, if the initial coordinate document is complete, taking the initial coordinate document as a coordinate document for designing the mask, and acquiring a detection result by adopting the mask data detection method in any embodiment.
The initial coordinate document comprises an unmodified coordinate document transmitted by the relevant data processing department. Since the coordinate document used for designing the mask plate after being processed by the data processing department needs to be complete, that is, all item coordinates in the mask plate corresponding to the coordinate document need to be checked, and each graph is placed in the cutting path to make sense to exposure, whether the initial coordinate document sent by the data processing department is complete needs to be detected before data detection is performed. If the initial coordinate document is complete, taking the initial coordinate document as a coordinate document for designing the mask plate, and inputting the detection software or the program corresponding to the mask plate data detection method in any embodiment to automatically obtain a detection result; if the initial coordinate document is incomplete, referring to fig. 9, a prompt message of incomplete data is output, so that the corresponding data processing department can provide the complete initial coordinate document again.
Before mask data detection is performed, the embodiment firstly judges whether the initial coordinate document is complete, and after judging that the initial coordinate document is complete, the embodiment takes the initial coordinate document as the coordinate document for designing the mask, and inputs detection software or a program corresponding to the mask data detection method in any embodiment to automatically obtain a detection result, so that the accuracy of the obtained detection result can be further improved.
The inventor researches and discovers that the detection terminal is difficult to automatically acquire the critical dimension of the minimum line width from the screenshot corresponding to the specific pattern of the minimum dimension, and based on the problem, in one embodiment, before generating the detection report, the mask data detection method further comprises: and identifying a specific graph, and acquiring the size of the specific graph so as to mark the corresponding size of the specific graph when the detection report is generated, so that the detection report can carry more complete information. Alternatively, the specific pattern includes a pattern requiring recognition of the minimum size, enabling a user such as an engineer to accurately acquire the size of the specific pattern directly from the inspection report. Alternatively, the present embodiment may use a size recognition tool to acquire the size of a specific graphic from a screenshot corresponding to the specific graphic from recognition of the specific graphic.
The above mask data detection method adopts the mask data detection method described in any embodiment to obtain a detection result, and has all the beneficial effects of the mask data detection method described in any embodiment, and is not described herein again.
A fourth aspect of the present application provides a mask data detection system, referring to fig. 10, the mask data detection system includes:
a fourth obtaining module 210, configured to obtain an initial coordinate document;
a judging module 220, configured to judge whether the initial coordinate document is complete;
and a fifth obtaining module 230, configured to, if the initial coordinate document is complete, input the initial coordinate document as a coordinate document for designing a mask plate, to the mask plate data detection system described in any one of the above embodiments, to obtain a detection result.
For specific limitation of the mask data detection system, reference may be made to the limitation of the mask data detection method hereinabove, and the description thereof will not be repeated here. All or part of each unit in the mask plate data detection system can be realized by software, hardware and a combination thereof. The units can be embedded in hardware or independent of an operation module in the computer equipment, and can also be stored in a memory in the computer equipment in a software mode, so that the operation module can call and execute the operations corresponding to the units.
The application also provides a detection terminal, which comprises: the mask data detection method comprises the steps of the mask data detection method according to any embodiment, wherein the mask data detection program is stored in the memory, and the steps of the mask data detection method according to any embodiment are realized when the mask data detection program is executed by the processor.
The present application also provides a computer readable storage medium, on which a computer program is stored, which when executed by a processor implements the steps of the mask data detection method according to any of the above embodiments.
Although the application has been shown and described with respect to one or more implementations, equivalent alterations and modifications will occur to others skilled in the art based upon a reading and understanding of this specification and the annexed drawings. The present application includes all such modifications and alterations and is limited only by the scope of the following claims. In particular regard to the various functions performed by the above described components, the terms used to describe such components are intended to correspond, unless otherwise indicated, to any component which performs the specified function of the described component (e.g., that is functionally equivalent), even though not structurally equivalent to the disclosed structure which performs the function in the herein illustrated exemplary implementations of the specification.
That is, the foregoing embodiments of the present application are merely examples, and are not intended to limit the scope of the present application, and all equivalent structures or equivalent processes using the descriptions of the present application and the accompanying drawings, such as the combination of technical features of the embodiments, or direct or indirect application in other related technical fields, are included in the scope of the present application.
In addition, in the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present application. In addition, the present application may be identified by the same or different reference numerals for structural elements having the same or similar characteristics. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more features. In the description of the present application, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
In the present application, the term "exemplary" is used to mean "serving as an example, instance, or illustration. Any embodiment described as "exemplary" in this disclosure is not necessarily to be construed as preferred or advantageous over other embodiments. The previous description is provided to enable any person skilled in the art to make or use the present application. In the above description, various details are set forth for purposes of explanation. It will be apparent to one of ordinary skill in the art that the present application may be practiced without these specific details. In other instances, well-known structures and processes have not been shown in detail to avoid unnecessarily obscuring the description of the application. Thus, the present application is not intended to be limited to the embodiments shown, but is to be accorded the widest scope consistent with the principles and features disclosed herein.
Claims (10)
1. The mask plate data detection method is characterized by comprising the following steps of:
acquiring a coordinate document for designing a mask plate;
determining the coordinates of the mask plate according to the coordinate document;
obtaining the pattern positions of the detection patterns corresponding to the mask plate according to the mask plate coordinates;
obtaining screenshot of each detection graph according to each graph position;
and detecting whether each screenshot meets the requirements according to a plurality of reference patterns used for limiting the mask plate.
2. The mask data detection method according to claim 1, wherein after detecting whether each of the shots meets a requirement or not based on a plurality of reference patterns for defining a mask, the mask data detection method further comprises:
and generating a detection report according to the coordinate document and each screenshot.
3. The mask data detection method according to claim 2, wherein after generating a detection report according to the coordinate document and each screenshot, the mask data detection method further comprises:
labeling detection results on each screenshot.
4. The method for detecting mask data according to claim 1, wherein the obtaining the screenshot of each detected pattern according to each pattern position includes:
determining the size of each detection pattern according to the type of each detection pattern, and amplifying each detection pattern according to the size of each detection pattern;
and capturing the amplified detection graphs according to the graph positions to obtain the capturing of the detection graphs.
5. The method for detecting mask data according to claim 1, wherein the mask coordinates are used for recording coordinates of each detection pattern on the mask.
6. The method of claim 5, wherein the detection pattern comprises at least one of: identification graphics, alignment marks, critical dimensions, overlay marks, and splice marks.
7. The mask plate data detection method is characterized by comprising the following steps of:
acquiring an initial coordinate document;
judging whether the initial coordinate document is complete;
if the initial coordinate document is complete, the initial coordinate document is used as a coordinate document for designing the mask plate, and a detection result is obtained by adopting the mask plate data detection method according to any one of claims 1 to 6.
8. The method of claim 7, wherein prior to generating the inspection report, the method further comprises:
and identifying a specific graph, and acquiring the size of the specific graph so as to mark the size corresponding to the specific graph when the detection report is generated.
9. A mask data detection system, comprising:
the first acquisition module is used for acquiring a coordinate document for designing the mask plate;
the determining module is used for determining the coordinates of the mask plate according to the coordinate document;
the second acquisition module is used for acquiring the pattern positions of the detection patterns corresponding to the mask plate according to the mask plate coordinates;
the third acquisition module is used for acquiring screenshot of each detection graph according to each graph position;
and the detection module is used for detecting whether the screenshot meets the requirements or not according to a plurality of reference patterns used for limiting the mask plate.
10. A mask plate data detection system is characterized by comprising the following steps:
the fourth acquisition module is used for acquiring an initial coordinate document;
the judging module is used for judging whether the initial coordinate document is complete or not;
and a fifth obtaining module, configured to, if the initial coordinate document is complete, input the initial coordinate document as a coordinate document for designing a mask, into the mask data detecting system according to claim 9 to obtain a detection result.
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