CN116693576A - 一种制备三乙基锑的方法 - Google Patents
一种制备三乙基锑的方法 Download PDFInfo
- Publication number
- CN116693576A CN116693576A CN202310689292.3A CN202310689292A CN116693576A CN 116693576 A CN116693576 A CN 116693576A CN 202310689292 A CN202310689292 A CN 202310689292A CN 116693576 A CN116693576 A CN 116693576A
- Authority
- CN
- China
- Prior art keywords
- triethylantimony
- preparing
- purity
- reaction
- antimony
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- KKOFCVMVBJXDFP-UHFFFAOYSA-N triethylstibane Chemical compound CC[Sb](CC)CC KKOFCVMVBJXDFP-UHFFFAOYSA-N 0.000 title claims abstract description 85
- 238000000034 method Methods 0.000 title claims abstract description 28
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 56
- 238000006243 chemical reaction Methods 0.000 claims abstract description 34
- 238000003756 stirring Methods 0.000 claims abstract description 21
- DAMJCWMGELCIMI-UHFFFAOYSA-N benzyl n-(2-oxopyrrolidin-3-yl)carbamate Chemical compound C=1C=CC=CC=1COC(=O)NC1CCNC1=O DAMJCWMGELCIMI-UHFFFAOYSA-N 0.000 claims abstract description 17
- 238000010992 reflux Methods 0.000 claims abstract description 17
- 239000012043 crude product Substances 0.000 claims abstract description 16
- BLHLJVCOVBYQQS-UHFFFAOYSA-N ethyllithium Chemical compound [Li]CC BLHLJVCOVBYQQS-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000011261 inert gas Substances 0.000 claims abstract description 16
- 239000002904 solvent Substances 0.000 claims abstract description 14
- 238000001514 detection method Methods 0.000 claims abstract description 12
- 239000000047 product Substances 0.000 claims abstract description 12
- 239000002994 raw material Substances 0.000 claims abstract description 8
- 230000005311 nuclear magnetism Effects 0.000 claims abstract description 7
- 238000004821 distillation Methods 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 5
- 238000005057 refrigeration Methods 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000001291 vacuum drying Methods 0.000 claims description 3
- 238000005303 weighing Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000005292 vacuum distillation Methods 0.000 abstract description 6
- 238000002360 preparation method Methods 0.000 abstract description 4
- 239000006227 byproduct Substances 0.000 abstract description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 239000007818 Grignard reagent Substances 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 150000004795 grignard reagents Chemical class 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 238000005070 sampling Methods 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- UHOVQNZJYSORNB-MZWXYZOWSA-N benzene-d6 Chemical compound [2H]C1=C([2H])C([2H])=C([2H])C([2H])=C1[2H] UHOVQNZJYSORNB-MZWXYZOWSA-N 0.000 description 2
- 238000004871 chemical beam epitaxy Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 229910017115 AlSb Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202310689292.3A CN116693576A (zh) | 2023-06-12 | 2023-06-12 | 一种制备三乙基锑的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202310689292.3A CN116693576A (zh) | 2023-06-12 | 2023-06-12 | 一种制备三乙基锑的方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN116693576A true CN116693576A (zh) | 2023-09-05 |
Family
ID=87844620
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202310689292.3A Pending CN116693576A (zh) | 2023-06-12 | 2023-06-12 | 一种制备三乙基锑的方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN116693576A (zh) |
-
2023
- 2023-06-12 CN CN202310689292.3A patent/CN116693576A/zh active Pending
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Address after: No. 88 Baoshun Road, Wuhu Economic and Technological Development Zone, Wuhu City, Anhui Province, 241008 Applicant after: Anhui Yagesheng Electronic New Materials Co.,Ltd. Applicant after: Quanjiao yagetai electronic new material technology Co.,Ltd. Address before: No.26 Chizhushan Road, Economic and Technological Development Zone, Wuhu City, Anhui Province, 241060 Applicant before: ANHUI ARGOSUN NEW ELECRONIC MATERIALS Co.,Ltd. Applicant before: Quanjiao yagetai electronic new material technology Co.,Ltd. |