CN116666276A - Nozzle fixing structure and plasma etching system - Google Patents
Nozzle fixing structure and plasma etching system Download PDFInfo
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- CN116666276A CN116666276A CN202310938337.6A CN202310938337A CN116666276A CN 116666276 A CN116666276 A CN 116666276A CN 202310938337 A CN202310938337 A CN 202310938337A CN 116666276 A CN116666276 A CN 116666276A
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- 238000001020 plasma etching Methods 0.000 title claims abstract description 13
- 238000007789 sealing Methods 0.000 claims abstract description 84
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 16
- 239000011253 protective coating Substances 0.000 abstract description 4
- 230000003247 decreasing effect Effects 0.000 abstract description 3
- 230000000694 effects Effects 0.000 description 8
- 238000009434 installation Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000006978 adaptation Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920004738 ULTEM® Polymers 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- -1 peek Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Abstract
The application discloses a nozzle fixing structure and a plasma etching system, which comprises an air inlet pipe, a dielectric window, a nozzle body, a first clamping ring and a second clamping ring, wherein the air inlet pipe is provided with a nozzle mounting end; the dielectric window is provided with a nozzle mounting groove; the outer side of the nozzle body is provided with a first limiting shaft shoulder and a second limiting shaft shoulder which are arranged in a step decreasing manner from the first sealing end face to the second sealing end face, the first sealing end face and the nozzle mounting end are sealed through a first sealing ring, and the second sealing end face is in sealing fit with the nozzle mounting groove through a second sealing ring; the first clamping ring is provided with an axial limiting surface which is matched with the end surface of the first limiting shaft shoulder; the second clamping ring is matched with one surface of the first clamping ring, which is away from the axial limiting surface; in addition, the nozzle mounting end is connected with the first clamping ring through a first threaded fastener; the first clamp ring and the second clamp ring are connected by a second threaded fastener. In the disassembly process, the first clamping ring is uniformly lifted circumferentially by the jackscrew instead of the first threaded fastener to avoid damaging the protective coating of the nozzle.
Description
Technical Field
The application relates to the technical field of semiconductor manufacturing, in particular to a nozzle fixing structure and a plasma etching system.
Background
Etching is an essential step in the fabrication of semiconductor devices, and etching processes are typically used to remove unwanted portions from the semiconductor devices. The etching process is usually performed by means of a plasma etching system, the gas inlet end of which is provided with a nozzle through which the process gas enters the reaction chamber, and the nozzle acts as a seal for the chamber, and there is typically an expensive coating on the nozzle to increase the service life of the nozzle. However, in the actual disassembly and assembly process of the nozzle, the protective coating is easily damaged, and the service life of the nozzle is further affected.
In summary, how to solve the problem of easy damage during the disassembly and assembly of the nozzle has become a technical problem to be solved by those skilled in the art.
Disclosure of Invention
In view of the above, the present application provides a nozzle fixing structure and a plasma etching system to solve the problem that the nozzle is easily damaged during the disassembly and assembly process.
In order to achieve the above purpose, the present application provides the following technical solutions:
a nozzle fixing structure, comprising:
an air inlet pipe having a nozzle mounting end;
a dielectric window having a nozzle mounting slot;
the nozzle comprises a nozzle body, a first sealing end face and a second sealing end face, wherein the first sealing end face is matched with a nozzle mounting end, the second sealing end face is matched with a nozzle mounting groove, a first limiting shaft shoulder and a second limiting shaft shoulder are arranged on the outer side of the nozzle body in a step decreasing mode from the first sealing end face to the second sealing end face, the first sealing end face is sealed with the nozzle mounting end through a first sealing ring, and the end face of the second limiting shaft shoulder is configured to be the second sealing end face and is in sealing fit with the nozzle mounting groove through a second sealing ring;
the first clamping ring is provided with an axial limiting surface which is matched with the end surface of the first limiting shaft shoulder;
the second clamping ring is arranged in the nozzle mounting groove and is matched with one surface of the first clamping ring, which is away from the axial limiting surface;
the nozzle mounting end is connected with the first clamping ring through a first threaded fastener to clamp the first limiting shaft shoulder, and the first threaded fastener is uniformly distributed along the peripheral circumference of the first limiting shaft shoulder; the nozzle mounting end, the first clamp ring and the second clamp ring are connected by a second threaded fastener.
Optionally, the second clamping ring and the nozzle mounting groove are of a fixed connection structure or a split detachable connection structure.
Optionally, the second clamping ring is detachably connected with the nozzle mounting groove in a clamping manner.
Optionally, the second clamping ring is detachably connected with the nozzle mounting groove in a rotary clamping manner.
Optionally, one of the second clamping ring and the nozzle mounting groove is provided with a rotary protrusion, and the other is provided with a rotary clamping groove.
Optionally, the end surface of the second clamping ring matched with the first clamping ring is not lower than the outer side surface of the dielectric window;
and/or when the axial limiting surface of the first clamping ring is propped against the end surface of the first limiting shaft shoulder, the end surface of the first clamping ring opposite to the nozzle mounting end is not higher than the first sealing end surface.
Optionally, a first sealing groove is formed in an end face, opposite to the first limiting shaft shoulder, of the nozzle mounting end, and the first sealing ring is arranged in the first sealing groove.
Optionally, the first clamping ring further has a circumferential limit surface in clearance fit with an outer race of the first limit shoulder.
Optionally, a first positioning part is further arranged on the circumferential limiting surface of the first clamping ring, and a second positioning part matched with the first positioning part is arranged on the outer ring of the first limiting shaft shoulder.
Optionally, one of the first positioning portion and the second positioning portion is a positioning protrusion, and the other is a positioning groove.
Optionally, a second sealing groove is formed in the second limiting shaft shoulder, and the second sealing ring is arranged in the second sealing groove.
Optionally, the second sealing ring is vertically crimped in the second sealing groove.
Compared with the background art, the nozzle fixing structure comprises an air inlet pipe, a dielectric window, a nozzle body, a first clamping ring and a second clamping ring, wherein the air inlet pipe is provided with a nozzle mounting end; the dielectric window is provided with a nozzle mounting groove; the nozzle body is provided with a first sealing end face matched with the nozzle mounting end and a second sealing end face matched with the nozzle mounting groove, a first limiting shaft shoulder and a second limiting shaft shoulder which are arranged in a step decreasing manner from the first sealing end face to the second sealing end face are arranged on the outer side of the nozzle body, the first sealing end face and the nozzle mounting end are sealed through a first sealing ring, and the end face of the second limiting shaft shoulder is configured to be the second sealing end face and is in sealing fit with the nozzle mounting groove through a second sealing ring; the first clamping ring is provided with an axial limiting surface which is matched with the end surface of the first limiting shaft shoulder; the second clamping ring is arranged in the nozzle mounting groove and is matched with one surface of the first clamping ring, which is away from the axial limiting surface; in addition, the nozzle mounting end is connected with the first clamping ring through a first threaded fastener to clamp the first limiting shaft shoulder, and the first threaded fastener is uniformly distributed along the peripheral circumference of the first limiting shaft shoulder; the nozzle mounting end, the first clamp ring and the second clamp ring are connected by a second threaded fastener. In the practical application process, the nozzle mounting end and the first clamping ring are fixedly connected through the first threaded fastener, so that the first limiting shaft shoulder is clamped and fixed between the nozzle mounting end and the first clamping ring to form an integral structure, the first sealing end face and the nozzle mounting end are sealed through the first sealing ring, then the nozzle mounting end, the first clamping ring and the second clamping ring are fixedly connected through the second threaded fastener, and as the second clamping ring is arranged on the nozzle mounting groove of the dielectric window, the nozzle body can be fixed to the dielectric window, the end face of the second limiting shaft shoulder on the nozzle body is configured to be a second sealing end face and is in sealing fit with the nozzle mounting groove through the second sealing ring, and therefore the sealing mounting of the nozzle body is completed; when need demolish the nozzle body, demolish first threaded fastener and second threaded fastener in proper order, then can pass nozzle installation end and first clamp ring screw thread cooperation through jackscrew replacement first threaded fastener and top on the second clamp ring corresponds the terminal surface opposite with first clamp ring, can make first clamp ring drive nozzle body circumference evenly rise along with the rotation of jackscrew, dismantle very conveniently, and dismantle the in-process, because the jackscrew that replaces first threaded fastener is circumference evenly distributed also, can avoid the nozzle body to take place to incline and the installation pore wall of medium window takes place to scratch the condition emergence of the condition such as damage protective coating through circumference evenly jacking first clamp ring.
In addition, the application also provides a plasma etching system, which comprises a reaction cavity and a dielectric window arranged in the reaction cavity, wherein a nozzle fixing structure is arranged on the dielectric window, and the nozzle fixing structure is the nozzle fixing structure described in any scheme. Since the nozzle fixing structure has the above technical effects, the plasma etching system having the nozzle fixing structure should have corresponding technical effects, and will not be described herein.
Drawings
In order to more clearly illustrate the embodiments of the application or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic cross-sectional view of a nozzle fixing structure according to an embodiment of the present application;
FIG. 2 is a schematic diagram of an explosion structure of a nozzle fixing structure according to an embodiment of the present application;
FIG. 3 is a schematic structural view of a first clamping ring according to an embodiment of the present application;
FIG. 4 is a schematic structural view of a nozzle body according to an embodiment of the present application;
FIG. 5 is a schematic view of an overall structure formed by combining a nozzle body, a nozzle mounting end and a first clamping ring according to an embodiment of the present application;
fig. 6 is a schematic view of a partial cross-sectional structure of a nozzle fixing structure according to an embodiment of the present application, in which a first threaded fastener is omitted.
Wherein, in fig. 1-6:
an air inlet pipe 1, a nozzle mounting end 11 and a first sealing groove 110;
a dielectric window 2, a nozzle mounting groove 21, and a rotary clamping groove 210;
the nozzle body 3, the first sealing end surface 30, the first limiting shaft shoulder 31, the second positioning part 310, the second limiting shaft shoulder 32 and the second sealing groove 320;
the first clamping ring 4, the axial limiting surface 41, the circumferential limiting surface 42 and the first positioning part 420;
a second clamp ring 5, a rotary protrusion 51;
a first seal ring 61, a second seal ring 62;
a first threaded fastener 71, a second threaded fastener 72.
Detailed Description
The application aims at providing a nozzle fixing structure and a plasma etching system to solve the problem that a nozzle is easy to damage in the process of disassembly and assembly.
The following description of the embodiments of the present application will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present application, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
Referring to fig. 1-6, the present application specifically provides a nozzle fixing structure, which comprises an air inlet pipe 1, a dielectric window 2, a nozzle body 3, a first clamping ring 4 and a second clamping ring 5.
The air inlet pipe 1 is provided with a nozzle mounting end 11, and the nozzle mounting end 11 is used for being connected with the nozzle body 3 and conveying air in the air inlet pipe 1 into the inner cavity of the nozzle body 3; the dielectric window 2 has a nozzle mounting groove 21, and the nozzle mounting groove 21 should have a mounting through hole for the nozzle body 3 to extend to the inner side of the dielectric window 2, namely, the inner side of the reaction chamber, and the inner diameter of the mounting through hole is slightly larger than the outer diameter of the nozzle body 2; the nozzle body 3 is provided with a first sealing end surface 30 matched with the nozzle mounting end 11 and a second sealing end surface matched with the nozzle mounting groove 21, the outer side of the nozzle body 3 is provided with a first limiting shaft shoulder 31 and a second limiting shaft shoulder 32 which are arranged from the first sealing end surface 30 to the second sealing end surface in a step-down manner, the first sealing end surface 30 and the nozzle mounting end 11 are sealed through a first sealing ring 61, and the end surface of the second limiting shaft shoulder 32 is configured as the second sealing end surface and is in sealing fit with the nozzle mounting groove 21 through a second sealing ring 62; the first clamping ring 4 is provided with an axial limiting surface 41 which is matched with the end surface of the first limiting shaft shoulder 31; the second clamping ring 5 is arranged in the nozzle mounting groove 21 and is matched with one surface of the first clamping ring 4, which is away from the axial limiting surface 41; in addition, the nozzle mounting end 11 is connected with the first clamping ring 4 through a first threaded fastener 71 to clamp the first limiting shaft shoulder 31, and the first threaded fasteners 71 are uniformly distributed along the peripheral circumference of the first limiting shaft shoulder 31, wherein a threaded structure matched with the first threaded fastener 71 is arranged on the first clamping ring 4; the nozzle mounting end 11, the first clamping ring 4 and the second clamping ring 5 are connected by means of a second threaded fastener 72, wherein the second clamping ring 5 is provided with a threaded structure adapted to the second threaded fastener 72.
In the practical application process, the nozzle fixing structure is characterized in that firstly, the nozzle mounting end 11 is fixedly connected with the first clamping ring 4 through the first threaded fastener 71, so that the first limiting shaft shoulder 31 is clamped and fixed between the nozzle mounting end 11 and the first clamping ring 4 to form an integral structure, the first sealing end face 30 and the nozzle mounting end 11 are sealed through the first sealing ring 61, then, the nozzle mounting end 11, the first clamping ring 4 and the second clamping ring 5 are fixedly connected through the second threaded fastener 72, and the nozzle body 3 can be fixed to the medium window 2 because the second clamping ring 5 is arranged on the nozzle mounting groove 21 of the medium window 2, and the end face of the second limiting shaft shoulder 32 on the nozzle body 3 is configured to be a second sealing end face and is in sealing fit with the nozzle mounting groove 21 through the second sealing ring 62, so that the sealing installation of the nozzle body 3 is completed; when the nozzle body 3 needs to be dismantled, the first threaded fastener 71 and the second threaded fastener 72 are sequentially dismantled, then the first threaded fastener 71 can be replaced by jackscrews to penetrate through the nozzle mounting end 11 and be in threaded fit with the first clamping ring 4 and be propped against the end face of the second clamping ring 5 corresponding to the first clamping ring 4, the first clamping ring 4 can drive the nozzle body 3 to uniformly lift in the circumferential direction along with the rotation of jackscrews, the disassembly is quite convenient, in the disassembly process, as jackscrews replacing the first threaded fastener 71 are uniformly distributed in the circumferential direction, the first clamping ring 4 can be uniformly lifted in the circumferential direction to avoid the occurrence of the conditions of tilting of the nozzle body 3, the occurrence of scratch and the like on the mounting hole wall of the medium window 2, and the occurrence of damage to the protective coating.
It should be understood by those skilled in the art that the dielectric window 2 is usually made of ceramic material, and forms a part of the reaction chamber; in addition, the first clamping ring 4 and the second clamping ring 5 are used as core components for fixing the nozzle body 3, and the first clamping ring 4 and the second clamping ring 5 are preferably made of ultem, peek, PTFE material, and then are made of aluminum, stainless steel and other materials in consideration of the temperature of a dielectric window and the influence of radio frequency environment.
It should be noted that, the above-mentioned second clamping ring 5 and the nozzle mounting groove 21 may specifically adopt a fixed connection structure, for example, a manner of being embedded in advance in the production and manufacturing process of the dielectric window 2, or may also adopt a split type detachable connection structure form. In addition, when adopting this kind of detachable connection structure, second clamp ring 5 must have certain fit clearance with nozzle mounting groove 21, then when the process of constantly pressing from both sides tightly between first clamp ring 4 and the second clamp ring 5 in the assembly process, second sealing washer 62 can produce elasticity and prop up tight force between dielectric window 2 and the spacing shaft shoulder 32 of second to make second sealing washer 62 not only have sealed effect, have in addition and make second clamp ring 5 produce ascending force with respect to nozzle mounting groove 21 of dielectric window 2, guarantee the stability of connecting between second clamp ring 5 and the nozzle mounting groove 21.
In a further embodiment, referring to fig. 2, the second clamping ring 5 and the nozzle mounting groove 21 may be detachably connected by a clamping connection, so that the second clamping ring 5 and the nozzle mounting groove 21 are more convenient to be assembled and disassembled by a clamping connection. In particular, the second clamping ring 5 and the nozzle mounting groove 21 can be designed as a detachable connection with a rotary snap-fit. For example, referring to fig. 2, one of the second clamp ring 5 and the nozzle mounting groove 21 is provided with a rotation protrusion 51, and the other is provided with a rotation catching groove 210.
In some more specific embodiments, referring to fig. 1 and fig. 6, the end surface of the second clamping ring 5 adapted to the first clamping ring 4 is preferably designed to be not lower than the outer side surface of the dielectric window 2, and by designing the structure, the second clamping ring 5 is more smooth when being abutted to the opposite surface of the first clamping ring 4, so as to avoid collision and scratch.
In addition, referring to fig. 1 to 6, when the axial limiting surface 41 of the first clamping ring 4 abuts against the end surface of the first limiting shoulder 31, the end surface of the first clamping ring 4 opposite to the nozzle mounting end 11 is not higher than the first sealing end surface 30, and by designing the structure, the clamping force of the axial limiting surface 41 and the nozzle mounting end 11 on the first limiting shoulder 31 can be ensured.
In some specific embodiments, referring to fig. 5, a first sealing groove 110 may be provided on an end surface of the nozzle mounting end 11 opposite to the first limiting shaft shoulder 31, and the first sealing ring 61 is disposed in the first sealing groove 110, so that the sealing effect of the first sealing ring 61 can be improved by designing the first sealing groove 110, and the installation is more convenient.
In other specific embodiments, as shown in connection with fig. 3 with reference to fig. 2, the first clamping ring 4 may also have a circumferential stop surface 42 that is in clearance fit with the outer race of the first stop shoulder 31. Through designing this circumference limit face 42 can form fine guard action to the outer lane of first spacing shaft shoulder 31, can also promote the convenience of assembly simultaneously.
In a further embodiment, referring to fig. 3 and 4, a first positioning portion 420 is further disposed on the circumferential limiting surface 42 of the first clamping ring 4, and a second positioning portion 310 adapted to the first positioning portion 420 is disposed on the outer ring of the first limiting shoulder 31. Through this first location portion 420 and second location portion 310 of design for the location is more convenient when first clamp ring 4 and the assembly of first spacing shaft shoulder 31, thereby can effectively guarantee the installation angle of nozzle body 3 on dielectric window 2. It should be noted that, one of the first positioning portion 420 and the second positioning portion 310 may be a positioning protrusion, and the other may be a positioning groove. Through designing into the cooperation structure of this kind of location arch and constant head tank for two location structures are simpler, the processing preparation of being convenient for. Wherein, the quantity of location arch and constant head tank can be set for as required.
In some specific embodiments, referring to fig. 4-6, the second limiting shoulder 32 may also be provided with a second sealing groove 320, and the second sealing ring 62 is disposed in the second sealing groove 320. Through this second seal groove 320 of design, not only can promote the sealed effect of second sealing washer 62, it is more convenient to install moreover.
In some embodiments, the second seal ring 62 deforms within the second seal groove 320 due to the pressure of the nozzle body 3 in the vertical direction, thereby providing a sealing effect.
In addition, the application also provides a plasma etching system, which comprises a reaction cavity and a dielectric window 2 arranged in the reaction cavity, wherein a nozzle fixing structure is arranged on the dielectric window 2, and the nozzle fixing structure is the nozzle fixing structure described in any scheme. Since the nozzle fixing structure has the above technical effects, the plasma etching system having the nozzle fixing structure should have corresponding technical effects, and will not be described herein.
It should be noted that, in the present specification, each embodiment is described in a progressive manner, and each embodiment is mainly described as different from other embodiments, and identical and similar parts between the embodiments are all enough to be referred to each other.
As used in the specification and in the claims, the terms "a," "an," "the," and/or "the" are not specific to a singular, but may include a plurality, unless the context clearly dictates otherwise. In general, the terms "comprises" and "comprising" merely indicate that the steps and elements are explicitly identified, and they do not constitute an exclusive list, as other steps or elements may be included in a method or apparatus. The inclusion of an element defined by the phrase "comprising one … …" does not exclude the presence of additional identical elements in a process, method, article, or apparatus that comprises an element.
Wherein, in the description of the embodiments of the present application, unless otherwise indicated, "/" means or, for example, a/B may represent a or B; "and/or" herein is merely an association relationship describing an association object, and means that three relationships may exist, for example, a and/or B may mean: a exists alone, A and B exist together, and B exists alone. In addition, in the description of the embodiments of the present application, "plurality" means two or more than two.
In addition, the terms "first," "second," are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature.
The principles and embodiments of the present application have been described herein with reference to specific examples, the description of which is intended only to facilitate an understanding of the core concepts of the application. It should be noted that it will be apparent to those skilled in the art that various modifications and adaptations of the application can be made without departing from the principles of the application and these modifications and adaptations are intended to be within the scope of the application as defined in the following claims.
Claims (13)
1. A nozzle fixing structure, characterized by comprising:
an air inlet pipe (1) having a nozzle mounting end (11);
a dielectric window (2) having a nozzle mounting groove (21);
the nozzle comprises a nozzle body (3) and a plurality of nozzles, wherein the nozzle body is provided with a first sealing end face (30) matched with a nozzle mounting end (11) and a second sealing end face matched with a nozzle mounting groove (21), a first limiting shaft shoulder (31) and a second limiting shaft shoulder (32) which are arranged from the first sealing end face (30) to the second sealing end face in a step-down manner are arranged on the outer side of the nozzle body (3), the first sealing end face (30) and the nozzle mounting end (11) are sealed through a first sealing ring (61), and the end face of the second limiting shaft shoulder (32) is configured to be the second sealing end face and is in sealing fit with the nozzle mounting groove (21) through a second sealing ring (62);
the first clamping ring (4) is provided with an axial limiting surface (41) which is matched with the end surface of the first limiting shaft shoulder (31);
the second clamping ring (5) is arranged in the nozzle mounting groove (21) and is matched with one surface of the first clamping ring (4) deviating from the axial limiting surface (41);
the nozzle mounting end (11) is connected with the first clamping ring (4) through a first threaded fastener (71) to clamp the first limiting shaft shoulder (31), and the first threaded fasteners (71) are uniformly distributed along the peripheral circumference of the first limiting shaft shoulder (31); the nozzle mounting end (11), the first clamping ring (4) and the second clamping ring (5) are connected by a second threaded fastener (72).
2. The nozzle fixing structure according to claim 1, wherein the second clamp ring (5) and the nozzle mounting groove (21) are a fixed connection structure or a split detachable connection structure.
3. A nozzle fixing structure according to claim 1, characterized in that the second clamping ring (5) is detachably connected with the nozzle mounting groove (21) in a clamping manner.
4. A nozzle fixing structure according to claim 3, characterized in that the second clamping ring (5) is detachably connected with the nozzle mounting groove (21) in a rotationally engaged manner.
5. A nozzle fixing structure according to claim 4, wherein one of the second clamp ring (5) and the nozzle mounting groove (21) is provided with a rotation protrusion (51), and the other is provided with a rotation catching groove (210).
6. A nozzle fixing structure according to claim 1, characterized in that the end face of the second clamping ring (5) which is adapted to the first clamping ring (4) is not lower than the outer side face of the dielectric window (2);
and/or when the axial limiting surface (41) of the first clamping ring (4) is propped against the end surface of the first limiting shaft shoulder (31), the end surface of the first clamping ring (4) opposite to the nozzle mounting end (11) is not higher than the first sealing end surface (30).
7. The nozzle fixing structure according to claim 1, wherein a first seal groove (110) is provided on an end surface of the nozzle mounting end (11) opposite to the first limit shaft shoulder (31), and the first seal ring (61) is provided in the first seal groove (110).
8. The nozzle fixing structure according to claim 1, wherein the first clamp ring (4) further has a circumferential limit surface (42) that is clearance-fitted with an outer ring of the first limit shoulder (31).
9. The nozzle fixing structure according to claim 8, wherein a first positioning portion (420) is further provided on the circumferential limiting surface (42) of the first clamping ring (4), and a second positioning portion (310) adapted to the first positioning portion (420) is provided on an outer ring of the first limiting shoulder (31).
10. The nozzle fixing structure according to claim 9, wherein one of the first positioning portion (420) and the second positioning portion (310) is a positioning protrusion, and the other is a positioning groove.
11. The nozzle fixing structure according to claim 1, wherein a second seal groove (320) is provided on the second limit shaft shoulder (32), and the second seal ring (62) is provided in the second seal groove (320).
12. The nozzle fixing structure according to claim 11, wherein the second seal ring (62) is vertically crimped in the second seal groove (320).
13. A plasma etching system, comprising a reaction chamber and a dielectric window (2) arranged in the reaction chamber, wherein a nozzle fixing structure is arranged on the dielectric window (2), and the plasma etching system is characterized in that the nozzle fixing structure is as claimed in any one of claims 1-12.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310938337.6A CN116666276A (en) | 2023-07-28 | 2023-07-28 | Nozzle fixing structure and plasma etching system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310938337.6A CN116666276A (en) | 2023-07-28 | 2023-07-28 | Nozzle fixing structure and plasma etching system |
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| Publication Number | Publication Date |
|---|---|
| CN116666276A true CN116666276A (en) | 2023-08-29 |
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| CN202310938337.6A Pending CN116666276A (en) | 2023-07-28 | 2023-07-28 | Nozzle fixing structure and plasma etching system |
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| CN216528736U (en) * | 2021-12-21 | 2022-05-13 | 北京凯世通半导体有限公司 | Ion source device with sealing sheet |
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2023
- 2023-07-28 CN CN202310938337.6A patent/CN116666276A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN206849812U (en) * | 2017-02-17 | 2018-01-05 | 北京北方华创微电子装备有限公司 | Gas leading-in device |
| CN207398075U (en) * | 2017-08-15 | 2018-05-22 | 北京北方华创微电子装备有限公司 | Nozzle holder, processing chamber and semiconductor processing equipment |
| CN213377476U (en) * | 2020-06-24 | 2021-06-08 | 沈阳芯源微电子设备股份有限公司 | Nozzle device for high-aspect-ratio deep-hole structure wafer or thin glue spraying wafer |
| CN112331544A (en) * | 2020-10-30 | 2021-02-05 | 北京北方华创微电子装备有限公司 | Dielectric window assembly for semiconductor device |
| CN216528736U (en) * | 2021-12-21 | 2022-05-13 | 北京凯世通半导体有限公司 | Ion source device with sealing sheet |
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Application publication date: 20230829 |