CN116641014A - Preparation process of fluorine-containing corrosion-resistant coating - Google Patents
Preparation process of fluorine-containing corrosion-resistant coating Download PDFInfo
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- CN116641014A CN116641014A CN202310623986.7A CN202310623986A CN116641014A CN 116641014 A CN116641014 A CN 116641014A CN 202310623986 A CN202310623986 A CN 202310623986A CN 116641014 A CN116641014 A CN 116641014A
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- fluorine
- fusion
- sand blasting
- shielding
- resistant coating
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- 239000011248 coating agent Substances 0.000 title claims abstract description 24
- 238000000576 coating method Methods 0.000 title claims abstract description 24
- 230000007797 corrosion Effects 0.000 title claims abstract description 17
- 238000005260 corrosion Methods 0.000 title claims abstract description 17
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 16
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 16
- 239000011737 fluorine Substances 0.000 title claims abstract description 16
- 238000002360 preparation method Methods 0.000 title claims abstract description 8
- 238000005488 sandblasting Methods 0.000 claims abstract description 16
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 claims abstract description 10
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 claims abstract description 10
- 239000001257 hydrogen Substances 0.000 claims abstract description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 5
- 238000004140 cleaning Methods 0.000 claims abstract description 4
- 238000007750 plasma spraying Methods 0.000 claims abstract description 3
- 239000007789 gas Substances 0.000 claims description 16
- 230000004927 fusion Effects 0.000 claims description 14
- 239000002390 adhesive tape Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 238000002347 injection Methods 0.000 claims description 9
- 239000007924 injection Substances 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 8
- 239000007921 spray Substances 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 6
- 238000005498 polishing Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 230000003796 beauty Effects 0.000 claims description 3
- 238000000227 grinding Methods 0.000 claims description 3
- 239000001307 helium Substances 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 3
- 230000000873 masking effect Effects 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 3
- 239000004576 sand Substances 0.000 claims description 3
- 239000004575 stone Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 238000005530 etching Methods 0.000 abstract description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 abstract description 6
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 239000002131 composite material Substances 0.000 abstract description 4
- 150000002431 hydrogen Chemical class 0.000 abstract description 4
- 239000000843 powder Substances 0.000 abstract description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 abstract description 3
- 229910016569 AlF 3 Inorganic materials 0.000 abstract description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract description 2
- 239000002253 acid Substances 0.000 abstract description 2
- 239000003513 alkali Substances 0.000 abstract description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
- 230000000903 blocking effect Effects 0.000 abstract description 2
- 230000008859 change Effects 0.000 abstract description 2
- 230000005496 eutectics Effects 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract description 2
- 150000002367 halogens Chemical class 0.000 abstract description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 abstract description 2
- 239000003960 organic solvent Substances 0.000 abstract description 2
- 239000001301 oxygen Substances 0.000 abstract description 2
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 239000011148 porous material Substances 0.000 abstract description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 2
- 210000002381 plasma Anatomy 0.000 abstract 2
- 238000004806 packaging method and process Methods 0.000 abstract 1
- 238000005507 spraying Methods 0.000 description 7
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000003682 fluorination reaction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
The invention discloses a preparation process of a fluorine-containing corrosion-resistant coating, which comprises the steps of accepting, shielding, sandblasting, meltallizing, shielding removing, cleaning and packaging. The prepared fluorine-containing corrosion-resistant coating has the advantages of low coating pore (2%), high binding force (12 Mpa), high hardness (480 HV), low oxygen content and the like by developing the technological parameters of atmospheric plasma spraying, and AlF is generated on the surface of etching cavity core equipment (mainly aluminum products) by reacting with halogen, particularly fluorine-containing plasmas ‑ 、AlF 2 ‑ 、AlF 3 The aluminum fluoride on the surface of the composite coating can better play a role in reaction blocking, so that the composite coating has better plasma resistance, and the aluminum fluoride powder is used this time, so that the aluminum fluoride is insoluble in water, acid and alkali solution, most of organic solvents and hydrofluoric acid and liquidThe hydrogen fluoride is very stable in property, does not react with liquid ammonia or even concentrated sulfuric acid until fuming, does not change with potassium hydroxide in a eutectic way, is not reduced by hydrogen, does not decompose when heated, and sublimates.
Description
Technical Field
The invention relates to a preparation process of a fluorine-containing corrosion-resistant coating.
Background
Plasma etching is an irreplaceable process for achieving high fidelity transfer of fine patterns from a lithographic template to a silicon wafer in the production of very large scale integrated circuits. When the plasma etching gas etches the wafer, other parts in the etching cavity are corroded, so that the parts in the etching cavity are required to have certain corrosion resistance, most of the parts are aluminum products, the aluminum parts are anodized in the traditional method, but the plasma resistance of the anodic oxidation cannot meet the requirements of the chip manufacturing process on core equipment of the etching cavity, and the replacement frequency of the parts is too high. Therefore, aluminum oxide coating is sprayed on the surface of aluminum parts, and although corrosion resistance of the aluminum parts is improved, the replacement frequency of the parts is still high. The chip manufacturer is therefore also required to pay high equipment maintenance costs. According to the continuous high-speed development of domestic chips, the domestic equipment rises, and the technology of coating the surface of the equipment is also suitable for the optimization and the rapid development of the chip manufacturing process. Therefore, in order to improve the service life of the aluminum parts, reduce the replacement frequency of the parts, improve the yield due to the reduction of particle pollution, and require a coating with stronger plasma resistance to be deposited on the surfaces of the parts.
The plasma and the plasma of the etching material also have the ability to damage other surfaces of the workplace, that is to say the surfaces that we do not need to damage. Can cause pollution problem and reduce productivity. So control of contaminant particles (particle) generated during etching is said to be a major industry problem. In addition, even for materials having the same etching rate, the degree of generation of contaminants may vary due to the microstructure of the surface.
Disclosure of Invention
The invention aims to provide a preparation process of a fluorine-containing corrosion-resistant coating, which aims to solve the problems in the background technology.
In order to achieve the above purpose, the present invention provides the following technical solutions: a preparation process of fluorine-containing corrosion-resistant coating comprises the following steps,
s1, confirming the appearance of a part and recording a photo, wherein the key points include but are not limited to pits, corrosion, marks, cracks and unfilled corners;
s2, masking a non-sandblasted area of the component by using a specified high-temperature resistant/polishing resistant adhesive tape, and ensuring that the adhesive tape is compacted and free of bubbles at the joint of the sandblasted area and the non-sandblasted area;
s3, using a sand blasting machine, wherein the sand material is alumina, the sand blasting pressure is 3-5Kg/cm < 2 >, the sand blasting distance is 150-200mm, and the gun head moving speed is 500-700mm/S. The sand blasting roughness Ra is required to be 2-4 mu m;
s4, after the sand blasting is completed, re-shielding the joint of the shielded area and the non-shielded area, replacing the adhesive tape used for shielding, and shielding all the joint by using the high-temperature-resistant adhesive tape;
s5, performing fusion injection by using an F4 fusion injection gun in the beauty department. The bottom layer is formed by yttrium oxide fusion, the fusion thickness is 120+/-50 mu m, the roughness Ra3-7 mu m, the upper layer is formed by aluminum fluoride fusion, the fusion thickness is 80+/-50 mu m, and the roughness Ra2-6 mu m;
s6, polishing the fused surface and the non-fused surface by using a designated alumina substrate grinding stone. After the treatment is completed, a cleaning operation is performed using a soda gun and ultrasonic waves.
Preferably, in the step S5, a plasma arc driven by direct current is used as a heat source, a nozzle (anode) and an electrode (cathode) of the torch are connected to the positive and negative poles of the power source, respectively, a working gas is introduced between the nozzle and the electrode, and the arc is ignited by a high-frequency spark.
Preferably, the S5 plasma spray gas comprises argon, hydrogen, helium, nitrogen or mixtures thereof, and the process gas used and the current applied to the electrode together control the energy generated by the process, as each gas and current can be precisely tuned, so that the coating results can be repeated and predicted, and the location and angle of the material injection plume and the distance of the gun from the target can be controlled.
Compared with the prior art, the invention has the beneficial effects that:
1. the prepared fluorine-containing corrosion-resistant coating has the advantages of low coating pore (2%), high bonding force (12 Mpa), high hardness (480 HV), low oxygen content and the like by developing the technological parameters of atmospheric plasma spraying;
2. plasma reaction of halogen, especially fluorine-containing radicals, on surfaces of etched cavity core devices, mainly aluminum productsSurface generation AlF should be applied - 、AlF 2 - 、AlF 3 The byproducts, namely aluminum fluoride on the surface of the composite coating can better play a role in reaction blocking, so that the composite coating has better plasma resistance.
Drawings
FIG. 1 is a process flow diagram of the present invention.
Fig. 2 is a map of the meltallizing parameters.
Description of the embodiments
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
The invention provides a technical scheme that: a preparation process of fluorine-containing corrosion-resistant coating comprises the following steps,
s1, as shown in FIG. 2, confirming the appearance of the component and taking photo records, wherein the emphasis includes but is not limited to pits, corrosion, marks, cracks and unfilled corners;
s2, masking a non-sandblasted area of the component by using a specified high-temperature resistant/polishing resistant adhesive tape, and ensuring that the adhesive tape is compacted and free of bubbles at the joint of the sandblasted area and the non-sandblasted area;
s3, using a sand blasting machine, wherein the sand material is alumina, the sand blasting pressure is 3-5Kg/cm < 2 >, the sand blasting distance is 150-200mm, and the gun head moving speed is 500-700mm/S. The sand blasting roughness Ra is required to be 2-4 mu m;
s4, after the sand blasting is completed, re-shielding the joint of the shielded area and the non-shielded area, replacing the adhesive tape used for shielding, and shielding all the joint by using the high-temperature-resistant adhesive tape;
s5, performing fusion injection by using an F4 fusion injection gun in the beauty department. The bottom layer is formed by yttrium oxide spraying, the spraying thickness is 120+/-50 mu m, the roughness Ra3-7 mu m, the upper layer is formed by aluminum fluoride spraying, the spraying thickness is 80+/-50 mu m, the roughness Ra2-6 mu m, and the spraying parameters are shown in figure 2;
s6, polishing the fused surface and the non-fused surface by using a designated alumina substrate grinding stone. After the treatment is completed, a cleaning operation is performed using a soda gun and ultrasonic waves.
The current use of Atmospheric Plasma Spray (APS) uses a plasma arc driven by direct current as a heat source, and the nozzle (anode) and electrode (cathode) of the spray gun are connected to the positive and negative poles of a power supply, respectively. A working gas is introduced between the nozzle and the electrode, and the arc is ignited by means of a high-frequency spark. The arc heats and ionizes the gas to produce a plasma arc, and the gas thermally expands to eject a high-velocity plasma jet from the nozzle. The powder feed gas feeds the powder from the nozzle (internal feed) or the nozzle (external feed) into the plasma jet. The plasma spray gas comprises argon, hydrogen, helium, nitrogen, or mixtures thereof. The process gas used and the current applied to the electrodes together control the energy generated by the process. Since each gas and current can be precisely adjusted, coating results can be repeated and predicted. Meanwhile, the position and angle of the material injection plume and the distance from the spray gun to the target can be controlled, so that proper material spraying parameters can be flexibly generated, and the melting temperature range is enlarged. The distance between the plasma torch and the target component, the relative speed of the torch and the component, and the component cooling (typically by means of air spraying concentrated on the target substrate) typically controls the plasma spray temperature of the component at 38 to 260 (100 to 500 f). The aluminum fluoride powder is used this time, aluminum fluoride is insoluble in water, acid and alkali solution, insoluble in most organic solvents, insoluble in hydrofluoric acid and liquid hydrogen fluoride, very stable in property, and does not react with liquid ammonia, even concentrated sulfuric acid, even after heating to fuming, does not change with potassium hydroxide eutectic, is not reduced by hydrogen, and is not decomposed by heating, but sublimates.
Control of changing materials and microstructure becomes critical. The results of the test, which are found by data retrieval and early work on projects, demonstrate that 10nm thick fluorination reactions occur on the ceramic surface when the ceramic substrate is exposed to plasma reactions. In a plasma environment, a physical etch is etched that includes repeated surface fluorination reactions (chemistry) and fluorine layers. Researchers have also made several studies of the relationship between ceramic coating and etching. The result is that the fluorine containing product is very robust against etching. Aluminum fluoride is therefore very effective in reducing particle generation. The method has obvious effects on prolonging the service life of core equipment in the etching cavity and improving the yield of chip manufacturers.
Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (3)
1. A preparation process of a fluorine-containing corrosion-resistant coating is characterized by comprising the following steps: the steps are as follows,
s1, confirming the appearance of a part and recording a photo, wherein the key points include but are not limited to pits, corrosion, marks, cracks and unfilled corners;
s2, masking a non-sandblasted area of the component by using a specified high-temperature resistant/polishing resistant adhesive tape, and ensuring that the adhesive tape is compacted and free of bubbles at the joint of the sandblasted area and the non-sandblasted area;
s3, using a sand blasting machine, wherein the sand material is alumina, the sand blasting pressure is 3-5Kg/cm < 2 >, the sand blasting distance is 150-200mm, and the gun head moving speed is 500-700mm/S. The sand blasting roughness Ra is required to be 2-4 mu m;
s4, after the sand blasting is completed, re-shielding the joint of the shielded area and the non-shielded area, replacing the adhesive tape used for shielding, and shielding all the joint by using the high-temperature-resistant adhesive tape;
s5, performing fusion injection by using an F4 fusion injection gun in the beauty department. The bottom layer is formed by yttrium oxide fusion, the fusion thickness is 120+/-50 mu m, the roughness Ra3-7 mu m, the upper layer is formed by aluminum fluoride fusion, the fusion thickness is 80+/-50 mu m, and the roughness Ra2-6 mu m;
s6, polishing the fused surface and the non-fused surface by using a designated alumina substrate grinding stone. After the treatment is completed, a cleaning operation is performed using a soda gun and ultrasonic waves.
2. The process for preparing the fluorine-containing corrosion-resistant coating according to claim 1, which is characterized in that: in S5, a plasma arc driven by direct current is used as a heat source, a nozzle (anode) and an electrode (cathode) of the torch are connected to the positive and negative electrodes of the power supply, respectively, a working gas is introduced between the nozzle and the electrode, and the arc is ignited by high-frequency spark.
3. The process for preparing the fluorine-containing corrosion-resistant coating according to claim 1, which is characterized in that: s5, the plasma spraying gas comprises argon, hydrogen, helium, nitrogen or mixtures thereof, the energy generated by the process is controlled by the process gas and the current applied to the electrode, each gas and the current can be precisely adjusted, so that the coating result can be repeated and predicted, and the position and angle of material injection plume and the distance from the spray gun to a target can be controlled.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310623986.7A CN116641014A (en) | 2023-05-30 | 2023-05-30 | Preparation process of fluorine-containing corrosion-resistant coating |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310623986.7A CN116641014A (en) | 2023-05-30 | 2023-05-30 | Preparation process of fluorine-containing corrosion-resistant coating |
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| CN116641014A true CN116641014A (en) | 2023-08-25 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117867439A (en) * | 2024-01-25 | 2024-04-12 | 苏州众芯联电子材料有限公司 | Process for manufacturing coating on surface of product |
| CN117961781A (en) * | 2024-03-29 | 2024-05-03 | 佰安氪医疗科技(上海)有限公司 | Surface treatment process based on coating material covering |
-
2023
- 2023-05-30 CN CN202310623986.7A patent/CN116641014A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117867439A (en) * | 2024-01-25 | 2024-04-12 | 苏州众芯联电子材料有限公司 | Process for manufacturing coating on surface of product |
| CN117961781A (en) * | 2024-03-29 | 2024-05-03 | 佰安氪医疗科技(上海)有限公司 | Surface treatment process based on coating material covering |
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