CN116555597A - Short-process preparation of high-purity germanium from germanium tetrachloride and tail gas circulation treatment method - Google Patents
Short-process preparation of high-purity germanium from germanium tetrachloride and tail gas circulation treatment method Download PDFInfo
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Abstract
Description
技术领域technical field
本发明申请涉及贵金属技术领域,具体涉及一种四氯化锗短流程制备高纯锗及尾气循环处理方法。The application of the present invention relates to the technical field of precious metals, in particular to a method for preparing high-purity germanium through a short process of germanium tetrachloride and tail gas circulation treatment.
背景技术Background technique
锗是一种重要元素,广泛用于半导体和电气工程行业,例如,作为制造红外探测器、光纤器件、电子器件、太阳能电池等的材料。由于锗在波长1.55μm附近具有高折射率和大吸收系数,人们对在光子和电信应用中使用薄锗膜的占比稳步增加。此外,锗的应用领域也不断在拓展,由于它在例如锂离子电池和太阳能电池中具有巨大的应用潜力。这种元素在各种应用领域的使用越来越多,这推动了对高纯锗的需求。Germanium is an important element widely used in the semiconductor and electrical engineering industries, for example, as a material for the manufacture of infrared detectors, optical fiber devices, electronic devices, solar cells, etc. Due to the high refractive index and large absorption coefficient of germanium near the wavelength of 1.55 μm, the use of thin germanium films in photonic and telecom applications has steadily increased. In addition, the field of application of germanium is constantly expanding, due to its great application potential in, for example, lithium-ion batteries and solar cells. The increasing use of this element in various applications is driving the demand for high purity germanium.
目前有几种工艺用于生产锗。在衬底上沉积锗的常规方法包括二锗烷或锗烷的化学气相沉积(CVD)和锗烷的等离子体增强化学气相淀积(13.56MHz)。在这些研究中,用氢气稀释的锗烷或二锗烷被用作前体。此外,在许多研究中,锗是通过二碘化锗(GeI2)歧化制备的。上述制备锗的方法的缺点是锗烷和二锗烷有毒且不稳定,并且碘是一种反应性元素。Several processes are currently used to produce germanium. Conventional methods of depositing germanium on substrates include chemical vapor deposition (CVD) of digermane or germane and plasma enhanced chemical vapor deposition (13.56 MHz) of germane. In these studies, germane or digermane diluted with hydrogen was used as a precursor. Furthermore, germanium was prepared by disproportionation of germanium diiodide ( GeI2 ) in many studies. The disadvantages of the above-mentioned method for preparing germanium are that germane and digermane are toxic and unstable, and that iodine is a reactive element.
“氯化-水解-还原”这一冶炼方法,通过四氯化锗水解(GeCl4)生成二氧化锗(GeO2),再由氢气还原GeO2并经过区熔提纯环节得到高纯锗。“氯化-水解-还原”法中,还原生产金属锗以GeO2为原料,用氢气还原来制备,用氢气还原GeO2得到金属锗是分布反应的,GeO2将先还原为GeO,再还原为Ge,还原反应如下:The "chlorination-hydrolysis-reduction" smelting method generates germanium dioxide (GeO 2 ) through the hydrolysis of germanium tetrachloride (GeCl 4 ), then reduces GeO 2 with hydrogen and undergoes zone melting purification to obtain high-purity germanium. In the "chlorination-hydrolysis-reduction" method, the reduction production of germanium metal uses GeO2 as raw material and is prepared by hydrogen reduction. The reduction of GeO2 with hydrogen gas to obtain metal germanium is a distribution reaction. GeO2 will be reduced to GeO first, and then reduced For Ge, the reduction reaction is as follows:
GeO2+H2=GeO+H2OGeO 2 +H 2 =GeO+H 2 O
GeO+H2=Ge+H2OGeO+H 2 =Ge+H 2 O
当温度达到700℃时,GeO易挥发。因此反应温度控制在600℃~650℃。但由于水解流程过长,需经过水解,过滤,清洗,煅烧,研磨,筛分等步骤,存在易引入杂质造成二次污染,设备设施投入过大等缺点。When the temperature reaches 700°C, GeO is volatile. Therefore, the reaction temperature is controlled at 600°C to 650°C. However, because the hydrolysis process is too long, it needs to go through steps such as hydrolysis, filtration, cleaning, calcination, grinding, and screening. There are disadvantages such as easy introduction of impurities to cause secondary pollution, and excessive investment in equipment and facilities.
2015年A. V. Kadomtseva研究出在四氯化锗氢化过程中加入铜纳米颗粒改性多壁碳纳米管进行催化,提出了四氯化锗和氢催化还原的反应机理。2016年A. V.Vorotyntsev研究了四氯化锗在热解钨存在下的氢还原动力学,提供了四氯化锗氢还原的反应活化能数据已经加入催化剂后的活化能数据。2018年A. V. Kadomtseva通过对四氯化锗氢还原制备锗催化剂的比较分析中通过使用杂化催化剂发现了铜锗的存在。2020年A.V. Kadomtseva开发了一种钨催化四氯化锗氢还原的工艺,降低反应温度,降低锗制备过程中的步骤数。但上述的发现发明中均存在副产物的产生以及没有解决后续的尾气处理问题。因此需要开发绿色环保型,具有更高经济效益的四氯化锗氢还原短流程制备锗的方法。In 2015, A. V. Kadomtseva studied the addition of copper nanoparticles to modify multi-walled carbon nanotubes for catalysis during the hydrogenation of germanium tetrachloride, and proposed the reaction mechanism of catalytic reduction of germanium tetrachloride and hydrogen. In 2016, A. V. Vorotyntsev studied the hydrogen reduction kinetics of germanium tetrachloride in the presence of pyrolytic tungsten, and provided the reaction activation energy data of the hydrogen reduction of germanium tetrachloride after adding the catalyst. In 2018, A. V. Kadomtseva discovered the existence of copper germanium by using hybrid catalysts in the comparative analysis of germanium tetrachloride hydrogen reduction to prepare germanium catalysts. In 2020, A.V. Kadomtseva developed a process for tungsten-catalyzed hydrogen reduction of germanium tetrachloride, which reduces the reaction temperature and the number of steps in the germanium preparation process. However, in the above-mentioned discovery inventions, there are by-products and the problem of subsequent tail gas treatment is not solved. Therefore, it is necessary to develop a method for preparing germanium in a short process of hydrogen reduction of germanium tetrachloride, which is green and environment-friendly and has higher economic benefits.
发明内容Contents of the invention
为解决或部分解决相关技术中存在的问题,本发明申请提供一种四氯化锗短流程制备高纯锗及尾气循环处理方法,从而使得反应更加稳定,反应过程中引入杂质的可能更小,同时省略了四氯化锗水解为二氯化锗的冗长步骤,减少了设备成本的投入,副产物经处理可再次利用,节约成本,提高经济效益。In order to solve or partially solve the problems existing in the related technology, the application of the present invention provides a short-process preparation of germanium tetrachloride to high-purity germanium and tail gas circulation treatment method, so that the reaction is more stable, and the possibility of introducing impurities in the reaction process is smaller. At the same time, the tedious step of hydrolyzing germanium tetrachloride into germanium dichloride is omitted, which reduces equipment cost investment, and by-products can be reused after treatment, saving costs and improving economic benefits.
本发明申请提供了一种四氯化锗短流程制备高纯锗及尾气循环处理方法,包括以下步骤:The application of the present invention provides a short process for preparing high-purity germanium tetrachloride germanium and tail gas circulation treatment method, including the following steps:
S1、通过控制高纯氢气的流速,将高纯四氯化锗蒸汽带入至高纯四氯化锗氢气还原炉中,通过控制器控制反应温度在锗对棒上沉积金属锗颗粒,收集锗对棒上的金属锗颗粒并通过区熔提纯得到高纯金属锗;S1. By controlling the flow rate of high-purity hydrogen, the high-purity germanium tetrachloride vapor is brought into the high-purity germanium tetrachloride hydrogen reduction furnace, and the reaction temperature is controlled by the controller to deposit metal germanium particles on the germanium pair rods, and the germanium pairs are collected. Metal germanium particles on the rod and purified by zone melting to obtain high-purity metal germanium;
具体而言,四氯化锗与氢气在还原炉内发生如下反应:Specifically, germanium tetrachloride reacts with hydrogen in the reduction furnace as follows:
GeCl4+2H2=Ge+4HClGeCl 4 +2H 2 =Ge+4HCl
S2、反应完成后未完全反应的四氯化锗与氢气,反应产生的氯化氢以及副产物二氯化锗通过反应尾气精馏系统进行精馏分离,其中四氯化锗和氢气通过精馏分离后再次送往还原炉中,氯化氢利用纯水进行处理,副产物二氯化锗通过二氯化锗氯化系统与氯气储罐提供的氯气进行反应,氯化为四氯化锗。S2. The incompletely reacted germanium tetrachloride and hydrogen after the reaction is completed, the hydrogen chloride produced by the reaction and the by-product germanium dichloride are rectified and separated through the reaction tail gas rectification system, wherein the germanium tetrachloride and hydrogen are separated by rectification Sent to the reduction furnace again, the hydrogen chloride is treated with pure water, and the by-product germanium dichloride reacts with the chlorine gas provided by the chlorine gas storage tank through the germanium dichloride chlorination system, and the chlorination is germanium tetrachloride.
进一步的,所述高纯氢气与高纯四氯化锗蒸汽进气比例控制在10~30。Further, the intake ratio of the high-purity hydrogen to the high-purity germanium tetrachloride steam is controlled at 10-30.
进一步的,高纯四氯化锗氢气还原炉的反应温度范围控制在700~900℃。Further, the reaction temperature range of the high-purity germanium tetrachloride hydrogen reduction furnace is controlled at 700-900°C.
进一步的,还原反应完成后的四氯化锗,氢气,氯化氢以及二氯化锗经过还原炉自带的水冷系统冷却后运往反应尾气精馏系统。Further, the germanium tetrachloride, hydrogen, hydrogen chloride and germanium dichloride after the reduction reaction are cooled by the water-cooling system built into the reduction furnace, and then transported to the reaction tail gas rectification system.
进一步的,尾气中的四氯化锗与氢气分别经过精馏达到进料时四氯化锗与氢气的纯度后,运往四氯化锗氢气还原炉或者分别运至四氯化锗储气罐与氢气储气罐。Further, germanium tetrachloride and hydrogen in the tail gas are respectively transported to germanium tetrachloride hydrogen reduction furnace or respectively transported to germanium tetrachloride gas storage tank and Hydrogen storage tank.
进一步的,尾气中的二氯化锗通过精馏后送往二氯化锗氯化系统,将氯气储罐提供的氯气与二氯化锗进气比例控制在1~10之间,发生反应,氯化生成四氯化锗。Further, the germanium dichloride in the tail gas is sent to the germanium dichloride chlorination system after rectification, and the ratio of the chlorine gas provided by the chlorine storage tank to the germanium dichloride intake is controlled between 1 and 10, and the reaction occurs. Chlorination produces germanium tetrachloride.
具体而言,发生如下反应:Specifically, the following reactions occur:
GeCl2+Cl2=GeCl4 GeCl 2 +Cl 2 =GeCl 4
进一步的,经过二氯化锗氯化系统氯化后的气体再次回到反应精馏系统,将其中的四氯化锗通过多次精馏达到需求纯度后运至四氯化锗储气罐内,其中未完全氯化的二氯化锗与氯气送往二氯化锗氯化系统再次进行处理。Further, the gas chlorinated by the germanium dichloride chlorination system returns to the reactive distillation system again, and the germanium tetrachloride is transported to the germanium tetrachloride gas storage tank after repeated rectification to reach the required purity , wherein the incompletely chlorinated germanium dichloride and chlorine are sent to the germanium dichloride chlorination system for further processing.
应当理解的是,以上的一般描述和后文的细节描述仅是示例性和解释性的,并不能限制本发明申请。It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present application.
本发明的有益技术效果:Beneficial technical effect of the present invention:
本发明在四氯化锗短流程制备高纯锗及尾气循环处理方法中引入元素只存在锗,氢,氯三元素,相较于其他锗的制备方法,不易引入其他杂质造成污染,提高得到的金属锗的纯度。The present invention introduces elements in the short-process preparation of germanium tetrachloride to high-purity germanium and the tail gas circulation treatment method, only germanium, hydrogen, and chlorine are present. Compared with other germanium preparation methods, it is not easy to introduce other impurities to cause pollution, and the obtained product is improved. The purity of germanium metal.
本发明与利用二锗烷或锗烷的方法相比,反应更加稳定,与 “氯化-水解-还原”冶炼方法相比,优化了四氯化锗制备锗的流程,省略了水解为二氯化锗的冗长步骤,减少了设备成本的投入。Compared with the method using digermane or germane, the present invention has a more stable reaction, and compared with the "chlorination-hydrolysis-reduction" smelting method, the process of preparing germanium from germanium tetrachloride is optimized, and the hydrolysis into dichloride is omitted. The lengthy steps of germanium reduction reduce the investment in equipment costs.
本发明四氯化锗与氢气反应过程中得到的副产物二氯化锗,经过分离精馏后通过氯化系统处理后变为反应物四氯化锗。该方法使得副产物可再次利用,节约成本,提高经济效益。The by-product germanium dichloride obtained in the process of reacting germanium tetrachloride and hydrogen in the present invention becomes the reactant germanium tetrachloride after separation and rectification through a chlorination system. The method enables by-products to be reused, thereby saving costs and improving economic benefits.
附图说明Description of drawings
图1为本发明中一种实施方式的工艺流程图。Figure 1 is a process flow diagram of an embodiment of the present invention.
具体实施方式Detailed ways
下面将参照附图更详细地描述本发明申请的可选实施方式。虽然附图中显示了本发明申请的可选实施方式,然而应该理解,可以以各种形式实现本发明申请而不应被这里阐述的实施方式所限制。相反,提供这些实施方式是为了使本发明申请更加透彻和完整,并且能够将本发明申请的范围完整地传达给本领域的技术人员。Alternative embodiments of the present application will be described in more detail below with reference to the accompanying drawings. Although alternative embodiments of the present application are shown in the drawings, it should be understood that the present application can be embodied in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided to make the present application more thorough and complete, and to fully convey the scope of the present application to those skilled in the art.
在本发明申请使用的术语是仅仅出于描述特定实施例的目的,而非旨在限制本发明申请。在本发明申请和所附权利要求书中所使用的单数形式的“一种”、“所述”和“该”也旨在包括多数形式,除非上下文清楚地表示其他含义。还应当理解,本文中使用的术语“和/或”是指并包含一个或多个相关联的列出项目的任何或所有可能组合。The terms used in the present application are for the purpose of describing particular embodiments only, and are not intended to limit the present application. As used in this application and the appended claims, the singular forms "a", "the", and "the" are also intended to include the plural forms unless the context clearly dictates otherwise. It should also be understood that the term "and/or" as used herein refers to and includes any and all possible combinations of one or more of the associated listed items.
以下结合附图对本发明申请四氯化锗短流程制备高纯锗及尾气循环处理方法进行详细说明,具体如下:Below in conjunction with accompanying drawing, the present invention applies for germanium tetrachloride short flow process to prepare high-purity germanium and tail gas circulation treatment method to describe in detail, specifically as follows:
为更清楚起见,下面通过以下实施例进行详细说明。For more clarity, detailed description is given below through the following examples.
实施例1Example 1
通过控制流量计控制高纯氢气的流速,将上游经过多次精馏得到的高纯四氯化锗蒸汽与高纯氢气比例为1:15,带入至高纯四氯化锗氢气还原炉中,通过控制器控制反应温度在800℃,连续通入气体持续8小时,在锗对棒上沉积金属锗颗粒,对锗对棒上的金属锗颗粒进行收集并通过区熔提纯得到高纯金属锗;反应完成后未完全反应的四氯化锗氢气,反应产生的氯化氢已经副产物二氯化锗通过反应尾气精馏系统进行多次精馏分离,其中四氯化锗和氢气通过精馏分离后再次送往还原炉中;氯化氢利用纯水进行处理;副产物二氯化锗通过二氯化锗氯化系统与氯气进行反应,氯气与二氯化锗的比例为2:1,氯化为四氯化锗。经测定四氯化锗氢还原短流程制备锗的一次转化率为23.82%。The flow rate of high-purity hydrogen is controlled by controlling the flowmeter, and the ratio of high-purity germanium tetrachloride vapor and high-purity hydrogen obtained by multiple rectifications upstream is 1:15, and is brought into the high-purity germanium tetrachloride hydrogen reduction furnace. The reaction temperature is controlled at 800°C by the controller, and the gas is continuously fed for 8 hours to deposit metal germanium particles on the germanium rods, collect the metal germanium particles on the germanium rods and purify them by zone melting to obtain high-purity metal germanium; After the reaction is completed, the germanium tetrachloride hydrogen gas that has not completely reacted, the hydrogen chloride produced by the reaction has been separated by rectification for many times through the reaction tail gas rectification system, and the germanium tetrachloride and hydrogen gas are separated by rectification. Sent to the reduction furnace; hydrogen chloride is treated with pure water; the by-product germanium dichloride reacts with chlorine gas through the germanium dichloride chlorination system, the ratio of chlorine gas to germanium dichloride is 2:1, and the chlorination is tetrachloride germanium. It has been determined that the primary conversion rate of germanium prepared by the short process of hydrogen reduction of germanium tetrachloride is 23.82%.
实施例2Example 2
通过控制流量计控制高纯氢气的流速,将上游经过多次精馏得到的高纯四氯化锗蒸汽与高纯氢气比例为1:20,带入至高纯四氯化锗氢气还原炉中,通过控制器控制反应温度在850℃,连续通入气体持续8小时,在锗对棒上沉积金属锗颗粒,对锗对棒上的金属锗颗粒进行收集并通过区熔提纯得到高纯金属锗;反应完成后未完全反应的四氯化锗氢气,反应产生的氯化氢已经副产物二氯化锗通过反应尾气精馏系统进行多次精馏分离,其中四氯化锗和氢气通过精馏分离后再次送往还原炉中;氯化氢利用纯水进行处理;副产物二氯化锗通过二氯化锗氯化系统与氯气进行反应,氯气与二氯化锗的比例为1:1,氯化为四氯化锗。经测定四氯化锗氢还原短流程制备锗的一次转化率为28.32%。The flow rate of high-purity hydrogen is controlled by controlling the flowmeter, and the ratio of high-purity germanium tetrachloride vapor obtained by multiple rectifications upstream to high-purity hydrogen is 1:20, and is brought into the high-purity germanium tetrachloride hydrogen reduction furnace. The reaction temperature is controlled at 850°C by the controller, and the gas is continuously fed for 8 hours to deposit metal germanium particles on the germanium rods, collect the metal germanium particles on the germanium rods and purify them by zone melting to obtain high-purity metal germanium; After the reaction is completed, the germanium tetrachloride hydrogen gas that has not completely reacted, the hydrogen chloride produced by the reaction has been separated by rectification for many times through the reaction tail gas rectification system, and the germanium tetrachloride and hydrogen gas are separated by rectification. Sent to the reduction furnace; hydrogen chloride is treated with pure water; the by-product germanium dichloride reacts with chlorine gas through the germanium dichloride chlorination system, the ratio of chlorine gas to germanium dichloride is 1:1, and the chlorination is tetrachloride germanium. It has been determined that the primary conversion rate of germanium prepared by the short process of hydrogen reduction of germanium tetrachloride is 28.32%.
实施例3Example 3
通过控制流量计控制高纯氢气的流速,将上游经过多次精馏得到的高纯四氯化锗蒸汽与高纯氢气比例为1:20,带入至高纯四氯化锗氢气还原炉中,通过控制器控制反应温度在875℃,连续通入气体持续10小时,在锗对棒上沉积金属锗颗粒,对锗对棒上的金属锗颗粒进行收集并通过区熔提纯得到高纯金属锗;反应完成后未完全反应的四氯化锗氢气,反应产生的氯化氢已经副产物二氯化锗通过反应尾气精馏系统进行多次精馏分离,其中四氯化锗和氢气通过精馏分离后再次送往还原炉中;氯化氢利用纯水进行处理;副产物二氯化锗通过二氯化锗氯化系统与氯气进行反应,氯气与二氯化锗的比例为2:1,氯化为四氯化锗。经测定四氯化锗氢还原短流程制备锗的一次转化率为28.44%。The flow rate of high-purity hydrogen is controlled by controlling the flowmeter, and the ratio of high-purity germanium tetrachloride vapor obtained by multiple rectifications upstream to high-purity hydrogen is 1:20, and is brought into the high-purity germanium tetrachloride hydrogen reduction furnace. The reaction temperature is controlled at 875°C by the controller, and the gas is continuously fed for 10 hours to deposit metal germanium particles on the germanium rods, collect the metal germanium particles on the germanium rods and purify them by zone melting to obtain high-purity metal germanium; After the reaction is completed, the germanium tetrachloride hydrogen gas that has not completely reacted, the hydrogen chloride produced by the reaction has been separated by rectification for many times through the reaction tail gas rectification system, and the germanium tetrachloride and hydrogen gas are separated by rectification. Sent to the reduction furnace; hydrogen chloride is treated with pure water; the by-product germanium dichloride reacts with chlorine gas through the germanium dichloride chlorination system, the ratio of chlorine gas to germanium dichloride is 2:1, and the chlorination is tetrachloride germanium. It has been determined that the primary conversion rate of germanium prepared by the short process of hydrogen reduction of germanium tetrachloride is 28.44%.
实施例4Example 4
通过控制流量计控制高纯氢气的流速,将上游经过多次精馏得到的高纯四氯化锗蒸汽与高纯氢气比例为1:25,带入至高纯四氯化锗氢气还原炉中,通过控制器控制反应温度在875℃,连续通入气体持续10小时,在锗对棒上沉积金属锗颗粒,对锗对棒上的金属锗颗粒进行收集并通过区熔提纯得到高纯金属锗;反应完成后未完全反应的四氯化锗氢气,反应产生的氯化氢已经副产物二氯化锗通过反应尾气精馏系统进行多次精馏分离,其中四氯化锗和氢气通过精馏分离后再次送往还原炉中;氯化氢利用纯水进行处理;副产物二氯化锗通过二氯化锗氯化系统与氯气进行反应,氯气与二氯化锗的比例为5:1,氯化为四氯化锗。经测定四氯化锗氢还原短流程制备锗的一次转化率为31.82%。The flow rate of high-purity hydrogen is controlled by controlling the flowmeter, and the ratio of high-purity germanium tetrachloride vapor obtained by multiple rectifications upstream to high-purity hydrogen is 1:25, and is brought into the high-purity germanium tetrachloride hydrogen reduction furnace. The reaction temperature is controlled at 875°C by the controller, and the gas is continuously fed for 10 hours to deposit metal germanium particles on the germanium rods, collect the metal germanium particles on the germanium rods and purify them by zone melting to obtain high-purity metal germanium; After the reaction is completed, the germanium tetrachloride hydrogen gas that has not completely reacted, the hydrogen chloride produced by the reaction has been separated by the by-product germanium dichloride through the reaction tail gas rectification system, and the germanium tetrachloride and hydrogen gas are separated by rectification and separated again. Sent to the reduction furnace; hydrogen chloride is treated with pure water; the by-product germanium dichloride reacts with chlorine gas through the germanium dichloride chlorination system, the ratio of chlorine gas to germanium dichloride is 5:1, and the chlorination is tetrachloride germanium. It has been determined that the primary conversion rate of germanium prepared by the short process of hydrogen reduction of germanium tetrachloride is 31.82%.
以上已经描述了本发明申请的各实施例,上述说明是示例性的,并非穷尽性的,并且也不限于所披露的各实施例。在不偏离所说明的各实施例的范围和精神的情况下,对于本技术领域的普通技术人员来说许多修改和变更都是显而易见的。本文中所用术语的选择,旨在最好地解释各实施例的原理、实际应用或对市场中的技术的改进,或者使本技术领域的其它普通技术人员能理解本文披露的各实施例。Various embodiments of the present application have been described above, the above description is illustrative, not exhaustive, and is not limited to the disclosed embodiments. Many modifications and alterations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the described embodiments. The terminology used herein is chosen to best explain the principle of each embodiment, practical application or improvement of technology in the market, or to enable other ordinary skilled in the art to understand each embodiment disclosed herein.
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