CN116497339A - 一种兼具3d异型工件公自转的自动连续式真空镀膜产线 - Google Patents

一种兼具3d异型工件公自转的自动连续式真空镀膜产线 Download PDF

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CN116497339A
CN116497339A CN202310647439.2A CN202310647439A CN116497339A CN 116497339 A CN116497339 A CN 116497339A CN 202310647439 A CN202310647439 A CN 202310647439A CN 116497339 A CN116497339 A CN 116497339A
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曲永鹏
刘杰波
林海弈
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Goldstone Fujian Energy Co Ltd
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Abstract

本发明公开了一种兼具3D异型工件公自转的自动连续式真空镀膜产线,其包含直线分布式多真空腔室镀膜系统、自动输送系统、平移载板工装系统;直线分布式多真空腔室镀膜系统包含多个呈直线排布的真空腔室,相邻两真空腔室之间设置有真空隔离门;自动输送系统包含自动上料载台、自动下料载台、及均设置在自动上料载台、自动下料载台之间的回流输送线和复合动力输送线;所述直线分布式多真空腔室镀膜系统两端分别连接自动上料载台和自动下料载台;所述复合动力输送线设置有传动切换装置驱动平移载板工装系统的移动或转动。其能实现公转镀膜或公自转镀膜,能同时兼容平面工件和3D异形工件的镀膜需求。

Description

一种兼具3D异型工件公自转的自动连续式真空镀膜产线
技术领域
本发明涉及太阳能电池生产设备及真空镀膜设备领域,尤其涉及一种兼具3D异型工件公自转的自动连续式真空镀膜产线。
背景技术
真空镀膜广泛应用于电子产品、集成电路、光学仪器、医疗器械、太阳能、建筑用材等领域,市场对真空镀膜设备需求量大,同时对真空镀膜设备工艺稳定性要求也越来越高,设备工艺稳定好能有效提高产品竞争力。目前市场上应用较为广泛的是单真空腔室镀膜设备,真空腔室中间为工件悬挂架,在镀膜过程中工件可公自转,真空腔室内同时设计有轰击靶、离化靶、蒸发电极等多个功能性工艺装置,工件在单一腔室内完成所有镀膜工艺。但现有的单真空腔室镀膜设备存在以下问题:1)各批次工件的上料都需破坏原有腔体内真空氛围,再重新把腔体从大气状态抽真空到镀膜所需真空氛围,设备能耗高且工艺稳定性差;2)相同镀膜产能需多台单真空腔室镀膜设备同时作业,每台均需配有设备操控人员,人力成本高,同时每套单真空腔室镀膜设备都需配有独立的真空系统,综合设备成本高;3)在单一腔室完成所有镀膜工艺,离化靶、轰击靶、溅射源等前后处理及各种镀膜工艺均在同一真空腔室中反应,不同工艺段之间污染大,会影响产品镀膜质量及设备运行的稳定性;4)单真空腔室镀膜设备所有工艺集中在单一腔室中串联完成,设备装载为批次形式,生产节拍受限大,腔室无法设计得过大,装载量有限,镀膜效率低。现有的多真空腔室镀膜产线,载板及工装系统只做平移运动,只适合平面性工件的镀膜,不兼备3D异形工件镀膜功能。因此,现有技术存在不足。
发明内容
针对上述问题,本发明提供了一种兼具3D异型工件公自转的自动连续式真空镀膜产线以提高镀膜设备的工艺稳定性;降低镀膜设备的综合投入及能耗,使设备更加节能;降低各工艺处理之间的污染;提高设备自动化程度,减少设备管理成本和人力成本;让设备兼容3D异形工件镀膜,且能稳定量产;增加设备装载量,提高设备镀膜效率。
为实现上述目的,本发明采用如下技术方案:
一种兼具3D异型工件公自转的自动连续式真空镀膜产线,其包含直线分布式多真空腔室镀膜系统、自动输送系统、平移载板工装系统;所述直线分布式多真空腔室镀膜系统包含多个呈直线排布的真空腔室,相邻两真空腔室之间设置有真空隔离门;所述自动输送系统包含自动上料载台、自动下料载台、及均设置在自动上料载台、自动下料载台之间的回流输送线和复合动力输送线;所述直线分布式多真空腔室镀膜系统两端分别连接自动上料载台和自动下料载台;所述复合动力输送线设置有传动切换装置驱动平移载板工装系统的移动或转动。
进一步的,所述回流输送线设置在直线分布式多真空腔室镀膜系统的一侧;所述复合动力输送线穿过直线分布式多真空腔室镀膜系统。
进一步的,所述平移载板工装系统的转动方式为公转或公自转。
进一步的,所述直线分布式多真空腔室镀膜系统包含进料腔室、清洗腔室、前处理腔室、镀膜腔室、后处理腔室、出料腔室;所述镀膜腔室为一个或多个。
进一步的,所述前处理腔室和后处理腔室均设置有离化靶和硅油系统。
进一步的,所述清洗腔室设置有轰击靶,用于对工件进行离子轰击清洗以进一步提高基材表面活性利于薄膜沉积。
进一步的,所述镀膜腔室设置有溅射源,所述溅射源采用侧面安装或卧式安装;用于工件表面的薄膜溅射。
进一步的,所述溅射源的镀膜方式为蒸发、溅射、多弧、(PE)ALD、(PE)CVD、(后)反应PVD中的一种或多种。
进一步的,所述平移载板工装系统依次包含内齿轮、外齿轮、自转转轴、第一轴承座、转台、支承轴承、第二轴承座、公转动力输入轴、载台、固定轴、连接杆、连接圆板、行车轮、转动轮、及一个或多个工件悬挂杆。
进一步的,所述工件悬挂杆直接设置在转台上,随转台转动而公转;或所述工件悬挂杆插入自转转轴,随转台转动而公转,同时随自转转轴转动而自转。
和现有技术相比,本发明提供的兼具3D异型工件公自转的自动连续式真空镀膜产线具有如下有益效果:
(1)设计有直线分布式真空腔体系统,各真空腔室间设计有真空隔离门,除进料腔室和出料腔室上下料时需破坏真空氛围,其它工艺腔室均能保持原有真空氛围,能更好保证工艺稳定性,设备也更加节能;
(2)自动连续式真空镀膜产线相比单真空腔室镀膜设备产线自动化程度更高,所需设备操控人员大大减少,人力成本大幅降低;能够实现连续生产镀膜,设备更加高效,同产能配置投入减低,场地面积节约;
(3)采用直线分布式多真空腔室系统,离化靶、轰击靶、溅射源等前后处理及各种镀膜工艺均在不同真空腔室中反应,各工艺段相互污染减少,提高了工件镀膜质量;
(4)镀膜平移载板工装系统设计有两种运动模式,平移+公转模式适合平面性工件单面/双面镀膜,同时满足单件大尺寸的异性工件镀膜,平移+公自转模式能很好兼容各种3D异形工件的镀膜,全方位旋转,使镀膜更加均匀,提高产品镀膜质量。
附图说明
构成本申请的一部分的附图用来提供对本发明的进一步理解,本发明的示意性实施例及其说明用于解释本发明,并不构成对本发明的不当限定。在附图中:
图1为本发明提供的一种兼具3D异型工件公自转的自动连续式真空镀膜产线一实施例的结构示意主视图。
图2为本发明提供的一种兼具3D异型工件公自转的自动连续式真空镀膜产线一实施例的结构示意俯视图。
图3为本发明提供的一种兼具3D异型工件公自转的自动连续式真空镀膜产线一实施例的平移载板工装系统的结构示意图。
图4为本发明提供的一种兼具3D异型工件公自转的自动连续式真空镀膜产线一实施例的平移载板工装系统的主视图。
图5为本发明提供的一种兼具3D异型工件公自转的自动连续式真空镀膜产线一实施例的3D异型工件在公自转模式下镀膜旋转示意(图4的A-A'剖视图)。
图6为本发明提供的一种兼具3D异型工件公自转的自动连续式真空镀膜产线一实施例的平面性工件在公转模式镀膜旋转示意(更换工件悬挂杆后图4的A-A'剖视图)。
附图中:1、进料腔室,2、清洗腔室,3、前处理-镀硅油腔室,4、镀膜腔室,5、后处理-镀硅油腔室,6、出料腔室,7、自动上料载台,8、自动下料载台,9、第一真空隔离门,10、第二真空隔离门,11、第三真空隔离门,12、第四真空隔离门,13、第五真空隔离门,14、第六真空隔离门,15、第七真空隔离门,16、轰击靶,17、离化靶一,18、硅油系统一,19、溅射源,20、离化靶二,21、硅油系统二,22、平移载板工装系统,23、内齿轮,24、外齿轮,25、自转转轴,26、轴承座一,27、转台,28、支承轴承,29、轴承座,30、公转动力输入轴,31、载台,32、固定轴,33、连接杆,34、连接圆板,35、行车轮,36传动轮,37工件悬挂杆一,38回流输送线,39、复合动力输送线,40、工件悬挂杆二,41、工件悬挂杆三。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白,以下结合附图及实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。
如图1-3所示,一种兼具3D异型工件公自转的自动连续式真空镀膜产线,其包含直线分布式多真空腔室镀膜系统、自动输送系统、平移载板工装系统;所述直线分布式多真空腔室镀膜系统包含多个呈直线排布的真空腔室,相邻两真空腔室之间设置有真空隔离门;具体的,所述直线分布式多真空腔室镀膜系统包含进料腔室1、清洗腔室2、前处理腔室3、镀膜腔室4、后处理腔室5、出料腔室6;进料腔室1与清洗腔室2之间设置有第二真空隔离门10,清洗腔室2与前处理腔室3之间设置有第三真空隔离门11,前处理腔室3与镀膜腔室4之间设置有第四真空隔离门12,镀膜腔室4与后处理腔室5之间设置有第五真空隔离门13,后处理腔室5与出料腔室6之间设置有第六真空隔离门14。其中,进料腔室1为待镀膜工件上料后从大气到真空的过渡腔室。上料完成后,首先关闭两侧第一真空隔离门9和第二真空隔离门10再进行抽真空;然后当腔室真空度达到设计要求时,打开第二真空隔离门10,此时进料腔室1与清洗腔室2连通;将待镀膜工件转移到清洗腔室2并关闭第二真空隔离门10。
清洗腔室2中设置有轰击靶16,用于对工件进行离子轰击清洗以进一步提高基材表面活性利于薄膜沉积。前处理腔室3中设置有离化靶一17、硅油系统一18;硅油蒸发于真空室内后采用高压电离方式将硅油分解为氧化硅等硅系成分在工件表面镀上一层硅系保护膜,以提高反射镜的反射率。镀膜腔室4中设置有溅射源19。后处理腔室5中设置有离化靶二20、硅油系统二21;硅油蒸发于真空室内后采用高压电离方式将硅油分解为氧化硅等硅系成分在工件表面镀上一层一硅系保护膜,能提高镀膜的机械强度,阻隔有害气体对保护膜的侵蚀,并提高反射镜的反射率。
在一些实施例中,所述镀膜腔室4为多个,实现叠层材料的组合镀膜(多层镀膜)。
在一些实施例中,所述溅射源19的的镀膜方式为蒸发、溅射、多弧、(PE)ALD、(PE)CVD、(后)反应PVD中的一种或多种,并根据镀膜方式和工件外形采用侧面安装或卧式安装。所述溅射源19用于在工件表面的镀上一层薄膜。镀膜工艺兼容金属膜、光学膜、硬质膜、保护膜、抗指纹膜、防水膜等。
出料腔室6作为已镀膜工件从真空到大气的过渡。镀膜下料完成后,关闭第七真空隔离门15再进行抽真空;当腔室真空度达到要求时,保压等待前一工艺处理完成;前一工艺处理完成后先打开第六真空隔离门14,后处理腔室5与出料腔室6连通;再将已镀膜工件转移到出料腔室6并关闭第六真空隔离门14;最后再打开第七真空隔离门15,已镀膜工件转移到自动下料载台8,完成已镀膜工件下料。
所述自动输送系统包含自动上料载台7、自动下料载台8、及均设置在自动上料载台7、自动下料载台8之间的回流输送线38和复合动力输送线39;所述直线分布式多真空腔室镀膜系统两端分别连接自动上料载台7和自动下料载台8;所述复合动力输送线39驱动平移载板工装系统22的移动或转动;所述自动上料载台7与进料腔室1之间设置有第一真空隔离门9,所述出料腔室6与自动下料载台8之间设置有第七真空隔离门15。
在一些实施例中,所述回流输送38设置在直线分布式多真空腔室镀膜系统的一侧;所述复合动力输送线39穿过直线分布式多真空腔室镀膜系统。
所述自动上料载台7用于实现把平移载板工装系统22从回流输送线38转移到复合动力输送线39上。所述自动下料载台8用于实现把平移载板工装系统22从复合动力输送线39转移到回流输送线38上。所述回流输送线38用于实现把平移载板工装系统22从自动下料载台8转移到自动上料载台7。所述复合动力输送线39用于驱动平移载板工装系统22的移动及公自转。
所述复合动力输送线39设置有传动切换装置,在一些实施例中,所述传动切换装置为离合装置,通过离合装置的切换实现能驱动平移载板工装系统22沿工艺流向运行到相应真空腔室,或在行走小车停止状态下转动,即公转或公自转。
在一些实施例中,如图4所示,33所述平移载板工装系统22依次包含内齿轮23、外齿轮23、自转转轴25、第一轴承座26、转台27、支承轴承28、第二轴承座29、公转动力输入轴30、载台31、固定轴32、连接杆33、连接圆板34、行车轮35、转动轮36、工件悬挂杆一37、工件悬挂杆二40和工件悬挂杆三41。公转动力输入轴30传递输入的力矩,直接带动转台27、连接杆33、连接圆板34整体转动,进而带工件围绕载台31中心轴公转。内齿轮23通过固定轴32与转台27连接,当内齿轮23转动时与之啮合的外齿轮24跟随差转动,驱动自转转轴25转动。
所述工件悬挂杆一37、工件悬挂杆二40、工件悬挂杆三41用于工件放置悬挂以便完成镀膜。如图5所示,当需要公自转镀膜时,工件悬挂杆一37插入到自转转轴25的U槽中,随自转转轴25转动而自转,同时随转台27转动而公转,实现工件公自转镀膜。如图6所示,另外当只需公转镀膜时,拆除悬挂杆一37,直接在转台27上安装工件悬挂杆二40、工件悬挂杆三41,实现工件公转镀膜。
本发明提供的兼具3D异型工件公自转的自动连续式真空镀膜产线,其工作过程如下:平移载板工装系统22通过回流输送线38运行到自动上料载台7处,由人工把待镀膜的3D异型工件上料到平移载板工装系统22上的工件悬挂杆37;随后自动上料载台7动作把平移载板工装系统22转移到复合动力输送线39上面并进入进料腔室1,进料腔室1抽真空,作为大气到真空的过渡;随后平移载板工装系统22通过传动切换装置与复合动力输送线39接触,转移到清洗腔室2对工件进行离子轰击表面清洁处理,轰击过程中平移载板工装系统22通过传动切换装置的切换,实现3D异型工件的公自转镀膜,带动工件公自转,全方位轰击提高薄膜附着力;随后转移到前处理腔室3进行镀硅油处理;随后转移到镀膜腔室4中进行溅射镀膜;随后转移到后处理腔室5进行镀硅油处理;随后转移到后出料腔室6,出料腔室抽真空,作为真空到大气的过渡;随后转移到自动下料载台8,由人工把镀膜完成的3D异型工件从工件悬挂杆37上取下来;最后工件公自转小车系统通过回流输送线38运行到自动上料载台7工位循环作业。当待镀膜的工件为平面性工件时,人工把待镀膜的平面性工件上料到平移载板工装系统22上的工件悬挂杆40和工件悬挂杆41上,实现工件的公转镀膜。
兼具3D异型工件公自转的自动连续式真空镀膜产线设计有两种运动模式,平移+公转模式适合平面性工件单面/双面镀膜,同时满足单件大尺寸的异性工件镀膜,平移+公自转模式能很好兼容各种3D异形工件的镀膜,全方位旋转,使镀膜更加均匀,提高产品镀膜质量。该真空镀膜产线产线具有极高产品镀膜兼容性。
以上所述仅为本发明的较佳实施例而已,并不用以限制本专利,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本专利的保护范围之内。

Claims (10)

1.一种兼具3D异型工件公自转的自动连续式真空镀膜产线,其特征在于:所述兼具3D异型工件公自转的自动连续式真空镀膜产线包含直线分布式多真空腔室镀膜系统、自动输送系统、平移载板工装系统;所述直线分布式多真空腔室镀膜系统包含多个呈直线排布的真空腔室,相邻两真空腔室之间设置有真空隔离门;所述自动输送系统包含自动上料载台、自动下料载台、及均设置在自动上料载台、自动下料载台之间的回流输送线和复合动力输送线;所述直线分布式多真空腔室镀膜系统两端分别连接自动上料载台和自动下料载台;所述复合动力输送线设置有传动切换装置驱动平移载板工装系统的移动或转动。
2.根据权利要求1所述兼具3D异型工件公自转的自动连续式真空镀膜产线,其特征还在于:所述回流输送线设置在直线分布式多真空腔室镀膜系统的一侧;所述复合动力输送线穿过直线分布式多真空腔室镀膜系统。
3.根据权利要求1所述兼具3D异型工件公自转的自动连续式真空镀膜产线,其特征还在于:所述平移载板工装系统的转动方式为公转或公自转。
4.根据权利要求1所述兼具3D异型工件公自转的自动连续式真空镀膜产线,其特征还在于:所述直线分布式多真空腔室镀膜系统包含进料腔室、清洗腔室、前处理腔室、镀膜腔室、后处理腔室、出料腔室;所述镀膜腔室为一个或多个。
5.根据权利要求4所述兼具3D异型工件公自转的自动连续式真空镀膜产线,其特征还在于:所述前处理腔室和后处理腔室均设置有离化靶和硅油系统。
6.根据权利要求4所述兼具3D异型工件公自转的自动连续式真空镀膜产线,其特征还在于:所述清洗腔室设置有轰击靶,用于对工件进行离子轰击清洗以进一步提高基材表面活性利于薄膜沉积。
7.根据权利要求4所述兼具3D异型工件公自转的自动连续式真空镀膜产线,其特征还在于:所述镀膜腔室设置有溅射源,所述溅射源采用侧面安装或卧式安装。
8.根据权利要求7所述兼具3D异型工件公自转的自动连续式真空镀膜产线,其特征还在于:所述溅射源的镀膜方式为蒸发、溅射、多弧、(PE)ALD、(PE)CVD、(后)反应PVD中的一种或多种。
9.根据权利要求1所述兼具3D异型工件公自转的自动连续式真空镀膜产线,其特征还在于:所述平移载板工装系统依次包含内齿轮、外齿轮、自转转轴、第一轴承座、转台、支承轴承、第二轴承座、公转动力输入轴、载台、固定轴、连接杆、连接圆板、行车轮、转动轮、及一个或多个工件悬挂杆。
10.根据权利要求9所述兼具3D异型工件公自转的自动连续式真空镀膜产线,其特征还在于:所述工件悬挂杆直接设置在转台上,随转台转动而公转;或所述工件悬挂杆插入自转转轴,随转台转动而公转,同时随自转转轴转动而自转。
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CN117305800A (zh) * 2023-11-29 2023-12-29 长沙正圆动力科技有限责任公司 一种具有多维旋转架的活塞环镀膜机

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CN117305800A (zh) * 2023-11-29 2023-12-29 长沙正圆动力科技有限责任公司 一种具有多维旋转架的活塞环镀膜机
CN117305800B (zh) * 2023-11-29 2024-02-13 长沙正圆动力科技有限责任公司 一种具有多维旋转架的活塞环镀膜机

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