CN116408690A - Method for predicting removal rate of polishing material of vibrating air mill - Google Patents
Method for predicting removal rate of polishing material of vibrating air mill Download PDFInfo
- Publication number
- CN116408690A CN116408690A CN202310441198.6A CN202310441198A CN116408690A CN 116408690 A CN116408690 A CN 116408690A CN 202310441198 A CN202310441198 A CN 202310441198A CN 116408690 A CN116408690 A CN 116408690A
- Authority
- CN
- China
- Prior art keywords
- polishing
- removal rate
- disc
- workpiece
- predicting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 129
- 239000000463 material Substances 0.000 title claims abstract description 34
- 238000000034 method Methods 0.000 title claims abstract description 30
- 239000004973 liquid crystal related substance Substances 0.000 claims description 10
- 238000005299 abrasion Methods 0.000 claims description 3
- 238000002474 experimental method Methods 0.000 claims description 3
- 238000007517 polishing process Methods 0.000 abstract description 7
- 230000000694 effects Effects 0.000 description 3
- 230000005489 elastic deformation Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/04—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/30—Computing systems specially adapted for manufacturing
Abstract
The invention discloses a method for predicting the removal rate of polishing materials of a vibrating air mill, which comprises the following steps: s1, sequentially extracting track points in a polishing track, and taking the currently extracted track points as current initial contact points; s2, calculating the maximum contact depth h corresponding to the constant grinding force F at the current initial contact point 0 Further calculating the size of the current polishing area; s3, calculating the current constant polishing force F and the material removal rate under the polishing area, wherein the removal rate represents the removal thickness. The polishing force and material removal rate are expressed according to the maximum contact depth of the polishing disc and the workpiece to be polished in the polishing process, and the polishing force is calculated by using the contact area equivalent, so that the method is suitable for polishing of the vibrating polishing discs with different shapes.
Description
Technical Field
The invention belongs to the technical field of workpiece processing, and particularly relates to a method for predicting the removal rate of polishing materials of a vibrating air mill.
Background
The polishing is to polish and grind the workpiece, remove a uniform layer on the surface of the workpiece, and has certain requirements on the quality and precision of the final surface, and the surface characteristics directly influence the use characteristics of the workpiece.
For polishing of free-form surfaces, such as hub surfaces, aircraft blades and other free-form surfaces, an oxide layer needs to be uniformly removed on the free-form surfaces, and the effect of an industrial robot for replacing a workpiece produced by manual polishing is inferior to that of a skilled worker, so that the workpiece is mainly polished manually at present.
The polishing process is accompanied by a large amount of dust and noise, irrecoverable damage is caused to the body of a worker, the consistency of the surface of the workpiece after polishing is related to the proficiency of the worker, and the quality of the polished workpiece is difficult to control and difficult to meet the requirements in modern industrial production.
Disclosure of Invention
The invention provides a method for predicting the removal rate of polishing materials of a vibrating air mill, and aims to solve the problems.
The invention discloses a method for predicting the removal rate of polishing materials of a vibrating air mill, which specifically comprises the following steps:
s1, sequentially extracting track points in a polishing track, and taking the currently extracted track points as current initial contact points;
s2, calculating the maximum contact depth h corresponding to the constant grinding force F at the current initial contact point 0 Further calculating the size of the current polishing area;
s3, calculating the current constant polishing force F and the material removal rate under the polishing area, wherein the removal rate represents the removal thickness in unit time.
Further, the maximum contact depth h under a constant polishing force F 0 The calculation formula is as follows:
wherein, the liquid crystal display device comprises a liquid crystal display device,
for the modulus of elasticity of the sanding disc, H is the thickness of the sanding discThe degree, beta is the nonlinear index of contact between the polishing disc and the workpiece, m is the radius of the polishing disc, theta is the included angle between the normal direction of the polishing disc and the normal direction of the workpiece at the initial contact point O, and b -1 Is the radius of curvature in the Y-axis direction at the initial contact point O of the workpiece surface.
Further, the calculation formula of the width w of the current polishing area is specifically as follows:
wherein h is 0 Is the maximum contact depth under constant polishing force F, m is the polishing disc radius, b -1 Is the curvature radius of the initial contact point O of the workpiece surface along the Y-axis direction, and theta is the included angle between the normal direction of the polishing disc and the normal direction of the workpiece.
Further, the calculation formula of the length l of the current polishing area is specifically as follows:
wherein h is 0 And θ is the included angle between the normal direction of the polishing disc and the normal direction of the workpiece.
Further, the calculation formula of the material removal rate MR is specifically as follows:
wherein r is the vibration radius of the polishing disc, K is the abrasion coefficient of the workpiece to be polished, v is determined by priori experiments w V for the polishing feed rate of the sanding plate m In order to ensure that the vibration speed of the polishing disc is equal to the polishing speed between the polishing disc and the free curved surface during polishing, Y is the coordinate of the current initial track point on the Y axis.
Further, a constant sharpening force of the current initial contact point is set based on the curvature b of the current initial contact point.
Further, in
In this case, the calculation formula of the constant polishing force is specifically as follows:
at the position of
In this case, the calculation formula of the constant polishing force is specifically as follows:
wherein c is a proportionality coefficient.
Further, the calculation formula of the proportionality coefficient c is specifically as follows:
wherein, the liquid crystal display device comprises a liquid crystal display device,
for the modulus of elasticity of the sanding disc, H is the thickness of the sanding disc and beta is the non-linear index of the contact of the sanding disc with the workpiece.
Further, in
During polishing, the free curved surface to be polished is concave, and cannot be polished.
The method for predicting the removal rate of the polishing material of the vibrating air mill has the following beneficial technical effects: (1) The method for predicting the material removal rate of the vibration polishing can realize offline prediction of the material removal rate in the vibration polishing process; (2) The polishing force and material removal rate are expressed according to the maximum contact depth of the polishing disc and the workpiece to be polished in the polishing process, and the polishing force is calculated by using the contact area equivalent, so that the method is suitable for polishing of polishing discs with different shapes; (3) The method for dividing the free curved surface according to the curvature size divides the area according to the curvature size of the curved surface, and different polishing force planning strategies are used on different areas, so that the method is better suitable for polishing workpieces with different curvatures.
Drawings
FIG. 1 is a flowchart of a method for predicting the removal rate of polishing materials of a vibrating air mill according to an embodiment of the present invention;
FIG. 2 is a schematic view of the surface contact between a sanding disc and a workpiece provided by an embodiment of the present invention;
fig. 3 is a schematic view of the contact area of fig. 2 projected in the XY plane.
Detailed Description
The following detailed description of the embodiments of the invention, given by way of example only, is presented in the accompanying drawings to aid in a more complete, accurate, and thorough understanding of the inventive concepts and aspects of the invention by those skilled in the art.
Fig. 1 is a flowchart of a method for predicting the removal rate of polishing materials of a vibrating air mill, which includes the following steps:
s1, sequentially extracting track points in a polishing track, and taking the currently extracted track points as current initial contact points;
fig. 2 is a schematic view of the contact between a polishing disc and the surface of a workpiece, wherein the polishing disc with the equivalent radius m initially contacts the workpiece at point O, an orthogonal coordinate system O-XYZ is established on the surface of the workpiece according to the following rule, the direction perpendicular to the surface of the workpiece at the initial contact point O aligned with the surface normal direction n is the Z axis, and the Y axis is given by the unit vector n×f. Defining the gray area as the contact area by locally deforming the grinding disc after being pressed into the workpiece by the inclined angle theta at the vicinity of the initial contact point O, which is the maximum contact depth in the contact area.
S2, calculating the maximum contact depth h corresponding to the constant grinding force F at the current initial contact point 0 Further calculate the current beatThe size of the abrasive area;
in the embodiment of the invention, the maximum contact depth h under constant polishing force F 0 The calculation is based on the following formula:
wherein, the liquid crystal display device comprises a liquid crystal display device,
for the elastic modulus of the polishing disc, H is the thickness of the polishing disc, beta is the nonlinear index of contact between the polishing disc and the workpiece, m is the radius of the polishing disc, theta is the included angle between the normal direction of the polishing disc and the normal direction of the workpiece at the initial contact point O, and b -1 Is the radius of curvature in the Y-axis direction at the initial contact point O of the workpiece surface.
In the embodiment of the invention, the maximum contact depth h 0 The dimensions of the front lapping area, i.e., the width w and length l of the current lapping area, are shown in FIG. 3 as projections of the contact area in the XY plane, i.e., the lapping area, in FIG. 2, C 1 Representing the shape of the grinding disc, the grinding disc can be in various shapes such as a circle, a triangle, a rectangle and the like, and the grinding force F and the maximum contact depth h can be calculated by using the formula (1) according to the shapes 0 Relation of C 2 The shape of the polishing region is determined by the curvature b of the workpiece surface, and the calculation formulas of the polishing region are respectively as follows:
s3, calculating the current constant polishing force F and the material removal rate under the polishing area, wherein the removal rate represents the removal thickness in unit time.
In the embodiment of the invention, a material removal rate model is established according to the preston equation, and the calculation formula of the material removal rate MR is specifically as follows:
wherein r is the vibration radius of the polishing disc, K is the abrasion coefficient of the workpiece to be polished, v is determined by priori experiments w V for the polishing feed rate of the sanding plate m In order to ensure that the vibration speed of the polishing disc is equal to the polishing speed between the polishing disc and the free curved surface during polishing, Y is the coordinate of the current initial track point on the Y axis.
When the inclination angle θ of the polishing disc is small, sin θ=θ, tan θ=θ, b < 0 is approximately considered to mean that the free curved surface is concave, b > 0 is convex, and b=0 is a polishing plane. In the embodiment of the invention, the constant polishing force of the current initial contact point is set according to the curvature b of the polishing area, and the setting method of the constant polishing force is specifically as follows:
(1) At the position of
When the radius of curvature of the free-form surface to be polished is far larger than the radius m of the polishing disc, the calculation formula of the constant polishing force is specifically as follows:
(2) At the position of
When the radius of curvature at the contact surface is far smaller than the radius of the polishing disc, the polishing force in the polishing process is no longer related to the radius of the polishing disc, and the radius of curvature is used for calculating the polishing force, namely:
wherein c is a proportionality coefficient, and the calculation formula is as follows:
the magnitude of beta is related to the material of the polishing disc contacting the workpiece, the elastic deformation capacity of the polishing disc is related, the beta with large elastic deformation amount per unit length is large, and when the elastic deformation amount is more than 20%, the value of beta is generally 0.8, and at the moment,
(3) At the position of
In this case, the free-form surface is relatively severely concave, and polishing cannot be performed.
The method for predicting the removal rate of the polishing material of the vibrating air mill has the following beneficial technical effects:
(1) The method for predicting the material removal rate of the vibration polishing can realize offline prediction of the material removal rate in the vibration polishing process;
(2) The polishing force and material removal rate are expressed according to the maximum contact depth of the polishing disc and the workpiece to be polished in the polishing process, and the polishing force is calculated by using the contact area equivalent, so that the method is suitable for polishing of polishing discs with different shapes;
(3) The method for dividing the free curved surface according to the curvature size divides the area according to the curvature size of the curved surface, and different polishing force planning strategies are used on different areas, so that the method is better suitable for polishing workpieces with different curvatures.
While the present invention has been described by way of example, it should be apparent that the practice of the invention is not limited by the foregoing, but rather is intended to cover various insubstantial modifications of the method concepts and teachings of the invention, either as applied to other applications without modification, or as applied directly to other applications, without departing from the scope of the invention.
Claims (9)
1. The method for predicting the removal rate of the polishing material of the vibrating air mill is characterized by comprising the following steps of:
s1, sequentially extracting track points in a polishing track, and taking the currently extracted track points as current initial contact points;
s2, calculating the maximum contact depth h corresponding to the constant grinding force F at the current initial contact point 0 Further calculating the size of the current polishing area;
s3, calculating the current constant polishing force F and the material removal rate under the polishing area, wherein the removal rate represents the removal thickness in unit time.
2. The method for predicting removal rate of polishing material by a vibratory air mill as claimed in claim 1, wherein the maximum contact depth h at a constant polishing force F 0 The calculation formula is as follows:
wherein, the liquid crystal display device comprises a liquid crystal display device,
for the elastic modulus of the polishing disc, H is the thickness of the polishing disc, beta is the nonlinear index of contact between the polishing disc and the workpiece, m is the radius of the polishing disc, theta is the included angle between the normal direction of the polishing disc and the normal direction of the workpiece at the initial contact point O, and b -1 Is the radius of curvature in the Y-axis direction at the initial contact point O of the workpiece surface.
3. The method for predicting the removal rate of polishing material of a vibratory air mill according to claim 1, wherein the width w of the current polishing area is calculated according to the following formula:
wherein h is 0 Maximum contact at constant polishing force FDepth, m is the polishing disc radius, b -1 Is the curvature radius of the initial contact point O of the workpiece surface along the Y-axis direction, and theta is the included angle between the normal direction of the polishing disc and the normal direction of the workpiece.
4. The method for predicting the removal rate of polishing material of a vibratory air mill according to claim 1, wherein the length l of the current polishing area is calculated according to the following formula:
wherein h is 0 And θ is the included angle between the normal direction of the polishing disc and the normal direction of the workpiece.
5. The method for predicting the removal rate of a polishing material of a vibratory mill as claimed in claim 1, wherein the calculation formula of the removal rate MR is as follows:
wherein r is the vibration radius of the polishing disc, K is the abrasion coefficient of the workpiece to be polished, v is determined by priori experiments w V for the polishing feed rate of the sanding plate m In order to ensure that the vibration speed of the polishing disc is equal to the polishing speed between the polishing disc and the free curved surface during polishing, Y is the coordinate of the current initial track point on the Y axis.
6. The method for predicting the removal rate of a polishing material of a vibratory finishing machine as set forth in claim 1, wherein the constant dressing force of the current initial contact point is set based on the curvature b of the current initial contact point.
7. The method for predicting removal rate of polishing material of vibratory air mill according to claim 6, wherein, in
In this case, the calculation formula of the constant polishing force is specifically as follows:
at the position of
In this case, the calculation formula of the constant polishing force is specifically as follows:
wherein c is a proportionality coefficient.
8. The method for predicting removal rate of polishing material in a vibratory air mill as recited in claim 7, wherein the scaling factor c is calculated as follows:
wherein, the liquid crystal display device comprises a liquid crystal display device,
for the modulus of elasticity of the sanding disc, H is the thickness of the sanding disc and beta is the non-linear index of the contact of the sanding disc with the workpiece.
9. The method for predicting removal rate of polishing material of vibratory air mill according to claim 7, wherein, in
During polishing, the free curved surface to be polished is concave, and cannot be polished.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310441198.6A CN116408690A (en) | 2023-04-20 | 2023-04-20 | Method for predicting removal rate of polishing material of vibrating air mill |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310441198.6A CN116408690A (en) | 2023-04-20 | 2023-04-20 | Method for predicting removal rate of polishing material of vibrating air mill |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116408690A true CN116408690A (en) | 2023-07-11 |
Family
ID=87052876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310441198.6A Pending CN116408690A (en) | 2023-04-20 | 2023-04-20 | Method for predicting removal rate of polishing material of vibrating air mill |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116408690A (en) |
-
2023
- 2023-04-20 CN CN202310441198.6A patent/CN116408690A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5166037B2 (en) | Grinding wheel | |
| JP6189407B2 (en) | Method for producing edge-reinforced article | |
| CN103084957B (en) | Glass plate and manufacture method, the Ginding process of glass plate end edge portion and device | |
| Zhang et al. | An investigation of material removal in polishing with fixed abrasives | |
| US7029367B2 (en) | Automated polishing process for mechanical parts in titanium or titanium alloy | |
| JP4234991B2 (en) | Manufacturing method of glass substrate for information recording medium and glass substrate for information recording medium manufactured by the manufacturing method | |
| JP3363587B2 (en) | Method and apparatus for processing brittle material | |
| KR102059203B1 (en) | The polishing apparatus and the polishing methdo for polishing the peripheral edge of the work, etc by the polishing tape | |
| JPS63120064A (en) | Method of forming indentation in edge of semiconductor substrate in high-power semiconductor structure element | |
| KR101677732B1 (en) | Scribing wheel and method for manufacturing the same | |
| JP6011627B2 (en) | Glass substrate polishing method | |
| Fiocchi et al. | Ultra-precision face grinding with constant pressure, lapping kinematics, and SiC grinding wheels dressed with overlap factor | |
| CN109794816A (en) | The axle journal method for fine finishing and axle journal of crankshaft, camshaft | |
| CN116408690A (en) | Method for predicting removal rate of polishing material of vibrating air mill | |
| JPH08192348A (en) | Grinding and polishing method and device therefor | |
| JP2001105292A (en) | Method and device for chamfering glass board | |
| CN202114611U (en) | Grinding equipment with a plurality of trimming devices | |
| JP2565385B2 (en) | Combined processing method and apparatus of electrolytic dressing grinding method and polishing method using conductive whetstone as tool | |
| US20240123567A1 (en) | Double-sided polishing method for optical lens | |
| CN215092961U (en) | Grinding wheel dressing device | |
| CN219787845U (en) | All-in-one polishing device | |
| WO2000024548A1 (en) | Polishing apparatus and a semiconductor manufacturing method using the same | |
| WO2023100957A1 (en) | Glass sheet manufacturing method | |
| CN208051561U (en) | A kind of face lapping mill | |
| KR101912345B1 (en) | Apparatus for polishing surface of a curved cover glass |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |