CN116376642B - Environment-friendly nano insulator cleaning agent and preparation method thereof - Google Patents
Environment-friendly nano insulator cleaning agent and preparation method thereof Download PDFInfo
- Publication number
- CN116376642B CN116376642B CN202310373498.5A CN202310373498A CN116376642B CN 116376642 B CN116376642 B CN 116376642B CN 202310373498 A CN202310373498 A CN 202310373498A CN 116376642 B CN116376642 B CN 116376642B
- Authority
- CN
- China
- Prior art keywords
- cleaning agent
- agent according
- microwave
- percent
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000012459 cleaning agent Substances 0.000 title claims abstract description 65
- 239000012212 insulator Substances 0.000 title claims abstract description 31
- 238000002360 preparation method Methods 0.000 title claims abstract description 12
- 230000007797 corrosion Effects 0.000 claims abstract description 23
- 238000005260 corrosion Methods 0.000 claims abstract description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 23
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000003223 protective agent Substances 0.000 claims abstract description 15
- 239000002738 chelating agent Substances 0.000 claims abstract description 14
- 239000003112 inhibitor Substances 0.000 claims abstract description 13
- 239000004094 surface-active agent Substances 0.000 claims abstract description 13
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 18
- 229920000805 Polyaspartic acid Polymers 0.000 claims description 13
- 108010064470 polyaspartate Proteins 0.000 claims description 13
- MXJDQIWBHIXNRE-UHFFFAOYSA-B C(CC(O)(C(=O)[O-])CC(=O)[O-])(=O)[O-].[C+4].C(CC(O)(C(=O)[O-])CC(=O)[O-])(=O)[O-].C(CC(O)(C(=O)[O-])CC(=O)[O-])(=O)[O-].C(CC(O)(C(=O)[O-])CC(=O)[O-])(=O)[O-].[C+4].[C+4] Chemical class C(CC(O)(C(=O)[O-])CC(=O)[O-])(=O)[O-].[C+4].C(CC(O)(C(=O)[O-])CC(=O)[O-])(=O)[O-].C(CC(O)(C(=O)[O-])CC(=O)[O-])(=O)[O-].C(CC(O)(C(=O)[O-])CC(=O)[O-])(=O)[O-].[C+4].[C+4] MXJDQIWBHIXNRE-UHFFFAOYSA-B 0.000 claims description 10
- 238000003756 stirring Methods 0.000 claims description 10
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 9
- 239000012964 benzotriazole Substances 0.000 claims description 9
- WXMKPNITSTVMEF-UHFFFAOYSA-M sodium benzoate Chemical compound [Na+].[O-]C(=O)C1=CC=CC=C1 WXMKPNITSTVMEF-UHFFFAOYSA-M 0.000 claims description 9
- 235000010234 sodium benzoate Nutrition 0.000 claims description 9
- 239000004299 sodium benzoate Substances 0.000 claims description 9
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 7
- 239000002736 nonionic surfactant Substances 0.000 claims description 7
- ONJQDTZCDSESIW-UHFFFAOYSA-N polidocanol Chemical group CCCCCCCCCCCCOCCOCCOCCOCCOCCOCCOCCOCCOCCO ONJQDTZCDSESIW-UHFFFAOYSA-N 0.000 claims description 7
- NHYZIQDLKOJOSI-UHFFFAOYSA-N [C].OC(=O)CC(O)(C(O)=O)CC(O)=O Chemical class [C].OC(=O)CC(O)(C(O)=O)CC(O)=O NHYZIQDLKOJOSI-UHFFFAOYSA-N 0.000 claims description 6
- -1 amino acid salts Chemical class 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 239000000243 solution Substances 0.000 claims description 6
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 230000035484 reaction time Effects 0.000 claims description 5
- LLKGTXLYJMUQJX-UHFFFAOYSA-M sodium;3-[2-carboxyethyl(dodecyl)amino]propanoate Chemical group [Na+].CCCCCCCCCCCCN(CCC(O)=O)CCC([O-])=O LLKGTXLYJMUQJX-UHFFFAOYSA-M 0.000 claims description 5
- 238000004108 freeze drying Methods 0.000 claims description 4
- 239000003002 pH adjusting agent Substances 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 4
- 239000007787 solid Substances 0.000 claims description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 4
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 claims description 2
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 claims description 2
- GIAFURWZWWWBQT-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO GIAFURWZWWWBQT-UHFFFAOYSA-N 0.000 claims description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 claims description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 claims description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000005642 Oleic acid Substances 0.000 claims description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 229940065856 cocoyl glycinate Drugs 0.000 claims description 2
- GALLUVDCTUHKRY-UHFFFAOYSA-L disodium;3-[2-carboxylatoethyl(octadecyl)amino]propanoate Chemical compound [Na+].[Na+].CCCCCCCCCCCCCCCCCCN(CCC([O-])=O)CCC([O-])=O GALLUVDCTUHKRY-UHFFFAOYSA-L 0.000 claims description 2
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 claims description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 claims description 2
- 229940102253 isopropanolamine Drugs 0.000 claims description 2
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 claims description 2
- QRDZFPUVLYEQTA-UHFFFAOYSA-N quinoline-8-carboxylic acid Chemical compound C1=CN=C2C(C(=O)O)=CC=CC2=C1 QRDZFPUVLYEQTA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 229940080258 tetrasodium iminodisuccinate Drugs 0.000 claims description 2
- GYBINGQBXROMRS-UHFFFAOYSA-J tetrasodium;2-(1,2-dicarboxylatoethylamino)butanedioate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CC(C([O-])=O)NC(C([O-])=O)CC([O-])=O GYBINGQBXROMRS-UHFFFAOYSA-J 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 9
- 239000002184 metal Substances 0.000 abstract description 9
- 230000006378 damage Effects 0.000 abstract description 5
- 229920001971 elastomer Polymers 0.000 abstract description 3
- 239000005060 rubber Substances 0.000 abstract description 3
- 239000000919 ceramic Substances 0.000 abstract description 2
- 150000002739 metals Chemical class 0.000 abstract description 2
- 238000004140 cleaning Methods 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 12
- 239000012855 volatile organic compound Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 8
- 230000007613 environmental effect Effects 0.000 description 5
- 239000002096 quantum dot Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000002086 nanomaterial Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 229920002379 silicone rubber Polymers 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 125000003636 chemical group Chemical group 0.000 description 2
- 238000005536 corrosion prevention Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 238000001027 hydrothermal synthesis Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 235000013162 Cocos nucifera Nutrition 0.000 description 1
- 244000060011 Cocos nucifera Species 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000006184 cosolvent Substances 0.000 description 1
- 238000005202 decontamination Methods 0.000 description 1
- 230000003588 decontaminative effect Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000004313 potentiometry Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/825—Mixtures of compounds all of which are non-ionic
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/0005—Other compounding ingredients characterised by their effect
- C11D3/0073—Anticorrosion compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/12—Water-insoluble compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2075—Carboxylic acids-salts thereof
- C11D3/2079—Monocarboxylic acids-salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/28—Heterocyclic compounds containing nitrogen in the ring
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/33—Amino carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/34—Organic compounds containing sulfur
- C11D3/349—Organic compounds containing sulfur additionally containing nitrogen atoms, e.g. nitro, nitroso, amino, imino, nitrilo, nitrile groups containing compounds or their derivatives or thio urea
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/37—Polymers
- C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C11D3/3769—(Co)polymerised monomers containing nitrogen, e.g. carbonamides, nitriles or amines
- C11D3/3773—(Co)polymerised monomers containing nitrogen, e.g. carbonamides, nitriles or amines in liquid compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Inorganic Chemistry (AREA)
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
The invention relates to an environment-friendly nano insulator cleaning agent and a preparation method thereof, wherein the cleaning agent comprises the following components in percentage by mass: 0.5-2% of pH regulator, 8-20% of surfactant, 0.2-1% of film forming protective agent, 0.2-0.8% of corrosion inhibitor, 0.2-0.8% of carbon quantum dot, 0.5-1% of chelating agent and the balance of water. The cleaning agent has moderate pH value, little harm to human bodies and environment, extremely low conductivity, high operation safety, no corrosion to rubber, ceramics and metals, and is suitable for various applications.
Description
Technical Field
The invention relates to the technical field of rail transit, in particular to an environment-friendly nano insulator cleaning agent and a preparation method thereof.
Background
The insulator is an electronic component commonly used for a motor train unit and a contact net system, and the surface of the insulator needs to be cleaned regularly in coastal areas or high pollution areas so as to achieve the aim of cleaning. Otherwise, after the surface of the insulator is polluted and piled up, the insulation performance of the insulator is greatly reduced, even the insulator breaks down, and flashover, also called pollution flashover, is formed. If pollution flashover is formed, the insulator is damaged, so that the insulation performance of the insulator is further reduced, and vicious circle is formed, so that the insulator cleaning process and the use of cleaning agents are key factors for determining the service life of the insulator. The existing insulator cleaning agent products are divided into solvent type, water-based type and semi-water-based type, and the existing products are mostly water-based type and semi-water-based type. Most of the existing insulator cleaning agents only pay attention to cleaning performance, and corrosion and environmental protection problems possibly caused by the cleaning agents are less researched.
CN112812895a provides a cleaning composition for composite insulators with repairing function, which comprises a dirt cleaning agent and an organic silicon rubber repairing agent, does not contain corrosiveness and forbidden substances, can form a repairing layer, repairs corroded and rugged parts of a surface layer, and contains a dust-proof agent which can effectively reduce the subsequent dirt storage probability of insulators and prolong the cleaning period.
CN111763583a discloses a cleaning agent for silicone rubber composite insulator, which comprises main cleaning agent, penetrating agent, stripping agent, cosolvent and water, and the adopted cleaning agent components are green and environment-friendly organic matters, and are nontoxic and harmless to human body and environment. Has obvious decontamination effect and strong penetrability.
However, the existing silicon rubber composite insulator cleaning agent has the following obvious defects: (1) the VOC content is generally higher, which does not meet the environmental protection requirement; (2) The conductivity is generally high, residues are easy to cause in the process of cleaning electrical elements, and potential safety hazards are increased; (3) Without considering the corrosiveness of the metal, corrosion is easily caused to the circuit or metal parts that may be contacted during the cleaning process.
The carbon quantum dot is a novel nano material developed in recent years, and the preparation process is relatively simple, and mainly comprises a carbon core and an outer surface chemical group, wherein the outer surface chemical group is related to a synthesized reactant.
Disclosure of Invention
In order to overcome the defects of the traditional insulator cleaning agent, the invention provides an environment-friendly nano insulator cleaning agent which has a proper pH value (weak alkalinity), is low in harm to human bodies and environment, extremely low in conductivity, high in operation safety, free of corrosion to rubber, ceramics and metals, and suitable for various applications. The VOC content of the cleaning agent is lower than 100g/L, and the cleaning agent belongs to a low VOC cleaning agent, and greatly reduces the conductivity of the product while ensuring the detergency. The surfactant used in the invention is biodegradable and has less environmental pollution. The invention has better cleaning effect on various dirt and has strong practicability. The surface of the cleaning device is provided with a layer of polymer protective film, so that components can be effectively protected within a certain time. The product contains the carbon quantum dot nano material, can improve the cleaning effect and prevent metal corrosion.
In order to solve the problems, the invention provides an environment-friendly nano insulator cleaning agent, which comprises the following components in percentage by mass: 0.5-2% of pH regulator, 8-20% of surfactant, 0.2-1% of film forming protective agent, 0.2-0.8% of corrosion inhibitor, 0.2-0.8% of carbon quantum dot, 0.5-1% of chelating agent and the balance of water.
Preferably, the cleaning agent comprises the following components in percentage by mass: 0.5 to 1 percent of pH regulator, 10 to 15 percent of surfactant, 0.4 to 0.8 percent of film forming protective agent, 0.2 to 0.4 percent of corrosion inhibitor, 0.2 to 0.5 percent of carbon quantum dot, 0.5 to 0.8 percent of chelating agent and the balance of water.
Further preferably, the cleaning agent comprises the following components in percentage by mass: 0.8% of pH regulator, 15% of surfactant, 0.6% of film forming protective agent, 0.4% of corrosion inhibitor, 0.5% of carbon quantum dot, 0.6% of chelating agent and the balance of water.
In one embodiment, the pH adjuster is selected from one or more of triethanolamine, isopropanolamine, diglycolamine.
Preferably, the pH adjuster is triethanolamine.
In one embodiment, the surfactant is a nonionic surfactant.
Preferably, the nonionic surfactant is selected from one or more of AEO-9, AEO7, 6501, coconut fatty acid diethanolamide.
Further preferably, the nonionic surfactant is AEO-9.
In one embodiment, the film forming protective agent is an amino acid salt, such as: sodium lauriminodipropionate, disodium steariminodipropionate, sodium N-carboxymethyl-N-cocoyl glycinate, tetrasodium iminodisuccinate, and the like.
Preferably, the film-forming protective agent is sodium lauriminodipropionate.
In one embodiment, the corrosion inhibitor is selected from one or more of 8-quinolinecarboxylic acid, sodium benzoate, thiourea, oleic acid imidazoline, benzotriazole.
Preferably, the corrosion inhibitor is a mixture of sodium benzoate and benzotriazole, and the mass ratio of the sodium benzoate to the benzotriazole is (1-4): 1.
further preferably, the mass ratio of the sodium benzoate to the benzotriazole is 3:1.
in one embodiment, the carbon quantum dots are nitrogen-doped citric acid carbon quantum dots.
Preferably, the nitrogen-doped carbon citrate quantum dot is prepared from ethylenediamine and citric acid serving as raw materials by a microwave method.
In one embodiment, the preparation method of the nitrogen-doped carbon citrate quantum dot comprises the following steps:
(1) 1-3g of citric acid and 0.5-1g of ethylenediamine are added into 30-50ml of water and completely dissolved.
(2) And (3) placing the solution obtained in the step (1) into microwave equipment for microwave.
(3) And (3) carrying out freeze-drying treatment on the nitrogen-doped carbon citrate quantum dots subjected to the microwave treatment in the step (2) to obtain solid powder.
Preferably, the step (1) is to add 2g of citric acid and 0.94g of ethylenediamine to 40ml of water and dissolve completely.
In one embodiment, in step (2), the microwave conditions are: the microwave power is 600-900W, the microwave temperature is 160-200 ℃, and the reaction time is 15-25min.
Preferably, the microwave conditions are: the microwave power is 800W, the microwave temperature is 190 ℃, and the reaction time is 20min.
In one embodiment, the chelating agent is selected from one or more of polyaspartic acid or methylglycine diethylamine.
Preferably, the chelating agent is polyaspartic acid.
Further preferably, the polyaspartic acid has an average molecular weight of 5000 to 10000. For example, available from Hebei cooperative environmental protection technologies, inc., CAS number: 181828-06-8.
Generally, the addition of a metal corrosion prevention system (generally inorganic salts) can improve the conductivity, and under the system, the inventor of the application can not only reduce the addition content of the inorganic salts, but also play a role in corrosion prevention and cleaning improvement by adding amino acid salts and carbon quantum dots. The possible reason is that the nitrogen doped citric acid carbon quantum dot has good water solubility, small size and low biotoxicity, can be quickly and deeply combined with the dirt on the surface of the insulator, improves the cleaning effect, and after the dirt is cleaned, the carbon quantum dot remained on the surface of the insulator forms a protective film on the surface of the insulator under the action of the film forming protective agent, so that the metal corrosion can be further prevented. However, the present inventors have found in a large number of experiments that the above problems can be solved by adding polyaspartic acid and controlling the average molecular weight to 5000-10000, and the stability of the protective film can be improved. The possible reason is that the polyaspartic acid is further combined with the film forming protective agent and the carbon quantum dots after being added into the cleaning agent formula, so that the surface film is smoother, has an automatic purifying function, can reduce the adhesive force of surface dirt after long-term use, and improves the cleaning effect. Due to the addition of the corrosion-resistant system and the carbon quantum dot nano material, the insulator is protected from damage, and meanwhile, metal parts which are possibly contacted in the cleaning process are protected from damage. The VOC content of the cleaning agent is lower than 100g/L, and belongs to low-VOC cleaning agent products.
The invention also provides a preparation method of the environment-friendly nano insulator cleaning agent, which comprises the following steps: and (3) taking deionized water, sequentially adding a surfactant, a film forming protective agent, a corrosion inhibitor, carbon quantum dots and a chelating agent, finally adding a pH regulator, stirring, and standing to obtain the aqueous solution.
In one embodiment, a pH adjustor is added to adjust the pH to 7.0-9.5.
In one embodiment, the stirring process is at a rotational speed of 200-500rpm and the stirring time is 10-30 minutes.
Preferably, the stirring process is carried out at a speed of 200-500rpm for 20min.
In one embodiment, the resting time is 1 to 5 hours.
Preferably, the rest time is 2 hours.
Advantageous effects
The conductivity of the cleaning agent is far lower than that of the existing cleaning agent, and the cleaning agent is safer for cleaning electric appliances than other products; the pH value of the cleaning agent is moderate, and the cleaning agent has little damage to human bodies and rubber. The cleaning agent provided by the invention can achieve higher cleaning effect and corrosion resistance, and the cleaning power of the cleaning agent is greatly improved compared with other products. The VOC limit value of the cleaning agent is 19g/L, and meets the environmental protection requirement. The cleaning agent provided by the invention can effectively inhibit corrosion and improve the cleaning effect. The cleaning agent disclosed by the invention contains a high-molecular film-forming component, and can protect the surface of an insulator within a certain time, so that the anti-flashover capability of the insulator is improved.
Detailed Description
The following describes the invention in more detail. The description of these embodiments is provided to assist understanding of the present invention, but is not intended to limit the present invention. In addition, the technical features of the embodiments of the present invention described below may be combined with each other as long as they do not collide with each other.
Examples 1 to 6
The formulations of examples 1-6 are shown in Table 1 below:
TABLE 1
The preparation method of the nitrogen-doped citric acid carbon quantum dots in examples 1-6 comprises the following steps:
(1) 2g of citric acid, 0.94g of ethylenediamine are added to 40ml of water and dissolved completely.
(2) The solution was placed in a microwave apparatus with a power of 800W, a temperature of 190 c and a reaction time of 15min.
(3) And (3) performing freeze-drying treatment on the nitrogen-doped carbon citrate quantum dots subjected to the microwave treatment in the step (2) to obtain solid powder.
The polyaspartic acid was purchased from Hebei cooperative environmental protection technology Co., ltd., CAS number: 181828-06-8.
The preparation method of the cleaning agent in the examples 1-6 comprises the following steps: taking deionized water, sequentially adding AEO-9, sodium lauriminodipropionate, sodium benzoate, benzotriazole and nitrogen-doped citric acid carbon quantum dots, polyaspartic acid, finally adding triethanolamine to adjust the pH to 8.25, stirring for 20min, stirring at 350rpm, and standing for 2h to obtain the product.
Example 7
The difference from example 6 is that the polyaspartic acid has an average molecular weight of 10000.
Example 8
Example 8 differs from example 6 in that methylglycine diethylamine was used as the chelating agent.
Comparative example 1
Comparative example 1 differs from example 6 in that the nitrogen-doped carbon citrate quantum dots were prepared by a hydrothermal method, which is:
(1) 2g of citric acid, 0.94g of ethylenediamine are added to 40ml of water and dissolved completely.
(2) The solution was placed in a hydrothermal reaction kettle, and placed in an oven at 190℃for 6 hours.
(3) And (3) carrying out freeze-drying treatment on the nitrogen-doped carbon citrate quantum dots subjected to the microwave treatment in the step (2) to obtain solid powder.
Comparative example 2
Comparative example 2 differs from example 6 in that the AEO-9 content is 5%.
Comparative example 3
Comparative example 3 differs from example 6 in that the nitrogen-doped carbon citrate quantum dot content is 0.1%.
Comparative example 4
Comparative example 4 differs from example 6 in that the nitrogen-doped carbon citrate quantum dot content is 1%.
Comparative example 5The difference from example 6 is that citric acid is used instead of nitrogen-doped carbon citrate quantum dots.
Test example:
performance test:
1. metal corrosiveness: examples 1-8, comparative examples 1-5 were tested with reference to the Q/CR468-2015 motor train unit external surface cleaner standard. The specific method comprises the following steps: the 45# steel coupon was immersed in a 5% detergent solution, tested at 40 ℃ for 4 hours, taken out, observed in appearance, and calculated for weight loss, and the results are shown in table 2 below.
2. Cleaning power: examples 1-8, comparative examples 1-5 were tested with reference to the Q/CR468-2015 motor train unit external surface cleaner standard. The specific method comprises the following steps: the oil stain was applied to the surface of a specific test piece, immersed in a 5% detergent solution, immersed by a pendulum washer, pendulum washed, then weighed, and the percent of the oil stain washed was calculated, and the results are shown in table 2 below.
3. Conductivity: the stock solutions of examples 1 to 8 and comparative examples 1 to 5 were tested for conductivity using a conductivity tester, and the results are shown in Table 2 below.
TABLE 2
4. Contact Angle experiment
Test sample: sample 1: polyaspartic acid molecular weight was 3000, the remainder being the same as in example 6; sample 2: the cleaning agent of example 6; sample 3: the cleaning agent of example 7; sample 4: polyaspartic acid had a molecular weight of 20000, and the rest was the same as in example 6.
The experimental method comprises the following steps: and (3) soaking the sample wafer made of the insulator material by adopting the samples 1-4, taking out after 2 hours, and testing the contact angle between the material and water. The results are shown in Table 3 below:
TABLE 3 Table 3
Since the greater the contact angle, the higher the hydrophobicity and the better the film quality, the above-mentioned samples 2-3 each have a contact angle exceeding 120, and thus the film quality of both is superior to that of sample 1 and sample 4.
5. pH value: the stock solution of example 6 was tested for pH at 8.25 using a pH electrode with reference to the potentiometric method of GB/T6368-2008 aqueous surfactant pH.
The experimental results show that under the same concentration condition, the product has moderate pH value, lower conductivity and lower ion content and is safer. And the corrosion to the 45# steel is very low, so that steel parts possibly contacted in the cleaning process are effectively protected.
6. VOC content testing: the product of example 6 was tested using GB/T38508-2020 "limit for the volatile organic Compound content of the cleaning agent", and its VOC content was=19 g/L, meeting the requirements for low VOC cleaning agents in GB/T38508-2020 "limit for the volatile organic Compound content of the cleaning agent".
7. Selection of nonionic surfactant: the formulation and method of preparation of example 6 were used, except that a different nonionic surfactant was used: AEO-9, AEO-7, 6501, the detergency test method was referred to as Q/CR468-2015, and the results are shown in Table 4 below.
TABLE 4 Table 4
| Composition of the components | AEO-9 | AEO-7 | 6501 |
| Detergency (%) | 98.01 | 82 | 84 |
Claims (20)
1. The environment-friendly nano insulator cleaning agent is characterized by comprising the following components in percentage by mass: 0.5-2% of pH regulator, 8-20% of surfactant, 0.2-1% of film forming protective agent, 0.2-0.8% of corrosion inhibitor, 0.2-0.8% of carbon quantum dot, 0.5-1% of chelating agent and the balance of water;
the surfactant is a nonionic surfactant, and the nonionic surfactant is AEO-9;
the film forming protective agent is amino acid salts;
the carbon quantum dots are nitrogen-doped citric acid carbon quantum dots, and the preparation method of the nitrogen-doped citric acid carbon quantum dots comprises the following steps:
(1) Adding 1-3g of citric acid and 0.5-1g of ethylenediamine into 30-50ml of water, and completely dissolving;
(2) Placing the solution obtained in the step (1) into microwave equipment for microwave;
(3) And (3) carrying out freeze-drying treatment on the nitrogen-doped carbon citrate quantum dots subjected to the microwave treatment in the step (2) to obtain solid powder.
2. The cleaning agent according to claim 1, characterized in that the cleaning agent consists of the following components in mass percent: 0.5 to 1 percent of pH regulator, 10 to 15 percent of surfactant, 0.4 to 0.8 percent of film forming protective agent, 0.2 to 0.4 percent of corrosion inhibitor, 0.2 to 0.5 percent of carbon quantum dot, 0.5 to 0.8 percent of chelating agent and the balance of water.
3. The cleaning agent according to claim 1, characterized in that the cleaning agent consists of the following components in mass percent: 0.8% of pH regulator, 15% of surfactant, 0.6% of film forming protective agent, 0.4% of corrosion inhibitor, 0.5% of carbon quantum dot, 0.6% of chelating agent and the balance of water.
4. A cleaning agent according to any one of claims 1 to 3, wherein the pH adjuster is selected from one or more of triethanolamine, isopropanolamine, diglycolamine.
5. The cleaning agent according to claim 4, wherein the pH adjuster is triethanolamine.
6. The cleaning agent according to any one of claims 1 to 3, characterized in that,
the film forming protective agent is selected from sodium lauriminodipropionate, disodium steariminodipropionate, sodium N-carboxymethyl-N-cocoyl glycinate and tetrasodium iminodisuccinate.
7. The cleaning agent according to claim 6, wherein the film is protected
The agent is sodium lauriminodipropionate.
8. The cleaning agent according to any one of claims 1 to 3, characterized in that,
the corrosion inhibitor is one or more selected from 8-quinoline carboxylic acid, sodium benzoate, thiourea, oleic acid imidazoline and benzotriazole.
9. The cleaning agent as claimed in claim 8, wherein the corrosion inhibitor
Is a mixture of sodium benzoate and benzotriazole, and the mass ratio of the sodium benzoate to the benzotriazole is (1-4): 1.
10. the cleaning agent according to claim 9, wherein the sodium benzoate
And benzotriazole in a mass ratio of 3:1.
11. the cleaning agent according to any one of claims 1 to 3, characterized in that,
the step (1) is to add 2g of citric acid and 0.94g of ethylenediamine into 40ml of water and dissolve completely.
12. The cleaning agent according to any one of claims 1 to 3, characterized in that,
in the step (2), the microwave conditions are as follows: the microwave power is 600-900W, the microwave temperature is 160-200 ℃, and the reaction time is 15-25min.
13. The cleaning agent according to claim 12, wherein the microwave conditions are: the microwave power is 800W, the microwave temperature is 190 ℃, and the reaction time is 20min.
14. The cleaning agent according to any one of claims 1 to 3, characterized in that,
the chelating agent is selected from one or more of polyaspartic acid or methylglycine diethylamine.
15. The cleaning agent according to any one of claims 1 to 3, characterized in that,
the chelating agent is polyaspartic acid.
16. The cleaning agent according to claim 15, wherein the polyaspartic acid has an average molecular weight of 5000 to 10000.
17. A preparation method of a cleaning agent according to any one of claims 1 to 16
A method, characterized in that the method comprises the steps of: and (3) taking deionized water, sequentially adding a surfactant, a film forming protective agent, a corrosion inhibitor, carbon quantum dots and a chelating agent, finally adding a pH regulator, stirring, and standing to obtain the aqueous solution.
18. The method for preparing the cleaning agent according to claim 17, wherein,
adding pH regulator to regulate pH value to 7.0-9.5.
19. The method for preparing the cleaning agent according to claim 17, wherein,
the rotation speed of the stirring process is 200-500rpm, the stirring time is 10-30min, and the standing time is 1-5h.
20. The method for preparing a cleaning agent according to claim 17, wherein the stirring process is carried out at a rotation speed of 200-500rpm for 20min and the standing time is 2h.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310373498.5A CN116376642B (en) | 2023-04-10 | 2023-04-10 | Environment-friendly nano insulator cleaning agent and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310373498.5A CN116376642B (en) | 2023-04-10 | 2023-04-10 | Environment-friendly nano insulator cleaning agent and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN116376642A CN116376642A (en) | 2023-07-04 |
| CN116376642B true CN116376642B (en) | 2024-03-22 |
Family
ID=86974703
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310373498.5A Active CN116376642B (en) | 2023-04-10 | 2023-04-10 | Environment-friendly nano insulator cleaning agent and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116376642B (en) |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09249894A (en) * | 1996-03-15 | 1997-09-22 | Chubu Electric Power Co Inc | Insulator cleaning liquid |
| CN102399642A (en) * | 2011-09-27 | 2012-04-04 | 英特沃斯(北京)科技有限公司 | Neutral cleaning agent and preparation method thereof |
| CN104017576A (en) * | 2014-06-20 | 2014-09-03 | 上海交通大学 | Method for synthesizing nitrogen-doped carbon quantum dots based on calcium citrate and urea microwave reaction |
| CN104480489A (en) * | 2015-01-04 | 2015-04-01 | 麻城市天安纳米化工材料有限公司 | Environment-friendly efficient train cleaning agent and preparation method thereof |
| KR20150089792A (en) * | 2014-01-28 | 2015-08-05 | 호서대학교 산학협력단 | Cleaning agent for electonic materials composed of various substrates |
| CN107626258A (en) * | 2017-10-23 | 2018-01-26 | 安徽工业大学 | A kind of synthetic method of carbon quantum dot quaternary cationics |
| WO2019033486A1 (en) * | 2017-08-17 | 2019-02-21 | 中国科学院宁波材料技术与工程研究所 | Environmentally-friendly pickling corrosion inhibitor and application thereof |
| CN110358640A (en) * | 2019-08-07 | 2019-10-22 | 郑州中原利达新材料有限公司 | A kind of high-speed rail insulator cleaning protective agent |
| CN112812895A (en) * | 2020-12-30 | 2021-05-18 | 苏州禾川化学技术服务有限公司 | Cleaning composition with repairing function for composite insulator and preparation method thereof |
| CN114181780A (en) * | 2021-11-12 | 2022-03-15 | 深圳供电局有限公司 | Transformer substation insulator descaling agent, application thereof and cleaning method for surface dirt of transformer substation insulator |
| CN115058171A (en) * | 2022-06-24 | 2022-09-16 | 中国铁道科学研究院集团有限公司金属及化学研究所 | Low-surface-treatment water-based paint for station house steel structure and preparation method thereof |
| CN115432693A (en) * | 2022-10-09 | 2022-12-06 | 中国石油大学(北京) | Nitrogen-doped carbon quantum dot corrosion inhibitor, preparation method thereof and application thereof in carbon steel metal pickling solution |
| CN115651776A (en) * | 2022-11-15 | 2023-01-31 | 中铁伟业（北京）新技术有限公司 | Preparation method and application of environment-friendly water-based cleaning agent special for insulator of motor car |
-
2023
- 2023-04-10 CN CN202310373498.5A patent/CN116376642B/en active Active
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09249894A (en) * | 1996-03-15 | 1997-09-22 | Chubu Electric Power Co Inc | Insulator cleaning liquid |
| CN102399642A (en) * | 2011-09-27 | 2012-04-04 | 英特沃斯(北京)科技有限公司 | Neutral cleaning agent and preparation method thereof |
| KR20150089792A (en) * | 2014-01-28 | 2015-08-05 | 호서대학교 산학협력단 | Cleaning agent for electonic materials composed of various substrates |
| CN104017576A (en) * | 2014-06-20 | 2014-09-03 | 上海交通大学 | Method for synthesizing nitrogen-doped carbon quantum dots based on calcium citrate and urea microwave reaction |
| CN104480489A (en) * | 2015-01-04 | 2015-04-01 | 麻城市天安纳米化工材料有限公司 | Environment-friendly efficient train cleaning agent and preparation method thereof |
| WO2019033486A1 (en) * | 2017-08-17 | 2019-02-21 | 中国科学院宁波材料技术与工程研究所 | Environmentally-friendly pickling corrosion inhibitor and application thereof |
| CN107626258A (en) * | 2017-10-23 | 2018-01-26 | 安徽工业大学 | A kind of synthetic method of carbon quantum dot quaternary cationics |
| CN110358640A (en) * | 2019-08-07 | 2019-10-22 | 郑州中原利达新材料有限公司 | A kind of high-speed rail insulator cleaning protective agent |
| CN112812895A (en) * | 2020-12-30 | 2021-05-18 | 苏州禾川化学技术服务有限公司 | Cleaning composition with repairing function for composite insulator and preparation method thereof |
| CN114181780A (en) * | 2021-11-12 | 2022-03-15 | 深圳供电局有限公司 | Transformer substation insulator descaling agent, application thereof and cleaning method for surface dirt of transformer substation insulator |
| CN115058171A (en) * | 2022-06-24 | 2022-09-16 | 中国铁道科学研究院集团有限公司金属及化学研究所 | Low-surface-treatment water-based paint for station house steel structure and preparation method thereof |
| CN115432693A (en) * | 2022-10-09 | 2022-12-06 | 中国石油大学(北京) | Nitrogen-doped carbon quantum dot corrosion inhibitor, preparation method thereof and application thereof in carbon steel metal pickling solution |
| CN115651776A (en) * | 2022-11-15 | 2023-01-31 | 中铁伟业（北京）新技术有限公司 | Preparation method and application of environment-friendly water-based cleaning agent special for insulator of motor car |
Non-Patent Citations (2)
| Title |
|---|
| Padhan Subash等.N-doped and Cu,N-doped carbon dots as corrosion inhibitor for mild steel corrosion in acid medium.COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS.2022,第653卷129905. * |
| 氮掺杂碳量子点的制备及其对碳钢的缓蚀性能研究;许旭敏;中国优秀硕士学位论文全文数据库工程科技Ⅰ辑;20230215;B020-1954 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN116376642A (en) | 2023-07-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2290046B1 (en) | Water-rich stripping and cleaning formulation and method for using same | |
| KR100355212B1 (en) | Post-washing method | |
| CN108485840B (en) | Cleaning formulation for removing residues on surfaces | |
| EP2975108B1 (en) | Copper corrosion inhibition system | |
| KR100793590B1 (en) | Photoresist Stripper/Cleaner Compositions Containing Aromatic Acid Inhibitors | |
| TWI416282B (en) | Composition for removing a photoresist residue and polymer residue, and residue removal process using same | |
| CN110067001B (en) | Metal cleaning agent and preparation method thereof | |
| EP2812422B1 (en) | A post chemical-mechanical-polishing (post-cmp) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol | |
| CN106479761B (en) | Printed circuit board waterborne cleaning agent composition and cleaning agent and its preparation method and application | |
| CN113736584A (en) | Polyimide degumming agent composition for wafers and preparation method thereof | |
| CN116376642B (en) | Environment-friendly nano insulator cleaning agent and preparation method thereof | |
| CN112981405B (en) | Titanium-tungsten etching solution and preparation method and application thereof | |
| US20020068684A1 (en) | Stripping and cleaning compositions | |
| JP2008519310A (en) | Post-etch cleaning composition for use on aluminum-containing substrates | |
| KR100907568B1 (en) | Cleaning agent for removing solder flux and method for cleaning solder flux | |
| CA2741673A1 (en) | Gluconic acid containing photoresist cleaning composition for multi-metal device processing | |
| KR100752446B1 (en) | Composition for Removing Polymer Residue of Photosensitive Resistive Etching Film | |
| CN111876010A (en) | Enameled wire paint remover and preparation method thereof | |
| CN116574565B (en) | Soldering flux cleaning agent for chip packaging, preparation method and application thereof | |
| WO2013118042A1 (en) | A post chemical-mechanical-polishing (post-cmp) cleaning composition comprising a specific sulfur-containing compound and comprising no significant amounts of specific nitrogen-containing compounds | |
| KR20100110977A (en) | Photoresist stripper composition and exfoliation method of a photoresist using the same | |
| CN116875983A (en) | Metal electrode protection liquid for semiconductor wafer, preparation method and application thereof | |
| JP2004038073A (en) | Stripping agent composition | |
| CN115220315A (en) | Positive photoresist stripping liquid composition and application | |
| KR20090114073A (en) | Cleaning solution composition and process of cleaning a panel using the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |