CN116200718A - Evaluation method, improvement method and evaluation system for uniformity of film coating - Google Patents

Evaluation method, improvement method and evaluation system for uniformity of film coating Download PDF

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Publication number
CN116200718A
CN116200718A CN202211738634.8A CN202211738634A CN116200718A CN 116200718 A CN116200718 A CN 116200718A CN 202211738634 A CN202211738634 A CN 202211738634A CN 116200718 A CN116200718 A CN 116200718A
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China
Prior art keywords
coating
film
baffle plate
uniformity
quality
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CN202211738634.8A
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Chinese (zh)
Inventor
臧世伟
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Chongqing Jinmei New Material Technology Co Ltd
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Chongqing Jinmei New Material Technology Co Ltd
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Priority to CN202211738634.8A priority Critical patent/CN116200718A/en
Publication of CN116200718A publication Critical patent/CN116200718A/en
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention provides an evaluation method, an improvement method and an evaluation system for uniformity of a film coating, wherein the uniformity of the film coating is evaluated by acquiring thicknesses or qualities of coating layers (3) at different positions on the surface of a baffle plate (2) in a film coating unit in the whole process of film coating of the film (1). The coating layer of the film (1) corresponding to the thicker coating layer (3) on the surface of the baffle plate (2) is thinner, and the coating layer of the film (1) corresponding to the thinner coating layer (3) on the surface of the baffle plate (2) is thicker; or the coating (3) with smaller surface quality of the baffle plate (2) is thicker than the coating of the corresponding film (1), and the coating (3) with larger surface quality of the baffle plate (2) is thinner than the coating of the corresponding film (1). The invention improves the accuracy of measuring the very thin coating on the surface of the film (1), and finally realizes that the films of all coating units along the TD direction can be uniformly coated.

Description

Evaluation method, improvement method and evaluation system for uniformity of film coating
Technical Field
The invention relates to the field of vacuum thermal evaporation coating, in particular to a method for testing and evaluating the deposition uniformity of a film layer of a vacuum thermal evaporation coating system, and especially relates to a method for evaluating the uniformity of a film coating, an improvement method and an evaluation system.
Background
At present, common coating modes for surface coating modification treatment of tens of thousands of meters of rolled flexible substrates comprise vacuum magnetron sputtering coating and vacuum thermal evaporation coating, and particularly the vacuum thermal evaporation coating is well-developed and applied to the field of mass production of packaging composite film layers, and has the advantage of efficient and large-scale production. The film deposition of the packaging film is relatively thin and the uniformity requirement for the coating is relatively reduced, and the production in this way is easier to achieve the quality requirement. Then, in recent years, the application of the composite current collector in the field of lithium ion batteries is used for pushing the high-efficiency vacuum thermal evaporation coating to a new application again. In general, there are two implementation modes, namely, an evaporation boat mode and a high temperature resistant container evaporation mode, the former is implemented by adopting a continuous wire feeding mode, namely, the wire feeding realizes continuous evaporation material supply, the latter is implemented by placing the material to be evaporated in the high temperature resistant container in advance, the evaporation effect is achieved along with the rise of temperature, after the evaporation efficiency reaches a certain target, the film to be coated starts to be driven at a certain speed, and when the evaporation material in the high temperature resistant container is insufficient to support the uniform deposition of the subsequent coating, the film coating is stopped.
In view of the fact that the thickness of the coating deposited on the composite current collector for the lithium ion battery reaches 1um and above, the coating with the thickness of hundreds of meters may need to be deposited at one time and the preparation of the coating with the required thickness may need to be completed through multiple depositions. If the uniformity difference of the coating thickness is too large, film folds may be caused in the coating deposition and winding process of tens of thousands of meters, so that the film cannot meet the quality requirement, and quality is not up to standard due to uneven coating thickness or a main factor that the winding length of the coated film is limited is caused. The uniformity of the film surface particularly reflects along the width direction (TD direction) of the film, and on the other hand, a plurality of high temperature resistant containers are generally evaporated in the TD direction by adopting a high temperature resistant container evaporation mode, and the uniformity is closely related to the state of each high temperature resistant container.
The uniformity of the deposited coating can be measured directly, and the uniformity of the coated coating can be obtained by using a method of directly carrying out online sheet resistance test, offline sheet resistance test or offline thickness test, which causes great errors due to the fact that a single-layer coating is relatively thin or a thin film is operated at a high speed in a non-contact mode, and particularly, the uniformity of the final test of an equipment system with a plurality of evaporation units is the effect of overlapping the plurality of evaporation units after the whole coating is finished, so that the uniformity of the thin film coating of each evaporation unit in the formal production process cannot be obtained more conveniently and accurately, and moreover, the test of the relevant coating is quite troublesome.
In summary, the following problems exist in the prior art: the prior art cannot accurately measure the thickness of a coating deposited on a composite current collector product for a lithium ion battery, and particularly has larger error in testing a very thin coating on the surface of a film and cannot accurately measure the uniformity of the film coating at different positions in each evaporation unit.
Disclosure of Invention
The invention provides an evaluation method, an improvement method and an evaluation system for uniformity of a film coating, which are used for solving the problems that in the prior art, the thickness of the coating deposited by a composite current collector product for a lithium ion battery cannot be accurately measured, particularly, the uniformity of the film coating at different positions in each evaporation unit cannot be accurately measured due to larger error in a very thin coating test on the surface of the film, and the uniformity of the coating along the width direction (TD direction) of the film is obviously improved.
Therefore, the invention provides an evaluation method, an improvement method and an evaluation system for uniformity of a film coating.
In order to achieve the above purpose, the present invention provides the following technical solutions:
a method for evaluating uniformity of a thin film plating layer, the method comprising the steps of:
(1) The method comprises the steps that coating thicknesses or qualities of different positions of the surfaces of a baffle plate in a film coating unit are obtained based on the whole film coating process, an evaporation source of the film coating unit comprises a plurality of high-temperature resistant containers containing evaporation materials, and the baffle plate is positioned between the evaporation source and the film and used for blocking the evaporation materials during informal film coating;
(2) Evaluating the uniformity of a film coating according to the thickness or quality of the coating at different positions on the surface of the baffle, wherein the film coating is a coating of an evaporation material of one evaporation source on the film, the coating of the film corresponding to the thicker coating on the surface of the baffle is thinner, and the coating of the film corresponding to the thinner coating on the surface of the baffle is thicker; or the coating with smaller surface quality of the baffle plate is thicker than the coating of the corresponding film, and the coating with larger surface quality of the baffle plate is thinner than the coating of the corresponding film.
Further, the thickness or quality of the coating at different positions on the surface of the baffle is obtained by obtaining a three-dimensional scanning image of the lower surface of the baffle.
Further, a three-dimensional coordinate system is established by taking the surface of a baffle plate in the film coating unit as a reference plane and the position of an evaporation source as an abscissa and an ordinate starting point.
Further, the thickness or the quality of the coating at different positions on the surface of the baffle plate in the film plating unit is associated with the coordinate positions of the plurality of high-temperature-resistant containers in a one-to-one correspondence manner through the three-dimensional coordinate system, so that the evaporation efficiency of each high-temperature-resistant container is obtained.
Further, the three-dimensional scanning image takes the length direction of the baffle plate as an X axis, the width direction of the baffle plate as a Y axis, the height direction of the coating layer as a Z axis, and the central position of the first high-temperature resistant container corresponding to the X axis and the Y axis as a starting point; the X axis corresponds to the width direction of the film, and the Y axis corresponds to the winding direction of the film.
Further, in the step S1, the number of the coating units is plural, each coating unit includes a baffle and a high temperature resistant container array, and the thickness or the quality of the coating at different positions on the surface of the baffle is associated with the coordinate positions of each high temperature resistant container in the high temperature resistant container array in a one-to-one correspondence manner.
Further, based on the thickness or quality of the coating at different positions of the surface of the baffle, the thickness of the film coating at each position corresponding to the thickness or quality of the coating at different positions of the surface of the film in the film coating unit is determined.
The film plating unit also comprises a heating module and a heat preservation module, wherein the film plating unit is used for improving the uniformity of the film plating based on any one of the evaluation methods of the uniformity of the film plating, and the heating power or the heat preservation effect of the high-temperature resistant container is relatively reduced at the corresponding position with thicker baffle plate coating or larger quality; and at the corresponding position with thinner baffle coating or smaller mass, the heating efficiency or the heat preservation effect of the high-temperature resistant container is relatively increased.
Further, the method for improving the uniformity of the thin film coating further comprises adjusting the evaporation efficiency of each high temperature resistant container by adjusting the interval of each high temperature resistant container.
A thin film coating uniformity evaluation system comprising:
the device comprises an acquisition module and an evaluation module, wherein the acquisition module is used for acquiring the coating thickness or the coating quality of different positions of the surface of a baffle plate in a film coating unit based on the whole film coating process, an evaporation source of the film coating unit comprises a plurality of high-temperature resistant containers containing evaporation materials, and the baffle plate is positioned between the evaporation source and the film and used for blocking the evaporation materials during informal film coating;
the evaluation module is used for evaluating the uniformity of a film coating according to the thickness or quality of the coating at different positions on the surface of the baffle, wherein the film coating is a coating of an evaporation material of one evaporation source on the film, the coating of the film corresponding to the thicker coating on the surface of the baffle is thinner, and the coating of the film corresponding to the thinner coating on the surface of the baffle is thicker; or the coating with smaller surface quality of the baffle plate is thicker than the coating of the corresponding film, and the coating with larger surface quality of the baffle plate is thinner than the coating of the corresponding film.
Compared with the prior art, the invention has the beneficial effects that: the invention provides a method for evaluating uniformity of a film coating, which comprises the following steps: s1, acquiring coating thicknesses or masses of different positions of the surfaces of a baffle plate in a film coating unit based on the whole film coating process, wherein an evaporation source of the film coating unit comprises a plurality of high-temperature resistant containers containing evaporation materials, and the baffle plate is positioned between the evaporation source and the film and used for blocking the evaporation materials during informal film coating; s2, evaluating the uniformity of a film coating according to the thickness or quality of the coating at different positions on the surface of the baffle, wherein the film coating is a coating of an evaporation material of one evaporation source on the film, the coating of the film corresponding to the thicker coating on the surface of the baffle is thinner, and the coating of the film corresponding to the thinner coating on the surface of the baffle is thicker; or the coating with smaller surface quality of the baffle plate is thicker than the coating of the corresponding film, and the coating with larger surface quality of the baffle plate is thinner than the coating of the corresponding film. According to the invention, through measuring the thickness or the quality of the coating on the surface of the baffle plate and correspondingly associating the quality distribution of the corresponding position with the film coating one by one, the accuracy of measuring the very thin coating on the surface of the film is improved, and finally, the film of each coating unit along the TD direction can be uniformly coated.
Drawings
FIG. 1 is a schematic diagram of a film plating unit in the length direction (TD direction of film plating) of a baffle plate of the invention;
fig. 2 is a schematic view showing the combination of a baffle plate in the width direction (the MD direction of film coating) and a plurality of high temperature resistant containers according to the present invention.
Reference numerals illustrate:
1. a film; 2. a baffle; 3. a coating; 4. a high temperature resistant container; 5. and a heating module.
Detailed Description
The present invention will now be described for a clearer understanding of technical features, objects, and effects of the present invention.
In vacuum thermal evaporation coating, the film 1 passes through a plurality of coating units from an unreeling end to a reeling end, as shown in fig. 1 and 2, each coating unit includes an evaporation unit, each coating unit includes a baffle 2, and each evaporation unit includes a high temperature resistant container array, for example, a 3×6 crucible array. Each evaporation unit further comprises an evaporation source comprising an evaporation material and a number of refractory containers 4 containing the evaporation material, the refractory containers 4 being for example crucibles. Each coating unit comprises a thin film coating based on the evaporation mode of the high-temperature resistant container, and the total evaporation material is divided into three aspects: 1) The part which is pumped away along with vacuumizing in the film coating process; 2) A plating layer deposited on the surface of the film 1 in the evaporation plating process; 3) The remainder of the coating 3 deposited on the surface of the baffle 2.
As shown in fig. 1, a baffle plate 2 is provided between the evaporation source and the film 1 so as to shield the film 1 from high-temperature baking breakage before the start of the official coating and after the completion of the official coating, and the baffle plate 2 is provided above the evaporation source for blocking the evaporation material at the time of the informal coating. The whole coating process comprises formal coating and informal coating, wherein the evaporation material is coated on the film 1 during formal coating, and the evaporation material is deposited on the baffle plate 2 during informal coating.
Establishing a three-dimensional coordinate system by taking the surface of a baffle plate 2 in a film coating unit as a reference plane, taking the length direction of the baffle plate 2 as an X axis, taking the width direction of the baffle plate 2 as a Y axis, taking the height direction of a coating 3 as a Z axis, and taking the central position of a first high-temperature resistant container 4 corresponding to the X axis and the Y axis as a starting point; based on the whole process of film coating of the film 1, three-dimensional scanning images of the lower surface of the baffle plate 2 are obtained through a three-dimensional scanning technology to obtain the thickness or quality of the coating 3 at different positions on the surface of the baffle plate 2, the thickness of the coating 3 at different positions on the surface of the baffle plate 2 is directly determined by scanning through the three-dimensional scanning technology, and the quality of the coating 3 at different positions on the surface of the baffle plate 2 is calculated according to thickness data obtained by scanning. Three-dimensional scanning techniques employ, for example, a three-dimensional laser scanning tester. After the three-dimensional scanning image is obtained, the coordinate positions of the coating 3 at different positions on the surface of the baffle plate 2 can be obtained, and the coordinate positions of the coating 3 at different positions on the surface of the baffle plate 2 are associated with the coordinate positions of each high-temperature-resistant container 4 in the high-temperature-resistant container array in a one-to-one correspondence manner so as to obtain the evaporation efficiency of each high-temperature-resistant container 4. The X axis corresponds to the width direction (TD direction) of the film 1, and the Y axis corresponds to the roll length direction (MD direction) of the film 1, so as to provide a more sufficient basis for adjusting the uniformity of the TD direction and the MD direction of the film 1.
The coating unit further comprises a heating module 5 and a heat preservation module, wherein the heating module 5 comprises heating electrodes, such as graphite heating electrodes, and each heating electrode controls all the high temperature resistant containers 4 in one coating unit, but the heating temperature of each heating electrode to each high temperature resistant container 4 is not completely consistent, so that the heating speed of each high temperature resistant container 4 is different. The high temperature resistant container 4 is arranged in the containing holes of the graphite heating electrode, one containing hole is provided with one high temperature resistant container 4, and the actual heating environments of different containing holes are different, namely the heating speeds are different, so that the thickness deposited on the baffle plate 2 is different. The uniformity of the film coating is evaluated according to the thickness or quality of the coating 3 at different positions on the surface of the baffle plate 2, the film coating is the coating of the evaporation material of a certain evaporation source on the film 1, the coating of the film 1 corresponding to the coating 3 with thicker surface of the baffle plate 2 is thinner, the temperature rise at the position is quick before the coating is implemented, so the coating 3 deposited on the baffle plate 2 by evaporation of the evaporation material is thicker in advance, the heating speed of the high-temperature resistant container 4 at the corresponding position is required to be reduced or the heat preservation performance is reduced, the heating environment at the position is more similar to the positions of other high-temperature resistant containers 4, and the effect that the coating on the surface of the film 1 is more uniform is achieved; or the coating 3 with larger surface quality of the baffle plate 2, the corresponding coating of the film 1 is thinner, and the principle and the adjustment principle are the same.
The coating 3 with thinner surface of the baffle plate 2 corresponds to the coating 3 with thicker film 1, or the coating 3 with smaller surface quality of the baffle plate 2 corresponds to the coating 1 with thicker film 1, which means that the temperature rise of the position is slower before coating is implemented, so that the evaporation amount of the evaporation material in the high temperature resistant container 4 is smaller, the deposition speed on the baffle plate 2 is insufficient, and when the coating is stopped after the normal coating of the film 1 is completed, more material to be evaporated is still left in the high temperature resistant container 4 at the corresponding position, therefore, the heating speed of the high temperature resistant container 4 at the corresponding position needs to be increased or the heat preservation performance needs to be increased, so that the heating environment at the position is more similar to the positions of other high temperature resistant containers 4, and the coating on the surface of the film 1 is more uniform.
Further, the evaporation efficiency of each high temperature resistant container 4 can be adjusted by adjusting the pitch of each high temperature resistant container 4. If the coating deposited on the baffle plate 2 is regularly fluctuated in thickness, the reason is that the high temperature resistant container 4 is not reasonably arranged or designed at intervals in the TD direction or MD direction of the film. Therefore, uniform film coating can be performed in each coating unit by adjusting the pitch of each high temperature resistant container 4 in the film TD direction or MD direction.
A thin film coating uniformity evaluation system comprising:
the acquisition module is used for acquiring the thickness or the quality of the coating 3 at different positions on the surface of the baffle plate 2 in the film coating unit based on the whole film coating process of the film 1 so as to obtain feedback of the coating non-uniformity of the film 1; after the coating distribution condition of the baffle plates 2 corresponding to each coating unit is obtained, the evaluation module is used for evaluating, so that the thermal environment of each high-temperature resistant container 4 is adjusted, the evaporation efficiency of each high-temperature resistant container 4 is adjusted to be consistent, and the uniformity of the film coating of each coating unit is realized.
In order to better judge whether the evaporation units at certain positions evaporate in advance or delay, the invention can check the uniformity of the film coating on the surface of the film in the practical application process, if the film coating film layers are attached at certain positions, the evaporation at the positions is relatively slow (the evaporation efficiency can be optimized and improved through a heating module or a heat preservation measure), and if the film coating at certain positions does not have the film coating film layers, the evaporation at the positions is fast (the heat preservation effect is reduced or a module with lower evaporation efficiency is replaced at the positions).
The foregoing is illustrative of the present invention and is not to be construed as limiting the scope of the invention. In order that the components of the invention may be combined without conflict, any person skilled in the art shall make equivalent changes and modifications without departing from the spirit and principles of the invention.

Claims (10)

1. A method for evaluating uniformity of a thin film coating, the method comprising the steps of:
s1, acquiring the thickness or the quality of a coating (3) at different positions on the surface of a baffle plate (2) in a coating unit based on the whole coating process of a film (1), wherein an evaporation source of the coating unit comprises a plurality of high-temperature resistant containers containing evaporation materials, and the baffle plate (2) is positioned between the evaporation source and the film (1) and used for blocking the evaporation materials during informal coating;
s2, evaluating the uniformity of a film coating according to the thickness or quality of the coating (3) on different positions of the surface of the baffle plate (2), wherein the film coating is a coating of an evaporation material of one evaporation source on the film (1), the coating of the film (1) corresponding to the thicker coating (3) on the surface of the baffle plate (2) is thinner, and the coating of the film (1) corresponding to the thinner coating (3) on the surface of the baffle plate (2) is thicker; or the coating (3) with smaller surface quality of the baffle plate (2) is thicker than the coating of the corresponding film (1), and the coating (3) with larger surface quality of the baffle plate (2) is thinner than the coating of the corresponding film (1).
2. The method for evaluating the uniformity of a thin film plating layer according to claim 1, wherein the thickness or quality of the coating layer (3) at different positions on the surface of the baffle plate (2) is obtained by obtaining a three-dimensional scanning image of the lower surface of the baffle plate (2).
3. The method according to claim 1, wherein a three-dimensional coordinate system is established with the surface of the baffle plate (2) in the coating unit as a reference plane and with the evaporation source position as the start points of the abscissa and the ordinate.
4. The method for evaluating the uniformity of a thin film coating according to claim 3, wherein the thickness or the quality of the coating (3) at different positions on the surface of the baffle plate (2) in the coating unit is associated with the coordinate positions of the plurality of high temperature resistant containers (4) one by one through the three-dimensional coordinate system, so that the evaporation efficiency of each high temperature resistant container (4) is obtained.
5. The method for evaluating the uniformity of a thin film coating according to claim 2, wherein the three-dimensional scan image is started from the center of the first high-temperature-resistant container (4) corresponding to the X axis and the Y axis, with the length direction of the shutter (2) as the X axis, the width direction of the shutter (2) as the Y axis, and the height direction of the coating (3) as the Z axis; the X axis corresponds to the width direction of the film (1), and the Y axis corresponds to the winding direction of the film (1).
6. The method according to claim 1, wherein the plurality of coating units in the step S1 is provided, each coating unit includes a baffle plate (2) and a high temperature resistant container array, and the thickness or the quality of the coating (3) at different positions on the surface of the baffle plate (2) is associated with the coordinate positions of each high temperature resistant container (4) in the high temperature resistant container array one by one.
7. The method for evaluating the uniformity of a thin film coating according to claim 1, wherein the thickness or quality of the thin film coating at each corresponding position of the thickness or quality of the coating (3) at different positions of the surface of the thin film (1) and the surface of the baffle (2) in the coating unit is determined based on the thickness or quality of the coating (3) at different positions of the surface of the baffle (2).
8. A method for improving the uniformity of a thin film coating, characterized in that the coating unit further comprises a heating module (5) and a heat preservation module, the uniformity of the thin film coating is improved based on the method for evaluating the uniformity of the thin film coating according to any one of claims 1 to 8, and the method for improving the uniformity of the thin film coating comprises the following steps:
at the corresponding position of the thicker or larger mass of the coating (3) of the baffle (2), the heating power or the heat preservation effect of the high-temperature resistant container (4) is relatively reduced;
and the heating efficiency or the heat preservation effect of the high-temperature resistant container (4) is relatively increased at the corresponding position of the thinner coating (3) or the smaller mass of the baffle plate (2).
9. The method of improving uniformity of a thin film coating according to claim 8, further comprising adjusting evaporation efficiency of each of said high temperature resistant containers (4) by adjusting pitch of each of said high temperature resistant containers (4).
10. A thin film plating uniformity evaluation system, comprising:
the device comprises an acquisition module and an evaluation module, wherein the acquisition module is used for acquiring the thickness or the quality of a coating (3) at different positions on the surface of a baffle plate (2) in a film coating unit based on the whole film coating process of a film (1), an evaporation source of the film coating unit comprises a plurality of high-temperature resistant containers containing evaporation materials, and the baffle plate (2) is positioned between the evaporation source and the film (1) and used for blocking the evaporation materials during informal film coating;
the evaluation module is used for evaluating the uniformity of a film coating according to the thickness or quality of the coating (3) on different positions of the surface of the baffle plate (2), wherein the film coating is a coating of an evaporation material of one evaporation source on the film (1), the coating of the film (1) corresponding to the thicker coating (3) on the surface of the baffle plate (2) is thinner, and the coating of the film (1) corresponding to the thinner coating (3) on the surface of the baffle plate (2) is thicker; or the coating (3) with smaller surface quality of the baffle plate (2) is thicker than the coating of the corresponding film (1), and the coating (3) with larger surface quality of the baffle plate (2) is thinner than the coating of the corresponding film (1).
CN202211738634.8A 2022-12-30 2022-12-30 Evaluation method, improvement method and evaluation system for uniformity of film coating Pending CN116200718A (en)

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Application Number Priority Date Filing Date Title
CN202211738634.8A CN116200718A (en) 2022-12-30 2022-12-30 Evaluation method, improvement method and evaluation system for uniformity of film coating

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Application Number Priority Date Filing Date Title
CN202211738634.8A CN116200718A (en) 2022-12-30 2022-12-30 Evaluation method, improvement method and evaluation system for uniformity of film coating

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CN116200718A true CN116200718A (en) 2023-06-02

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