CN116130561A

CN116130561A - Preparation method of superlattice infrared detector

Info

Publication number: CN116130561A
Application number: CN202310395930.0A
Authority: CN
Inventors: 薛建凯; 李斌; 苏莹; 冯伟
Original assignee: Shanxi Chuangxin Photoelectric Technology Co ltd
Current assignee: Shanxi Chuangxin Photoelectric Technology Co ltd
Priority date: 2023-04-14
Filing date: 2023-04-14
Publication date: 2023-05-16
Anticipated expiration: 2043-04-14
Also published as: CN116130561B

Abstract

The invention provides a preparation method of a superlattice infrared detector, which comprises the following steps: according to the preparation requirements of the superlattice infrared detector, a preparation scheme consistent with the preparation requirements is called from a preparation database; analyzing flow attributes of each preparation flow in the preparation scheme and standard preparation parameters related to each preparation flow; constructing a flow information table of the same preparation flow and a stable information table of adjacent preparation flows according to the flow attribute and the standard preparation parameter and by combining the material attribute of the current preparation material; according to all the flow information tables, performing first simulation on the detector to be prepared, and performing second simulation on all the flow information tables and the stable information tables according to the complete preparation flow; and generating a simulation array list according to the simulation result, screening array information meeting production and preparation standards, and carrying out multi-azimuth verification on the actual detector. In order to effectively ensure the preparation precision of the detector, the preparation method is convenient to further reach the preparation expectation.

Description

Preparation method of superlattice infrared detector

Technical Field

The invention relates to the technical field of semiconductors, in particular to a preparation method of a superlattice infrared detector.

Background

The superlattice material has great potential and advantages in the infrared detection field, for example, in the infrared thermal imaging technology, the long-wave refrigeration detector can resist sand dust and reflective interference, and is suitable for target detection under complex background, such as vehicles in sand dust, ships on water surface, reflective cloud layers, airplanes and other scenes. The medium-long wave double-color refrigeration infrared detector integrates the advantages of medium-wave and long-wave detection in one refrigeration infrared detector component, can perform high-performance imaging in the medium-wave and long-wave infrared bands at the same time, and greatly reduces the false alarm rate. The method can be used for detecting complex background and monitoring high-speed moving targets.

However, in the process of producing the detector, due to practical influencing factors in the production process, such as oxidation of materials, unstable surface materials, etc., a certain precision loss is caused to the detector produced in a standard manner, so that the prepared detector cannot meet the preparation expectations.

Therefore, the invention provides a preparation method of the superlattice infrared detector.

Disclosure of Invention

The invention provides a preparation method of a superlattice infrared detector, which is used for providing a basis for the follow-up expectation by acquiring a preparation scheme matched with requirements, and simulating by combining a flow information table and a stability information table, so that the preparation precision of the detector is effectively ensured, and the preparation expectation is conveniently and further reached.

The invention provides a preparation method of a superlattice infrared detector, which comprises the following steps:

step 1: according to the preparation requirements of the superlattice infrared detector, a preparation scheme consistent with the preparation requirements is called from a preparation database;

step 2: analyzing flow attributes of each preparation flow in the preparation scheme and standard preparation parameters related to each preparation flow;

step 3: constructing a flow information table of the same preparation flow according to the flow attribute and the standard preparation parameter and combining the material attribute of the current preparation material, and simultaneously constructing a stable information table of the adjacent preparation flow according to the flow triggering relationship between the adjacent preparation flows;

step 4: according to all the flow information tables, performing first simulation on the detector to be prepared, and performing second simulation on all the flow information tables and the stable information tables according to the complete preparation flow;

step 5: and generating a simulation array list according to the first simulation result and the second simulation result, screening array information meeting production and preparation standards, performing actual production and preparation, and performing multi-azimuth verification on the actual detector.

Preferably, according to the preparation requirement of the superlattice infrared detector, a preparation scheme consistent with the preparation requirement is called from a preparation database, and the preparation scheme comprises the following steps:

Carrying out demand analysis on the preparation requirements to obtain a plurality of demand scripts and demand task results matched with each demand script;

disambiguating the corresponding demand script, and acquiring a new demand script and a new task result according to the disambiguating script and the matched demand task result;

performing word sense important position analysis on the preparation requirement, locking a main script from the new demand script, and calling a plurality of history script lists which are parallel to the locked main script from a script database;

obtaining residual scripts of the new demand scripts after the main scripts are removed, respectively carrying out script matching on each residual script and each history script list, and obtaining matching frequency;

performing frequency sorting on the matching frequencies of all the remaining scripts, and judging whether overlapping sorting exists or not;

if the task exists, acquiring task execution weights corresponding to new task results of the overlapped scripts, combining the corresponding word sense position weights to obtain a sequencing value, and sequencing the size to obtain a final sequencing result;

wherein P represents the ranking value of the corresponding overlapping script; max represents the maximum value symbol; min represents a minimum symbol; w1 represents word sense position weights of the corresponding overlapped scripts; r1 represents task execution weights of the corresponding overlapped scripts;

If not, taking the frequency size sorting result as a final sorting result;

primary arrangement is carried out on the main scripts as parallel scripts, and secondary arrangement is carried out on all the remaining scripts according to a final ordering result, so that a requirement matching list is obtained;

and carrying out script collaborative matching on each new demand script in the demand matching list based on the preparation database, and calling to obtain a preparation scheme consistent with the preparation requirement.

Preferably, the preparation scheme comprises: flow attributes of different preparation flows and standard preparation parameters of different preparation flows.

Preferably, according to the process attribute and the standard preparation parameter, and in combination with the material attribute of the currently prepared material, a process information table of the same preparation process is constructed, including:

acquiring the material types related in the same preparation flow, and obtaining matching materials from a material database according to the unique codes of the material types;

acquiring the latest detection report of each matching material respectively, and acquiring the material attribute of the corresponding matching material through an attribute analysis model;

comparing the material properties of the same material with standard properties;

determining the material entering position and the material ending position of an initial flow table constructed by the same material based on the flow attribute of the same preparation flow and the standard preparation parameters;

Inputting a preparation participation process formed by the comparison result of the same material and the material entering position and the material ending position of the same material into a result-process analysis model, and determining the influence condition of the comparison result of the same material;

judging whether each influence condition meets the corresponding material influence standard, and performing first calibration on the influence conditions meeting the material influence standard and performing second calibration on the influence conditions not meeting the material influence standard;

determining a final influence part according to the first calibration times and the second calibration times and combining the material weight corresponding to the first calibration result and the material weight corresponding to the second calibration result:

when (when)

And +.>

When the second calibration result is judged as a final influence part;

otherwise, the first calibration result is used as a final influence part;

wherein B2 represents the corresponding second calibration times; b1 represents corresponding first calibration times;

representing the material weight corresponding to the i1 th second calibration result; />

Representing the material weight corresponding to the i2 th first calibration result;

and continuously optimizing based on the material entering position of the initial flow chart based on each influence condition in the final influence part to obtain a flow information chart.

Preferably, the step of constructing a stable information table of the adjacent preparation process according to the process trigger relationship between the adjacent preparation processes includes:

after the last preparation process in the adjacent preparation processes is determined to be finished, a stable mode for enabling the matched preparation assembly to perform performance stability is obtained;

when the matched preparation assembly reaches a stability standard according to the stability mode, setting a first trigger condition of the matched preparation assembly, and setting a second trigger condition for the next preparation process of the adjacent preparation processes, wherein the first trigger condition and the second trigger condition are process trigger relations between the adjacent preparation processes;

and constructing a stable information table of adjacent preparation processes based on the process triggering relationship.

Preferably, according to all the flow information tables, performing a first simulation on the to-be-prepared detector, and performing a second simulation on all the flow information tables and the stability information table according to the complete preparation flow, including:

configuring a first time execution tag to each flow information table and a second time execution tag to each stable information table according to the table simulation sequence of each flow information table;

Executing a label according to the first time to control each flow information table to perform first simulation construction to obtain corresponding first initial components, performing component evaluation on each first initial component, and combining simulation construction processes of the corresponding first initial components to obtain first component information of the corresponding first initial components;

sequencing the execution sequence of all the first time execution labels and the second time execution labels to obtain a plurality of third time execution labels, controlling the matched information table to carry out second simulation construction to obtain corresponding second initial components, carrying out component evaluation on each second initial component, and combining simulation construction processes of the corresponding second initial components to obtain second component information of the corresponding second initial components.

Preferably, generating a simulation array list according to the first simulation result and the second simulation result includes:

extracting third component information corresponding to a flow information table adjacent to the left side of the stable information table from all the second component information;

taking the first component information and the third component information corresponding to the same flow information table as component arrays, and analyzing the weight difference and the mean value difference between the two component information corresponding to the component arrays relative to the component information with larger weight;

When the weight difference is smaller than a first set threshold value and the mean value difference is smaller than a second set threshold value, performing first significance processing on the corresponding component array;

otherwise, performing intersection processing on the first component information and the third component information in the same component array to obtain intersection information, and performing corresponding similar processing to obtain similar information;

when the similar information is based on the first component information and the first information duty ratio of the second component is larger than a third set threshold value and the first duty ratio weight is larger than a fourth set threshold value, performing information supplementing processing on the first component information in the same component number group based on the similar information, and performing second significance processing on the same component number group;

otherwise, taking the rest information of the similar information except intersection information as matching information, and calling the to-be-supplemented information which is in matching connection with the matching information from the dissimilar information, if the second information proportion of all to-be-supplemented information to the matching information and the intersection information is larger than a third set threshold value and the second proportion weight is larger than a fourth set threshold value, carrying out information supplementing processing on the first component information in the same component array, carrying out third saliency processing on the same component array, and otherwise, carrying out fourth saliency processing;

Based on all the saliency processing results, a simulated array list is generated.

Preferably, generating a simulated array list and screening array information meeting production and preparation criteria includes:

locking array columns corresponding to the first significance processing result, the second significance processing result and the third significance processing result, and extracting first component information after supplementary processing;

meanwhile, locking an array column corresponding to the fourth significance processing result to extract third component information;

and obtaining array information based on the last first component information and the extracted third component information.

Preferably, the third set threshold and the fourth set threshold of the same component array are determined based on the production preparation criteria.

Preferably, the process of multi-azimuth verification of the actual detector includes:

acquiring a verification mode of the actual detector, and acquiring a first result of verifying the actual detector according to the verification mode;

acquiring index distribution of different verification indexes based on the same verification window in the same verification mode, matching result weights to each index sub-result in a first result, and simultaneously acquiring distance distribution weights of each verification index based on the center index of the verification window;

According to the result weight and the distance distribution weight, calculating a first qualification value of the actual detector aiming at the same verification mode;

wherein m1 represents the total number of verification indexes in the same verification mode;

a result weight indicating the j1 st verification index; />

A result verification value indicating a j 1-th verification index; />

A distance weight representing the j1 st verification index;

a distance verification value indicating a j 1-th verification index; />

Representing the maximum weight in all result weights in the same verification mode; />

Representing the maximum weight in all distance distribution weights in the same verification mode; h1 represents a first qualification value under the same verification mode; />

A standard result verification value representing a j 1-th verification index; />

A standard distance verification value representing a j 1-th verification index;

calculating a second qualification value of the actual detector according to the verification weight of each verification mode;

when all the first qualified values and the second qualified values meet the qualification standard, judging that the actual detector is qualified;

otherwise, locking the verification mode and the verification index corresponding to the unqualified value, and carrying out optimization reminding.

Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and claims thereof as well as the appended drawings.

The technical scheme of the invention is further described in detail through the drawings and the embodiments.

Drawings

The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate the invention and together with the embodiments of the invention, serve to explain the invention. In the drawings:

fig. 1 is a flowchart of a method for manufacturing a superlattice infrared detector in an embodiment of the invention.

Detailed Description

The preferred embodiments of the present invention will be described below with reference to the accompanying drawings, it being understood that the preferred embodiments described herein are for illustration and explanation of the present invention only, and are not intended to limit the present invention.

The invention provides a preparation method of a superlattice infrared detector, which is shown in figure 1 and comprises the following steps:

In this embodiment, the preparation requirements include requirements scripts related to preparation purposes, response bands of the detector, detection rate, uniformity of the detector, sensitivity, noise dark current, and the like, and are mainly used for acquiring parameters related to the requirements so as to facilitate effective adjustment of a subsequent preparation scheme.

In this embodiment, the preparation database includes the demand script parameters of different sequential combinations and the preparation schemes matched with the demand script parameters of different combinations, where the preparation schemes are the preparation flows required for the preparation, for example: the combination of the demand script parameters is: the preparation scheme matched with the combination is scheme 2, for example, the following corresponding relation exists:

Script parameter 1, script parameter 4, script parameter 3- -preparation scheme 2;

script parameter 1, script parameter 3, script parameter 4- -preparation scheme 3;

script parameter 3, script parameter 1, script parameter 4- -preparation scheme 4;

script parameter 3, script parameter 4, script parameter 1- -preparation scheme 1;

script parameter 4, script parameter 1, script parameter 3- -preparation scheme 5;

script parameter 4, script parameter 3, script parameter 1- -preparation scheme 6;

the corresponding relations are preset, and the preparation flow of the detector belongs to the disclosure technology, but the corresponding preparation schemes under different requirements are different and belong to the disclosure technology.

In this embodiment, the process attribute refers to that the corresponding manufacturing process mainly completes the in-process operation, for example, the detector includes a substrate, an n-type contact layer, a superlattice absorption layer, a p-type contact layer, a first electrode and a second electrode, where the n-type contact layer, the n-type superlattice barrier layer, the superlattice absorption layer, the p-type superlattice barrier layer and the p-type contact layer are sequentially stacked on the substrate, the first electrode is disposed on the n-type contact layer, the second electrode is disposed on the p-type contact layer, each component included in the device is implemented according to the corresponding manufacturing process, and the process attribute is related to the component type of the corresponding manufactured component, and the standard manufacturing parameters are also set in advance based on the set parameters acquired by the manufacturing scheme, for example, in the manufacturing process for the detector includes:

Coating a superlattice epitaxial wafer sample with photoresist and then carrying out photoetching development;

and a second step of forming a separated device by dry etching or wet etching the sample subjected to the photoetching development in the first step. The existing dry etching technology is to put a sample into a plasma etching system for etching for a certain time, and the dry etching of the step in the prior art scheme is generally carried out in medium vacuum or high vacuum (namely, the vacuum degree is lower than 1e-5 pa) inductively coupled plasma etching equipment by using a plasma etching method. The existing wet etching technology uses a certain proportion of corrosive liquid to corrode a sample in an atmospheric environment.

And thirdly, taking out the sample formed in the second step, removing photoresist by using an organic reagent, transferring the sample with the photoresist removed into another vacuum environment, cleaning etching residues by using plasma and growing a passivation layer. This step in prior art schemes, the plasma clean etch is typically performed in a plasma enhanced chemical vapor deposition (pecvd) system or a plasma enhanced atomic layer deposition (peald) system to clean and grow the passivation layer.

And fourthly, photoetching the sample finished in the third step again, corroding the passivation layer and leaking out the electrode hole.

And fifth, carrying out photoetching on the sample finished in the fourth step, and then growing an electrode to manufacture a unit device.

In this embodiment, each process is formed by a plurality of small items, so that a process information table of each preparation process needs to be constructed to realize efficient preparation of the detector.

In this embodiment, the process triggering relationship refers to that after the assembly 1 is prepared and stabilized, the assembly will be further prepared according to the following process, so as to ensure the preparation accuracy.

In this embodiment, the stability information table refers to that the component is not moved to the next process until the component is subjected to the stabilizing operation.

In this embodiment, the superlattice infrared detector device is prepared by adopting the above process, the etching forming device in the second step and the etching cleaning passivation in the third step are respectively completed in medium vacuum or high vacuum equipment, the sample is required to be taken out from the plasma etching system after the second step is completed and exposed in the atmosphere to remove the photoresist on the surface of the sample, then the sample is transferred to the vacuum equipment in the third step, and the passivation layer of the electrode hole is required to be etched by one photoetching after the third step is completed, that is, the project needing to be noted in each process is required to ensure the qualification of the corresponding component, so that the simulation is performed once under the condition that the attention is not required, that is, the stability information is not required, and the simulation is performed once under the condition that the stability information is required, that is, the effective preparation of the detector is realized through the simulation twice.

In this embodiment, the stability information refers to ensuring that the components are maximally exposed to the smallest possible external influence, such as oxidation influence, during the production process, and the influence between dark currents between adjacent components during the building process, i.e. ensuring that each component is grown to the greatest possible extent, and then building the next component, so as to ensure the building accuracy, wherein the growth may be that the material source furnace temperature required for the growth of the corresponding layer is raised to the growth temperature and reaches a stable state, etc.

In this embodiment, the first simulation is to simulate the flow information table to obtain simulation processes and simulation results of different components, so as to analyze the components, and finally obtain the physical components, which is mainly used to determine the truly reasonable and reliable flow in the actual preparation process.

The second simulation is to combine the flow information table and the stability information table to perform simulation to obtain the existing simulation process and simulation result, and the obtained simulation result is also a physical component, so as to ensure the reliability and rationality of the actual preparation process.

In this embodiment, the analog array list=

。

In this embodiment, the array information refers to screening a reasonable simulation result from the first simulation result and the second simulation result as a preparation process, where the second simulation result is used to perform a complementary process on the first simulation result, so that the detector is effectively prepared under the condition that the accuracy and the efficiency can be ensured.

The beneficial effects of the technical scheme are as follows: the preparation scheme matched with the requirements is obtained, a foundation is provided for the follow-up expectation, and the simulation is carried out by combining the flow information table and the stability information table, so that the preparation precision of the detector is effectively ensured, and the preparation expectation is conveniently and further reached.

The invention provides a preparation method of a superlattice infrared detector, which is characterized in that a preparation scheme consistent with the preparation requirement is called from a preparation database according to the preparation requirement of the superlattice infrared detector, and the preparation method comprises the following steps:

if not, taking the frequency size sorting result as a final sorting result;

In this embodiment, the requirement analysis is implemented based on an analysis model, through which the requirement can be analyzed to obtain a plurality of requirement scripts, where the requirement scripts refer to scripts matched with the requirement keywords, so as to obtain requirement tasks matched with the scripts, and the analysis model includes requirements of different combinations and analysis results matched with the requirements, so that the requirement tasks can be effectively obtained.

In this embodiment, after the requirement a is parsed, the requirement keywords 1, 2 and 3 are obtained, where the requirement script matched with the requirement keyword 1 is a1, the requirement script matched with the requirement keyword 2 is a2, the requirement script matched with the requirement keyword 3 is a3, at this time, the requirement task matched with the requirement script a1 is b1, the requirement task matched with the requirement script a2 is b2, and the requirement task matched with the requirement script a3 is b3;

at this time, the demand script a1 has an ambiguous script c1, and after the disambiguation, the demand task b4 is obtained from the a1-c1 script.

In this embodiment, the position analysis is obtained by analyzing the requirement keywords in the preparation requirement according to the word sense position analysis model, because a main keyword and a secondary keyword exist in one requirement, the importance degree of the keywords at different positions is reflected by the same expression semantics in the expression process, so as to determine the main script existing in the new requirement script.

Such as: the scripts of a1-c1 are main scripts, the scripts of the rest a2-c2 and a3-c3 are rest scripts,

in the history preparation process, different schemes are matched according to different requirements and are obtained based on different script matching, so that the occurrence frequency of each residual script can be determined to be ranked according to the frequency, for example, the occurrence frequency of a2-c2 is 5, the occurrence frequency of a3-c3 is 6, and at the moment, the final ranking result is as follows: a1-c1, a3-c3, a2-c2;

If the occurrence frequency is the same, the task execution weight is determined according to a new task, and the execution weight of each task is determined in advance and is obtained by matching from a task-weight database.

In this embodiment, the word sense position weight is obtained by analyzing the preparation requirement based on the word sense position analysis model, and then the importance degree of the position with different new requirements is obtained, so that the word sense position weight can be used as the word sense position weight.

In this embodiment, the task execution weight has a value range of 0 to 1, and the word sense position weight has a value range of 0 to 1.

In this embodiment, the history list means that the first main script must be a1-c1, and the history list includes different scripts.

In this embodiment, script collaborative matching refers to parallel comparison of each script in the corresponding list with the preparation database, so as to ensure the high efficiency of comparison, and simultaneously, parallel comparison with the same position, so as to obtain a consistent preparation scheme.

The beneficial effects of the technical scheme are as follows: the new demand script and the new task result are acquired through demand analysis and script elimination, so that important ordering of the script is performed, and accurate and reasonable preparation schemes are convenient to obtain, wherein the ordering result is subjected to auxiliary determination through frequency matching and ordering value calculation, so that a foundation is provided for subsequent acquisition of the preparation schemes.

The invention provides a preparation method of a superlattice infrared detector, which constructs a flow information table of the same preparation flow according to the flow attribute and standard preparation parameters and by combining the material attribute of the current preparation material, and comprises the following steps:

when (when)

And +.>

When the second calibration result is judged as a final influence part;

otherwise, the first calibration result is used as a final influence part;

In this embodiment, the types of materials involved in different processes in the preparation process are different, that is, the materials used are different, so that matching materials can be obtained according to the types of materials involved in the processes and unique codes.

In this embodiment, the detection report is the latest detection of the components of the matched material, so as to effectively determine the difference between the material to be used and the standard material, and the attribute analysis model is trained in advance, and the component content, oxidation condition, material purity and the like of the material, that is, the attribute of the corresponding material, are determined by detecting various detection information, such as various component information, existing on the report.

In this example, standard properties refer to the composition content, oxidation, purity of the material, etc. of each material in the case of acceptable raw materials used and the material prepared without oxidation.

In this embodiment, each preparation process is implemented based on a plurality of preparation steps, so that an initial flow table is obtained based on process attributes and standard preparation parameters, which may be predetermined, because a preset flow table exists when each preparation process is under standard conditions.

In this embodiment, the flow table includes: substep 1-substep 2-substep 3, for example, the material entry position of the material 1 is substep 1, the material end position is substep 2, and the preparation process of the material 1 is substep 1 and substep 2.

In this embodiment, the result-process analysis model is trained in advance, and based on different participating processes and the material property comparison results matched with the participating processes, and the existing influence conditions are obtained by sample training, it can be determined whether the influence of the manufacturing process caused by the property differences meets the material influence standard.

In this embodiment, the materials database is comprised of various materials that are uniquely coded and matched to the unique code.

In this embodiment, the material impact criteria are preset, for example, the oxidation degree of the material 1 cannot exceed 3%, and if the oxidation impact condition is that the oxidation degree is 5%, the corresponding material impact criteria are: in this case, since the first calibration is performed for the material 1 when the oxidation degree exceeds 3%, the same material needs to be calibrated a plurality of times because the same material includes analysis of moisture content, component ratio, and the like in addition to the oxidation degree.

In this embodiment, the second calibration result is a portion of little influence directed thereto, and the first calibration result is a portion of big influence directed thereto.

In this embodiment, the process information table is obtained by continuously optimizing the influencing conditions of the influencing part, for example: initial flow table: substep 1-substep 2-substep 3, the determined flow information table is: the sub-step 01-2-3, that is, the optimization can be a certain sub-step, or a plurality of sub-steps, in the continuous optimization process, the sub-steps in the initial flow chart are optimized according to the corresponding influence conditions, so that the accuracy in the subsequent preparation process is ensured, for example, the accuracy is influenced by the material moisture, the material needs to be removed in the operation process, that is, the operation is added in the sub-step 1 at the entering position, the original sub-step 1 is changed into the sub-step 01, and the accuracy in the subsequent preparation is ensured to the greatest extent.

The beneficial effects of the technical scheme are as follows: the detection report of the actual material is obtained, and the material attribute is compared with the standard attribute through the attribute analysis model, so that the initial flow chart is analyzed by the same material, and the influence part is determined, the continuous optimization of the initial flow chart is effectively realized, and a basis is provided for the follow-up accurate preparation.

The invention provides a preparation method of a superlattice infrared detector, which constructs a stable information table of adjacent preparation processes according to process triggering relations between the adjacent preparation processes, and comprises the following steps:

In this embodiment, the stabilizing manner of the performance stabilization may be to perform a stabilizing operation on the surface of the corresponding component, for example, to keep the surface of the corresponding component stable by means of temperature.

In this embodiment, the stabilization mode is based on a performance-stabilization map matching, and in this way, the stabilization criterion means that the corresponding surface is stabilized for 10 seconds and more in the stabilization mode.

In this embodiment, the first trigger condition refers to the stable manner of setting up the previous component and the time for the next component to enter preparation.

In this example, the stability information table is mainly used to ensure the rationality of the preparation of adjacent components.

The beneficial effects of the technical scheme are as follows: and setting triggering conditions for the components by determining the stable mode of the components to obtain a flow triggering relationship, providing a basis for constructing a stable information table, and indirectly improving the accuracy of subsequent preparation.

The invention provides a preparation method of a superlattice infrared detector, which carries out first simulation on the detector to be prepared according to all flow information tables, carries out second simulation on the detector to be prepared according to the complete preparation flow by using all flow information tables and a stable information table, and comprises the following steps:

In this embodiment, the table simulation sequence refers to the sequence of preparation for different components, which can be directly determined according to the preparation scheme, wherein the preparation scheme includes a preparation flow, preparation parameters, preparation sequence, and the like.

In this embodiment, the time execution labels are execution labels corresponding to the execution sequences of different preparation flows, and because the process belongs to an automatic preparation process, the preparation period of each component is strictly defined, so that there is a setting of the time label.

In this embodiment, there is an operation of performing stabilization treatment or the like on the surface of the component during the preparation, and therefore, it is also necessary to set the second time stamp to the corresponding stabilization information table: such as: the construction sequence is as follows: component 1-stability information table (the stability treatment is required to be carried out on the component 1 according to the table) -component 2-stability information table (the stability treatment is required to be carried out on the component 2 according to the table), and time labels are sequentially determined according to the construction sequence, wherein the stability information table corresponding to each component is preset, and the stability information table related to the component can be called based on the component-label database.

In this embodiment, the first component information refers to component parameters in the process of constructing the first initial component and evaluation results of various indexes in the first component.

In this embodiment, the second initial component is based on the first component and further includes a stabilizing process, so the second component information refers to component parameters, stabilizing parameters, and evaluation results of various indexes in the second component in the process of constructing the second initial component.

In this embodiment, the analog building process refers to a process of building a component according to the correspondence information table, so as to obtain existing related parameters, such as a response band, carrier effective mass, and the like.

The beneficial effects of the technical scheme are as follows: the first simulation is carried out according to the flow information, the second simulation is carried out by combining the stable information table, the first component information and the second component information are effectively obtained, an effective basis is provided for the subsequent information extraction, and the accuracy of the subsequent preparation is ensured.

The invention provides a preparation method of a superlattice infrared detector, which generates a simulation array list according to a first simulation result and a second simulation result, and comprises the following steps:

taking the first component information and the third component information corresponding to the same flow information table as component arrays, and analyzing the weight difference and the mean value difference between the two component information corresponding to the component arrays;

In this embodiment: flow information table 1-stability information table, so adjacent flow information table 1 corresponds to the third component information of the stability information table.

In this embodiment, the first component information is the result of the first simulation, and the third component information is the result of the second simulation, and since not every component is required to perform a stabilization operation, that is, is required to be performed according to the stabilization information table, a subsequent analysis is performed by analyzing the weight difference and the mean difference, wherein:

weight difference = absolute value of weight difference of information weight of the first component information and information weight of the second component information, wherein the information weight is determined according to effective information related in the component information, is obtained by matching based on an information-weight mapping table, and effectively obtains the information weight of the corresponding component.

Mean difference 1 =

Mean difference 2 =

In this embodiment, the first set threshold and the second set threshold are both preset, and the value of the first set threshold is generally 0.2, and the value of the second set threshold is generally 0.1.

In this embodiment, saliency processing refers to highlighting corresponding arrays of components with different colors.

In this embodiment, the first component information: information 1, information 2, information 3;

third component information: information 1, information 4, information 5;

wherein, intersection information is: information 1, similar information is information 2 and information 4, information 1 and information 1.

First information duty ratio=duty ratios of information 2, information 4, and information 1 based on information 1, information 2, information 3, information 4, and information 5.

In this embodiment, the third set threshold value is generally 0.5, and the fourth set threshold value is generally 0.5, where the first duty ratio weight=the information weight accumulation of the stored similar information and/or the information weight accumulation of all the first component information and the second component information.

In this embodiment, the information supplementing process refers to supplementing the information 4 in the similar information to the first component information, and further performing the second saliency process.

In this embodiment, the matching information may be information 4, and the second component information includes information 6 associated with the information 4, where the information 6 is a part of the information 5, and at this time, the information 4 and the western information 6 are used as information to be supplemented, and are supplemented to the first component information, and subjected to third saliency processing;

otherwise, the fourth saliency processing is to completely replace the corresponding first component information with the third component information, mainly to save operation steps, improve preparation efficiency, and further ensure preparation accuracy.

In this embodiment, the simulated array list = { significance processing results corresponding to different components }

In this embodiment, the corresponding set thresholds are different according to different production and preparation standards, and typically the third set threshold is 0.5, and the fourth set threshold is also 0.5.

The beneficial effects of the technical scheme are as follows: through carrying out reasonable and effective analysis to the third subassembly information in the same array, realize the effective supplementary to first subassembly information, not only save the operation flow, can also effectual improvement preparation accuracy.

The invention provides a preparation method of a superlattice infrared detector, which generates a simulation array list and screens array information meeting production and preparation standards, and comprises the following steps:

In this embodiment, the array information is the information determined last under different significance results, that is, the information after the first component information is supplemented, or the information is completely replaced.

The beneficial effects of the technical scheme are as follows: and array information is effectively obtained through the significance processing result, so that a foundation is provided for subsequent actual preparation.

The invention provides a preparation method of a superlattice infrared detector, which comprises the following steps of:

a result weight indicating the j1 st verification index; />

A result verification value indicating a j 1-th verification index; />

A distance weight representing the j1 st verification index;

a distance verification value indicating a j 1-th verification index; />

Representing the maximum weight in all result weights in the same verification mode; / >

In this embodiment, the verification modes of different detectors are different, but generally focus mainly on verification of corresponding bands, verification of carriers, verification of dark current, and the like, so that corresponding signals are input to corresponding detectors to achieve effective detection.

In this embodiment, different verification indexes, that is, verification of the relevant type parameters needs to be performed on the detector, to obtain the corresponding verification values.

In this embodiment, the result weight is preset according to the index weight of the corresponding index in the process of verifying the detector, where the verification window includes verification indexes involved in the process of verifying the detector by using the verification method, the weight of each index is determined by index distribution, and the sum of all the index weights is 1.

In this embodiment, the center index refers to an index having the largest index weight, and the distance between the remaining indexes and the center index is determined by this.

In this embodiment, the larger the distance is, the smaller the distance distribution weight is, and the distance weight=1 corresponding to all the distance distribution weights+the center index is.

In this embodiment, the sum of the weights of all verification methods is 1.

In this embodiment, the qualification criteria are preset, and the value of H1 is greater than 0.8, and the value of H2 is greater than 0.6.

In this embodiment, for example, the response bandwidth can be verified, with a larger GaSb layer thickness for a fixed InAs layer thickness (26 a) and a shorter cut-off wavelength, and with a fixed GaSb layer thickness (27 a), a larger InAs layer thickness and a longer cut-off wavelength. Except that the effective band gap can be continuously adjustable at 0-400 meV and the infrared detection capability of the wave band of 3.1-30 um is covered. The band edges (the bottom of the conduction band and the top of the valence band) of the second-class superlattice material can be independently adjusted, and a platform is provided for the design and development of a novel device structure (particularly a barrier type device);

for example, the effective mass of the carriers can be verified, and the effective mass of the carriers of the second type superlattice is relatively large due to the special energy band structure (for long-wave materials, the effective mass of electrons of the second type superlattice is about 0.03m ₀ The effective mass of mercury cadmium telluride electrons is about 0.009m ₀ ). The large effective mass can reduce the tunneling current of the detector, which is a major contribution in the dark current of the long wave and its long wave mercury cadmium telluride infrared detector.

The beneficial effects of the technical scheme are as follows: the result weight and the distance distribution weight are determined by acquiring the index distribution of the same verification mode, so that the first qualified value under the single verification mode is calculated, the comprehensive qualified value under all the verification modes is further calculated, an effective judgment basis is provided for determining whether the detector is qualified, and the preparation accuracy and the qualification of the detector are ensured.

It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention also include such modifications and alterations insofar as they come within the scope of the appended claims or the equivalents thereof.

Claims

1. The preparation method of the superlattice infrared detector is characterized by comprising the following steps of:

2. A method of manufacturing a superlattice infrared detector as defined in claim 1, wherein retrieving a manufacturing recipe consistent with the manufacturing requirement from a manufacturing database according to the manufacturing requirement of the superlattice infrared detector comprises:

wherein P represents the ranking value of the corresponding overlapping script; max represents the maximum value symbol; min represents a minimum symbol; w1 represents word sense position weight of the corresponding overlapped script; r1 represents task execution weights of the corresponding overlapped scripts;

If not, taking the frequency size sorting result as a final sorting result;

3. The method for preparing the superlattice infrared detector as recited in claim 1, wherein said preparation scheme includes: flow attributes of different preparation flows and standard preparation parameters of different preparation flows.

4. The method for fabricating a superlattice infrared detector as defined in claim 1, wherein constructing a flow information table of a same fabrication flow based on said flow properties and standard fabrication parameters, in combination with material properties of a currently fabricated material, comprises:

when (when)

And +.>

When the second calibration result is judged as a final influence part;

otherwise, the first calibration result is used as a final influence part;

5. The method for preparing a superlattice infrared detector as recited in claim 1, wherein constructing a table of stability information for adjacent preparation processes based on process trigger relationships between adjacent preparation processes comprises:

6. The method for manufacturing a superlattice infrared detector as defined in claim 1, wherein the first simulating the to-be-manufactured detector according to all the flow information tables, and the second simulating the to-be-manufactured detector according to the complete manufacturing flow with all the flow information tables and the stability information table includes:

7. The method for manufacturing a superlattice infrared detector as defined in claim 1, wherein generating a list of simulated arrays based on the first simulation result and the second simulation result comprises:

8. The method for manufacturing a superlattice infrared detector as defined in claim 7, wherein generating a list of analog arrays and screening array information satisfying production manufacturing criteria comprises:

9. A method of fabricating a superlattice infrared detector as defined in claim 7, wherein a third set threshold and a fourth set threshold of the same component array are determined based on the production and fabrication criteria.

10. The method for manufacturing a superlattice infrared detector as defined in claim 1, wherein the process of performing multi-azimuth verification on the actual detector comprises:

a result weight indicating the j1 st verification index; / >

A result verification value indicating a j 1-th verification index; />

A distance weight representing the j1 st verification index; />

A distance verification value indicating a j 1-th verification index; />