CN116096511A - Cleaning surfaces - Google Patents
Cleaning surfaces Download PDFInfo
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- CN116096511A CN116096511A CN202180058440.0A CN202180058440A CN116096511A CN 116096511 A CN116096511 A CN 116096511A CN 202180058440 A CN202180058440 A CN 202180058440A CN 116096511 A CN116096511 A CN 116096511A
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- China
- Prior art keywords
- polymer layer
- cleaning
- cleaning surface
- substrate
- topographical feature
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- 238000004140 cleaning Methods 0.000 title claims abstract description 153
- 229920000642 polymer Polymers 0.000 claims abstract description 80
- 239000000758 substrate Substances 0.000 claims abstract description 58
- 238000000034 method Methods 0.000 claims abstract description 23
- 230000005855 radiation Effects 0.000 claims abstract description 14
- 230000003068 static effect Effects 0.000 claims description 5
- 230000001788 irregular Effects 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000002985 plastic film Substances 0.000 claims description 4
- 229920006255 plastic film Polymers 0.000 claims description 4
- 239000002216 antistatic agent Substances 0.000 claims description 3
- 229920001971 elastomer Polymers 0.000 claims description 3
- 239000011888 foil Substances 0.000 claims description 3
- 239000000806 elastomer Substances 0.000 claims description 2
- 238000004049 embossing Methods 0.000 claims description 2
- 230000000873 masking effect Effects 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 60
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 238000001723 curing Methods 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000003847 radiation curing Methods 0.000 description 3
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- 239000004677 Nylon Substances 0.000 description 1
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- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0028—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by adhesive surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B6/00—Cleaning by electrostatic means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
Landscapes
- Cleaning In General (AREA)
Abstract
The present disclosure relates to a cleaning surface (100) for contacting a cleaning device. The cleaning surface includes a substrate (110) detachably mounted on the contact cleaning apparatus, the substrate supporting a first polymer layer (130) having a surface (132). A first topographical feature (140) or layer is applied to and/or formed on at least a portion of the first polymer layer, and the first polymer layer is radiation cured. The invention also relates to a method of forming a contact cleaning surface.
Description
RELATED APPLICATIONS
The present application claims the benefit of uk (GB) patent application 2008260.8 entitled "cleaning surfaces" filed on day 2, 6, 2020. The entire contents of said uk (GB) patent application No. 2008260.8 are expressly incorporated herein by reference.
Technical Field
The present invention relates to a contact cleaning surface for a contact cleaning device, and in particular, but not exclusively, to a contact cleaning surface comprising a substrate having topographical features, the substrate being detachably mounted to the device. The invention also relates to a method of forming a contact cleaning surface.
Background
Contact cleaning is used to clean a substrate surface or workpiece. Once cleaned, the workpiece may be used in a variety of complex processes, such as the manufacture of electronic devices, photovoltaic devices, and flat panel displays. Typically, rubber or elastomeric contact cleaning rollers are used to remove dirt particles from the substrate surface, and adhesive rollers may then be used to remove the dirt particles or debris from the cleaning rollers. This ensures that the cleaning roller is free of debris and that the cleaning roller will exhibit its maximum efficiency in removing dirt particles from the substrate surface or workpiece.
The scrub roller typically includes a roller shaft or core with an elastomeric coating on its outer surface. The elastomeric coating is then cured on the roll core such that its outer surface forms the cleaning surface. Optionally, the cleaning surface may be micro-roughened to increase and/or maximize surface area contact between the cleaning surface and small particles that cause fouling.
In addition, known scrub rollers are formed by attaching a polymer coated flexible substrate cut from a flexible sheet to the roller core. The polymer coated flexible substrate is secured to the roll core using an adhesive or laser welding.
One of the drawbacks of the prior art is that the application of the elastic coating directly to the roll core makes it difficult to remove said coating at the end of its service life. It is also difficult to apply micro-roughening to the outer surface of the elastomeric coating formed around the roll core.
Systems utilizing flexible substrates cut from flexible sheets are formed as continuous lengths of sheet material that cannot be customized or adapted for the device to which the sheet material is attached. The use of adhesives to attach the substrates to the roll core also makes them difficult to remove at the end of their useful life.
It is therefore an object of the present invention to provide a contact cleaning surface which can be easily adapted to the contact cleaning application in which it is intended. It is a further object of the present invention to provide a method of forming a contact cleaning surface that provides maximum flexibility in its form and function. Certain embodiments provide the advantage that the surface is adaptable or customizable, so that the various portions of the contact cleaning surface can be optimized or modified in different ways. In this way, the contact cleaning surface may be adjusted or tailored to various aspects of the substrate surface, workpiece or workpieces that the contact cleaning apparatus cleans, such as the shape, orientation, or surface characteristics of the substrate surface, workpiece or workpieces.
Disclosure of Invention
According to the present invention, a cleaning surface for contacting a cleaning device is provided according to the appended claims.
According to the present invention, a contact cleaning roller according to the appended claims is provided.
According to the present invention, a contact cleaning system according to the appended claims is provided.
According to the present invention, there is provided a method of forming a cleaning surface for contacting a cleaning device according to the appended claims.
According to a first aspect of the present invention there is provided a cleaning surface for contacting a cleaning device comprising:
a substrate detachably mounted on the contact cleaning apparatus, supporting a first polymer layer having a surface,
wherein a first topographical feature or layer is applied to and/or formed on at least a portion of the first polymer layer,
and wherein the first polymer layer is radiation cured.
In certain embodiments, a second topographical feature or layer is applied to and/or formed on at least one other portion of the polymer layer. In this way, the debris collection efficiency of the cleaning surface is tailored to varying degrees within the first topographical feature, within the second topographical feature, and outside the first topographical feature and outside the second topographical feature.
In certain embodiments, the second topographical feature is dimensionally different from the first topographical feature. In certain embodiments, the first topographical feature comprises a regular or irregular pattern. In these ways, when the cleaning surface is used to collect debris in a contact cleaning system, the portion of the cleaning roller that contacts the substrate surface or workpiece to be cleaned has a tailored area along its length. The customized area in contact with the substrate surface or workpiece to be cleaned may vary as the cleaning roller rotates. Thus, the regions are tailored to correspond to different aspects of the substrate surface or workpiece being cleaned.
In certain embodiments, the substrate provides dimensional stability to the cleaning surface. In certain embodiments, the substrate comprises a plastic film or a metal foil. In certain embodiments, the substrate comprises a mesh. The substrate and the polymer layer supported thereon are flexible so that the cleaning surface can be mounted to a contact cleaning roll. Due to its nature, e.g. its composition and/or its thickness, the substrate is able to provide dimensional stability to the cleaning surface without impeding the mounting of the cleaning surface around the cleaning roll core. In this way, the substrate provides the cleaning surface with better compatibility with the cleaning roller without affecting its elasticity.
In certain embodiments, the first polymer layer comprises an antistatic agent. In certain embodiments, the first polymer layer is static dissipative. In this way, the cleaning surface may be adjusted to mitigate the effects of static electricity accumulation on the cleaning roller or in the contact cleaning system, thereby preventing damage to the workpiece or substrate surface to be cleaned.
In certain embodiments, the first polymer layer comprises an elastomer.
In certain embodiments, the cleaning surface may be shaped as a cylinder or a cylindrical cap. In certain embodiments, the cleaning surface is provided as a belt or sheet. In this way, the cleaning surface can accommodate different cleaning rollers, as well as different contact cleaning systems.
In certain embodiments, a second polymer layer is provided between the substrate and the first polymer layer. In certain embodiments, the second polymer layer comprises a different polymer than the first polymer layer. In this way, the second polymer layer may improve compatibility between the substrate and the first polymer layer. The second polymer layer may provide additional properties to the cleaning surface, such as antistatic or static dissipative properties.
According to a second aspect of the present invention, there is provided a contact cleaning roller comprising a roller core, and a contact cleaning surface detachably mounted on at least a portion of the roller core, the contact cleaning surface comprising:
a substrate supporting a first polymer layer having a surface,
wherein a first topographical feature or layer is applied to and/or formed on at least a portion of the first polymer layer,
and wherein the first polymer layer is cured.
According to a third aspect of the present invention, there is provided a contact cleaning apparatus, the contact cleaning roller comprising a roller core, and a contact cleaning surface detachably mounted on at least a portion of the roller core, the contact cleaning surface comprising:
a substrate supporting a first polymer layer having a surface,
wherein a first topographical feature or layer is applied to and/or formed on at least a portion of the first polymer layer,
and wherein the first polymer layer is cured.
In certain embodiments, the contact cleaning roller is adapted to operably and moveably interact with a workpiece surface such that the contact cleaning surface collects debris from the workpiece surface. In this way, when the cleaning surface is used to collect debris in a contact cleaning system, the portion of the cleaning roller in contact with the workpiece has a tailored zone or zones along its length. The customized area of contact with the workpiece may change as the contact cleaning roller rotates. Thus, the regions are customized to correspond to different aspects of the workpiece being cleaned.
According to a fourth aspect of the present invention there is provided a method of forming a cleaning surface for contacting a cleaning device, comprising:
providing a substrate detachably mounted to the contact cleaning apparatus,
a polymer layer is applied to the substrate to form a clean surface,
and providing at least a first topographical feature or layer onto at least a portion of the polymer layer.
In certain embodiments, the method further comprises curing the polymer layer with radiation, wherein providing the at least first topographical feature occurs before, during, or after the curing.
In certain embodiments, the method further comprises mounting the substrate onto the contact cleaning apparatus after curing the polymer layer.
In certain embodiments, the at least one topographical feature is provided by masking, printing or embossing the polymer layer. In this way, topographical features are applied to and/or formed on the surface of the polymer layer by known means.
In certain embodiments, the mask comprises a negative or positive photoresist.
In certain embodiments, the at least one topographical feature comprises a plurality of topographical features sequentially provided on the polymer layer. In this way, the cleaning surface can be adjusted or customized in stages, maximizing flexibility in the manufacturing process, and allowing the cleaning surface to be customized very specifically for a particular aspect of the workpiece or a particular cleaning application.
In certain embodiments of all aspects of the invention, the curing radiation is ultraviolet radiation.
In certain embodiments of all aspects of the invention, the curing radiation is microwave radiation.
Drawings
Embodiments of the invention will now be described, by way of example only, with reference to the accompanying drawings, in which:
fig. 1 shows a) a cross-sectional view and b) a top view of a first exemplary embodiment of a cleaning surface according to a first aspect of the invention;
fig. 2 shows a) a cross-sectional view and b) a top view of a second exemplary embodiment of a cleaning surface according to a first aspect of the invention;
FIG. 3 shows a perspective view of the cleaning surface of FIG. 2 mounted to a contact cleaning roller;
FIG. 4 shows a first method according to another aspect of the invention;
FIG. 5 shows a second method according to another aspect of the invention; and
fig. 6 shows a perspective view of a third exemplary embodiment of a cleaning surface mounted on a contact cleaning roller.
In the drawings, like reference numerals refer to like parts.
Detailed Description
Certain terminology is used in the following description for convenience only and is not limiting. The terms 'upper' and 'lower' designate in the drawings the direction in which the reference is made and are with respect to the direction in which the components described are assembled, the particular meaning of which is readily understood from the context of the description.
Furthermore, as used herein, the terms "connected," "attached," "coupled," "mounted" are intended to encompass a direct connection between two elements, without any other elements intervening therebetween, as well as an indirect connection between elements wherein one or more other elements are intervening between the aforementioned elements. The terminology includes the words specifically mentioned above, derivatives thereof and words of similar import.
Moreover, unless otherwise indicated, the use of ordinal adjectives, such as "first," "second," "third," etc., merely indicate that different instances of like objects are being referred to, and are not intended to imply that the objects so described must be in a given sequence, either temporally, spatially, in ranking, or in any other manner.
Referring now to fig. 1, a cleaning surface 100 according to a first aspect of the present invention is shown. The cleaning surface 100 includes a substrate 110 supporting a polymer layer 130 having a surface 132. A portion of the surface 132 of the polymer layer 130 has a first topographical feature 140, and the polymer layer 130 is radiation cured to fix the topographical feature. In this way, the portions may be tuned to customize the cleaning surface 100 for a particular cleaning task.
The substrate 110 is formed of a plastic film to provide an upper surface and a lower surface extending substantially parallel to each other. The substrate 110 is rectangular and includes a pair of long sides 112, 114 parallel to each other and a pair of short sides 116, 118 parallel to each other, the long sides being disposed perpendicular to the short sides.
The polymer layer 130 extends across substantially the entire upper surface of the substrate. The polymer layer 130 is provided as a coating of the substrate 110, applied to substantially cover the upper surface of the substrate. Once applied, the polymer layer 130 provides a surface 132 for the cleaning surface 100. The polymer layer 130 may be any polymer suitable for contacting cleaning debris from a workpiece, such as an elastomeric coating. Non-limiting example materials for the polymer layer include silicone rubber, polyurethane, and polyether.
A first topographical feature 140 is provided on the polymer layer surface 132. The first topographical feature 140 extends between the long sides 112, 114 in a direction parallel to the short sides 116, 118 with a uniform width. In this way, the first topographical feature 140 forms an area extending across the surface 132.
The first topographical feature 140 is provided as a series of grooves 142 formed on the surface 132. Each of the grooves 142 is substantially identical to each other, arranged such that the grooves together provide a regular pattern. In other words, the first topographical feature 140 forms a uniformly textured surface. The series of grooves 142 greatly increases the surface area of the surface 132 in the region of the first topographical feature 140, thereby allowing for an adjustment in the debris collection efficiency in the region of the first topographical feature 140.
Fig. 2 shows a second embodiment of a cleaning surface 200. Wherein the features are the same as in the previous embodiment, the reference numerals are the same, except that the beginning number is "2". The embodiment shown in fig. 2 is similar to the embodiment shown in fig. 1, such that the cleaning surface 200 includes a substrate 210 having a polymer layer 230 supported thereon and having a first topographical feature 240 on a surface 232 thereof. And also has a second topographical feature 250 on its surface 232.
The second topographical feature 250 extends between the long sides 212, 214 with a uniform width in a direction parallel to the short sides 216, 218 and parallel to the first topographical feature 240. In this way, the second topographical feature 250 forms an area extending across the surface 232. The width of the second topographical feature 250 across the surface 232 is narrower than the width of the first topographical feature 240.
The first topographical feature 240 is provided as a series of first grooves 242 on the surface 232. As with the example depicted in fig. 1, the series of first grooves 242 increases the surface area of the surface 232 in the region of the first topographical feature 240 to adjust the debris collection efficiency in that region.
The second topographical feature 250 is provided as a series of second grooves 252 on the surface 232. The second groove 252 has a different profile shape and an opening shape from those of the first groove 242. The series of second grooves 252 increases the surface area of the surface 232 in the region of the second topographical feature 250 by a different degree than the region of the first topographical feature 240. Thus, the debris collection efficiency of the surface 232 is adjusted to varying degrees within the first topographical feature 240, within the second topographical feature 250, and outside of the first topographical feature 240 and the second topographical feature 250.
Fig. 3 shows the cleaning surface 200 described above, including a first topographical feature 240 and a second topographical feature 250 provided on the surface 232 of the polymer layer 230. The entire cleaning surface 200 is mounted on the cleaning roller 300. The scrub roller 300 includes a roller core 360 having an axial length and a cylindrical outer surface. The cleaning surface 200 is mounted on the roll core 360 such that the cleaning surface wraps around and covers the cylindrical outer surface.
When forming the cleaning surface 200, the length of the long sides 212, 214 of the cleaning surface 200 is selected to correspond to the axial length of the roll core 360. The length of the short sides 216, 218 of the cleaning surface 200 is also selected to correspond to the circumference of the roll core 360. Thus, when the cleaning surface 200 is mounted to the cleaning roller 300, it forms a single layer or sleeve around the roller core 360.
The cleaning surface 200 is mounted to the cleaning roller 300 such that the first topographical feature 240 and the second topographical feature 250 provide a circumferential band around the cleaning roller. Thus, when the cleaning roller is installed in a contact cleaning apparatus and put into use to collect debris, the portion of the cleaning roller 300 in contact with the workpiece has an adjustment area along its contact area. Thus, as the workpiece moves in the machine direction within the contact cleaning apparatus, the cleaning roller 300 rotates to continuously apply customized cleaning across the width of the workpiece.
Referring now to FIG. 6, another embodiment of a scrub roller 600 is shown. Wherein the features are the same as in the previous embodiments, the reference numerals are the same except that the beginning numerals are "6". Thus, a cleaning surface is mounted on the cleaning roller 600 with its substrate 610 wrapped around the cleaning roller core 660 such that the surface 632 faces outwardly.
The surface 632 is provided with a topographical feature 640 throughout the outer surface 632. The one topographical feature 640 extends continuously across the entire outer surface 632 of the cleaning surface. Thus, the one topographical feature 640 is configured to provide a uniformly textured surface to the scrub roller 600.
Referring now to fig. 4, a method 400 of forming a cleaning surface in accordance with a fourth aspect of the present invention is shown. The method 400 first provides 410 a substrate, such as the substrates 110, 210 described with reference to fig. 1-3. A polymer layer is then applied 420 to the substrate to form a clean substrate. At least a first topographical feature or layer is then provided 430 over at least a portion of the polymer layer.
Fig. 5 shows another method 500 of forming a cleaning surface according to a fourth aspect of the invention. Wherein the features are identical to those of the method of fig. 4, the reference numerals are identical except that the beginning numerals are "5" instead of "4". The embodiment shown in fig. 5 is similar to the embodiment shown in fig. 4, such that a substrate is provided 510, then a polymer layer is applied 520 on the substrate, and then a first topographical feature or layer is provided 530 on a first portion of the polymer layer. The method includes the further step 535 of: a second topographical feature or layer is provided 535 on a second portion of the polymer layer. Thus, the cleaning surface is provided with a plurality of topographical features in sequence. The polymer layer is then cured 540 with radiation.
It will be appreciated by persons skilled in the art that the above embodiments have been described by way of example only and not in any limitative sense, and that various alterations and modifications are possible without departure from the scope of the invention as defined by the appended claims. Various modifications to the detailed examples described above are possible, for example, variations in the number, shape, size, arrangement, fit, or the like of contact cleaning surfaces, contact cleaning rollers, or adhesive rollers. In particular, the cross-sectional profile of each topographical feature may exhibit any suitable coverage, shape, or size.
In certain embodiments, the topographical features comprise a series of uniform grooves arranged in a regular pattern. However, any regular or irregular pattern may be provided. The pattern may include grooves, openings or protrusions or roughened areas, or any suitable combination thereof.
In certain examples, the first topographical feature, or the first topographical feature and any additional topographical features, are disposed on the cleaning surface in any suitable orientation. In this way, the topographical features may be provided in a variety of configurations when the cleaning surface is mounted to a roll core, such that they form, for example, strips, spirals, or tiles of regular or irregular shape. The topographical features may be in the form of a single uninterrupted shape, or may be formed from a pattern of discontinuities in a smaller form.
In certain embodiments, the substrate is a plastic film. Alternatively, the substrate may be a mesh, such as a woven or non-woven textile, or a shaped grid or lattice. The film or mesh may be formed from a polymer such as polyethylene or nylon. Alternatively, the substrate may be a metal foil, such as aluminum, steel or copper.
In certain embodiments, the antistatic agent may include conductive fibers dispersed within the polymer layer, such as nanowires made of, for example, silver or carbon nanotubes. The static dissipative agent can be, for example, a cyclic siloxane or a metal salt.
In certain embodiments, the polymer layer is provided as a relatively thin film, for example having an average thickness in the range of about 1mm to about 6 mm. The substrate may be provided with a thickness in the range of about 25 microns to about 3 millimeters.
In certain embodiments, the polymer layer may include adjacent portions of different polymers. Alternatively, different topographical features may be applied to each polymer of the polymer layer, thereby providing topographical features collectively tailored by the physical form of the surface and the polymer material from which they are formed.
In certain example methods, the radiation curing of the polymer layer may be performed as a single step, after all topographical features are formed. Alternatively, each topographical feature may be formed and then subsequently locally cured. Alternatively, one or more topographical features may be formed and cured simultaneously.
In certain example methods, radiation curing may use ultraviolet or microwave radiation. In addition, other radiation curing may be used, such as infrared or visible light.
The polymer layer may be radiation cured prior to the cleaning surface being mounted to the cleaning roll, or the polymer layer may be radiation cured after being mounted.
Claims (23)
1. A cleaning surface for contacting a cleaning device, comprising:
a substrate detachably mounted to the contact cleaning apparatus, the substrate supporting a first polymer layer having a surface,
wherein a first topographical feature or layer is applied to and/or formed on at least a portion of the first polymer layer,
and wherein the first polymer layer is radiation cured.
2. The cleaning surface of claim 1, wherein a second topographical feature or layer is applied to and/or formed on at least one other portion of the polymer layer.
3. The cleaning surface of claim 2, wherein the second topographical feature is dimensionally different from the first topographical feature.
4. A cleaning surface according to any one of claims 1 to 3, wherein the first topographical feature comprises a regular or irregular pattern.
5. The cleaning surface of any preceding claim, wherein the substrate provides dimensional stability to the cleaning surface.
6. A cleaning surface according to any preceding claim, wherein the substrate comprises a plastic film or a metal foil.
7. The cleaning surface of any one of claims 1 to 5, wherein the substrate comprises a mesh.
8. The cleaning surface of any preceding claim, wherein the first polymer layer comprises an antistatic agent.
9. The cleaning surface of any preceding claim, wherein the first polymer layer is static dissipative.
10. The cleaning surface of any preceding claim, wherein the first polymer layer comprises an elastomer.
11. The cleaning surface of any preceding claim, wherein the cleaning surface is formable into a cylinder or a cylindrical cap.
12. A cleaning surface according to any preceding claim, wherein a second polymer layer is provided between the substrate and the first polymer layer.
13. The cleaning surface of claim 12, wherein the second polymer layer comprises a different polymer than the first polymer layer.
14. The cleaning surface according to any one of claims 1 to 13, wherein the cleaning surface is provided as a belt or sheet.
15. A contact cleaning roller comprising a roller core, wherein the contact cleaning surface according to any one of claims 1 to 14 is detachably mounted on at least a portion of the roller core.
16. A contact cleaning apparatus comprising the contact cleaning roller of claim 15.
17. A contact cleaning device as claimed in claim 16, wherein the contact cleaning roller is adapted to operatively interact with a workpiece surface such that the contact cleaning surface collects debris from the workpiece surface.
18. A method of forming a cleaning surface for contacting a cleaning device, comprising:
providing a substrate detachably mounted to the contact cleaning apparatus,
a polymer layer is applied to the substrate to form a clean surface,
and providing at least a first topographical feature or layer onto at least a portion of the polymer layer.
19. The method of claim 18, further comprising curing the polymer layer with radiation, wherein providing the at least first topographical feature occurs before, during, or after the curing.
20. The method of claim 19, further comprising mounting the substrate onto the contact cleaning apparatus after curing the polymer layer.
21. The method of claim 18, wherein the at least one topographical feature is provided by masking, printing or embossing the polymer layer.
22. The method of claim 21, wherein the mask comprises a negative or positive photoresist.
23. The method of any one of claims 18 to 22, wherein the at least one topographical feature comprises a plurality of topographical features provided sequentially on the polymer layer.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB2008260.8A GB2595670B8 (en) | 2020-06-02 | 2020-06-02 | Cleaning surface |
| GB2008260.8 | 2020-06-02 | ||
| PCT/US2021/031095 WO2021247192A1 (en) | 2020-06-02 | 2021-05-06 | Cleaning surface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116096511A true CN116096511A (en) | 2023-05-09 |
Family
ID=71526465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202180058440.0A Pending CN116096511A (en) | 2020-06-02 | 2021-05-06 | Cleaning surfaces |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP4157557A1 (en) |
| JP (1) | JP2023528867A (en) |
| KR (1) | KR20230019137A (en) |
| CN (1) | CN116096511A (en) |
| GB (1) | GB2595670B8 (en) |
| WO (1) | WO2021247192A1 (en) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4314444B2 (en) * | 2004-02-05 | 2009-08-19 | Ｊｓｒ株式会社 | Cleaning film, cleaning member, and cleaning method |
| CN101500718B (en) * | 2006-08-11 | 2012-06-27 | 日东电工株式会社 | Cleaning member, delivery member with cleaning function, and method of cleaning substrate processing apparatus |
| JP5429844B2 (en) * | 2007-10-04 | 2014-02-26 | Ｍｉｐｏｘ株式会社 | Cleaning tape and manufacturing method thereof |
| GB0817657D0 (en) * | 2008-09-26 | 2008-11-05 | Th Group Ltd | Surface cleaning |
| GB2492991A (en) * | 2011-07-19 | 2013-01-23 | Itw Cs Uk Ltd | Contact cleaning assembly |
| GB2523785B (en) * | 2014-03-05 | 2017-02-22 | Itw Ltd | Adhesive roll |
| GB2572649A (en) * | 2018-04-06 | 2019-10-09 | Illinois Tool Works | Improved adhesive roll |
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2020
- 2020-06-02 GB GB2008260.8A patent/GB2595670B8/en active Active
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2021
- 2021-05-06 JP JP2022574310A patent/JP2023528867A/en active Pending
- 2021-05-06 KR KR1020227045736A patent/KR20230019137A/en active Search and Examination
- 2021-05-06 CN CN202180058440.0A patent/CN116096511A/en active Pending
- 2021-05-06 WO PCT/US2021/031095 patent/WO2021247192A1/en unknown
- 2021-05-06 EP EP21728390.2A patent/EP4157557A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB2595670A8 (en) | 2023-01-25 |
| GB2595670A (en) | 2021-12-08 |
| GB2595670B8 (en) | 2023-01-25 |
| WO2021247192A1 (en) | 2021-12-09 |
| GB2595670B (en) | 2023-01-11 |
| GB202008260D0 (en) | 2020-07-15 |
| JP2023528867A (en) | 2023-07-06 |
| EP4157557A1 (en) | 2023-04-05 |
| KR20230019137A (en) | 2023-02-07 |
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