JP2023528867A - cleaning surface - Google Patents

Abstract

The present disclosure relates to a cleaning surface 100 of a contact cleaning device. The cleaning surface is releasably attachable to a contact cleaning device and comprises a substrate 110 supporting a first polymer layer 130 having a surface 132 . A first topographic feature 140 or layer is applied and/or formed in at least a portion of the first polymer layer, and the first polymer layer is radiation cured. The invention also relates to a method of forming a contact cleaning surface.

Description

[Related Application]
This application claims the benefit of UK Patent Application No. 2008260.8, filed 2 June 2020 entitled "Cleaning Surface". The entirety of UK Patent Application No. 2008260.8 is expressly incorporated herein by reference.

[Field of Disclosure]
The present invention relates to a contact cleaning surface of a contact cleaning device, and more particularly, but not exclusively, to a contact cleaning surface having topographical features and comprising a substrate that is detachably attachable to the device. The invention also relates to a method of forming a contact cleaning surface.

[background]
Contact cleaning is used to clean substrate surfaces or workpieces. After cleaning, the workpiece can be used in a variety of sophisticated processes, such as in the manufacture of electronics, photovoltaics, and flat panel displays. A contact cleaning roller, typically made of rubber or elastomer, is used to remove contaminant particles from the substrate surface, after which a bonding roll can be used to remove contaminant particles or debris from the cleaning roller. This ensures that the cleaning roller remains debris-free and allows maximizing the efficiency with which the cleaning roller removes contaminant particles from the substrate surface or workpiece.

A cleaning roller typically comprises a shaft or core having an elastomeric coating applied to its outer surface. The elastomer is then cured on the core so that its outer surface forms the cleaning surface. Optionally, the cleaning surface can be micro-roughened to increase or maximize the surface area of contact between the cleaning surface and small particles that cause contamination.

Alternatively, known cleaning rollers are formed by attaching a polymer-coated flexible substrate cut from flexible sheet stock to a roller core. A polymer-coated flexible substrate is attached to the core using an adhesive or laser welding.

One of the drawbacks of the prior art is that applying the elastomeric coating directly to the roller core makes the coating difficult to remove at the end of its useful life. It is also difficult to apply micro-roughening to the outer surface of the elastomeric coating formed around the core.

Systems that use flexible substrates cut from flexible sheet stock do not provide the ability to customize or adapt the substrate to the device to which it is attached because it is formed as a continuous length of sheet. . Also, if adhesive is used to attach the substrate to the roller core, the adhesive is also difficult to remove at the end of its useful life.

SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide a contact cleaning surface that can be readily adapted to the intended contact cleaning application. A further object of the present invention is to provide a method of forming a contact cleaning surface for maximum flexibility in terms of form and function. Certain embodiments provide the advantage that the surface can be adapted or customized such that portions of the contact cleaning surface can be optimized or modified in various ways. In this way, the contact cleaning surface may be adapted or adapted to aspects of the substrate surface, workpiece(s) to be cleaned by the contact cleaning apparatus, such as the shape, orientation or surface characteristics of the substrate surface, workpiece(s). Adapted.

[overview]
According to the present invention there is provided a cleaning surface of a contact cleaning device according to the appended claims.

According to the present invention there is provided a contact cleaning roller according to the appended claims.

According to the present invention there is provided a contact cleaning system according to the appended claims.

According to the present invention there is provided a method of forming a cleaning surface of a contact cleaning device according to the appended claims.

According to a first aspect of the invention, a cleaning surface of a contact cleaning device comprising:
a substrate releasably attachable to a contact cleaning device and supporting a first polymer layer having a surface;
a first topographic feature or layer is applied and/or formed on at least a portion of the first polymer layer;
The first polymer layer is radiation cured to provide a cleaning surface.

In certain embodiments, a second topographical feature or layer is applied and/or formed in at least one further portion of the polymer layer. In this way, the debris collection efficiency of the surface is determined for various ranges within the first topographic feature, within the second topographic feature, and outside both the first and second topographic features. applied.

In certain embodiments, the second topographical features are different in dimension than the first topographical features. In certain embodiments, the first topographical features include regular or irregular patterns. In this way, when the cleaning surface is used to collect debris in a contact cleaning system, the portion of the roller that contacts the substrate surface or workpiece being cleaned has an adapted area along its length. have. The adapted area in contact with the substrate surface or workpiece to be cleaned can change as the cleaning roller rotates. As such, these areas are adapted to accommodate various aspects of the substrate surface or workpiece being cleaned.

In certain embodiments, the substrate provides dimensional stability to the cleaning surface. In certain embodiments, the substrate comprises plastic film or metal foil. In certain embodiments, the substrate includes mesh. The substrate and the polymer layer supported thereon are flexible so that the cleaning surface can be attached to a roller. Due to its properties, such as composition and/or thickness, the substrate can provide dimensional stability to the cleaning surface while not interfering with the mounting of the cleaning surface about the core of the cleaning roller. In this way, the substrate provides the cleaning surface with improved compatibility with the cleaning roller without affecting the repelling properties of the cleaning surface.

In certain embodiments, the first polymer layer comprises an antistatic agent. In certain embodiments, the first polymer layer is static dissipative. In this way, the cleaning surface can be adapted to mitigate the effects of electrostatic charges on the cleaning roller or within the contact cleaning system, thereby preventing damage to the workpiece or substrate surface being cleaned.

In certain embodiments, the first polymer layer comprises an elastomer.

In certain embodiments, the cleaning surface can be formed into a cylinder or cylindrical cover. In certain embodiments the cleaning surface is provided as a belt or sheet. In this way, the cleaning surface is not only adaptable to different cleaning rollers, but also adaptable to different contact cleaning systems.

In certain embodiments, a second polymer layer is provided intermediate the substrate and the first polymer layer. In certain embodiments, the second polymer layer comprises a different polymer than the first polymer layer. In this way, the second polymer layer can improve compatibility between the substrate and the first polymer layer. The second polymer layer can provide additional properties to the cleaning surface, such as antistatic properties or static dissipative properties.

According to a second aspect of the invention, a contact cleaning roller comprising a core and a contact cleaning surface separably attached to at least a portion of the core, the contact cleaning surface comprising a first surface having a comprising a substrate supporting the polymer layer;
a first topographic feature or layer is applied and/or formed on at least a portion of the first polymer layer;
A contact cleaning roller is provided wherein the first polymer layer is cured.

According to a third aspect of the invention, a contact cleaning apparatus having a contact cleaning roller comprising a core and a contact cleaning surface detachably attached to at least a portion of the core, the contact cleaning surface comprising: a substrate supporting a first polymer layer having a surface;
a first topographic feature or layer is applied and/or formed on at least a portion of the first polymer layer;
A contact cleaning device is provided wherein the first polymer layer is cured.

In certain embodiments, the contact cleaning roller is adapted to operably moveably engage a work surface such that the contact cleaning surface collects debris from the work surface. In this way, when the cleaning surface is used to collect debris in a contact cleaning system, the portion of the roller that contacts the workpiece has one or more areas adapted along its length. The adapted area or areas in contact with the workpiece can change as the cleaning roller rotates. As such, these areas are adapted to accommodate various aspects of the workpiece being cleaned.

According to a fourth aspect of the invention, a method of forming a cleaning surface of a contact cleaning device, comprising:
providing a substrate detachably attachable to the contact cleaning device;
applying a polymer layer to the substrate to form a cleaning surface;
providing at least a first topographic feature or layer on at least one portion of the polymer layer;
A method is provided, comprising:

In certain embodiments, the method further comprises curing the polymer layer with radiation, wherein providing the at least first topographical features is performed before, during, or after the curing. done.

In certain embodiments, the method further comprises mounting the substrate in a contact cleaning apparatus after curing the polymer layer.

In certain embodiments, the at least one topographic feature is provided by masking, printing, or embossing the polymer layer. Thus, topographical features are applied and/or formed at the surface of the polymer layer by known means.

In certain embodiments, the masking comprises negative photoresist or positive photoresist.

In certain embodiments, the at least one topographical feature comprises a plurality of topographical features continuously provided on the polymer layer. In this way, the cleaning surface can be adapted or adapted in stages, maximizing flexibility in the manufacturing process and adapting the cleaning surface very specifically to the workpiece or specific aspects of a particular cleaning application. It becomes possible to let

In certain embodiments of all aspects of the invention, the curing radiation is ultraviolet radiation.

In certain embodiments of all aspects of the invention, the curing radiation is microwave radiation.

[Brief description of the drawing]
Embodiments of the invention will now be described, by way of example only, with reference to the accompanying drawings.

1 a) a sectional view and b) a top view of a first exemplary embodiment of a cleaning surface according to a first aspect of the present invention; FIG.

Figures 2a and 2b are a) a cross-sectional view and b) a top view of a second exemplary embodiment of a cleaning surface according to the first aspect of the present invention;

Figure 3 is a perspective view of the cleaning surface of Figure 2 attached to a contact cleaning roller;

Fig. 3 illustrates a first method according to a further aspect of the invention;

Fig. 3 illustrates a second method according to a further aspect of the invention;

FIG. 10 is a perspective view of a third exemplary embodiment of a cleaning surface attached to a contact cleaning roller;

In the drawings, like reference numerals indicate like parts.

[Detailed description]
The use of certain terminology in the following description is for convenience only and is not limiting. The words "upper" and "lower" designate orientations in the drawings to which reference is made, relative to the components being described when assembled, and the specific meaning will be readily apparent from the context of the description. .

Further, as used herein, the terms "connected," "fixed," "coupled," and "attached" refer to two members directly It is intended to include direct connections as well as indirect connections in which one or more other members are interposed between members. This term includes the words specifically mentioned above, derivatives thereof, and words of similar import.

Further, unless otherwise specified, the use of ordinal adjectives such as “first,” “second,” “third,” etc. is referring to different instances of the same object. and is not intended to imply an obligation that the objects so described are in any given order, ranking, or any other manner in time or space.

Referring now to Figure 1, there is shown a cleaning surface 100 according to a first aspect of the invention. Cleaning surface 100 comprises substrate 110 supporting polymer layer 130 having surface 132 . A portion of surface 132 of polymer layer 130 is provided with first topographic features 140, and polymer layer 130 is radiation cured to fix the topographic features. In this way, the portion can be adapted such that the cleaning surface 100 is adapted for a particular cleaning task.

Substrate 110 is formed from a plastic film and provides upper and lower surfaces that extend substantially parallel to each other. The substrate 110 is rectangular and has a pair of parallel long sides 112 , 114 that are arranged perpendicular to a pair of parallel short sides 116 , 118 .

Polymer layer 130 extends over substantially the entire top surface of the substrate. Polymer layer 130 is provided as a coating on substrate 110 and is applied to substantially cover the top surface of the substrate. Polymer layer 130 provides surface 132 to cleaning surface 100 when applied. Polymer layer 130 can be any polymer suitable for contact cleaning debris from a workpiece, such as an elastomer. Non-limiting exemplary materials for the polymer layer include silicone rubbers, polyurethanes and polyethers.

A first topographical feature 140 is provided on the surface 132 of the polymer layer. A first topographic feature 140 extends with a uniform width between the long sides 112,114 in a direction parallel to the short sides 116,118. In this manner, first topographic feature 140 forms a region that extends across surface 132 .

First topographic features 140 are provided as a series of recesses 142 formed on surface 132 . Each of the recesses 142 are substantially identical to each other and collectively arranged to provide a regular pattern. In other words, first topographic features 140 form a consistent textured surface. The series of recesses 142 substantially increase the surface area of surface 132 in the region of first topographic features 140 , thereby accommodating debris collection efficiency in the region of first topographic features 140 .

FIG. 2 shows a cleaning surface 200 of a second embodiment. Where the features are the same as the previous embodiment, the reference numbers are the same except the first digit is "2". The embodiment shown in FIG. 2 is similar to the embodiment shown in FIG. 1, wherein the cleaning surface 200 comprises a substrate 210 upon which a polymer layer 230 is supported, and on a surface 232 of the polymer layer 230 is a first of topographical features 240 are provided. A second topographical feature 250 is also provided on surface 232 of polymer layer 230 .

The second topographic feature 250 extends with a uniform width between the long sides 212, 214 in a direction parallel to the short sides 216, 218 and parallel to the first topographic feature 240. do. In this manner, second topographic feature 250 forms an area that extends across surface 232 . The width of second topographic feature 250 across surface 232 is less than the width of first topographic feature 240 .

First topographic features 240 are provided as a series of first recesses 242 on surface 232 . Similar to the example depicted in FIG. 1, the series of first recesses 242 increase the surface area of the surface 232 in the region of the first topographic features 240 to accommodate debris collection efficiency in that region.

Second topographic features 250 are provided as a series of second recesses 252 on surface 232 . The second recess 252 has a different contour shape and opening shape than the first recess 242 . The series of second recesses 252 increase the surface area of the surface 232 in the area of the second topographical features 250 by a different extent than in the area of the first topographical features 240 . Thereby, the debris collection efficiency of surface 232 is reduced within first topographic feature 240 , within second topographic feature 250 , and outside both first topographic feature 240 and second topographic feature 250 . Adapted for different ranges.

FIG. 3 shows the cleaning surface 200 described above with first topographical features 240 and second topographical features 250 provided on surface 232 of polymer layer 230 . The entire cleaning surface 200 is attached to a cleaning roller 300 . Cleaning roller 300 comprises a core 360 provided with an axial length and a cylindrical outer surface. The cleaning surface 200 is attached to the core 360 such that the cleaning surface wraps around and covers the cylindrical outer surface.

When forming the cleaning surface 200 , the length of the long sides 212 , 214 of the cleaning surface 200 is chosen to correspond to the axial length of the core 360 . Also, the length of the short sides 216 , 218 of the cleaning surface 200 is selected to correspond to the outer circumference of the core 360 . In this manner, when cleaning surface 200 is attached to cleaning roller 300 , cleaning surface 200 forms a single layer or sleeve around core 360 .

Cleaning surface 200 is attached to cleaning roller 300 such that first topographic feature 240 and second topographic feature 250 provide a perimeter band around the cleaning roller. In this way, when the cleaning roller is installed in a contact cleaning device and used to collect debris, the portion of the cleaning roller 300 that contacts the workpiece has an adapted area along its contact area. Thus, as the workpiece moves in machine direction within the contact cleaning apparatus, the cleaning roller 300 rotates to consistently apply adapted cleaning across the width of the workpiece.

Referring now to FIG. 6, an alternate embodiment of cleaning roller 600 is shown. Where the features are the same as the previous embodiment, the reference numbers are the same except the first digit is "6". As such, the cleaning surface is attached to cleaning roller 600 with surface 632 facing outward, with substrate 610 of the cleaning surface wrapped around cleaning roller core 660 .

Surface 632 is provided with one topographical feature 640 throughout outer surface 632 . One topographic feature 640 extends continuously across the outer surface 632 of the cleaning surface. As such, one topographical feature 640 is configured to provide a consistent textured surface to roller 600 .

Referring now to FIG. 4, a method 400 of forming a cleaning surface is shown in accordance with a fourth aspect of the present invention. The method 400 begins by providing 410 a substrate, such as the substrates 110, 210 described with reference to FIGS. 1-3. Next, a polymer layer is applied to the substrate to form a cleaning substrate (420). Next, at least a first topographic feature or layer is provided (430) on at least a portion of the polymer layer.

FIG. 5 shows an alternative method 500 of forming a cleaning surface according to the fourth aspect of the invention. Where the features are the same as the method of FIG. 4, the reference numbers are the same except the first digit is "5" instead of "4". The embodiment shown in FIG. 5 is similar to the embodiment shown in FIG. 4 in that a substrate is provided (520), a polymer layer is applied (520) thereon, and a first topographic feature or layer is formed on the polymer layer. Provided (530) on the first portion. The method includes a further step 535 of providing a second topographic feature or layer on the second portion of the polymer layer. As such, the cleaning surface is provided with a series of topographical features. The polymer layer is then cured by radiation.

Those skilled in the art will recognize that the above-described embodiments have been described by way of example only and not in a limiting sense, and that they depart from the scope of the invention as defined by the appended claims. It will be appreciated that various changes and modifications are possible. Various modifications are possible to the detailed examples given above, for example variations in the number, shape, size, arrangement, assembly, etc. of the contact cleaning surfaces, contact cleaning rollers or adhesive rolls. In particular, the cross-sectional shape of each topographic feature can have any suitable footprint, shape, or size.

In certain embodiments, the topographic features include a series of uniform depressions arranged in a regular pattern. However, any regular or irregular pattern can be provided. The pattern may include recesses, openings or protrusions or roughened zones, or any suitable combination thereof.

In certain examples, the first topographic feature, or the first topographic feature and any additional topographic features, are disposed on the cleaning surface in any suitable orientation. In this way, when the cleaning surface is attached to the roller core, the topographical features can be provided in a number of configurations, such as to form bands, spirals, or regular or irregularly shaped patches. A topographic feature form can be a single uninterrupted shape, or it can consist of a discontinuous pattern of smaller forms.

In one particular embodiment, the substrate is a plastic film. Alternatively, the substrate can be a mesh, such as a woven or non-woven fabric, or a shaped grid or lattice. The film or mesh can be formed from polymers such as polyethylene or nylon. Alternatively, the substrate can be a metal foil such as aluminum, steel or copper.

In certain embodiments, the antistatic agent can include conductive fibers dispersed within the polymer layer, such as nanowires made of silver, or carbon nanotubes. Static dissipative agents can be, for example, cyclic siloxanes or metal salts.

In certain embodiments, the polymer layer is provided as a relatively thin film, eg, with an average thickness ranging from about 1 mm to about 6 mm. A substrate can be provided with a thickness ranging from about 25 microns to about 3 mm.

In certain embodiments, a polymer layer can include contiguous sections of different polymers. Optionally, different topographical features can be applied to each polymer of the polymer layer, resulting in topographical features adapted by both the physical morphology of the surface and the polymeric material forming the topographical features. offer.

In certain exemplary methods, radiation curing of the polymer layer can be performed after forming all topographical features as a single step. Alternatively, each topographic feature may be formed and then cured locally in sequence. Alternatively, one or more topographical features may be formed and cured simultaneously.

In certain exemplary methods, radiation curing can use UV or microwave radiation. Alternatively, other radiation curing such as infrared light or visible light can be used.

The polymer layer can be radiation cured before the cleaning surface is attached to the cleaning roller, or the polymer layer can be radiation cured after attachment.

Claims (23)

A cleaning surface of a contact cleaning device, comprising:
a substrate detachably attachable to the contact cleaning device, the substrate supporting a first polymer layer having a surface;
a first topographic feature or layer is applied and/or formed on at least a portion of said first polymer layer;
wherein the first polymer layer is radiation cured;
cleaning surface. 2. The cleaning surface of claim 1, wherein a second topographical feature or layer is applied and/or formed in at least one further portion of said polymer layer. 3. The cleaning surface of claim 2, wherein the second topographical feature has a different dimension than the first topographical feature. A cleaning surface according to any preceding claim, wherein the first topographical features comprise a regular or irregular pattern. A cleaning surface according to any preceding claim, wherein the substrate provides dimensional stability to the cleaning surface. A cleaning surface according to any preceding claim, wherein the substrate comprises a plastic film or a metal foil. A cleaning surface according to any preceding claim, wherein the substrate comprises a mesh. A cleaning surface according to any preceding claim, wherein the first polymer layer comprises an antistatic agent. A cleaning surface according to any preceding claim, wherein the first polymer layer is static dissipative. A cleaning surface according to any preceding claim, wherein the first polymer layer comprises an elastomer. A cleaning surface according to any preceding claim, wherein the cleaning surface is formable into a cylinder or a cylindrical cover. A cleaning surface according to any preceding claim, wherein a second polymer layer is provided intermediate the substrate and the first polymer layer. 13. The cleaning surface of claim 12, wherein said second polymer layer comprises a different polymer than said first polymer layer. A cleaning surface according to any preceding claim, wherein the cleaning surface is provided as a belt or sheet. A contact cleaning roller comprising a core, on at least a part of said core, a contact cleaning surface according to any one of claims 1 to 14 being detachably attached. A contact cleaning device comprising the contact cleaning roller of claim 15 . 17. The contact cleaning apparatus of claim 16, wherein the contact cleaning roller is adapted to operably moveably engage the work surface such that the contact cleaning surface collects debris from the work surface. . A method of forming a cleaning surface of a contact cleaning device, comprising:
providing a substrate detachably attachable to the contact cleaning device;
applying a polymer layer to the substrate to form a cleaning surface;
providing at least a first topographic feature or layer on at least one portion of the polymer layer;
A method, including 19. The method of claim 18, further comprising curing the polymer layer with radiation, wherein providing the at least first topographical features occurs before, during, or after the curing. 20. The method of claim 19, further comprising attaching the substrate to the contact cleaning device after curing the polymer layer. 19. The method of Claim 18, wherein the at least one topographical feature is provided by masking, printing, or embossing the polymer layer. 22. The method of claim 21, wherein the masking comprises negative photoresist or positive photoresist. 23. The method of any one of claims 18-22, wherein the at least one topographical feature comprises a plurality of topographical features provided continuously on the polymer layer.

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