CN116047637A - Ultra-wide angle penetrating near infrared AR film - Google Patents
Ultra-wide angle penetrating near infrared AR film Download PDFInfo
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- CN116047637A CN116047637A CN202210932334.7A CN202210932334A CN116047637A CN 116047637 A CN116047637 A CN 116047637A CN 202210932334 A CN202210932334 A CN 202210932334A CN 116047637 A CN116047637 A CN 116047637A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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Abstract
The invention discloses an ultra-wide angle penetrating near infrared (AR) film, which comprises a substrate and an AR film plated on the substrate, wherein the AR film comprises a first high refractive index film, a first low refractive index film, a second high refractive index film, a second low refractive index film, a third high refractive index film, a third low refractive index film, a fourth high refractive index film, a fifth high refractive index film, a fourth low refractive index film, a sixth high refractive index film, a seventh high refractive index film, a fifth low refractive index film, an eighth high refractive index film, a ninth high refractive index film and a sixth low refractive index film from inside to outside. The invention has the advantages of simple structure and small film stress, and is very suitable for industrialized mass production.
Description
Technical Field
The invention belongs to the technical field of optical coating, and particularly relates to an ultra-wide angle penetrating near infrared AR film.
Background
With the development of infrared technology, infrared LEDs, infrared lasers and the like with wavelengths of 850nm, 905nm, 940nm, 1064nm, 1550nm and the like are increasingly widely applied to the aspects of biological identification and automatic ranging.
For optical glass or optical plastic with refractive index of 1.5 to 1.9, the reflection loss of each surface is about 4.0% to 9.6%, the loss of light energy is generated in the optical system, and stray light is generated by multiple reflections on each surface inside the optical system, in order to reduce or eliminate the reflected light of the optical surface, thereby increasing the light transmission quantity of the optical element, reducing or eliminating the stray light of the system, an antireflection film, also called an AR film, needs to be processed on the optical surface. The antireflection film is widely applied to the fields of digital, monitoring, astronomy, vehicle-mounted and machine vision.
For the biological recognition and automatic ranging infrared optical system, good light transmission quantity and low stray light are always required to be kept under the incidence condition of 0 DEG and large angle, and unfortunately, due to the physical characteristics of the optical film, the equivalent refractive index and film thickness of the film layer are seriously changed for the light rays incident at different angles, the offset phenomenon can occur on a film coating curve, and the conventional optical film is difficult to consider the reduction of the reflectivity when the incidence is carried out at 0 DEG and large angle.
Disclosure of Invention
The invention aims to overcome the defects, and provides an ultra-wide angle penetrating near infrared AR film which solves the problem that the near infrared light transmittance difference is large in different angle ranges in the prior art.
In order to achieve the above design purpose, the technical scheme adopted by the invention is as follows: an ultra-wide angle penetrating near infrared (AR) film comprises a substrate and an AR film plated on the substrate, wherein the AR film consists of a first high refractive index film, a first low refractive index film, a second high refractive index film, a second low refractive index film, a third high refractive index film, a third low refractive index film, a fourth high refractive index film, a fifth high refractive index film, a fourth low refractive index film, a sixth high refractive index film, a seventh high refractive index film, a fifth low refractive index film, an eighth high refractive index film, a ninth high refractive index film and a sixth low refractive index film from inside to outside.
The first high-refractive-index film is plated on the substrate layer, the film layer is made of one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 50-103nm; the first low refractive index film is plated on the first high refractive index film, the film layer is SIO2 or MGF2, and the thickness is 30-85nm; the second high refractive index film is plated on the first low refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 100-200nm; the second low refractive index film is plated on the second high refractive index film, the film layer is made of SIO2 or MGF2, and the thickness is 80-150nm; the third high refractive index film is plated on the second low refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 65-120nm; the third low refractive index film is plated on the third high refractive index film, the film layer is made of SIO2 or MGF2, and the thickness is 70-140nm; the fourth high refractive index film is plated on the third low refractive index film, and the thickness of one of the film layer materials H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5 is 90-170nm; the fifth high refractive index film is plated on the fourth high refractive index film, and the thickness of one of the film layer materials H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5 is 55-120nm; the fourth low refractive index film is plated on the fifth high refractive index film, the film layer is made of SIO2 or MGF2, and the thickness is 270-540nm; the sixth high refractive index film is plated on the fourth low refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 100-220nm; the seventh high refractive index film is plated on the sixth high refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 70-170nm; the fifth low refractive index film is plated on the seventh high refractive index film, the film layer is SIO2 or MGF2, and the thickness is 20-60nm; the eighth high refractive index film is plated on the fifth low refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 14-30nm; the ninth high refractive index film is plated on the eighth high refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 90-190nm; the sixth low refractive index film is plated on the ninth high refractive index film, the film layer material is any one of SIO2 or MGF2, and the thickness is 180-340nm.
The low refractive index film has a refractive index of 1.35 to 1.6.
The high refractive index film has a refractive index of 1.7 to 2.65.
The substrate is any one of optical plastic or optical glass.
When the substrate is optical glass, the AR film system has a maximum reflectivity of less than 0.2% at an incident angle of 0-30 degrees, a maximum reflectivity of less than 0.6% at an incident angle of 50 degrees and a maximum reflectivity of less than 0.8% at an incident angle of 60 degrees in a near infrared band.
When the base material is optical plastic, the AR film system has a maximum reflectivity of less than 0.2% at an incident angle of 0-30 degrees, a maximum reflectivity of less than 0.8% at an incident angle of 50 degrees and a maximum reflectivity of less than 1.6% at an incident angle of 60 degrees in a near infrared band.
The AR film can achieve incidence at angles of 0-60 degrees in the near infrared spectrum with a maximum reflectance < 1.6%, including but not limited to 905nm, 940nm, 1064nm, 1550nm.
The invention provides an ultra-wide angle penetrating near infrared AR film system, which utilizes the wide angle matching concept of optical admittances of two or more common film materials to realize extremely low reflectivity at incidence of near infrared light wave bands of 905nm, 940nm, 1064nm, 1550nm and the like, wherein the maximum reflectivity is less than 0.2% at an incidence angle of 0-30 DEG, the maximum reflectivity is less than 0.6% at an incidence angle of 50 DEG and the maximum reflectivity is less than 0.8% at an incidence angle of 60 DEG when a base material is optical glass, the AR film system is in the four near infrared wave bands, the maximum reflectivity is less than 0.2% at an incidence angle of 0-30 DEG and the maximum reflectivity is less than 0.8% at an incidence angle of 50 DEG and the maximum reflectivity is less than 1.6% at an incidence angle of 60 DEG when the base material is optical glass, thereby effectively reducing the influence of system stray light and ghosting. The invention has the advantages of simple structure and small film stress, and is very suitable for industrialized mass production.
Drawings
FIG. 1 is a schematic diagram of an AR film system according to an alternative embodiment of the present invention;
FIG. 2 is a graph showing the contrast between the 0-60 reflectance of an AR film system and the 0-60 reflectance of a conventional film system on an optical plastic substrate in accordance with an alternative embodiment of the present invention;
FIG. 3 is a graph showing the contrast between the 0-60 reflectance of an AR film system and the 0-60 reflectance of a conventional film system on an optical glass substrate in accordance with an alternative embodiment of the present invention;
FIG. 4 is a schematic diagram showing the admittance of an AR film system in comparison to a conventional film system according to an alternative embodiment of the present invention;
FIG. 5 is a graph showing the reflectance curves of the near infrared bands of 0-60 DEG at 905nm, 940nm, 1064nm, 1550nm, etc. when the substrate of the present invention is an optical plastic;
FIG. 6 shows a schematic diagram of reflectance curves of the substrate of the present invention in the range of 0℃to 60℃in the infrared light bands of 905nm, 940nm, 1064nm, 1550nm, etc. when the substrate is an optical glass.
Detailed Description
The following detailed description of specific embodiments of the invention refers to the accompanying drawings. As shown in fig. 1-6: an ultra-wide angle penetrating near infrared AR film comprises a substrate and an AR film plated on the substrate, wherein the AR film comprises a first high refractive index film (H1), a first low refractive index film (L1), a second high refractive index film (H2), a second low refractive index film (L2), a third high refractive index film (H3), a third low refractive index film (L3), a fourth high refractive index film (H4), a fifth high refractive index film (H5), a fourth low refractive index film (L4), a sixth high refractive index film (H6), a seventh high refractive index film (H7), a fifth low refractive index film (L5), an eighth high refractive index film (H8), a ninth high refractive index film (H9) and a sixth low refractive index film (L6).
The first high refractive index film (H1) is plated on the substrate layer, the film layer is made of one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, the thickness is 50-103nm, the mechanical property of the material is excellent, the loss absorption is low, and the binding force of the subsequent film layer can be improved; the first low refractive index film (L1) is plated on the first high refractive index film (H1), the film layer is made of SIO2 or MGF2, and the thickness is 30-85nm, so that the adhesive force is increased, and the reflectivity is reduced; the second high refractive index film (H2) is plated on the first low refractive index film (L1), the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 100-200nm for increasing the transmittance; the second low refractive index film (L2) is plated on the second high refractive index film (H2), the film layer is made of SIO2 or MGF2, and the thickness is 80-150nm, so that the adhesive force is increased, and the reflectivity is reduced; the third high refractive index film (H3) is plated on the second low refractive index film (L2), the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 65-120nm, so that the transmittance is increased; the third low refractive index film (L3) is plated on the third high refractive index film (H3), the film layer is made of SIO2 or MGF2, and the thickness is 70-140nm, so that the adhesive force is increased, and the reflectivity is reduced; the fourth high refractive index film (H4) is plated on the third low refractive index film (L3), and one of film materials H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5 is 90-170nm thick and used for increasing the transmittance; the fifth high refractive index film (H5) is plated on the fourth high refractive index film (H4), and one of film materials H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5 is 55-120nm thick and used for increasing the transmittance; the fourth low refractive index film (L4) is plated on the fifth high refractive index film (H5), the film layer is made of SIO2 or MGF2, and the thickness is 270-540nm, so that the adhesive force is increased, and the reflectivity is reduced; the sixth high refractive index film (H6) is plated on the fourth low refractive index film (L4), the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 100-220nm for increasing the transmittance; the seventh high refractive index film (H7) is plated on the sixth high refractive index film (H6), the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 70-170nm, so that the transmittance is increased; the fifth low refractive index film (L5) is plated on the seventh high refractive index film (H7), and the film layer is made of SIO2 or MGF2, and has the thickness of 20-60nm and is used for increasing the adhesive force and reducing the reflectivity; the eighth high refractive index film (H8) is plated on the fifth low refractive index film (L5), and the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 14-30nm for increasing the transmittance; the ninth high refractive index film (H9) is plated on the eighth high refractive index film (H8), the film layer is made of one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 90-190nm for increasing the transmittance; the sixth low refractive index film (L6) is plated on the ninth high refractive index film (H9), the film layer is made of any one of SIO2 and MGF2, and the thickness is 180-340nm, so that the film layer hardness is increased, and the reflectivity is reduced.
The low refractive index film has a refractive index of 1.35 to 1.6.
The high refractive index film has a refractive index of 1.7 to 2.65.
The substrate is any one of optical plastic or optical glass.
When the substrate is optical glass, the AR film system has a maximum reflectivity of less than 0.2% at an incident angle of 0-30 degrees, a maximum reflectivity of less than 0.6% at an incident angle of 50 degrees and a maximum reflectivity of less than 0.8% at an incident angle of 60 degrees in a near infrared band.
When the base material is optical plastic, the AR film system has a maximum reflectivity of less than 0.2% at an incident angle of 0-30 degrees, a maximum reflectivity of less than 0.8% at an incident angle of 50 degrees and a maximum reflectivity of less than 1.6% at an incident angle of 60 degrees in a near infrared band.
The AR film can achieve incidence at angles of 0-60 degrees in the near infrared spectrum with a maximum reflectance < 1.6%, including but not limited to 905nm, 940nm, 1064nm, 1550nm.
Claims (8)
1. An ultra-wide angle penetrating near infrared (AR) film comprises a substrate and an AR film plated on the substrate, wherein the AR film consists of a first high refractive index film, a first low refractive index film, a second high refractive index film, a second low refractive index film, a third high refractive index film, a third low refractive index film, a fourth high refractive index film, a fifth high refractive index film, a fourth low refractive index film, a sixth high refractive index film, a seventh high refractive index film, a fifth low refractive index film, an eighth high refractive index film, a ninth high refractive index film and a sixth low refractive index film from inside to outside.
2. An ultra-wide angle transmission near infrared AR film as defined in claim 1, wherein: the first high-refractive-index film is plated on the substrate layer, the film layer is made of one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 50-103nm; the first low refractive index film is plated on the first high refractive index film, the film layer is SIO2 or MGF2, and the thickness is 30-85nm; the second high refractive index film is plated on the first low refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 100-200nm; the second low refractive index film is plated on the second high refractive index film, the film layer is made of SIO2 or MGF2, and the thickness is 80-150nm; the third high refractive index film is plated on the second low refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 65-120nm; the third low refractive index film is plated on the third high refractive index film, the film layer is made of SIO2 or MGF2, and the thickness is 70-140nm; the fourth high refractive index film is plated on the third low refractive index film, and the thickness of one of the film layer materials H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5 is 90-170nm; the fifth high refractive index film is plated on the fourth high refractive index film, and the thickness of one of the film layer materials H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5 is 55-120nm; the fourth low refractive index film is plated on the fifth high refractive index film, the film layer is made of SIO2 or MGF2, and the thickness is 270-540nm; the sixth high refractive index film is plated on the fourth low refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 100-220nm; the seventh high refractive index film is plated on the sixth high refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 70-170nm; the fifth low refractive index film is plated on the seventh high refractive index film, the film layer is SIO2 or MGF2, and the thickness is 20-60nm; the eighth high refractive index film is plated on the fifth low refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 14-30nm; the ninth high refractive index film is plated on the eighth high refractive index film, the film layer material is one of H4, TIO2, zrO2, hfO2, nb2O3 and Ta2O5, and the thickness is 90-190nm; the sixth low refractive index film is plated on the ninth high refractive index film, the film layer material is any one of SIO2 or MGF2, and the thickness is 180-340nm.
3. An ultra-wide angle transmission near infrared AR film as defined in claim 2, wherein: the low refractive index film has a refractive index of 1.35 to 1.6.
4. An ultra-wide angle transmission near infrared AR film as defined in claim 2, wherein: the high refractive index film has a refractive index of 1.7 to 2.65.
5. An ultra-wide angle transmission near infrared AR film as defined in claim 1, wherein: the substrate is any one of optical plastic or optical glass.
6. An ultra-wide angle transmission near infrared AR film as defined in claim 1, wherein: when the substrate is optical glass, the AR film system has a maximum reflectivity of less than 0.2% at an incident angle of 0-30 degrees, a maximum reflectivity of less than 0.6% at an incident angle of 50 degrees and a maximum reflectivity of less than 0.8% at an incident angle of 60 degrees in a near infrared band.
7. An ultra-wide angle transmission near infrared AR film as defined in claim 2, wherein: when the base material is optical plastic, the AR film system has a maximum reflectivity of less than 0.2% at an incident angle of 0-30 degrees, a maximum reflectivity of less than 0.8% at an incident angle of 50 degrees and a maximum reflectivity of less than 1.6% at an incident angle of 60 degrees in a near infrared band.
8. An ultra-wide angle transmission near infrared AR film as defined in claim 2, wherein: the AR film can achieve incidence at angles of 0-60 degrees in the near infrared spectrum with a maximum reflectance < 1.6%, including but not limited to 905nm, 940nm, 1064nm, 1550nm.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210932334.7A CN116047637A (en) | 2022-08-04 | 2022-08-04 | Ultra-wide angle penetrating near infrared AR film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210932334.7A CN116047637A (en) | 2022-08-04 | 2022-08-04 | Ultra-wide angle penetrating near infrared AR film |
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| Publication Number | Publication Date |
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| CN116047637A true CN116047637A (en) | 2023-05-02 |
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| CN202210932334.7A Pending CN116047637A (en) | 2022-08-04 | 2022-08-04 | Ultra-wide angle penetrating near infrared AR film |
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- 2022-08-04 CN CN202210932334.7A patent/CN116047637A/en active Pending
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Inventor after: Liu Zhonghua Inventor after: Jiao Taotao Inventor after: Chen Jun Inventor after: Zhou Liyuan Inventor after: Gao Yali Inventor before: Liu Zhonghua Inventor before: Jiao Tao Inventor before: Chen Jun Inventor before: Zhou Liyuan Inventor before: Gao Yali |