CN211043711U - Eimei anti-reflection anti-infrared light lens - Google Patents
Eimei anti-reflection anti-infrared light lens Download PDFInfo
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- CN211043711U CN211043711U CN201922278252.1U CN201922278252U CN211043711U CN 211043711 U CN211043711 U CN 211043711U CN 201922278252 U CN201922278252 U CN 201922278252U CN 211043711 U CN211043711 U CN 211043711U
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Abstract
The utility model relates to an angstrom anti-reflection anti infrared light lens, be in including substrate and setting the rete of substrate internal surface, the rete includes from inside to outside in proper order range upon range of first to ninth thin layer, and wherein, first thin layer, fourth thin layer, sixth thin layer and ninth thin layer are low refractive index layer, and second thin layer and seventh thin layer are selenium coating film layer, indium coating film layer or one kind or multiple combination in the nickel coating film layer, and third thin layer, fifth thin layer and eighth thin layer are high refractive index layer. The utility model discloses angstrom anti-reflection anti-infrared light lens wavelength 400-.
Description
Technical Field
The utility model relates to a functional lens, especially an angstrom rice anti-reflection anti infrared light lens.
Background
When light passes through a medium to another medium, phenomena such as reflection, refraction, scattering, and absorption may occur to varying degrees, depending on the characteristics of the medium of interest and the direction of movement of the light in the medium. A functioning medium, such as a lens, can refract most visible light, with only a small fraction being reflected, scattered, and absorbed. With typical glass and plastic lenses, about 92% of the light can be refracted to reach the eye. In order to reduce the reflection to the maximum, the prior art uses an anti-reflection coating covering the inner surface of the lens to reduce the reflection, so as to increase the light reaching the eye, however, the anti-reflection effect is usually not only for visible light, ultraviolet light and infrared light, but also for additional anti-infrared effect, a plurality of thin films are usually deposited on the outer surface of the lens, which is equivalent to simultaneously depositing thin film layers on the inner surface and the outer surface of the same lens, and the process is complex, not easy to operate and high in cost.
For example, chinese patent application CN102998724A discloses a lens comprising an optic portion and a non-optic portion surrounding the optic portion. The optical part is used for allowing light to penetrate to realize optical imaging and has a first surface and a second surface which are opposite. The curvature of the first surface is larger than zero, and an anti-reflection film is deposited on the first surface. The anti-reflection film has a reflectance of less than 2% in a wavelength range of 400nm to 850 nm. And 850nm of the eye drops into an infrared light area, and the eyeball contains more liquid and has strong absorption to infrared rays, so that cataract can be caused when the infrared rays with certain intensity directly irradiate the eye. The generation of cataract is related to the action of short-wave infrared rays; the infrared ray with the wavelength of more than 1.5 microns does not cause cataract, in other words, the light of 800-.
SUMMERY OF THE UTILITY MODEL
The utility model aims at overcoming the problem that current lens is difficult to realize antireflection and anti-infrared effect simultaneously on a surface, provide an angstrom meter antireflection anti-infrared light lens, through selenium, indium, nickel material characteristic and multilayer overlapping structure, the internal surface at the lens is from inside to outside stacked gradually first to ninth thin layer, it is first, four, six, nine thin layer are low refractive index layer, and a second, seven thin layer are selenium coating film layer, indium coating film layer, one kind or multiple combination in the nickel coating film layer, and a third, five, eight thin layer are high refractive index layer.
The specific scheme is as follows:
the utility model provides a halli anti-reflection anti-infrared light lens, halli anti-reflection anti-infrared light lens includes the substrate and sets up the rete on substrate surface, the rete includes from inside to outside in proper order range upon range of first to ninth thin layer, and wherein, first thin layer, fourth thin layer, sixth thin layer and ninth thin layer are low refractive index layer, and second thin layer and seventh thin layer are selenium coating film layer, indium coating film layer or the combination of one kind or more in the nickel coating film layer, and third thin layer, fifth thin layer and eighth thin layer are high refractive index layer.
Further, the film layer covers the inner surface of the substrate.
Further, the substrate is any one of an acrylic substrate, a polycarbonate substrate, a nylon substrate, a CR-39 substrate or a glass substrate.
Further, the high refractive index layer is ZrO2Layer, Ti3O5Layer or Ta2O5Any one of the layers, the low refractive index layer is SiO2Layers, silicon-aluminium mixtures or MgF2Any of the layers.
Furthermore, the second film layer and the seventh film layer are combined layers of a selenium coating layer, an indium coating layer and a nickel coating layer which are sequentially stacked.
Further, the thicknesses of each of the second thin film layer and the seventh thin film layer are respectively as follows: the selenium coating layer is 100-300 angstrom, the indium coating layer is 50-100 angstrom, and the nickel coating layer is 100-300 angstrom.
Further, the thickness of the first thin film layer is 400-800 angstroms, the thickness of the second thin film layer is 200-700 angstroms, the thickness of the third thin film layer is 300-700 angstroms, the thickness of the fourth thin film layer is 500-900 angstroms, the thickness of the fifth thin film layer is 200-500 angstroms, the thickness of the sixth thin film layer is 600-1000 angstroms, the thickness of the seventh thin film layer is 200-700 angstroms, the thickness of the eighth thin film layer is 200-500 angstroms, and the thickness of the ninth thin film layer is 500-900 angstroms.
Further, the thickness of the first thin film layer is 500-700 angstroms, the thickness of the second thin film layer is 400-600 angstroms, the thickness of the third thin film layer is 400-600 angstroms, the thickness of the fourth thin film layer is 600-800 angstroms, the thickness of the fifth thin film layer is 300-400 angstroms, the thickness of the sixth thin film layer is 700-900 angstroms, the thickness of the seventh thin film layer is 400-600 angstroms, the thickness of the eighth thin film layer is 300-400 angstroms, and the thickness of the ninth thin film layer is 600-800 angstroms.
Further, the anti-corrosion coating further comprises a protective layer, wherein the protective layer covers the outer surface of the ninth thin film layer, and the thickness of the protective layer is 50-400 angstroms.
Further, the first thin film layer is made of SiO2Layer, thickness are 650 angstroms meters, the second thin layer with the seventh thin layer all is the combined layer on selenium coating film layer, indium coating film layer and nickel coating film layer, and wherein the thickness of each layer is respectively: the selenium coating layer is 200 angstrom meters, the indium coating layer is 50 angstrom meters, the nickel coating layer is 300 angstrom meters, and the third thin film layer is Ti3O5A film coating layer with a thickness of 530 angstroms and the fourth film layer being SiO2A layer with a thickness of 800 angstrom m, and a fifth thin film layer of Ti3O5Layer with thickness of 330 angstrom, the sixth thin film layer is SiO2A layer of 820 angstrom in thickness, the eighth thin film layer being Ti3O5A layer with a thickness of 350 angstrom m, and a ninth thin film layer of SiO2Layer, thickness 750 angstroms meter, the protective layer is waterproof layer, thickness 280 angstroms meters.
Has the advantages that: the utility model discloses angstrom anti-reflection anti-infrared light lens wavelength 400-.
Drawings
In order to illustrate the technical solution of the present invention more clearly, the accompanying drawings will be briefly described below, and it is to be understood that the drawings in the following description are only related to some embodiments of the present invention, and are not intended to limit the present invention.
Fig. 1 is a schematic view of a lens structure according to an embodiment of the present invention.
Detailed Description
Definitions of some terms used in the present invention are given below, and other unrecited terms have definitions and meanings known in the art:
substrate: the lens is any one of an acrylic substrate, a polycarbonate substrate, a nylon substrate, a CR-39 substrate or a glass substrate, and can be a plane lens or a lens with a certain radian.
Inner surface: the utility model discloses well internal surface means the lens under the user state, for the surface of directly accepting light source light, is located inboard one side.
In the egyptian anti-reflection and anti-infrared light lens provided by the utility model, the thickness of the substrate is 0.1-5mm, preferably 1-5mm, such as 2mm, such as 3mm, such as 4 mm.
The utility model provides an among the angstrom meter antireflection anti-infrared light lens, first thin layer is low refracting index thin layer, and the material is SiO2Silicon-aluminum mixture or MgF2Any one of them. The first thin film layer is used as a priming layer, so that the film adhesion, hardness and plating layer bonding force of subsequent plating films are better, and the thickness is 400-800 angstroms, preferably 500-700 angstroms, more preferably 580-680 angstroms, such as 590 angstroms, such as 620 angstroms, such as 650 angstroms. The silicon-aluminum mixture can be SiO2With Al2O3Mixtures of (A) with (B), e.g. Al2O32-6% of the total weight of the silicon-aluminum mixture, and more preferably Al2O33-3.5% of the total weight of the silicon-aluminum mixture, and the material can be made by self or be a commercial product, such as vacuum coating material L5The national common name "Si-Al mixture", "L5" is its German common name, and the material is available from Merck optical company, Nanyang happy Ruite New optical materials Co., Ltd or Suzhou Prkyo vacuum technology Co., Ltd, and has a common specification of 1-3mm in bulk and white.
The utility model provides an in the angstrom meter anti-reflection anti infrared light lens, the material of second, seven thin layers is selenium, indium, one of them or multiple combination of nickel, and the main function on design this layer reduces the infrared light and sees through lens injury glasses, and when the material was the combination of multiple component, preferred selenium, indium, nickel mixed, and thickness is selenium 100 ability of honour rice 300 ability of honour rice, 50-100 ability of honour rice, 100 ability of honour rice 300 ability of honour rice respectively. In order to ensure the anti-infrared effect, the thickness of the second and seventh thin film layers is 200-700 angstroms, preferably 400-600 angstroms, such as 450 angstroms, such as 500 angstroms, such as 550 angstroms.
The utility model provides an among the angstrom meter anti-reflection anti infrared light lens, third, five, eight thin layers are high refractive index layer, and the material is ZrO2、Ti3O5Or Ta2O5The fourth, sixth and ninth film layers are low-refractive-index layers made of silicon-aluminum mixture or SiO2Or MgF2The light intensity of the lens reflected at the wavelength of 400-700nm is reduced through the high-low refractive index thin film layer stacking design, and the glasses of a wearer are protected.
The utility model provides an in the anti-infrared light lens of angstrom rice antireflection, the third thin layer is high refractive index layer the thickness of third thin layer is 300 and serves 700 angstrom rice, preferably 400 and serves 600 angstrom rice, for example 450 angstrom rice, for example 500 angstrom rice, for example 550 angstrom rice.
The utility model provides an in the anti-infrared light lens of angstrom meter antireflection, fourth thin layer is low refractive index layer, the thickness of fourth thin layer is 500-sand-baked 900 angstrom meters, preferably 600-sand-baked 800 angstrom meters, for example 650 angstrom meters, for example 720 angstrom meters, for example 780 angstrom meters.
The utility model provides an in the anti-infrared light lens of angstrom rice antireflection, fifth thin layer is the high refractive index layer, the thickness of fifth thin layer is 200-plus-500 angstrom rice, preferably 300-plus-400 angstrom rice, for example 320 angstrom rice, for example 350 angstrom rice, for example 380 angstrom rice.
The utility model provides an in the anti-infrared light lens of angstrom rice antireflection, sixth thin layer is low refractive index layer, the thickness of sixth thin layer is 600 and serves 1000 angstrom rice, preferably 700 and serves 900 angstrom rice, 760 angstrom rice for example, 810 angstrom rice for example 860 angstrom rice.
The utility model provides an in the anti-infrared light lens of angstrom rice antireflection, eighth thin layer is the high refractive index layer, the thickness of eighth thin layer is 200-plus-500 angstrom rice, preferably 300-plus-400 angstrom rice, for example 330 angstrom rice, for example 360 angstrom rice, for example 390 angstrom rice.
The utility model provides an in the anti-infrared light lens of angstrom meter antireflection, ninth thin layer is low refractive index layer, the thickness of ninth thin layer is 500 and serves 900 angstrom meters, preferably 600 and serves 800 angstrom meters, for example 660 angstrom meters, for example 700 angstrom meters, for example 750 angstrom meters.
The utility model provides an in the anti-infrared light lens of angstrom rice anti-reflection, can also contain the protective layer, the material is waterproof material, the thickness of protective layer is 50-400 angstrom meters, preferably 100 and 300 angstrom meters, for example 130 angstrom meters, for example 160 angstrom meters, for example 200 angstrom meters.
Preferred embodiments of the present invention will be described in more detail below. While the following describes preferred embodiments of the present invention, it should be understood that the present invention may be embodied in various forms and should not be construed as limited to the embodiments set forth herein. The examples do not specify particular techniques or conditions, and are performed according to the techniques or conditions described in the literature in the art or according to the product specifications. The reagents or instruments used are not indicated by the manufacturer, and are all conventional products commercially available. In the following examples, "%" means weight percent, unless otherwise specified.
The test methods used below included:
and (3) reflectivity testing: testing the transmittance at 400 and 1100nm by using a spectrophotometer U-2900H;
the 400-780nm reflectance was tested using a spectrophotometer U-3900H.
Example 1
An Ammi anti-reflection anti-infrared lens, refer to FIG. 1, comprises a substrate 0 and a film layer, wherein the film layer is located on the inner surface of the substrate. The film starts to extend outwards from one side close to the substrate 0, and comprises a first film layer to a tenth film layer which are stacked in sequence, wherein the first film layer 1, the fourth film layer 4, the sixth film layer 6 and the ninth film layer 9 are low-refractive-index layers, the second film layer 2 and the seventh film layer 7 are selenium coating layers, indium coating layers or nickel coating layers or a plurality of combinations, the third film layer 3, the fifth film layer 5 and the eighth film layer 8 are high-refractive-index layers, and the tenth film layer 10 is a waterproof protective layer.
Specifically, the first thin film layer 1 is SiO2And the thickness is 650 angstrom, and second thin layer 2 and seventh thin layer 7 are all the combined layer on selenium coating film layer, indium coating film layer and nickel coating film layer, and wherein the thickness of each layer is respectively: 200 angstrom of selenium coating layer, 50 angstrom of indium coating layer, 300 angstrom of nickel coating layer, and the third film layer 3 is Ti3O5A film coating layer with the thickness of 530 angstrom meters and a fourth film layer 4 of SiO2800 angstrom thick, and Ti as the fifth film layer 53O5The thickness of the sixth film layer 6 is 330 angstrom, and the sixth film layer is SiO2820 angstrom thick, the eighth thin film layer 8 is Ti3O5350 angstrom thick, the ninth film layer 9 is SiO2750 angstroms thick, and the tenth film layer 10 is a waterproof protective layer, 280 angstroms thick.
The lenses were tested and their reflectance and transmittance were shown in table 1 and table 2, respectively.
TABLE 1 test result table for reflectivity of lens (R is reflectivity)
| nm | ％R | nm | ％R | nm | ％R | nm | ％R | nm | ％R | nm | ％R |
| 780 | 1.7 | 715 | 0.4 | 650 | 1 | 585 | 0.8 | 520 | 0.4 | 455 | 0.5 |
| 775 | 1.3 | 710 | 0.4 | 645 | 1 | 580 | 0.7 | 515 | 0.4 | 450 | 0.6 |
| 770 | 1 | 705 | 0.4 | 640 | 1 | 575 | 0.7 | 510 | 0.3 | 445 | 1 |
| 765 | 0.9 | 700 | 0.6 | 635 | 1 | 570 | 0.6 | 505 | 0.3 | 440 | 1.3 |
| 760 | 0.8 | 695 | 0.6 | 630 | 1 | 565 | 0.6 | 500 | 0.3 | 435 | 1.7 |
| 755 | 0.6 | 690 | 0.6 | 625 | 1 | 560 | 0.6 | 495 | 0.3 | 430 | 2.7 |
| 750 | 0.6 | 685 | 0.7 | 620 | 1 | 555 | 0.5 | 490 | 0.3 | 425 | 3 |
| 745 | 0.5 | 680 | 0.7 | 615 | 1 | 550 | 0.5 | 485 | 0.3 | 420 | 4.3 |
| 740 | 0.4 | 675 | 0.8 | 610 | 1 | 545 | 0.4 | 480 | 0.2 | 415 | 5.1 |
| 735 | 0.4 | 670 | 0.8 | 605 | 1 | 540 | 0.4 | 475 | 0.2 | 410 | 6.2 |
| 730 | 0.4 | 665 | 0.9 | 600 | 0.9 | 535 | 0.4 | 470 | 0.2 | 405 | 7.5 |
| 725 | 0.4 | 660 | 1 | 595 | 0.9 | 530 | 0.4 | 465 | 0.3 | 400 | 8.9 |
| 720 | 0.4 | 655 | 1 | 590 | 0.9 | 525 | 0.4 | 460 | 0.3 |
TABLE 2 lens transmittance test results Table (T represents transmittance)
Can obtain from table 1 and table 2, the micron anti-reflection anti-infrared light lens wavelength 400 supplyes one's materials 700nm average reflectivity is less than 1.5%, and wavelength 750 supplyes one's materials 1100nm average transmittance is less than 29%, effectual reduction reflected light intensity, reduce the injury of infrared light to eyes, protection person's of wearing eyes.
Example 2
An Eimeria anti-reflection anti-infrared lens comprises a substrate and a film layer, wherein the film layer is positioned on the inner surface of the substrate. The film layer begins to extend outwards by the one side that is close to the substrate, including the first to tenth thin layer that stacks gradually, wherein, first thin layer, fourth thin layer, sixth thin layer and ninth thin layer are low refractive index layer, and second thin layer and seventh thin layer are the composite layer of selenium coating film layer, indium coating film layer and nickel coating film layer, and third thin layer, fifth thin layer and eighth thin layer are high refractive index layer, and the tenth thin layer is water proof protective layer.
Specifically, the first thin film layer is SiO2The thickness of the layer is 600 angstrom meters, the second thin film layer is a combined layer of a selenium coating layer, an indium coating layer and a nickel coating layer, the thicknesses of the combined layer are respectively 150 angstrom meters, 60 angstrom meters and 280 angstrom meters, and the third thin film layer is Ti3O5Layer 490 angstrom thick and fourth layer of SiO2A layer with a thickness of 690 angstroms and a fifth thin film layer of Ti3O5Layer of 335 angstrom thickness and the sixth film layer of SiO2The thickness of the layer is 799 angstrom meters, the seventh thin film layer is a combination layer of a selenium coating layer, an indium coating layer and a nickel coating layer, the thicknesses of the layers are respectively 150 angstrom meters, 60 angstrom meters and 280 angstrom meters, and the eighth thin film layer is Ti3O5A layer with a thickness of 350 angstrom m and a ninth thin film layer of SiO2Layer with thickness of 688 angstroms, tenth film layer with thickness of 168 angstroms。
Example 3
An Eimeria anti-reflection anti-infrared lens comprises a substrate and a film layer, wherein the film layer is positioned on the inner surface of the substrate. The film layer begins to extend outwards by the one side that is close to the substrate, including the first to tenth thin layer that stacks gradually, wherein, first thin layer, fourth thin layer, sixth thin layer and ninth thin layer are low refractive index layer, and second thin layer and seventh thin layer are the combined layer on selenium coating film layer, indium coating film layer or nickel coating film layer, and third thin layer, fifth thin layer and eighth thin layer are high refractive index layer, and the tenth thin layer is water proof protective layer.
Specifically, the first thin film layer is SiO2The thickness of the layer is 630 angstrom meters, the second thin film layer is a combined layer of a selenium coating layer, an indium coating layer and a nickel coating layer, the thicknesses of the combined layer are respectively 300 angstrom meters, 70 angstrom meters and 200 angstrom meters, and the third thin film layer is Ta2O5Layer thickness of 510 angstrom and fourth thin film layer of SiO2A layer of 708 angstroms thick and a fifth thin film layer of Ta2O5Layer of 355 Angstrom thickness and a sixth thin film layer of SiO2The layer with the thickness of 808 angstroms, the seventh film layer is a combined layer of a selenium coating layer, an indium coating layer and a nickel coating layer, the thicknesses of the combined layer are respectively 300 angstroms, 70 angstroms and 200 angstroms, and the eighth film layer is Ta2O5A layer with a thickness of 369 angstroms and a ninth thin film layer of SiO2The layer, thickness is 703 angstrom meters, and the tenth thin film layer is waterproof layer, and thickness is 180 angstrom meters.
Example 4
An Eimeria anti-reflection anti-infrared lens comprises a substrate and a film layer, wherein the film layer is positioned on the inner surface of the substrate. The film layer begins to extend outwards by the one side that is close to the substrate, including the first to tenth thin layer that stacks gradually, wherein, first thin layer, fourth thin layer, sixth thin layer and ninth thin layer are low refractive index layer, and second thin layer and seventh thin layer are the selenium coating film layer, and third thin layer, fifth thin layer and eighth thin layer are high refractive index layer, and the tenth thin layer is waterproof layer.
Specifically, the first thin film layer is SiO2Layer of 650 angstrom thickness, second film layerIs a selenium layer with a thickness of 400 angstrom, and a third film layer of Ta2O5Layer of 530 angstroms thick and a fourth layer of SiO2Layer with thickness of 720 angstrom and fifth film layer of Ta2O5A layer with a thickness of 350 angstrom m and a sixth thin film layer of SiO2The thickness of the layer is 850 angstrom meters, the seventh thin film layer is a selenium layer, the thickness is 400 angstrom meters, and the eighth thin film layer is Ta2O5Layer with a thickness of 375 angstrom m and a ninth thin film layer of SiO2The layer, thickness is 730 angstroms meters, and the tenth thin film layer is waterproof layer, and thickness is 160 angstroms meters.
Example 5
An Eimeria anti-reflection anti-infrared lens comprises a substrate and a film layer, wherein the film layer is positioned on the inner surface of the substrate. The rete begins outwards to extend by the one side that is close to the substrate, including the first to tenth thin layer that stacks gradually, wherein, first thin layer, fourth thin layer, sixth thin layer and ninth thin layer are low refractive index layer, and second thin layer and seventh thin layer are the nickel coating film, and third thin layer, fifth thin layer and eighth thin layer are high refractive index layer, and the tenth thin layer is waterproof layer.
Specifically, the first thin film layer is SiO2A layer with a thickness of 635 angstrom, a second thin film layer of nickel with a thickness of 500 angstrom and a third thin film layer of ZrO2Layer thickness of 550 angstrom and fourth film layer of SiO2Layer 780 angstrom meter thick, the fifth film layer is ZrO2 layer, and thickness is 380 angstrom meter, and the sixth film layer is SiO2Layer 860 angstrom thick, the seventh film layer is nickel layer 500 angstrom thick, the eighth film layer is ZrO2Layer with a thickness of 390 angstroms and a ninth thin film layer of SiO2The layer, thickness is 750 angstroms meters, and the tenth thin film layer is waterproof layer, and thickness is 280 angstroms meters.
Example 6
An Eimeria anti-reflection anti-infrared lens comprises a substrate and a film layer, wherein the film layer is positioned on the inner surface of the substrate. The rete begins outwards to extend by the one side that is close to the substrate, including the first to tenth thin layer that stacks gradually, wherein, first thin layer, fourth thin layer, sixth thin layer and ninth thin layer are low refractive index layer, and second thin layer and seventh thin layer are the nickel coating film, and third thin layer, fifth thin layer and eighth thin layer are high refractive index layer, and the tenth thin layer is waterproof layer.
Specifically, the first thin film layer is a silicon-aluminum mixture layer with the thickness of 590 angstrom meters, the second thin film layer is a combination layer of a selenium coating layer, an indium coating layer and a nickel coating layer with the thicknesses of 100 angstrom meters, 50 angstrom meters and 300 angstrom meters respectively, and the third thin film layer is Ti3O5Layer with thickness of 450 angstrom, fourth film layer of Si-Al mixture layer with thickness of 650 angstrom and fifth film layer of Ti3O5The layer, thickness is 320 angstroms meters, and the sixth thin film layer is silicon-aluminium mixture layer, and thickness is 760 angstroms meters, and the seventh thin film layer is the combined layer of selenium coating film layer, indium coating film layer and nickel coating film layer, and thickness is 100 angstroms meters, 50 angstroms meters, 300 angstroms meters respectively, and the eighth thin film layer is Ti3O5Layer, thickness are 330 angstroms meters, and the ninth thin film layer is silicon-aluminum mixture layer, and thickness is 660 angstroms meters, and the tenth thin film layer is waterproof layer, and thickness is 130 angstroms meters.
Example 7
The method for preparing the anti-reflection and anti-infrared light lens comprises the following steps:
(1) cleaning and drying the substrate, wherein the baking temperature is 40-65 ℃ and the baking time is 1-2 hours;
(2) sequentially carrying out vacuum coating on the inner surface of the substrate;
A. placing the dried substrate on a jig, and sending the substrate into a vacuum chamber for vacuumizing;
B. when the vacuum degree of the vacuum chamber reaches less than or equal to 5 x 10-5Starting an ion source during Torr, and cleaning the surface of the substrate;
C. sequentially vacuum-coating the inner surface of the substrate
When the vacuum degree of the vacuum chamber reaches less than or equal to 2.0 x 10-5When the temperature of the vacuum chamber is controlled to be 40-60 ℃ during Torr, an electron gun is adopted to bombard the material of the first thin film layer, the material is evaporated and then deposited on the outer surface of the substrate in a angstrom level molecular form, and simultaneously the evaporation rate of the first thin film layer is controlled to be
The thickness of the first thin film layer after final formation is 400-800 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding the material of the second thin film layer by using an electron gun, depositing the material on the outer surface of the substrate in the form of Hermitian molecules after the material is evaporated, and simultaneously controlling the evaporation rate of the second thin film layer to be
The thickness of the second thin film layer after final formation is 200-700 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding the material of the third film layer by using an electron gun, depositing the third film layer on the outer surface of the substrate in the form of Hermitian molecules after evaporating, and simultaneously controlling the evaporation rate of the third film layer to be
The thickness of the finally formed third thin film layer is 300-700 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding a fourth film layer material by using an electron gun, depositing the fourth film layer material on the outer surface of the substrate in a Hermite molecular form after evaporating, and simultaneously controlling the evaporation rate of the fourth film layer to be
The thickness of the fourth thin film layer after final formation is 500-900 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding a fifth thin film layer material by using an electron gun, depositing the fifth thin film layer on the outer surface of the substrate in a Hermite molecular form after the fifth thin film layer is evaporated, and simultaneously controlling the evaporation rate of the fifth thin film layer to be
The thickness of the fifth thin film layer after final formation is 200-500 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding a sixth thin film layer material by using an electron gun, evaporating the sixth thin film layer material, depositing the sixth thin film layer material on the outer surface of the substrate in the form of angstrom-level molecules, and controlling the evaporation rate of the sixth thin film layer material to be at the same time
The thickness of the sixth thin film layer after the final formation is 600-1000 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding the material of the seventh thin film layer by using an electron gun, depositing the seventh thin film layer on the outer surface of the substrate in the form of Hermitian molecules after evaporating, and simultaneously controlling the evaporation rate of the seventh thin film layer to be
The thickness of the tenth thin film layer after final formation is 200-700 angstroms;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding an eighth thin film layer material by using an electron gun, evaporating the eighth thin film layer material, depositing the eighth thin film layer material on the outer surface of the substrate in the form of Hermitian molecules, and simultaneously controlling the evaporation rate of the eighth thin film layer to be
The thickness of the eighth thin film layer after final formation is 200-500 angstrom;
maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5Keeping the temperature of the vacuum chamber at 40-60 ℃ during Torr, bombarding the material of the ninth thin film layer by using an electron gun, depositing the ninth thin film layer on the outer surface of the substrate in the form of Hermitian molecules after the evaporation, and simultaneously controlling the evaporation rate of the ninth thin film layer to be
The thickness of the ninth thin film layer after final formation is 500-900 angstrom;
(3) after the preparation of the ninth film layer is finished, the inner surface of the substrate is plated with a protective layer: maintaining vacuum chamber vacuum degree less than or equal to 2.0 x 10-5When the temperature of the vacuum chamber is kept at 40-60 ℃ during Torr, a tungsten boat is adopted to heat the film material waterproof material of the tenth thin film layer, the tenth thin film layer is evaporated and then deposited on the outer surface of the substrate in the form of Hermitian-grade molecules, and the evaporation rate of the tenth thin film layer is controlled to be 40-60 DEG C
The thickness of the tenth film layer after final formation is 50-300 angstrom m, forming a protective layer.
The above detailed description describes the preferred embodiments of the present invention, but the present invention is not limited to the details of the above embodiments, and the technical idea of the present invention can be within the scope of the present invention, and can be right to the technical solution of the present invention, and these simple modifications all belong to the protection scope of the present invention.
It should be noted that the various features described in the above embodiments may be combined in any suitable manner without departing from the scope of the invention. In order to avoid unnecessary repetition, the present invention does not separately describe various possible combinations.
In addition, various embodiments of the present invention can be combined arbitrarily, and the disclosed content should be regarded as the present invention as long as it does not violate the idea of the present invention.
Claims (10)
1. An angstrom anti-reflection anti-infrared light lens which characterized in that: the anti-reflection anti-infrared lens comprises a substrate and a film layer arranged on the surface of the substrate, wherein the film layer comprises a first film layer, a second film layer, a fourth film layer, a sixth film layer and a ninth film layer which are sequentially stacked from inside to outside, the second film layer and the seventh film layer are low-refractive-index layers, the second film layer and the seventh film layer are one or more of selenium coating layers, indium coating layers or nickel coating layers, and the third film layer, the fifth film layer and the eighth film layer are high-refractive-index layers.
2. The emm-antireflection anti-ir lens of claim 1, wherein: the film layer covers the inner surface of the substrate.
3. The emm-antireflection anti-ir lens of claim 1, wherein: the substrate is any one of an acrylic substrate, a polycarbonate substrate, a nylon substrate, a CR-39 substrate or a glass substrate.
4. The emm-antireflection anti-ir lens of claim 1, wherein: the high refractive index layer is ZrO2Layer, Ti3O5Layer or Ta2O5Any one of the layers, the low refractive index layer is SiO2Layers, silicon-aluminium mixtures or MgF2Any of the layers.
5. The emm-antireflection anti-ir lens of claim 1, wherein: the second film layer and the seventh film layer are combined layers of a selenium coating layer, an indium coating layer and a nickel coating layer which are sequentially stacked.
6. The Am anti-reflective anti-infrared lens of claim 5, wherein: the thicknesses of each of the second film layer and the seventh film layer are respectively as follows: the selenium coating layer is 100-300 angstrom, the indium coating layer is 50-100 angstrom, and the nickel coating layer is 100-300 angstrom.
7. The Am anti-reflective anti-infrared lens of any one of claims 1-6, wherein: the thickness of the first thin film layer is 400-800 angstroms, the thickness of the second thin film layer is 200-700 angstroms, the thickness of the third thin film layer is 300-700 angstroms, the thickness of the fourth thin film layer is 500-900 angstroms, the thickness of the fifth thin film layer is 200-500 angstroms, the thickness of the sixth thin film layer is 600-1000 angstroms, the thickness of the seventh thin film layer is 200-700 angstroms, the thickness of the eighth thin film layer is 200-500 angstroms, and the thickness of the ninth thin film layer is 500-900 angstroms.
8. The emm-antireflection anti-ir lens of claim 7, wherein: the thickness of the first thin film layer is 500-700 angstroms, the thickness of the second thin film layer is 400-600 angstroms, the thickness of the third thin film layer is 400-600 angstroms, the thickness of the fourth thin film layer is 600-800 angstroms, the thickness of the fifth thin film layer is 300-400 angstroms, the thickness of the sixth thin film layer is 700-900 angstroms, the thickness of the seventh thin film layer is 400-600 angstroms, the thickness of the eighth thin film layer is 300-400 angstroms, and the thickness of the ninth thin film layer is 600-800 angstroms.
9. The Am anti-reflective anti-infrared lens of any one of claims 1-6, wherein: the protective layer covers the outer surface of the ninth film layer, and the thickness of the protective layer is 50-400 angstroms.
10. The emm-antireflection anti-ir lens of claim 9, wherein: the first film layer is SiO2Layer, thickness are 650 angstroms meters, the second thin layer with the seventh thin layer all is the combined layer on selenium coating film layer, indium coating film layer and nickel coating film layer, and wherein the thickness of each layer is respectively: the selenium coating layer is 200 angstrom meters, the indium coating layer is 50 angstrom meters, the nickel coating layer is 300 angstrom meters, and the third thin film layer is Ti3O5A film coating layer with a thickness of 530 angstroms and the fourth film layer being SiO2A layer with a thickness of 800 angstrom m, and a fifth thin film layer of Ti3O5Layer with thickness of 330 angstrom, the sixth thin film layer is SiO2A layer of 820 angstrom in thickness, the eighth thin film layer being Ti3O5A layer with a thickness of 350 angstrom m, and a ninth thin film layer of SiO2Layer, thickness 750 angstroms, said protectionThe layer is a waterproof protective layer with the thickness of 280 angstroms.
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| CN111175993A (en) * | 2019-12-18 | 2020-05-19 | 厦门美澜光电科技有限公司 | Eimei anti-reflection anti-infrared light lens and preparation method thereof |
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| CN111175993A (en) * | 2019-12-18 | 2020-05-19 | 厦门美澜光电科技有限公司 | Eimei anti-reflection anti-infrared light lens and preparation method thereof |
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