CN116011211A - Mask unit, manufacturing method of mask plate and mask plate - Google Patents
Mask unit, manufacturing method of mask plate and mask plate Download PDFInfo
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- CN116011211A CN116011211A CN202211711695.5A CN202211711695A CN116011211A CN 116011211 A CN116011211 A CN 116011211A CN 202211711695 A CN202211711695 A CN 202211711695A CN 116011211 A CN116011211 A CN 116011211A
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Abstract
The invention provides a mask unit, a mask plate manufacturing method and a mask plate, wherein the mask unit manufacturing method comprises the following steps: performing simulation on the stretching process of the mask unit to obtain deformation data of the mask unit; the mask unit comprises standard points and a plurality of line groups distributed along the stretching direction of the expanded mesh stretching, and the deformation data comprises first deformation data of the standard points; determining a row group to be compensated according to the deformation data, compensating the row group to be compensated, wherein the compensating process comprises the following steps: and compensating the row group to be compensated based on the first deformation data, so that the compensated row group is positioned at a preset position of the mask unit after being stretched by the expanded mesh, and the compensated mask unit is obtained. The invention can improve the position accuracy of the film layer evaporated by the mask unit.
Description
Technical Field
The invention relates to the technical field of masks, in particular to a manufacturing method of a mask unit, a manufacturing method of a mask plate and the mask plate.
Background
An organic light emitting diode (Organic Light Emitting Diode, abbreviated as OLED) is a device that emits light by current driving, and usually requires a mask to be used for vapor deposition of a film layer such as a pixel of the OLED, i.e., a film vapor deposition region (e.g., a red sub-pixel vapor deposition region, a green sub-pixel vapor deposition region, a blue sub-pixel vapor deposition region, etc.) of the OLED is defined by an opening of the mask. However, the existing mask plate has the defects of poor evaporation precision and the like, and the position precision of the film layer after evaporation is affected.
Disclosure of Invention
The invention provides a mask unit, a manufacturing method of the mask and the mask, and aims to at least solve the problems of poor evaporation precision of the mask and the like in the prior art.
In one aspect of the present invention, a method for manufacturing a mask unit is provided, including: performing simulation on a net stretching process of a mask unit to obtain deformation data of the mask unit; the mask unit comprises standard points distributed along the stretching direction of the expanded mesh and a plurality of row groups, wherein each row group comprises a plurality of openings distributed along a second direction, and the second direction is perpendicular to the stretching direction; the deformation data comprise first deformation data of the standard point location; determining a row group to be compensated according to the deformation data, and compensating the row group to be compensated, wherein the compensating process comprises the following steps: and compensating the row group to be compensated based on the first deformation data, so that the compensated row group is positioned at a preset position of the mask unit after being stretched by the expanded mesh, and the compensated mask unit is obtained.
In some embodiments, the determining the row group to be compensated according to the deformation data includes: determining deformation of at least part of the row groups according to the deformation data; determining a compensation cut-off line according to the deformation; and in the stretching direction, determining the row group between the edge of the mask unit and the compensation cut-off line as the row group to be compensated, so that the row group to be compensated is conveniently determined, effective compensation is carried out on the row group to be compensated, and meanwhile, the compensation efficiency is improved.
In some embodiments, the standard point is located between the edge of the mask unit and the compensation cut-off line, so that the standard point has a larger deformation, and the compensation accuracy can be improved by compensating the row group to be compensated based on the deformation (i.e. the first deformation data).
In some embodiments, the mask unit includes a plurality of vapor deposition regions distributed along the stretching direction, each of the vapor deposition regions includes a plurality of the row groups, and the standard point is located in the vapor deposition region closest to the edge of the mask unit in the stretching direction, so that compensation accuracy is further improved.
In some embodiments, in the evaporation area where the standard point is located, the difference between the numbers of the row groups located at two opposite sides of the standard point is less than or equal to 1, so that the standard point is located substantially in the middle of the evaporation area, and has a suitable deformation amount, so that compensation accuracy is further improved.
In some embodiments, the standard point is a positioning mark line disposed on the mask unit, or is a row of the row group, which is beneficial to further improving the compensation accuracy of the row group to be compensated based on the first deformation data.
In some embodiments, the deformation of the row group to be compensated is greater than a set threshold, where the set threshold is 0.5-1 μm, so that it is convenient to improve the evaporation precision and the compensation efficiency of the compensated mask unit.
In some embodiments, the compensating the row group to be compensated based on the first deformation data includes: and compensating the row group to be compensated based on the distance from the standard point position to the same datum line in the stretching direction and the first deformation data, so as to further improve the compensation efficiency.
In some embodiments, the compensating the row group to be compensated based on the first deformation data includes: and fitting to generate a first compensation curve based on the distance between the line group to be compensated and the standard point to the same reference line in the stretching direction and the first deformation data, and compensating the line group to be compensated according to the first compensation curve, so that the compensated line group is positioned at a preset position of the mask unit after being stretched by the expanded mesh, and therefore, the first compensation curve has better smoothness, can be better matched with the positions of all openings in the line group, and improves the opening position precision of the compensated mask unit.
In another aspect of the present invention, a method for manufacturing a mask plate is provided, including: manufacturing a mask unit according to the manufacturing method of the mask unit; and stretching the mask unit net, and welding the stretched mask unit net to the frame to obtain the mask plate.
In still another aspect of the present invention, a mask plate is provided, which includes a frame and a mask unit manufactured according to the manufacturing method of the mask unit, where the mask unit is welded to the frame after being stretched by a net.
According to the invention, the deformation condition of the mask unit after stretching is obtained by carrying out simulation on the stretched net in the stretching process of the mask unit, and then the line group to be compensated of the mask unit is compensated according to the deformation condition, specifically, the line group to be compensated is compensated based on the first deformation data, so that the compensated line group is positioned at the preset position of the mask unit after stretching the stretched net, and therefore, when the mask unit is welded on a frame to form a mask after stretching the stretched net, and then the mask is adopted to carry out film evaporation, the higher position precision of an evaporation area is ensured, the position precision of a film evaporated through the mask is ensured, and the phenomena such as OLED color mixing and the like are avoided.
In addition, each row group to be compensated is compensated based on the first deformation data of the standard point location by setting the standard point location, so that the method has a relatively accurate compensation effect, is simpler in process, is convenient to operate, improves the compensation efficiency and is beneficial to practical application.
Drawings
FIG. 1 is a schematic diagram of a mask unit before stretching a screen in accordance with an embodiment of the present invention;
FIG. 2 is a schematic diagram of a mask plate manufactured by stretching a mask unit and welding the stretched mask unit to a frame according to an embodiment of the present invention;
fig. 3 is a schematic diagram showing a first compensation curve generated by fitting and a fitting formula thereof according to an embodiment of the invention.
Reference numerals illustrate:
1: a mask unit;
11: an evaporation zone;
10: an opening;
100: a reference line;
101: a first side;
102: a second side;
110: standard point location;
120: compensating a cut-off line;
130: the middle position of the mask unit;
140. 150, 160: a first deformation curve;
170: a second deformation curve;
L 0 : the distance from the standard point to the datum line in the stretching direction;
L 1 : the distance from the row group to be compensated to the datum line in the stretching direction;
F 1 : the stress direction of the first side of the mask unit when the net is stretched;
F 2 : the second side of the mask unit is stressed in the direction when the net is stretched;
2: and a frame.
Detailed Description
The present invention will be described in further detail below for the purpose of better understanding of the aspects of the present invention by those skilled in the art. The following detailed description is merely illustrative of the principles and features of the present invention, and examples are set forth for the purpose of illustration only and are not intended to limit the scope of the invention. All other embodiments, which can be made by those skilled in the art based on the examples of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the related art, the mask plate has defects of poor evaporation precision and the like, and the position precision of the evaporated film layer is affected.
The inventor has found through long-term research that in the evaporation process of the OLED pixel, a precise Mask (FMM) is mainly adopted to control the position of the organic material deposited on the substrate, so that the evaporation of the pixel is completed, the FMM is composed of a Mask unit (sheet), a Frame, auxiliary materials and other structures, and an opening of the Mask is arranged on the Mask unit. The mask unit is generally welded on the frame, but if the mask unit is welded freely, the mask unit has a certain sagging amount, and is easy to deform in the vapor deposition process, and vapor deposition shadow is enlarged, so that phenomena such as red (R), green (G), blue (B) cross color and the like are caused.
Therefore, it is generally necessary to stretch the mask unit and then weld the mask unit to the frame, i.e., to apply a certain tension to the mask unit to keep it balanced against sagging. However, after the expanded mesh is stretched, the mask unit is deformed by tension, so that the position of an opening of the mask unit is changed, and the position accuracy of the evaporated film layer is affected, for example, the position accuracy (Pixel Position Accuracy, PPA) of the pixel is deviated, and the OLED color mixing and other phenomena are caused.
In view of the foregoing, an embodiment of the present invention provides a method for manufacturing a mask unit, including: performing simulation on the screen stretching process of the mask unit 1 to obtain deformation data of the mask unit 1; as shown in fig. 1 and 2, the mask unit 1 includes a standard dot 110 distributed along a stretching direction (parallel to a first direction in fig. 1 and 2) of the expanded metal and a plurality of line groups, each line group including a plurality of openings 10 distributed along a second direction, the second direction being perpendicular to the stretching direction; the deformation data includes first deformation data of the standard point location 110; determining a row group to be compensated according to the deformation data, compensating the row group to be compensated, and specifically, the compensating process comprises the following steps: and compensating the row group to be compensated based on the first deformation data, so that the compensated row group is positioned at a preset position of the mask unit 1 after being stretched by the expanded mesh, and the compensated mask unit 1 is obtained.
In this way, the positions of the openings 10 of each row of the mask unit 1 in the stretching direction can be compensated, when the compensated mask unit 1 is stretched and welded on the frame 2 through the stretched mesh, the positions of the openings 10 of each row of the mask unit 1 can be located at preset positions, when the mask plate is adopted for film evaporation, the higher position precision of the evaporation area 11 is ensured, so that the position precision of the film evaporated through the mask plate is ensured, and phenomena such as OLED color mixing are avoided.
In addition, by setting the standard point location 110 and compensating each row group to be compensated based on the first deformation data of the standard point location 110, the embodiment of the invention not only has more accurate compensation effect, but also has simpler process, is convenient to operate, improves the compensation efficiency and is beneficial to practical application.
Illustratively, as shown in fig. 1 and 2, the first direction (stretching direction) is parallel to the length direction of the mask unit 1, and the second direction is parallel to the width direction of the mask unit 1.
Specifically, in the mask unit 1, the openings 10 of each row are used to vapor deposit a film layer such as a pixel of an OLED, that is, when vapor depositing a film layer such as a pixel of an OLED, the organic material used is deposited on the substrate through the openings 10 to form a corresponding film layer. It can be understood that the compensation is performed on the line group to be compensated, specifically, the positions of the openings 10 in the line group to be compensated are compensated, so that the positions of the openings 10 in the compensated mask unit 1 can be located at the preset positions after the compensated mask unit is stretched by the expanded mesh.
Specifically, the compensation is to compensate the position of the opening 10 in the opposite direction, for example, by taking the original position of a certain opening 10 as a reference point, and by the above simulation, the offset of the position of the opening 10 is a (i.e. offset a from the original position), and the offset of the position of the opening 10 after compensation is-a. That is, the mask unit 1 has a first side 101 and a second side 102 opposite to each other, the directions of the first side 101 to the second side 102 are parallel to the stretching direction, and the opening 10 is offset toward the first side 101 with respect to the original position thereof by an offset A through simulation 1 The compensated position of the opening 10 is shifted towards the second side 102 with respect to its original position by an amount a 2 ，A 1 、A 2 The values are equal.
In some embodiments, determining the set of rows to be compensated from the deformation data as described above may include: determining deformation of at least part of the row groups according to the deformation data; determining a compensation cut-off line according to the deformation; in the stretching direction, the row group between the edge of the mask unit and the compensation cut-off line is determined as the row group to be compensated.
In the stretching direction, the deformation amount of the line group closer to the edge of the mask unit 1 is larger, and the deformation amount of the line group closer to the middle position 130 of the mask unit 1 is smaller, so that the deformation amount of at least part of the line groups can be obtained to determine the line group with the deformation amount closest to the set threshold value, and further determine the compensation cut-off line 120 (the deformation amount of the compensation cut-off line 120 after stretching deformation by the expanded mesh can be basically equal to the set threshold value, and in particular can be kept close to a straight line), and the deformation amount of the line groups between the edge of the mask unit 1 and the compensation cut-off line 120 is larger than the set threshold value, and the line groups to be compensated are determined to be the line groups to be compensated; the deformation of the line group between the middle position 130 of the mask unit 1 and the compensation cut-off line 120 is smaller than the set threshold, and no compensation is performed.
The threshold value may be specifically 0.5 to 1. Mu.m, for example, 0.5. Mu.m, 0.8. Mu.m, 1. Mu.m, etc. The numerical range of the set threshold value can be set according to actual conditions.
Specifically, as shown in fig. 1 and 2, the distances from the intermediate position 130 of the mask unit 1 to the first side 101 and the second side 102 of the mask unit 1 are substantially equal, that is, in the first direction, the portions located on opposite sides of the intermediate position 130 of the mask unit 1 are axisymmetric about the intermediate position 130 as a symmetry axis, the determined compensation cut-off line includes a compensation cut-off line 120 located between the intermediate position 130 and the first side 101 and a compensation cut-off line 120 located between the intermediate position 130 and the second side 102, the deformation amount of the line group located between the two compensation cut-off lines 120 is small (less than the set threshold), no compensation may be performed, and the line group located between the first side 101 and the compensation cut-off line 120 and the line group located between the second side 102 and the compensation cut-off line 120 are used as the line group to be compensated according to the above compensation process.
In general, the standard point 110 has a larger deformation, and may be specifically larger than a set threshold. Specifically, the standard point 110 may be located between the edge of the mask unit 1 and the compensation cutoff line 120, so that the deformation of the standard point 110 is greater than the set threshold.
Specifically, as shown in fig. 1 and 2, the mask unit 1 includes a plurality of vapor deposition regions 11 distributed along the stretching direction, each vapor deposition region 11 includes a plurality of row groups, and the standard dot 110 may be located in the vapor deposition region 11 closest to the edge of the mask unit 1 in the stretching direction, for example, in the vapor deposition region 11 closest to the first side 101 or in the vapor deposition region closest to the second side 102.
In some embodiments, the standard point 110 may be located in the middle of the evaporation area 11, where the difference between the number of the row groups located on two opposite sides of the standard point 110 in the evaporation area 11 where the standard point 110 is located is less than or equal to 1.
Specifically, the standard point 110 may be a positioning Mark line (Mark) provided on the mask unit 1, that is, a line of symbol marks may be provided at a preset position of the mask unit 1 before stretching the expanded mesh to form the positioning Mark line; alternatively, the standard point 110 is a row group, specifically a row group to be compensated, and generally specifically a line connecting the centers of the openings 10 in the row group.
In some embodiments, the compensating the row group to be compensated based on the first deformation data may specifically include: and compensating the row group to be compensated based on the distance between the row group to be compensated and the standard point position in the stretching direction from the same datum line and the first deformation data.
Specifically, when the expanded metal is stretched, the mask unit 1 is stressed at two opposite ends in the stretching direction (such as the stress direction F1 of the first side 101 and the stress direction F2 of the second side 102 of the mask unit 1 in fig. 1), and the evaporation zone 11 is deformed by the stress to form a barrel shape (as shown in fig. 2). In general, the larger the positional deviation (deformation) of the line group closer to the edge (first side 101 and second side 102) of the mask unit 1 in the stretching direction, the smaller the positional deviation of the line group closer to the intermediate position 130 of the mask unit 1, and the standard point 110 and the line group of the mask unit 1 are distributed in the stretching direction, so that, based on this trend of variation, the deformation amount and the compensation amount (the compensation amount of the line group to be compensated is opposite in azimuth to the deformation amount thereof, the same in value) of the line group to be compensated can be converted according to the deformation condition of the standard point 110 and the position (the distance between the two to the same reference line 100 in the stretching direction) of the line group to be compensated and the line group to be compensated according to the converted compensation amount.
The reference line 100 is perpendicular to the stretching direction, the reference line 100 may be parallel to the second direction, and the reference line 100 may specifically be an edge (as shown in fig. 1) of one side (e.g., the first side 101 or the second side 102) of the mask unit 1 in the stretching direction, but is not limited thereto.
Specifically, the deformation amount (first deformation data) of the standard point location 110 may be scaled in equal proportion according to the distance between the line group to be compensated and the standard point location 110 in the stretching direction from the same reference line 100, so as to obtain the deformation amount and the compensation amount of the line group to be compensated.
For example, the deformation of the standard point 110 is Δp 0 The distance between the standard point 110 and the reference line 100 in the stretching direction is L 0 A distance between a certain row group to be compensated and the reference line 100 in the stretching direction is L 1 The deformation of the row group to be compensated is delta p 1 The line group to be compensated, the reference line 100 and the standard point 110 are located between the intermediate position 130 and the first side 101, respectively, and the reference line 100 may be specifically an edge (as shown in fig. 1) of the first side 101 of the mask unit 1, and Δp may be calculated according to the following formula 1 ：
△p 1 ×L 1 ＝△p 0 ×L 0 。
When the group of rows to be compensated located between the intermediate position 130 and the second side 102 passes the formula Δp 1 ×L 1 ＝△p 0 ×L 0 When compensation is performed, the reference line 100 and the standard point 110 may be located between the intermediate position 130 and the second side 102, and the reference line 100 may be specifically an edge of the second side 102 of the mask unit 1. I.e. the number of fiducial lines 100 is two, the two fiducial lines 100 being located on opposite sides of the mask unit 1 (one on the first side 101 and the other on the second side 102), respectively. The number of the standard points 110 is two, and the two standard points 110 are respectively located at two opposite sides of the mask unit 1, that is, one of the two standard points is close to the first side 101, and specifically can be located between the first side 101 and the compensation cut-off line 120 located between the intermediate position 130 and the first side 101; the other is near the second side 102, and may specifically be located between the second side 102 and the compensation cutoff line 120 located between the intermediate position 130 and the second side 102, where the two standard points 110 may be axisymmetric with respect to the intermediate position 130 as a symmetry axis, but is not limited thereto. Wherein the reference line 100 at the first side 101 and the standard point 110 near the first side 101 are used for determining the deformation amount of the row group to be compensated between the intermediate position 130 and the first side 101, and the reference line 100 at the second side 102 and the standard point 110 near the second side 102 are used for determining the deformation amount of the row group to be compensated between the intermediate position 130 and the second side 102.
Or in another embodiment, when the group of rows to be compensated between the intermediate position 130 and the second side 102 passes the formula Δp 1 ×L 1 ＝△p 0 ×L 0 When compensation is performed, the reference line 100 and the standard point 110 may be located between the intermediate position 130 and the first side 101, that is, the number of the reference line 100 and the standard point 110 may be one, and the deformation amounts of the row group to be compensated located between the intermediate position 130 and the first side 101 and the row group to be compensated located between the intermediate position 130 and the second side 102 may be determined based on the same reference line 100 and the same standard point 110. Specifically, since the row groups located on opposite sides of the intermediate position 130 are substantially axisymmetric about the intermediate position 130 as the symmetry axis, wherein the deformation orientations of the axisymmetric row groups to be compensated are opposite, the formula Δp can be used 1 ×L 1 ＝△p 0 ×L 0 Obtaining the deformation Δp of the group of rows to be compensated between the intermediate position 130 and the first side 101 1 Thereby obtaining a line group which is axisymmetric to the line group to be compensated and is positioned between the middle position 130 and the first side 101The deformation Δp of the row group to be compensated between the intermediate position 130 and the second side 102 1 To compensate for the set of rows to be compensated between the intermediate position 130 and the second side 102.
It can be understood that the deformation of each opening 10 in the row group to be compensated is calculated by the above formula, so as to obtain the deformation of the row group to be compensated, and the compensation of the row group to be compensated refers to compensating the position of the row group to be compensated, so that each opening 10 is located at a preset position after being stretched by the expanded mesh.
The distance between the standard point 110 and the reference line 100 in the stretching direction, and the distance between the line group to be compensated and the reference line 100 in the stretching direction refer to the distance between these points when the mask unit 1 is not stretched (i.e., before stretching).
In addition, when the mask unit 1 is stretched by stretching the mesh, the positions of the standard point 110 and the openings 10 in each to-be-compensated row group are shifted, and in view of different stresses at different positions, the deformation amounts of the positions of the different openings 10 are different, so that after the deformation of the connecting lines of the positions of the openings 10 in each to-be-compensated row group (specifically, the connecting lines of the centers of the openings 10) generally form deformation curves (such as the first deformation curve 140 of the first row group of the first evaporation zone 11 from the first side 101, the first deformation curve 150 of the second row group, and the first deformation curve 160 of the ninth row group in fig. 2), the standard point 110 is deformed, and then the deformation curves are formed.
In some embodiments, compensating the row group to be compensated based on the first deformation data may specifically include: based on the distance between the line group to be compensated and the standard point 110 in the stretching direction and the first deformation data from the same standard line 100, a first compensation curve is generated by fitting, and the line group to be compensated is compensated according to the first compensation curve, so that the compensated line group is positioned at the preset position of the mask unit 1 after being stretched by the expanded mesh, and therefore, the first compensation curve has better smoothness and good operability, can be matched with the position of each opening 10 in the line group better, and improves the position accuracy of the openings 10 of the mask unit 1 after compensation.
In particular, when compensating a certain row group to be compensated, the method can be based on the formula Δp 1 ×L 1 ＝△p 0 ×L 0 And calculating deformation of the plurality of openings 10 in the row group to be compensated, wherein the selected plurality of openings 10 can be arranged at basically equal intervals in the second direction, fitting the calculated plurality of deformation data into a first compensation curve, and compensating the row group to be compensated.
Specifically, a first fitting formula (i.e., a formula corresponding to the first compensation curve) may be obtained according to the first compensation curve, and then the amount to be compensated of each opening 10 in the row group to be compensated is calculated according to the first fitting formula, so as to compensate the position of each opening 10. For example, fig. 3 shows a first fitting curve of a certain row group to be compensated and a corresponding first fitting formula thereof, and the positions of the openings 10 in the row group to be compensated may be calculated according to the first fitting formula to compensate the positions of the openings 10 in an embodiment.
Further, as shown in fig. 1, the openings 10 of each vapor deposition region 11 in the mask unit 1 are arranged in an array to form the above-described plurality of row groups distributed along the first direction and a plurality of column groups distributed along the second direction (the column groups include a plurality of openings 10 distributed along the first direction/stretching direction), and as shown in fig. 2, the mask unit 1 is deformed in the second direction after being stretched by the net.
The embodiment of the present invention may further include a process of performing position compensation on the deformation of the mask unit 1 in the second direction, for example, in some embodiments, the deformation data of the mask unit 1 further includes second deformation data of the mask unit 1 in the second direction, and the column group may be compensated according to the second deformation data, so that the compensated column group is located at a preset position after being stretched by the expanded mesh.
In general, when the mask unit 1 is stretched without a net, the connection lines of the sites of the openings 10 in each column group (specifically, the connection lines of the centers of the openings 10) are substantially straight, and when the mask unit 1 is stretched with a net, the positions of the openings 10 in each column group are shifted, and in view of different stresses at different positions, the deformation amounts of the positions of the openings 10 are different, so that after the connection lines of the sites of the openings 10 in each column group are deformed, a deformation curve (such as the second deformation curve 170 of two column groups on opposite sides of the first evaporation area 11 in the second direction from the first side 101 of the mask unit 1 in fig. 2) is generally formed.
In the specific implementation, when compensating one column group, a second compensation curve can be fitted according to the second deformation data, and then the column group is compensated according to the second compensation curve.
Specifically, the deformation amount of the plurality of openings 10 in the column group may be obtained from the second deformation data, the plurality of openings 10 used may be arranged at substantially equal intervals in the first direction, and the calculated plurality of deformation amount data may be fitted to the second compensation curve to compensate for the column group.
The second fitting formula (i.e., the formula corresponding to the second compensation curve) may be obtained according to the second compensation curve, and then the compensation amount of each opening 10 in the column group is calculated according to the second fitting formula, so as to compensate the position of each opening 10.
As shown in fig. 1 and 2, the mask unit 1 generally includes a plurality of vapor deposition regions 11, and deformation conditions of column groups of the same column of the vapor deposition regions 11 are substantially the same or similar, so that compensation can be performed using the same compensation curve.
In specific implementation, the mask unit can be modeled (namely, a mask unit model is constructed) through conventional simulation software in the field such as mechanical simulation software, and the stretching process of the mask unit is simulated, so that deformation data of the mask unit are obtained. The compensated positions of the openings in the Mask unit are obtained through the compensation process, then a mold with the openings conforming to the positions is manufactured, the mold is used as a Mask structure (Mask) to cover the substrate, then the substrate is etched in a mode of illumination etching and the like, so that the openings corresponding to the openings in the specific positions on the mold are etched on the substrate, the substrate is manufactured into the compensated Mask unit, and after the Mask unit is stretched in a screen-tensioning mode, the openings are positioned at preset positions, and therefore the evaporation precision can be improved. Furthermore, the mask unit can be compensated by adopting a mode of modeling by simulation software, so that the evaporation accuracy is improved; meanwhile, the operation is simple and quick, the cost is reduced, and the popularization and promotion are facilitated.
The manufacturing method of the mask plate provided by the embodiment of the invention comprises the following steps: manufacturing a mask unit 1 according to the manufacturing method of the mask unit 1; and stretching the net of the mask unit 1, and welding the net to the frame 2 to prepare the mask plate.
The mask plate provided by the embodiment of the invention comprises the frame 2 and the mask unit 1 manufactured according to the manufacturing method of the mask unit, wherein the mask unit 1 is welded on the frame 2 after being stretched, and the mask plate can be manufactured according to the manufacturing method of the mask plate.
As described above, the positions of the openings 10 in the mask unit 1 are compensated through the above process, so that after the mask unit 1 is stretched by the expanded mesh, the openings 10 in the mask unit 1 can be located at preset positions, so that the positions of the openings can be more accurately matched with preset positions of a film layer to be evaporated (such as an OLED pixel, etc.), thereby improving the evaporation precision and avoiding phenomena such as color mixing.
In the description of the present invention, the terms "first", "second", etc. are used for descriptive purposes only, for example to distinguish between components, in order to more clearly illustrate/explain the technical solution, but are not to be understood as indicating or implying a quantity of technical features indicated or an order of substantial significance, etc.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present invention, and not for limiting the same; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the invention.
Claims (10)
1. A method of making a mask unit, comprising:
performing simulation on a net stretching process of a mask unit to obtain deformation data of the mask unit; the mask unit comprises standard points distributed along the stretching direction of the expanded mesh and a plurality of row groups, wherein each row group comprises a plurality of openings distributed along a second direction, and the second direction is perpendicular to the stretching direction; the deformation data comprise first deformation data of the standard point location;
determining a row group to be compensated according to the deformation data, and compensating the row group to be compensated, wherein the compensating process comprises the following steps: and compensating the row group to be compensated based on the first deformation data, so that the compensated row group is positioned at a preset position of the mask unit after being stretched by the expanded mesh, and the compensated mask unit is obtained.
2. The method for fabricating a mask unit according to claim 1, wherein determining the row group to be compensated according to the deformation data comprises:
determining deformation of at least part of the row groups according to the deformation data;
determining a compensation cut-off line according to the deformation;
and determining the row group between the edge of the mask unit and the compensation cut-off line as the row group to be compensated in the stretching direction.
3. The method for manufacturing a mask unit according to claim 2, wherein the standard point is located between the edge of the mask unit and the compensation cut-off line.
4. The method of manufacturing a mask unit according to claim 1, wherein the mask unit includes a plurality of vapor deposition regions distributed along the stretching direction, each of the vapor deposition regions includes a plurality of the line groups, and the standard point is located in the vapor deposition region closest to the edge of the mask unit in the stretching direction;
preferably, in the evaporation area where the standard point is located, the difference between the number of the line groups located on two opposite sides of the standard point is less than or equal to 1.
5. The method for manufacturing a mask unit according to any one of claims 1 to 4, wherein the standard dot is a positioning mark line provided on the mask unit or a row of the row group.
6. The method of manufacturing a mask unit according to claim 1 or 2, wherein the deformation amount of the line group to be compensated is larger than a set threshold value, and the set threshold value is 0.5-1 μm.
7. The method for fabricating a mask unit according to claim 1, wherein the compensating the row group to be compensated based on the first deformation data comprises: and compensating the row group to be compensated based on the distance from the standard point position to the same datum line in the stretching direction and the first deformation data.
8. The method for fabricating a mask unit according to claim 7, wherein the compensating the row group to be compensated based on the first deformation data comprises:
and fitting to generate a first compensation curve based on the distance between the row group to be compensated and the standard point to the same reference line in the stretching direction and the first deformation data, and compensating the row group to be compensated according to the first compensation curve so that the compensated row group is positioned at a preset position of the mask unit after being stretched by the expanded mesh.
9. The manufacturing method of the mask plate is characterized by comprising the following steps of:
manufacturing a mask unit according to the manufacturing method of the mask unit according to any one of claims 1 to 8;
and stretching the mask unit net, and welding the stretched mask unit net to a frame to obtain the mask plate.
10. A mask plate, characterized by comprising a frame and a mask unit manufactured according to the manufacturing method of the mask unit of any one of claims 1-8, wherein the mask unit is welded to the frame after being stretched by a net.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211711695.5A CN116011211A (en) | 2022-12-29 | 2022-12-29 | Mask unit, manufacturing method of mask plate and mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211711695.5A CN116011211A (en) | 2022-12-29 | 2022-12-29 | Mask unit, manufacturing method of mask plate and mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116011211A true CN116011211A (en) | 2023-04-25 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211711695.5A Pending CN116011211A (en) | 2022-12-29 | 2022-12-29 | Mask unit, manufacturing method of mask plate and mask plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116011211A (en) |
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2022
- 2022-12-29 CN CN202211711695.5A patent/CN116011211A/en active Pending
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