CN115978938A - Photovoltaic silicon chip drying equipment with dual-channel - Google Patents
Photovoltaic silicon chip drying equipment with dual-channel Download PDFInfo
- Publication number
- CN115978938A CN115978938A CN202211480443.6A CN202211480443A CN115978938A CN 115978938 A CN115978938 A CN 115978938A CN 202211480443 A CN202211480443 A CN 202211480443A CN 115978938 A CN115978938 A CN 115978938A
- Authority
- CN
- China
- Prior art keywords
- air
- tank body
- silicon wafer
- photovoltaic silicon
- drying equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 46
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 46
- 239000010703 silicon Substances 0.000 title claims abstract description 46
- 238000001035 drying Methods 0.000 title claims abstract description 36
- 210000005056 cell body Anatomy 0.000 claims abstract description 15
- 239000007789 gas Substances 0.000 claims description 19
- 239000011229 interlayer Substances 0.000 claims description 14
- 230000009977 dual effect Effects 0.000 claims description 8
- 238000009423 ventilation Methods 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 239000010410 layer Substances 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 230000003247 decreasing effect Effects 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 125000004122 cyclic group Chemical group 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 3
- 238000004140 cleaning Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/02—Circulating air or gases in closed cycles, e.g. wholly within the drying enclosure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B23/00—Heating arrangements
- F26B23/10—Heating arrangements using tubes or passages containing heated fluids, e.g. acting as radiative elements; Closed-loop systems
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
- F26B25/06—Chambers, containers, or receptacles
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B9/00—Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards
- F26B9/10—Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards in the open air; in pans or tables in rooms; Drying stacks of loose material on floors which may be covered, e.g. by a roof
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model relates to a photovoltaic silicon chip drying equipment with dual-channel, gaseous after the heating of heater, it is internal that the expert enters the groove, the passageway of inner loop is formed to the intermediate layer through centrifugal fan and cell body to realize gaseous and thermal cyclic utilization, influence the stoving effect simultaneously in order to prevent the increase of moisture in the gaseous of cell body, gaseous in the cell body will be partly discharged again, through the structural design of dual-channel, improved gaseous and thermal utilization ratio.
Description
Technical Field
The application belongs to the technical field of photovoltaic silicon wafer production equipment, and particularly relates to photovoltaic silicon wafer drying equipment with double channels.
Background
The photovoltaic silicon wafer is a key for converting light energy into electric energy, the silicon wafer needs to be cleaned in the production process of the photovoltaic silicon wafer, and the main work of the cleaning process is to degum the silicon wafer produced in the wire cutting process and clean mortar on the surface of the silicon wafer. The method comprises three items of work content: pre-cleaning, inserting sheet and ultrasonic cleaning. And after each cleaning, drying the photovoltaic silicon wafer by using a drying groove. Chinese patent document CN108240740A discloses a drying device, which comprises a tank body, a heating temperature control assembly, a fan assembly and a silicon wafer basket supporting member, wherein the tank body is arranged in a cleaning device, the heating temperature control assembly is arranged on the inner side wall of the tank body, the fan assembly and the silicon wafer basket supporting member are both arranged in the tank body, a silicon wafer basket is arranged on the silicon wafer basket supporting member, an air outlet of the fan assembly is located below the silicon wafer basket supporting member, so as to blow air flow to the silicon wafer basket, an air channel is further arranged in the tank body, and an air inlet of the fan assembly is communicated with the air channel, so as to suck the air flow into the fan assembly. According to the invention, the tank body is integrated into the cleaning equipment, and after the silicon wafer is cleaned in the cleaning equipment, the silicon wafer basket is taken out by the mechanical arm and placed on the silicon wafer basket supporting piece of the drying equipment, so that the automation of dry-in and dry-out is realized. However, the drying apparatus cannot effectively use the heat of the air.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: in order to solve the defects in the prior art, the photovoltaic silicon wafer drying equipment with the double channels is provided, and the gas heat can be effectively utilized.
The technical scheme adopted by the invention for solving the technical problems is as follows:
a photovoltaic silicon wafer drying device with dual channels comprises: a tank body and a ventilation assembly;
one side of the tank body is provided with a connecting part, the two side walls and the bottom of the tank body are provided with interlayers, the inner wall of the tank body is provided with air holes so that airflow flows into the interlayers from the inside of the tank body, and the inner wall of the tank body is provided with a vent pipe communicated with the connecting part;
the ventilation assembly comprises an exhaust fan, a heater, a centrifugal fan arranged at the bottom of the tank body, an air inlet pipe communicated with the connecting part, and an air outlet pipe communicated with the bottom of the tank body, wherein the exhaust fan enters the tank body from the air inlet pipe after air is sucked into the heater and discharges air from the air outlet pipe, the exhaust fan sucks air from the air inlet pipe and discharges air from the air outlet pipe to form an air inlet pipe to the connecting part to the air outlet pipe, and after passing through an interlayer at the bottom of the tank body, part of air returns to the inside of the tank body through the interlayer at the side wall of the tank body, and part of air flows to the air outlet pipe through a through hole at the bottom of the tank body and is discharged outwards.
Preferably, according to the photovoltaic silicon wafer drying equipment with the double channels, the air outlet pipe is provided with the electromagnetic valve so as to realize the connection and disconnection of the pipeline.
Preferably, according to the photovoltaic silicon wafer drying equipment with the double channels, the bottom of the groove body and the upper part of the centrifugal fan are provided with the rectifying plates, and the rectifying plates are provided with a plurality of rectifying holes.
Preferably, according to the photovoltaic silicon wafer drying equipment with the double channels, the rectifying holes are circularly arranged.
Preferably, in the photovoltaic silicon wafer drying equipment with the double channels, the through hole at the bottom of the tank body is positioned between the two centrifugal fans.
Preferably, in the photovoltaic silicon wafer drying equipment with the double channels, the vent pipe is L-shaped and extends to the inner wall of the groove body opposite to the connecting part.
Preferably, according to the photovoltaic silicon wafer drying equipment with the dual channels, the number of the air holes is gradually reduced along the height reduction.
Preferably, according to the photovoltaic silicon wafer drying equipment with the double channels, the gas is air or nitrogen.
Preferably, in the photovoltaic silicon wafer drying equipment with two channels, the inclined plate is arranged at the corner of the interlayer.
The invention has the beneficial effects that:
according to the photovoltaic silicon wafer drying equipment with the double channels, disclosed by the embodiment of the invention, after being heated by the heater, the gas is introduced into the groove body, and the internal circulation channel is formed by the centrifugal fan and the interlayer of the groove body, so that the cyclic utilization of the gas and heat is realized, meanwhile, in order to prevent the drying effect from being influenced by the increase of moisture in the gas in the groove body, part of the gas in the groove body is discharged, and the utilization rate of the gas and heat is improved through the structural design of the double channels.
Drawings
The technical solution of the present application is further explained below with reference to the drawings and examples.
FIG. 1 is a schematic structural diagram of a photovoltaic silicon wafer drying apparatus with dual channels according to an embodiment of the present application;
FIG. 2 is a cross-sectional view of a photovoltaic silicon wafer drying apparatus with dual channels according to an embodiment of the present application;
FIG. 3 is a top view of a photovoltaic silicon wafer drying apparatus with dual channels according to an embodiment of the present application;
fig. 4 is a schematic structural diagram of the photovoltaic silicon wafer drying apparatus with dual channels according to the embodiment of the present application, after hiding a side plate.
The reference numbers in the figures are:
1. a tank body;
2. a ventilation assembly;
14. air holes;
15. a connecting portion;
16. a breather pipe;
17. a rectifying plate;
18 sloping plates;
20. a through hole;
21. an exhaust fan;
22. a centrifugal fan;
24. a heater;
231. an air inlet pipe;
232. and (7) an air outlet pipe.
Detailed Description
It should be noted that, in the present application, the embodiments and features of the embodiments may be combined with each other without conflict.
In the description of the present application, it is to be understood that the terms "central," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in an orientation or positional relationship indicated in the drawings for convenience in describing the present application and to simplify the description, but are not intended to indicate or imply that the device or element so referred to must have a particular orientation, be constructed in a particular orientation, and be operated in a particular manner, and thus are not to be construed as limiting the scope of the present application. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the invention, "a plurality" means two or more unless otherwise specified.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art through specific situations.
The technical solutions of the present application will be described in detail below with reference to the accompanying drawings in combination with embodiments.
Examples
The embodiment provides a photovoltaic silicon wafer drying apparatus with dual channels, as shown in fig. 1, including: a tank body 1 (for accommodating a hanging basket 9) and a ventilation assembly 2;
one side of the tank body 1 is provided with a connecting part 15, the two side walls and the bottom of the tank body 1 are provided with interlayers, the inner wall of the tank body 1 is provided with an air hole 14 so that air flow can flow into the interlayers from the inside of the tank body 1, and the inner wall of the tank body 1 is provided with a vent pipe 16 communicated with the connecting part 15;
the ventilation assembly 2 comprises an exhaust fan 21, a heater 24 and a centrifugal fan 22 arranged at the bottom of the tank body 1, an air inlet pipe 231 communicated with a connecting part 15, an air outlet pipe 232 communicated with the bottom of the tank body 1, the exhaust fan 21 sucks gas from the air inlet pipe 231 and discharges the gas from the air outlet pipe 232 to form the air inlet pipe 231 to the connecting part 15 to the air pipe 16 to the tank body 1 through an interlayer at the bottom of the tank body 1, partial gas returns to the inside of the tank body 1 through an interlayer on the side wall of the tank body 1, and the partial gas flows to the air outlet pipe 232 through a through hole 20 at the bottom of the tank body 1 and is discharged outwards.
The photovoltaic silicon chip drying equipment with double channels of this embodiment, gaseous after the heating of heater 24, let in cell body 1, the passageway of inner loop is formed through centrifugal fan 22 and the intermediate layer of cell body 1 to realize gaseous and thermal cyclic utilization, influence the stoving effect simultaneously in order to prevent the increase of moisture in the cell body 1 internal gas, gaseous in the cell body 1 is partly discharged again, through the structural design of double channels, has improved gaseous and thermal utilization ratio.
Further, an electromagnetic valve is arranged on the air outlet pipe 232 to realize the on-off of the pipeline.
Further, a rectifying plate 17 is arranged at the bottom of the tank body 1 and above the centrifugal fan 22, a plurality of rectifying holes are formed in the rectifying plate 17, and the rectifying holes are circularly arranged or rectangularly arranged.
Further, as shown in fig. 4, the through hole 20 at the bottom of the slot body 1 is located between two centrifugal fans 22, and the through hole 20 is arranged between the two centrifugal fans 22 to stably control the air volume entering the through hole 20.
Further, the vent pipe 16 is L-shaped to extend to an inner wall of the tank body 1 opposite to the connection portion 15.
Further, the air holes 14 are uniformly distributed on the side wall or gradually decrease in number along the height, as shown in fig. 2, preferably gradually decrease in number along the height.
Further, the corners of the interlayer are provided with inclined plates 18 to reduce dead zones of the airflow.
It should be noted that the top of the tank body 1 is provided with a cover, and the related structure is not described herein since it is irrelevant to the invention.
In light of the foregoing description of the preferred embodiments according to the present application, it is to be understood that various changes and modifications may be made without departing from the spirit and scope of the invention. The technical scope of the present application is not limited to the contents of the specification, and must be determined according to the scope of the claims.
Claims (9)
1. The utility model provides a photovoltaic silicon chip drying equipment with bi-pass which characterized in that includes: a tank body (1) and a ventilation assembly (2);
one side of the tank body (1) is provided with a connecting part (15), two side walls and the bottom of the tank body (1) are provided with interlayers, the inner wall of the tank body (1) is provided with an air hole (14) so that air flow flows into the interlayers from the inside of the tank body (1), and the inner wall of the tank body (1) is provided with a vent pipe (16) communicated with the connecting part (15);
ventilation assembly (2) are including air exhauster (21), heater (24) and centrifugal fan (22) of setting in cell body (1) bottom, air-supply line (231) with connecting portion (15) intercommunication, air-out pipe (232) with cell body (1) bottom intercommunication, air exhauster (21) get into behind air-supply line (231) suction gas through heater (24) in (1) cell body (1) and from air-out pipe (232) exhaust gas, air exhauster (21) are from air-supply line (231) suction gas and from air-out pipe (232) exhaust gas form air-supply line (231) to connecting portion (15) to breather pipe (16) to cell body (1) inside behind cell body (1) bottom intermediate layer, part gas returns inside cell body (1) through cell body (1) lateral wall intermediate layer, part gas flows to air-out pipe (232) through-hole (20) of cell body (1) bottom and outwards discharges.
2. The photovoltaic silicon wafer drying equipment with double channels as claimed in claim 1, wherein the air outlet pipe (232) is provided with an electromagnetic valve to realize the on-off of the pipeline.
3. The photovoltaic silicon wafer drying equipment with double channels as claimed in claim 1, wherein a rectifying plate (17) is arranged at the bottom of the tank body (1) and above the centrifugal fan (22), and a plurality of rectifying holes are formed in the rectifying plate (17).
4. The photovoltaic silicon wafer drying apparatus with double channels as claimed in claim 3, wherein the rectifying holes are arranged in a circle.
5. The photovoltaic silicon wafer drying equipment with the double channels as claimed in claim 1 is characterized in that the through hole (20) at the bottom of the tank body (1) is positioned between two centrifugal fans (22).
6. The photovoltaic silicon wafer drying apparatus with double passages as claimed in claim 1, wherein the vent pipe (16) is L-shaped to extend to an inner wall of the tank body (1) opposite to the connection portion (15).
7. The photovoltaic silicon wafer drying apparatus having dual channels according to claim 1, wherein the number of the air holes (14) decreasing along the height is gradually reduced.
8. The photovoltaic silicon wafer drying equipment with the double channels as claimed in claim 1, wherein the gas is air or nitrogen.
9. The photovoltaic silicon wafer drying equipment with double channels as claimed in claim 1, wherein the corners of the interlayer are provided with sloping plates (18).
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211480443.6A CN115978938A (en) | 2022-11-23 | 2022-11-23 | Photovoltaic silicon chip drying equipment with dual-channel |
| PCT/CN2023/093356 WO2024108914A1 (en) | 2022-11-23 | 2023-05-11 | Photovoltaic silicon wafer drying apparatus having two paths |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211480443.6A CN115978938A (en) | 2022-11-23 | 2022-11-23 | Photovoltaic silicon chip drying equipment with dual-channel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115978938A true CN115978938A (en) | 2023-04-18 |
Family
ID=85971151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211480443.6A Pending CN115978938A (en) | 2022-11-23 | 2022-11-23 | Photovoltaic silicon chip drying equipment with dual-channel |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN115978938A (en) |
| WO (1) | WO2024108914A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024108914A1 (en) * | 2022-11-23 | 2024-05-30 | 江苏亚电科技有限公司 | Photovoltaic silicon wafer drying apparatus having two paths |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108240740A (en) * | 2016-12-26 | 2018-07-03 | 北京北方华创微电子装备有限公司 | A kind of drying equipment |
| CN214426398U (en) * | 2021-03-29 | 2021-10-19 | 无锡琨圣智能装备股份有限公司 | Circulation air blowing type drying groove |
| CN215983613U (en) * | 2021-08-18 | 2022-03-08 | 禄丰隆基硅材料有限公司 | Drying groove and drying equipment |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN205561438U (en) * | 2016-03-23 | 2016-09-07 | 常州捷佳创精密机械有限公司 | Slot type stoving structure |
| CN212806284U (en) * | 2020-07-29 | 2021-03-26 | 苏州晶洲装备科技有限公司 | Silicon wafer drying device |
| CN219301166U (en) * | 2022-11-23 | 2023-07-04 | 江苏亚电科技有限公司 | Photovoltaic silicon wafer drying groove |
| CN115978938A (en) * | 2022-11-23 | 2023-04-18 | 江苏亚电科技有限公司 | Photovoltaic silicon chip drying equipment with dual-channel |
-
2022
- 2022-11-23 CN CN202211480443.6A patent/CN115978938A/en active Pending
-
2023
- 2023-05-11 WO PCT/CN2023/093356 patent/WO2024108914A1/en unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108240740A (en) * | 2016-12-26 | 2018-07-03 | 北京北方华创微电子装备有限公司 | A kind of drying equipment |
| CN214426398U (en) * | 2021-03-29 | 2021-10-19 | 无锡琨圣智能装备股份有限公司 | Circulation air blowing type drying groove |
| CN215983613U (en) * | 2021-08-18 | 2022-03-08 | 禄丰隆基硅材料有限公司 | Drying groove and drying equipment |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024108914A1 (en) * | 2022-11-23 | 2024-05-30 | 江苏亚电科技有限公司 | Photovoltaic silicon wafer drying apparatus having two paths |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024108914A1 (en) | 2024-05-30 |
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Address after: 225500 No. 151, Keji Avenue, Sanshui street, Jiangyan District, Taizhou City, Jiangsu Province Applicant after: Jiangsu Yadian Technology Co.,Ltd. Address before: 225500 No. 151, Keji Avenue, Sanshui street, Jiangyan District, Taizhou City, Jiangsu Province Applicant before: Jiangsu Yadian Technology Co.,Ltd. |