CN115872126A - Mask plate position adjusting device - Google Patents

Mask plate position adjusting device Download PDF

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Publication number
CN115872126A
CN115872126A CN202211686878.6A CN202211686878A CN115872126A CN 115872126 A CN115872126 A CN 115872126A CN 202211686878 A CN202211686878 A CN 202211686878A CN 115872126 A CN115872126 A CN 115872126A
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CN
China
Prior art keywords
mask
axis direction
plate
clamp
along
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Withdrawn
Application number
CN202211686878.6A
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Chinese (zh)
Inventor
刘峰
李文荘
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Suzhou Guangsiao Optoelectronics Technology Co ltd
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Suzhou Guangsiao Optoelectronics Technology Co ltd
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Priority to CN202211686878.6A priority Critical patent/CN115872126A/en
Publication of CN115872126A publication Critical patent/CN115872126A/en
Withdrawn legal-status Critical Current

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Abstract

The invention relates to the technical field of mask related equipment, and discloses a mask position adjusting device. The mask plate position adjusting device comprises a rack, a turnover mechanism and a rotating mechanism, wherein the turnover mechanism is arranged on the rack and can clamp or loosen a mask plate and drive the mask plate to turn around the X-axis direction, the rotating mechanism is movably arranged on the rack along the Z-axis direction and is positioned above or below the turnover mechanism, and the rotating mechanism can clamp or loosen the mask plate and drive the mask plate to rotate around the Z-axis direction. The mask plate position adjusting device can turn and rotate mask plates, is suitable for mask plates of different sizes, and is high in working efficiency and low in cost.

Description

Mask plate position adjusting device
Technical Field
The invention relates to the technical field of related equipment of masks, in particular to a mask position adjusting device.
Background
A MASK (MASK), referred to simply as a MASK, is an indispensable component of a lithographic process. The mask carries a design pattern through which light passes to project the design pattern onto the photoresist. During the process of using, producing and carrying the mask, the mask needs to be turned and rotated, during the turning and rotating process of the mask, the stability and safety of the mask in the process must be ensured, particle pollution cannot be caused, and the whole process must meet the requirements of high precision and high reliability. In the prior art, most I-beam welding devices are fixed tools, the I-beam welding devices cannot lift, rotate and turn over, a crane must be adopted for matching in the welding process, the construction cost is high, the efficiency is low, and certain safety risks exist; and the device is only suitable for turning and rotating products with strong rigidity, and can not adjust the products with different sizes.
Therefore, a reticle position adjustment device is needed to solve the above problems.
Disclosure of Invention
Based on the above, the invention aims to provide a mask plate position adjusting device, which can turn and rotate mask plates, is suitable for mask plates with different sizes, and has the advantages of high working efficiency and low cost.
In order to achieve the purpose, the invention adopts the following technical scheme:
reticle position adjustment device includes:
a frame;
the turnover mechanism is arranged on the rack and can clamp or loosen the mask plate and drive the mask plate to turn around the X-axis direction;
the rotating mechanism is movably arranged on the rack along the Z-axis direction and is positioned above or below the turnover mechanism, and the rotating mechanism can clamp or loosen the mask and can drive the mask to rotate around the Z-axis direction.
As a preferable scheme of the reticle position adjusting device, the turnover mechanism comprises:
the supporting column is movably arranged on the rack on a plane formed in the X-axis direction and the Y-axis direction;
the first clamp assembly is arranged on the support column in a rotating mode around the X-axis direction and can clamp or loosen the mask plate.
As a preferable aspect of the reticle position adjusting device, the reticle position adjusting device further includes:
the Y-direction guide rail extends along the Y-axis direction and is arranged on the rack;
the Y-direction sliding block is arranged on the Y-direction guide rail in a sliding manner along the Y-axis direction;
the X-direction guide rail extends along the X-axis direction and is arranged on the Y-direction sliding block, and the supporting column slides along the X-axis direction and is arranged on the X-direction guide rail.
As a preferred scheme of the mask plate position adjusting device, the number of the support columns is two, the two support columns are oppositely arranged along the X-axis direction, and the first clamp assembly comprises:
the two first clamping pieces are rotatably arranged on one supporting column around the X-axis direction, and can clamp two opposite sides of the mask.
As a preferable aspect of the reticle position adjusting device, each of the first clamping members includes:
the supporting beams are rotatably arranged on one supporting column around the X-axis direction;
at least one first anchor clamps, every first anchor clamps include mounting panel, lower plate and punch holder, the mounting panel is followed a supporting beam's length direction removes to set up supporting beam is last, the punch holder is followed a supporting beam's width direction removes to set up on the mounting panel, and can wind a supporting beam's width direction rotates, the lower plate winds a supporting beam's width direction rotates to set up on the mounting panel, the lower plate can with the punch holder forms first centre gripping space relatively.
As a preferable aspect of the reticle position adjusting device, the rotation mechanism includes:
the fixing frame is movably arranged on the rack along the Z-axis direction and is positioned above or below the rotating mechanism;
and the second clamp assembly is rotatably arranged on the fixed frame around the Z-axis direction and can clamp or loosen the mask plate.
As a preferable aspect of the reticle position adjusting device, the reticle position adjusting device further includes:
the Z-direction guide rail extends along the Z-axis direction and is arranged on the rack, and the fixed frame is arranged on the Z-direction guide rail in a sliding manner;
and the Z-direction driving piece is arranged on the rack and is in driving connection with the fixed frame.
As a preferable scheme of the reticle position adjusting device, the second clamp assembly includes:
the fixing plate is rotatably arranged on the fixing frame around the Z-axis direction;
the two second clamping pieces are arranged on the fixing plate in a relatively moving mode and can respectively clamp two opposite sides of the mask plate.
As a preferable aspect of the reticle position adjusting device, each of the second clamping members includes:
the adapter plate is movably arranged on the fixing plate along the length direction of the fixing plate;
and each second fixture comprises a lower positioning plate and an upper positioning plate, the lower positioning plate is arranged on the adapter plate, and the upper positioning plate is movably arranged above the lower positioning plate along the Z-axis direction and forms a second clamping space with the lower positioning plate.
As a preferred scheme of the mask plate position adjusting device, the frame comprises a bottom frame and a portal frame erected on the bottom frame, the turnover mechanism is arranged on the bottom frame, and the rotating mechanism is arranged on the portal frame and is opposite to the turnover mechanism.
The beneficial effects of the invention are as follows:
the invention provides a mask plate position adjusting device, which comprises a rack, a turnover mechanism and a rotating mechanism, wherein in the using or production and transportation process of a mask plate, the turnover mechanism is used for clamping the mask plate and then driving the mask plate to turn around the X-axis direction, so that the orientation of the mask plate along the Z-axis direction is changed, and the turning process is relatively stable; after overturning, the mask plates are moved towards the overturning mechanism through the rotating mechanism and clamped, meanwhile, the overturning mechanism loosens the mask plates, and the rotating mechanism drives the mask plates to be far away from the overturning mechanism and then drives the mask plates to rotate around the Z-axis direction, so that the orientation of the mask plates on the XY plane is changed, and the rotating process is stable. Under the structure, the turning and the rotation of the mask can be realized without a crane, the rotating mechanism is directly butted with the turning mechanism, the influence on the position precision of the mask is avoided, the adjusting precision and the adjusting efficiency of the mask position adjusting device are higher, and the cost is lower.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments of the present invention will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the contents of the embodiments of the present invention and the drawings without creative efforts.
FIG. 1 is a front view of a reticle position adjustment apparatus provided by an embodiment of the invention;
FIG. 2 is a side view of a reticle position adjustment mechanism provided by an embodiment of the invention;
FIG. 3 is a schematic diagram of a reticle position adjustment device provided by an embodiment of the invention;
FIG. 4 is a schematic structural diagram of a first clamping member according to an embodiment of the present invention;
FIG. 5 is an enlarged view of portion A of FIG. 4;
fig. 6 is a schematic structural diagram of a rotating mechanism provided in an embodiment of the present invention;
fig. 7 is an enlarged view of a portion B in fig. 6.
In the figure:
1. a frame; 11. a chassis; 12. a gantry;
2. a turnover mechanism; 21. a support pillar; 22. a first clamp assembly; 221. a first clamping member; 2211. a support beam; 2212. a first clamp; 22121. mounting a plate; 22122. a lower splint; 22123. an upper splint; 22124. a first upper driving member; 22125. a first lower driving member; 2213. a first guide rail; 2214. a first driving member;
3. a rotation mechanism; 31. a fixed mount; 32. a second clamp assembly; 321. a fixing plate; 322. a second clamping member; 3221. a patch panel; 3222. a second clamp; 32221. a lower positioning plate; 32222. an upper positioning plate; 323. a second guide rail; 324. a second driving member;
4. a Y-direction guide rail; 5. an X-direction guide rail; 6. a Z-direction guide rail;
100. and (5) masking.
Detailed Description
The present invention will be described in further detail with reference to the drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
In the description of the present invention, unless expressly stated or limited otherwise, the terms "connected," "connected," and "fixed" are to be construed broadly, e.g., as meaning permanently connected, removably connected, or integral to one another; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or may be connected through the use of two elements or the interaction of two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. "beneath," "under" and "beneath" a first feature includes the first feature being directly beneath and obliquely beneath the second feature, or simply indicating that the first feature is at a lesser elevation than the second feature.
In the description of the present embodiment, the terms "upper", "lower", "left", "right", and the like are used based on the orientations and positional relationships shown in the drawings, and are only for convenience of description and simplicity of operation, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. In the description of the present invention, "a plurality" means two or more unless otherwise specified. Furthermore, the terms "first" and "second" are used only for descriptive purposes and are not intended to have a special meaning.
During the use, production and transportation of the mask, the mask needs to be turned and rotated, and during the turning and rotation of the mask, the stability and safety of the mask in the process must be ensured, particle pollution cannot be caused, and the whole process must meet the requirements of high precision and high reliability. In the prior art, most I-beam welding devices are fixed tools, cannot lift, rotate and turn, and must be matched by a crane in the welding process, so that the construction cost is high, the efficiency is low, and certain safety risk exists; and the device is only suitable for overturning and rotating products with stronger rigidity, and can not adjust the products with different sizes. Based on the above problem, this embodiment provides a mask plate position adjusting device to solve the above problem, and the mask plate position adjusting device has the following specific structure:
as shown in fig. 1 to 7, the mask position adjusting device includes a frame 1, a turnover mechanism 2 and a rotation mechanism 3, the turnover mechanism 2 is disposed on the frame 1, the turnover mechanism 2 can clamp or release the mask 100 and can drive the mask 100 to turn around the X-axis direction, the rotation mechanism 3 is disposed on the frame 1 along the Z-axis direction and is located above or below the turnover mechanism 2, and the rotation mechanism 3 can clamp or release the mask 100 and can drive the mask 100 to rotate around the Z-axis direction. In the using or production and transportation process of the mask 100, the mask 100 is clamped by the turnover mechanism 2, and then the mask 100 is driven to turn around the X-axis direction, so that the orientation of the mask 100 along the Z-axis direction is changed, and the turning process is stable; after overturning, the mask 100 is moved towards the overturning mechanism 2 through the rotating mechanism 3 and clamped, meanwhile, the overturning mechanism 2 loosens the mask 100, and the rotating mechanism 3 drives the mask 100 to be far away from the overturning mechanism 2 and then drives the mask 100 to rotate around the Z-axis direction, so that the orientation of the mask 100 on the XY plane is changed, and the rotating process is stable. Under the structure, the turning and the rotation of the mask plate 100 can be realized without a crane, the rotating mechanism 3 is directly butted with the turning mechanism 2, the influence on the position precision of the mask plate 100 is avoided, and the mask plate position adjusting device has higher adjusting precision and efficiency and lower cost.
Illustratively, the rack 1 comprises a base frame 11 and a portal frame 12 erected on the base frame 11, the turnover mechanism 2 is arranged on the base frame 11, and the rotating mechanism 3 is arranged on the portal frame 12 and is opposite to the turnover mechanism 2. The structure enables the turnover mechanism 2 and the rotating mechanism 3 to be arranged just opposite to each other, so that the mask 100 can be conveniently transferred between the turnover mechanism 2 and the rotating mechanism 3, and the reliability and the safety of transfer are ensured. Of course, in other embodiments, the turnover mechanism 2 may also be disposed on the gantry 12, and the rotation mechanism 3 is disposed on the bottom frame 11, specifically according to actual requirements.
Further, as shown in fig. 3 to 5, the turnover mechanism 2 includes a support column 21 and a first clamp assembly 22, the support column 21 is movably disposed on the frame 1, specifically on the base frame 11, on a plane formed by the X-axis direction and the Y-axis direction, and the first clamp assembly 22 is rotatably disposed on the support column 21 around the X-axis direction and can clamp or release the reticle 100. The supporting column 21 moves on a plane formed in the X-axis direction and the Y-axis direction, so that the first clamp assembly 22 can align with the mask 100 on the robot arm, pass through the mask 100, and then rotate to drive the mask 100 to turn over through the first clamp assembly 22. Meanwhile, the first clamp assembly 22 is arranged in a rotating mode around the X-axis direction, when the turnover mechanism 2 receives the mask plate 100 from the manipulator, the first clamp assembly 22 can incline at a certain angle, for example, the first clamp assembly 22 inclines at 15 degrees, butt joint with the manipulator is facilitated, when the manipulator receives the mask plate 100 from the turnover mechanism 2, the first clamp assembly 22 can also incline at a certain angle to align with the manipulator, and butt joint reliability is improved.
Specifically, as shown in fig. 3, the reticle position adjusting apparatus further includes a Y-direction rail 4, a Y-direction slider, and an X-direction rail 5, the Y-direction rail 4 is disposed on the base frame 11 in a manner of extending in the Y-axis direction, the Y-direction slider is disposed on the Y-direction rail 4 in a manner of sliding in the Y-axis direction, the X-direction rail 5 is disposed on the Y-direction slider in a manner of extending in the X-axis direction, and the support column 21 is disposed on the X-direction rail 5 in a manner of sliding in the X-axis direction. The position of the support column 21 in the Y-axis direction is adjusted by sliding the Y-direction slider on the Y-direction guide rail 4, and the position of the support column 21 in the X-axis direction is adjusted by sliding the support column 21 on the X-direction guide rail 5. And Y is to the cooperation of slider and Y to guide rail 4 and X to the setting of guide rail 5 make the position control of support column 21 comparatively smooth and easy, be favorable to guaranteeing the position control precision.
Preferably, the Y-guide rails 4 are provided in plurality, the Y-guide rails 4 are arranged at intervals in the X-axis direction, the X-guide rails 5 are provided in plurality, and the X-guide rails 5 are arranged at intervals in the Y-axis direction, so that the stability of the support columns 21 is improved, and the turning stability and safety of the reticle 100 are ensured. The number of the Y-directional guide rails 4 and the X-directional guide rails 5 is specifically set according to actual requirements, for example, 2 or 3Y-directional guide rails 4 and 3X-directional guide rails 5 are respectively provided.
In this embodiment, the reticle position adjusting device further includes a Y-direction driving element and an X-direction driving element, the Y-direction driving element is connected to the Y-direction slider in a driving manner to drive the Y-direction slider to slide along the Y-direction rail 4, and the X-direction driving element is connected to the supporting column 21 in a driving manner to drive the supporting column 21 to slide along the X-direction rail 5, so that the degree of automation and the adjusting accuracy are improved.
Alternatively, the Y-direction driving element and the X-direction driving element may be driving cylinders, or may be other structures, such as a lead screw and nut mechanism, which is specifically set according to actual requirements.
More specifically, two support columns 21 are provided, the two support columns 21 are arranged oppositely along the X-axis direction, the first clamp assembly 22 includes two first clamping members 221, each first clamping member 221 is rotatably arranged on one support column 21 around the X-axis direction, and the two first clamping members 221 can clamp two opposite sides of the reticle 100. The two opposite sides of the mask plate 100 are clamped by the two first clamping pieces 221 which are oppositely arranged, so that the stress of the mask plate 100 is uniform, the stability can be kept in the overturning process, and the operation safety and reliability are improved. Meanwhile, the two support columns 21 can slide along the X-direction guide rail 5, so that the distance between the two support columns 21 can be adjusted, that is, the distance between the two first clamping pieces 221 can be adjusted, the mask 100 can be conveniently and smoothly connected, and the mask 100 can be suitable for masks 100 with different sizes. When the rotating mechanism 3 clamps the mask 100, the two supporting columns 21 are away from each other after the two first clamping members 221 loosen the mask 100, so that the rotating mechanism 3 can smoothly drive the mask 100 to move along the Z-axis direction.
In this embodiment, each support pillar 21 is provided with an overturning driving member, and the overturning driving member is connected to the first clamping member 221 in a driving manner to drive the first clamping member 221 to rotate, so that the overturning accuracy of the reticle 100 is relatively high. Preferably, the turnover driving member is disposed in the supporting column 21, and an output shaft of the turnover driving member extends out of the supporting column 21 and is connected to the first clamping member 221, so as to improve the compactness and the aesthetic appearance.
Further, as shown in fig. 4 and 5, the first clamping member 221 includes a support beam 2211 and at least one first clamp 2212, the support beam 2211 is rotatably disposed on one support column 21 in the X-axis direction, that is, the support beam 2211 is connected to the output end of the turnover driving member, each first clamp 2212 includes a mounting plate 22121, a lower clamp 22122 and an upper clamp 22123, the mounting plate 22121 is movably disposed on the support beam 2211 in the length direction of the support beam 2211, the upper clamp 22123 is movably disposed on the mounting plate 22121 in the width direction of the support beam 2211 and can be rotated in the width direction of the support beam 2211, the lower clamp 22122 is rotatably disposed on the mounting plate 22121 in the width direction of the support beam 2211, and the lower clamp 22122 can form a first clamping space with respect to the upper clamp 22123. By moving the mounting plate 22121 along the length direction of the support beam 2211, the first clamp 2212 can clamp different positions of the mask 100 according to requirements, and can also be suitable for different sizes of the mask 100. After the mounting plate 22121 is moved to a proper position, the upper clamping plate 22123 and the lower clamping plate 22122 are respectively rotated until the mask 100 contacts the lower clamping plate 22122, the upper clamping plate 22123 is far away from the mask 100 to avoid the interference between the upper clamping plate 22123 and the mask 100, and then the upper clamping plate 22123 is close to the lower clamping plate 22122 to clamp the mask 100, so that the mask 100 is clamped. Not only simple structure, the flexibility is higher, and with the marginal contact of reticle 100, area of contact is less, avoids leaving the vestige on reticle 100.
Specifically, the first clamp 2212 further includes a first upper driving member 22124 and a first lower driving member 22125, the mounting plate 22121 is movably connected to the output end of the first upper driving member 22124 along the width direction of the support beam 2211, the first upper driving member 22124 can drive the upper clamping plate 22123 to rotate, and the first lower driving member 22125 is disposed on the mounting plate 22121 and is connected to the lower clamping plate 22122 in a driving manner to drive the lower clamping plate 22122 to rotate. Illustratively, the output end of the first upper drive 22124 is provided with a clamping drive that drives the connecting mounting plate 22121 to drive the mounting plate 22121 to move along the width direction of the support beam 2211, thereby clamping or unclamping the reticle 100. The first upper driving member 22124 can be, but is not limited to, a driving cylinder, and the first lower driving member 22125 can be, but is not limited to, a rotating cylinder.
Preferably, the support beam 2211 is provided with a first guide rail 2213 extending along the longitudinal direction thereof, the first guide rail 2213 is provided with a first slider in a sliding manner, and the mounting plate 22121 is fixedly connected to the first slider, so that the moving smoothness and the position accuracy of the first clamp 2212 are improved. More preferably, the support beam 2211 is further provided with a first driving member 2214, and the first driving member 2214 drives the connecting mounting plate 22121 or the first slider to drive the mounting plate 22121 to move along the length direction of the support beam 2211.
Illustratively, the number of the first clamps 2212 is two, and the two first clamps 2212 are spaced along the length direction of the support beam 2211, that is, two clamping points are provided on one side of the mask 100, which is beneficial to improve the stability of clamping the mask 100. Of course, in other embodiments, the number of the first clamps 2212 may also be 3 or 4, and the like, which is specifically set according to actual requirements.
Further, as shown in fig. 3, 6 and 7, the rotating mechanism 3 includes a fixed frame 31 and a second clamp assembly 32, the fixed frame 31 is movably disposed on the frame 1 along the Z-axis direction and is located above or below the rotating mechanism 3, the fixed frame 31 is specifically disposed on the gantry 12, and the second clamp assembly 32 is rotatably disposed on the fixed frame 31 around the Z-axis direction and can clamp or release the reticle 100. The fixed frame 31 provides a supporting function for the second clamp assembly 32, and the fixed frame 31 moves along the Z-axis direction to drive the second clamp assembly 32 to move along the Z-axis direction, so that the second clamp assembly 32 passes through the mask 100 from the turnover mechanism 2 or sends the mask 100 to the turnover mechanism 2; after the second clamp assembly 32 is connected with the mask 100, the second clamp assembly 32 moves to a position far away from the turnover mechanism 2 along with the fixed frame 31 and then rotates to drive the mask 100 to rotate, after the mask 100 rotates to a preset angle, the second clamp assembly 32 moves downwards to transfer the mask 100 to the turnover mechanism 2, and the turnover mechanism 2 and the manipulator are used for connecting the mask 100.
Preferably, the rack 1 is provided with a Z-direction guide rail 6 extending along the Z-axis direction, the fixing frame 31 is slidably disposed on the Z-direction guide rail 6, the rack 1 is further provided with a Z-direction driving member, the Z-direction driving member is connected with the fixing frame 31 in a driving manner so as to drive the fixing frame 31 to move along the Z-direction guide rail 6, so that the moving smoothness and accuracy of the second clamp assembly 32 are improved, and the accurate butt joint with the mask 100 on the turnover mechanism 2 is facilitated.
More preferably, two Z-guide rails 6 are provided, two Z-guide rails 6 are oppositely arranged on the frame 1, a Z-slide block is slidably arranged on each Z-guide rail 6, and two ends of the fixing frame 31 are respectively connected with the Z-guide rails 6 through the Z-slide blocks, so that the fixing frame 31 has high movement stability. Of course, in other embodiments, the number of the Z-guide rails 6 may be set to be other, for example, 4 or 6Z-guide rails 6 are provided, and the specific number is set according to actual requirements.
Specifically, as shown in fig. 6 and 7, the second clamp assembly 32 includes a fixed plate 321 and two second clamping members 322, the fixed plate 321 is rotatably disposed on the fixed frame 31 around the Z-axis direction, and the second clamping members 322 are relatively movably disposed on the fixed plate 321 and can respectively clamp two opposite sides of the reticle 100. The fixing plate 321 provides a mounting and supporting function for the two oppositely arranged second clamping members 322, so that the two second clamping members 322 can clamp two opposite sides of the mask 100, the clamping stability is improved, and the reliability and the safety of the mask 100 during rotation can be improved. Meanwhile, the relative distance between the two second clamping pieces 322 is adjusted, so that the mask plates 100 with different sizes can be clamped conveniently, and the practicability is high.
Preferably, the second clamp assembly 32 further includes a rotary driving member, which is disposed on the fixing frame 31 and is connected to the fixing plate 321 in a driving manner, so as to drive the fixing plate 321 to rotate, thereby ensuring the rotation accuracy of the mask blank 100 and improving the working efficiency. Wherein the rotary driving member is selected from but not limited to a rotary cylinder.
More specifically, each of the second clamping members 322 includes an adapter plate 3221 and at least one second clamp 3222, the adapter plate 3221 is movably disposed on the fixing plate 321 along a length direction of the fixing plate 321, each of the second clamps 3222 includes a lower positioning plate 32221 and an upper positioning plate 32222, the lower positioning plate 32221 is disposed on the adapter plate 3221, and the upper positioning plate 32222 is movably disposed above the lower positioning plate 32221 along a Z-axis direction, and forms a second clamping space with the lower positioning plate 32221. When the mask 100 is transferred, the angle of the fixing plate 321 and the position of the adapter plate 3221 on the fixing plate 321 are adjusted, so that the upper and lower positioning plates 32221 of the adapter plate 3221 are aligned with the lower end surface of the mask 100, then the upper positioning plate 32222 moves towards the lower positioning plate 32221 to clamp the mask 100, the mask 100 is loosened by the turnover mechanism 2, the transfer of the mask 100 is realized, and the safety of the mask 100 is high in the transfer process. In this embodiment, the lower positioning plate 32221 is L-shaped, a vertical plate of the L-shaped lower positioning plate 32221 is connected to the adapting plate 3221, and a horizontal plate is disposed opposite to the upper positioning plate 32222.
Illustratively, two second clamps 3222 are disposed on each adapter plate 3221, and the two second clamps 3222 are disposed at intervals in the width direction of the fixing plate 321, that is, two clamping points are provided for one side of the reticle 100, so as to improve the clamping stability and the safety during rotation. Of course, in other embodiments, the number of the second clamps 3222 is specifically set according to actual requirements, for example, 3 or 4 second clamps 3222 on each adapting board 3221 are provided, and the like.
Preferably, at least one second driving member 324 is further disposed on each adapting plate 3221, the second driving member 324 is connected to the upper positioning plate 32222 in a driving manner to drive the upper positioning plate 32222 to move along the Z-axis direction, and the second driving member 324 may be, but is not limited to, a driving air cylinder.
Preferably, the fixing plate 321 is provided with a second guide rail 323 extending along the length direction thereof, the second guide rail 323 is provided with a second slider in a sliding manner, and the adapting plate 3221 is fixedly connected to the second slider, so that the moving smoothness and the moving direction accuracy of the adapting plate 3221 are improved. More preferably, a third driving member is further disposed on the fixing plate 321, the third driving member drives the connection adapting plate 3221 to drive the adapting plate 3221 to move along the length direction of the fixing plate 321, and the third driving member may be, but is not limited to, a driving cylinder.
The mask plate position adjusting device provided by the embodiment has the following working process:
two first clamping pieces 221 of the turnover mechanism 2 rotate by 15 degrees, and the first clamp 2212 is connected with the mask 100 from the clamping manipulator;
the two first clamping members 221 are rotated 180 °;
the fixed frame 31 moves to the upper part of the turnover mechanism 2, and the two first clamping pieces 221 rotate to the level of the mask 100;
the second clamp 3222 clamps the reticle 100, the fixing frame 31 moves upwards, and the fixing plate 321 rotates 180 degrees in the horizontal direction;
the fixed frame 31 moves downwards to the upper part of the turnover mechanism 2, the turnover mechanism 2 is connected with the mask 100, and the fixed frame 31 moves upwards;
if the mask 100 does not need to be turned, the manipulator tilts by 15 degrees to take the mask 100, and 180-degree turning of the mask 100 is completed;
if the mask 100 needs to be turned over, the two support beams 2211 rotate 180 degrees, and the robot rotates 15 degrees to access the mask 100.
The mask plate position adjusting device provided by the embodiment turns and rotates under the condition of not contacting the working surface of the mask plate 100, high-requirement actions which cannot be completed by manpower are completed, and high precision and high reliability are met; moreover, the mask plate 100 can be suitable for mask plates 100 with different sizes, and the practicability is high.
It is to be noted that the foregoing description is only exemplary of the invention and that the principles of the technology may be employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.

Claims (10)

1. Mask version position control device, its characterized in that includes:
a frame (1);
the turnover mechanism (2), the turnover mechanism (2) is arranged on the frame (1), the turnover mechanism (2) can clamp or loosen the mask (100) and can drive the mask (100) to turn around the X-axis direction;
the rotating mechanism (3) is movably arranged on the rack (1) along the Z-axis direction and is positioned above or below the turnover mechanism (2), and the rotating mechanism (3) can clamp or loosen the mask (100) and can drive the mask (100) to rotate around the Z-axis direction.
2. The reticle position adjustment device according to claim 1, wherein the flipping mechanism (2) comprises:
the supporting column (21) is movably arranged on the rack (1) on a plane formed by the X-axis direction and the Y-axis direction;
the first clamp assembly (22) is arranged on the supporting column (21) in a rotating mode around the X-axis direction, and can clamp or release the mask plate (100).
3. The reticle position adjustment device of claim 2, further comprising:
the Y-direction guide rail (4), the Y-direction guide rail (4) extends along the Y-axis direction and is arranged on the rack (1);
the Y-direction sliding block is arranged on the Y-direction guide rail (4) in a sliding manner along the Y-axis direction;
the X-direction guide rail (5), the X-direction guide rail (5) extends along the X-axis direction and is arranged on the Y-direction sliding block, and the supporting column (21) slides along the X-axis direction and is arranged on the X-direction guide rail (5).
4. The reticle position adjustment device according to claim 2, wherein the support columns (21) are provided in two, the two support columns (21) being disposed opposite to each other in an X-axis direction, the first clamp assembly (22) comprising:
the two first clamping pieces (221) are arranged on one supporting column (21) in a rotating mode around the X-axis direction, and the two first clamping pieces (221) can clamp two opposite sides of the mask (100).
5. The reticle position adjustment device of claim 4, wherein each of the first clamps (221) comprises:
the supporting beam (2211), the supporting beam (2211) is arranged on one supporting column (21) in a rotating mode around the X-axis direction;
at least one first clamp (2212), each first clamp (2212) comprises a mounting plate (22121), a lower clamping plate (22122) and an upper clamping plate (22123), the mounting plate (22121) is movably arranged on the support beam (2211) along the length direction of the support beam (2211), the upper clamping plate (22123) is movably arranged on the mounting plate (22121) along the width direction of the support beam (2211) and can rotate around the width direction of the support beam (2211), the lower clamping plate (22122) is rotatably arranged on the mounting plate (22121) around the width direction of the support beam (2211), and the lower clamping plate (22122) and the upper clamping plate (22123) can form a first clamping space relatively.
6. The reticle position adjustment device according to any one of claims 1 to 5, wherein the rotation mechanism (3) comprises:
the fixing frame (31) is movably arranged on the rack (1) along the Z-axis direction and is positioned above or below the rotating mechanism (3);
the second clamp assembly (32) is arranged on the fixing frame (31) in a rotating mode around the Z-axis direction, and can clamp or release the mask (100).
7. The reticle position adjustment device of claim 6, further comprising:
the Z-direction guide rail (6) extends along the Z-axis direction and is arranged on the rack (1), and the fixing frame (31) is arranged on the Z-direction guide rail (6) in a sliding manner;
and the Z-direction driving piece is arranged on the rack (1) and is in driving connection with the fixed frame (31).
8. The reticle position adjustment device of claim 6, wherein the second clamp assembly (32) comprises:
the fixing plate (321), the said fixing plate (321) is set up on the said fixed mount (31) around the direction of Z axle rotation;
the two second clamping pieces (322) are arranged on the fixing plate (321) in a relatively moving mode and can respectively clamp two opposite sides of the mask (100).
9. The reticle position adjustment device of claim 7, wherein each of the second clamps (322) comprises:
the adapter plate (3221) is movably arranged on the fixing plate (321) along the length direction of the fixing plate (321);
at least one second clamp (3222), wherein each second clamp (3222) comprises a lower positioning plate (32221) and an upper positioning plate (32222), the lower positioning plate (32221) is arranged on the adapter plate (3221), the upper positioning plate (32222) is movably arranged above the lower positioning plate (32221) along the Z-axis direction, and a second clamping space is formed between the upper positioning plate (32222) and the lower positioning plate (32221).
10. The reticle position adjustment device according to any one of claims 1 to 5, wherein the frame (1) comprises a base frame (11) and a gantry (12) mounted on the base frame (11), the flipper (2) is arranged on the base frame (11), and the rotation mechanism (3) is arranged on the gantry (12) and faces the flipper (2).
CN202211686878.6A 2022-12-26 2022-12-26 Mask plate position adjusting device Withdrawn CN115872126A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202211686878.6A CN115872126A (en) 2022-12-26 2022-12-26 Mask plate position adjusting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202211686878.6A CN115872126A (en) 2022-12-26 2022-12-26 Mask plate position adjusting device

Publications (1)

Publication Number Publication Date
CN115872126A true CN115872126A (en) 2023-03-31

Family

ID=85754753

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202211686878.6A Withdrawn CN115872126A (en) 2022-12-26 2022-12-26 Mask plate position adjusting device

Country Status (1)

Country Link
CN (1) CN115872126A (en)

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