CN115841974A - Water film spraying equipment of photovoltaic cleaning equipment - Google Patents
Water film spraying equipment of photovoltaic cleaning equipment Download PDFInfo
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- CN115841974A CN115841974A CN202310159230.1A CN202310159230A CN115841974A CN 115841974 A CN115841974 A CN 115841974A CN 202310159230 A CN202310159230 A CN 202310159230A CN 115841974 A CN115841974 A CN 115841974A
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- water
- overflow
- liquid
- tank
- water film
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 156
- 238000004140 cleaning Methods 0.000 title claims abstract description 35
- 238000005507 spraying Methods 0.000 title claims abstract description 33
- 239000007788 liquid Substances 0.000 claims abstract description 104
- 239000007921 spray Substances 0.000 claims abstract description 29
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 16
- 239000010703 silicon Substances 0.000 claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 210000005056 cell body Anatomy 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Cleaning By Liquid Or Steam (AREA)
Abstract
The application relates to a water film spraying device of a photovoltaic cleaning device, which belongs to the technical field of photovoltaic production equipment, and the device consists of a groove body and a spraying head. The groove body comprises a main groove and an overflow groove which are formed by dividing an overflow plate, a water inlet pipe is arranged in the main groove, at least one water outlet is arranged on a side plate along the length direction of the main groove, an overflow port is formed in the side plate of the overflow groove, and liquid is sprayed out from a spray header through a spray pipe during working so as to form a water film on the top surface of the photovoltaic silicon wafer and keep the liquid in the main groove in an overflow state. When spraying, keep the overflow simultaneously to make water level in the main tank keep invariable, thereby make shower head water pressure invariable, and then make the flow that the shower head flows preserve invariable, improve the stability of water film quality.
Description
Technical Field
The application belongs to the technical field of photovoltaic manufacturing equipment, and particularly relates to a water film spraying device of photovoltaic cleaning equipment.
Background
In the production and manufacturing process of the photovoltaic silicon wafer, some processes need to perform cleaning processing, such as corrosion and the like, on the bottom surface of the silicon wafer, and in order to prevent the top surface of the silicon wafer from being corroded by the corrosive liquid, a water film needs to be formed on the top surface to protect the top surface from being corroded. The water film covering is to spray water or other liquid onto the top of the silicon chip via the shower head. Chinese patent document CN215118926U discloses a water film spraying apparatus, comprising a water dropping pipe and a water replenishing assembly; the water dripping pipe is horizontally and transversely arranged, a plurality of water dripping openings are sequentially arranged on the bottom surface at intervals to connect a plurality of water inlet pipelines, one end of each water inlet pipeline is connected with the corresponding water dripping opening, and the other end of each water inlet pipeline is connected with the corresponding water dripping box and used for guiding liquid in the water dripping pipe into the box body. The transversely arranged water dripping pipe is convenient for distributing water liquid in the length direction of the water dripping pipe. However, the interior water storage quantity of the water dropping pipe serving as the water storage device can be changed in the actual working process, so that the liquid level height is changed, the water pressure at the water dropping port at the bottom surface of the water dropping pipe is different, when the water dropping pipe depends on gravity as the main power source for spraying liquid, different liquid level heights can cause different spraying quantities, the thickness of a water film is different, and the quality of the sprayed liquid is unstable.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: the problem of unstable water film quality that leads to for shower head department water pressure unstability among the prior art is solved to a photovoltaic cleaning equipment water film spraying equipment who improves the stability of water film quality is provided.
The technical scheme adopted by the invention for solving the technical problems is as follows:
a photovoltaic cleaning equipment water film sprays equipment includes:
the photovoltaic silicon wafer overflow trough comprises a trough body and a plurality of grooves, wherein the trough body comprises a main trough and an overflow trough which are formed by dividing an overflow plate, a water inlet pipe is arranged in the main trough, at least one water outlet is arranged on a side plate along the length direction of the main trough, an overflow port is formed in the side plate of the overflow trough to discharge liquid in the overflow trough, liquid for forming a water film flows into the main trough from a water tank through the water inlet pipe during working, the liquid in the main trough is sprayed out from a spray header through a spray pipe to form the water film on the top surface of a photovoltaic silicon wafer, and meanwhile the liquid in the main trough overflows into the overflow trough;
and the spray header is communicated with the water outlet through a spray pipe and can spray liquid to form a water film on the surface of the photovoltaic silicon wafer.
Preferably, the photovoltaic cleaning equipment water film spraying equipment is provided with a first liquid level sensor at the position equal to the height of the overflow plate, the first liquid level sensor monitors the liquid level in the main tank, and when the first liquid level sensor senses that the liquid level is equal to the height of the overflow plate and the liquid level is lower than the height of the overflow plate, the first liquid level sensor sends a signal to inform a control program of the equipment to send an alarm, so that the continuous overflow is ensured.
Preferably, according to the water film spraying device of the photovoltaic cleaning device, a second liquid level sensor is arranged at the equal height position of the overflow port of the overflow tank, and when liquid flows out from the overflow port, the second liquid level sensor can sense the liquid flow, so that the overflow is ensured.
Preferably, in the water film spraying device of the photovoltaic cleaning device, a third liquid level sensor is further arranged at the middle height of the overflow trough.
Preferably, the water inlet pipe is transversely arranged in the main tank, and the length of the water inlet pipe exceeds the water outlets at the two extreme ends and is higher than the water outlets.
Preferably, the opening on the water inlet pipe faces to the side away from the water outlet or faces upwards, so that the water pressure at the water inlet pipe is prevented from being changed due to the inflow of liquid at the opening.
Preferably, in the water film spraying device of the photovoltaic cleaning device, the water inlet pipe is supported and fixed by a plurality of support plates arranged on the bottom plate of the main tank, and one support plate is arranged between two adjacent water outlets in vertical projection.
Preferably, according to the water film spraying device of the photovoltaic cleaning device, the number of the openings in each area divided by the support plate on the water inlet pipe is equal.
Preferably, the liquid of the water film spraying device of the photovoltaic cleaning device is clear water or alkaline liquid.
Preferably, in the water film spraying device of the photovoltaic cleaning device, the water inlet pipe and the overflow port are respectively connected with a water tank, the water tank supplies liquid to the water inlet pipe, and the liquid flowing out of the overflow port flows into the water tank.
The invention has the beneficial effects that:
the application discloses photovoltaic cleaning equipment water film spraying equipment comprises cell body and shower head two parts. The groove body comprises a main groove and an overflow groove which are formed by dividing an overflow plate, a water inlet pipe is arranged in the main groove, at least one water outlet is arranged on a side plate along the length direction of the main groove, an overflow port is formed in the side plate of the overflow groove, and liquid is sprayed out from a spray header through a spray pipe during working so as to form a water film on the top surface of the photovoltaic silicon wafer and keep the liquid in the main groove in an overflow state. Also when spraying, keep the overflow simultaneously to make the water level keep invariable in the master tank, thereby make shower head water pressure invariable, and then make the flow that the shower head flows preserve invariable, improve the stability of water film quality.
Drawings
The technical solution of the present application is further explained below with reference to the drawings and examples.
FIG. 1 is a schematic structural diagram of a water film spraying device of a photovoltaic cleaning device in an embodiment of the application;
fig. 2 is a schematic structural view of a photovoltaic cleaning equipment water film spraying equipment according to an embodiment of the present application, after a front side plate of a tank body is hidden;
FIG. 3 is a front view of the water film spraying apparatus of the photovoltaic cleaning apparatus of FIG. 2;
the reference numbers in the figures are:
1. a trough body;
2. a shower head;
3. a manual valve;
4. an automatic valve;
5. a shower pipe;
9. a transfer roller;
10. an overflow plate;
11. a main tank;
12. an overflow trough;
13. a water inlet pipe;
14. a water outlet;
15. an overflow port;
16. emptying the air;
17. a first liquid level sensor;
18. a second liquid level sensor;
19. a third liquid level sensor;
131. an opening;
132. and a support plate.
Detailed Description
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict.
In the description of the present application, it is to be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in the orientation or positional relationship indicated in the drawings for convenience in describing the present application and for simplicity in description, and are not intended to indicate or imply that the referenced devices or elements must have a particular orientation, be constructed in a particular orientation, and be operated in a particular manner, and are not to be considered limiting of the scope of the present application. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the invention, the meaning of "a plurality" is two or more unless otherwise specified.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art through specific situations.
The technical solutions of the present application will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
Examples
This embodiment provides a photovoltaic cleaning equipment water film equipment of spraying, as shown in fig. 1, includes:
the structure of the tank body 1 is as shown in fig. 2 and 3, the tank body 1 is arranged on the top of a transmission roller 9, and comprises a main tank 11 and an overflow tank 12 which are formed by dividing through an overflow plate 10, a water inlet pipe 13 is arranged in the main tank 11, at least one water outlet 14 is arranged on a side plate along the length direction of the main tank 11, an overflow port 15 is arranged on the side plate of the overflow tank 12, liquid for forming a water film during operation flows into the main tank 11 from a water tank through the water inlet pipe 13, part of liquid in the main tank 11 is sprayed out from a spray header 2 through a spray pipe 5 to form the water film on the surface of a photovoltaic silicon wafer (facing the top surface of the spray header 2), meanwhile, the liquid in the main tank 11 is kept overflowing into the overflow tank 12, the liquid in the overflow tank 12 returns to the water tank through the overflow port 15 arranged at the bottom of the overflow tank 12, the water tank is usually arranged in a space below the transmission roller 9 of the photovoltaic cleaning equipment, the liquid is pumped into the tank body 1 above from the water tank by a pump, and the overflow is kept constant during spraying, so that the water level of the spray header 2 is constant; the body of the tank body 1 consists of a top plate, a bottom plate and side plates around, one side of the inside of the tank body is close to and provided with an overflow plate 10, the top surface of the overflow plate 10 is an inclined plane, and the height of one side of the overflow plate close to the main tank 11 is higher than the height of one side of the overflow tank close to the overflow tank 12, so that the liquid can overflow conveniently.
The spray header 2 is communicated with the water outlet 14 through the spray pipe 5 and can spray liquid to form a water film on the top surface of the photovoltaic silicon wafer.
The water film spraying equipment of the photovoltaic cleaning equipment mainly comprises a tank body 1 and a spray header 2. The bath body 1 is arranged at the top of the transmission roller 9 and comprises a main bath 11 and an overflow bath 12 which are formed by dividing an overflow plate 10, a water inlet pipe 13 is arranged in the main bath 11, at least one water outlet 14 is arranged on a side plate along the length direction of the main bath 11, an overflow port 15 is arranged on the side plate of the overflow bath 12, and when the bath body works, liquid is sprayed out from the spray header 2 through the spray pipe 5 so as to form a water film on the top surface of the photovoltaic silicon wafer, and meanwhile, the liquid in the main bath 11 is always in an overflow state. The overflow is kept while the water is sprayed, so that the water level in the main groove 11 is kept constant, the water pressure of the spray header 2 is constant, the flow flowing out of the spray header 2 is kept constant, and the quality stability of the water film is improved.
Generally, the liquid in the overflow groove 12 is returned to the water tank through the overflow port 15 for recycling, and the water tank is disposed in the space below the conveying roller 9 of the photovoltaic cleaning equipment so as to facilitate the arrangement of the related equipment. The transfer roller 9 in fig. 1 is used for transferring the photovoltaic silicon wafer.
Further, the shower pipe 5 is provided with a manual valve 3 and/or an automatic valve 4, as shown in fig. 1, and the manual valve 3 and the automatic valve 4 are provided to facilitate manual or automatic control of the single shower head 2, and the automatic valve 4 is, for example, a solenoid valve or a pneumatic valve.
Further, a first liquid level sensor 17 is arranged at a position equal to the height of the overflow plate 10, the first liquid level sensor 17 monitors the liquid level in the main tank 11, when the first liquid level sensor 17 senses that the liquid level height is equal to the height of the overflow plate 10, the overflow is always performed, and when the first liquid level sensor 17 senses that the liquid level height is lower than the height of the overflow plate 10, a signal is sent to inform a control program of the device to send an alarm, so that the overflow is continuously performed.
Further, the overflow port 15 of the overflow tank 12 is provided with a second liquid level sensor 18 at the same height position, when the overflow port 15 has liquid to flow out, the second liquid level sensor 18 can sense the liquid to flow, so as to ensure the existence of overflow, that is, when spraying, the second liquid level sensor 18 can sense the liquid to flow, otherwise, no overflow liquid is considered, and then an alarm is given. The provision of the second level sensor 18 together with the first level sensor 17 ensures that overflow occurs.
Further, a third liquid level sensor 19 is further arranged at the middle height of the overflow chute 12, and when the third liquid level sensor 19 senses the liquid level, it indicates that the liquid level in the overflow chute 12 is too high, and it indicates that the overflow chute 12 has a liquid flow obstacle and needs to overhaul equipment.
The first liquid level sensor 17, the second liquid level sensor 18 and the third liquid level sensor 19 are all float type liquid level sensors, the float can stand when the liquid level is higher than the liquid level sensors, the float can hang down when the liquid level is lower than the liquid level sensors, and corresponding sensing signals can occur when the float stands and hangs down.
Further, as shown in fig. 3, the water inlet pipe 13 is transversely disposed in the main groove 11, and has a length that exceeds the water outlet 14 at the two extreme ends and is higher than the water outlet 14 (higher than the water outlet 14 in the height direction).
Further, the opening 131 of the inlet pipe 13 faces to the side away from the water outlet 14 or faces upward to prevent the inflow of liquid at the opening 131 from causing the change of the water pressure at the inlet pipe 13.
Further, the water inlet pipe 13 is supported and fixed by a plurality of supporting plates 132 disposed on the bottom plate of the main tank 11, and a supporting plate 132 is disposed between two adjacent water outlets 14 in vertical projection to separate, and the number of the openings 131 in each area divided by the supporting plate 132 of the water inlet pipe 13 is equal. As shown in fig. 3, the water inlet pipe is divided into 5 segments from left to right, the 5 segments correspond to 5 water outlets 14, the number of the openings 131 of each segment in the 5 segments is equal to 4, and one of the openings 131 at the leftmost side is located at the end of the water inlet pipe 13. The water inlet pipe 13 needs to be supported and fixed by the supporting plate 132, and in order to reduce the influence of the supporting plate 132 on the liquid flow, the water outlet 14 is purposely arranged between the two supporting plates 132, and the number of the corresponding openings 131 is also set to be the same.
Further, the main tank 11 is further provided with a drain 16 for draining liquid in the main tank 11, the drain is used for cleaning the main tank 11 during non-working time, it should be noted that the drain 16 is higher than the water outlet 14, and a part of the liquid lower than the drain 16 is drained from the water outlet 14, and the water outlet 14 is distributed in the length direction of the main tank 11, so that all the liquid can be drained more conveniently.
When liquid at a certain temperature is required, a heater is provided in the water tank to heat the liquid, and a temperature sensor may be provided in the main tank 11 to monitor the temperature.
According to actual needs, the liquid for forming the water film can be clear water, alkaline liquid or other solutions.
It is noted that in this application no conduits are illustrated, but that the components with fluid communication interconnections require conduit connections (for ease of illustration, parts of the conduits are omitted from the drawings throughout), and that pumps or valves or flow regulating devices (flow valves) are provided on the conduits as necessary to power or open and close the flow passages or flow regulation.
In light of the foregoing description of the preferred embodiments according to the present application, it is to be understood that various changes and modifications may be made without departing from the spirit and scope of the invention. The technical scope of the present application is not limited to the contents of the specification, and must be determined according to the scope of the claims.
Claims (10)
1. The utility model provides a photovoltaic cleaning equipment water film sprays equipment which characterized in that includes:
the photovoltaic silicon wafer cleaning device comprises a tank body (1) and a cleaning device, wherein the tank body comprises a main tank (11) and an overflow tank (12) which are formed by dividing an overflow plate (10), a water inlet pipe (13) is arranged in the main tank (11), at least one water outlet (14) is arranged on a side plate along the length direction of the main tank (11), an overflow port (15) is formed in the side plate of the overflow tank (12) to discharge liquid in the overflow tank (12), the liquid for forming a water film flows into the main tank (11) from a water tank through the water inlet pipe (13) during working, the liquid in the main tank (11) is sprayed out from a spray header (2) through a spray pipe (5) to form the water film on the top surface of a photovoltaic silicon wafer, and meanwhile the liquid in the main tank (11) overflows into the overflow tank (12);
the spray header (2) is communicated with the water outlet (14) through a spray pipe (5) and can spray liquid to form a water film on the surface of the photovoltaic silicon wafer.
2. The water film spraying equipment of the photovoltaic cleaning equipment according to claim 1, wherein a first liquid level sensor (17) is arranged at a position equal to the height of the overflow plate (10), the first liquid level sensor (17) monitors the liquid level in the main tank (11), and when the first liquid level sensor (17) senses that the liquid level is equal to the height of the overflow plate (10), and when the first liquid level sensor (17) senses that the liquid level is lower than the height of the overflow plate (10), a signal is sent to inform a control program of the equipment to send an alarm, so that the continuous overflow is ensured.
3. The water film spraying device of the photovoltaic cleaning device according to claim 2, wherein a second liquid level sensor (18) is arranged at the same height position as the overflow port (15) of the overflow tank (12), and when liquid flows out of the overflow port (15), the second liquid level sensor (18) can sense the liquid flow, so that the existence of overflow is ensured.
4. The photovoltaic cleaning plant water film spraying plant according to claim 2 or 3, characterized in that a third level sensor (19) is further provided at the intermediate height of the overflow launder (12).
5. The water film spraying device of a photovoltaic cleaning device according to claim 1, wherein the water inlet pipe (13) is arranged transversely in the main trough (11) and has a length which exceeds the water outlets (14) at the extreme ends and is higher than the water outlets (14).
6. The water film spraying device of photovoltaic cleaning equipment according to claim 5, characterized in that the opening of the water inlet pipe (13) is directed to the side away from the water outlet (14) or to the upper side, in order to prevent the inflow of liquid at the opening from causing a change in the water pressure at the water inlet pipe (13).
7. The water film spraying device of photovoltaic cleaning equipment according to claim 5, wherein the water inlet pipe (13) is supported and fixed by a plurality of support plates (132) arranged on the bottom plate of the main tank (11), and one support plate (132) is arranged between two adjacent water outlets (14) in vertical projection.
8. The water film shower device for a photovoltaic cleaning system according to claim 7, characterized in that the number of openings (131) in each region of the inlet pipe (13) divided by the support plate (132) is equal.
9. The photovoltaic cleaning apparatus water film shower apparatus of claim 1, wherein the liquid is clear water or an alkaline liquid.
10. The water film spraying device of a photovoltaic cleaning device according to claim 1, characterized in that the inlet pipe (13) and the overflow opening (15) are each connected to a water tank, which supplies liquid to the inlet pipe (13) and into which the liquid flowing out of the overflow opening (15) flows.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310159230.1A CN115841974B (en) | 2023-02-24 | 2023-02-24 | Water film spraying equipment of photovoltaic cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310159230.1A CN115841974B (en) | 2023-02-24 | 2023-02-24 | Water film spraying equipment of photovoltaic cleaning equipment |
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| Publication Number | Publication Date |
|---|---|
| CN115841974A true CN115841974A (en) | 2023-03-24 |
| CN115841974B CN115841974B (en) | 2023-05-05 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310159230.1A Active CN115841974B (en) | 2023-02-24 | 2023-02-24 | Water film spraying equipment of photovoltaic cleaning equipment |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101559409A (en) * | 2008-04-15 | 2009-10-21 | 迈科机械制造有限及两合公司 | Nozzle system |
| CN204182611U (en) * | 2014-09-19 | 2015-03-04 | 宝山钢铁股份有限公司 | A kind of finish rolling calibrator backlight cleaning device |
| CN205231093U (en) * | 2015-12-29 | 2016-05-11 | 安徽银阳光伏科技有限公司 | Solar cell wet etching's water film device |
| CN209873180U (en) * | 2018-12-28 | 2019-12-31 | 阜宁苏民绿色能源科技有限公司 | Even sculpture water film spray set of going out water |
| CN214976101U (en) * | 2021-03-18 | 2021-12-03 | 安徽英发睿能科技股份有限公司 | Even sculpture water film spray set of going out water |
| CN115156142A (en) * | 2022-05-30 | 2022-10-11 | 江苏亚电科技有限公司 | PSG water film spraying mechanism and photovoltaic silicon wafer water film attaching method |
-
2023
- 2023-02-24 CN CN202310159230.1A patent/CN115841974B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101559409A (en) * | 2008-04-15 | 2009-10-21 | 迈科机械制造有限及两合公司 | Nozzle system |
| CN204182611U (en) * | 2014-09-19 | 2015-03-04 | 宝山钢铁股份有限公司 | A kind of finish rolling calibrator backlight cleaning device |
| CN205231093U (en) * | 2015-12-29 | 2016-05-11 | 安徽银阳光伏科技有限公司 | Solar cell wet etching's water film device |
| CN209873180U (en) * | 2018-12-28 | 2019-12-31 | 阜宁苏民绿色能源科技有限公司 | Even sculpture water film spray set of going out water |
| CN214976101U (en) * | 2021-03-18 | 2021-12-03 | 安徽英发睿能科技股份有限公司 | Even sculpture water film spray set of going out water |
| CN115156142A (en) * | 2022-05-30 | 2022-10-11 | 江苏亚电科技有限公司 | PSG water film spraying mechanism and photovoltaic silicon wafer water film attaching method |
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| CN115841974B (en) | 2023-05-05 |
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Address after: 225500 No. 151, Keji Avenue, Sanshui street, Jiangyan District, Taizhou City, Jiangsu Province Patentee after: Jiangsu Yadian Technology Co.,Ltd. Address before: 225500 No. 151, Keji Avenue, Sanshui street, Jiangyan District, Taizhou City, Jiangsu Province Patentee before: Jiangsu Yadian Technology Co.,Ltd. |